TWI432593B - 端塊與濺鍍裝置 - Google Patents
端塊與濺鍍裝置 Download PDFInfo
- Publication number
- TWI432593B TWI432593B TW100108570A TW100108570A TWI432593B TW I432593 B TWI432593 B TW I432593B TW 100108570 A TW100108570 A TW 100108570A TW 100108570 A TW100108570 A TW 100108570A TW I432593 B TWI432593 B TW I432593B
- Authority
- TW
- Taiwan
- Prior art keywords
- end block
- target
- rotor
- disposed
- deposition apparatus
- Prior art date
Links
- 238000004544 sputter deposition Methods 0.000 title description 54
- 238000009434 installation Methods 0.000 title description 2
- 239000002826 coolant Substances 0.000 claims description 53
- 239000000758 substrate Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 26
- 230000008569 process Effects 0.000 claims description 25
- 230000008021 deposition Effects 0.000 claims description 24
- 239000012530 fluid Substances 0.000 claims description 6
- 238000012545 processing Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 description 13
- 239000000463 material Substances 0.000 description 10
- 239000013077 target material Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 238000001816 cooling Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 3
- 150000004645 aluminates Chemical class 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- -1 aluminum (Al) Chemical class 0.000 description 2
- QNTVPKHKFIYODU-UHFFFAOYSA-N aluminum niobium Chemical compound [Al].[Nb] QNTVPKHKFIYODU-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 2
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 101100460147 Sarcophaga bullata NEMS gene Proteins 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- JYMITAMFTJDTAE-UHFFFAOYSA-N aluminum zinc oxygen(2-) Chemical compound [O-2].[Al+3].[Zn+2] JYMITAMFTJDTAE-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001053 micromoulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C19/00—Bearings with rolling contact, for exclusively rotary movement
- F16C19/22—Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings
- F16C19/34—Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings for both radial and axial load
- F16C19/38—Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings for both radial and axial load with two or more rows of rollers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Sealing Devices (AREA)
- Rolling Contact Bearings (AREA)
- Support Of The Bearing (AREA)
- Joints Allowing Movement (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP10159023.0A EP2371992B1 (en) | 2010-04-01 | 2010-04-01 | End-block and sputtering installation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201144465A TW201144465A (en) | 2011-12-16 |
| TWI432593B true TWI432593B (zh) | 2014-04-01 |
Family
ID=42590049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100108570A TWI432593B (zh) | 2010-04-01 | 2011-03-14 | 端塊與濺鍍裝置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20110240465A1 (enExample) |
| EP (1) | EP2371992B1 (enExample) |
| JP (1) | JP5793555B2 (enExample) |
| CN (1) | CN103119191B (enExample) |
| TW (1) | TWI432593B (enExample) |
| WO (1) | WO2011120782A2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9809876B2 (en) | 2014-01-13 | 2017-11-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl | Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure |
| DE102014101830B4 (de) * | 2014-02-13 | 2015-10-08 | Von Ardenne Gmbh | Antriebs-Baugruppe, Prozessieranordnung, Verfahren zum Montieren einer Antriebs-Baugruppe und Verfahren zum Demontieren einer Antriebs-Baugruppe |
| DE102014115275B4 (de) * | 2014-10-20 | 2019-10-02 | VON ARDENNE Asset GmbH & Co. KG | Endblockanordnung und Prozessieranordnung |
| CN104357802B (zh) * | 2014-11-06 | 2017-03-15 | 深圳市纳为金属技术有限公司 | 一种氟化物轴封超薄旋转阴极端头 |
| KR101694197B1 (ko) * | 2015-03-25 | 2017-01-09 | 주식회사 에스에프에이 | 스퍼터 장치 |
| BE1024754B9 (nl) * | 2016-11-29 | 2018-07-24 | Soleras Advanced Coatings Bvba | Een universeel monteerbaar eindblok |
| JP2018131644A (ja) * | 2017-02-13 | 2018-08-23 | 株式会社アルバック | スパッタリング装置用の回転式カソードユニット |
| CN107779830B (zh) * | 2017-11-09 | 2023-10-10 | 浙江大学昆山创新中心 | 一种应用于柱形旋转靶的挡板组件 |
| KR102462111B1 (ko) * | 2020-09-14 | 2022-11-02 | 주식회사 케이씨엠씨 | 회전형 캐소드 및 이를 구비한 스퍼터 장치 |
| CN222581094U (zh) * | 2021-06-23 | 2025-03-07 | 应用材料公司 | 阴极组件和沉积装置 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53163352U (enExample) * | 1977-05-31 | 1978-12-21 | ||
| US5200049A (en) * | 1990-08-10 | 1993-04-06 | Viratec Thin Films, Inc. | Cantilever mount for rotating cylindrical magnetrons |
| US5100527A (en) * | 1990-10-18 | 1992-03-31 | Viratec Thin Films, Inc. | Rotating magnetron incorporating a removable cathode |
| JP3428264B2 (ja) * | 1995-12-22 | 2003-07-22 | 日本精工株式会社 | 転がり軸受用回転精度測定装置 |
| US20020189939A1 (en) * | 2001-06-14 | 2002-12-19 | German John R. | Alternating current rotatable sputter cathode |
| EP1641956B1 (en) * | 2003-07-04 | 2009-03-25 | Bekaert Advanced Coatings | Rotating tubular sputter target assembly |
| DE602005006008T2 (de) * | 2004-10-18 | 2009-06-18 | Bekaert Advanced Coatings | Endblock für eine sputter-vorrichtung mit drehbarem target |
| KR101358820B1 (ko) * | 2004-10-18 | 2014-02-10 | 솔레라스 어드밴스드 코팅스 비브이비에이 | 회전가능한 스퍼터링 타겟을 지지하기 위한 평탄한엔드-블록 |
| US7578061B2 (en) * | 2004-11-18 | 2009-08-25 | Sms Demag Ag | Method and device for prestressing tapered roller bearings of a rolling mill roller |
| PT1856303E (pt) * | 2005-03-11 | 2009-02-27 | Bekaert Advanced Coatings | Bloco de extremidade individual em ângulo recto |
| FR2886204A1 (fr) * | 2005-05-24 | 2006-12-01 | Sidel Sas | Machine tournante a colonne tournante d'alimentation fluidique |
| JP2007119824A (ja) * | 2005-10-26 | 2007-05-17 | Kohatsu Kogaku:Kk | 回転円筒型マグネトロンスパッタリングカソード用ターゲット組立体、それを用いたスパッタリングカソード組立体及びスパッタリング装置並びに薄膜作成方法 |
| DE102008018609B4 (de) * | 2008-04-11 | 2012-01-19 | Von Ardenne Anlagentechnik Gmbh | Antriebsendblock für ein rotierendes Magnetron |
-
2010
- 2010-04-01 EP EP10159023.0A patent/EP2371992B1/en active Active
- 2010-04-09 US US12/757,752 patent/US20110240465A1/en not_active Abandoned
-
2011
- 2011-03-11 CN CN201180026580.6A patent/CN103119191B/zh active Active
- 2011-03-11 WO PCT/EP2011/053736 patent/WO2011120782A2/en not_active Ceased
- 2011-03-11 JP JP2013501718A patent/JP5793555B2/ja active Active
- 2011-03-14 TW TW100108570A patent/TWI432593B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2011120782A3 (en) | 2015-07-02 |
| JP2013533373A (ja) | 2013-08-22 |
| EP2371992B1 (en) | 2013-06-05 |
| JP5793555B2 (ja) | 2015-10-14 |
| WO2011120782A2 (en) | 2011-10-06 |
| EP2371992A1 (en) | 2011-10-05 |
| US20110240465A1 (en) | 2011-10-06 |
| TW201144465A (en) | 2011-12-16 |
| CN103119191A (zh) | 2013-05-22 |
| CN103119191B (zh) | 2016-05-25 |
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