CN103119191B - 端块和溅射装置 - Google Patents

端块和溅射装置 Download PDF

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Publication number
CN103119191B
CN103119191B CN201180026580.6A CN201180026580A CN103119191B CN 103119191 B CN103119191 B CN 103119191B CN 201180026580 A CN201180026580 A CN 201180026580A CN 103119191 B CN103119191 B CN 103119191B
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CN
China
Prior art keywords
end block
target
axis
rotation
base body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201180026580.6A
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English (en)
Chinese (zh)
Other versions
CN103119191A (zh
Inventor
法兰克·施纳朋伯格
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of CN103119191A publication Critical patent/CN103119191A/zh
Application granted granted Critical
Publication of CN103119191B publication Critical patent/CN103119191B/zh
Active legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C19/00—Bearings with rolling contact, for exclusively rotary movement
    • F16C19/22—Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings
    • F16C19/34—Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings for both radial and axial load
    • F16C19/38—Bearings with rolling contact, for exclusively rotary movement with bearing rollers essentially of the same size in one or more circular rows, e.g. needle bearings for both radial and axial load with two or more rows of rollers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Sealing Devices (AREA)
  • Rolling Contact Bearings (AREA)
  • Support Of The Bearing (AREA)
  • Joints Allowing Movement (AREA)
CN201180026580.6A 2010-04-01 2011-03-11 端块和溅射装置 Active CN103119191B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP10159023.0A EP2371992B1 (en) 2010-04-01 2010-04-01 End-block and sputtering installation
EP10159023.0 2010-04-01
PCT/EP2011/053736 WO2011120782A2 (en) 2010-04-01 2011-03-11 End-block and sputtering installation

Publications (2)

Publication Number Publication Date
CN103119191A CN103119191A (zh) 2013-05-22
CN103119191B true CN103119191B (zh) 2016-05-25

Family

ID=42590049

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180026580.6A Active CN103119191B (zh) 2010-04-01 2011-03-11 端块和溅射装置

Country Status (6)

Country Link
US (1) US20110240465A1 (enExample)
EP (1) EP2371992B1 (enExample)
JP (1) JP5793555B2 (enExample)
CN (1) CN103119191B (enExample)
TW (1) TWI432593B (enExample)
WO (1) WO2011120782A2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9809876B2 (en) 2014-01-13 2017-11-07 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure
DE102014101830B4 (de) * 2014-02-13 2015-10-08 Von Ardenne Gmbh Antriebs-Baugruppe, Prozessieranordnung, Verfahren zum Montieren einer Antriebs-Baugruppe und Verfahren zum Demontieren einer Antriebs-Baugruppe
DE102014115275B4 (de) * 2014-10-20 2019-10-02 VON ARDENNE Asset GmbH & Co. KG Endblockanordnung und Prozessieranordnung
CN104357802B (zh) * 2014-11-06 2017-03-15 深圳市纳为金属技术有限公司 一种氟化物轴封超薄旋转阴极端头
KR101694197B1 (ko) * 2015-03-25 2017-01-09 주식회사 에스에프에이 스퍼터 장치
BE1024754B9 (nl) * 2016-11-29 2018-07-24 Soleras Advanced Coatings Bvba Een universeel monteerbaar eindblok
JP2018131644A (ja) * 2017-02-13 2018-08-23 株式会社アルバック スパッタリング装置用の回転式カソードユニット
CN107779830B (zh) * 2017-11-09 2023-10-10 浙江大学昆山创新中心 一种应用于柱形旋转靶的挡板组件
KR102462111B1 (ko) * 2020-09-14 2022-11-02 주식회사 케이씨엠씨 회전형 캐소드 및 이를 구비한 스퍼터 장치
CN222581094U (zh) * 2021-06-23 2025-03-07 应用材料公司 阴极组件和沉积装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53163352U (enExample) * 1977-05-31 1978-12-21
US5200049A (en) * 1990-08-10 1993-04-06 Viratec Thin Films, Inc. Cantilever mount for rotating cylindrical magnetrons
US5100527A (en) * 1990-10-18 1992-03-31 Viratec Thin Films, Inc. Rotating magnetron incorporating a removable cathode
JP3428264B2 (ja) * 1995-12-22 2003-07-22 日本精工株式会社 転がり軸受用回転精度測定装置
US20020189939A1 (en) * 2001-06-14 2002-12-19 German John R. Alternating current rotatable sputter cathode
EP1641956B1 (en) * 2003-07-04 2009-03-25 Bekaert Advanced Coatings Rotating tubular sputter target assembly
DE602005006008T2 (de) * 2004-10-18 2009-06-18 Bekaert Advanced Coatings Endblock für eine sputter-vorrichtung mit drehbarem target
KR101358820B1 (ko) * 2004-10-18 2014-02-10 솔레라스 어드밴스드 코팅스 비브이비에이 회전가능한 스퍼터링 타겟을 지지하기 위한 평탄한엔드-블록
US7578061B2 (en) * 2004-11-18 2009-08-25 Sms Demag Ag Method and device for prestressing tapered roller bearings of a rolling mill roller
PT1856303E (pt) * 2005-03-11 2009-02-27 Bekaert Advanced Coatings Bloco de extremidade individual em ângulo recto
FR2886204A1 (fr) * 2005-05-24 2006-12-01 Sidel Sas Machine tournante a colonne tournante d'alimentation fluidique
JP2007119824A (ja) * 2005-10-26 2007-05-17 Kohatsu Kogaku:Kk 回転円筒型マグネトロンスパッタリングカソード用ターゲット組立体、それを用いたスパッタリングカソード組立体及びスパッタリング装置並びに薄膜作成方法
DE102008018609B4 (de) * 2008-04-11 2012-01-19 Von Ardenne Anlagentechnik Gmbh Antriebsendblock für ein rotierendes Magnetron

Also Published As

Publication number Publication date
WO2011120782A3 (en) 2015-07-02
JP2013533373A (ja) 2013-08-22
TWI432593B (zh) 2014-04-01
EP2371992B1 (en) 2013-06-05
JP5793555B2 (ja) 2015-10-14
WO2011120782A2 (en) 2011-10-06
EP2371992A1 (en) 2011-10-05
US20110240465A1 (en) 2011-10-06
TW201144465A (en) 2011-12-16
CN103119191A (zh) 2013-05-22

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