TWI421380B - Corrosion resistance of aluminum or aluminum alloys - Google Patents

Corrosion resistance of aluminum or aluminum alloys Download PDF

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TWI421380B
TWI421380B TW95117694A TW95117694A TWI421380B TW I421380 B TWI421380 B TW I421380B TW 95117694 A TW95117694 A TW 95117694A TW 95117694 A TW95117694 A TW 95117694A TW I421380 B TWI421380 B TW I421380B
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aluminum
aluminum alloy
oxide layer
alloy
barrier
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TW95117694A
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TW200710279A (en
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Sakae Inayoshi
Katsunobu Ishizawa
Takeru Nomura
Shinichi Saito
Manami Yamaguchi
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Ulvac Inc
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon

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  • Chemical Treatment Of Metals (AREA)
  • Inorganic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Description

鋁或鋁合金之耐腐蝕處理方法Corrosion resistant treatment method for aluminum or aluminum alloy

本發明係關於一種鋁或鋁合金之耐腐蝕處理方法。The present invention relates to a method of corrosion resistance treatment of aluminum or aluminum alloy.

以往,作為對於鋁或鋁合金施行耐腐蝕處理之方法,例如於專利文獻1中,揭示出於鋁合金之表面進行阻擋型陽極氧化處理,加熱進行脫氣處理之方法。Conventionally, as a method of performing corrosion-resistant treatment on aluminum or an aluminum alloy, for example, Patent Document 1 discloses a method in which a surface of an aluminum alloy is subjected to a barrier anodizing treatment and heated to perform a degassing treatment.

然而,如專利文獻1所揭示,對於A1050合金、A5052合金及A6061合金之各個中,經由弱鹼性之脫脂液實施脫脂處理後,於硝酸水溶液中進行剝黑膜(desmut)處理,進行己二酸銨之阻擋型陽極氧化處理,將已形成之阻擋型陽極氧化處理皮膜之形態,使用掃瞄型電子顯微鏡觀察時,A1050合金形成比較的連續性皮膜,但是A5052合金及A6061合金形成之膜具有缺點多、耐腐蝕性及真空環境下之氣體釋出特性之問題。However, as disclosed in Patent Document 1, in each of the A1050 alloy, the A5052 alloy, and the A6061 alloy, the degreasing treatment is performed through a weakly alkaline degreasing liquid, and then a desmutation treatment is performed in an aqueous nitric acid solution to carry out a desmut treatment. The barrier anodic oxidation treatment of ammonium amide forms the morphology of the formed barrier anodized film. When observed by a scanning electron microscope, the A1050 alloy forms a comparative continuous film, but the film formed by the A5052 alloy and the A6061 alloy has There are many disadvantages, corrosion resistance and gas release characteristics in a vacuum environment.

專利文獻1:專利第3506827號公報Patent Document 1: Patent No. 3506827

因此,本發明係欲解決該以往技術之問題點,故以提供一種對於鋁或鋁合金賦予耐腐蝕性之阻擋型陽極氧化處理皮膜,經由為緻密者、氣體釋出特性優異者之鋁或鋁合金耐腐蝕處理方法作為目的。Therefore, the present invention is to provide a barrier type anodized film which imparts corrosion resistance to aluminum or an aluminum alloy, and is provided by aluminum or aluminum which is excellent in gas release characteristics and which is excellent in gas release characteristics. The alloy corrosion resistant treatment method serves as an object.

欲解決該課題,本發明者們發現如以下所述之解決方法。To solve this problem, the inventors have found a solution as described below.

即,本發明之鋁或鋁合金之耐腐蝕處理方法,如申請專利範圍第1項所述,其特徵為於鋁或鋁合金之表面形成厚度為5~20nm之緻密的氧化層,之後,進行阻擋型陽極氧化處理。That is, the corrosion-resistant treatment method of the aluminum or aluminum alloy of the present invention, as described in the first item of the patent application, is characterized in that a dense oxide layer having a thickness of 5 to 20 nm is formed on the surface of the aluminum or aluminum alloy, and then, Block anodizing treatment.

申請專利範圍第2項之本發明係如申請專例範圍第1項之鋁或鋁合金之耐腐蝕處理方法,其中該氧化層係經由酸性溶液之氧化處理所形成。The invention of claim 2 is the corrosion-resistant treatment method of aluminum or aluminum alloy according to item 1 of the application specification, wherein the oxide layer is formed by an oxidation treatment of an acidic solution.

申請專利範圍第3項之本發明係如申請專例範圍第2項之鋁或鋁合金之耐腐蝕處理方法,其中該酸性溶液係含有磷酸為50~80重量%及硝酸為1~5重量%,且將該酸性溶液加熱至80~100℃、將該鋁或鋁合金浸漬1~10分鐘。The invention of claim 3 is the corrosion-resistant treatment method of aluminum or aluminum alloy according to the second item of the application scope, wherein the acidic solution contains 50 to 80% by weight of phosphoric acid and 1 to 5% by weight of nitric acid. And the acidic solution is heated to 80 to 100 ° C, and the aluminum or aluminum alloy is immersed for 1 to 10 minutes.

申請專利範圍第4項係如申請專利範圍第1至第3項任一項中之鋁或鋁合金之耐腐蝕處理方法,其中將該氧化層形成之鋁或鋁合金於真空、大氣或是氮氣環境下、將該鋁或鋁合金於150℃~300℃下加熱處理後,再進行該阻擋型陽極化處理。The fourth aspect of the patent application is the corrosion-resistant treatment method of aluminum or aluminum alloy according to any one of claims 1 to 3, wherein the aluminum or aluminum alloy formed by the oxide layer is in a vacuum, atmosphere or nitrogen. In the environment, the aluminum or aluminum alloy is heat-treated at 150 ° C to 300 ° C, and then the barrier anodizing treatment is performed.

依據本發明,對於鋁或鋁合金賦予耐腐蝕性之阻擋型陽極氧化處理皮膜形成之前,經由形成緻密的氧化層,可將阻擋型陽極氧化皮膜成為緻密,可作為耐腐蝕性及氣體釋放特性優異之阻擋型陽極氧化皮膜。According to the present invention, before the formation of the barrier anodizing film which imparts corrosion resistance to aluminum or an aluminum alloy, the barrier anodic oxide film can be made dense by forming a dense oxide layer, and can be excellent in corrosion resistance and gas release characteristics. Barrier anodic oxide film.

欲實施本發明之最佳形態The best form for carrying out the invention

作為本發明可使用之鋁或鋁合金,並不特別限制。例如,可使用純鋁系之1000系合金、Al-Cu系、A-Cu-Mg系之2000系合金、Al-Mn系之3000系合金、Al-Si系之4000系合金、Al-Mg系之5000系合金、Al-Mg-Si系之6000合金、Al-Zn-Mg-Cu系、Al-Zn-Mg系之7000系合金、7N01等合金,但是特別是純鋁系、2000系、30000系、5000系、6000系之鋁合金係對於本發明有效。4000系之鋁合金係於合金組織中,分散存在約數μm之矽,鋁之部份中無法生長緻密的氧化皮膜,故部份的處理。Aluminum or an aluminum alloy which can be used in the present invention is not particularly limited. For example, a pure aluminum-based 1000-based alloy, an Al-Cu-based, an A-Cu-Mg-based 2000-based alloy, an Al-Mn-based 3000-based alloy, an Al-Si-based 4000-based alloy, and an Al-Mg system can be used. 5000 alloy, Al-Mg-Si 6000 alloy, Al-Zn-Mg-Cu system, Al-Zn-Mg system 7000 alloy, 7N01 alloy, etc., but especially pure aluminum, 2000 series, 30,000 The aluminum alloys of the 5000, 6000, and 6000 series are effective for the present invention. The 4000 series aluminum alloy is in the alloy structure, and is dispersed in a certain number of μm. In the aluminum portion, a dense oxide film cannot be grown, so part of the treatment.

該鋁或是鋁合金形成之緻密的氧化層係5~20nm。The dense oxide layer formed by the aluminum or aluminum alloy is 5-20 nm.

又,本發明書中,所謂緻密的氧化皮膜係指除去由非金屬夾雜物等的存在所引起的缺點,沒有奈米級以上的空孔的連續的被膜,氧化層形成後,盡管於大氣中進行氧化等促進氧化,氧化層也不會變成更厚的層。Further, in the present invention, the dense oxide film refers to a film which removes defects caused by the presence of non-metallic inclusions and the like, and has no continuous film of pores having a nanometer or higher, and the oxide layer is formed, although in the atmosphere. Oxidation or the like promotes oxidation, and the oxide layer does not become a thicker layer.

該氧化層未達5nm,連續地層狀生長不易,為不均勻氧化皮膜,若超過20nm,無形成緻密的氧化層而成為多孔構造,其後,阻擋型陽極氧化皮膜生長,則氣體釋放出為多。When the oxide layer is less than 5 nm, continuous layered growth is not easy, and it is a non-uniform oxide film. If it exceeds 20 nm, a dense oxide layer is not formed and becomes a porous structure. Thereafter, when the barrier anodic oxide film grows, the gas is released. many.

作為該氧化層之形成方法,並不特別限制,經由酸性溶液進行為佳,再者,將酸性溶液含有磷酸50~80重量%及硝酸1~5重量%,將酸性溶液加熱至80~100℃,將鋁或是鋁合金浸漬1~10分鐘為佳。The method for forming the oxide layer is not particularly limited, and it is preferably carried out via an acidic solution. Further, the acidic solution contains 50 to 80% by weight of phosphoric acid and 1 to 5% by weight of nitric acid, and the acidic solution is heated to 80 to 100 ° C. It is better to immerse aluminum or aluminum alloy for 1~10 minutes.

經由此等,將厚為5~20nm之緻密的表面氧化層,形成於鋁或鋁合金之表面為容易地組成。Thus, a dense surface oxide layer having a thickness of 5 to 20 nm is formed on the surface of the aluminum or aluminum alloy to be easily composed.

又,形成該氧化層之後,於真空、大氣或是氮氣環境下,將該鋁或鋁合金於150~300℃下加熱處理為佳。因為經由此等,可促進氧化。Further, after the oxide layer is formed, it is preferred to heat the aluminum or aluminum alloy at 150 to 300 ° C in a vacuum, atmosphere or nitrogen atmosphere. Because of this, oxidation can be promoted.

該氧化層所形成之鋁或鋁合金之阻擋型陽極氧化處理係經由電解質溶液可進行電解。The barrier anodizing treatment of aluminum or aluminum alloy formed by the oxide layer can be performed by electrolysis through an electrolyte solution.

作為電解質溶液係可使用例如己二酸銨等之己二酸鹽、硼酸與硼酸銨之混合物等之硼酸鹽、磷酸二氫銨等磷酸鹽、酒石酸鹽、矽酸鹽、鄰苯二甲酸氫鉀等之鄰苯二甲酸鹽、碳酸鈉等之碳酸鹽、檸檬酸鹽、鉻酸鈉等之溶液中任一種或是可使用此等之混合溶液。As the electrolyte solution, for example, an adipate such as ammonium adipate or a borate such as a mixture of boric acid and ammonium borate, or a phosphate such as ammonium dihydrogen phosphate, tartrate, citrate or potassium hydrogen phthalate can be used. Any one of a solution of a carbonate such as phthalic acid salt or sodium carbonate, a citrate salt, sodium chromate or the like, or a mixed solution of these may be used.

該電解質水溶液中,鋁合或是鋁合金素材為陽極之方式,接續電源進行電解,而陰極係可使用不溶性之導電材料。In the aqueous electrolyte solution, the aluminum alloy or the aluminum alloy material is an anode, and the power source is used for electrolysis, and the cathode system can use an insoluble conductive material.

電解電流係並不特別限制,直流電流時,可為直流密度約0.2~5A/cm2 ,電解時間係可經由形成之皮膜厚度等之電解條件適當選擇。又,外加電壓,並不特別限制,可為20~500V。The electrolysis current is not particularly limited, and the DC current may be a DC density of about 0.2 to 5 A/cm 2 , and the electrolysis time may be appropriately selected via electrolysis conditions such as the thickness of the formed film. Moreover, the applied voltage is not particularly limited and may be 20 to 500V.

實施例Example

以下,對於本發明之實施例說明。Hereinafter, an embodiment of the present invention will be described.

(實施例1)(Example 1)

將表面以車床切削,將直徑45nm、厚3mm之A5052合金製之圓版準備為被處理物。將該被處理物浸漬攪拌於含有80重量%磷酸及3重量%硝酸之85℃溶液,進行氧化處理2分鐘。接者,被處理物浸漬於純水,再度經由純水,浸漬洗淨。The surface was cut by a lathe, and a round plate made of A5052 alloy having a diameter of 45 nm and a thickness of 3 mm was prepared as a workpiece. The material to be treated was immersed and stirred in a 85 ° C solution containing 80% by weight of phosphoric acid and 3% by weight of nitric acid, and oxidized for 2 minutes. The material to be treated was immersed in pure water and washed again with pure water.

接者,將被處理物浸漬於40℃之10重量%之己二酸銨溶液,於直流電壓200V下,1小時形成阻擋型陽極氧化皮膜。Then, the object to be treated was immersed in a 10% by weight ammonium adipate solution at 40 ° C, and a barrier anodic oxide film was formed at a direct current voltage of 200 V for 1 hour.

(實施例2)(Example 2)

準備與實施例1相同之被處理物。The same processed object as in Example 1 was prepared.

將該被處理物浸漬攪拌於含有80重量%磷酸及3重量%硝酸之85℃溶液,進行氧化處理2分鐘。The material to be treated was immersed and stirred in a 85 ° C solution containing 80% by weight of phosphoric acid and 3% by weight of nitric acid, and oxidized for 2 minutes.

接者,被處理物浸漬於純水,經由於50℃之純水,再度經由純水浸漬洗淨。Then, the object to be treated was immersed in pure water, and then washed with pure water at 50 ° C, and then washed again with pure water.

將已洗淨之被處理物,於真空裝置內,減壓至10 4 Pa範圍下,於300℃下進行加熱30分鐘,之後,冷卻至室溫(約10℃~40℃,以下相同)為止,由大氣中取出,浸漬於含有10重量%之己二酸銨之40℃之溶液,於直流電壓200V下,1小時形成阻擋型陽極氧化皮膜。The washed object is heated in a vacuum apparatus to a range of 10 - 4 Pa, and heated at 300 ° C for 30 minutes, and then cooled to room temperature (about 10 ° C to 40 ° C, the same below) The solution was taken out from the atmosphere, immersed in a solution containing 10% by weight of ammonium adipate at 40 ° C, and a barrier anodic oxide film was formed at a direct current voltage of 200 V for 1 hour.

(比較例1)(Comparative Example 1)

準備與實施例1相同之被處理物。The same processed object as in Example 1 was prepared.

將該被處理物於含有15重量%磷酸及1重量%氟酸之室溫下之溶液中浸漬3分鐘,浸漬於純水,經由於50℃之純水,再度經由純水浸漬洗淨。The material to be treated was immersed in a solution containing 15% by weight of phosphoric acid and 1% by weight of hydrofluoric acid at room temperature for 3 minutes, immersed in pure water, and washed again with pure water at 50 ° C by immersion in pure water.

將已洗淨之被處理物,浸漬1分鐘於35重量%之硝酸溶液,以純水洗淨。The washed material was immersed in a 3 wt% nitric acid solution for 1 minute, and washed with pure water.

因此,於與實施例1相同條件下,形成阻擋型陽極氧化皮膜。Therefore, a barrier type anodic oxide film was formed under the same conditions as in Example 1.

(比較例2)(Comparative Example 2)

準備與實施例1相同之被處理物。The same processed object as in Example 1 was prepared.

將該被處理物經由丙酮脫脂洗淨。The material to be treated was degreased by acetone.

將已洗淨之被處理物,於與實施例1相同條件下,形成阻擋型陽極氧化皮膜。The treated object to be washed was subjected to the same conditions as in Example 1 to form a barrier type anodic oxide film.

(比較評價1)(Comparative evaluation 1)

評價實施例1,2及比較例1,2之己二酸銨之形成阻擋型陽極氧化皮膜之試料的氣體釋放特性。氣體釋放特性之評價係使用昇溫脫離測定裝置(ALBACKTECNICALJOUNOL No.58 P.30),測定昇溫至300℃為止間之每單位面積之氣體釋放量,其結果表示如表1。The gas release characteristics of the samples of the barrier anodic oxide film forming the ammonium adipate of Examples 1, 2 and Comparative Examples 1, 2 were evaluated. The gas release characteristics were evaluated by using a temperature rise and fall measurement device (ALBACKTECNICAL JOUNOL No. 58 P. 30), and the gas release amount per unit area between the temperatures up to 300 ° C was measured. The results are shown in Table 1.

作為阻擋型陽極氧化處理之前處理係形成約10nm之緻密的氧化層之實施例1,2之氣體釋放量係與無法形成氧化層之比較例1,2之試料相比,可了解釋放量少。The gas release amount of Examples 1 and 2 in which a dense oxide layer of about 10 nm was formed before the barrier anodizing treatment was compared with the samples of Comparative Examples 1 and 2 in which the oxide layer could not be formed, and the amount of release was small.

(比較評價2)(Comparative evaluation 2)

將實施例1及比較例1之試料之阻擋型陽極氧化處理層之表面,經由掃描式電子顯微鏡(SEM)觀察,將該表面SEM像如圖1所示。圖1之(a)係實施例1之表面SEM像、(b)係比較例1之表面SEM像。與實施例1相比,可了解比較例1缺點多且氧化皮膜為粗的構造。比較例1之釋放量多之原因,可由該構造推測。The surface of the barrier anodized layer of the samples of Example 1 and Comparative Example 1 was observed by a scanning electron microscope (SEM), and the surface SEM image was as shown in FIG. Fig. 1(a) is a surface SEM image of Example 1, and (b) is a surface SEM image of Comparative Example 1. As compared with Example 1, it can be understood that Comparative Example 1 has many disadvantages and the oxide film is thick. The reason why the amount of release in Comparative Example 1 is large can be estimated from this structure.

(比較評價3)(Comparative evaluation 3)

將實施例1,2及比較例1,2之己二酸接之形成阻擋型陽極氧化皮膜之前的試料,使用奧格電子分光分析深的方向,將表面氧化層之厚度,對應各個試料之測定位置之方式,取出8處,求得氧化層厚度之偏差,結果表示如表2。又,表面氧化層厚度係作為氧之最大值的半值值。The samples before the formation of the barrier anodic oxide film by the adipic acid of Examples 1 and 2 and Comparative Examples 1 and 2 were subjected to spectroscopic analysis in the deep direction, and the thickness of the surface oxide layer was determined for each sample. In the manner of position, 8 points were taken out, and the deviation of the thickness of the oxide layer was obtained. The results are shown in Table 2. Further, the thickness of the surface oxide layer is a half value of the maximum value of oxygen.

由表2,可得知對於無法使用前處理形成氧化層之比較例1,2之試料,實施例1,2之試料係測定點間之偏差少、形成均質的氧化層。From Table 2, it was found that the samples of Comparative Examples 1 and 2 in which the oxide layer was not formed by the pretreatment were used, and the samples of Examples 1 and 2 had little variation between the measurement points, and a homogeneous oxide layer was formed.

上述實施例係使用A5052系之鋁合金,但純鋁、2000系、3000系、5000系、6000系之鋁合金,確認為本發明之有效者。In the above embodiment, an aluminum alloy of the A5052 type was used, but an aluminum alloy of pure aluminum, 2000 series, 3000 series, 5000 series, and 6000 series was confirmed to be effective for the present invention.

又,阻擋型陽極氧化處理中,已使用己二酸銨,但確認亦可使用硼酸銨、磷酸銨等。Further, in the barrier anodizing treatment, ammonium adipate has been used, but it is confirmed that ammonium borate or ammonium phosphate can also be used.

產業上之利用可能性Industrial use possibility

本發明之鋁或是鋁合金之耐腐蝕性方法係可利用對於放置於半導體製造裝置與薄膜形成裝置等之真空環境下之零件,賦予耐腐蝕性。The corrosion resistance method of the aluminum or aluminum alloy of the present invention can impart corrosion resistance to a component placed in a vacuum environment such as a semiconductor manufacturing apparatus and a thin film forming apparatus.

〔圖1〕(a)實施例1之SEM像(b)比較例1之SEM像[Fig. 1] (a) SEM image of Example 1 (b) SEM image of Comparative Example 1

Claims (2)

一種鋁或鋁合金之耐腐蝕處理方法,其特徵為將含有磷酸為50~80重量%及硝酸為1~5重量%之酸性溶液加熱至80~100℃,再將該鋁或鋁合金浸漬1~10分鐘,於前述鋁或鋁合金之表面形成厚度為5~20nm之緻密的氧化層之後,進行阻擋型陽極氧化處理,前述緻密的氧化皮膜為除去由非金屬夾雜物等的存在所引起的缺點,沒有奈米級以上的空孔的連續的被膜,氧化層形成後,盡管於大氣中進行氧化等促進氧化,氧化層也不會變成更厚的層,前述阻擋型陽極氧化處理為使用己二酸鹽、硼酸鹽、磷酸鹽、酒石酸鹽、矽酸鹽、鄰苯二甲酸鹽、碳酸鹽、檸檬酸鹽、鉻酸鈉等之溶液中任一種或是使用此等之混合溶液來作為電解質溶液,使直流的電流密度為0.2~5A/cm2 ,施加外加電壓為20~500V之處理。An anti-corrosion treatment method for aluminum or aluminum alloy, characterized in that an acidic solution containing 50 to 80% by weight of phosphoric acid and 1 to 5% by weight of nitric acid is heated to 80 to 100 ° C, and then the aluminum or aluminum alloy is impregnated 1 ~10 minutes, after forming a dense oxide layer having a thickness of 5 to 20 nm on the surface of the aluminum or aluminum alloy, a barrier type anodizing treatment is performed, and the dense oxide film is removed by the presence of non-metallic inclusions or the like. Disadvantages, there is no continuous film of pores above the nanometer level. After the oxide layer is formed, the oxide layer does not become a thicker layer even though oxidation is promoted in the atmosphere, and the barrier type anodizing treatment is used. Any one of a solution of a diacid salt, a borate, a phosphate, a tartrate, a citrate, a phthalate, a carbonate, a citrate, a sodium chromate or the like or a mixed solution thereof The electrolyte solution is such that the current density of the direct current is 0.2 to 5 A/cm 2 and the applied voltage is 20 to 500 V. 如申請專利範圍第1項之鋁或鋁合金之耐腐蝕處理方法,其為將形成有前述氧化層之鋁或鋁合金於真空、大氣或是氮氣環境下,將該鋁或鋁合金於150℃~300℃加熱處理後,再進行前述阻擋型陽極氧化處理。An anti-corrosion treatment method for aluminum or aluminum alloy according to claim 1 is characterized in that the aluminum or aluminum alloy forming the oxide layer is in a vacuum, atmosphere or nitrogen atmosphere, and the aluminum or aluminum alloy is at 150 ° C. After the heat treatment at ~300 ° C, the above-described barrier anodizing treatment is performed.
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