TWI399628B - 用以調節流體流量之系統與電腦程式及用以結束分配程序之方法 - Google Patents
用以調節流體流量之系統與電腦程式及用以結束分配程序之方法 Download PDFInfo
- Publication number
- TWI399628B TWI399628B TW94104062A TW94104062A TWI399628B TW I399628 B TWI399628 B TW I399628B TW 94104062 A TW94104062 A TW 94104062A TW 94104062 A TW94104062 A TW 94104062A TW I399628 B TWI399628 B TW I399628B
- Authority
- TW
- Taiwan
- Prior art keywords
- fluid
- valve
- control signal
- rate
- control valve
- Prior art date
Links
- 239000012530 fluid Substances 0.000 title claims description 250
- 238000000034 method Methods 0.000 title claims description 69
- 238000004590 computer program Methods 0.000 title claims description 16
- 230000001105 regulatory effect Effects 0.000 title claims 3
- 230000008569 process Effects 0.000 title description 7
- 230000001133 acceleration Effects 0.000 claims description 39
- 230000008859 change Effects 0.000 claims description 34
- 230000015654 memory Effects 0.000 claims description 31
- 238000004891 communication Methods 0.000 claims description 9
- 230000004044 response Effects 0.000 claims 3
- 230000001419 dependent effect Effects 0.000 claims 1
- 238000003825 pressing Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 description 21
- 238000009826 distribution Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 230000008901 benefit Effects 0.000 description 6
- 230000001276 controlling effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 238000012545 processing Methods 0.000 description 5
- 230000014759 maintenance of location Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- -1 developer Substances 0.000 description 1
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 229920005548 perfluoropolymer Polymers 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
- G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0971—Speed responsive valve control
- Y10T137/0989—Acceleration responsive valve control
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Flow Control (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/779,009 US7107128B2 (en) | 2004-02-13 | 2004-02-13 | System for controlling fluid flow |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200540591A TW200540591A (en) | 2005-12-16 |
| TWI399628B true TWI399628B (zh) | 2013-06-21 |
Family
ID=34838286
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94104062A TWI399628B (zh) | 2004-02-13 | 2005-02-05 | 用以調節流體流量之系統與電腦程式及用以結束分配程序之方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US7107128B2 (enExample) |
| EP (1) | EP1725921A2 (enExample) |
| JP (2) | JP4729504B2 (enExample) |
| KR (1) | KR101162390B1 (enExample) |
| CN (1) | CN101160585A (enExample) |
| SG (1) | SG135178A1 (enExample) |
| TW (1) | TWI399628B (enExample) |
| WO (1) | WO2005079235A2 (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2837945B1 (fr) * | 2002-03-28 | 2005-04-08 | Celec Conception Electronique | Gamme de produits configurables a l'installation, outil de configuration et procede de configuration de tels produits |
| US7107128B2 (en) * | 2004-02-13 | 2006-09-12 | Entegris, Inc. | System for controlling fluid flow |
| CN101048645A (zh) * | 2004-08-13 | 2007-10-03 | 恩特格里公司 | 用于流量设备的校准的系统和方法 |
| US7172096B2 (en) * | 2004-11-15 | 2007-02-06 | Advanced Technology Materials, Inc. | Liquid dispensing system |
| CN101356488B (zh) | 2005-12-02 | 2012-05-16 | 恩特格里公司 | 与泵控制器对接的i/o系统、方法和设备 |
| US7517469B2 (en) * | 2006-04-28 | 2009-04-14 | Sokudo Co., Ltd. | Method and system to measure flow velocity and volume |
| US8265794B2 (en) * | 2007-10-01 | 2012-09-11 | Westlock Controls Corporation | Knowledge based valve control method |
| EP2210153B1 (en) * | 2007-11-13 | 2013-04-24 | Rockwell Automation Technologies, Inc. | Industrial controller using shared memory multicore architecture |
| DE102009032547A1 (de) * | 2009-07-10 | 2011-01-13 | Krones Ag | Verfahren zur automatisierten Steuerung eines Rohrleitungsnetzes |
| EP2583301B1 (en) * | 2010-06-18 | 2018-12-05 | Entegris Inc. | Endpoint determination for capillary-assisted flow control |
| DE102010039296B4 (de) * | 2010-08-13 | 2020-06-10 | Robert Bosch Gmbh | Vorrichtung und Verfahren zur Erzeugung eines Steuersignals |
| US9616540B2 (en) * | 2011-02-08 | 2017-04-11 | The University Of Utah Research Foundation | System and method for dispensing a minimum quantity of cutting fluid |
| US9506785B2 (en) | 2013-03-15 | 2016-11-29 | Rain Bird Corporation | Remote flow rate measuring |
| EP3191751B1 (en) | 2014-09-09 | 2020-11-04 | Proteus Industries Inc. | Systems and methods for coolant drawback |
| JP6415418B2 (ja) * | 2015-11-27 | 2018-10-31 | 株式会社アドヴィックス | 流体制御弁装置 |
| KR101817212B1 (ko) | 2016-04-29 | 2018-02-21 | 세메스 주식회사 | 처리액 분사 유닛 및 기판 처리 장치 |
| US10634538B2 (en) | 2016-07-13 | 2020-04-28 | Rain Bird Corporation | Flow sensor |
| US10719089B2 (en) * | 2017-05-18 | 2020-07-21 | Fisher Controls International Llc | Apparatus and methods to characterize fluid control valves |
| US10473494B2 (en) | 2017-10-24 | 2019-11-12 | Rain Bird Corporation | Flow sensor |
| EP3814284B1 (en) | 2018-08-29 | 2025-06-04 | MKS Instruments, Inc. | Ozonated water delivery system and method of use |
| US11662242B2 (en) | 2018-12-31 | 2023-05-30 | Rain Bird Corporation | Flow sensor gauge |
| US11415230B2 (en) * | 2020-03-31 | 2022-08-16 | Applied Material, Inc. | Slit valve pneumatic control |
| KR20220121306A (ko) * | 2021-02-24 | 2022-09-01 | 삼성디스플레이 주식회사 | 커버 윈도우, 커버 윈도우의 제조방법, 및 표시 장치 |
| US12443208B2 (en) | 2023-02-08 | 2025-10-14 | Rain Bird Corporation | Control zone devices, systems and methods |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5964192A (en) * | 1997-03-28 | 1999-10-12 | Fuji Jukogyo Kabushiki Kaisha | Electromagnetically operated valve control system and the method thereof |
| US6176438B1 (en) * | 1998-08-31 | 2001-01-23 | Smc Kabushiki Kaisha | Suck back valve having sensor for detecting diaphragm displacement amount |
| US6200100B1 (en) * | 1998-09-25 | 2001-03-13 | Smc Kabushiki Kaisha | Method and system for preventing incontinent liquid drip |
| US20010035512A1 (en) * | 2000-04-07 | 2001-11-01 | Messer Jeffrey M. | Environmentally friendly electro-pneumatic positioner |
| US6348098B1 (en) * | 1999-01-20 | 2002-02-19 | Mykrolis Corporation | Flow controller |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1133471A (ja) * | 1997-07-23 | 1999-02-09 | Tokyo Electron Ltd | 塗布装置 |
| AU2002254405A1 (en) * | 2001-03-29 | 2002-10-15 | Applied Precision, Llc | Precision controlled fast valve |
| TW483047B (en) * | 2001-04-20 | 2002-04-11 | Winbond Electronics Corp | Liquid spraying method capable of preventing residual liquid drops |
| US7025326B2 (en) * | 2002-07-11 | 2006-04-11 | Sturman Industries, Inc. | Hydraulic valve actuation methods and apparatus |
| US6973375B2 (en) * | 2004-02-12 | 2005-12-06 | Mykrolis Corporation | System and method for flow monitoring and control |
| US7107128B2 (en) * | 2004-02-13 | 2006-09-12 | Entegris, Inc. | System for controlling fluid flow |
-
2004
- 2004-02-13 US US10/779,009 patent/US7107128B2/en not_active Expired - Lifetime
-
2005
- 2005-02-05 TW TW94104062A patent/TWI399628B/zh not_active IP Right Cessation
- 2005-02-07 WO PCT/US2005/003709 patent/WO2005079235A2/en not_active Ceased
- 2005-02-07 JP JP2006553171A patent/JP4729504B2/ja not_active Expired - Lifetime
- 2005-02-07 EP EP20050712955 patent/EP1725921A2/en not_active Withdrawn
- 2005-02-07 CN CNA2005800046269A patent/CN101160585A/zh active Pending
- 2005-02-07 KR KR1020067015651A patent/KR101162390B1/ko not_active Expired - Lifetime
- 2005-02-07 SG SG200705755-7A patent/SG135178A1/en unknown
-
2006
- 2006-08-10 US US11/502,048 patent/US7317971B2/en not_active Expired - Lifetime
-
2007
- 2007-11-09 US US11/937,931 patent/US8082066B2/en not_active Expired - Lifetime
-
2011
- 2011-01-12 JP JP2011004417A patent/JP5314059B2/ja not_active Expired - Lifetime
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5964192A (en) * | 1997-03-28 | 1999-10-12 | Fuji Jukogyo Kabushiki Kaisha | Electromagnetically operated valve control system and the method thereof |
| US6176438B1 (en) * | 1998-08-31 | 2001-01-23 | Smc Kabushiki Kaisha | Suck back valve having sensor for detecting diaphragm displacement amount |
| US6200100B1 (en) * | 1998-09-25 | 2001-03-13 | Smc Kabushiki Kaisha | Method and system for preventing incontinent liquid drip |
| US6348098B1 (en) * | 1999-01-20 | 2002-02-19 | Mykrolis Corporation | Flow controller |
| US20010035512A1 (en) * | 2000-04-07 | 2001-11-01 | Messer Jeffrey M. | Environmentally friendly electro-pneumatic positioner |
Also Published As
| Publication number | Publication date |
|---|---|
| US7317971B2 (en) | 2008-01-08 |
| US8082066B2 (en) | 2011-12-20 |
| JP2011071564A (ja) | 2011-04-07 |
| WO2005079235A3 (en) | 2007-04-05 |
| CN101160585A (zh) | 2008-04-09 |
| KR20060127122A (ko) | 2006-12-11 |
| JP2007525837A (ja) | 2007-09-06 |
| SG135178A1 (en) | 2007-09-28 |
| EP1725921A2 (en) | 2006-11-29 |
| US20080071425A1 (en) | 2008-03-20 |
| US20060276935A1 (en) | 2006-12-07 |
| WO2005079235A2 (en) | 2005-09-01 |
| JP5314059B2 (ja) | 2013-10-16 |
| TW200540591A (en) | 2005-12-16 |
| US20050182525A1 (en) | 2005-08-18 |
| US7107128B2 (en) | 2006-09-12 |
| KR101162390B1 (ko) | 2012-07-04 |
| JP4729504B2 (ja) | 2011-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |