TWI397776B - Exposing apparatus - Google Patents

Description

Exposure device

The present invention relates to an exposure apparatus that exposes an image of an opening of a mask to which exposure light is applied to the exposure optical system by an exposure optical system, thereby exposing it to an object to be exposed. More specifically, on the one hand, the object to be exposed is moved at a constant speed, and the setting of the exposure position and the timing of exposure of the exposure light are controlled based on a reference position set in advance on the reference pattern formed on the object to be exposed. Thereby, the reticle is efficiently used to perform exposure in a wide range of exposure fields.

Conventionally, such an exposure apparatus maintains the photosensitive material of the substrate facing upward, and controls the movement of the substrate in the X, Y, Z-axis directions and the θ direction, and has a set distance in steps of at least one of the X and Y directions. a base of the reticle holding the reticle on the upper side of the substrate; a light source portion for illuminating the light from the smear on the substrate side; an automatic alignment mechanism for automatically aligning the position of the substrate and the reticle on the base; A gap control mechanism that controls a gap between the substrate and the mask. Thereby, the alignment mechanism and the gap control mechanism are used to align the position of the substrate and the mask, and the gap adjustment is completed, the first exposure is performed by irradiating the exposure light from the light source portion at a set time, and then the base is moved, for example, at a set pitch. Realign the position in the X direction. After the gap adjustment is performed, the second exposure is performed, and the operation is repeated to expose the entire pattern to the large substrate (see, for example, Japanese Laid-Open Patent Publication No. Hei 9-127702).

However, in such a conventional exposure apparatus, once the exposure to the set field is completed, the exposure operation is terminated, and the mask is moved relative to the substrate in steps, the positional alignment of the substrate and the mask is performed again, and the gap is adjusted to be exposed. Such a plurality of alignment positions and gap adjustments are required to take a long time, and the exposure takes a long time to complete.

In the above conventional exposure apparatus, the small-area mask is used to fully expose the setting pattern on the large substrate, which has the advantage of reducing the cost of the mask used, but if the mask area is smaller, the alignment position and the number of adjustment gaps are used. The more you have to make, the longer the adjustment time, and the longer the exposure time.

In addition, in order to shorten the above alignment position and adjust the gap time, it is necessary to use a slightly larger mask. In this case, the exposure light energy must be increased, the light source power is limited, and the exposure light irradiation time must be lengthened, and the exposure time cannot be shortened as a result. .

In order to solve the above problems, the present invention has an object of providing an exposure apparatus capable of efficiently performing exposure in a wide range of exposure fields by using a small photomask.

In order to achieve the above object, an exposure apparatus according to a first embodiment of the present invention includes an exposure optical system that irradiates an exposure target with an exposure light from a light source, and an alignment optical system that is disposed opposite to the exposure optical system. A transport mechanism that is transported at a constant speed. The exposure device exposes an image of the opening of the mask that is interposed on the optical path of the exposure optical system to the object to be exposed, and is provided with a photographing position in front of the exposure position of the exposure optical system in the moving direction of the transport mechanism. And capturing a photographing mechanism pre-formed on the reference pattern of the exposing body; and detecting a reference position preset to the reference pattern captured by the photographing mechanism, and controlling the exposure optics based on the reference position The irradiation timing of the exposure light is used to expose the image of the opening of the mask to the control unit of the set position of the object to be exposed.

According to this configuration, the object to be exposed is conveyed at a constant speed by the transport mechanism, and the reference pattern previously formed on the object to be exposed is picked up by the photographing means, and the reference position previously formed in the reference pattern is detected by the control means. The reference position is used as a reference to control the timing of the exposure of the exposure light from the exposure optical source, and the exposure optical system exposes the image of the opening of the mask that is interposed on the optical path to the set position of the object to be exposed. It is possible to use the reticle to be effective in exposure to a wide range of exposure fields. Moreover, since the position of the exposure optical system exposure position can be captured by the photographing mechanism in the direction in which the object is to be exposed, the object to be exposed is moved on the one hand, and the exposure position is set according to the reference position of the reference pattern captured by the photographing mechanism. The exposure is improved, thereby improving the exposure accuracy.

Further, the exposure optical system has a condenser lens for focusing an image of the opening of the mask on the object to be exposed. The image of the opening of the mask is focused on the object to be exposed by the condenser lens. Further, since the object to be exposed can be disposed away from the mask, contamination or damage to the mask can be reduced.

Further, in the exposure apparatus according to the second embodiment of the present invention, the exposure light from the light source is irradiated to the object to be exposed through the mask having the set opening, and the image of the opening of the mask is exposed to be exposed. Physically. The exposure apparatus includes a transport mechanism that transports the object to be exposed at a constant speed, and is disposed above the transport mechanism to collect the mask opening that is interposed on the optical path from the light source to the object to be exposed a focusing lens on the object to be exposed and an exposure optical system having a beam slit disposed on an optical path between the focusing lens and the reticle; the light beam slit can be received on the reflecting surface of the condensing lens side And a photographing mechanism configured to receive a reference pattern formed in advance on the object to be exposed through the image lens; and detecting a reference position preset by the photographing mechanism and set in the reference pattern, And controlling the exposure timing of the exposure light of the exposure optical system based on the reference position, and exposing the control mechanism of the opening position of the reticle to the position at which the exposure body is set.

According to this configuration, the object to be exposed is conveyed at a constant speed by the transport mechanism, and the reference pattern previously formed on the object to be exposed is taken by the image pickup mechanism through the image pickup lens of the exposure optical system, and is detected by the control unit in advance in the reference pattern. a reference position of the type, and controlling the timing of the exposure light of the light source provided by the exposure optical system based on the reference position, and focusing the image of the opening of the mask interposed on the optical path with the exposure lens by the image lens It is exposed by setting the position. The exposure accuracy is improved by making the exposure position of the exposure optical system coincide with the imaging position of the photographing mechanism.

Furthermore, the light source is a flash lamp that intermittently emits exposure light. The flash light intermittently emits the exposure light. Also, since the flash is used as a light source, it is easy to control the timing of exposure of the exposure light.

Further, in either of the transport mechanism or the exposure optical system, the deviation between the exposure target position and the actual exposure position of the mask opening set in the reference pattern is calculated based on the reference position, and the deviation is corrected. Alignment mechanism.

By using the alignment mechanism, the deviation between the predetermined exposure position of the mask opening set in the reference pattern and the actual exposure position is calculated based on the reference position, and the deviation is corrected, and the adjustment is performed between the exposure target and the next exposure position. Correction. Therefore, the correction time can be shortened, and high-precision exposure can be performed in any place in the field of exposure.

Further, the mask is formed on the opaque film formed on the transparent glass substrate, and corresponds to a width of the exposure field exposed by the exposure optical system, and an elongated opening portion orthogonal to the moving direction of the object to be exposed . Thereby, exposure is performed by a mask formed in one elongated opening in a direction orthogonal to the moving direction of the object to be exposed. At this time, the size of the mask can be reduced to save the cost of the mask, and the exposure optical system can be miniaturized to reduce the cost of the device.

Furthermore, the reticle is on the opaque material, corresponding to the width of the exposure field exposed by the exposure optical system, and an elongated opening formed orthogonal to the moving direction of the exposed object, and the opening is made The length of the part is adjustable. Therefore, the length of one elongated opening formed in the direction orthogonal to the moving direction of the exposed body should be adjusted as necessary. In this case, for different lengths of exposure patterns, the length of the opening can also be adjusted to cope with it.

Embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Fig. 1 is a conceptual view showing a first embodiment of an exposure apparatus of the present invention. The exposure apparatus 1 exposes an image of the opening of the mask attached to the exposure optical system to the object to be exposed by the exposure light of the exposure optical system, and includes an exposure optical system 2, an imaging mechanism 3, and conveyance. Mechanism 4, and control mechanism 5. Hereinafter, a color filter substrate of a liquid crystal display element will be described as an object to be exposed.

The exposure optical system 2 is configured to irradiate exposure light onto a color filter substrate 6 coated with a sensitizer to expose a set color filter pattern, and includes a light source 7, a reticle base 8, and a condensing lens. 9.

The light source 7 is, for example, a light bulb that emits ultraviolet light, and is a flash lamp that is controlled to be intermittently controlled by a control unit 5 to be described later. Further, the reticle base 8 is attached to the optical path between the light source 7 and the condensing lens 9 to be described later, by holding the reticle 10 for mounting. Further, the condensing lens 9 is used to condense the opening 10a of the reticle 10 on the color filter substrate 6, and is disposed opposite to the color filter substrate 6. Further, the photomask 10 is formed on an opaque film formed on a transparent glass substrate, and is formed to be positive in the moving direction (arrow A direction) of the color filter substrate 6 in accordance with the width of the exposure region exposed by the exposure optical system 2. In the first embodiment, the opening 10a is formed in a row in a row in the horizontal direction of the black matrix 11 as shown in FIG. 2, for example, as shown in FIG. The pixel 12 is formed in a slit shape. In addition to the flashlight, a light source 7 can also be used with a conventional ultraviolet lamp. At this time, intermittent irradiation of the exposure light, for example, the shutter can be set in front of the exposure light irradiation direction to control the opening and closing of the shutter.

Further, in the moving direction (arrow A direction) of the color filter substrate 6, the exposure position of the exposure optical system 2 is the imaging position, and the imaging mechanism 3 is provided. The photographing mechanism 3 is for picking up the pixels 12 of the black matrix 11 which are formed in advance on the color filter substrate 6 as a reference pattern, and the light receiving elements are arranged in a line, for example, a line CCD. As shown in FIG. 2, the photographing position of the photographing mechanism 3 and the exposure position of the exposure optical system 2 are separated by a set distance D, and the photographing mechanism 3 picks up the pixel 12 and then passes the set time pixel 12 The exposure position can be reached. The distance D is as small as possible. The movement error of the color filter substrate 6 can be reduced, and the exposure position can be correctly positioned for the pixel 12. As shown in the figure, the center of the photographing mechanism 3 and the center of the opening 10a of the mask 10 are aligned in the transport direction (arrow A direction) of the color filter substrate 6, and the opening of the mask 10 is opened. The center of 10a is arranged to coincide with the center of the optical axis of the concentrating lens 9. Further, an illumination mechanism (not shown) is provided in the vicinity of the photographing mechanism 3 to illuminate the photographing field of the photographing mechanism 3.

Further, a transport mechanism 4 is provided below the exposure optical system 2. The transport mechanism 4 can mount the color filter substrate 6 on the base and move in the XY-axis direction, and the control mechanism 5 controls the transport motor (not shown) to move the base 4a. Further, the X-axis direction coincides with the conveyance direction (arrow A direction) of the color filter substrate 6, and the Y-axis direction is a direction orthogonal thereto. Further, the transport mechanism 4 is provided with a position detecting sensor such as an encoder and a line sensor (not shown) and a speed sensor, and the output is fed back to the control unit 5 to perform position control and speed control. Furthermore, the transport mechanism 4 is provided with an alignment mechanism 29 for calculating the deviation between the predetermined exposure position on the black matrix 11 and the exposure position of the opening 10a of the reticle 10 based on the reference position, and moving the base 4a The position of the swivel angle and the Y-axis direction is corrected to correct the deviation. Further, the angle of the base 4a can be detected by an angle sensor.

Further, the control unit 5 is connected to the above-described light source 7, imaging unit 3, and transport mechanism 4. The control mechanism 5 is for controlling the entire device to perform an appropriate operation, and includes an image processing unit 13 for detecting a reference position previously set on the pixel 12 captured by the photographing unit 3; for storing the black matrix 11 The design data and the memory unit 14 corresponding to the data such as the observation table (LUT) of the reference position; using the distance D between the photographing position and the exposure position and the moving speed V of the color filter substrate 6 to calculate the pixel 12 The calculation unit 15 for the time t at which the photographing position is moved to the exposure position, and the positional deviation between the exposure predetermined position (hereinafter referred to as "exposed area") and the opening portion 10a of the mask 10, which is obtained from the reference position; The reference position is used as a reference to control the light controller 16 that exposes the light irradiation timing of the light source 7; the base for driving the transport mechanism 4 at a constant speed in the X-axis direction, and simultaneously drives the alignment mechanism provided in the transport mechanism 4 The mechanism controller 17; and a control unit 18 for integrally controlling the entire device.

3 and 4 are block diagrams showing a configuration example of the image processing unit 13. As shown in Fig. 3, the image processing unit 13 includes, for example, three parallel ring buffer memories 19A, 19B, and 19C, and three column buffers each connected in parallel to the ring buffer memories 19A, 19B, and 19C. The memory 20A, 20B, 20C; a comparison loop 21 connected to the column buffer memories 20A, 20B, 20C, compared with a predetermined threshold value, and binarized gray scale data and outputted; The output data of the nine column buffer memories 20A, 20B, and 20C and the image data LUT corresponding to the first reference position determined at the left end of the exposure area from the first memory unit 14 (hereinafter referred to as "LUT for the left end" In comparison, when the two data match, the left end determination circuit 22 outputs the left end determination result; and the output data for the nine column buffer memories 20A, 20B, and 20C and the memory unit 14 shown in FIG. The obtained decision is compared with the image data LUT (hereinafter referred to as "right end LUT") corresponding to the second reference position at the right end of the exposure field, and the right end determination circuit 23 of the right end determination result is output when the two data match.

Further, as shown in FIG. 4, the image processing unit 13 includes a counter circuit 24A for inputting the left end determination result and calculating the number of coincidences of the image data corresponding to the first reference position, and comparing the output of the counter circuit 24A with the first 1 shows the left-end pixel number obtained by the memory unit 14. When the two values match, the left-end designation signal is outputted to the comparison circuit 25A of the memory unit 14; the right-end determination result is input, and the second reference position is calculated. The image data matching count circuit 24B is configured to compare the output of the counting circuit 24B with the right-end pixel number obtained by the memory unit 14 shown in FIG. 1, and output the right end designating signal to the memory unit 14 when the two values match. a comparison loop 25B for calculating a left-end pixel count loop 26 of the left-end pixel n according to the output of the count loop 24A; and comparing the output of the left-end pixel count loop 26 with the memory portion 14 shown in FIG. The obtained exposure ends with the prime number N, and when the two values match, the exposure end pixel specified signal is output to the comparison loop 27 of the memory unit 14. Further, the counting circuits 24A and 24B, at the beginning of the reading operation of the photographing unit 3, are reformed according to the reading start signal. Further, the left end counting circuit 26 is reformed by the exposure end signal when the exposure to the predetermined area is terminated.

Next, the operation of the exposure apparatus having the above configuration will be described with reference to the flowchart of Fig. 5.

First, the power is supplied to the exposure device 1. The imaging unit 3 shown in Fig. 1 is activated, and the illumination unit and the control unit 5 are activated. Next, the color filter substrate 6 is mounted on the base 4a of the transport mechanism 4, and a switch (not shown) is operated. The transport mechanism 4 is transported in the direction of the arrow A at a constant speed under the control of the transport mechanism controller 17 of the control unit 5. Filter substrate 6. When the color filter substrate 6 reaches the photographing position of the photographing mechanism 3, the exposure operation is performed by the following procedure.

First, in step S1, an image of the pixel 12 of the black matrix 11 is acquired by the photographing unit 3. The image data thus obtained is sent to the three ring buffer memories 19A, 19B, and 19C of the image processing unit 13 shown in Fig. 3 for processing. Then, the latest three data are output from the ring buffer memories 19A, 19B, and 19C, respectively. At this time, for example, the previous second data is output from the ring buffer memory 19A, the first data is outputted from the ring buffer memory 19B, and the latest data is output from the ring buffer memory 19C. Further, each of the data is composed of three column buffer memories 20A, 20B, and 20C, and for example, an image of a 3 × 3 CCD pixel is placed on the same clock (time axis). As a result, for example, an image shown in Fig. 6(a) can be obtained. This image is numerically converted to a value of 3 x 3 as shown in Fig. 6(b). Since these numerical images are arranged on the same clock, the loop can be binarized by comparison with the critical value ratio. For example, if the critical value is 〝45〞, the image of Fig. 6(a) is binarized as shown in Fig. 6(c).

In step S2, the reference position of the left and right ends of the exposure area is detected. Specifically, the reference position is detected by the left end determination circuit 22, and the binarized data is compared with the data of the left end LUT obtained by the memory unit 14 shown in Fig. 1.

For example, when the first reference position at the left end of the exposure area is set to the upper left corner of the pixel 12 of the black matrix 11 shown in Fig. 7(a), the LUT at the left end is shown in Fig. 7(b). At this time, the LUT data at the left end is 〝 000011011〞. The binary data is compared with the left end LUT data 〝 000011011 ,. When the two data match, the image data acquired by the imaging unit 3 is determined to be the first reference position, and the left end determination circuit 22 outputs the left end. judgement result. Further, as shown in Fig. 10, when five pixels 12 are arranged side by side, the upper left corner of each pixel 12 corresponds to the first reference position.

Based on the above determination result, the number of coincidences is calculated by the counting circuit 24A of Fig. 4. Then, the counted number is compared with the left-end pixel number obtained by the memory unit 14 of Fig. 1 in the comparison circuit 25A, and when the two values match, the left end designation signal is outputted to the memory unit 14. At this time, as shown in FIG. 10, for example, when the first pixel 121 is determined to be the left-end pixel number, the upper left corner portion of the pixel 121 is set as the first reference position. The element address of the column CCD of the imaging unit 3 corresponding to the first reference position is stored, for example, by the memory unit 14.

On the other hand, the binarized data is compared with the right end LUT data obtained by the memory unit 14 of the first figure in the right end decision circuit 23. For example, when the second reference position at the right end of the exposure area is set to the upper right corner portion of the pixel 12 of the black matrix 11 shown in Fig. 8(a), the LUT at the right end is as shown in Fig. 8(b). At this time, the right end LUT data is 〝000110110〞. The binary data is compared with the right end LUT data 〝000110110〞, and when the two data match, it is determined that the image data acquired by the imaging unit 3 is the reference position of the right end of the object to be exposed, and the right end determination circuit 23 Output the result of the right end decision. As in the foregoing case, as shown in Fig. 10, for example, when five pixels 12 are juxtaposed, the upper right corner of each pixel 12 corresponds to the second reference position.

Based on the above determination result, the number of coincidences is calculated by the counting circuit 24B of Fig. 4. Then, the counted number is compared with the right-end pixel number obtained by the memory unit 14 of Fig. 1 in the comparison circuit 25B, and when the two values match, the right end designation signal is outputted to the memory unit 14. At this time, as shown in FIG. 10, for example, when the fifth pixel 125 is determined to be the right-end pixel number, the upper right corner portion of the pixel 121 is set to the second reference position. The component address of the column CCD of the imaging unit 3 corresponding to the second reference position is stored, for example, by the memory unit. Then, after detecting the left end and the right end reference position of the exposed area as described above, the process proceeds to step S3.

In step S3, as shown in Fig. 9, the inclination angle θ of the color filter substrate 6 in the conveyance direction is calculated based on the detection timings t1 and t2 of the first reference position and the second reference position. For example, if the conveyance speed is V, the amount of deviation between the first reference position and the second reference position in the conveyance direction is (t1 - t2)V. Further, as shown in FIG. 10, the interval between the first reference position and the second reference position can be based on the component address EL1 of the photographing mechanism 3 corresponding to the first reference position and the component address of the photographing mechanism 3 corresponding to the second reference position. EL5, and is obtained by K(EL5-EL1). Further, K is the photographing bit rate, and the tilt angle θ of the color filter substrate 6 can be calculated by the following equation: θ=arctan(t1-t2)V/{K(EL5-EL1)} After the inclination angle θ of the substrate 6 is controlled by the transport mechanism controller 17, the alignment mechanism 29 of the transport mechanism 4 is driven to rotate the base 4a by an angle θ. As shown in Fig. 10, each side of the exposed area of the black matrix 11 is parallel to each side of the opening 10a of the mask 10.

Next, in step S4, the calculation unit 15 calculates the intermediate position between the first reference position and the second reference position. Specifically, the intermediate position is determined to be (EL1+EL5)/based on the component address EL1 of the imaging unit 3 corresponding to the first position read by the storage unit 14 and the component address EL5 of the imaging unit 3 corresponding to the second position. 2.

Next, in step S5, it is determined whether or not the intermediate position obtained in S4 coincides with the photographing center (element address ELC) of the photographing unit 3. If it is determined to be 〝No〞, the process proceeds to step S6.

In step S6, the alignment mechanism 29 is controlled by the transport mechanism controller 17, and as shown in Fig. 10, the base 4aK{ELC-(EL1+EL5)/2} is moved in the direction of the arrow B of the Y-axis. As shown in Fig. 2, the center of the exposure area coincides with the photographing center of the photographing mechanism 3 (or the center position of the opening 10a of the mask 10), and the flow proceeds to step S7.

On the other hand, if it is determined in step S5 that 〝Yes 〞, the process proceeds to step S7.

In step S7, it is determined whether or not the area to be exposed of the black matrix 11 is set to the exposure position of the exposure optical system. This determination is based on the first reference position detection time t1 stored in the storage unit 14, the pixel width W and the conveyance speed V in the conveyance direction shown in FIG. 2, and the distance D between the shooting position and the exposure position. After the calculation unit 15 calculates the center position of the pixel column by the photographing unit 3, the color filter substrate 6 carries the time t required for the distance D, and manages the time t. Here, if it is determined that the elapsed time t, that is, the area to be exposed of the black matrix 11 has been set to the exposure position (decision 〝YES〞), the process proceeds to step S8.

In step S8, the light controller 16 is activated to cause the light source 7 to emit light for a predetermined time. At this time, since the color filter substrate 6 is moved at a constant speed, the exposure pattern may be blurred at the edge of the conveyance direction. Therefore, the conveying speed, the exposure time, and the power of the light source 7 must be set in advance so that the amount of blur is within the allowable value.

In step S9, the left-end pixel number n is counted by the left-end pixel count loop of Fig. 4. Then, the process proceeds to step 10, where the comparator 27 compares the number of left-end pixels n with the exposure-finished pixel number N stored in advance by the memory unit 14, and determines whether the two values match.

In step S10, if it is determined to be 〝No〞, the process returns to step S1, and the detection operation at the next reference position is performed. At this time, the counting circuits 24A and 24B of Fig. 4 are reformed in accordance with the reading start signal of the photographing unit 3.

On the other hand, if it is determined as YESYES in step S10, all the exposures in the field are set in the color filter substrate 6, and the left-end pixel count circuit 26 is reformed in accordance with the exposure end signal in Fig. 4. The transport mechanism 4 is then transported back to the base 4a at a high speed to the starting position.

Furthermore, if the exposable field of the exposure optical system 2 is narrower than the width of the color filter substrate 6, the step S10 is terminated, the distance set by the base 4a is moved in the Y direction in a stepwise manner, and the step S1 is performed again. ~S10, and exposure in the area adjacent to the already exposed. However, the exposure optical system 2 and the photographing mechanism 3 may be arranged in a plurality of rows in the Y-axis direction, and the full width of the color filter substrate 6 may be exposed once. Further, if the field of photography of the photographing unit 3 to be exposed is narrow, a plurality of photographing mechanisms 3 may be arranged in parallel along the Y-axis direction.

Further, for convenience of explanation, steps S1 to S10 are described as a series of operations, but the detection of the reference position is performed in parallel with each step, and the detected data is stored in the memory unit 14 at any time. Therefore, the adjustment of the tilt angle θ of the color filter substrate 6 in step S3 and the Y-axis adjustment of the color filter substrate 6 in step S6 are performed by reading the necessary data from the memory unit 14 and the color filter substrate 6 The movement time is moved from the previous exposure position to the next exposure position.

According to the exposure apparatus 1 of the present invention, the color filter substrate 6 is transported at a constant speed, and the light source 7 is controlled to be illuminated based on the reference position set on the pixel 12 of the black matrix 11 captured by the photographing mechanism 3. Timing, and using the mask 10 corresponding to the exposure field width exposed by the exposure optical system 2 to form an elongated opening 10a orthogonal to the moving direction of the color filter substrate 6, the image of the opening 10a is exposed to the filter The set position of the color filter substrate 6. In this way, the small exposure mask 10 can be used to efficiently expose a wide range of exposure fields.

Further, according to the reference position, the adjustment operation of the angle θ of the base 4a and the alignment of the Y-axis is performed during the time when the color filter substrate 6 is moved from the previous exposure position to the next exposure position, so that the alignment can be shortened. Time, and high-precision exposure can be applied to any location in the field of exposure.

Further, in the first embodiment described above, the alignment mechanism 29 is provided in the case where the transport mechanism 4 is provided. However, the present invention is not limited thereto, and the alignment mechanism 29 may be provided in the exposure optical system 2 and the photographing mechanism 3. Keep it inside the organization. In this case, as shown in Fig. 11, the alignment in the Y-axis direction can be performed by moving the mask base 8 or the condenser lens 9 of the mask 10. For example, when the moving reticle base 8 is adjusted, as shown in FIG. 11(a), the displacement reticle base 8 is in the direction of the arrow C, and the image collected on the color filter substrate 6 is moved in the direction of the arrow D. . The adjustment is made by shifting the mask base 8 in the opposite direction of the exposure pattern adjustment direction. Further, for example, when the concentrating lens 9 is moved and adjusted, as shown in FIG. 11(b), the concentrating lens 9 is moved in the same direction (arrow E direction) as the exposure pattern adjustment direction.

Fig. 12 is a view showing another example of the configuration of the reticle 10. The reticle 10 is made of a black alumina-treated metal material 28, and an elongated opening portion 10a' is formed along a moving direction orthogonal to the color filter substrate 6 in a width corresponding to the exposure field of the exposure optical system 2. The material of both ends of the opening 10a' perpendicular to the conveying direction (Y-axis direction) can be moved in the Y-axis direction, so that the alignment in the Y-axis direction can be moved by the set amount. The end material 28a is sufficient. Therefore, the alignment of the Y-axis direction can be completed by moving the both end portions 28a in the same direction by the same amount. If the amount of movement and the direction of movement of the both end portions 28a are appropriately set, the width of the exposure area can be arbitrarily set. This adjustment can be automatically controlled by the control mechanism 5.

Further, in the first embodiment, the case where the opening 10a or 10a' of the mask 10 is focused on the color filter substrate 6 by the condenser lens 9 is described, but the present invention is not limited thereto. It can be applied to a proximity exposure device that directly exposes the reticle 10 to the color filter substrate 6.

Figure 13 is a side elevational view showing the principal part of a second embodiment of the exposure apparatus of the present invention. In the second embodiment, the spectroscope 30 is disposed between the mask base 8 and the concentrating lens 9 to form the exposure optical system 2, and the imaging mechanism 3 is disposed so as to accept the image of the beam slit 30. The reflected light from the lens side reflecting surface 30a shares the image lens 9 and an image lens for focusing the image of the black matrix 11 formed on the color filter substrate 6 on the surface of the light receiving element of the photographing mechanism 3. Here, in Fig. 13, reference numeral 31 denotes an illumination light source, and reference numeral 32 denotes a half mirror surface, and the photographing position of the photographing mechanism 3 can be illuminated by the condenser lens 9. Further, by selecting the light wavelength of the light source 7, the exposure light source 7 can also be used as illumination for replacing the illumination light source 31 of the imaging unit 3.

In the second embodiment having such a configuration, the color filter substrate 6 is transported by the transport mechanism 4 at a constant speed in the direction of the arrow A, and the black matrix on the color filter substrate 6 is picked up by the photographing mechanism 3 while passing through the condenser lens 9. In the pixel 12 of Fig. 11, the control unit 5 detects the reference position previously set on the pixel 12 captured by the imaging unit 3, and adjusts the mask 10 and the color in accordance with the reference position in accordance with the reference position. The light source substrate 7 is aligned while the light source 7 of the exposure optical system 2 is illuminated, and the image of the opening 10a of the mask 10 is collected by the image lens 9 at the set position of the color filter substrate 6. exposure.

According to the second embodiment, since the condensing lens of the exposure optical system 2 and the condensing lens of the imaging unit 3 are shared, the exposure position of the exposure optical system and the imaging position of the imaging unit 3 are used, and therefore, the imaging mechanism 3 is used. The exposure predetermined position of the color filter substrate 6 is detected by photography, Exposure is immediately possible, and the exposure accuracy is improved as compared with the first embodiment.

Further, in the first and second embodiments, the alignment mechanism is provided. However, if only the base 4a of the color filter substrate 6 can be placed, the predetermined exposure position and the actual exposure position can be restrained. When the amount of deviation is within the allowable range, it is not necessary to use an alignment mechanism.

In the first and second embodiments, the color filter substrate 6 is used as the object to be exposed. However, the present invention is not limited thereto, and is also applicable to substrates arranged in a matrix of a patterned shape. .

1. . . Exposure device

2. . . Exposure optics

3. . . Photography agency

4. . . Transport mechanism

5. . . Control mechanism

6. . . Color filter substrate

7. . . light source

8. . . Photomask abutment

9. . . Focus lens

10. . . Mask

10a. . . Opening

11. . . Black matrix

12. . . Pixel

29. . . Alignment mechanism

4a. . . Abutment

13. . . Image processing department

14. . . Memory department

15. . . Calculation department

17. . . Transport mechanism controller

16. . . Lighting controller

18. . . Control department

19A, 19B, 19C. . . Ring buffer memory

20A, 20B, 20C. . . Column buffer memory

twenty two. . . Left end decision loop

twenty three. . . Right end decision loop

24A, 24B‧‧‧ Counting loop

25A, 25B‧‧‧ comparison loop

27‧‧‧Comparative circuit

26‧‧‧ Left-end pixel counting loop

28a‧‧‧End material

29‧‧‧Alignment mechanism

30‧‧‧beam splitter

31‧‧‧Light source

32‧‧‧Half mirror

1 is a conceptual view of a first embodiment of an exposure apparatus according to the present invention; FIG. 2 is an explanatory view showing a relationship between a photographing mechanism, a mask opening, and a black matrix and an exposed area; and FIG. 3 is a view showing an internal configuration of the image processing unit. Block diagram of the first half of the processing system; Fig. 4 is a block diagram showing the latter half of the processing system in the internal configuration of the image processing unit; Fig. 5 is a flow chart for explaining the operation of the exposure apparatus of the present invention; and Fig. 6 is a circular buffer memory. FIG. 7 is an explanatory diagram showing a first reference position image and a LUT set in advance in a black matrix pixel, and FIG. 8 is a second reference position set in advance in a black matrix pixel. FIG. 9 is an explanatory diagram of a method for adjusting a tilt angle of a color filter substrate; FIG. 10 is an explanatory diagram of a method for adjusting alignment of a color filter substrate along a Y-axis direction; FIG. 12 is a view showing another example of the configuration of the photomask substrate in the Y-axis direction, wherein FIG. 12 is a plan view, (b) is a plan view, and (b) is a cross-sectional view; Indicates that the exposure apparatus of the present invention is the second The main part of the facilities form a side view.

1. . . Exposure device

2. . . Exposure optics

3. . . Photography agency

4. . . Transport mechanism

5. . . Control mechanism

6. . . Color filter substrate

7. . . light source

8. . . Photomask abutment

9. . . Focus lens

10. . . Mask

10a. . . Opening

4a. . . Abutment

13. . . Image processing department

14. . . Memory department

15. . . Calculation department

17. . . Transport mechanism controller

16. . . Lighting controller

18. . . Control department

29. . . Alignment mechanism

Claims (7)

An exposure apparatus having an exposure optical system that irradiates an exposure target with an exposure light from a light source; and a transport mechanism that is disposed opposite to the exposure optical system and that carries the exposed object and transports at a constant speed, and the exposure apparatus can be exposed The exposure cover is mounted on the exposure target on the exposure optical path, and the exposure device includes an opening of the mask, and is formed in an elongated shape to convey the exposed object to the transport mechanism The moving direction is a direction orthogonal to each other; a plurality of light receiving elements arranged in a line in the longitudinal direction of the opening of the mask; and a front position of the exposed position of the exposure optical system in the moving direction of the exposed object is a photographing position, and a photographing mechanism that is formed in a reference pattern formed in advance on the exposure body; and a detection target position preset to the pixel in accordance with a processing state of the image captured by the photographing unit, and based on the reference position Controlling an irradiation timing of the exposure light of the exposure optical system, thereby exposing the image of the opening of the mask to a control mechanism of the position at which the exposure body is set, and the majority The length of the pitch-based light receiving element is arranged, compared with the pixels of the moving direction of the exposure to be orthogonal direction characterized by its small. The exposure apparatus of claim 1, wherein the exposure optical system has a condensing lens for collecting an image of the reticle opening on the object to be exposed. An exposure device having a photomask that can pass through a set opening Exposing the exposure light from the light source to the object to be exposed, and exposing the image of the opening of the mask to the object to be exposed, the exposure device comprising: a transport mechanism for transporting the object to be exposed at a constant speed; a condenser lens that is disposed on the light-receiving surface of the light-receiving body from the light source to the exposed object, and is disposed in an inclined manner on the image lens An exposure optical system having a spectroscope on an optical path between the reticle; the reticle opening portion is formed in an elongated shape and formed in a direction orthogonal to a moving direction of the object to be transported by the transport mechanism; the reticle a plurality of light-receiving elements arranged in a line in the longitudinal direction of the opening; and are disposed so as to receive reflected light from the focusing surface of the focusing lens, and are received by the focusing lens to be formed in advance on the object to be exposed a reference pattern type photographing unit having a matrix of pixels; and a reference position preset for the pixel in accordance with a processing state of the image taken by the photographing unit, and based on the reference position Controlling an exposure timing of the exposure light of the exposure optical system, and exposing a control mechanism of the opening portion of the reticle to the position at which the exposure body is set according to a position coincident with a photographing position of the photographing mechanism, and arranging the plurality of light receiving elements The pitch system is characterized by a smaller length in a direction orthogonal to the moving direction of the object to be exposed. For example, in the exposure apparatus of claim 1 or 3, The light source is a flash lamp that intermittently emits exposure light. The exposure apparatus of claim 1 or 3, wherein any one of the transport mechanism or the exposure optical system is provided with an exposure exposure position set to the reference pattern and the mask opening based on the reference position The alignment mechanism of the deviation is corrected by the deviation of the exposure position of the portion. The exposure apparatus of claim 1 or 3, wherein the reticle is on an opaque film formed on a transparent glass substrate, corresponding to a width of an exposure field exposed by the exposure optical system, orthogonal to An elongated opening formed by the direction in which the exposed object is moved. The exposure apparatus of claim 1 or 3, wherein the reticle is on an opaque material, corresponding to a width of an exposure field exposed by the exposure optical system, orthogonal to a moving direction of the exposed object An elongated opening portion is formed, and the length of the opening portion is adjustable.