JP2008076709A - Exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To shorten the time required for an exposure stage by controlling exposure position correction and timing of irradiation with exposure light without forming a two-dimensional image based upon a linear image. <P>SOLUTION: An exposure device includes a first imaging means 4 having a plurality of light receiving elements arrayed almost orthogonally to a conveyance direction, a second imaging means 5 having a plurality of light receiving elements arrayed almost in parallel to the conveyance direction, an alignment means 6 of moving a photomask 12 almost orthogonally to the conveying direction to correct a position of exposure by the photomask 12, and a control means 8 of controlling driving of the alignment means 6 based upon a first reference position for exposure position correction of a color filter substrate 9 when the first imaging means 4 detects the first reference position, and controlling the timing of irradiation with the exposure light based upon a second reference position for irradiation timing extraction of the exposure light of the color filter substrate 9 when the second imaging means detects the second reference position. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that intermittently irradiates an exposure object conveyed at a constant speed through a photomask, and exposes a mask pattern of the photomask at a predetermined position. This relates to an exposure apparatus that can shorten the time.

  A conventional exposure apparatus includes an exposure optical system that irradiates an exposure object with exposure light from a light source, and a conveying unit that is disposed to face the exposure optical system and carries the exposure object at a constant speed. And exposing an image of an opening of a mask interposed on the optical path of the exposure optical system on the object to be exposed, on the near side of the exposure position by the exposure optical system in the moving direction of the transport means Is an imaging position, imaging means for imaging a reference pattern previously formed on the object to be exposed, and a reference position preset in the reference pattern imaged by the imaging means is detected, and exposure is performed based on the reference position. And control means for controlling the irradiation timing of the exposure light of the optical system and exposing the image of the opening of the mask at a predetermined position of the object to be exposed (for example, refer to Patent Document 1).

Here, the reference position set in the reference pattern is the first reference position for correcting the exposure position for aligning the opening of the mask with the reference pattern of the object to be exposed and the irradiation timing of the exposure light. And a second reference position for extracting. In this case, the first reference position is set in parallel with the transport direction of the object to be exposed, and the second reference position is set in a direction orthogonal to the transport direction of the object to be exposed.
JP 2006-17895 A

  However, since such a conventional exposure apparatus is provided with only one imaging means composed of a line CCD having a plurality of light receiving elements arranged in a direction orthogonal to the conveyance direction of the object to be exposed, the imaging device In order to detect the first and second reference positions set in the two orthogonal directions by the means, it is necessary to create a two-dimensional image based on the one-dimensional image acquired by the imaging means. For this purpose, a plurality of ring buffer memories, a plurality of line buffer memories, and the like are required, and there is a possibility that the circuit scale of the control means becomes enormous and the apparatus becomes expensive. Further, since the two-dimensional image is created based on the one-dimensional image, the time required for the image processing becomes long, and the exposure process may take a long time.

  Therefore, the present invention addresses such problems and controls the exposure position correction and the exposure light irradiation timing without creating a two-dimensional image based on the one-dimensional image, thereby exposing the exposure process. An object of the present invention is to provide an exposure apparatus that can shorten the time required for the above-described process.

  In order to achieve the above object, an exposure apparatus according to the present invention intermittently irradiates exposure light through a photomask onto an object to be exposed which is conveyed at a constant speed, and applies the mask pattern of the photomask to a predetermined position. An exposure apparatus that performs exposure on the photomask, and is arranged so as to image an exposure position by the photomask, or a position on the front side in the transport direction of the object to be exposed with respect to the exposure position, and a direction substantially orthogonal to the transport direction A first imaging means having a plurality of light receiving elements arranged in a row, and an exposure position by the photomask, or a position on the nearer side in the transport direction of the object to be exposed than the exposure position. A second imaging means having a plurality of light receiving elements arranged substantially in parallel with the transport direction, and the object to be exposed and the photomask are relatively moved in a direction substantially perpendicular to the transport direction. An alignment unit that corrects an exposure position by a screen, and a first reference position for exposure position correction that is provided in advance on the object to be exposed by the first imaging unit, and the alignment unit based on the detected first reference position When the second reference position for extracting the exposure light irradiation timing previously provided on the object to be exposed is detected by the second imaging means, the exposure light irradiation is performed based on the second reference position. And a control means for controlling the timing.

  With such a configuration, a plurality of photomasks are arranged so as to capture an exposure position by a photomask or a position on the front side in the transport direction of the object to be exposed and arranged in a direction substantially orthogonal to the transport direction. A first reference position for exposure position correction provided in advance on the object to be exposed is detected by a first imaging means having a light receiving element, and when the first reference position is detected, control is performed based on the first reference position. The means controls the driving of the alignment means, and the alignment means relatively moves the object to be exposed and the photomask in a direction substantially perpendicular to the conveying direction to correct the exposure position by the photomask. In addition, a first light-receiving element is provided so as to image an exposure position by a photomask or a position in front of the exposure direction in the transport direction with respect to the exposure position, and has a plurality of light receiving elements arranged substantially parallel to the transport direction. The second reference position for extracting the exposure timing of the exposure light provided in advance on the object to be exposed is detected by the image pickup means 2, and when the second reference position is detected, the control means performs exposure based on the second reference position. The exposure timing of light is controlled, and exposure light is intermittently irradiated to the object to be exposed conveyed at a constant speed through the photomask, so that the mask pattern of the photomask is exposed to a predetermined position.

  Further, the photomask is formed by forming a plurality of mask patterns at a predetermined interval in a direction substantially perpendicular to the conveying direction of the object to be exposed. As a result, a plurality of mask patterns formed at predetermined intervals in a direction substantially orthogonal to the conveyance direction of the object to be exposed are exposed with the photomask.

  Further, the photomask forms a mask pattern row by arranging a plurality of mask patterns at a predetermined interval in a direction substantially orthogonal to the transport direction of the object to be exposed, and the mask pattern row in the transport direction of the object to be exposed. A plurality of rows are formed at predetermined intervals. Thus, a photomask in which a plurality of mask patterns formed by arranging a plurality of mask patterns at a predetermined interval in a direction substantially perpendicular to the conveyance direction of the object to be exposed is formed in a plurality of rows at a predetermined interval in the conveyance direction of the object to be exposed. The mask pattern is subjected to multiple exposure.

  Moreover, the said to-be-exposed body consists of a transparent substrate. As a result, the object to be exposed made of a transparent substrate is conveyed at a constant speed, the exposure light is intermittently irradiated to the object to be exposed, and the mask pattern of the photomask is exposed to a predetermined position.

  Further, the first imaging means is arranged so as to image the first reference position formed on the surface of the object to be exposed made of the transparent substrate from the back side of the object to be exposed. . Thereby, the first reference position formed on the surface of the object to be exposed is imaged by the first imaging unit from the back side of the object to be exposed made of a transparent substrate.

  The second imaging means is arranged so as to image the second reference position formed on the surface of the object to be exposed made of the transparent substrate from the back side of the object to be exposed. . Thus, the second reference position formed on the surface of the object to be exposed is imaged by the second imaging unit from the back side of the object to be exposed made of a transparent substrate.

  According to the exposure apparatus of the first aspect, the first reference position for correcting the exposure position is detected by the first imaging means, and the second reference position for extracting the exposure timing of the exposure light is detected by the second imaging means. In order to detect these two reference positions, exposure position correction control and exposure light can be performed without creating a two-dimensional image based on the one-dimensional image acquired as in the prior art. By controlling the timing of irradiation, the time of the exposure process can be shortened. In particular, since the two reference positions are detected by the individual imaging means, image processing can be performed at high speed. Accordingly, it is possible to shorten the exposure process time by increasing the conveyance speed of the object to be exposed.

  According to the second aspect of the present invention, if the object to be exposed is, for example, a color filter substrate, only the pixel that is the exposure target of the color filter substrate is exposed, and the portion between adjacent pixels is not exposed. Can be. Therefore, the second and subsequent color resist coating layers can be relatively flattened, and the exposure accuracy can be further improved.

  Furthermore, according to the third aspect of the present invention, multiple exposure can be performed at a predetermined exposure position with a plurality of mask patterns arranged in the carrying direction. Therefore, even if the conveyance speed of the object to be exposed is increased, the exposure can be reliably performed, and the exposure processing time can be shortened.

  According to the inventions according to claims 4 to 6, the reference position formed on the surface of the object to be exposed made of a transparent substrate can be directly imaged from the back surface side, and the detection of the reference position becomes easy. Therefore, alignment control based on the first reference position and exposure light irradiation timing control based on the second reference position can be performed more accurately, and exposure accuracy can be further improved. In this case, if the first and second imaging means capture the same position as the exposure position, the operations from the detection of the reference position to the exposure can be performed in almost real time, and the exposure accuracy is further increased. Can be improved.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a conceptual view showing an embodiment of an exposure apparatus according to the present invention, and FIG. 2 is a cross-sectional view taken along the line OO of FIG. The exposure apparatus is configured to intermittently irradiate an object to be exposed, which is conveyed at a constant speed, with exposure light via a photomask, and to expose a mask pattern of the photomask at a predetermined position. The mask stage 2, the light source 3, the first imaging unit 4, the second imaging unit 5, the alignment unit 6, the illumination unit 7, and the control unit 8 are included. Hereinafter, a case where the object to be exposed is a color filter substrate 9 made of, for example, a transparent glass substrate will be described.

  The transport means 1 is for placing a color filter substrate 9 coated with a color resist and transporting it at a constant speed in the transport direction indicated by an arrow A in FIG. 1. For example, a plurality of air stages 10, A plurality of transport rollers 11 are provided. The air stage 10 is provided with a number of injection ports for injecting compressed air and a number of suction ports for sucking air on the upper surface. The color filter substrate 9 can be floated by a predetermined amount by balancing the suction and the suction. A plurality of transport rollers 11 are provided along edges parallel to the transport direction of the plurality of air stages 10. The conveyance roller 11 holds the edge portion of the color filter substrate 9 and conveys it at a predetermined speed in the direction of arrow A shown in FIG. 1, and is always urged upward, and is loaded by the load of the color filter substrate 9. It sinks downward by a predetermined amount. Each conveyance roller 11 is driven in synchronization by a conveyance drive motor (not shown).

  A mask stage 2 is disposed above the conveying means 1. The mask stage 2 holds the photomask 12 in close proximity to the surface of the color filter substrate 9 transported by the transport means 1 and holds the photomask 12 in parallel with the surface. Together with the means 4 and 5, it can move in the directions of arrows B and C shown in FIG.

  As shown in FIG. 3, the photomask 12 is provided with a plurality of mask patterns 13 at a predetermined interval in a direction substantially orthogonal to the conveying direction indicated by the arrow A. As shown in FIG. An opaque film 15 made of chromium or the like is formed on the substrate 14, and openings are formed in the opaque film 15 to form the plurality of mask patterns 13. Then, as shown in the figure, the mask stage 2 is held with the surface on which the opaque film 15 is formed facing down. In FIG. 3, for example, the left side edge of the mask pattern 13 located on the leftmost side is set in advance as the alignment reference position M1 of the photomask 12.

  A light source 3 is provided above the mask stage 2. The light source 3 emits ultraviolet light serving as exposure light, and includes, for example, a flash lamp 16 capable of intermittently emitting the exposure light and an elliptical mirror 17. The flash lamp 16 has, for example, an elongated arc tube in a direction (arrow B and C directions shown in FIG. 2) substantially orthogonal to the transport direction as shown in FIG. Therefore, the exposure light can be irradiated efficiently. Note that the arc tube is not limited to an elongated one as described above. The elliptical mirror 17 encloses the flash lamp 16 in a state of being arranged at the first focal point f1 of the elliptical mirror 17, and condenses the exposure light emitted from the flash lamp 16 at the second focal point f2. It has become. A condensing lens 18 is provided in front of the light source 3 in the radiation direction of the exposure light so that its front focal point substantially coincides with the second focal point f2 of the elliptical mirror 17, and the radiated exposure light is guided along the optical axis. It is possible to irradiate the photomask 12 by converting it into exposure light having a light bundle substantially parallel to the light beam.

  Below the mask stage 2, between the adjacent air stages 10 of the transport unit 1, a first imaging unit 4 is provided so as to image an exposure position by the photomask 12. The first image pickup means 4 picks up an image of a first reference position for exposure position correction (see S1 shown in FIG. 5) provided in advance on the color filter substrate 9 from the back side of the color filter substrate 9. It functions for correcting the exposure position. In FIG. 3, it has a plurality of light receiving elements 19 arranged in a direction substantially orthogonal to the conveying direction indicated by arrow A, one of which is a reference position for calculating the exposure position correction amount. Is set as the first reference light receiving element 19s and is aligned with the alignment reference position M1 of the photomask 12.

  On the side of the first image pickup means 4, the second image pickup means 5 is provided side by side so as to image the exposure position by the photomask 12 from the center of the transport means 1. The second imaging means 5 uses a second reference position (see S2 shown in FIG. 5A) for extracting exposure light irradiation timing provided in advance on the color filter substrate 9 as the back surface of the color filter substrate 9. The image is taken from the side, and functions to control the irradiation timing of the exposure light. In FIG. 3, a plurality of light receiving elements 20 arranged substantially in parallel with the transport direction indicated by arrow A are provided, one of which is a second reference light receiving for extracting the exposure light irradiation timing. It is set as the element 20 s and matches the edge 13 a on the leading side in the transport direction of the mask pattern 13 of the photomask 12.

  An alignment means 6 is provided so that the mask stage 2, the first imaging means 4 and the second imaging means 5 can be moved. As shown in FIG. 3, the alignment means 6 moves the first and second imaging means 4 and 5 and the photomask 12 in the directions of arrows B and C to correct the exposure position by the photomask 12. The alignment reference position M1 of the photomask 12 is made to coincide with the first reference position S1 of the color filter substrate 9 (see FIG. 5B). Further, the first and second imaging means 4 and 5 and the mask stage 2 can be integrally rotated by an angle θ about the center of the surface of the photomask 12 as an axis.

  An illumination unit 7 is provided above the transport unit 1. The illumination means 7 irradiates the color filter substrate 9 with visible illumination light, and the first and second image pickup means 5 set the first and second reference positions S1 and S2 of the color filter substrate 9. It makes it possible to take an image. The illumination light emitted from the illuminating means 7 is reflected toward the first and second imaging means 4 and 5 by the half mirror 21 which is disposed inclined on the optical path of the exposure light. ing.

  A control means 8 is connected to the light source 3, the first and second imaging means 4, 5 and the alignment means 6. When the first image pickup means 4 detects a first reference position S1 for correcting the exposure position provided in advance on the color filter substrate 9, the control means 8 controls the driving of the alignment means 6 based on the detected first reference position S1. When the second imaging unit 5 detects the second reference position S2 for extracting the exposure light irradiation timing provided in advance on the color filter substrate 9, the exposure light irradiation timing is controlled based on the second reference position S2. As shown in FIG. 4, a first image processing unit 22, a second image processing unit 23, a light source controller 24, a memory 25, a calculation unit 26, an alignment means controller 27, and a control unit 28 are provided. Yes.

  The first image processing unit 22 detects the first reference position S1 of the color filter substrate 9 based on the image acquired by the first imaging unit 4. The first reference position S1 is detected from the luminance information of the light receiving element 19, and the position information is output.

  The second image processing unit 23 detects the second reference position S2 of the color filter substrate 9 based on the image acquired by the second imaging unit 5, and the second imaging unit 5 The second reference position S2 is detected based on the on / off output from the second reference light receiving element 20s. When the second reference position S2 is detected, trigger information that triggers the start of exposure light exposure is output.

  Further, the light source controller 24 turns on the light source 3 for a predetermined time based on the trigger information output from the first image processing unit 22, and a light source drive (not shown) provided with a light source lighting command in the light source 3. Output to the section.

  The memory 25 stores position information of the first reference light receiving element 19s set in the first image pickup unit 4, a calculation result, and the like, and is a rewritable semiconductor memory, for example.

  In addition, the calculation unit 26 includes the position information of the first reference position S1 input from the first image processing unit 22 and the first reference light receiving element of the first imaging unit 4 read from the memory 25. The exposure position correction amount is calculated based on the position information of 19s.

Further, the alignment means controller 27 controls the movement of the alignment means 6 in the directions of arrows B and C shown in FIG. 2 based on the correction amount calculated by the calculation unit 26. It is also possible to control the rotation of the alignment means 6 by a predetermined angle θ so as to follow the yawing of the color filter substrate 9 being conveyed.
The control unit 28 controls the entire control means 8 so that the components of the control means 8 are appropriately driven.

Next, the operation of the exposure apparatus configured as described above will be described.
First, when the color filter substrate 9 is placed on the conveying means 1 shown in FIG. 1, the color filter substrate 9 floats on the stage by a predetermined amount due to the balance between air injection and suction of the air stage 10. Retained. In this state, the sheet is conveyed at a constant speed in the direction indicated by the arrow A by the conveyance roller 11.

  When the color filter substrate 9 conveyed by the conveying means 1 reaches the lower side of the photomask 12, it is preset on the color filter substrate 9 by the first imaging means 4 as shown in FIG. The left edge of the leftmost pixel 29 that is the first reference position S1 is imaged. This image is subjected to image processing by the first image processing unit 22 shown in FIG. 4, and the first reference position S1 is detected from the luminance information of the image. Then, the position information of the first reference position S1 is output from the first image processing unit 22.

  In this case, the position information of the first reference position S1 is compared with the position information of the first reference light receiving element 19s of the first imaging means 4 read from the memory 25, and the deviation amount is calculated by the calculation unit 26. Is calculated. The alignment unit controller 27 drives the alignment unit 6 so that the calculated deviation amount becomes a predetermined value (zero in this embodiment), and the first and second imaging units 4 and 5 and the photomask. 21 is moved in the directions of arrows B and C shown in FIG. In this way, the exposure position correction is performed, and the first reference light receiving element 19s of the first imaging means 4 is aligned with the first reference position S1 of the color filter substrate 9 as shown in FIG. Then, the alignment reference position M1 of the photomask 21 is aligned with the first reference position S1 of the color filter substrate 9 as shown in FIG. In the first image processing unit 22, when the first reference position S1 is not detected in the image acquired by the first imaging unit 4, such as a portion between adjacent pixels 29, the alignment unit controller 27 A maintenance signal is output, and the alignment means 6 maintains the previous alignment state.

  Next, as shown in FIG. 5 (a), the second imaging means 5 causes the edge on the leading side in the transport direction of the pixel 29, which is the second reference position S2 set in advance, on the color filter substrate 9. Imaged. This video is subjected to image processing by the second image processing unit 23 shown in FIG. 4, and the second reference light receiving element 20 s preset in the second imaging means 5 changes from, for example, off to on, for example. When the second reference position S2 is detected, trigger information for turning on the light source 3 is output from the second image processing unit 23. At this time, the mask pattern 13 of the photomask 12 is accurately positioned on the pixel 29 to be exposed on the color filter substrate 9 as shown in FIG.

  When trigger information is output from the second image processing unit 23, the light source controller 24 shown in FIG. 4 is driven by using the trigger information as a trigger, and the light source 3 is turned on for a predetermined time. As a result, the pixel 29 to be exposed on the color filter substrate 9 is exposed as shown by hatching in FIG.

  Thereafter, by repeatedly executing the above-described operation, only the pixel 29 to be exposed on the color filter substrate 9 conveyed in the direction of arrow A is exposed as shown by hatching in FIG. Can do.

  FIG. 6 is an explanatory view showing a modification of the photomask 12. In the photomask 12, a plurality of mask patterns 13 are formed at predetermined intervals in a direction substantially perpendicular to the transport direction of the color filter substrate 9, and the plurality of mask patterns 13 are predetermined in the transport direction of the color filter substrate 9. A plurality of rows are formed at intervals (in FIG. 6, two rows are shown as an example). Thereby, the multiple exposure can be performed on the pixel 29 to be exposed by the plurality of mask patterns 13 arranged in the transport direction indicated by the arrow A. Therefore, even if the conveyance speed is increased, exposure can be performed reliably, and the exposure processing time can be shortened.

  FIG. 7 is a block diagram showing another configuration example of the control means. The control unit 8 inputs the conveyance speed information of the color filter substrate 9 from, for example, an encoder of the conveyance unit 1, and the calculation unit 26 designs the arrangement information in the conveyance direction of the pixel 29 read from the speed information and the memory 25. The output period of the trigger information is calculated from the value, and the time when the next trigger information is output from the second image processing unit 23 is estimated by the control unit 28 based on the output period of the trigger information. Yes. Only the trigger information output at the estimated time is determined as true trigger information, and the true trigger information is output to the light source controller 24. As a result, before the estimated time, the second image pickup unit 5 picks up a foreign object, a flaw or the like, which is erroneously detected as the second reference position S2, and trigger information is output from the second image processing unit 23. Even in this case, the trigger information is determined not to be true trigger information but to false trigger information, and this false trigger information is not output to the light source controller 24. Accordingly, it is possible to prevent malfunction of the exposure light irradiation timing.

  In the above-described embodiment, the case where the transport unit 1 includes the air stage 10 and the transport roller 11 has been described. However, the present invention is not limited to this, and the transport unit 1 moves the color filter substrate 9 at a constant speed. As long as it can be conveyed in the direction of arrow A, any configuration may be used.

  Moreover, in the said embodiment, although the 1st and 2nd imaging means 4 and 5 demonstrated the case where it arrange | positioned so that the exposure position by the photomask 12 might be imaged, this invention is not limited to this, You may arrange | position so that the position of the conveyance direction near side of the color filter board | substrate 9 may be imaged with respect to the exposure position by the photomask 12. FIG. In this case, the exposure light is irradiated after a predetermined time has elapsed after the second imaging means 5 detects the second reference position S2.

  Furthermore, in the said embodiment, when the 1st and 2nd imaging means 4 and 5 are arrange | positioned so that 1st and 2nd reference position S1, S2 may be imaged from the back surface side of the color filter board | substrate 9. However, the present invention is not limited to this, and may be arranged so as to pick up an image from the front side of the color filter substrate 9, or one image pickup means is arranged on the back side of the color filter substrate 9. The other imaging means may be arranged on the surface side.

  Furthermore, in the above-described embodiment, the case where the light source 3 is intermittently turned on has been described. However, the present invention is not limited to this. You may enable it to irradiate.

  In the above embodiment, the case where the mask stage 2 is arranged close to the transport unit 1 and the photomask 12 and the color filter substrate 9 are brought close to each other is described. However, the present invention is not limited to this, A projection lens may be provided between the mask stage 2 and the conveying means 1 so that the image of the mask pattern 13 of the photomask 12 is formed on the color filter substrate 9.

  In the above description, the case where the object to be exposed is the color filter substrate 9 has been described. However, the present invention is not limited to this, and the object to be exposed may be a semiconductor substrate or a printed circuit board. .

It is a conceptual diagram which shows embodiment of the exposure apparatus by this invention. It is the OO sectional view taken on the line of FIG. It is explanatory drawing shown about arrangement | positioning with the photomask used for the said exposure apparatus, and a 1st and 2nd imaging means. It is a block diagram shown about the control means of the said exposure apparatus. It is explanatory drawing which shows operation | movement of the said exposure apparatus. It is a top view which shows the modification of the photomask used for the said exposure apparatus. It is a block diagram which shows the other structural example of the control means of the said exposure apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 ... Conveyance means 2 ... Mask stage 3 ... Light source 4 ... 1st imaging means 5 ... 2nd imaging means 6 ... Alignment means 8 ... Control means 9 ... Color filter board | substrate (to-be-exposed body)
DESCRIPTION OF SYMBOLS 12 ... Photomask 13 ... Mask pattern 19, 20 ... Light receiving element S1 ... 1st reference position S2 ... 2nd reference position

Claims (6)

An exposure apparatus that intermittently irradiates exposure light via a photomask to an object to be conveyed at a constant speed, and exposes a mask pattern of the photomask at a predetermined position,
A plurality of light receiving elements arranged so as to image an exposure position by the photomask or a position in front of the exposure position in the transport direction with respect to the exposure position, and arranged in a direction substantially orthogonal to the transport direction First imaging means comprising:
It has a plurality of light receiving elements that are arranged so as to image an exposure position by the photomask or a position in front of the exposure position in the transport direction with respect to the exposure position, and are arranged substantially parallel to the transport direction. A second imaging means;
Alignment means for correcting the exposure position by the photomask by relatively moving the object to be exposed and the photomask in a direction substantially perpendicular to the transport direction;
When a first reference position for exposure position correction provided in advance on the object to be exposed is detected by the first imaging unit, the driving of the alignment unit is controlled based on the first reference position, and the second imaging unit is controlled. When a second reference position for extraction of exposure light irradiation timing provided in advance on the exposure object is detected by the means, control means for controlling the irradiation timing of the exposure light based on the second reference position;
An exposure apparatus comprising:   2. The exposure apparatus according to claim 1, wherein the photomask is formed by forming a plurality of mask patterns at a predetermined interval in a direction substantially perpendicular to a transport direction of the object to be exposed.   The photomask forms a mask pattern array by arranging a plurality of mask patterns at a predetermined interval in a direction substantially orthogonal to the transport direction of the object to be exposed, and the mask pattern array is formed at a predetermined interval in the transport direction of the object to be exposed. 2. An exposure apparatus according to claim 1, wherein a plurality of lines are formed.   The exposure apparatus according to claim 1, wherein the object to be exposed is made of a transparent substrate.   The first imaging means is arranged so as to image the first reference position formed on the surface of the object to be exposed made of the transparent substrate from the back side of the object to be exposed. The exposure apparatus according to claim 4.   The second imaging means is arranged to take an image of the second reference position formed on the surface of the object to be exposed made of the transparent substrate from the back surface side of the object to be exposed. The exposure apparatus according to claim 4 or 5.

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