TWI379104B - Illuminator for dark field inspection - Google Patents

Illuminator for dark field inspection Download PDF

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Publication number
TWI379104B
TWI379104B TW094123601A TW94123601A TWI379104B TW I379104 B TWI379104 B TW I379104B TW 094123601 A TW094123601 A TW 094123601A TW 94123601 A TW94123601 A TW 94123601A TW I379104 B TWI379104 B TW I379104B
Authority
TW
Taiwan
Prior art keywords
illumination
illuminator
light
incident
angle
Prior art date
Application number
TW094123601A
Other languages
English (en)
Chinese (zh)
Other versions
TW200608053A (en
Inventor
David Vaughnn
Original Assignee
August Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by August Technology Corp filed Critical August Technology Corp
Publication of TW200608053A publication Critical patent/TW200608053A/zh
Application granted granted Critical
Publication of TWI379104B publication Critical patent/TWI379104B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW094123601A 2004-07-12 2005-07-12 Illuminator for dark field inspection TWI379104B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58720604P 2004-07-12 2004-07-12
US11/179,010 US20060012778A1 (en) 2004-07-12 2005-07-11 Illuminator for dark field inspection

Publications (2)

Publication Number Publication Date
TW200608053A TW200608053A (en) 2006-03-01
TWI379104B true TWI379104B (en) 2012-12-11

Family

ID=35599061

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094123601A TWI379104B (en) 2004-07-12 2005-07-12 Illuminator for dark field inspection

Country Status (3)

Country Link
US (2) US20060012778A1 (https=)
JP (1) JP4744215B2 (https=)
TW (1) TWI379104B (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007144777A2 (en) * 2006-03-30 2007-12-21 Orbotech, Ltd. Inspection system employing illumination that is selectable over a continuous range angles
US8385997B2 (en) 2007-12-11 2013-02-26 Tokitae Llc Spectroscopic detection of malaria via the eye
US8840536B2 (en) * 2007-12-11 2014-09-23 Tokitae, LLC Systems, devices, and methods including paramagnetic oscillation, rotation and translation of hemozoin asymmetric nanoparticles in response to multi-harmonic optical detection of the presence of hemozoin
EP2474824A1 (en) * 2009-09-03 2012-07-11 CCS Inc. Illumination/image-pickup system for surface inspection and data structure
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
US8781184B2 (en) * 2010-02-10 2014-07-15 Tokitae Llc Systems, devices, and methods for detection of malaria
EP2598791A4 (en) * 2010-07-30 2017-11-29 KLA-Tencor Corporation Ring light illuminator, beam shaper and method for illumination
EP2632380A4 (en) * 2010-10-25 2014-09-03 Tokitae Llc SYSTEMS, DEVICES AND METHODS USING A DARK FIELD REFLECTION LIGHTING DEVICE
TWI468651B (zh) * 2012-03-23 2015-01-11 Oto Photonics Inc 光學量測系統、用以架設其之承載結構及光學量測方法
TWI467125B (zh) 2012-09-24 2015-01-01 Ind Tech Res Inst 量測系統與量測方法
US9599572B2 (en) 2014-04-07 2017-03-21 Orbotech Ltd. Optical inspection system and method
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
CN104568886B (zh) * 2015-01-08 2017-10-13 中国科学院遗传与发育生物学研究所 一种基于全内反射的暗场照明方法
US9904192B2 (en) * 2015-02-19 2018-02-27 Zeon Corporation Toner
WO2017024250A1 (en) * 2015-08-05 2017-02-09 Playhard, Inc. Systems and methods for a stellate beam splitter
SG10201703345RA (en) * 2017-04-25 2018-11-29 Emage Vision Pte Ltd Intraocular lens inspection
CN112098421B (zh) * 2020-09-15 2022-06-28 上海微电子装备（集团）股份有限公司 暗场检测装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1539579A (en) * 1921-08-31 1925-05-26 Autoscope Ltd Optical device for compensating the movement of the film in cinematograph apparatus
EP0162120B1 (de) * 1984-05-14 1988-12-07 Ibm Deutschland Gmbh Verfahren und Einrichtung zur Oberflächenprüfung
JPH0814661B2 (ja) * 1986-02-17 1996-02-14 オリンパス光学工業株式会社 視野変換光学系
US4893932A (en) * 1986-05-02 1990-01-16 Particle Measuring Systems, Inc. Surface analysis system and method
JPH02203361A (ja) * 1989-01-31 1990-08-13 Canon Inc 複写装置
IL94368A (en) * 1990-05-11 1993-07-08 Orbot Systems Ltd Optic inspection apparatus and illumination system particularly useful therein
US5539514A (en) * 1991-06-26 1996-07-23 Hitachi, Ltd. Foreign particle inspection apparatus and method with front and back illumination
WO2002040970A1 (en) * 2000-11-15 2002-05-23 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US7365834B2 (en) * 2003-06-24 2008-04-29 Kla-Tencor Technologies Corporation Optical system for detecting anomalies and/or features of surfaces
DE10330006B4 (de) * 2003-07-03 2006-07-20 Leica Microsystems Semiconductor Gmbh Vorrichtung zur Inspektion eines Wafers

Also Published As

Publication number Publication date
TW200608053A (en) 2006-03-01
US20090073429A1 (en) 2009-03-19
JP2006030194A (ja) 2006-02-02
US20060012778A1 (en) 2006-01-19
US7724358B2 (en) 2010-05-25
JP4744215B2 (ja) 2011-08-10

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