JP4744215B2 - 暗視野検査照明装置 - Google Patents

暗視野検査照明装置 Download PDF

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Publication number
JP4744215B2
JP4744215B2 JP2005203720A JP2005203720A JP4744215B2 JP 4744215 B2 JP4744215 B2 JP 4744215B2 JP 2005203720 A JP2005203720 A JP 2005203720A JP 2005203720 A JP2005203720 A JP 2005203720A JP 4744215 B2 JP4744215 B2 JP 4744215B2
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Japan
Prior art keywords
focal plane
illumination
longitudinal
angle
rear focal
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JP2005203720A
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Japanese (ja)
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JP2006030194A (ja
JP2006030194A5 (https=
Inventor
ボーン デービッド
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オーガスト テクノロジー コーポレイション
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Publication of JP2006030194A5 publication Critical patent/JP2006030194A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2005203720A 2004-07-12 2005-07-12 暗視野検査照明装置 Expired - Lifetime JP4744215B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US58720604P 2004-07-12 2004-07-12
US60/587,206 2004-07-12
US11/179,010 US20060012778A1 (en) 2004-07-12 2005-07-11 Illuminator for dark field inspection
US11/179,010 2005-07-11

Publications (3)

Publication Number Publication Date
JP2006030194A JP2006030194A (ja) 2006-02-02
JP2006030194A5 JP2006030194A5 (https=) 2008-08-21
JP4744215B2 true JP4744215B2 (ja) 2011-08-10

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ID=35599061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005203720A Expired - Lifetime JP4744215B2 (ja) 2004-07-12 2005-07-12 暗視野検査照明装置

Country Status (3)

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US (2) US20060012778A1 (https=)
JP (1) JP4744215B2 (https=)
TW (1) TWI379104B (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007144777A2 (en) * 2006-03-30 2007-12-21 Orbotech, Ltd. Inspection system employing illumination that is selectable over a continuous range angles
US8385997B2 (en) 2007-12-11 2013-02-26 Tokitae Llc Spectroscopic detection of malaria via the eye
US8840536B2 (en) * 2007-12-11 2014-09-23 Tokitae, LLC Systems, devices, and methods including paramagnetic oscillation, rotation and translation of hemozoin asymmetric nanoparticles in response to multi-harmonic optical detection of the presence of hemozoin
EP2474824A1 (en) * 2009-09-03 2012-07-11 CCS Inc. Illumination/image-pickup system for surface inspection and data structure
US9044141B2 (en) * 2010-02-10 2015-06-02 Tokitae Llc Systems, devices, and methods including a dark-field reflected-illumination apparatus
US8781184B2 (en) * 2010-02-10 2014-07-15 Tokitae Llc Systems, devices, and methods for detection of malaria
EP2598791A4 (en) * 2010-07-30 2017-11-29 KLA-Tencor Corporation Ring light illuminator, beam shaper and method for illumination
EP2632380A4 (en) * 2010-10-25 2014-09-03 Tokitae Llc SYSTEMS, DEVICES AND METHODS USING A DARK FIELD REFLECTION LIGHTING DEVICE
TWI468651B (zh) * 2012-03-23 2015-01-11 Oto Photonics Inc 光學量測系統、用以架設其之承載結構及光學量測方法
TWI467125B (zh) 2012-09-24 2015-01-01 Ind Tech Res Inst 量測系統與量測方法
US9599572B2 (en) 2014-04-07 2017-03-21 Orbotech Ltd. Optical inspection system and method
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
CN104568886B (zh) * 2015-01-08 2017-10-13 中国科学院遗传与发育生物学研究所 一种基于全内反射的暗场照明方法
US9904192B2 (en) * 2015-02-19 2018-02-27 Zeon Corporation Toner
WO2017024250A1 (en) * 2015-08-05 2017-02-09 Playhard, Inc. Systems and methods for a stellate beam splitter
SG10201703345RA (en) * 2017-04-25 2018-11-29 Emage Vision Pte Ltd Intraocular lens inspection
CN112098421B (zh) * 2020-09-15 2022-06-28 上海微电子装备（集团）股份有限公司 暗场检测装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1539579A (en) * 1921-08-31 1925-05-26 Autoscope Ltd Optical device for compensating the movement of the film in cinematograph apparatus
EP0162120B1 (de) * 1984-05-14 1988-12-07 Ibm Deutschland Gmbh Verfahren und Einrichtung zur Oberflächenprüfung
JPH0814661B2 (ja) * 1986-02-17 1996-02-14 オリンパス光学工業株式会社 視野変換光学系
US4893932A (en) * 1986-05-02 1990-01-16 Particle Measuring Systems, Inc. Surface analysis system and method
JPH02203361A (ja) * 1989-01-31 1990-08-13 Canon Inc 複写装置
IL94368A (en) * 1990-05-11 1993-07-08 Orbot Systems Ltd Optic inspection apparatus and illumination system particularly useful therein
US5539514A (en) * 1991-06-26 1996-07-23 Hitachi, Ltd. Foreign particle inspection apparatus and method with front and back illumination
WO2002040970A1 (en) * 2000-11-15 2002-05-23 Real Time Metrology, Inc. Optical method and apparatus for inspecting large area planar objects
US7365834B2 (en) * 2003-06-24 2008-04-29 Kla-Tencor Technologies Corporation Optical system for detecting anomalies and/or features of surfaces
DE10330006B4 (de) * 2003-07-03 2006-07-20 Leica Microsystems Semiconductor Gmbh Vorrichtung zur Inspektion eines Wafers

Also Published As

Publication number Publication date
TW200608053A (en) 2006-03-01
TWI379104B (en) 2012-12-11
US20090073429A1 (en) 2009-03-19
JP2006030194A (ja) 2006-02-02
US20060012778A1 (en) 2006-01-19
US7724358B2 (en) 2010-05-25

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