WO2007144777A2 - Inspection system employing illumination that is selectable over a continuous range angles - Google Patents

Inspection system employing illumination that is selectable over a continuous range angles Download PDF

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Publication number
WO2007144777A2
WO2007144777A2 PCT/IB2007/002845 IB2007002845W WO2007144777A2 WO 2007144777 A2 WO2007144777 A2 WO 2007144777A2 IB 2007002845 W IB2007002845 W IB 2007002845W WO 2007144777 A2 WO2007144777 A2 WO 2007144777A2
Authority
WO
WIPO (PCT)
Prior art keywords
illumination
angle
angles
inspection
microscopic
Prior art date
Application number
PCT/IB2007/002845
Other languages
French (fr)
Other versions
WO2007144777A3 (en
Inventor
Tali Hurvitz
Yariv Dror Mizrahi
David Fisch
Original Assignee
Orbotech, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US78723006P priority Critical
Priority to US60/787,230 priority
Application filed by Orbotech, Ltd. filed Critical Orbotech, Ltd.
Publication of WO2007144777A2 publication Critical patent/WO2007144777A2/en
Publication of WO2007144777A3 publication Critical patent/WO2007144777A3/en

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8822Dark field detection
    • G01N2021/8825Separate detection of dark field and bright field
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible or ultra-violet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513Liquid crystal panels

Abstract

An illumination device and method for inspecting objects having microscopic features is provided. The device includes an illuminator which provides a solid angle of angularly specific illumination defining an illumination angle, selected by a user from among a continuous range of possible illumination angles. The device further includes an object inspector which inspects the object illuminated by the illuminator. The illuminator may include an illumination source, a light concentrator, an illumination angle selector, disposed along a light path between the illumination source and the object inspector. The illumination angle selector may have a first position in which directly -reflected light propagates toward the object plane and a second position in which no light both selected by the illumination angle selector and directly reflected from the object plane enters the collecting lens. Rather, in the second position, only scattered light from the object plane enters the collecting lens.

Description

INSPECTION SYSTEM EMPLOYING ILLUMINATION THAT IS SELECTABLE OVER A CONTINUOUS RANGE ANGLES

CROSS-REFERENCE TO RELATED PATENT APPLICATIONS

[01] This Application claims the benefit of U.S. Provisional Application No. 60/787,230, filed on March 30, 2006, the entire disclosure of which is incorporated herein by reference.

BACKGROUND OF THE INVENTION [02] Field of the Invention

[03] Methods and apparatuses consistent with the present invention are related to inspection system for inspection of flat panel displays. [04] Description of the Related Art

[05] Conventional inspection systems for flat panel displays use bright field reflective illumination for image acquisition. Defect detection relies on contrast between materials on the panel, inter alia. However, some of the panel materials are designed to be transparent, for example ITO (indium tin oxide), and creating suitable contrast between these materials and other materials on a panel can be very difficult.

SUMMARY OF THE INVENTION

[06] In accordance with an embodiment of the invention the ability to enhance contrast in the image uses a controlled illumination angle. A substrate to be imaged is selectably illuminated using various combinations of illumination having a controlled angle, including bright field, semi-dark field, dark field or deep dark field. Since the contrast of the image of the substrate depends on the specific pattern, and/or the composition of materials, controlling the angle of illumination enables the system to reach a "best" or good contrast for each inspected pattern.

[07] In accordance with another embodiment of the invention is the ability to add the above features and still retain conventional bright field illumination ability on the same apparatus.

[08] The device shown and described herein is particularly suitable for applications in which transparent layers are to be inspected. Such improved detection performance may be greatly appreciated by custom realization of a solution using the widely collected angles of an elliptical mirror.

[09] Several illumination modes may be provided, including some or all of the following types of illumination: Bright Field (BF)5 Dark Field (DF), and Semi Dark Field (SDF).

[10] There is thus provided, in accordance with an exemplary embodiment of the present invention, an inspection system for inspecting objects with microscopic features, the inspection system comprising an illuminator operative to provide illumination of an object having microscopic features, the illumination providable over a continuous range of selectable illumination angles, an object inspector inspecting the object with microscopic features under said illumination; and a dual mode controller operative to control the object inspector to operate in at least two modes including:

[11] a first, learning, mode in which a suitable illumination angle from within said continuous range is identified for an individual set of objects having microscopic features by comparing contrast for at least some of the objects in said set when under each of a plurality of illumination angles; and

[12] a second, inspection, mode in which said individual set of objects is inspected under said suitable illumination angle. [13] Both the first, learning, mode and the second, inspection, mode may be performed in sequence by a single mechanism by imaging and measuring the contrast. [14] Further, in accordance with an exemplary embodiment of the present invention, the object inspector comprises a collecting lens and the object defines an object plane, and the illuminator comprises: an illumination source; an elliptical mirror facing the illumination source; a flat mirror which faces incoming light from the elliptical mirror, wherein the flat mirror, in at least a first position, reflects light toward the object plane; and a flat mirror relative motion provider operative to provide relative motion of the flat mirror relative to the illumination source and to the elliptical mirror, such that in at least a second position of the flat mirror, no light being reflected from both the mirror and directly reflected by the object enters the collecting lens. In other words, in this second position, light entering the collecting lens has been incident on the object from the elliptical mirror and then has been scattered by the object.

[15] One advantage of an embodiment of the invention, but not necessarily the only advantage, is that individual batches of microscopically featured objects with different contrast characteristics, or even individual areas, each having their own contrast characteristics, within objects belonging to a single batch, can be imaged using an illumination angle which best enhances the particular contrast pattern. Typically, the illumination angle is set once for each recipe, each recipe typically comprising a batch of objects. However, in applications in which glasses with more than one type of display are being inspected, it may be desired to scan using different setups within a single recipe or glass. Also, it may be desired to scan different areas within a single display, such as a "cell area" as opposed to a "connectors area" using different setups. BRIEF DESCRIPTION OF THE DRAWINGS

[16] Fig. 1 is a simplified optical diagram of apparatus for providing smooth variation of the illumination angle in an inspection system for microscopic objects such as in-fabrication flat panel displays, wherein the apparatus is in a first state for providing dark field illumination;

[17J Fig. 2 is a simplified optical diagram of the apparatus of Fig. 1 in a second state for providing dark field illumination;

[18] Fig. 3 is a simplified optical diagram of the apparatus of Fig. 1 in a third state for providing semi-dark field illumination;

[19] Fig. 4 is a simplified optical diagram of the apparatus of Fig. 1 in a fourth state for providing semi-dark field illumination;

[20] Fig. 5 is a simplified optical diagram of the apparatus of Fig. 1 in a fifth state for providing bright field illumination.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS OF THE

INVENTION

[21] An embodiment of the present invention is shown in Figs. 1 — 5 in various states. As shown in Fig. 5, which represents a bright field illumination providing state, an optical beam output from an optical fiber bundle propagates in free space. Suitably the fiber bundle has a numerical aperture of 0.6 (angle +/-36°), although other suitable illumination sources having other numerical apertures may be employed. A propagating beam reflects from a suitable optical element e.g. an elliptical mirror with a suitable magnification factor such as 1.46. A slider, or beam splitter mirror module, bearing a partially reflecting mirror / beam splitter and a fully reflecting mirror, both of which may be constructed and operative to be translated together is provided. As shown in Figs. 1-5, an elliptical mirror may collect light from the fiber bundle over an angle of about 27°. The remaining light from the fiber bundle may be treated as stray light. It can be insured that the stray light does not interfere with the illumination or imaging systems by use of appropriate baffles, as would be understood by one of skill in the art.

[22] The beam splitter is arranged to reflect some of the light impinging thereon, e.g. 40% of the light, towards the panel plane. It is noted that the panel plane is the same as the object plane, as discussed above. The may be focused on the panel over a region for which the total angular coverage is e.g. 18°. A collecting lens is positioned along a central optical axis of the system above the panel plane. Typically the collecting lens collects light over a collection angle, e.g. ± 3° or 6° total, for example, collects the light reflected from the panel that passes through the Beam Splitter, e.g. with 40% efficiency, and images the light onto the imaging plane of a camera(not shown). The camera provides images to an image processor, which suitably is operative to analyze the images and detect defects in the object that is imaged. [23] Figs. 1 and 2 shows an exemplary apparatus, also seen in the other figures, configured in full dark field illumination providing states, each of which is characterized by a different illumination angle. It is appreciated that a continuum of selectable states of illumination, i.e. between angles of dark field illumination, full field/bright field illumination and various states combining both dark field and full field/bright field illumination, is provided by an apparatus of the present invention.

[24] The optical beam output from the fiber bundle has a suitable numerical aperture, e.g. 0.6 (angle is +/- 36°), although light sources having a different NA may also be suitable. The propagating beam reflects from an elliptical mirror with a suitable magnification factor of, for example, 1.46. [25J The Beam Splitter-Mirror Module is set with the Flat Mirror facing the incoming light from the elliptical mirror, the module being arranged to reflect light from the flat mirror towards the panel plane. The slider / beam splitter mirror module is shifted relative to the optical axis to provide a selected angle of illumination. For full Dark Field illumination the flat mirror is shifted such that the angle of the light directed onto the panel, e.g. by the flat mirror as seen in the figures, is subsequently reflected by the panel at an angle that misses the objective lens of a viewing camera. The extent of the shift is defined by the application- appropriate dark field angle.

[26] Thus, based on the positioning of the beam splitter and mirror module, a panel in the object plane may be illuminated with light of varying angles, all from a single illuminator: e.g. the fiber bundle, as discussed above. The angle of the light incident on the panel defines the angle at which light is reflected from the panel towards the collecting lens, and the position of the beam splitter and mirror module further determines, as shown in Figs. 1-5, the angle of light reflected from the panel which is "visible" to the connecting lens. Alternately, the illuminator may comprise a set of individually-controlled illumination devices, such as lamps or diodes.

[27] Light is concentrated onto the panel, typically along a linear scan line, and then reflected from it. In this context, reflection from the panel includes specular reflection as well as diffusive reflection and scattering. An objective lens placed along the central optical axis (typically above the panel plane) is associated with a camera to view the panel. It is noted that the objective lens is the same as the collecting lens, as discussed above. As shown, the angle at which illumination is reflected from the panel in the configuration shown in Fig. 1 is offset 5 degrees from the central optical axis of the system, whereas the angle at which illumination is reflected from the panel in the configuration shown in Fig. 2 is offset 4 degrees from the central optical axis. It is appreciated that the linear motion of the slider provides a continuous selectable displacement of the flat mirror relative to the optical axis, which in turn provides for selectability of a suitable illumination angle along a continuum of possible illumination angles.

[28] Figs. 3 and 4 represents semi-dark field illumination states each characterized by a different illumination angle that comprises both dark field and bright field components. A continuum of such states is provided by the apparatus of the present invention. In Figs. 3 and 4, light is output from an optical fiber bundle having a suitable numerical aperture of e.g. 0.6 (angle is +/- 36°). Other light sources having different numerical apertures may be suitable. The propagating beam reflects from an elliptical mirror with a suitable magnification factor of e.g. 1.46.

[29] The Beam Splitter-Mirror Module is set with the Flat Mirror facing the incoming light from the elliptical mirror, the module being arranged to reflect light from the flat mirror towards the panel plane. The slider / beam splitter mirror module is shifted relative to the optical axis to provide a selected angle of illumination. For Semi Dark Field illumination the slider is shifted in a way such that at least some light reflected onto the panel by the flat mirror is subsequently reflected by the panel at an angle such that a least some of the reflected light enters the collecting lens. The extent of the shift is defined by the required semi dark field angle. The light is concentrated onto the panel, and then reflected from it. An objective lens placed along the central optical axis of the system above the panel plane, typically views panel from within an angle of ± 3° (6° total), for example. [30] As shown, the angle at which illumination is reflected from the panel in the configuration shown in Fig. 3 is offset 2 degrees from the central optical axis of the system whereas the angle at which illumination is reflected from the panel in the configuration shown in Fig. 4 is offset 2.5 degrees from the central optical axis. Other suitable angles of offset from the central optical axis may be selected. It is appreciated that translation of the slider results in continuous selectable displacement of the flat mirror relative to the central optical axis, which in turn results in continuous selectable variation of the illumination angle. [31] Thus in order to achieve dark field illumination, the flat mirror is placed so that light from the panel is reflected at an angle greater than ± 3 degrees (in the illustrated embodiment) of offset from the central optical axis. As seen in Figs. 1 and 2, all of the light reflected from the panel is reflected at an angle greater than ± 3 degress of offset from the central optical axis, but at different degrees of offset. In Figs. 3 and 4, some of the light reflected from the panel is reflected at an angle greater than ± 3 degress of offset (in the illustrated embodiment) from the central optical axis, and some of the light reflected from the panel is reflected at an angle less than ± 3 degress of offset (in the illustrated embodiment) from the central optical axis, but at different angles of offset. In Fig. 5, substantially all of the light reflected from the panel is reflected at an angle less than ± 3 degress of offset (in the illustrated embodiment) from the central optical axis, such that substantially of the reflected light enters the aperture of the imaging optics.

J32] The apparatus and methods shown and described herein are particularly useful in conjunction with state of the art inspection systems such as the Orbotech Supervision or InVision inspection systems, commercially available from Orbotech Systems, Yavne, Israel. [33] It is appreciated that software components of the present invention, such as a controller for controlling sliding of the slider may, if desired, be implemented in ROM (read only memory) form. Alternatively the software components may, generally, be implemented in hardware, if desired, using conventional techniques. [34] Features of the present invention which are described in the context of separate embodiments may also be provided in combination in a single embodiment. Conversely, features of the invention which are described for brevity in the context of a single embodiment may be provided separately or in any suitable subcombination. [35] Although exemplary embodiments of the present invention have been described, it will be understood by those skilled in the art that the present invention should not be limited to the described embodiments, but various changes and modifications can be made within the spirit and the scope of the present invention.

Claims

WHAT IS CLAIMED IS:
1. An inspection method, intended for use in inspecting objects with microscopic features, comprising: providing a solid angle of angularly specific illumination defining an illumination angle, wherein the illumination angle is a selected one of a plurality of illumination angles; and inspecting an object, using said solid angle of angularly specific illumination.
2. A method according to claim 1 , wherein the plurality of illumination angles is a continuous range of illumination angles.
3. A method according to claim 1 wherein said providing comprises providing an angle for bright field illumination of the object.
4. A method according to one of claims 1-3 wherein said providing comprises providing an angle for dark field illumination of the object.
5. A method according to one of claims 1-3 wherein said object comprises an in- fabrication flat panel display.
6. An inspection system for inspecting objects with microscopic features, the system comprising: an illuminator which provides a solid angle of angularly specific illumination defining an illumination angle, wherein the illumination angle is a selected one of a plurality of illumination angles; and an object inspector which inspects an object with microscopic features, using said solid angle of angularly specific illumination.
7. An inspection system according to claim 6, wherein the plurality of illumination angles is a continuous range of illumination angles.
8. An inspection system according to claim 6 or claim 7, wherein the illuminator is a single bundle of optical fibers.
9. An illumination device for inspecting objects with microscopic features, the device comprising: an illuminator which provides a solid angle of angularly specific illumination defining an illumination angle, wherein the illumination angle is a selected one of a plurality of illumination angles.
10. An illumination device according to claim 9, wherein the plurality of illumination angles is a continuous range of illumination angles.
11. An illumination device according to claim 9 or claim 10, wherein the illuminator is a single bundle of optical fibers.
12. An inspection system for inspecting objects with microscopic features, the inspection system comprising: an illuminator which provides illumination of an object having microscopic features, the illumination defining a plurality of selectable illumination angles; an object inspector which inspects the object with microscopic features under said illumination; and a controller which controls the object inspector to operate in one of at least two modes including: a first, learning, mode in which a suitable illumination angle from within said continuous range is identified for an individual set of objects having microscopic features by comparing contrast for at least some of the objects in said set when under each of a plurality of illumination angles; and a second, inspection, mode in which said individual set of objects is inspected under said suitable illumination angle.
13. An inspection system according to claim 12, wherein the plurality of illumination angles is a continuous range of illumination angles.
14. An inspection system according to claim 12 or claim 13, wherein the illuminator is a single bundle of optical fibers.
15. A system according to claim 12 wherein said object inspector comprises a collecting lens; wherein the object defines an object plane; and wherein said illuminator comprises: an illumination source; a light concentrator; an illumination angle selector which is disposed along a light path extending from the illumination source to the object inspector and which, in at least a first selectable position, enables light to propagate toward the object plane; a relative motion provider operative to provide motion of the illumination angle selector relative to the illumination source, such that in at least a second selectable position of the illumination angle selector, light selected by the illumination angle selector and incident on the collecting lens is scattered by the object in the object plane.
16. A system according to claim 15 wherein said illumination angle selector comprises a flat mirror.
17. A system according to claim 15 or claim 16 wherein said light concentrator comprises an elliptical mirror.
18. A system according to claim 15, wherein the illumination source is a single bundle of optical fibers.
19. An inspection method, intended for use in inspecting objects with microscopic features, comprising: in a first, learning mode: sequentially illuminating an object having microscopic features to be inspected with a plurality of illumination angles from a plurality of illumination angles; comparing a contrast of the microscopic features under the plurality of illumination angles; identifying, from among the plurality of illumination angles, a suitable illumination angle, based on the contract; and in a second, inspection mode: inspecting the microscopic features under the suitable illumination angle.
20. An inspection method according to claim 19, wherein the plurality of possible illumination angles is a continuous range of possible illumination angles.
PCT/IB2007/002845 2006-03-30 2007-03-20 Inspection system employing illumination that is selectable over a continuous range angles WO2007144777A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US78723006P true 2006-03-30 2006-03-30
US60/787,230 2006-03-30

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020087022797A KR101373511B1 (en) 2006-03-30 2007-03-20 Inspection system employing illumination that is selectable over a continuous range angles
JP2009502261A JP2009532668A (en) 2006-03-30 2007-03-20 Inspection system that utilizes selectable illumination over a continuous range of angles
US12/295,514 US7986404B2 (en) 2006-03-30 2007-03-20 Inspection system employing illumination that is selectable over a continuous range angles
IL19389008A IL193890D0 (en) 2006-03-30 2008-09-04 Inspection system employing iiiumination that is selectable over a continuous range angles

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WO2007144777A2 true WO2007144777A2 (en) 2007-12-21
WO2007144777A3 WO2007144777A3 (en) 2013-07-11

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US (1) US7986404B2 (en)
JP (1) JP2009532668A (en)
KR (1) KR101373511B1 (en)
IL (1) IL193890D0 (en)
TW (1) TWI457558B (en)
WO (1) WO2007144777A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101537656B1 (en) * 2009-07-28 2015-07-17 동우 화인켐 주식회사 Inspection method and inspector for liquid crystal display device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020118359A1 (en) * 1995-06-06 2002-08-29 Kla-Tencor Technologies Corporation High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
US6847442B1 (en) * 1998-06-16 2005-01-25 Orbotech, Ltd. Illuminator for inspecting substantially flat surfaces
US6882417B2 (en) * 2002-03-21 2005-04-19 Applied Materials, Inc. Method and system for detecting defects

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US684744A (en) * 1901-02-08 1901-10-15 Hugh H Byrne Garment support and fastener.
JPH0374763B2 (en) 1983-12-13 1991-11-28
DE3518832C2 (en) 1985-05-24 1989-09-28 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch, De
US4707611A (en) 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films
JPS6453101A (en) 1987-05-25 1989-03-01 Kurashiki Boseki Kk Equal tilt angle interference type film thickness gauge
US4914309A (en) 1987-05-27 1990-04-03 Nippon Sheet Glass Co., Ltd. Discriminating type flaw detector for light-transmitting plate materials
JPS6475903A (en) 1987-09-18 1989-03-22 Ricoh Kk Method for measuring refractive index and film thickness
US4899055A (en) 1988-05-12 1990-02-06 Tencor Instruments Thin film thickness measuring method
US4999014A (en) 1989-05-04 1991-03-12 Therma-Wave, Inc. Method and apparatus for measuring thickness of thin films
JP3057747B2 (en) 1990-11-01 2000-07-04 日本電気株式会社 Semiconductor memory device
US5164603A (en) 1991-07-16 1992-11-17 Reynolds Metals Company Modular surface inspection method and apparatus using optical fibers
US5333049A (en) 1991-12-06 1994-07-26 Hughes Aircraft Company Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation
US5293214A (en) 1991-12-06 1994-03-08 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology by deforming a thin film layer into a reflective condenser
US5337150A (en) 1992-08-04 1994-08-09 Hughes Aircraft Company Apparatus and method for performing thin film layer thickness metrology using a correlation reflectometer
JP3657694B2 (en) * 1995-03-31 2005-06-08 リンテック株式会社 Lighting device
KR0160191B1 (en) 1995-08-12 1999-01-15 김광호 Method & apparatus for back light correction
JP3668294B2 (en) * 1995-08-22 2005-07-06 オリンパス株式会社 Surface defect inspection equipment
US5729343A (en) 1995-11-16 1998-03-17 Nikon Precision Inc. Film thickness measurement apparatus with tilting stage and method of operation
US5838448A (en) 1997-03-11 1998-11-17 Nikon Corporation CMP variable angle in situ sensor
US5798837A (en) 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
JP3114972B2 (en) 1999-03-02 2000-12-04 インターナショナル・ビジネス・マシーンズ・コーポレ−ション Film thickness inspection apparatus and film thickness inspection method
JP2001324450A (en) * 2000-03-06 2001-11-22 View Engineering Inc Method and system for illuminating object with focused light at varying angles of incidence and multi-color light source for use therein
JP2001260492A (en) * 2000-03-17 2001-09-25 Minolta Co Ltd Printing system and printing method
US6538730B2 (en) 2001-04-06 2003-03-25 Kla-Tencor Technologies Corporation Defect detection system
US6731380B2 (en) 2001-06-18 2004-05-04 Applied Optics Center Of Delaware, Inc. Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films
JP2003149169A (en) 2001-11-16 2003-05-21 Tokyo Seimitsu Co Ltd Wafer defect examining device
US20070072666A1 (en) * 2002-08-02 2007-03-29 David Loewenstein Multihand poker game
EP1333260A3 (en) 2002-01-31 2004-02-25 Canon Kabushiki Kaisha Phase measuring method and apparatus
JP2003227914A (en) 2002-01-31 2003-08-15 Canon Inc Wave front division element for extreme-ultraviolet radiation and phase measurement device having the same
US6975410B1 (en) 2002-04-15 2005-12-13 Sturgill Dennis T Measuring device
US7139081B2 (en) 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US6781103B1 (en) 2003-04-02 2004-08-24 Candela Instruments Method of automatically focusing an optical beam on transparent or reflective thin film wafers or disks
US6999180B1 (en) 2003-04-02 2006-02-14 Kla-Tencor Technologies Corporation Optical film topography and thickness measurement
US7001055B1 (en) 2004-01-30 2006-02-21 Kla-Tencor Technologies Corporation Uniform pupil illumination for optical inspection systems
DE102004004761A1 (en) 2004-01-30 2005-09-08 Leica Microsystems Semiconductor Gmbh Apparatus and method for inspecting a wafer
US7315642B2 (en) 2004-02-12 2008-01-01 Applied Materials, Israel, Ltd. System and method for measuring thin film thickness variations and for compensating for the variations
CN101300473B (en) * 2004-03-05 2012-10-31 以色列商奥宝科技股份有限公司 Verification of non-recurring defects in pattern inspection
TW200540939A (en) * 2004-04-22 2005-12-16 Olympus Corp Defect inspection device and substrate manufacturing system using the same
US7177030B2 (en) 2004-04-22 2007-02-13 Technion Research And Development Foundation Ltd. Determination of thin film topography
JP4272121B2 (en) 2004-06-23 2009-06-03 株式会社日立ハイテクノロジーズ Three-dimensional shape measuring method and apparatus using SEM
US20060012778A1 (en) 2004-07-12 2006-01-19 August Technology Corp. Illuminator for dark field inspection
JP2006226804A (en) 2005-02-17 2006-08-31 Matsushita Electric Ind Co Ltd Inspection method of flat display panel
JP2006292668A (en) 2005-04-14 2006-10-26 Matsushita Electric Ind Co Ltd Surface inspection device and surface inspection method
US7161667B2 (en) 2005-05-06 2007-01-09 Kla-Tencor Technologies Corporation Wafer edge inspection
JP4778755B2 (en) 2005-09-09 2011-09-21 株式会社日立ハイテクノロジーズ Defect inspection method and apparatus using the same
JP4723362B2 (en) 2005-11-29 2011-07-13 株式会社日立ハイテクノロジーズ Optical inspection apparatus and method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020118359A1 (en) * 1995-06-06 2002-08-29 Kla-Tencor Technologies Corporation High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
US6847442B1 (en) * 1998-06-16 2005-01-25 Orbotech, Ltd. Illuminator for inspecting substantially flat surfaces
US6882417B2 (en) * 2002-03-21 2005-04-19 Applied Materials, Inc. Method and system for detecting defects

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IL193890D0 (en) 2009-08-03
KR20080106548A (en) 2008-12-08
TW200745541A (en) 2007-12-16
WO2007144777A3 (en) 2013-07-11
US7986404B2 (en) 2011-07-26
TWI457558B (en) 2014-10-21
KR101373511B1 (en) 2014-03-12
JP2009532668A (en) 2009-09-10
US20100231901A1 (en) 2010-09-16

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