1376700 - 九、發明說明： * 【發明所屬之技術領域】 • 本發明係關於觸控面板用之複合透明導電性基材。 【先前技術】 觸控面板係只要用手碰觸顯示器之顯示部，人人皆會使 用，因此被認爲是一種出色的人·機•界面。對於需求擴大 ' .的個人可攜式資訊機器係採用電阻膜方式之觸控面板。 迄今爲止之電阻膜式觸控面板係一種用手指或筆等來按 φ 壓操作之方式，亦即所謂的「打點方式」。對該方式的觸 控面板之透明電極薄膜（透明導電性基材）所要求之主要 特性是係（a)具有特定的電阻値且電阻値爲均勻、（b) 在高溫高濕下的電阻値之安定性、及（c )如打點所引起之 電阻値變化少之打點耐久性。由於通常設置在透明導電性 基材的透明導電性層之厚度係如10〜40奈米之薄，因此 容易由於打點而導致在透明導電性層造成變形、磨耗、龜 裂等。因此，在上述主要的特性中最需要解決困難的特性 > · 是「打點耐久性」，因此爲解決該技術問題而已有各種技 術提案。例如，一種在透明基材薄膜之至少一面，隔著厚 , 度爲0.02 ~ 10微米之含有矽氧烷鍵之錨固層設置透明導電 層之透明導電積層體之提案（發明專利文獻1)。該方法 雖然在高溫高濕下之電阻値是具有安定性，但是耐久性並 不足夠。另外，有一種具有含導電性聚合物的導電性表面 之透明導電性基材之提案（發明專利文獻2)。該方法雖 然具有優越的耐久性，但是卻有電阻値會在高溫高濕下上 1376700 - 升之問題。 (發明專利文獻1 )日本發明專利特開第2002-367436號公 報申請專利範圍第2項 (發明特許文獻2)日本發明專利特開第2002-1 09998號公 報申請專利範圍第1項 【發明內容】 ' 〔所欲解決之技術問題〕 此外，迄今爲止之打點方式，近年來正在擴展可供描繪 φ 的觸控面板之開發。對描繪型的觸控面板之透明導電性基 材所要求之主要特性，係（a)具有特定的電阻値且電阻値 爲均勻、（b)在高溫高濕下的電阻値之安定性、及（c) 如描繪所引起的電阻値變化少之描繪耐久性。描繪係因需 要使筆在觸控面板上滑動，以致比較打點方式將伴隨極大 的透明導電性基材之塑性變形及磨耗。惟若就迄今爲止之 透明導電性基材而言，仍然不能符合該等所有之特性。 本發明係提供一種（a )具有特定的電阻値且電阻値爲均 • 勻、（b )在高溫高濕下的電阻値變化小、及（c )打點所 引起之電阻値變化少之透明導電性基材。 〔解決問題之技術方法〕 本發明係一種將由高分子薄膜或高分子薄片所構成之基 材（A)、透明導電層（B)、及介電質層（C)依此順序 積層，該介電質層（C)係由在溫度爲20°C、頻率爲1 kHz 時之比介電常數爲15以上之有機高分子所構成，且介電質 層（C)之厚度爲40奈米以上、2,0 00奈米以下之觸控面 •6- 1376700 • 扳用複合透明導電性基材，及使用其之觸控面板。 〔發明之功效〕 本發明之複合透明導電性基材，由於在高溫高濕下具有 優越的電阻値之安定性，且描繪所引起之電阻値變化少， '因此用作爲描繪型的觸控面板用之透明導電性基材時非常 傑出。 【實施方式】 〔本發明之最佳實施方式〕 B 本發明之複合透明導電性?基材，係將由高分子薄膜或高 分子薄片（下稱爲薄膜/薄片）所構成之基材（A)、透明 導電層（B)、及介電質層（C)依此順序所積層。 另外，在本發明之所謂「薄膜」係意謂厚度爲1微米以 上、500微米以下，所謂「薄片」係意謂厚度爲超過500 微米、2毫米以下者。 本發明之複合透明導電性基材係可用作爲觸控面板的透 明電極之構件。電阻膜方式之觸控面板係將上部電極與下 φ 部電極隔著一定的間隙所配置。爲防止電極彼此之誤接觸 ，則也有在上下電極之間設置點狀間隔物之方法。當按下 觸控面板之某一點時，該部份之上下電極將接觸而成爲可 通電。對上下電極中任一者外加電壓時，即會產生電位梯 度，並以另一方的電極檢測電位，即可檢測到接觸點之電 位。由檢測到之電位與電位梯度之關係，即可計算出接觸 點之座標。在此等機構上，透明導電性基材必將受到重複 變形及應力，使得透明導電性層容易產生龜裂。 1376700 在透明導電層（B)上予以積層由有機高分子所構成之介 電質層（C)，藉此即可使得在透明導電層（B)上不易產 生龜裂，可顯著地改善描繪所引起之電阻値變化。然而， 若以有機高分子覆蓋在透明導電層（B)上時，通常表面電 阻値將會顯著地升高，以致不適合於用作爲透明電極。如 上所述，若使用導電性之聚合物時，雖然可消除該問題， 但是卻有在高溫高濕下電阻値會上升之問題。在可攜式資 訊機器等之在屋外使用的機器所使用之觸控面板，由於在 高溫高濕下具有優越的電阻値之安定性是重要，因此要求 在高溫高濕下的電阻値之安定性與描繪耐久性兩者並存。 本發明之發明人發現若在透明導電層（B)上積層由在溫 度爲20°C、頻率爲1 kHz下的比介電常數爲15以上之有 機高分子所構成且厚度爲40奈米以上、2,000奈米以下之 介電質層（C)，藉此即可製得具有在高溫高濕下的電阻値 之安定性，且描繪所引起之電阻値變化少的複合透明導電 性基材。 亦即，本發明之發明人發現比介電常數爲15以上之有機 高分子，雖然其體積固有電阻値高，但是若將適當的膜厚 之薄膜形成在透明導電層上時，有機高分子層之表面電阻 値將不致於從透明導電層之表面電阻値大幅度地變化，因 此可獲得適合於觸控面板之範圍內的電阻値。 在溫度爲20°C、頻率爲1 kHz下的比介電常數爲15以 上之有機高分子，較佳爲經氰乙基化之有機高分子。其中 更佳爲選自由：氰乙基纖維素、氰乙基羥基乙基纖維素等 1376700 之纖維素系高分子之氰乙基化高分子；氰乙基澱粉、氰乙 基淫基丙基澱粉、氰乙基支鏈澱粉、氰乙基糖醇支鏈澱粉 等之澱粉系高分子之氰乙基化高分子；聚氰乙基乙烯醇、 氰乙基蔗糖'及氰乙基山梨糖醇所構成之族群中之一種或 兩種以上之有機高分子。其中之氰乙基支鏈澱粉（ cyanoethyl pullulan)，由於可製得具有可撓性、描繪耐久 性高，且在高溫高濕下的電阻値之安定性也高之複合透明 導電性基材，因此爲特別佳。 B 此外，乙醯化支鏈澱粉也可適合用作爲有機高分子來使 用。乙醯化支鏈澱粉，係即使單獨使用、或與經氰乙基化 的有機高分子混合使用，也能製得具有可撓性、描繪耐久 性高，且在高溫高濕下的電阻値之安定性也高的複合透明 導電性基材，因此爲較佳》 另外，介電質層（C)之厚度較佳爲40奈米以上、2，000 奈米以下。若爲薄於40奈米時，則在高溫高濕下的電阻値 之安定性改善功效低，且描繪耐久性之改善功效也不大。 φ 若超過2,000奈米時，表面電阻値則將增大》因此，更佳 的範圍爲80奈米以上、800奈米以下》 複合透明導電性基材之表面電阻値較佳爲1〇〇 Ω/□以上 、1，000 Ω /□以下。若表面電阻値爲小於100Ω /□時，觸 控面板之耗電量將增加。若表面電阻値爲超過1，〇〇〇Ω /□ 時，則容易受到電波干擾影響。複合透明導電性基材之表 面電阻値更佳爲200 Ω /□以上、500 Ω /□以下。若使透明 導電層厚度增厚時，表面電阻値雖然會下降’但是光線透 1376700 •射率也會下降，以致將產生觸控面板之透明性惡化之不良 影響。複合透明導電性基材之全光線透射率較佳爲80%以 上，且更佳爲85%以上。 另外，在此所謂「表面電阻値」係意謂在介電質層（C) 上所測得之表面電阻値。 可作爲基材（A)的薄膜/薄片，較佳爲由聚碳酸酯樹脂 ' 、丙烯酸樹脂、以三醋酸酯爲其代表的醋酸酯樹脂、環狀 聚烯烴、聚對苯二甲酸乙二醇酯或聚萘二甲酸乙二醇酯等 φ 的聚酯樹脂等之高透明性的樹脂所成型之薄膜/薄片。其中 較佳爲由透明性高、耐熱性高，且具有可撓性的聚對苯二 甲酸乙二醇酯所構成之薄膜/薄片。 另外，爲提高與透明導電層（B)之黏著性，較佳爲在與 透明導電層（B)進行積層之前，在薄膜/薄片上塗佈黏著 樹脂、或施加放電處理等之表面處理。並且，由於薄膜/薄 片係有可能因熱而收縮，也可預先施加熱處理，以消除會 造成收縮原因的應變。 φ 本發明之觸控面板用複合基材之透明導電膜層（B)較佳 爲金、銀、銅等之極薄的金屬薄膜、或氧化銦（也可含有 氧化錫和/或氧化鋅）、氧化錫、氧化鋅等之導電性金屬氧 化物等之金屬系透明導電性薄膜。其中，更佳爲在透明性 高的範圍下之電阻値爲低的導電性金屬氧化物。尤其是選 自氧化銦、氧化錫及氧化鋅中之一種或兩種以上之化合物 ，其表面電阻値低、透明性高，且因濕度所引起之化學的 變化少，因此爲較佳。另外，透明導電層（B )係也可爲將 •10- 1376700 - 金屬系透明導電性薄膜予以積層成多層。 將金屬系透明導電性薄膜使用於透明導電層（B)時，在 高溫高濕下之電阻値變化雖然少，但是僅爲透明導電層（B )時，則因描繪所引起之電阻値變化卻大。然而，經在透 明導電層（B)積層介電質層（C)時，則因描繪所引起之 電阻値變化也可使其變小》 ' 該等透明導電性薄膜係可以電子束蒸鍍法、濺鍍法、離 子電鍍法等之被稱爲「PVD (物理氣相沉積）」之真空蒸 φ 鍍法形成在基材（A)上。金屬系透明導電性薄膜，較佳爲 選定適合於目的用途特性之金屬系透明導電性物質，並以 適當的薄膜製造方法來形成。另外，金屬系透明導電性薄 膜係可以熱處理改變其表面電阻値、光線透射率、光線反 射率等之特性，因此必要時可施加熱處理等。此外，金屬 系透明導電薄膜之一般的物性及製造方法係詳細揭示於「 透明導電膜之技術」第3章、第4章、及第5章（日本學 術振興會透明氧化物光•電子材料第166次委員會編、歐 φ 姆社（股）發行）等。 若透明導電層（B)爲由金屬系透明導電性物質所構成時 ，則其厚度雖然應根據用途所要求的表面電阻値及光線透 射率來作適當的決定，但是較佳爲從5奈米至0.5微米。 從表面電阻値、光線透射率、及可撓性的觀點來看，則透 明導電層（B)之厚度更佳爲從1〇奈米至〇.2微米。其係 因爲若厚度爲薄於5奈米時，表面電阻則將增高’若厚度 爲超過0.5微米時，則因相對於光線透射率會因透明導電 -11 - 1376700 層（B)之光吸收而降低，表面電阻値卻不太會降低之緣故 〇 透明導電層（B)之材料也可爲導電性高分子。導電性高 分子較佳爲以2微米厚度即具有50%以上之光線透射率， 且具有l.〇xl(T8S/cm之導電率者。 關於導電性高分子，則在「導電性高分子之論述」第5 章（吉野勝美著、日刊工業新聞社發行）「導電性高分子 j (緒方直哉編、講談社科技發行）、或「導電性高分子 之科技和應用（Science and Application of Conducting Polymers)」（W. R. Salaneck 等人編、Adam Hilger 發行 )等有詳細掲示。 若透明導電層（B)使用透明導電性高分子時，雖然因描 繪所引起之電阻値變化少，但是僅爲透明導電層（B )诗， 則在高溫高濕下的電阻値變化大。惟經在透明導電層（B ) 積層介電質層（C)時，則可使得在高溫高濕下的電阻値變 化變小。 可使用於透明導電層（B)之較佳的導電性高分子，從透 明性、導電性及可撓性的觀點來看，則爲聚吡咯、聚噻吩 、聚呋喃、聚哂吩、聚苯胺、聚對伸苯基、聚莽、及該等 之衍生物、及選自構成該等之單體的共聚合物之導電性高 分子中之任一種或兩種以上之混合物等。其中，藉由導入 側鏈即可具有對水或其他溶劑爲可溶性或分散性的聚噻吩 、聚烷基蕗、聚荞 '聚對伸苯基、聚伸苯基伸乙烯基之衍 生物，及選自構成該等之單體的共聚合物中之至少一種之 -12- 1376700 ’ 導電性高分子，由於具有優越的透明性及導電性，且可塗 佈在薄膜/薄片上形成適當的厚度之導電性高分子膜，因此 爲更佳。尤其是含有聚二氧噻吩之導電性高分子，其中由 聚伸乙基二氧噻吩（PEDT )與聚苯乙烯磺酸（PSS )之混 合物所構成之導電性高分子，由於其可溶解或分散於水或 其他溶劑中，可容易地塗佈在薄膜/薄片上，並且又可形成 ’ 透明性與導電性爲特別高的薄膜，因此爲特別佳。將聚伸 乙基二氧噻吩與聚苯乙烯磺酸所構成之導電性高分子溶解 φ 或分散於水或其他溶劑的樹脂液之製造方法，係已提案在 日本發明專利特開平第7-90060號公報、或國際公開第 02/067273 號小冊。 由於再對導電性高分子添加聚苯乙烯顆粒、丙烯酸樹脂 樹脂顆粒等之顆粒則可提高滑性，使得在裁切薄膜/薄片爲 顯示器畫面大小時，即可容易堆積經裁切的薄膜/薄片，因 此爲較佳。另外，經在導電性高分子添加其他樹脂時，透 明導電層（B)之強度將增強，提高摩擦或搔刮耐久性等之 φ 品質安定性，因此爲較佳。 在基材（A)積層導電性高分子之方法係包括電解聚合 法、蒸鍍法、塗佈法（塗裝法）等，可根據用途或導電性 高分子之種類來作適當的選擇。惟採取以塗佈法積層會溶 解於水或其他溶劑之導電性高分子之方法時，即可在如薄 膜/薄片般之寬幅且長度爲長的基材上，在特定厚度下均勻 加以積層，因此爲較佳。塗佈之方法並無特殊限制，可根 據用途來選擇適當的方法。塗佈之各種方法，係詳細揭示 -13- 1376700 •在Γ塗佈方式」之從第1章至第18章（原崎勇次著、稹書 店發行）等之文獻。 使用導電性高分子時之透明導電層（B)之厚度係因導電 性高分子之種類而不同，雖然應由表面電阻値及光線透射 率來作適當的決定，但是一般較佳爲從約400奈米至5微 米。若從表面電阻値與光線透射率的觀點來看時，則厚度 ' 更佳爲從5 00奈米至2微米。若厚度爲薄於400奈米時， 表面電阻値即將增高，若厚度爲超過5微米時，光線透射 φ 率將因導電性高分子之光吸收而降低。 由於觸控面板之表面將受到筆的磨擦，其表面是容易刮 傷。因此較佳爲在複合導電性基材之至少一面上設置表面 硬化層（D) »由於會受到筆的磨擦之外表面係基材（A) 之設置透明導電層（B) /介電質層（C)的面之相反面，因 此較佳爲在其面上設置表面硬化層（D)，並以表面硬化層 (D) /基材（A) /透明導電層（B) /介電質層（C)之順序 加以積層。另外，經在基材（A)之兩面設置表面硬化層（ φ D )的表面硬化層（D ) /基材（A ) /表面硬化層（D’）/透 明導電層（B) /介電質層（C)之構成也可加以選擇。 該表面硬化層（D)較佳爲具有鉛筆硬度爲1H以上的硬 度者。表面硬化層（D)之材料，雖然可爲無機化合物也可 爲有機化合物，但是從具有可撓性的觀點來看，則更佳爲 有機化合物。表面硬化層之組成係包括熱硬化樹脂、或會 因照射電子射線、紫外線等之高能量射線而硬化的電離放 射線硬化樹脂等。例如三聚氰胺樹脂、環氧樹脂、新戊四 -14- 1376700 醇三丙烯酸酯、或丙烯酸酯系經以醇改質之多官能化合物 等之（甲基）丙烯酸酯樹脂、烷氧基矽烷化合物、鈦酸酯 化合物等。特別是經照射電離放射線即能硬化的（甲基） 丙烯酸酯樹脂，由於其硬度高且具有可撓性，因此是一種 適合用作爲表面硬化層（D )之組成物。此等硬化樹脂之組 成物係例如包括揭示於日本發明專利特開平第12-141556 號公報、特開平第13-179902號公報、特開平第13-287308 號公報等之樹脂組成物。 B 對於觸控面板一般方法是上部電極係使用透明導電薄膜 ，下部電極係使用導電性玻璃。本發明之複合透明導電性 基材，若用作爲屬上部電極的透明導電薄膜時，則可製造 具有優越的耐描繪性及耐高溫高濕性之觸控面板。另一方 面，對於最近正在檢討開發作爲可攜式機器用等之觸控面 板的薄型觸控面板，若將本發明之複合透明性基材用作爲 上下之兩電極時，則可製得體態薄且輕的優異觸控面板。 《實施例》 φ 〔評估方法〕 1.介電常數 將欲測定的有機高分子溶解於以二甲基甲醯胺爲主溶劑 之溶劑，並將該溶液在玻璃板上塗佈成經乾燥後之厚度 能成爲0.5毫米，然後在15CTC之烘箱歷時3分鐘予以乾 燥固化，以製得板狀試料。將所製得之板狀試料切成40 毫米見方，在Keycom製造之介電常數測定裝置DT-002 將平板計測用電極DPT-008作爲電極而予以安裝，使試 -15- 1376700 料夾住於電極，在溫度爲20°C下施加頻率爲1 kHz、電 壓爲1.0 VDC之電壓，並根據JIS C6481-1986進行測定 2.表面電阻値 根據JIS K7 194-1994，並使用DIA儀器公司製造之低電 阻率計Loresta MCP-T360，且以4探針法進行測定。在 欲測定的複合透明性基材之介電質層上將4支針狀電極 放置在直線上，使一定電流流通於外側之二探針之間， 然後測定在內側之二探針之間所產生的電位差，並以計 算求出電阻》另外，在測定並未設置介電質層之試料時 ，則將電極放置在透明電極上。 3 .全光線透射率 將複合透明性基材切成40毫米見方，並根據JIS K7 105-1981，且使用日本電色製造之 Haze Mater NDH-2000, 以D65光源進行測定。 4. b値 將複合透明性基材切成40毫米見方，並根據JIS K7 105-1981，且使用Suga試驗機製造之SM彩色電腦型號SM-6，以D65光源且以透射法進行測定。 5. 在高溫高濕下的電阻値之安定性評估 將複合透明性基材放入60°C、90 %RH之恆溫高濕槽歷 時240小時。將放入恆溫高濕槽前之表面電阻値R〇及放 入後之表面電阻値R係分別使用上述第2項之評估方法 來加以測定。然後以兩者之比R/RG進行在高溫高濕下的 -16- 1376700 電阻値之安定性評估。R/R〇之値愈接近於1，在高溫高 濕下的電阻値之安定性愈佳。 6.描繪所引起之電阻値變化之評估 在附有間隔物顆粒之Nesa玻璃（觸控面板硏究所（股） 製造）的導電性側表面之端部貼上附有黏著黏帶之銅箔 帶，並設置Y電極與該電極之取出端子作爲下部電極（ 固定電極）。在本發明之透明導電性基材的導電層（B) /介電質層（C)側表面之端部貼上附有黏著黏帶之銅箔 帶，並設置X電極與該電極之取出端子作爲上部電極（ 可動電極）。並且，使上部電極與下部電極相對配置成 導電性側表面彼此能相對，且在隔著貼附在端部的兩面 黏帶設置80微米之間隙下，予以貼合，以製得觸控面板 試料。將該觸控面板試料設置於電阻膜式觸控面板檢査 裝置（觸控面板硏究所（股）製造），然後如第2圖所 示使上部電極之平行二邊作爲X電極而使一定電流I流 通。在距自端部爲2毫米之位置，在透明導電性基材的 表面硬化層（D)上面，以經施加300克之筆荷重量的筆 尖爲0.8 R之聚縮醛筆且以210毫米/分鐘之速度將長度 爲20毫米之直線作往復筆記（描繪）。以1往復視爲描 繪1次，而每1，000次即測定電阻値之直線性。該電阻 値之直線性係被稱爲「線性」，係可由下式算得： 線性=(△ E/E ) X 100% 式中，E是假設測定端子P所描繪的直線兩端分別爲XI 及X2時，可由連接測定端子P位於XI上時的電壓EXi -17- 1376700 與測定端子p位於X2上時的電壓EX2之直線所計算之 在X 1與X2之間任意點Χχ的計算上之電壓》Δ Ex係如 第3圖所示在點Χχ的計算上之EX與實際所測得之EXx 的差。使用在連接X〗與Χ2之直線上的最大之ΔΕΧ，並 以上述計算式來求出線性之値。 所謂「直線性變化量」就是經描繪第1次所測定之線 性與每描繪1，〇〇〇次所測定的線性之差。以直線性變化 量會爲1 .5°/。的描繪次數則視爲最大描繪次數。最大描繪 Β 次數愈大，描繪所引起之電阻値變化愈少。 〔實施例1〕 以厚度爲125微米之聚對苯二甲酸乙二醇酯薄膜（東麗 公司（股）製造之商品名“Lumirror (註冊商標）’’QT59 ) 用作爲基材（A).，在該基材（A)上使用三輥式逆向塗佈 機將由70重量份之二新戊四醇六丙烯酸酯，16重量份之 巨單體AN-6S (固態份50重量％) 、20重量份之苯乙烯- 丙烯酸共聚合物（固態份爲60%、重量平均分子量爲 φ 1 7,790 ) ，10重量份之醯亞胺基丙烯酸酯（TO-1429 )所 構成之表面硬化樹脂溶解於以甲苯與甲基乙基酮爲主溶劑 的溶劑之塗佈劑，以經乾燥後之膜厚能成爲5微米之方式 且以10公尺/分鐘之塗佈速度塗佈。然後在烘箱乾燥後， 以100w/cm之能量強度之高壓水銀燈照射，使該表面硬化 樹脂進行交聯硬化，以製造表面硬化膜。在與該表面硬化 膜之表面硬化層（D)成相反側之表面上，使用捲取式DC 脈衝法磁控濺鍍裝置，以表面電阻値能成爲400 Ω /□之方 -18- 1376700 * 式形成ITO (氧化銦錫）薄膜（透明導電層（B))。另外 ，濺鍍條件.係使用ITO靶（氧化銦（90 wt%)與氧化錫（ 10 wt% )之燒結靶（燒結密度99%以上）），直至真空度 成爲4xl0_3 Pa爲止，使濺鍍裝置內排氣後，導入氧氣爲 3.5莫耳％之Ar/02混合氣體，並使真空度成爲4xl(T2 Pa 後，以基材速度3公尺/分鐘進行濺鍍。 ' 其次，在透明導電層（B)上，使用直接式凹版輪轉頭塗 佈器，以經乾燥後之膜厚能成爲0.15微米之方式且在塗佈 φ 速度爲30公尺/分鐘下塗佈經溶解於以二甲基甲醯胺爲主 溶劑的溶劑之氰乙基支鏈澱粉（信越（Shin-Etsu )化學工 業製造）以設置介電質層（C)。所使用之氰乙基支鏈澱粉 (信越化學工業製造）之比介電常數爲19»以上述方法製 得根據由表面硬化層（D) /由高分子薄膜所構成之基材（A )/由ITO所構成之透明導電性層（B) /由氰乙基支鏈澱粉 所構成之介電質層（C)之順序所積層的本發明之觸控面板 用複合透明導電性基材。將根據上述評估方法所評估之結 φ 果展示於表1。 經使用實施例1的複合導電性基材之觸控面板，其最大 描繪次數係符合描繪耐久性之基準的1 〇萬次以上之條件， 因此具有優越的描繪耐久性。 另外，ITO濺鍍膜係帶黃色，因此迄今爲止對於提高光 線透射率及改善色調之要求爲強烈。惟實施例1之複合導 電性基材，經藉由在ITO濺鍍膜上積層氰乙基支鏈澱粉之 層，即可比比較例1之未具有氰乙基支鏈澱粉之層的複合 -19- 1376700 ' 導電性基材更提高光線透射率、且b*値也降低。如上所述 本發明之觸控面板用複合導電性基材可說是對於光學特性 也是優異的更佳導電性基材。 〔比較例1〕 除並未設置介電質層（C )以外，其餘則以與實施例1相 同方法製造經根據表面硬化層（D) /由高分子薄膜所構成 ' 之基材（A)/由ITO所構成之透明導電性層（B )之順序 所積層之複合透明導電性基材。對於所製得之透明導電性 φ 基材，根據上述評估方法進行評估。將評估結果展示於表 1 ° 〔實施例2〕 在與藉由實施例1所製造的表面硬化膜之表面硬化層（ D )成相反側之表面上，以經乾燥後之膜厚能成爲1.2微米 之方式塗佈由聚伸乙基二氧噻吩（PEDOT )及聚苯乙烯磺 酸（PSS)所構成之導電性高分子之水溶液（固態份濃度爲 0.7%) ( Agfa-Gevaert N. V.製造，商品名：Orgacon (註 φ 冊商標）N300 NEW)，以設置透明導電層（B)。在透明 導電層（B)上，以與實施例1相同方法且以經乾燥後之膜 厚能成爲0.12微米之方式塗佈氰乙基支鏈澱粉，以設置介 電質層（C)。以上述方法製造根據表面硬化層（D) /由高 分子薄膜所構成之基材（A) /由導電性高分子所構成之透 明導電性層（B) /由氰乙基支鏈澱粉所構成之介電質層（C )之順序所積層之本發明之複合透明導電性基材。將根據 上述評估方法所評估之結果展示於表1。 -20- 1376700 、 經使用實施例2的複合導電性基材之觸控面板’係符合 在高溫高濕下的電阻値安定性之基準之R/Rg各1.1的條件 ，具有優越的在高溫高濕下的電阻値安定性。另外，也具 有優越的描繪耐久性β 〔比較例2〕 除並未設置介電質層（C )以外，其餘則以與實施例1相 * 同方法製造由表面硬化層（D) /由高分子薄膜所構成之基 材（Α) /由ΙΤΟ所構成之透明導電性層（Β)所構成之複 φ 合透明導電性基材。對於所製得之透明導電性基材，根據 上述評估方法進行評估。將評估結果展示於表1。 〔實施例3〕 除在設置介電質層（C)時，使用乙醯化支鏈澱粉（林原 商事製造）以取代氰乙基支鏈澱粉以外，其餘則以與實施 例1相同方法製造複合透明導電性基材。所使用之乙醯化 支鏈澱粉之比介電常數爲16。將評估結果展示於表1。 〔實施例4〕 . φ 除在設置介電質層‘（C)時，則將乙醯化支鏈澱粉（林原 商事製造）與氰乙基支鏈澱粉（信越化學工業製）以重量 比爲50%/50%混合使用以取代氰乙基支鏈澱粉以外，其餘 則以與實施例1相同方法製造複合透明導電性基材。以重 量比50%/5 0%混合乙醯化支鏈澱粉與氰乙基支鏈澱粉時之 比介電常數丨7。將評估結果展示於表1。 -21 - 1376700 表1 表面 電阻値 Q/D 全光線 透射率 % b*値 (R/R〇) 最大描繪 次數 (萬次） 實施例1 440 93 -0.39 1.02 11 比較例1 410 86 2.95 1.01 0.5 實施例2 456 89 1.03 16 比較例2 460 85 1.4 10 實施例3 489 90 1.04 10 實施例4 500 92 1.03 11 〔產業上之利用性〕 可利用用作爲人類在操作資訊機器時所必要的界面所使 φ 用的觸控面板之重要構成構件的複合透明導電性基材。 【圖式簡單說明】 第1圖係展示本發明觸控面板用複合透明性基材之一實 例剖面示意圖。 第2圖係展示在實施例中因描繪所引起之電阻値變化之 評估方法模式圖。 第3圖係展示以第2圖之評估所測定的電壓與線性之關 係圖。 9 【主要元件符號說明】 1 由高分子薄膜或薄片所構成之基材（A) 2 透明導電層（B ) 3 介電質層（C) 4 表面硬化層（D ) -22-1376700 - IX. Description of the invention: * [Technical Field of the Invention] The present invention relates to a composite transparent conductive substrate for a touch panel. [Prior Art] The touch panel is used by everyone as long as it touches the display portion of the display, so it is considered to be an excellent human-machine interface. For the demand expansion, the personal portable information device uses a resistive film touch panel. The resistive touch panel of the prior art is a method of pressing a φ pressure with a finger or a pen, that is, a so-called "dot mode". The main characteristics required for the transparent electrode film (transparent conductive substrate) of the touch panel of this method are that (a) has a specific resistance 値 and the resistance 値 is uniform, and (b) the resistance under high temperature and high humidity 値The stability, and (c) the resistance of the resistance caused by the dot change caused by the dot. Since the thickness of the transparent conductive layer usually provided on the transparent conductive substrate is as thin as 10 to 40 nm, deformation, abrasion, cracking, and the like are likely to occur in the transparent conductive layer due to dot plating. Therefore, among the above-mentioned main characteristics, the most difficult feature to be solved is > · "drilling durability", and various technical proposals have been made to solve the technical problem. For example, a transparent conductive laminated body in which a transparent conductive layer is provided on at least one side of a transparent base film via an anchor layer containing a decane bond having a thickness of 0.02 to 10 μm is proposed (Patent Document 1). This method has stability in resistance 値 under high temperature and high humidity, but durability is not sufficient. Further, there is a proposal for a transparent conductive substrate having a conductive surface containing a conductive polymer (Patent Document 2). Although this method has superior durability, it has a problem that the resistance 値 will be 1376700 - liter under high temperature and high humidity. (Patent Document 1) Japanese Patent Application Laid-Open No. 2002-367436 (Patent Document No. 2) (Invention Patent Document No. 2) Japanese Patent Application Laid-Open No. 2002-1 09998 】 ' [Technical problems to be solved] In addition, in recent years, the development of touch panels for drawing φ has been expanding in recent years. The main characteristics required for a transparent conductive substrate of a drawing type touch panel are (a) having a specific resistance and uniformity of resistance 、, (b) stability of a resistor 高温 under high temperature and high humidity, and (c) Depiction durability of the resistance 値 change caused by the depiction. The depiction is due to the need to slide the pen over the touch panel, so that the comparison of the dot pattern will be accompanied by plastic deformation and wear of the extremely transparent conductive substrate. However, in the case of transparent conductive substrates to date, all of these characteristics are still not met. The present invention provides a transparent conductive having (a) a specific resistance 値 and a resistance 値 uniform, (b) a small change in resistance 高温 under high temperature and high humidity, and (c) a small change in resistance 引起 caused by dot plating. Substrate. [Technical method for solving the problem] The present invention relates to a substrate (A), a transparent conductive layer (B), and a dielectric layer (C) composed of a polymer film or a polymer sheet, which are laminated in this order. The electrolyte layer (C) is composed of an organic polymer having a specific dielectric constant of 15 or more at a temperature of 20 ° C and a frequency of 1 kHz, and the thickness of the dielectric layer (C) is 40 nm or more. Touch surface below 2,00 nm • 6- 1376700 • Use a composite transparent conductive substrate and use the touch panel. [Effects of the Invention] The composite transparent conductive substrate of the present invention has excellent stability of the electric resistance under high temperature and high humidity, and the resistance 値 change caused by the drawing is small, so that it is used as a drawing type touch panel. It is excellent when used with a transparent conductive substrate. [Embodiment] [Best Mode for Carrying Out the Invention] B The composite transparent conductive substrate of the present invention is a substrate (A) composed of a polymer film or a polymer sheet (hereinafter referred to as a film/sheet). The transparent conductive layer (B) and the dielectric layer (C) are laminated in this order. Further, the term "film" as used in the present invention means a thickness of 1 μm or more and 500 μm or less, and the term "sheet" means a thickness of more than 500 μm and 2 mm or less. The composite transparent conductive substrate of the present invention can be used as a member of a transparent electrode of a touch panel. The resistive film type touch panel is disposed with a gap between the upper electrode and the lower φ electrode. In order to prevent the electrodes from being in erroneous contact with each other, there is also a method of providing a dot spacer between the upper and lower electrodes. When a point on the touch panel is pressed, the upper and lower electrodes of the portion will contact and become energizable. When a voltage is applied to any of the upper and lower electrodes, a potential gradient is generated, and the potential is detected by the other electrode, and the potential of the contact point can be detected. From the relationship between the detected potential and the potential gradient, the coordinates of the contact point can be calculated. In such a mechanism, the transparent conductive substrate is subject to repeated deformation and stress, so that the transparent conductive layer is liable to be cracked. 1376700 A dielectric layer (C) composed of an organic polymer is laminated on the transparent conductive layer (B), whereby cracks are less likely to occur on the transparent conductive layer (B), and the depiction can be remarkably improved. The resulting resistance changes. However, if the organic polymer is coated on the transparent conductive layer (B), the surface resistance 値 will usually rise remarkably, so that it is not suitable for use as a transparent electrode. As described above, when a conductive polymer is used, although the problem can be eliminated, there is a problem that the electric resistance 上升 rises under high temperature and high humidity. In a touch panel used in a device such as a portable information machine, it is important to have excellent resistance and stability under high temperature and high humidity. Therefore, the stability of the resistor under high temperature and high humidity is required. Coexist with both depicting durability. The inventors of the present invention found that when the transparent conductive layer (B) is laminated, it is composed of an organic polymer having a specific dielectric constant of 15 or more at a temperature of 20 ° C and a frequency of 1 kHz and a thickness of 40 nm or more. With a dielectric layer (C) of 2,000 nm or less, it is possible to obtain a composite transparent conductive substrate having a stability of a resistor 在 under high temperature and high humidity and a small change in resistance 引起 caused by the drawing. That is, the inventors of the present invention have found that an organic polymer having a specific dielectric constant of 15 or more has a bulk specific resistance 値, but an organic polymer layer is formed when a film having a suitable film thickness is formed on a transparent conductive layer. The surface resistance 値 will not vary greatly from the surface resistance 透明 of the transparent conductive layer, so that a resistor 适合 suitable for the touch panel can be obtained. The organic polymer having a specific dielectric constant of 15 or more at a temperature of 20 ° C and a frequency of 1 kHz is preferably a cyanoethylated organic polymer. More preferably, it is a cyanoethylated polymer selected from the group consisting of: cyanoethyl cellulose, cyanoethyl hydroxyethyl cellulose, etc., 1376700 of a cellulose-based polymer; cyanoethyl starch, cyanoethyl ketonepropyl starch a cyanoethylated polymer of a starch-based polymer such as cyanoethyl amylopectin or cyanoethyl alcohol amylopectin; polycyanoethyl vinyl alcohol, cyanoethyl sucrose, and cyanoethyl sorbitol One or more organic polymers of the constituent groups. Among them, cyanoethyl pullulan can produce a composite transparent conductive substrate having flexibility, high drawing durability, and high stability under high temperature and high humidity. Especially good. B In addition, acetylated amylopectin can also be suitably used as an organic polymer. The acetaminolated amylopectin can be obtained by using it alone or in combination with a cyanoethylated organic polymer to obtain a resin having flexibility, high drawing durability, and high temperature and high humidity. The composite transparent conductive substrate having high stability is preferable. Further, the thickness of the dielectric layer (C) is preferably 40 nm or more and 2,000 nm or less. When it is thinner than 40 nm, the stability of the resistance 在 under high temperature and high humidity is low, and the effect of improving durability is not large. When φ exceeds 2,000 nm, the surface resistance 値 will increase. Therefore, the more preferable range is 80 nm or more and 800 nm or less. The surface resistance 复合 of the composite transparent conductive substrate is preferably 1 〇〇Ω. /□ above, 1,000 Ω / □ or less. If the surface resistance 値 is less than 100 Ω / □, the power consumption of the touch panel will increase. If the surface resistance 値 is more than 1, 〇〇〇Ω /□, it is susceptible to radio wave interference. The surface resistivity of the composite transparent conductive substrate is preferably 200 Ω / □ or more and 500 Ω / □ or less. When the thickness of the transparent conductive layer is increased, the surface resistance 下降 is lowered, but the light transmittance is 1376700. The transmittance is also lowered, so that the transparency of the touch panel is deteriorated. The total transparent light transmittance of the composite transparent conductive substrate is preferably 80% or more, and more preferably 85% or more. In addition, the term "surface resistance 値" as used herein means the surface resistance 测 measured on the dielectric layer (C). It can be used as a film/sheet of the substrate (A), preferably a polycarbonate resin, an acrylic resin, an acetate resin represented by triacetate, a cyclic polyolefin, and a polyethylene terephthalate. A film/sheet formed of a highly transparent resin such as a polyester resin such as ester or polyethylene naphthalate. Among them, a film/sheet composed of polyethylene terephthalate having high transparency and high heat resistance and having flexibility is preferable. Further, in order to improve the adhesion to the transparent conductive layer (B), it is preferred to apply an adhesive resin or a surface treatment such as discharge treatment to the film/sheet before laminating the transparent conductive layer (B). Further, since the film/sheet may shrink due to heat, heat treatment may be applied in advance to eliminate strain which causes shrinkage. φ The transparent conductive film layer (B) of the composite substrate for a touch panel of the present invention is preferably an extremely thin metal film of gold, silver or copper, or indium oxide (which may also contain tin oxide and/or zinc oxide). A metal-based transparent conductive film such as a conductive metal oxide such as tin oxide or zinc oxide. Among them, a conductive metal oxide having a low electric resistance in a range of high transparency is more preferable. In particular, a compound selected from one or more of indium oxide, tin oxide and zinc oxide is preferred because it has low surface resistance, high transparency, and little chemical change due to humidity. Further, the transparent conductive layer (B) may be formed by laminating a layer of a 10-10376700-metal transparent conductive film. When a metal-based transparent conductive film is used for the transparent conductive layer (B), the resistance enthalpy change under high temperature and high humidity is small, but when it is only the transparent conductive layer (B), the resistance 値 changes due to the drawing are Big. However, when the dielectric layer (C) is laminated on the transparent conductive layer (B), the resistance 値 change due to the drawing can be made smaller. ' These transparent conductive films can be electron beam vapor deposition. A vacuum vapor deposition method called "PVD (Physical Vapor Deposition)" such as a sputtering method or an ion plating method is formed on the substrate (A). The metal-based transparent conductive film is preferably a metal-based transparent conductive material selected for the purpose of use, and is formed by a suitable film production method. Further, the metal-based transparent conductive film can be heat-treated to change characteristics such as surface resistance 光线, light transmittance, light reflectance, etc., and therefore heat treatment or the like can be applied as necessary. In addition, the general physical properties and manufacturing methods of the metal-based transparent conductive film are disclosed in detail in Chapter 3, Chapter 4, and Chapter 5 of the "Technology of Transparent Conductive Films" (Japan Society for the Promotion of Science, Transparent Oxide Light, Electronic Materials, etc.) 166 committees, Ou hms (shares), etc. When the transparent conductive layer (B) is composed of a metal-based transparent conductive material, the thickness thereof should be appropriately determined depending on the surface resistance 値 and light transmittance required for the application, but preferably from 5 nm. Up to 0.5 microns. The thickness of the transparent conductive layer (B) is more preferably from 1 Å to 2 μm from the viewpoint of surface resistance 光线, light transmittance, and flexibility. This is because if the thickness is thinner than 5 nm, the surface resistance will increase. 'If the thickness is more than 0.5 μm, the light transmittance will be due to the light absorption of the transparent conductive-11 - 1376700 layer (B). The material of the transparent conductive layer (B) may also be a conductive polymer because the surface resistance is less likely to decrease. The conductive polymer preferably has a light transmittance of 50% or more in a thickness of 2 μm, and has a conductivity of 1 〇 x 1 (T8 S/cm. For the conductive polymer, the conductive polymer Chapter 5 (issued by Yoshino Satoshi, published by Nikkan Kogyo Shimbun) "Electrically conductive polymer j (Osaka Ogata, Kodansha Technology), or "Science and Application of Conducting Polymers" (Writing by WR Salaneck et al., issued by Adam Hilger), etc. If a transparent conductive polymer is used for the transparent conductive layer (B), the resistance 値 changes due to the drawing are small, but only the transparent conductive layer ( B) Poetry, the resistance 値 changes under high temperature and high humidity. However, when the dielectric layer (C) is laminated on the transparent conductive layer (B), the change in resistance 在 under high temperature and high humidity can be made small. A preferred conductive polymer for the transparent conductive layer (B) is polypyrrole, polythiophene, polyfuran, polybenzazole, polyaniline from the viewpoints of transparency, conductivity, and flexibility. Poly(p-phenylene) Any one or a mixture of two or more kinds of a base, a polyfluorene, and a derivative thereof, and a conductive polymer selected from the group consisting of the copolymers of the monomers, wherein a side chain is introduced It may have a polythiophene, a polyalkylhydrazine, a polyfluorene poly(p-phenylene), a polyphenylenevinylene derivative, which is soluble or dispersible to water or other solvent, and a monomer selected from the group consisting of such monomers. -12-1376700' conductive polymer of at least one of the copolymers has excellent transparency and conductivity, and can be applied to a film/sheet to form a conductive polymer film having an appropriate thickness. More preferably, in particular, a conductive polymer containing polydioxythiophene, wherein a conductive polymer composed of a mixture of polydiethylthiophene (PEDT) and polystyrenesulfonic acid (PSS) is used. Dissolved or dispersed in water or other solvents, can be easily applied to the film/sheet, and can form a film with a particularly high transparency and conductivity, so it is particularly preferable. The polyethylene dioxythiophene will be polymerized. Composition with polystyrene sulfonic acid A method for producing a resin liquid in which a conductive polymer is dissolved in φ or dispersed in water or another solvent is proposed in Japanese Laid-Open Patent Publication No. 7-90060 or International Publication No. 02/067273. Adding particles such as polystyrene particles or acrylic resin particles to the conductive polymer improves the slipperiness, so that when the cut film/sheet is the size of the display screen, the cut film/sheet can be easily deposited. In addition, when another resin is added to the conductive polymer, the strength of the transparent conductive layer (B) is enhanced, and the φ quality stability such as friction or scratch durability is improved, which is preferable. The method of laminating the conductive polymer in the substrate (A) includes an electrolytic polymerization method, a vapor deposition method, a coating method (coating method), and the like, and can be appropriately selected depending on the use or the type of the conductive polymer. When a method of laminating a conductive polymer which dissolves in water or another solvent by a coating method is employed, it is possible to uniformly laminate a layer at a specific thickness on a substrate having a wide width and a long length such as a film/sheet. Therefore, it is better. The method of coating is not particularly limited, and an appropriate method can be selected depending on the use. Various methods of coating are disclosed in detail from -13 to 1376700 in Chapters 1 through 18 (original Yamashita, published by the bookstore). The thickness of the transparent conductive layer (B) when the conductive polymer is used differs depending on the type of the conductive polymer, and is appropriately determined by the surface resistance 値 and the light transmittance, but it is generally preferably from about 400. Nano to 5 microns. The thickness 'better is from 500 nm to 2 μm from the viewpoint of surface resistance 値 and light transmittance. When the thickness is thinner than 400 nm, the surface resistance 値 is increased, and when the thickness is more than 5 μm, the light transmission φ ratio is lowered by the light absorption of the conductive polymer. Since the surface of the touch panel will be rubbed by the pen, the surface is easily scratched. Therefore, it is preferable to provide a surface hardened layer (D) on at least one side of the composite conductive substrate. » A transparent conductive layer (B)/dielectric layer is provided on the surface-based substrate (A) due to abrasion by the pen. The opposite side of the surface of (C), it is preferred to provide a surface hardened layer (D) on the surface thereof, and a surface hardened layer (D) / substrate (A) / transparent conductive layer (B) / dielectric The order of layers (C) is laminated. Further, a surface hardened layer (D) / substrate (A) / surface hardened layer (D') / transparent conductive layer (B) / dielectric provided with a surface hardened layer (φ D ) on both sides of the substrate (A) The composition of the layer (C) can also be selected. The surface hardened layer (D) preferably has a hardness of 1H or more in pencil hardness. The material of the surface hardened layer (D) may be an inorganic compound or an organic compound, but is preferably an organic compound from the viewpoint of flexibility. The composition of the surface hardened layer includes a thermosetting resin or an ionizing radiation hardening resin which is hardened by irradiation with high-energy rays such as electron beams or ultraviolet rays. For example, melamine resin, epoxy resin, neopenta-4-14376700 alcohol triacrylate, or acrylate-based (meth) acrylate resin, alkoxy decane compound, titanium, etc. An acid ester compound or the like. In particular, a (meth) acrylate resin which is hardenable by irradiation with ionizing radiation is a composition suitable for use as a surface hardened layer (D) because of its high hardness and flexibility. The composition of the hardened resin is, for example, a resin composition disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. B The general method for the touch panel is to use a transparent conductive film for the upper electrode and conductive glass for the lower electrode. When the composite transparent conductive substrate of the present invention is used as a transparent conductive film which is an upper electrode, a touch panel having excellent patterning resistance and high temperature and high humidity resistance can be produced. On the other hand, in the case of a thin touch panel which is currently being developed to develop a touch panel for use as a portable device, if the composite transparent substrate of the present invention is used as the upper and lower electrodes, the body can be made thin. Light and excellent touch panel. <<Examples>> φ [Evaluation method] 1. Dielectric constant The organic polymer to be measured is dissolved in a solvent containing dimethylformamide as a main solvent, and the solution is coated on a glass plate to be dried. The thickness can be made 0.5 mm, and then dried and solidified in an oven at 15 CTC for 3 minutes to obtain a plate-like sample. The prepared plate-shaped sample was cut into a 40 mm square, and the dielectric constant measuring device DT-002 manufactured by Keycom was mounted with the flat measuring electrode DPT-008 as an electrode, and the test -15-1376700 was clamped to the sample. The electrode was applied at a temperature of 20 ° C at a frequency of 1 kHz and a voltage of 1.0 VDC, and was measured according to JIS C6481-1986. 2. Surface resistance 値 according to JIS K7 194-1994, and using a low manufactured by DIA Instruments The resistivity meter Loresta MCP-T360 was measured by the 4-probe method. Place 4 needle electrodes on the dielectric layer of the composite transparent substrate to be measured, and make a certain current flow between the two probes on the outer side, and then measure between the two probes on the inner side. The generated potential difference is calculated by calculation. In addition, when the sample in which the dielectric layer is not provided is measured, the electrode is placed on the transparent electrode. 3. Total light transmittance The composite transparent substrate was cut into a 40 mm square and measured by a D65 light source in accordance with JIS K7 105-1981 and using Haze Mater NDH-2000 manufactured by Nippon Denshoku Co., Ltd. 4. b値 The composite transparent substrate was cut into a 40 mm square and measured according to JIS K7 105-1981 using a SM color computer model SM-6 manufactured by a Suga tester using a D65 light source and transmitting. 5. Evaluation of the stability of the resistor 高温 under high temperature and high humidity The composite transparent substrate was placed in a constant temperature and high humidity bath at 60 ° C and 90 % RH for 240 hours. The surface resistance 値R〇 before placing the thermostatic high-humidity tank and the surface resistance 値R after the introduction were measured using the evaluation method of the above item 2, respectively. Then, the stability of the -16-1376700 resistance enthalpy under high temperature and high humidity was evaluated by the ratio R/RG of the two. The R/R〇 is closer to 1, and the stability of the resistor 高温 under high temperature and high humidity is better. 6. Evaluation of the change in the resistance 値 caused by the description. The end of the conductive side surface of the Nesa glass (manufactured by Touch Panel Research Institute) with spacer particles is attached with a copper foil with an adhesive tape. The belt is provided with a Y electrode and a take-out terminal of the electrode as a lower electrode (fixed electrode). A copper foil tape with an adhesive tape attached thereto is attached to an end portion of the side surface of the conductive layer (B) / dielectric layer (C) of the transparent conductive substrate of the present invention, and an X electrode and a take-out terminal of the electrode are provided. As the upper electrode (movable electrode). Further, the upper electrode and the lower electrode are disposed so that the conductive side surfaces are opposite to each other, and are attached to each other with a gap of 80 μm interposed between the adhesive tapes attached to the end portions to obtain a touch panel sample. . The touch panel sample is placed on the resistive film type touch panel inspection device (manufactured by the touch panel research institute), and then the parallel electrodes on the upper electrode are used as the X electrodes to make a constant current as shown in FIG. 2 I circulate. At a position 2 mm from the end, on the surface hardened layer (D) of the transparent conductive substrate, a polyacetal pen having a pen tip of 300 g applied with a weight of 300 g was applied at 210 mm/min. The speed is a reciprocating note (depicted) of a line with a length of 20 mm. The reciprocation of 1 is regarded as drawing once, and the linearity of the resistance 値 is measured every 1,000 times. The linearity of the resistor 被 is called "linear" and can be calculated from the following equation: Linear = (Δ E / E ) X 100% where E is assumed to be XI and the two ends of the line drawn by the measurement terminal P are respectively In X2, the calculated voltage at any point X between X 1 and X2 calculated from the line connecting the measurement terminal P on the XI with the voltage EXi -17-1376700 and the voltage of the voltage EX2 when the measurement terminal p is located at X2 Δ Δ is the difference between the EX calculated by the point Χχ and the actually measured EXx as shown in Fig. 3. The maximum ΔΕΧ on the line connecting X and Χ2 is used, and the linearity is obtained by the above calculation formula. The "linear change amount" is the difference between the linearity measured for the first time and the linearity measured for each drawing 1 time. The amount of change in linearity will be 1.5 ° /. The number of draws is considered as the maximum number of draws. Maximum drawing Β The greater the number of times, the less the resistance 値 caused by the depiction. [Example 1] A polyethylene terephthalate film (trade name "Lumirror (registered trademark) ''QT59) manufactured by Toray Industries Co., Ltd.) was used as the substrate (A). On the substrate (A), using a three-roll reverse coater, 70 parts by weight of dipentaerythritol hexaacrylate, 16 parts by weight of macromonomer AN-6S (solid portion 50% by weight), 20 Parts by weight of a styrene-acrylic acid copolymer (60% solids, weight average molecular weight φ 177,790), and 10 parts by weight of a surface hardening resin composed of fluorene imino acrylate (TO-1429) are dissolved in A coating agent of a solvent of toluene and methyl ethyl ketone as a main solvent, which is applied so that the film thickness after drying can be 5 μm and at a coating speed of 10 m/min, and then dried in an oven. The surface-hardened resin is cross-linked and hardened by irradiation with a high-pressure mercury lamp having an energy intensity of 100 W/cm to produce a surface-cured film. On the surface opposite to the surface hardened layer (D) of the surface-hardened film, a roll is used. Take-off DC pulse method magnetron sputtering device with surface resistance An ITO (Indium Tin Oxide) film (transparent conductive layer (B)) is formed in a range of 400 Ω / □ -18 - 1376700 * In addition, sputtering conditions are performed using an ITO target (indium oxide (90 wt%) and oxidation a sintered target of tin (10 wt%) (sintering density of 99% or more) until the degree of vacuum is 4x10_3 Pa, and after exhausting the inside of the sputtering apparatus, an Ar/02 mixed gas having an oxygen content of 3.5 mol% is introduced, and The degree of vacuum was changed to 4xl (T2 Pa, and sputtering was performed at a substrate speed of 3 m/min. ' Next, on the transparent conductive layer (B), a direct gravure coater was used to dry the film. The film has a film thickness of 0.15 μm and is coated with a cyanoethyl amylopectin dissolved in a solvent containing dimethylformamide as a solvent at a coating φ speed of 30 m/min (Shin (Shin) -Etsu) (manufactured by the chemical industry) to set the dielectric layer (C). The cyanoethyl amylopectin used (manufactured by Shin-Etsu Chemical Co., Ltd.) has a specific dielectric constant of 19» which is obtained by the above method according to the surface hardened layer. (D) / Substrate (A) composed of a polymer film / Transparent conductive layer (B) composed of ITO / by The composite transparent conductive substrate for a touch panel of the present invention laminated in the order of the dielectric layer (C) composed of ethyl amylopectin. The knot φ evaluated according to the above evaluation method is shown in Table 1. In the touch panel using the composite conductive substrate of the first embodiment, the maximum number of times of drawing is in accordance with the condition of drawing durability of more than 1 million times, and therefore, the drawing durability is excellent. With a yellow color, the demand for improving light transmittance and improving color tone has been strong so far. However, the composite conductive substrate of Example 1 can be composited with the layer of the cyanoethyl amylopectin of Comparative Example 1 by laminating a layer of cyanoethyl amylopectin on the ITO sputtering film. 1376700 ' Conductive substrates increase light transmission and b*値 also decreases. As described above, the composite conductive substrate for a touch panel of the present invention can be said to be a more excellent conductive substrate which is excellent in optical properties. [Comparative Example 1] A substrate (A) based on the surface hardened layer (D) / composed of a polymer film was produced in the same manner as in Example 1 except that the dielectric layer (C) was not provided. / A composite transparent conductive substrate laminated in the order of the transparent conductive layer (B) composed of ITO. The obtained transparent conductive φ substrate was evaluated according to the above evaluation method. The evaluation results are shown in Table 1 ° [Example 2] On the surface opposite to the surface hardened layer (D) of the surface cured film produced in Example 1, the film thickness after drying was 1.2. An aqueous solution of a conductive polymer composed of polyethyl oxydithiophene (PEDOT) and polystyrene sulfonic acid (PSS) (solid concentration: 0.7%) is applied in a micron manner (manufactured by Agfa-Gevaert NV, commercial product) Name: Orgacon (note φ booklet) N300 NEW) to set the transparent conductive layer (B). On the transparent conductive layer (B), a cyanoethyl amylopectin was applied in the same manner as in Example 1 and the film thickness after drying was 0.12 μm to provide a dielectric layer (C). The substrate (A) composed of the surface hardened layer (D) / the polymer film / the transparent conductive layer (B) composed of the conductive polymer / composed of cyanoethyl amylopectin is produced by the above method The composite transparent conductive substrate of the present invention is laminated in the order of the dielectric layer (C). The results evaluated according to the above evaluation methods are shown in Table 1. -20- 1376700, The touch panel of the composite conductive substrate of the second embodiment is in accordance with the condition of R/Rg of 1.1 per the standard of resistance 値 stability under high temperature and high humidity, and has superior high temperature and high temperature. The resistance under wet is stable. In addition, it also has excellent drawing durability β [Comparative Example 2] Except that the dielectric layer (C) is not provided, the surface hardening layer (D) / high is manufactured by the same method as in the first embodiment. A substrate made of a molecular film (Α) / a transparent conductive substrate made of a transparent conductive layer made of ruthenium. The transparent conductive substrate thus obtained was evaluated in accordance with the above evaluation method. The results of the evaluation are shown in Table 1. [Example 3] A compound was produced in the same manner as in Example 1 except that acetamino amylopectin (manufactured by Hayashibara Seisakusho Co., Ltd.) was used instead of cyanoethyl amylopectin in the case where the dielectric layer (C) was provided. A transparent conductive substrate. The acetylated amylopectin used had a specific dielectric constant of 16. The results of the evaluation are shown in Table 1. [Example 4] . φ In addition to the dielectric layer '(C), the weight ratio of acetaminolated amylopectin (manufactured by Hayashibara Corporation) to cyanoethyl amylopectin (manufactured by Shin-Etsu Chemical Co., Ltd.) was A composite transparent conductive substrate was produced in the same manner as in Example 1 except that 50%/50% was used in combination to replace the cyanoethyl amylopectin. The specific dielectric constant 丨7 is obtained when the weight ratio of acetaminolated amylopectin to cyanoethyl amylopectin is 50%/5 0%. The results of the evaluation are shown in Table 1. -21 - 1376700 Table 1 Surface resistance 値Q/D Total light transmittance % b*値(R/R〇) Maximum number of renderings (10,000 times) Example 1 440 93 -0.39 1.02 11 Comparative Example 1 410 86 2.95 1.01 0.5 Example 2 456 89 1.03 16 Comparative Example 2 460 85 1.4 10 Example 3 489 90 1.04 10 Example 4 500 92 1.03 11 [Industrial Applicability] It can be used as an interface necessary for humans to operate information machines. A composite transparent conductive substrate which is an important constituent member of a touch panel for φ. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing an example of a composite transparent substrate for a touch panel of the present invention. Fig. 2 is a schematic view showing an evaluation method for the change in resistance 因 caused by the drawing in the embodiment. Figure 3 is a graph showing the relationship between voltage and linearity as measured by the evaluation of Figure 2. 9 [Description of main component symbols] 1 Substrate composed of polymer film or sheet (A) 2 Transparent conductive layer (B) 3 Dielectric layer (C) 4 Surface hardened layer (D) -22-