TWI370332B - Apparatus comprising a rotating contaminant trap - Google Patents

Apparatus comprising a rotating contaminant trap

Info

Publication number
TWI370332B
TWI370332B TW096134619A TW96134619A TWI370332B TW I370332 B TWI370332 B TW I370332B TW 096134619 A TW096134619 A TW 096134619A TW 96134619 A TW96134619 A TW 96134619A TW I370332 B TWI370332 B TW I370332B
Authority
TW
Taiwan
Prior art keywords
rotor
contaminant trap
radiation beam
electrical discharge
radiation source
Prior art date
Application number
TW096134619A
Other languages
English (en)
Other versions
TW200823606A (en
Inventor
Johannes Christiaan Leonardus Franken
Vadim Yevgenyevich Banine
Arnoud Cornelis Wassink
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200823606A publication Critical patent/TW200823606A/zh
Application granted granted Critical
Publication of TWI370332B publication Critical patent/TWI370332B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0681—Construction or mounting aspects of hydrostatic bearings, for exclusively rotary movement, related to the direction of load
    • F16C32/0685—Construction or mounting aspects of hydrostatic bearings, for exclusively rotary movement, related to the direction of load for radial load only
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02—Parts of sliding-contact bearings
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/72—Sealings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2300/00—Application independent of particular apparatuses
    • F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
    • F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Centrifugal Separators (AREA)
  • Electrostatic Separation (AREA)
  • Filtering Of Dispersed Particles In Gases (AREA)
  • Filtration Of Liquid (AREA)
  • Sink And Installation For Waste Water (AREA)
  • Sanitary Device For Flush Toilet (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • X-Ray Techniques (AREA)
TW096134619A 2006-09-22 2007-09-14 Apparatus comprising a rotating contaminant trap TWI370332B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/525,225 US7889312B2 (en) 2006-09-22 2006-09-22 Apparatus comprising a rotating contaminant trap

Publications (2)

Publication Number Publication Date
TW200823606A TW200823606A (en) 2008-06-01
TWI370332B true TWI370332B (en) 2012-08-11

Family

ID=39186198

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096134619A TWI370332B (en) 2006-09-22 2007-09-14 Apparatus comprising a rotating contaminant trap

Country Status (9)

Country Link
US (2) US7889312B2 (zh)
EP (1) EP2076818B1 (zh)
JP (2) JP4852152B2 (zh)
KR (1) KR101044751B1 (zh)
CN (2) CN102402136A (zh)
AT (1) ATE453136T1 (zh)
DE (1) DE602007004002D1 (zh)
TW (1) TWI370332B (zh)
WO (1) WO2008035965A2 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap
US8018576B2 (en) 2007-03-23 2011-09-13 Asml Netherlands B.V. Contamination prevention system, a lithographic apparatus, a radiation source and a method for manufacturing a device
JP5475693B2 (ja) 2008-02-28 2014-04-16 コーニンクレッカ フィリップス エヌ ヴェ 回転フォイルトラップ及び駆動装置を持つデブリ低減装置
NL1036803A (nl) * 2008-09-09 2010-03-15 Asml Netherlands Bv Radiation system and lithographic apparatus.
WO2010072429A1 (en) 2008-12-22 2010-07-01 Asml Netherlands B.V. A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method
DE102009056241B4 (de) 2009-12-01 2012-07-12 Von Ardenne Anlagentechnik Gmbh Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target
JP6480339B2 (ja) * 2012-11-15 2019-03-06 エーエスエムエル ネザーランズ ビー．ブイ． 放射源およびリソグラフィのための方法
CN103108480B (zh) * 2012-11-22 2015-09-23 中国科学院微电子研究所 一种euv光源污染物收集装置
WO2014154433A1 (en) 2013-03-27 2014-10-02 Asml Netherlands B.V. Radiation collector, radiation source and lithographic apparatus
JP6135410B2 (ja) * 2013-09-06 2017-05-31 ウシオ電機株式会社 ホイルトラップ及びこのホイルトラップを用いた光源装置
NL2013493A (en) * 2013-10-16 2015-04-20 Asml Netherlands Bv Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method.
WO2018046280A1 (en) * 2016-09-09 2018-03-15 Asml Holding N.V. Lithographic apparatus and support structures background

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
JP2000511681A (ja) * 1997-04-04 2000-09-05 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 記録／再生装置に使用する回転可能な構成部材を支持するための軸受け
US6126169A (en) 1998-01-23 2000-10-03 Nikon Corporation Air bearing operable in a vacuum region
NL1008352C2 (nl) * 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2002102750A (ja) * 2000-09-29 2002-04-09 Ntn Corp 静電塗装機用スピンドル
JP2003022950A (ja) * 2001-07-05 2003-01-24 Canon Inc Ｘ線光源用デブリ除去装置及び、デブリ除去装置を用いた露光装置
CN101469742B (zh) * 2001-11-13 2010-12-15 Ntn株式会社 流体轴承装置
DE10237901B3 (de) 2002-08-16 2004-05-27 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von Teilchenemission bei der Strahlungserzeugung einer Röntgenstrahlungsquelle
KR100748447B1 (ko) * 2002-08-23 2007-08-10 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어
JP3813959B2 (ja) * 2002-11-22 2006-08-23 エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ 複数の抑制メッシュを備えたリトグラフ投影装置
US6963071B2 (en) * 2002-11-25 2005-11-08 Intel Corporation Debris mitigation device
TWI230847B (en) * 2002-12-23 2005-04-11 Asml Netherlands Bv Contamination barrier with expandable lamellas
TWI255394B (en) * 2002-12-23 2006-05-21 Asml Netherlands Bv Lithographic apparatus with debris suppression means and device manufacturing method
SG118268A1 (en) * 2003-06-27 2006-01-27 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7161653B2 (en) * 2004-09-20 2007-01-09 Asml Netherlands B.V. Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus
SG123770A1 (en) 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, radiation system and filt er system
US8018574B2 (en) * 2005-06-30 2011-09-13 Asml Netherlands B.V. Lithographic apparatus, radiation system and device manufacturing method
US7368733B2 (en) 2006-03-30 2008-05-06 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
US7889312B2 (en) * 2006-09-22 2011-02-15 Asml Netherlands B.V. Apparatus comprising a rotating contaminant trap

Also Published As

Publication number Publication date
TW200823606A (en) 2008-06-01
US20100259733A1 (en) 2010-10-14
US20110096308A1 (en) 2011-04-28
US7889312B2 (en) 2011-02-15
CN101517490B (zh) 2011-12-28
JP4852152B2 (ja) 2012-01-11
KR20090055012A (ko) 2009-06-01
EP2076818B1 (en) 2009-12-23
JP5323161B2 (ja) 2013-10-23
EP2076818A2 (en) 2009-07-08
KR101044751B1 (ko) 2011-06-27
JP2012028813A (ja) 2012-02-09
CN102402136A (zh) 2012-04-04
ATE453136T1 (de) 2010-01-15
DE602007004002D1 (de) 2010-02-04
WO2008035965A2 (en) 2008-03-27
WO2008035965A3 (en) 2008-05-29
JP2010504642A (ja) 2010-02-12
CN101517490A (zh) 2009-08-26

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees