JP4852152B2 - 回転汚染物質トラップを含む装置 - Google Patents
回転汚染物質トラップを含む装置 Download PDFInfo
- Publication number
- JP4852152B2 JP4852152B2 JP2009529139A JP2009529139A JP4852152B2 JP 4852152 B2 JP4852152 B2 JP 4852152B2 JP 2009529139 A JP2009529139 A JP 2009529139A JP 2009529139 A JP2009529139 A JP 2009529139A JP 4852152 B2 JP4852152 B2 JP 4852152B2
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- Prior art keywords
- rotor
- gas
- shaft
- bearing
- discharge
- Prior art date
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- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
- F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
- F16C32/0681—Construction or mounting aspects of hydrostatic bearings, for exclusively rotary movement, related to the direction of load
- F16C32/0685—Construction or mounting aspects of hydrostatic bearings, for exclusively rotary movement, related to the direction of load for radial load only
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/72—Sealings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C2300/00—Application independent of particular apparatuses
- F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
- F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Nanotechnology (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Centrifugal Separators (AREA)
- Electrostatic Separation (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Filtration Of Liquid (AREA)
- Sink And Installation For Waste Water (AREA)
- Sanitary Device For Flush Toilet (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
- X-Ray Techniques (AREA)
Description
[0033] -放射ビームPB(例えば、UV放射または他の種類の放射)を調整するように構成された照明システム(イルミネータ)ILと、
[0034] -パターニングデバイス(例えば、マスク)MAを保持するように構成され、かつ特定のパラメータに従ってパターニングデバイスを正確に位置付けるように構成された第1のポジショナPMに連結されているサポート構造(例えば、マスクテーブル)MTと、
[0035] -基板(例えば、レジストコートウェーハ)Wを保持するように構成され、かつ特定のパラメータに従って基板を正確に位置付けるように構成された第2のポジショナPWに連結されている基板テーブル(例えば、ウェーハテーブル)WTと、
[0036] -パターニングデバイスMAによって放射ビームPBに付与されたパターンを基板Wのターゲット部分C(例えば、1つ以上のダイを含む)上に投影するように構成されている投影システムPSとを備える。
Claims (12)
- 放射ビームを生成する放射源から発散する汚染物質をトラップする、前記放射ビームのパスにおける汚染物質トラップ装置であって、
前記放射ビームの伝搬の方向に対して実質的に平行なチャネルを規定する複数のチャネル形成要素を有するロータであって、帯電可能材料を含み、前記放射源の動作の結果として帯電されるロータと、
前記ロータをロータ搬送構造に対して回転可能に保持するベアリングとを含み、
(i)前記ロータの放電を制御または方向転換させるか、(ii)前記ロータの放電を抑制するか、または(iii)(i)および(ii)の両方を行う、汚染物質トラップ装置。 - 前記ロータの放電は、前記ロータの導電性部分および前記ロータ搬送構造の導電性部分、電荷ドレイン、または両方と電気的接触している導電性カップリングによって制御される、請求項1に記載の装置。
- 前記電気的カップリングは、滑り接触を含む、請求項2に記載の装置。
- 前記ベアリングは、ロータシャフトと前記ロータ搬送構造との間に設けられた半径ガスベアリング構造を含み、前記ロータシャフトは、前記ロータと前記ロータ搬送構造のベアリング面との間の前記ガスベアリング構造における電荷の流れを防ぐために電気絶縁材料を含む、請求項1〜3のうちのいずれかに記載の装置。
- 前記ベアリングは、ロータシャフトの第1の部分と前記ロータ搬送構造の一部との間に設けられた半径ガスベアリング構造を含み、前記ガスベアリング構造は、前記ロータシャフトの第1の部分と前記ロータ搬送構造との間にガスまたはガス混合物を供給し、前記ガスベアリング構造の外のエリアで前記ロータシャフトとの放電を刺激するために前記ロータシャフトの別の第2の部分においてまたはその近くで、(i)放電刺激構造が提供されるか、(ii)放電刺激ガスまたはガス混合物が提供されるか、または(iii)(i)および(ii)の両方が行われ、前記第2のシャフト部は、前記ロータに取り付けられ、且つ前記帯電可能ロータ材料と電荷を交換することが可能である、請求項1〜4のうちのいずれかに記載の装置。
- 前記第2のシャフト部は、実質的に前記ガスベアリング構造に囲まれておらず、且つ前記ロータと前記第1のシャフト部との間に延在する、請求項5に記載の装置。
- 前記放電刺激ガスまたはガス混合物は、前記ベアリングガスまたはガス混合物より低い破壊電圧を有する、請求項5または6に記載の装置。
- 前記放電刺激構造は、前記第2のシャフト部の外面の近くの位置へと延在または延びる導電性電極を含み、前記電極は、電荷ドレインまたは電位源に接続されている、請求項5〜7のうちのいずれかに記載の装置。
- 前記ベアリングは、ロータシャフトの一部と前記ロータ搬送構造の一部との間に設けられた半径流体ベアリング構造を含み、前記流体ベアリング構造は、前記ロータシャフトと前記ロータ搬送構造との間に導電性パスを提供するために導電性流体または流体混合物を供給する、請求項1〜8のうちのいずれかに記載の装置。
- 前記ベアリングは半径ガスベアリング構造を含み、前記チャネル形成要素は前記チャネルを規定するプレートを含み、前記プレートは前記放射ビームの伝搬の方向に対して実質的に平行であり、ロータシャフトの一部は前記ガスベアリング構造へと延びる、請求項1〜9のうちのいずれかに記載の装置。
- 前記放射源を含む放射システムをさらに含む、請求項1〜10のうちのいずれかに記載の装置。
- 請求項1〜11のいずれか一項に記載の汚染物質トラップ装置を含む、リソグラフィ装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/525,225 US7889312B2 (en) | 2006-09-22 | 2006-09-22 | Apparatus comprising a rotating contaminant trap |
US11/525,225 | 2006-09-22 | ||
PCT/NL2007/050451 WO2008035965A2 (en) | 2006-09-22 | 2007-09-17 | Apparatus comprising a rotating contaminant trap |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011231451A Division JP5323161B2 (ja) | 2006-09-22 | 2011-10-21 | 汚染物質をトラップする方法及び装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010504642A JP2010504642A (ja) | 2010-02-12 |
JP4852152B2 true JP4852152B2 (ja) | 2012-01-11 |
Family
ID=39186198
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009529139A Expired - Fee Related JP4852152B2 (ja) | 2006-09-22 | 2007-09-17 | 回転汚染物質トラップを含む装置 |
JP2011231451A Expired - Fee Related JP5323161B2 (ja) | 2006-09-22 | 2011-10-21 | 汚染物質をトラップする方法及び装置 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011231451A Expired - Fee Related JP5323161B2 (ja) | 2006-09-22 | 2011-10-21 | 汚染物質をトラップする方法及び装置 |
Country Status (9)
Country | Link |
---|---|
US (2) | US7889312B2 (ja) |
EP (1) | EP2076818B1 (ja) |
JP (2) | JP4852152B2 (ja) |
KR (1) | KR101044751B1 (ja) |
CN (2) | CN102402136A (ja) |
AT (1) | ATE453136T1 (ja) |
DE (1) | DE602007004002D1 (ja) |
TW (1) | TWI370332B (ja) |
WO (1) | WO2008035965A2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7889312B2 (en) * | 2006-09-22 | 2011-02-15 | Asml Netherlands B.V. | Apparatus comprising a rotating contaminant trap |
US8018576B2 (en) | 2007-03-23 | 2011-09-13 | Asml Netherlands B.V. | Contamination prevention system, a lithographic apparatus, a radiation source and a method for manufacturing a device |
JP5475693B2 (ja) | 2008-02-28 | 2014-04-16 | コーニンクレッカ フィリップス エヌ ヴェ | 回転フォイルトラップ及び駆動装置を持つデブリ低減装置 |
NL1036803A (nl) * | 2008-09-09 | 2010-03-15 | Asml Netherlands Bv | Radiation system and lithographic apparatus. |
WO2010072429A1 (en) | 2008-12-22 | 2010-07-01 | Asml Netherlands B.V. | A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method |
DE102009056241B4 (de) | 2009-12-01 | 2012-07-12 | Von Ardenne Anlagentechnik Gmbh | Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target |
JP6480339B2 (ja) * | 2012-11-15 | 2019-03-06 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源およびリソグラフィのための方法 |
CN103108480B (zh) * | 2012-11-22 | 2015-09-23 | 中国科学院微电子研究所 | 一种euv光源污染物收集装置 |
WO2014154433A1 (en) | 2013-03-27 | 2014-10-02 | Asml Netherlands B.V. | Radiation collector, radiation source and lithographic apparatus |
JP6135410B2 (ja) * | 2013-09-06 | 2017-05-31 | ウシオ電機株式会社 | ホイルトラップ及びこのホイルトラップを用いた光源装置 |
NL2013493A (en) * | 2013-10-16 | 2015-04-20 | Asml Netherlands Bv | Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method. |
WO2018046280A1 (en) * | 2016-09-09 | 2018-03-15 | Asml Holding N.V. | Lithographic apparatus and support structures background |
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JP2002102750A (ja) * | 2000-09-29 | 2002-04-09 | Ntn Corp | 静電塗装機用スピンドル |
JP2004207736A (ja) * | 2002-12-23 | 2004-07-22 | Asml Netherlands Bv | デブリ抑制手段を備えたリソグラフィ装置およびデバイス製造方法 |
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JP2006191061A (ja) * | 2004-12-28 | 2006-07-20 | Asml Netherlands Bv | リソグラフィ装置、放射系およびフィルタ装置 |
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JP2000511681A (ja) * | 1997-04-04 | 2000-09-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 記録/再生装置に使用する回転可能な構成部材を支持するための軸受け |
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NL1008352C2 (nl) * | 1998-02-19 | 1999-08-20 | Stichting Tech Wetenschapp | Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden. |
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CN101469742B (zh) * | 2001-11-13 | 2010-12-15 | Ntn株式会社 | 流体轴承装置 |
DE10237901B3 (de) | 2002-08-16 | 2004-05-27 | Xtreme Technologies Gmbh | Anordnung zur Unterdrückung von Teilchenemission bei der Strahlungserzeugung einer Röntgenstrahlungsquelle |
KR100748447B1 (ko) * | 2002-08-23 | 2007-08-10 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 투영장치 및 상기 장치에 사용하기 위한파티클 배리어 |
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TWI230847B (en) * | 2002-12-23 | 2005-04-11 | Asml Netherlands Bv | Contamination barrier with expandable lamellas |
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US7161653B2 (en) * | 2004-09-20 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus having a contaminant trapping system, a contamination trapping system, a device manufacturing method, and a method for improving trapping of contaminants in a lithographic apparatus |
US8018574B2 (en) * | 2005-06-30 | 2011-09-13 | Asml Netherlands B.V. | Lithographic apparatus, radiation system and device manufacturing method |
US7368733B2 (en) | 2006-03-30 | 2008-05-06 | Asml Netherlands B.V. | Contamination barrier and lithographic apparatus comprising same |
US7889312B2 (en) * | 2006-09-22 | 2011-02-15 | Asml Netherlands B.V. | Apparatus comprising a rotating contaminant trap |
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2006
- 2006-09-22 US US11/525,225 patent/US7889312B2/en not_active Expired - Fee Related
-
2007
- 2007-09-14 TW TW096134619A patent/TWI370332B/zh not_active IP Right Cessation
- 2007-09-17 DE DE602007004002T patent/DE602007004002D1/de active Active
- 2007-09-17 KR KR1020097005960A patent/KR101044751B1/ko not_active IP Right Cessation
- 2007-09-17 JP JP2009529139A patent/JP4852152B2/ja not_active Expired - Fee Related
- 2007-09-17 CN CN2011104332430A patent/CN102402136A/zh active Pending
- 2007-09-17 CN CN2007800351237A patent/CN101517490B/zh not_active Expired - Fee Related
- 2007-09-17 AT AT07808582T patent/ATE453136T1/de not_active IP Right Cessation
- 2007-09-17 WO PCT/NL2007/050451 patent/WO2008035965A2/en active Application Filing
- 2007-09-17 EP EP07808582A patent/EP2076818B1/en not_active Not-in-force
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2011
- 2011-01-05 US US12/985,014 patent/US20110096308A1/en not_active Abandoned
- 2011-10-21 JP JP2011231451A patent/JP5323161B2/ja not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002102750A (ja) * | 2000-09-29 | 2002-04-09 | Ntn Corp | 静電塗装機用スピンドル |
JP2004207736A (ja) * | 2002-12-23 | 2004-07-22 | Asml Netherlands Bv | デブリ抑制手段を備えたリソグラフィ装置およびデバイス製造方法 |
JP2005020006A (ja) * | 2003-06-27 | 2005-01-20 | Asml Netherlands Bv | フォイル・トラップを備えたレーザー生成プラズマ放射システム |
JP2006191061A (ja) * | 2004-12-28 | 2006-07-20 | Asml Netherlands Bv | リソグラフィ装置、放射系およびフィルタ装置 |
Also Published As
Publication number | Publication date |
---|---|
TW200823606A (en) | 2008-06-01 |
US20100259733A1 (en) | 2010-10-14 |
US20110096308A1 (en) | 2011-04-28 |
US7889312B2 (en) | 2011-02-15 |
CN101517490B (zh) | 2011-12-28 |
KR20090055012A (ko) | 2009-06-01 |
EP2076818B1 (en) | 2009-12-23 |
JP5323161B2 (ja) | 2013-10-23 |
EP2076818A2 (en) | 2009-07-08 |
KR101044751B1 (ko) | 2011-06-27 |
JP2012028813A (ja) | 2012-02-09 |
CN102402136A (zh) | 2012-04-04 |
ATE453136T1 (de) | 2010-01-15 |
DE602007004002D1 (de) | 2010-02-04 |
WO2008035965A2 (en) | 2008-03-27 |
TWI370332B (en) | 2012-08-11 |
WO2008035965A3 (en) | 2008-05-29 |
JP2010504642A (ja) | 2010-02-12 |
CN101517490A (zh) | 2009-08-26 |
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