TWI370156B - - Google Patents

Info

Publication number
TWI370156B
TWI370156B TW094108471A TW94108471A TWI370156B TW I370156 B TWI370156 B TW I370156B TW 094108471 A TW094108471 A TW 094108471A TW 94108471 A TW94108471 A TW 94108471A TW I370156 B TWI370156 B TW I370156B
Authority
TW
Taiwan
Application number
TW094108471A
Other languages
Chinese (zh)
Other versions
TW200604277A (en
Inventor
Hiroomi Shimomura
Mitsunobu Doimoto
Tetsuya Yamamura
Takayoshi Tanabe
Hideaki Takase
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200604277A publication Critical patent/TW200604277A/zh
Application granted granted Critical
Publication of TWI370156B publication Critical patent/TWI370156B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/42Gloss-reducing agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025Crosslinking or vulcanising agents; including accelerators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
TW094108471A 2004-03-18 2005-03-18 Liquid curable resin composition, cured film and multilayer body TW200604277A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004077447 2004-03-18
JP2004331266 2004-11-15
JP2005021459 2005-01-28

Publications (2)

Publication Number Publication Date
TW200604277A TW200604277A (en) 2006-02-01
TWI370156B true TWI370156B (enExample) 2012-08-11

Family

ID=34993660

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108471A TW200604277A (en) 2004-03-18 2005-03-18 Liquid curable resin composition, cured film and multilayer body

Country Status (4)

Country Link
JP (1) JP4867658B2 (enExample)
KR (1) KR100896123B1 (enExample)
TW (1) TW200604277A (enExample)
WO (1) WO2005090470A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4715746B2 (ja) * 2004-03-18 2011-07-06 Jsr株式会社 積層体の製造方法
JP2007229999A (ja) * 2006-02-28 2007-09-13 Jsr Corp 反射防止積層体
FR2930996B1 (fr) * 2008-05-07 2010-08-27 Christian Dalloz Sunoptics Nouveau type de verre pour lunettes et son procede d'obtention
JP2009286981A (ja) * 2008-06-02 2009-12-10 Toppan Printing Co Ltd ハードコート塗液、ハードコートフィルム、偏光板及び透過型液晶表示装置
US20110287251A1 (en) * 2009-02-13 2011-11-24 Whitford Corporation Nanoparticle-modified fluoropolymer coatings
JP6537364B2 (ja) * 2014-06-19 2019-07-03 関西ペイント株式会社 基材の被膜形成方法
CN110168002A (zh) 2016-12-28 2019-08-23 3M创新有限公司 含硅卤化弹性体
WO2019126298A1 (en) 2017-12-22 2019-06-27 3M Innovative Properties Company Peroxide-cured halogenated elastomers having a silicon-containing superficial layer
JP7006518B2 (ja) * 2018-06-13 2022-01-24 Agc株式会社 加飾フィルムの製造方法、加飾フィルム付き3次元成形品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10339971A (ja) * 1997-06-09 1998-12-22 Ricoh Co Ltd 静電荷像現像用現像剤
JP4078704B2 (ja) * 1998-02-12 2008-04-23 Jsr株式会社 反射防止膜
JP4081929B2 (ja) 1998-08-04 2008-04-30 Jsr株式会社 光硬化性樹脂組成物および硬化膜
JP2003261797A (ja) * 2002-03-12 2003-09-19 Sumitomo Chem Co Ltd 硬化被膜が形成された透明基材
JP2004317734A (ja) * 2003-04-15 2004-11-11 Fuji Photo Film Co Ltd 反射防止膜、その製造方法、反射防止フィルムおよび画像表示装置

Also Published As

Publication number Publication date
JP4867658B2 (ja) 2012-02-01
KR20060124764A (ko) 2006-12-05
JPWO2005090470A1 (ja) 2008-01-31
WO2005090470A1 (ja) 2005-09-29
TW200604277A (en) 2006-02-01
KR100896123B1 (ko) 2009-05-07

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent