TWI369359B - Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins - Google Patents
Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resinsInfo
- Publication number
- TWI369359B TWI369359B TW096132568A TW96132568A TWI369359B TW I369359 B TWI369359 B TW I369359B TW 096132568 A TW096132568 A TW 096132568A TW 96132568 A TW96132568 A TW 96132568A TW I369359 B TWI369359 B TW I369359B
- Authority
- TW
- Taiwan
- Prior art keywords
- nitrogen
- decomposition
- oxygen
- weakly basic
- basic ion
- Prior art date
Links
- 150000001282 organosilanes Chemical class 0.000 title abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title abstract 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052760 oxygen Inorganic materials 0.000 title abstract 2
- 239000001301 oxygen Substances 0.000 title abstract 2
- 239000003456 ion exchange resin Substances 0.000 title 1
- 229920003303 ion-exchange polymer Polymers 0.000 title 1
- 230000006641 stabilisation Effects 0.000 title 1
- 238000011105 stabilization Methods 0.000 title 1
- 238000000354 decomposition reaction Methods 0.000 abstract 4
- 239000002253 acid Substances 0.000 abstract 2
- 150000001450 anions Chemical class 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
- 239000012500 ion exchange media Substances 0.000 abstract 1
- 230000007774 longterm Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- -1 nitrogen-containing organosilane Chemical class 0.000 abstract 1
- 230000002000 scavenging effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicon Polymers (AREA)
- Formation Of Insulating Films (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/514,650 US7442822B2 (en) | 2006-09-01 | 2006-09-01 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200813078A TW200813078A (en) | 2008-03-16 |
TWI369359B true TWI369359B (en) | 2012-08-01 |
Family
ID=38738949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096132568A TWI369359B (en) | 2006-09-01 | 2007-08-31 | Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins |
Country Status (8)
Country | Link |
---|---|
US (1) | US7442822B2 (zh) |
EP (1) | EP1894934B1 (zh) |
JP (1) | JP4851405B2 (zh) |
KR (1) | KR100967768B1 (zh) |
CN (1) | CN101134761B (zh) |
AT (1) | ATE471327T1 (zh) |
DE (1) | DE602007007160D1 (zh) |
TW (1) | TWI369359B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009001088A1 (de) * | 2009-02-23 | 2010-08-26 | Wacker Chemie Ag | Verfahren zur Herstellung und Stabilisierung von Oligoaminosilanen |
DE102011006053A1 (de) * | 2011-03-24 | 2012-09-27 | Evonik Degussa Gmbh | Verfahren zur Dechlorierung von alkylfunktionellen Organosilanen und alkylfunktionellen Organosiloxanen |
WO2013005748A1 (ja) * | 2011-07-04 | 2013-01-10 | 三菱化学株式会社 | 1,4-ブタンジオールの製造方法 |
KR101965923B1 (ko) | 2011-11-08 | 2019-04-04 | 닛산 가가쿠 가부시키가이샤 | 실란올기 함유 폴리실록산 용액의 안정화 방법, 안정화 실란올기 함유 폴리실록산 용액의 제조 방법 및 안정화 실란올기 함유 폴리실록산 용액 |
US9978585B2 (en) | 2012-06-01 | 2018-05-22 | Versum Materials Us, Llc | Organoaminodisilane precursors and methods for depositing films comprising same |
US9337018B2 (en) | 2012-06-01 | 2016-05-10 | Air Products And Chemicals, Inc. | Methods for depositing films with organoaminodisilane precursors |
TWI716333B (zh) | 2015-03-30 | 2021-01-11 | 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 | 碳矽烷與氨、胺類及脒類之觸媒去氫耦合 |
TWI724141B (zh) * | 2016-03-23 | 2021-04-11 | 法商液態空氣喬治斯克勞帝方法硏究開發股份有限公司 | 形成含矽膜之組成物及其製法與用途 |
KR20180110612A (ko) | 2017-03-29 | 2018-10-10 | (주)디엔에프 | 비스(아미노실릴)알킬아민 화합물을 포함하는 실리콘 함유 박막증착용 조성물 및 이를 이용하는 실리콘 함유 박막의 제조방법 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2834648A (en) | 1953-03-25 | 1958-05-13 | Union Carbide Corp | Disproportionation of chlorosilanes employing amine-type catalysts |
US3928542A (en) | 1974-04-05 | 1975-12-23 | Union Carbide Corp | Process for the preparation of anion exchange resin for use in the redistribution of chlorosilanes |
DE2800017C2 (de) | 1978-01-02 | 1983-05-26 | Dynamit Nobel Ag, 5210 Troisdorf | Verfahren zur Herstellung von Organoalkoxysilanen |
US4357473A (en) | 1979-11-01 | 1982-11-02 | Olin Corporation | Method for preparing alkoxysilane cluster compounds; resulting novel compounds; and their use as functional fluids |
US4368313A (en) | 1981-09-18 | 1983-01-11 | General Electric Company | Stabilization of silanol hydrolysates of organosilanes |
JPH0753574B2 (ja) | 1985-06-11 | 1995-06-07 | 三井東圧化学株式会社 | シラン類の不均化方法 |
US4709067A (en) | 1986-05-20 | 1987-11-24 | Union Carbide Corporation | Method for preparing methacryloxy and acryloxy containing organosilanes and organosilicones |
US4798889A (en) | 1987-11-13 | 1989-01-17 | Dow Corning Corporation | Method for stabilizing unsaturated organosilicone compositions |
US4900520A (en) | 1988-10-31 | 1990-02-13 | Gaf Chemicals Corporation | Process for removal of soluble platinum group metal catalysts from liquid product mixtures |
US4924022A (en) * | 1989-10-04 | 1990-05-08 | Dow Corning Corporation | Method for preparation of organoalkoxysilanes |
US6963006B2 (en) | 2003-01-15 | 2005-11-08 | Air Products And Chemicals, Inc. | Process for the production and purification of bis(tertiary-butylamino)silane |
-
2006
- 2006-09-01 US US11/514,650 patent/US7442822B2/en active Active
-
2007
- 2007-08-29 KR KR1020070087114A patent/KR100967768B1/ko active IP Right Grant
- 2007-08-31 CN CN200710142253.2A patent/CN101134761B/zh active Active
- 2007-08-31 DE DE602007007160T patent/DE602007007160D1/de active Active
- 2007-08-31 JP JP2007225899A patent/JP4851405B2/ja not_active Expired - Fee Related
- 2007-08-31 EP EP07115415A patent/EP1894934B1/en active Active
- 2007-08-31 AT AT07115415T patent/ATE471327T1/de not_active IP Right Cessation
- 2007-08-31 TW TW096132568A patent/TWI369359B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US7442822B2 (en) | 2008-10-28 |
KR100967768B1 (ko) | 2010-07-05 |
ATE471327T1 (de) | 2010-07-15 |
KR20080020950A (ko) | 2008-03-06 |
CN101134761B (zh) | 2015-05-06 |
TW200813078A (en) | 2008-03-16 |
EP1894934A1 (en) | 2008-03-05 |
JP2008074847A (ja) | 2008-04-03 |
CN101134761A (zh) | 2008-03-05 |
EP1894934B1 (en) | 2010-06-16 |
US20080058541A1 (en) | 2008-03-06 |
JP4851405B2 (ja) | 2012-01-11 |
DE602007007160D1 (de) | 2010-07-29 |
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Legal Events
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MM4A | Annulment or lapse of patent due to non-payment of fees |