TWI368932B - Exposure apparatus and method - Google Patents

Exposure apparatus and method

Info

Publication number
TWI368932B
TWI368932B TW094107607A TW94107607A TWI368932B TW I368932 B TWI368932 B TW I368932B TW 094107607 A TW094107607 A TW 094107607A TW 94107607 A TW94107607 A TW 94107607A TW I368932 B TWI368932 B TW I368932B
Authority
TW
Taiwan
Prior art keywords
exposure apparatus
exposure
Prior art date
Application number
TW094107607A
Other languages
English (en)
Other versions
TW200539266A (en
Inventor
Young-Mi Tak
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW200539266A publication Critical patent/TW200539266A/zh
Application granted granted Critical
Publication of TWI368932B publication Critical patent/TWI368932B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J36/00—Parts, details or accessories of cooking-vessels
    • A47J36/06—Lids or covers for cooking-vessels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/50—Projection printing apparatus, e.g. enlarger, copying camera with slit or like diaphragm moving over original for progressive exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
    • A47J27/00—Cooking-vessels
    • A47J27/08—Pressure-cookers; Lids or locking devices specially adapted therefor
    • A47J27/086—Pressure-cookers; Lids or locking devices specially adapted therefor with built-in heating means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094107607A 2004-03-13 2005-03-11 Exposure apparatus and method TWI368932B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20040017178A KR101016577B1 (ko) 2004-03-13 2004-03-13 노광 장치 및 방법

Publications (2)

Publication Number Publication Date
TW200539266A TW200539266A (en) 2005-12-01
TWI368932B true TWI368932B (en) 2012-07-21

Family

ID=34918803

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094107607A TWI368932B (en) 2004-03-13 2005-03-11 Exposure apparatus and method

Country Status (5)

Country Link
US (1) US7612864B2 (zh)
JP (1) JP4759290B2 (zh)
KR (1) KR101016577B1 (zh)
CN (1) CN100465791C (zh)
TW (1) TWI368932B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100758228B1 (ko) * 2006-02-10 2007-09-12 삼성전기주식회사 노광장치 및 노광방법
JP5787472B2 (ja) * 2009-07-14 2015-09-30 セイコーインスツル株式会社 半導体露光装置
JP5867916B2 (ja) * 2011-12-06 2016-02-24 国立研究開発法人産業技術総合研究所 露光装置および露光方法
KR101691570B1 (ko) * 2015-03-30 2016-12-30 주식회사 아바코 노광 장치
KR102423858B1 (ko) * 2015-09-18 2022-07-21 엘지디스플레이 주식회사 노광장치 및 이를 이용한 노광방법

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62254137A (ja) * 1986-04-28 1987-11-05 Oak Seisakusho:Kk 平行光移動型露光装置
JPH02297918A (ja) * 1989-05-12 1990-12-10 Nikon Corp 投影光学装置
JPH03197949A (ja) * 1989-12-26 1991-08-29 Nec Corp 半導体集積回路装置製造用フォトレチクル
US5617182A (en) * 1993-11-22 1997-04-01 Nikon Corporation Scanning exposure method
TW447009B (en) * 1999-02-12 2001-07-21 Nippon Kogaku Kk Scanning exposure method and scanning type exposure device
JP2000298354A (ja) * 1999-04-13 2000-10-24 Nikon Corp 走査型露光方法および走査型露光装置
JP2000331909A (ja) * 1999-05-19 2000-11-30 Nikon Corp 走査型露光装置
JP2001203150A (ja) * 2000-01-21 2001-07-27 Nikon Corp ホローアパーチャ、荷電粒子線露光装置、荷電粒子線露光装置におけるビームの位置合わせ方法、荷電粒子線量の調整方法、荷電粒子線発生源の調整方法、及び半導体デバイスの製造方法
JP2001215717A (ja) * 2000-02-02 2001-08-10 Nikon Corp 走査露光方法および走査型露光装置
JP2002353108A (ja) * 2001-05-24 2002-12-06 Nikon Corp 露光方法、露光装置、フォトマスク、デバイス製造方法、及びフォトマスク製造方法
JP2002351084A (ja) * 2001-05-25 2002-12-04 Mitsubishi Electric Corp 露光光源装置
JP2003031122A (ja) 2001-07-13 2003-01-31 Toshiba Corp 露光装置及び蛍光体スクリーン形成方法
JP2003282421A (ja) * 2002-03-26 2003-10-03 Seiko Epson Corp 露光装置及び露光方法
KR100673487B1 (ko) * 2002-04-17 2007-01-24 캐논 가부시끼가이샤 레티클 및 광학특성 계측방법
JP4168665B2 (ja) 2002-05-22 2008-10-22 株式会社ニコン 露光方法及び露光装置、デバイス製造方法

Also Published As

Publication number Publication date
CN100465791C (zh) 2009-03-04
KR101016577B1 (ko) 2011-02-22
US20050200822A1 (en) 2005-09-15
JP4759290B2 (ja) 2011-08-31
US7612864B2 (en) 2009-11-03
CN1667513A (zh) 2005-09-14
JP2005258437A (ja) 2005-09-22
TW200539266A (en) 2005-12-01
KR20050091983A (ko) 2005-09-16

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