TWI368932B - Exposure apparatus and method - Google Patents
Exposure apparatus and methodInfo
- Publication number
- TWI368932B TWI368932B TW094107607A TW94107607A TWI368932B TW I368932 B TWI368932 B TW I368932B TW 094107607 A TW094107607 A TW 094107607A TW 94107607 A TW94107607 A TW 94107607A TW I368932 B TWI368932 B TW I368932B
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure apparatus
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
- A47J36/00—Parts, details or accessories of cooking-vessels
- A47J36/06—Lids or covers for cooking-vessels
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/50—Projection printing apparatus, e.g. enlarger, copying camera with slit or like diaphragm moving over original for progressive exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47J—KITCHEN EQUIPMENT; COFFEE MILLS; SPICE MILLS; APPARATUS FOR MAKING BEVERAGES
- A47J27/00—Cooking-vessels
- A47J27/08—Pressure-cookers; Lids or locking devices specially adapted therefor
- A47J27/086—Pressure-cookers; Lids or locking devices specially adapted therefor with built-in heating means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Food Science & Technology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20040017178A KR101016577B1 (ko) | 2004-03-13 | 2004-03-13 | 노광 장치 및 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200539266A TW200539266A (en) | 2005-12-01 |
TWI368932B true TWI368932B (en) | 2012-07-21 |
Family
ID=34918803
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094107607A TWI368932B (en) | 2004-03-13 | 2005-03-11 | Exposure apparatus and method |
Country Status (5)
Country | Link |
---|---|
US (1) | US7612864B2 (zh) |
JP (1) | JP4759290B2 (zh) |
KR (1) | KR101016577B1 (zh) |
CN (1) | CN100465791C (zh) |
TW (1) | TWI368932B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100758228B1 (ko) * | 2006-02-10 | 2007-09-12 | 삼성전기주식회사 | 노광장치 및 노광방법 |
JP5787472B2 (ja) * | 2009-07-14 | 2015-09-30 | セイコーインスツル株式会社 | 半導体露光装置 |
JP5867916B2 (ja) * | 2011-12-06 | 2016-02-24 | 国立研究開発法人産業技術総合研究所 | 露光装置および露光方法 |
KR101691570B1 (ko) * | 2015-03-30 | 2016-12-30 | 주식회사 아바코 | 노광 장치 |
KR102423858B1 (ko) * | 2015-09-18 | 2022-07-21 | 엘지디스플레이 주식회사 | 노광장치 및 이를 이용한 노광방법 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62254137A (ja) * | 1986-04-28 | 1987-11-05 | Oak Seisakusho:Kk | 平行光移動型露光装置 |
JPH02297918A (ja) * | 1989-05-12 | 1990-12-10 | Nikon Corp | 投影光学装置 |
JPH03197949A (ja) * | 1989-12-26 | 1991-08-29 | Nec Corp | 半導体集積回路装置製造用フォトレチクル |
US5617182A (en) * | 1993-11-22 | 1997-04-01 | Nikon Corporation | Scanning exposure method |
TW447009B (en) * | 1999-02-12 | 2001-07-21 | Nippon Kogaku Kk | Scanning exposure method and scanning type exposure device |
JP2000298354A (ja) * | 1999-04-13 | 2000-10-24 | Nikon Corp | 走査型露光方法および走査型露光装置 |
JP2000331909A (ja) * | 1999-05-19 | 2000-11-30 | Nikon Corp | 走査型露光装置 |
JP2001203150A (ja) * | 2000-01-21 | 2001-07-27 | Nikon Corp | ホローアパーチャ、荷電粒子線露光装置、荷電粒子線露光装置におけるビームの位置合わせ方法、荷電粒子線量の調整方法、荷電粒子線発生源の調整方法、及び半導体デバイスの製造方法 |
JP2001215717A (ja) * | 2000-02-02 | 2001-08-10 | Nikon Corp | 走査露光方法および走査型露光装置 |
JP2002353108A (ja) * | 2001-05-24 | 2002-12-06 | Nikon Corp | 露光方法、露光装置、フォトマスク、デバイス製造方法、及びフォトマスク製造方法 |
JP2002351084A (ja) * | 2001-05-25 | 2002-12-04 | Mitsubishi Electric Corp | 露光光源装置 |
JP2003031122A (ja) | 2001-07-13 | 2003-01-31 | Toshiba Corp | 露光装置及び蛍光体スクリーン形成方法 |
JP2003282421A (ja) * | 2002-03-26 | 2003-10-03 | Seiko Epson Corp | 露光装置及び露光方法 |
KR100673487B1 (ko) * | 2002-04-17 | 2007-01-24 | 캐논 가부시끼가이샤 | 레티클 및 광학특성 계측방법 |
JP4168665B2 (ja) | 2002-05-22 | 2008-10-22 | 株式会社ニコン | 露光方法及び露光装置、デバイス製造方法 |
-
2004
- 2004-03-13 KR KR20040017178A patent/KR101016577B1/ko active IP Right Grant
-
2005
- 2005-03-03 CN CNB2005100512918A patent/CN100465791C/zh active Active
- 2005-03-04 US US11/072,075 patent/US7612864B2/en active Active
- 2005-03-07 JP JP2005061843A patent/JP4759290B2/ja active Active
- 2005-03-11 TW TW094107607A patent/TWI368932B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN100465791C (zh) | 2009-03-04 |
KR101016577B1 (ko) | 2011-02-22 |
US20050200822A1 (en) | 2005-09-15 |
JP4759290B2 (ja) | 2011-08-31 |
US7612864B2 (en) | 2009-11-03 |
CN1667513A (zh) | 2005-09-14 |
JP2005258437A (ja) | 2005-09-22 |
TW200539266A (en) | 2005-12-01 |
KR20050091983A (ko) | 2005-09-16 |
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