TWI362697B - Methods and apparatus for processing a substrate - Google Patents

Description

1362697 IX. Description of the Invention: TECHNICAL FIELD OF THE INVENTION The present invention relates generally to substrate processing, and in particular to methods and apparatus for cleaning the edges of substrates. [Prior Art]

Conventional systems use an abrasive film to contact the edges of the substrate to clean the edges, and conventional systems do not completely clean the edges. For example, the abrasive film does not sufficiently contact the two bevels of the edge during cleaning. In addition, the abrasive film wears out with use, and thus loses the ability to clean the substrate and needs to be replaced from time to time, which affects the manufacturing capacity of the semiconductor component. Therefore, what is desired is a method and apparatus that can improve the edge of a clean substrate. [Summary of the Invention]

In a first aspect of the invention, an apparatus for polishing an edge of a substrate comprises: an abrasive film; a frame adapted to tension the abrasive film such that at least a portion of the abrasive film is supported And a substrate rotary actuator adapted to rotate the substrate against the plane of the abrasive film such that the abrasive film can: apply tension to the substrate; contour conforming to the edge of the substrate, The edge includes at least one outer edge and a first bevel; and grinding the outer edge and the first bevel when the substrate is rotated. In a second aspect of the invention, one is suitable for grinding the edge of a substrate The apparatus comprises: a plurality of abrasive films; a frame adapted to tighten each of the abrasive films such that at least a portion of each of the abrasive films is supported on a respective 6 1362697

And a substrate rotary actuator adapted to abut against at least one of the respective planes of the abrasive films, such that when rotated, any abrasive film applied to the substrate is contoured to conform to The edge of the substrate and the grinding of the edge. In a third aspect of the invention, an apparatus suitable for polishing the edge comprises: an abrasive film having a polishing side and a fillable gasket adjacent the abrasive film a second side; a support for the abrasive film and the fillable gasket; and a substrate adapted to rotate a substrate against the abrasive film to be disposed at an edge of the substrate The fillable gasket is contoured to the base of the abrasive film and the abrasive film is in contact with the edge of the substrate. In a fourth aspect of the invention, a method of cleaning a substrate comprises: (a) supporting an abrasive film; (b) conforming the abrasive film to an edge, the edge comprising an outer edge and at least one slope; . Other features and aspects of the invention will be apparent from the appended claims and appended claims. [Embodiment] The present invention provides methods and apparatus for improving cleaning and/or grinding. Referring to Figure 1, substrate 100 includes two main portions 102' and an edge 104. Each of the substrates 100 is primarily rotated to rotate the substrate to the substrate. a side of a substrate a second side; a frame that is adapted to rotate the side of the material. Between the grinding, the edge of the material, the edge of the substrate (c) rotates the substrate to explain the

The edge of the material f surface 1 02, q 102 ' 102J 7 1362697

An element area 106, 106' and an outer row of areas 108, 108' are included. (However, typically only one of the two major surfaces 102, 102' includes an element area and an outer row of areas.) The exclusion area 108, 108' acts as a buffer between the element areas 106, 106' and the edge 104. Area. The edge 104 of the substrate 100 includes an outer edge 110 and slopes 112, 114. The ramps 112, 114 are located between the outer edge 110 and the exclusion regions 1 0 8 , 1 0 8 ' of the two major surfaces 102, 102'. The present invention cleans and/or polishes the outer edge 110 of the substrate 100 and the at least one bevel 112, 114 without affecting the component regions 106, 106'. In some embodiments, all or a portion of the exclusion zone 1 0 8 , 1 0 8 ' may also be cleaned.

The present invention provides a frame for supporting a film (e.g., an abrasive film) or an abrasive buffer against a substrate when the substrate 1 is rotated (e.g., rotated by a vacuum chuck, drive roller, etc.) The edge 104 of the material 100. The film is pressed against the edge of the rotating substrate 104 by using a spacer pushed by the actuator and/or a fillable gasket. In either case, the gasket and/or the fillable gasket are soft and/or include or develop a contour to conform to the shape of the substrate edge 104. Depending on the force applied by the actuator, the elasticity of the selected gasket, the fill amount of the fillable gasket, and/or the amount of tension on the membrane, a controlled amount of pressure can be applied to grind the edge 104. Alternatively or additionally, the film may be under tension within the frame such that the film itself exerts a variable amount of tension to the edge of the substrate 104, and to the outer edge 110 and the at least one bevel 112, 114 (eg, having Or no additional support from the gasket). Therefore, the present invention provides an accurate control of an edge grinding process that compensates for the difference in substrate 100 when the material is removed from edge 104. δ 1362697

The edge geometry changes with. In some embodiments, the frame supports a plurality of heads, each supporting an abrasive film. These head systems support different types of films (e.g., grit films) that can be used simultaneously or at different times in a predetermined order. These heads can be placed at different locations to allow the supported film to be milled through different portions of the edge 104 of the rotating substrate 100. These head movements (e.g., angularly about the tangential axis of the substrate 100, and/or relative to the substrate 1000) wrap around the edge 104 to abrade the edge 104. In some embodiments, the headlines continue to oscillate around the edge 104 of the substrate 100. Each head includes an indexed film wrap or is housed in a replaceable cassette. Additionally or alternatively, the invention includes a facility for transporting fluid to the edge of the substrate 104. In some embodiments, multiple channels may be provided to direct chemicals or water to the edge of the substrate 104 to aid in and/or rinse the particles produced by the milling. The fluid can be sprayed from either side of the substrate 100, and the present invention can utilize gravity or suction to contaminate or contact the flow to other portions of the substrate 100 or the apparatus of the present invention. This can be applied to the edge of the substrate 1 0 4 via a fluid carrying energy (e.g., ultrasonic energy). The substrate 100 is rotated in a horizontal plane. In additional or additional embodiments, the substrate 100 can be rotated in a vertical plane, a non-horizontal plane, and/or moved between different planes of rotation, see FIG. 2, which depicts an edge grinding apparatus 200. The frame 202 supports and stretches a polishing film 204 to be perpendicular to the substrate to be used to abrade the gravel so that the frame can be rotated around the different parts of the frame, and / is ground for grinding or one side, Or the body will not be again, the energy is applied to the alternative. intention. 100 9 1362697 The plane of the major surfaces 102, 102, such that the edge 〇4 of the substrate 丨00 can be pressed against (for example, by the straight downward arrows 205a, 205b) to grind the film 2 〇 4, and The abrasive film 2〇4 is contoured against the edge of the substrate i 04 β as indicated by the curved arrow 2 05c, and the substrate 100 is rotated against the abrasive film 204. Substrate 100 can be rotated at a speed of, for example, a range of about 5 Torr to 300 RPM, although other velocities can be used. The substrate 1 can be contacted with the abrasive film 204 for about 15 to 150 seconds, depending on the film type used, the grit 'rotation speed of the film, the amount of polishing required, and the like. It can be used for a longer or shorter time. In some embodiments, the abrasive film 204 is supported by a web 206. The spacer 206 is adjacent to the back side of the abrasive film 204 (e.g., the non-moist side) and is mounted on the frame 2〇2. As indicated by the straight upward arrow 207, the frame 2〇2 is pushed against the edge 104 of the substrate 1 , wherein the frame 202 includes a taut abrasive film 2〇4 and/or a spacer 206. In some embodiments, the substrate is capable of abutting the abrasive film with a force ranging from about 5 pounds to about 2 inches. Other forces can also be used. Additionally or alternatively, the additional length of the abrasive film 2〇4 is supported and taut by the winding wheels 208, 210, wherein the winding wheels 2〇8, 21 are attached to the frame 202. A supply winding 208 includes an unused abrasive film 2〇4 that is to be loosened and pulled to a position adjacent to the substrate ι, and a take-up reel 21 is used to receive the used And/or worn abrasive film 2〇4. One or both of the windings 2, 8, 210 can be indexed to precisely control the amount by which the abrasive film 204 advances. The abrasive film 2〇4 can be made of many different materials, including oxidized, oxidized, mashed, and the like. Other materials can also be used. In some embodiments, the size of the millname used is between 10 1362697

It is in the range of about 0.5 microns to about 3 microns, although other sizes can be used. Different widths ranging from about 1 吋 to about 1.5 。 can be used (although other widths can be used). In one or more embodiments, the thickness of the abrasive film is from about 0.002 Torr to about 0.02 Å, and the abrasive film can be loaded with a tension of from about 1 pound to about 5 pounds, and can be loaded in embodiments in which the spacer 206 is used. From about 3 pounds to about 8 pounds of tension. Other films having different thicknesses and strengths can be used. The diameter of the winding wheel 2 0 8 ' 2 10 is about 1 inch, and the abrasive film 204 of about 500 吋 is grasped, and can be constructed by any practical material, such as polyamino phthalate, polyvinylidene fluoride. Polyvinyl difloride (PVDF) and so on. Other materials can also be used. The frame 202 can be constructed from any other useful material, such as aluminum, stainless steel, and the like.

In some embodiments, one or more fluid channels 2 1 2 (eg, a spray nozzle or rod) may be provided to transport chemicals and/or water to aid in the grinding/cleaning of the substrate edge 104, lubricating the substrate. And/or wash away the removed material. The fluid passage 212 is adapted to deliver fluid to the substrate 100, to the abrasive film 204, and/or to the gasket 206. The fluid may include deionized water, which acts as a lubricant and is used to flush out the particles. It may also include an interfacial active agent and/or other well known cleaning chemistry. In some embodiments, a sonic (e.g., ultrasonic) nozzle is used to deliver the sonicated fluid to the edge of the substrate 104 to enhance cleaning. Fluid can also be delivered to the edge 104 via the abrasive film 205 and/or the shims 206. Referring to Figures 3A and 3B, a partial front view and a side view, respectively, of the abrasive film 206 and the spacer 206 of Figure 2 are shown. It is noted that the force (indicated by the straight arrow) causes the abrasive film 204 to conform to the contour of the spacer 206 11 1362697 at the edge 104' of the substrate and conform to the edge 104 of the substrate. In some embodiments, if the substrate 100 is absent, the crotch panel 206 has a flat surface, wherein the surface is where the substrate 1 is pressed against the spacer 206. Similarly, if the substrate 100 does not exist, it will lie flat and will be represented by a straight line in the two figures.

Referring to Figures 4 and 5, there are shown two alternative embodiments of an edge grinding apparatus 4, 500. As shown in FIG. 4, an exemplary edge grinding apparatus 400 includes a base or frame 402 that includes a head 4〇4 that supports the abrasive film 204, wherein the abrasive film 2〇4 is taut Between the windings 208, 210 and more supported by the spacer 206. As shown, the spacer 206 can be mounted to the head 404 via a biasing element 4〇6 (e.g., a spring). The edge grinding apparatus 4 of FIG. 4 may also include one or more drive rollers 408 (two shown) and a guide roller 41 〇 (two shown) for rotating the edge 104 of the substrate 1 to Each of the drive rollers 408 is driven by a drive 412 (eg, a motor, gear, belt, chain, etc.). The driving roller 408 and the guiding roller 410 may also include a groove,

The grooves cause the rollers 408, 410 to individually support the substrate i. In one such embodiment the groove in the drive roller 408 has a diameter of about 2.5 mm and the groove in the roller 41 0 has a diameter of about 1 inch. Other sizes can also be used. The block in which the drive roller 408 is in contact with the substrate 1 includes a textured or phase-shifted groove such that the drive roller 408 grips the substrate i 〇〇. The ^ ° drive roller 408 and the guide roller 410 may be constructed of a material such as a polyvinyl diflo ride (PVDF) or the like. Other materials can also be used. 12, as shown in FIG. 5, another exemplary edge grinding apparatus 500 includes a base or frame 502 that includes a head 504 that supports an abrasive film 404, wherein the abrasive film 204 is taut Between the winding wheels 208, 210 and more supported by the spacer 206. As shown, the shim 206 can be mounted to the head 504 via an actuator 506 (e.g., a pneumatic slider, a hydraulic hammer, a servo motor driven propeller, etc.). The edge grinding apparatus 5 of Fig. 5 may also include a vacuum chuck 508 coupled to a medal 510 (e.g., motor, gear, belt, chain, etc.). An advantage of the embodiment illustrated in Figure 5 is that the device 500 does not need to be in contact with the edge being ground. Therefore, the potential for particles to accumulate on the drive roller and redeposit on the edge 104 can be eliminated. There is also no need to clean the rollers. Furthermore, the possibility of damage to the drum or scratching of the edges can be avoided. By holding the substrate in the hollow chuck, high speed rotation can be achieved without vibration. Referring to Figures 6 through 8B, there is shown a detailed structure of an exemplary embodiment of Figures 4 and 5. It is worth noting that the features of the different embodiments can be combined in many different practical ways to apply to different design principles or points of interest. Figure 6 is a diagram showing the detailed structure of the frame 502 (including the head 504) of Figure 5. The head 504 supports the abrasive film 204 as described above, wherein the abrasive medium 204 is stretched between the winding wheels 208, 210. . The frame 502 (including the head 5〇4) is angularly displaced from the frame 602 by a driver 600 (e.g., a servo motor) (relative to the axis tangent to the edge 104 of the substrate, wherein the substrate 100 is held in the edge grinding device 500 (figure 5)). The angular transfer of the frame (with the abrasive film 2 〇 4) will be described in more detail below with reference to Figures 9A through 1C, 136, which may be one or more. It is driven by a wound rice driver 604 (for example, a servo motor) mounted on the head 504. The driver 6〇4 can provide an indexing capability such that a specific amount of unused abrasive film 204 is advanced or continuously fed to the edge of the substrate, and the end-tightening ability is such that the abrasive film is stretched and stressed To the edge of the substrate ° as shown in detail in the figure (relative to Figure 5) 'Selective cymbals

206 can be mounted to the head 504' via an actuator 506, wherein the actuator 506 adjustably presses the abrasive film 206 or contours the abrasive film 204 against the edge of the substrate 1 第 4 (Fig. 5) . Furthermore, one or more support rollers 606 may also be mounted on the head 5〇4 to guide and align the abrasive film 204 to a plane perpendicular to the major surface 102 (Fig. 基材) of the substrate 100, which The substrate 100 is held in the edge grinding apparatus 500 (Fig. 5).

It is to be noted that in the embodiments illustrated in Figures 5 and 6, the length of the abrasive film 204 is set to be orthogonal to the edge 104 of the substrate 1 being ground. This is in contrast to the embodiment of Figure 2, in which the longitudinal direction of the abrasive joint 204 is aligned with the edge 104 of the substrate 100 being ground. Other abrasive film orientations and configurations can also be used. For example, the abrasive film 206 can be held diagonally relative to the main surface of the substrate 1 102 102 ° See Figures 7A and 7B, which show two of the replaceable cassettes 700A, 700B A perspective view of a different embodiment. The cartridges 7〇〇A, 700B are available in disposable, refillable, and replaceable kits to provide the features of the head 404 and the abrasive film 204. The kit can be quickly and easily installed 14 to sfe • s removed from frames 4〇2, 502 of different edge grinding equipment 400, 500. As shown in Fig. 7A, the box 7〇〇a includes a head 404 and a head 4〇4 system. The rank spanning supply spool 208 is moved to the abrasive film 204 of the take-up spool 210. The grinding film 2〇 a is guided and aligned by the slabs 606, wherein the bud rollers 606 are mounted on the head 〇4. A spacer 2〇6 may be provided to further support the abrasive film 2〇4' as previously described. As previously mentioned, a biasing element 4〇6 (e.g., a spring) can be utilized to provide the spacer 2〇6 to the head 4〇4 to provide an elastic/dynamic back pressure to the spacer 206. Alternatively or additionally tir)-y an adjustable actuator 506 (Fig. 6) may be used to push the spacer 206 against the abrasive film 204' or push the entire head 4〇4 toward the substrate 1〇 Hey. In yet another alternative embodiment, as shown in FIG. 7B, without the spacer 206, the head 404 can provide a transverse D pressure to the edge of the substrate by a tension of only 2*4 of the abrasive film 2〇4 ( Figure 1). In some embodiments, the head 々ο* ° 乂 includes a notch 702, as shown in FIG. 7B, to accommodate the substrate 1〇〇. Referring to Figures 8A and 8B, two different alternative embodiments of the cymbals 2〇6A, 206B are illustrated. In addition to the spacer 2〇6 (which has a flat surface coplanar with the abrasive film 204 when the substrate is not present (Fig. 6)), the potential sheet 206A may have a contour conforming to the edge of the substrate 100. The concave surface or 'shield 206B as shown in FIG. 8B' may have a double concave surface to better conformally conform to the edge 1〇4 of the substrate 100. In still other alternative embodiments, the spacer 206 can include a shaped groove that is precisely contoured to conform to the edge 1 of the substrate 100 (including the slopes 112, 114' and the outer edge 11 〇 (Fig. 1)). 1362697 The spacers 206, 206A, 206B may be made of a material such as an acetal resin (for example, Delrin® manufactured by Dupont Corporation), PVDF, a polyurethane seal chamber foam, a ruthenium rubber or the like. Other materials can also be used. Such materials may have elasticity, or a ability to function as a function of the thickness or density of the gasket. This material can be chosen according to its elasticity. The desired elasticity can be selected by the desired abrasive pattern.

In some embodiments, the spacers 206, 206A, 206B have an adjustable ability to conform to the edge of the substrate. For example, the spacers 206, 206A, 206B can be or include a fillable pouch that can be made stiffer by adding more air or liquid or other fluid, and the shim can reduce air in the pouch Or liquid or other fluid to become more conformal. 8C illustrates an embodiment of a spacer 206C including a fillable pouch 802, wherein the fillable pouch 802 can fill (and/or align) fluid from a fluid supply 806 via a fluid passage 804. air). In some embodiments, the fluid supply 806 can fill/leak the bladder 802 under the direction of an operator or as directed by a programmed and/or user operated controller. In such an embodiment, an elastic material (e.g., silicone rubber, etc.) can be used for the bladder 802' to further enhance the ability of the bladder to stretch and conform to the edge of the substrate. Allowing the operator/controller to precisely control how far the abrasive film 206 contacts the substrate 1〇〇 beyond the slope 112114 (if all) and enters the exclusion region 108 and/or 1〇8, how far (Figure )), For example, by limiting the amount of fluid that is drawn into the bladder 8〇2 by the cartridge. For example, when the outer edge 110 of the substrate is placed against the spacer 2 having the leak pocket 8 〇 2, the pocket 802 is filled, such that the spacer 2 〇 6c is forced to wrap and conform to the base 16 1362697 The outer edge 110 of the material 100 and the bevels 112, 114 do not wrap around the component regions 106, 106' of the substrate 100. Notably, in some embodiments, multiple pockets may be used in the shim, and differently shaped fillable pouches may be used in the differently shaped shim 206, 206A '206B.

In some embodiments, the fluid to aid in grinding can be delivered to the edge of the substrate via spacers 206, 206A, 206B. A fluid can be provided to drip or spray fluid onto the gasket or into the gasket. Alternatively, the fillable gasket can comprise a bladder having a semi-permeable membrane, wherein the semipermeable membrane allows fluid to be slowly released and delivered to the abrasive membrane 204 (e.g., via a septum). In such an embodiment, the crotch panels 206, 206A, 20 6B may be covered by a material that will absorb and/or retain a fluid (eg, polyvinyl alcohol (PVA), etc.). In, and/or include the material. Figures 9A-9C and 10A-10C show different possible head positions of the alternative edge grinding apparatus 400, 500, respectively. The present invention is applicable to the abrasive film 204 contacting the beveled surfaces 112, 114 and the outer edge 11 of the substrate 1 without contacting the component region 106 of the substrate 100. In operation, this can be achieved by 'translating the heads 404, 504 angularly about an axis (and thus a portion of the abrasive film is in contact with and contoured to conform to the edge 104 of the substrate 100), wherein the shafting Tangent to the outer edge 110 of the substrate 100 being rotated. Referring to Figures 9A-9C and 10A-10C, the axis of the angular transfer is indicated by the line on the vertical extension of the paper labeled "Pj. The heads 404, 504 are kept in different positions. The desired portion of the substrate edge 104 can be cleaned when the substrate 100 is rotated. In some embodiments, the head 404, 504 17 1362697

It is suitable to oscillate continuously or intermittently between different locations and/or other locations as depicted. Heads 404, 504 can be moved to frame 502 by driver 6 00 (Fig. 6) under the direction of a programmed or user operated controller. Alternatively, the heads 404, 504 can be secured and/or adjusted only when the substrate is not being rotated. In still other embodiments, the substrate can remain stationary while the headgear is oscillated (as previously described) and rotated circumferentially about the substrate 100. Further, the abrasive film 204 can be mounted on the heads 404, 504 in a continuous loop, and/or the abrasive film 204 can be continuously (or intermittently) fed forward to grind the substrate edge 104. For example, the travel of the film can be used to establish or enhance the grinding motion. Any of the aforementioned practical grinding motions and/or combinations of methods can be utilized.

Referring to Figures 1 1 - 2 2, an additional embodiment of an edge grinding apparatus is illustrated. 11 is an edge grinding apparatus 1100 including three heads 104, and 12 is an edge grinding apparatus 1 200 including two heads 504 - and FIG. 13 is a diagram including four heads 1304. Edge grinding equipment 1 3 00. As shown, any number and type of headers 404, 504, 1304 can be used in any actual combination. Moreover, in such a multi-head embodiment, each of the heads 4 04, 5 0 4, 1 3 0 4 may use a different configuration or type of abrasive film 204 (e.g., different gravel, material, tension, pressure, etc.). Any number of headers 404, 5 04, 1 3 04 can be used 'individually and/or sequentially. Different heads 404, 504, 1304 can be used on different substrates 100, or different types of substrates. For example, a first head 404 having a rigid biasing element 406 to support a shim 206 (e.g., recessed shim 206B) and a coarse gravel abrasive film 204 can be used initially from the substrate bevel 112, 18 136.2697 114 (Figure 1) removes a considerable amount of rough material. The first head 404 can be suitably positioned to approximate the ramps 112, 114. After cleaning with the first head 404, the first head 04 04 is retracted from the substrate 100, and the second head 504 having a fine gravel abrasive film 204 (and without a spacer) can be moved to position for grinding Bevels 112, 114 and outer edge 110.

After cleaning one or more of the substrates 1 〇 , the portion of the polishing film 204 used for such cleaning may be worn. Therefore, the take-up reel 210 (Fig. 4) is driven to pull the abrasive film 204 from the supply reel 208 toward the take-up reel 210 by a fixed amount. In this manner, an unused portion of the abrasive film 204 can be provided between the take-up spool 210 and the supply spool 208. The unused portion of the abrasive film 248 can be utilized in a manner similar to that described above to successively clean one or more other substrates 100. Therefore, the apparatus 1 1 0 0, 1 2 0 0 can replace the worn portion of the abrasive film 204 with an unused portion with little or no impact on the substrate processing capacity. Similarly, when all of the abrasive film 204 in the cassette 700A is used, if the replaceable cassette 700A is utilized, the impact on productivity can be minimized by rapidly replacing the cassette 700A. An exemplary embodiment of the edge grinding apparatus 1 3 00 of Figure 13 is a schematic illustration of a frame 1302 supporting a plurality of heads 1304. Each head 1304 is mounted to a frame 1302, and each head 1304 includes an actuator 1 306 (eg, a pneumatic piston, a servo drive slide, a hydraulic hammer, etc.), wherein the actuator 1306 is responsive to the controller 1308 One of the control signals (such as a stylized computer, an operator-guided valve system, an embedded instant processor, etc.) is adapted to press the spacer 206 and the length of the abrasive film 204 19 1362697 against the edge of the substrate 104. It is noted that the controller 1308 is coupled to (e.g., electrically, mechanically, pneumatically, hydraulically, etc.) each of the actuators 1 3 0 6 .

Additionally, a fluid supply 806 can be coupled to controller 1308 and under the control of controller 1308. Fluid supply 860 can be controlled to independently deliver fluid (e.g., deionized water, cleaning chemistry, sonicating fluid, gas, air, etc.) to each head 1304 via one or more fluid passages 2 1 2 . Under the direction of the controller 1308, different fluids may be selectively delivered to the gasket 206, the abrasive film 204, and/or the substrate edge 1 经由 4 via the fluid passages 212. The fluid can be used to grind, lubricate, particulate remove/wet, and/or fill pocket 802 (Fig. 8C) within gasket 206. For example, in some embodiments, the same fluid delivered via a permeable septum 206 can be used to grind the shim 206 and fill the shim 206, while being delivered via a second passage (not shown) to Different flow systems of the same head 1304 are used for wetting and grinding.

The foregoing description discloses only exemplary embodiments of the invention. Variations of the apparatus and method disclosed in the scope of the invention are apparent to those of ordinary skill in the art. For example, although the invention merely discloses an example of a substrate that cleans a circle, the invention can be modified to clean substrates having other shapes (e.g., glass or polymer sheets for use in flat panel displays). Moreover, while the above shows the processing of a single substrate by equipment, in some embodiments, the apparatus can process a plurality of substrates simultaneously. It is to be understood that the present invention is disclosed by way of example embodiments, and it is understood that other embodiments are also within the scope of the invention as defined by the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view of a part of a substrate. Figure 2 is a schematic illustration of an embodiment of an edge cleaning apparatus in accordance with the present invention. Figures 3A and 3B are partial front and side views, respectively, of a portion of the edge cleaning apparatus of Figure 2.

Figure 4 is a perspective view of an embodiment of an edge cleaning apparatus in accordance with the present invention. Figure 5 is a perspective view of another embodiment of an edge cleaning apparatus in accordance with the present invention. Fig. 6 is a perspective view showing a part of the embodiment of Fig. 5. 7A and 7B are fragmentary perspective views of different interchangeable cartridge embodiments for use in embodiments of the present invention.

Figures 8A-8C are partial perspective views of different gasket embodiments for use in embodiments of the present invention. Figures 9A-9C are diagrams showing examples of different possible head positions of the exemplary edge grinding apparatus of Figure 4. The 10A-1 0C diagram illustrates an example of different possible head positions of the exemplary edge grinding apparatus of FIG. Figure 11 is a perspective view of an embodiment of a multi-edge edge grinding apparatus in accordance with the present invention. Figure 12 is a view of another multi-edge edge grinding apparatus according to the present invention 21 1362697

Fig. 13 is a perspective view of an embodiment of a multi-head edge grinding apparatus according to the present invention.

[Main component symbol description] 100 substrate 102, 102' main surface 104 edge 106, 106' element area 108, 10 8, exclusion area 110 outer edge 112 slope 114 slope 200 edge grinding apparatus 202 frame 204 abrasive film 205a-c arrow 206 Shims 206A- • C Shims 207 Arrows 208 Supply Wraps 2 10 Pickup Wraps 212 Fluid Channels 400 Edge Grinding Equipment 402 Frame 404 Head 406 Biasing Element 408 Drive Roller 410 Guide Roller 412 Drive 500 Edge Grinding Equipment 502 Frame 504 Head 506 Actuator 508 Vacuum Chuck 5 10 Drive 600 Drive 602 Pole 604 Drive 606 Support Roller 700A Clamshell 700B Clamshell 702 Notch 22 136.2697 802 Fillable Pouch 804 Fluid Channel 806 Fluid Supply 1100 Edge Grinding Equipment 1200 edge grinding equipment 1300 edge grinding equipment 1302 frame 1304 head 1306 actuator 1308 controller

twenty three

Claims (1)

1362697 The first slogan is revised in July. The scope of the patent application: 1. A device suitable for grinding the edge of a substrate, which comprises at least: a replaceable abrasive film which is adapted to conform to the contour a substrate; a frame adapted to tigh at least a first length of the flexible abrasive film, wherein a first length of the flexible abrasive film forms a first plane prior to contacting a substrate; a substrate rotary actuator adapted to rotate the substrate against a first length of the portion against the flexible abrasive film such that the substrate extends into the first plane ' and the flexible abrasive film can Applying tension to the substrate; contourally conforming to an edge of the substrate, the edge including at least one outer edge and a first bevel; and 'grinding the outer edge and the first bevel when the substrate is rotated; Wherein the edge of the substrate extends beyond the substrate rotary actuator; and wherein the frame is more suitable for angularly transferring the flexible abrasive film around the edge of the substrate. 2. The apparatus of claim 1, wherein the frame comprises a winding wheel and a take-up reel for use in one of the flexible abrasive films, and wherein the frame is more suitable to allow the flexible abrasive film The portion in contact with the substrate can be replaced. 3. The apparatus of claim 2, wherein the flexible abrasive film 24 1362697 spans between the supply winding and the take-up reel in a longitudinal direction, and wherein the substrate rotates the drive system The edge of the substrate is moved in the longitudinal direction of the flexible abrasive film. 4. The apparatus of claim 1, wherein the flexible abrasive film and the frame are housed in a replaceable cassette. 5. The apparatus of claim 1, wherein the frame is more suitable for angularly transferring the flexible abrasive film about an axis such that the flexible abrasive film contacts the outer edge, the first slope, And a second bevel of the substrate, wherein the shaft is tangent to the outer edge of the substrate. 6. The apparatus of claim 1, wherein the frame is more suitable for circumferentially rotating the flexible abrasive film about the edge of the substrate relative to the substrate. 7. The apparatus of claim 1, further comprising a fluid supply channel, and wherein the fluid supply channel is adapted to deliver fluid to an edge of the substrate. 8. The apparatus of claim 7, wherein the fluid supply channel is further adapted to deliver fluid to the edge of the substrate via the flexible abrasive film. 25 1362697 9. The apparatus of claim 7, wherein the system is adapted to deliver sonic energy to the edge of the substrate. 10. The apparatus of claim 7, wherein at least one of water and a cleaning chemistry. 11. An apparatus for grinding an edge of a substrate, wherein: a plurality of flexible abrasive films; at least one frame adapted to tension at least a first length of each of the flexible abrasive flexible abrasive films, wherein Forming, by the first length of each of the substrates, a first flat substrate rotation driver adapted to rotate a portion of the first length of the at least one flexible abrasive film to the first plane And thereby applying pressure to the substrate, at the edge of the substrate, and grinding the edge of the substrate in the flexible abrasive film of the substrate as it is rotated. 1 2. The apparatus of claim 1 wherein the flexographic film comprises a film having different abrasive particles. The apparatus of claim 11, wherein the plurality of heads, and each of the heads is adapted to support at least a membrane, and wherein the heads are adapted to simultaneously supply the supported fluid to the fluid at about the same time Included includes: a film along each of the flexible abrasive film faces; and a material that extends against the substrate, any contact contour conforming to the plurality of frames, the frame including a flexible abrasive flexible grind 26 1362697 The film is in contact with the edge of the substrate. 14. The apparatus of claim 11, wherein the frame has a plurality of heads, and wherein each of the heads is adapted to support at least one flexible film, and wherein each of the heads comprises a spacer, the spacer is adapted to A flexible abrasive film that is supported by the edge of the substrate. The apparatus of claim 14 wherein each of the head sheets is adapted to abut against the flexible abrasive film of the push head. A rotating substrate to push the actuator on the spacer. 16. The apparatus of claim 14, wherein each of the abradable membranes and each head are housed in a replaceable cassette. The apparatus of claim 14, wherein the frame is configured to angularly transfer the flexible abrasive film of each head to contact the outer edge of the first bevel around the respective axis with a scratching film. And a beveled surface of the substrate, wherein the shaft is tangent to the outer edge of the substrate. 18. The apparatus of claim 14, wherein the frame is configured to rotate each of the splayed abrasive films circumferentially about the edge of the substrate relative to the substrate. Including the grinding and the matting of the mating is more suitable for the second one. 27 1362697. 19. The apparatus of claim 11, further comprising a fluid supply passage, wherein the fluid supply passage is applicable To deliver a fluid to the edge of the substrate. 20. The apparatus of claim 14, further comprising a fluid supply channel, and wherein the fluid supply channel is adapted to deliver a fluid to the edge of the substrate via the flexible abrasive film of each head. The apparatus of claim 19, wherein the fluid supply channel is adapted to deliver sonic energy to the edge of the substrate. 22. The device of claim 19, wherein the fluid comprises at least one of water and a cleaning chemistry. 23. An apparatus adapted to grind the edge of a substrate, the at least comprising: a flexible abrasive film adapted to conformally conform to a substrate; a contoured gasket pre-formed to conformally conform to an edge of a substrate, wherein the contoured gasket is adapted to conformal to An edge of the substrate; a frame adapted to tighten at least a first length of the flexible abrasive film, wherein the first length of the washable abrasive film forms a first plane prior to contacting the substrate; And a substrate rotary actuator adapted to rotate the substrate against the flexible abrasive film along a first length of the portion to extend the substrate 28 1362697 Into the first plane, and the flexible abrasive film can: apply tension to the substrate; contour conforms to the edge of the substrate, the edge includes an outer edge and a first bevel; and the substrate is When rotated, the outer edge is ground with the first - wherein the edge of the substrate extends beyond the substrate to rotate the drive wherein the frame is more suitable for angularly transferring the edge of the substrate to be flexibly ground. Including at least - bevel; ; 29