TWI362066B - - Google Patents

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Publication number
TWI362066B
TWI362066B TW096140438A TW96140438A TWI362066B TW I362066 B TWI362066 B TW I362066B TW 096140438 A TW096140438 A TW 096140438A TW 96140438 A TW96140438 A TW 96140438A TW I362066 B TWI362066 B TW I362066B
Authority
TW
Taiwan
Prior art keywords
cleaning
supply pipe
cleaning liquid
gas
dissolved
Prior art date
Application number
TW096140438A
Other languages
English (en)
Chinese (zh)
Other versions
TW200830391A (en
Inventor
Tsukasa Watanabe
Naoki Shindo
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200830391A publication Critical patent/TW200830391A/zh
Application granted granted Critical
Publication of TWI362066B publication Critical patent/TWI362066B/zh

Links

Classifications

    • H10P70/15—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H10P70/234—
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Liquid Crystal (AREA)
TW096140438A 2006-10-27 2007-10-26 Substrate cleaning apparatus, substrate cleaning method, program and recording medium TW200830391A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006292348 2006-10-27

Publications (2)

Publication Number Publication Date
TW200830391A TW200830391A (en) 2008-07-16
TWI362066B true TWI362066B (OSRAM) 2012-04-11

Family

ID=39324617

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096140438A TW200830391A (en) 2006-10-27 2007-10-26 Substrate cleaning apparatus, substrate cleaning method, program and recording medium

Country Status (3)

Country Link
JP (1) JPWO2008050832A1 (OSRAM)
TW (1) TW200830391A (OSRAM)
WO (1) WO2008050832A1 (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5526118B2 (ja) * 2011-12-26 2014-06-18 ジルトロニック アクチエンゲゼルシャフト 超音波洗浄方法
JP5989338B2 (ja) * 2011-12-28 2016-09-07 芝浦メカトロニクス株式会社 処理液生成装置、処理液生成方法、基板処理装置及び基板処理方法
JP6430772B2 (ja) * 2014-10-06 2018-11-28 オルガノ株式会社 炭酸ガス溶解水供給システム、炭酸ガス溶解水供給方法、およびイオン交換装置
CN106140722A (zh) * 2016-08-12 2016-11-23 嘉兴百盛光电有限公司 一种多功能超声波清洗机的供水单元

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5800626A (en) * 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
JP2000098321A (ja) * 1998-09-25 2000-04-07 Toshiba Corp 洗浄方法および洗浄装置
JP2003234320A (ja) * 2002-02-06 2003-08-22 Nec Electronics Corp 基板の洗浄方法、洗浄薬液、洗浄装置及び半導体装置
JP2004281894A (ja) * 2003-03-18 2004-10-07 Matsushita Electric Ind Co Ltd 電子材料用洗浄水、その製造方法および電子材料の洗浄方法
CN1849182A (zh) * 2003-06-11 2006-10-18 艾奎昂技术股份有限公司 用过饱和清洁溶液进行强超声波清洁
JP4623706B2 (ja) * 2004-04-14 2011-02-02 東京エレクトロン株式会社 超音波洗浄処理装置
JP2006179765A (ja) * 2004-12-24 2006-07-06 Dainippon Screen Mfg Co Ltd 基板処理装置およびパーティクル除去方法

Also Published As

Publication number Publication date
WO2008050832A1 (fr) 2008-05-02
TW200830391A (en) 2008-07-16
JPWO2008050832A1 (ja) 2010-02-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees