TWI346829B - Inspection device for tft array substrate - Google Patents

Inspection device for tft array substrate

Info

Publication number
TWI346829B
TWI346829B TW095114676A TW95114676A TWI346829B TW I346829 B TWI346829 B TW I346829B TW 095114676 A TW095114676 A TW 095114676A TW 95114676 A TW95114676 A TW 95114676A TW I346829 B TWI346829 B TW I346829B
Authority
TW
Taiwan
Prior art keywords
array substrate
inspection device
tft array
tft
inspection
Prior art date
Application number
TW095114676A
Other languages
English (en)
Other versions
TW200639551A (en
Inventor
Makoto Shinohara
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of TW200639551A publication Critical patent/TW200639551A/zh
Application granted granted Critical
Publication of TWI346829B publication Critical patent/TWI346829B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136254—Checking; Testing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2594—Measuring electric fields or potentials

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Immunology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Electric Properties And Detecting Electric Faults (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Thin Film Transistor (AREA)
TW095114676A 2005-05-02 2006-04-25 Inspection device for tft array substrate TWI346829B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005134592 2005-05-02

Publications (2)

Publication Number Publication Date
TW200639551A TW200639551A (en) 2006-11-16
TWI346829B true TWI346829B (en) 2011-08-11

Family

ID=37396374

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095114676A TWI346829B (en) 2005-05-02 2006-04-25 Inspection device for tft array substrate

Country Status (5)

Country Link
JP (1) JPWO2006120861A1 (zh)
KR (1) KR100877928B1 (zh)
CN (1) CN101107534B (zh)
TW (1) TWI346829B (zh)
WO (1) WO2006120861A1 (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006015714B4 (de) 2006-04-04 2019-09-05 Applied Materials Gmbh Lichtunterstütztes Testen eines optoelektronischen Moduls
JP5224194B2 (ja) * 2009-02-04 2013-07-03 株式会社島津製作所 Ｔｆｔアレイ検査方法およびｔｆｔアレイ検査装置
WO2013065142A1 (ja) * 2011-11-02 2013-05-10 株式会社島津製作所 液晶アレイ検査装置および液晶アレイ検査装置の信号処理方法
CN104795339B (zh) * 2015-03-09 2017-10-20 昆山龙腾光电有限公司 薄膜晶体管阵列基板的检测装置及检测方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348473A (ja) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd 欠陥画素検査装置
US4819038A (en) * 1986-12-22 1989-04-04 Ibm Corporation TFT array for liquid crystal displays allowing in-process testing
JPH073446B2 (ja) * 1988-05-18 1995-01-18 松下電器産業株式会社 スイッチング素子を有したアクティブ基板の欠陥検査装置および欠陥検査方法
US5432461A (en) * 1991-06-28 1995-07-11 Photon Dynamics, Inc. Method of testing active matrix liquid crystal display substrates
US5465052A (en) * 1991-09-10 1995-11-07 Photon Dynamics, Inc. Method of testing liquid crystal display substrates
JPH08220174A (ja) * 1995-02-20 1996-08-30 Matsushita Electric Ind Co Ltd 液晶パネルの検査方法
JP2669385B2 (ja) * 1995-03-06 1997-10-27 日本電気株式会社 液晶薄膜トランジスタ基板の検査方法及びそれを適用した検査装置
JP4104728B2 (ja) * 1998-03-25 2008-06-18 フォトン・ダイナミクス・インコーポレーテッド 液晶駆動基板の検査装置及びその検査方法

Also Published As

Publication number Publication date
TW200639551A (en) 2006-11-16
KR100877928B1 (ko) 2009-01-12
CN101107534A (zh) 2008-01-16
WO2006120861A1 (ja) 2006-11-16
JPWO2006120861A1 (ja) 2008-12-18
KR20070093112A (ko) 2007-09-17
CN101107534B (zh) 2012-04-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees