TWI340735B - Water treatment method and water treatment apparatus - Google Patents

Water treatment method and water treatment apparatus

Info

Publication number
TWI340735B
TWI340735B TW095133671A TW95133671A TWI340735B TW I340735 B TWI340735 B TW I340735B TW 095133671 A TW095133671 A TW 095133671A TW 95133671 A TW95133671 A TW 95133671A TW I340735 B TWI340735 B TW I340735B
Authority
TW
Taiwan
Prior art keywords
water treatment
treatment apparatus
treatment method
water
treatment
Prior art date
Application number
TW095133671A
Other languages
English (en)
Other versions
TW200722387A (en
Inventor
Kazuyuki Yamasaki
Keichiro Uda
Kazumi Chuhjoh
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of TW200722387A publication Critical patent/TW200722387A/zh
Application granted granted Critical
Publication of TWI340735B publication Critical patent/TWI340735B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/74Treatment of water, waste water, or sewage by oxidation with air
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00Other mixers; Mixing plants; Combinations of mixers
    • B01F33/80Mixing plants; Combinations of mixers
    • B01F33/82Combinations of dissimilar mixers
    • B01F33/821Combinations of dissimilar mixers with consecutive receptacles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/21Measuring
    • B01F35/213Measuring of the properties of the mixtures, e.g. temperature, density or colour
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00Controlling or monitoring parameters in water treatment
    • C02F2209/11Turbidity
TW095133671A 2005-09-16 2006-09-12 Water treatment method and water treatment apparatus TWI340735B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005270105A JP4250163B2 (ja) 2005-09-16 2005-09-16 水処理方法および水処理装置

Publications (2)

Publication Number Publication Date
TW200722387A TW200722387A (en) 2007-06-16
TWI340735B true TWI340735B (en) 2011-04-21

Family

ID=37467499

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095133671A TWI340735B (en) 2005-09-16 2006-09-12 Water treatment method and water treatment apparatus

Country Status (6)

Country Link
US (1) US7625484B2 (zh)
EP (1) EP1767496B1 (zh)
JP (1) JP4250163B2 (zh)
CN (1) CN100488883C (zh)
DE (1) DE602006003973D1 (zh)
TW (1) TWI340735B (zh)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4485444B2 (ja) * 2005-09-28 2010-06-23 シャープ株式会社 排水処理方法および排水処理装置
JP4490904B2 (ja) * 2005-11-22 2010-06-30 シャープ株式会社 水処理装置
KR100788202B1 (ko) 2006-12-14 2007-12-26 효림산업주식회사 인공 폭기 장치
JP4805120B2 (ja) * 2006-12-18 2011-11-02 シャープ株式会社 生物反応装置
JP4949873B2 (ja) * 2007-01-24 2012-06-13 シャープ株式会社 生物反応方法および生物反応装置
JP4611328B2 (ja) * 2007-02-28 2011-01-12 シャープ株式会社 インスリン量を増加させるとともに血糖値を低下させる装置
JP4945318B2 (ja) * 2007-05-25 2012-06-06 株式会社仲田コーティング 微細気泡発生装置
JP2009060987A (ja) * 2007-09-04 2009-03-26 Sharp Corp 入浴装置
JP5172252B2 (ja) * 2007-09-07 2013-03-27 シャープ株式会社 ナノバブル含有磁気活水を用いた処理装置および処理方法
JP4994265B2 (ja) * 2008-02-25 2012-08-08 シャープ株式会社 水処理装置および水処理方法
JP5097024B2 (ja) * 2008-06-17 2012-12-12 シャープ株式会社 水処理装置および水処理方法
JP5261124B2 (ja) 2008-10-10 2013-08-14 シャープ株式会社 ナノバブル含有液体製造装置及びナノバブル含有液体製造方法
JP5037479B2 (ja) * 2008-11-18 2012-09-26 シャープ株式会社 浄化処理装置及び浄化処理方法
US8322634B2 (en) * 2009-01-12 2012-12-04 Jason International, Inc. Microbubble therapy method and generating apparatus
US9060916B2 (en) 2009-01-12 2015-06-23 Jason International, Inc. Microbubble therapy method and generating apparatus
US8720867B2 (en) * 2009-01-12 2014-05-13 Jason International, Inc. Microbubble therapy method and generating apparatus
US8201811B2 (en) * 2009-01-12 2012-06-19 Jason International, Inc. Microbubble therapy method and generating apparatus
US8579266B2 (en) * 2009-01-12 2013-11-12 Jason International, Inc. Microbubble therapy method and generating apparatus
CN101830555B (zh) * 2009-03-09 2011-12-28 江西金达莱环保研发中心有限公司 一种射流曝气装置及其射流曝气方法
CN101885570B (zh) * 2009-05-15 2012-04-04 江西金达莱环保研发中心有限公司 一种污泥处理方法
CN102686967B (zh) * 2009-11-30 2014-09-10 皮特·森提万尼 处理气体的方法和装置
CN101891340A (zh) * 2010-07-08 2010-11-24 云南昆船设计研究院 一种基于膜生物反应技术的污水处理方法
JP5717245B2 (ja) * 2010-11-15 2015-05-13 芝浦メカトロニクス株式会社 微細バブル含有液体生成装置及び微細バブル含有液体生成方法
CN102815802A (zh) * 2012-08-08 2012-12-12 安徽迎驾贡酒股份有限公司 洗瓶用水循环利用系统
US11459257B1 (en) * 2017-05-12 2022-10-04 Eco Environmental, LLC Method of treating a liquid with nanobubbles
CN109432616A (zh) * 2018-12-26 2019-03-08 合肥中科离子医学技术装备有限公司 一种用于质子系统cbct成像的滤过器远程自动切换装置
CN110452741B (zh) * 2019-09-17 2020-10-23 山东大学 生物质气化气相脱焦方法、液相脱焦方法及联合脱焦方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4752383A (en) * 1986-08-05 1988-06-21 The United States Of America As Represented By The Secretary Of The Interior Bubble generator
US5275732A (en) * 1990-07-03 1994-01-04 International Environmental Systems, Inc., Usa Combined coarse and fine bubble separation system
JP3095620B2 (ja) 1994-06-10 2000-10-10 株式会社クボタ 生物学的窒素除去装置
JP3467671B2 (ja) 1996-07-23 2003-11-17 日立造船株式会社 硝化脱窒方法
GB9809016D0 (en) 1998-04-29 1998-06-24 Wrc Plc Method for monitoring bubbles in liquid
JP2000308900A (ja) 1999-04-26 2000-11-07 Nippon Steel Corp アンモニア含有排水の処理方法
DE10148474A1 (de) * 2001-10-01 2003-05-08 Koehler August Papierfab Verfahren und Vorrichtung zum Reinigen von Abwässern
US20030146141A1 (en) * 2002-02-06 2003-08-07 Schneider John C. Agitated counter current flotation apparatus
JP4016099B2 (ja) 2002-05-20 2007-12-05 独立行政法人産業技術総合研究所 ナノ気泡の生成方法
DE10244545A1 (de) 2002-09-25 2004-04-08 Roland Damann Mobile Klär- und Flotationsvorrichtung
JP2004121962A (ja) 2002-10-01 2004-04-22 National Institute Of Advanced Industrial & Technology ナノバブルの利用方法及び装置
US7159854B2 (en) * 2003-08-21 2007-01-09 Glr Solutions Ltd. Apparatus and method for producing small gas bubbles in liquids
US20060061765A1 (en) * 2004-09-16 2006-03-23 Behzad Rezvani Turbidity sensor with improved noise rejection
JP4168068B2 (ja) * 2006-09-25 2008-10-22 シャープ株式会社 マイクロナノバブル含有液体製造方法、マイクロナノバブル含有液体製造装置、およびマイクロナノバブル含有液体応用装置

Also Published As

Publication number Publication date
EP1767496B1 (en) 2008-12-03
CN1931731A (zh) 2007-03-21
EP1767496A1 (en) 2007-03-28
DE602006003973D1 (de) 2009-01-15
US7625484B2 (en) 2009-12-01
JP4250163B2 (ja) 2009-04-08
US20070062869A1 (en) 2007-03-22
CN100488883C (zh) 2009-05-20
TW200722387A (en) 2007-06-16
JP2007075785A (ja) 2007-03-29

Similar Documents

Publication Publication Date Title
TWI340735B (en) Water treatment method and water treatment apparatus
GB2442171B (en) Water treatment apparatus
GB0525961D0 (en) Water shut off method and apparatus
ZA200610236B (en) Water treatment system and process
ZA200709196B (en) Wound treatment apparatus and method
ZA200709197B (en) Wound treatment apparatus and method
GB2441700B8 (en) Waste treatment apparatus and method
EP2018235A4 (en) SURFACE TREATMENT DEVICE AND METHOD
AP2007004077A0 (en) Fluid treatment method and apparatus
EP1923357A4 (en) PROCESS FOR THE PRODUCTION OF OZONIZED WATER AND APPARATUS FOR THE PRODUCTION OF OZONIZED WATER
EP1860071A4 (en) METHOD AND DEVICE FOR CLEANING CIRCULATORY WATER
EP1786732A4 (en) WATER TREATMENT DEVICE, METHOD AND SYSTEM
GB0501688D0 (en) Method and apparatus
ZA200708649B (en) Vessel and method for water treatment
GB0506186D0 (en) Apparatus and method
EP1885655A4 (en) WATER TREATMENT SYSTEM AND METHOD
SG119232A1 (en) Desalination apparatus and method
GB2419590B (en) Water disinfection apparatus and method
GB0502318D0 (en) Apparatus and method
GB0511383D0 (en) Waste treatment method and apparatus
GB0504469D0 (en) Method and apparatus
EP2029495A4 (en) OVERCRAFT MELT TREATMENT PROCESS AND DEVICE
GB0611171D0 (en) Water treatment method and apparatus
HK1117454A1 (en) Device and method for treating water
AU2005905332A0 (en) Contaminated water treatment method and apparatus

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees