TWI331686B - - Google Patents

Description

[Technical Field] The present invention relates to a series of predetermined processes (such as photoresist coating treatment) for a thin plate-shaped substrate (hereinafter referred to as a substrate) such as a semiconductor substrate or a liquid crystal glass substrate. A substrate processing apparatus for development processing, etc. [Prior Art] A conventional substrate processing apparatus is known as a series of processes such as photoresist coating processing, exposure processing, and development processing on a substrate by a plurality of processing units. Such a substrate processing apparatus is described, for example, in Patent Document 1. Such a substrate processing apparatus, as shown in the document 1 described above, has one of the processing units, and has a transfer unit 31 and a spin coating unit. 32. The photoresist coating unit 33, the edge rinsing unit 34, and the transfer chamber (transporting unit) 35 are transported from the transport unit 31 to the transfer chamber 35 by sequentially transporting the substrates to the adjacent processing. The sliding portion 5a-5d of the portion transports the substrate. In the case of the above substrate processing apparatus, as shown in Fig. 11, the substrate G is separated from the edge by the sliding portion 5d. The mechanism for transporting the washing portion 34 to the transfer chamber 35 is disposed adjacent to the edge flushing portion 34 to provide a transfer chamber, and the position of the double-dotted line is shown in FIG. U from the position indicated by the solid line in FIG. The substrate G is transported from the edge flushing portion 34 to the transfer chamber 35, and the substrate G is further transported from the transfer chamber 35 to the pre-baking unit 40 by the transport mechanism 39. In addition, the adjacent robot 42 enters the pre-baking unit. The position shown by the double-dotted line in 40, via the robot

Port V 2014-7082-PF 5 1331686 , the hand 'will be transported to the substrate of the pre-baking unit 40 (j is transported to the processing chamber at the upper portion of the pre-supply unit 40. Patent Document 1: 曰本专利申请特开平1卜 274265 In the conventional substrate processing apparatus having the above-described configuration, the transport mechanism 39 and the sliding portion 5d' are required to be transported during the substrate transport from the edge flushing portion 34 to the transfer chamber 35. Further, since the transfer chamber 35 and the transport mechanism 39 exist, the substrate transport path from the edge rinse portion 34 to the pre-baking unit 40 is lengthened, and as a result, the total length of the substrate processing apparatus is lengthened. The present invention has been made to solve the above problems, and an object thereof is to provide a substrate processing apparatus capable of shortening the entire length of the substrate processing apparatus and reducing the manufacturing cost of the apparatus. The substrate processing apparatus according to the present invention has a stack. The plurality of disposed processes include: a transport chamber that is stacked and disposed with respect to the plurality of processing chambers, and a processing portion that is adjacent to the transport chamber The first transport device includes a hand for loading a substrate and a main body portion, and the main body portion is placed in the transport chamber to move the hand forward and backward between the processing portion disposed adjacent to the transport chamber. In this configuration, the main body portion of the first transport device installed in the transport chamber performs the advancement and retreat operation between the transport chamber and the processing portion disposed adjacent thereto, thereby performing the substrate between the processing portion and the transport chamber. By this, the substrate can be directly transported between the processing unit and the processing unit adjacent thereto by the hand of the first transport device.

Further, the substrate processing apparatus according to the present invention further includes a second transport device. The second transport device transports the substrate between the transport chamber and the plurality of processing chambers. In this configuration, the second transport device transports the substrate transported by the hand of the second transport device to the transport chamber to the processing chamber, and the processing chamber is transported to the hand in the transport chamber. Further, in the substrate processing apparatus according to the present invention, the transport device performs the transfer of the substrate between the hand of the first transport device located in the state of the calling room in the transport room. According to this configuration, since the second transport device transfers the substrate between the hands of the transfer device in the indoor state, the substrate can be directly and quickly transported between the i-th transfer device and the first device. And can contribute to the production capacity of the ancient 'A long substrate treatment. Further, in the substrate processing apparatus according to the present invention, the main body portion of the transport device in the tub has a mechanism for rotating the hand, and the hand is moved forward and backward with respect to the plurality of processing portions disposed adjacent to the transport chamber. The main body of the first reading & e-delivery device rotates the hand, and the multi-processing retreat operation of the hand with respect to the adjacent transport chamber is performed between the processing unit disposed adjacent to the adjacent transport chamber The transport of the substrate is performed. Therefore, the substrate transport direction is not limited to one direction. Further, in the substrate processing apparatus according to the present invention, the upper transporting device is provided with a plurality of main 2014-7082-PF 7 1331686 body portions of each of the first transporting devices, and the plurality of hand portions are arranged adjacent to each other. According to this configuration, the first transporting device is configured to move forward and retracting, and the plurality of first transporting main body portions are placed so as to be adjacent to each other. The predetermined processing unit advances and retracts: the intermediate needle can be transported between the plurality of processing units disposed adjacent to the transport chamber, and the substrate transport direction is not limited to one direction. Further, in the substrate processing apparatus according to the present invention, the main body portion of the upper transport device includes a middle portion that moves the hand (4) forward and backward in the adjacent processing portion, and a base portion that causes the intermediate portion to follow The hand, the intermediate stage, and the base are stacked in the vertical direction in the same direction as the direction in which the hand advances and retreats through the intermediate stage. In this configuration, since the main body portion is formed by stacking the hand portion, the intermediate portion, and the base portion in the vertical direction, the operation of both the intermediate table by the base portion and the intermediate portion of the intermediate table can be moved forward and backward. The hand moves forward and backward between % of the processing unit and the transport chamber. Further, in the substrate processing apparatus according to the present invention, the intermediate stage of the first transport apparatus is provided with a substrate detecting sensor that detects whether or not the substrate is mounted on the hand. Since the substrate detecting sensor that detects whether or not the substrate is mounted on the hand is provided on the intermediate stage of the first transport device, it is not necessary to provide wiring for operating the substrate detecting sensor from the intermediate stage to the hand. Wait. In the substrate processing apparatus according to the present invention, the substrate of the i-th transport device is provided with a plurality of protruding portions for restricting the movement of the substrate to the side surface on the substrate loading surface, and the substrate is loaded. Within the range formed by these plural protrusions. In this configuration, by providing a plurality of protrusions on the substrate mounting surface of the hand, the substrate can be restricted from moving laterally, and the substrate can be loaded on the substrate loading surface in a stable state for transportation.

According to the present invention, the hand of the first transport device provided in the transport chamber between the transport chamber and the processing portion adjacent to the transport chamber can directly move the substrate between the transport chamber and the processing portion, and in the transport chamber and It is not necessary to separately provide, for example, a transfer chamber or a transport mechanism between the processing chambers, thereby shortening the substrate transport path and shortening the total length of the substrate processing apparatus, thereby reducing the manufacturing cost of the apparatus. According to the present invention, the substrate in the transport chamber can be transported to the processing chamber by the second transport device, or the substrate can be transported from the processing chamber to the state in which the transport device is located in the transport chamber. The first transport 奘 奘 刃 乐 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 1 The substrate is shipped. According to the present invention, since the hand is moved relative to the transport chamber by the first turn, the substrate can be transported adjacent to the transport, and the main body of the substrate transfer device can be placed adjacent to each other in the main processing unit. The transport direction between any of the configured processing units is not limited to one side.

2014-7082-PF 8 9 1331686 To 0, according to the present invention, since the plural number 〗 〖T Ί * - Λβ .. to the device /, each 4' makes the above hand relative to the adjacent $ hangs t, adjacent In the plurality of processing units, the needle 1 transport device is preliminarily scheduled to move forward and backward. Therefore, the substrate transport is performed between the plurality of processing units disposed adjacent to the transport chamber, and the substrate transport direction is not Limited to one direction. According to the present invention, since the middle layer of the hand is the most "the top of the table, the base and the base are along the upper and lower sides.

And, by moving the intermediate table forward and backward by the base, and by the operation of both the middle mouth and the hand movement, the hand can move forward and backward between the processing unit and the transport unit, and you && In the state in which the hand is retracted from the processing unit, the size of the device is small, and the size of the device is small when the hand is moved in and out of the processing unit. The range of motion is large. Further, according to the present invention, since it is not necessary to provide wiring or the like for detecting the effect of the substrate from the intermediate stage to the hand, the structure of the hand that has entered the processing unit to transfer the substrate is simplified, thereby reducing the There is a possibility that an obstacle occurs when the processing unit performs the substrate transfer. Moreover, according to the present invention, the substrate is loaded on the substrate loading surface in a stable state by a plurality of projections provided on the substrate loading surface of the hand. In this way, the substrate can be stably placed on the hand without the need for the substrate suction mechanism or the like. Therefore, the piping or the like necessary for the case where the substrate suction mechanism needs to be provided can be eliminated from the hand or the like, and can be lowered. When the hand enters the processing unit, the particles in the processing unit invade 0. [Embodiment]

2014-7082-PF 10 1331686 An embodiment of the present invention will be described below with reference to the drawings. FIG. 2 is a diagram showing an example of a substrate processing apparatus according to an embodiment of the present invention. The substrate processing apparatus 1 mainly includes an indexer 2, a cleaning unit 1 , a dehydration drying 7 L 20 , and a photoresist coating unit 30 . A pre-bake 40 developing unit 80, a post-bake unit 90, and a buffer portion (f fer) 50' disposed between the pre-baking unit 40 and the exposing unit 60 are relatively In the indexer unit 2, the other processing units are arranged in a u-shaped arrangement, and the substrates are transported to the respective unit processing units and processed in the respective unit processing units in accordance with the gauge=transport order supplied from the indexer unit 2. Then, return to the above-described indexer unit 2 again. The substrate processing apparatus 1 is a coating (C0ater)/developing apparatus that connects and processes a plurality of processing units, and is connected to the exposure unit 而 to perform a part of a photolithography process. It is continuously performed from the cleaning before the photoresist coating to the photoresist coating, exposure, and development. The indexer unit 2 is provided with a cassette loading unit that mounts the cassette 4 in which the substrate is housed, and the substrate transport robot 3, and the substrate transport robot 3 takes out the substrate from the cassette 4 loaded in the cassette loading unit and delivers the substrate to the indexing unit 3 The monthly washing unit is 1 〇, and the processed substrate is received from the post-drying unit 9 并 and returned to the original casing 4 for storage. The cleaning unit 10 includes a transport unit 11, an ultraviolet ozone cleaning unit 1, a water washing unit 13, a liquid droplet removing unit 14, and a transport unit 15, for example, a substrate provided by the indexer unit 2, Carrying out cleaning treatment while transporting in a horizontal position

2014-7082-PF 11 1331686 The above-described dehydration drying unit 20 includes a transporting unit t^, a heating unit 22, a close-strengthening processing unit 23, and a cooling unit 24, and the storm plate is cleaned up for the completion of the cleaning process. First, heat treatment is performed on the heating portion 22 to reduce the moisture by a certain amount, and then the HMDS (Hexamethyldisilazane) which can improve the adhesion of the photoresist can be improved. After the fall, the substrate nP 23 is coated with n ... the cooling portion 24 is processed by the substrate.

The photoresist coating unit 30 includes a transport portion 31, a spin coating portion 32, a reduced-pressure drying portion 33, and an edge rinsing portion (an example of a processing portion in the patent application) 34. First, in the spin coating portion In the case of 32, a photoresist film is formed uniformly on the surface of the substrate, and after the dust reduction is performed in the reduced-pressure drying portion 33, the unnecessary photoresist film around the substrate is removed in the edge cleaning portion 34. A pre-supply unit 4A is provided on the side of the edge flushing portion 34. The pre-baking unit 40 includes a processing chamber 41b' in which the heating unit and the cooling unit are disposed in multiple stages, and the substrate 42 is taken out or returned to the processing chamber 41b by the robot 42, and the substrate is subjected to heating and cooling treatment. Further, the pre-baking unit 40 includes the processing chamber 41b and a transport chamber 41a (Fig. 2) provided at a lower portion of the processing chamber 4ib. The buffer unit 50 includes two storage portions 51 that can store a plurality of substrates, and a robot 52 disposed between the storage portions 51. The robot 52 stores the substrate before exposure and the exposed substrate. The substrate is temporarily placed on standby in each of the storage portions 51'. The exposure unit 60 includes, for example, an exposure machine for reducing the projection exposure machine and the like, and an alignment mechanism for performing positioning for printing the exposure pattern of the exposure unit to expose the pre-baked substrate.

2014-7082-PF 12 1331686 The above development unitization includes a carry-in drying portion 83 and a carry-out portion 84. For example, the developing unit 82 and the water spray the developing solution, and the developing portion 2 is applied to the substrate. The post-drying unit 90 includes the transporting portion 93 and the transporting portion 94. First, the heating is performed. The portion 92 is subjected to a cold heat treatment, and the substrate after the evaporation and removal of the substrate is subjected to a cooling treatment. "Shadow liquid or h lotion, in addition, in Figure 1, attached to the icon pre-supply ... buffer section 5. Between the two:: the loading platform of the board, on the carrier substrate. Moreover, the reference mark 70 is exposed The second time 'time is loaded onto the conveyor belt of the developing unit 80. The earth plate is transported here, and the photoresist is coated with the outer edge of the photoresist layer 34, the pre-bake early 40 and the robot 42. Fig. 2 is a plan view showing a schematic configuration of the edge flushing unit 34, the pre-drying unit 4Q, and the robot 42. Fig. 3 is a side view showing a schematic configuration of the edge flushing unit 34 and the pre-baking unit. The edge rinsing unit 34 is provided with a substrate up-and-down moving mechanism 34 that moves the substrate G up and down by the eight pins 341a to support the lower portion of the substrate (four). The pre-supply unit 40 includes a transport chamber 41a and is stacked and disposed. The plurality of processing chambers 41b in the upper portion of the transport chamber 41a. The substrate transport robot 4U (the first transport device) is provided in the transport chamber 41 & f. The substrate transport robot 411 transports the substrate G from the edge flushing portion 34 to the transport chamber 4 & The substrate transport robot 411 includes a loading substrate Hand 4111, and the hand 4111 toward the edge rinsing portion 34 side (substrate up and down moving mechanism 3 4 丄

The 2014-7082-PF 8 13 丄 331686 side) moves the intermediate stage 4112 and the base 4113 which moves the intermediate stage 4112 toward the edge flushing unit 34 side. The substrate transport robot 411 has its hand 4111 moved to the inside of the edge flushing portion 34 by the base portion 4113 and the intermediate portion 4112. The hand portion 4111 receives the substrate G from the substrate up-and-down moving mechanism 341, and the substrate G is loaded on the hand portion 4111. In the state, the base portion 4113 and the intermediate table 4112 are again moved to the transport chamber 41a, so that the transport of the substrate G from the edge flushing portion 34 to the transport chamber 41a is realized. The substrate G' loaded on the hand 4111 and moved into the transport chamber 41a is delivered from the hand 4 (1) to the robot 42 (second transport device) provided on the side of the transport chamber 4U. The robot 42 transports the received substrate g to any one of the plurality of processing chambers 4ib that are stacked on the upper portion of the transport chamber 41a. Then, the substrate conveyed to one of the processing chambers 41b is taken out from the pre-baking unit 4 by the robot 42 (the processing chamber ο. is taken out and transferred to the unit of the next process. Here, the structure of the substrate transport robot 411 is given 4 is a plan view showing a substrate transport robot in a state of being stored in a transport chamber. FIG. 5 is a plan view showing a substrate transport robot 411 in a state before loading the substrate G, and FIG. 6 is a loading substrate G. FIG. 7 is a side view showing the front end portion of the handcuff 4111 of the second person 411, and FIG. 8 is a plan view showing the state of the substrate transport robot (1). A side view of the sensor portion is detected. The substrate transport robot 411 includes the hand 4 ιιι, as described above.

2014-7082-PF 14 1331686 Intermediate stage 4112 and base 4113. The base portion 4113 is provided on the bottom surface ' of the transport portion 41a' on the upper surface 411 3a of the base portion 4113, and is provided with an air cylinder 411 3b for driving the intermediate stage 4112, and a movement for guiding the intermediate stage 4112 driven by the air cylinder 4丨丨3b. Direct motion guiding mechanism 4113c. The linear guide mechanism 4113c is moved to the side of the edge flushing portion 34 in order to move the intermediate table 4112 toward the edge flushing portion 34 side. Further, the air cylinder 4113b is fitted at the mounting position of the linear motion guiding mechanism 4113c and at a position that does not affect the movement of the intermediate stage 4112. The lower portion of the intermediate stage 4112 is slidably mounted on the linear motion guiding mechanism 4113c. On the upper surface 4U2a of the intermediate stage 4112, an air cylinder 4U2b for driving the hand 4111 and a linear motion guiding mechanism 4112c for guiding the movement of the hand (four) driven by the air cylinder 4U2b are provided. The linear motion guiding mechanism 4112c is disposed so as to be movable toward the edge flushing portion (4) in order to move the hand 4ι to the edge flushing portion 34 side.

Stretch. In addition, the 'air redness 4'1?h is the ffi? I' cylinder 4UZb is broken and assembled at the mounting position of the linear motion guiding mechanism 411& and the position which does not affect the movement of the hand 4(1). The lower portion of the hand 4(1) is slidably mounted in the intermediate stage guide mechanism 4112... The hand 4111 includes .2 long strip members 41Ua and 4 strip members extending side by side (4) for 4111b Λ #4111a is disposed to extend toward the side of the edge rinsing portion 34, and the elongated member 4 is sturdy, and the sinus is placed to extend in a direction perpendicular to the elongated member 4111a. I support the pin 411le in each of the elongated members 4111, for example, four substrates 1 C° are mounted, and viewed from the top, in the hand 4 (1)

In the vicinity of 2014-7082-PF 8 15 , four substrate support pins 4111c are also provided. The substrate G is loaded on the 12 substrate support pins 4111. on. Further, a front end portion of the two elongated members 4 111a on the side of the edge flushing portion 34 (the end portion of the hand 4111 in the forward direction) is provided with a substrate guide pin 4111d (projecting portion). Further, two substrate guide pins (projecting portions) 4111e and 4111f are provided on each of the two elongated members 4111b. The height of the substrate guide pin 4Uld is set to be higher than that of the substrate support pin 4nic as shown in Fig. 7, and the same is true for the substrate guide pins 4111e and 4111f. The substrate G is loaded on the substrate supporting pin 4111 of the hand 4111. In the upper case, the mounting positions of the substrate guide pins 4111d and 4111e are set such that the substrate guide pins 4md provided on the elongated member 4111a are in contact with the front end portion of the substrate G in the advancing direction of the hand portion 4111, and are disposed in a strip shape. The substrate guide pin 4nie on the member 4111b is in contact with the rear end portion of the substrate G in the forward direction of the hand 4n1. Further, the substrate guide pin 41116 provided on the elongated member 4111b is attached to a position in contact with the side surface of the substrate G in the forward direction of the hand. Thus, the substrate guiding pins 41 lid, 41 lie can restrict the movement of the substrate G in the state of being loaded on the substrate supporting pin 41Uc in the advancing direction of the hand portion 4111, and the substrate guiding pin 4111f restricts the advancement of the substrate G and the hand portion 4111 The movement of the direction perpendicular to the direction. Further, as shown in Fig. 6, at the front end portion of the upper hand portion 4111 in the advancing direction of the intermediate table 4112, when the hand portion 41丨i moves to the maximum extent on the edge flushing portion 34 side, the upper hand portion 4111 does not exist. The substrate detecting sensor 4114 is disposed at the position. The substrate detecting sensor 4114 is as shown in FIG. 8 16

2014-7082-PF 8 丄^1686 Returns to the standby position shown in Figure 2 to Figure 4. In the state where the substrate G is loaded on the hand 4111, the hand is ο. When the intermediate stage 4112 returns to the standby position shown in FIGS. 2 to 4 described above, the robot 42 enters the transport chamber 41a, and the hand squats into the substrate G and the elongated member 4111a formed by the substrate supporting pin 4111C. The gap between 4111b is 'up to the position indicated by the double dot line. Then, the hand 卩 42a rises to be in a state in which the substrate ς is loaded. When the substrate G is loaded on the hand 42a, the hand 4 of the robot 42 moves in the direction away from the transport chamber 41a, and then the hand 42a rises to the processing chamber 4 where f is the storage destination of the substrate G. Immediately after the height, the hand 42a is moved in the horizontal direction toward the processing chamber 41b and proceeds to the processing 41b, and the substrate g is stored in the processing chamber 4ib. The present invention is not limited to the configuration of the above embodiment, and various changes are possible. For example, in the above embodiment, the case where the substrate transport robot 411 provided in the transport chamber 41a transports the substrate G from the edge flushing portion 34 to the transport chamber 41a side is described, but the substrate processing apparatus 1 of the present invention does not In addition to this configuration, as shown in FIG. 9 and FIG. 1 below, the substrate transport robot 411 may be configured to transport the substrate G to a plurality of processing units provided adjacent to the pre-baking unit 40. 9 is a side view showing a schematic configuration of a pre-baking unit 40 and a plurality of processing units adjacent to the pre-baking unit 4, and FIG. 1A shows a pre-baking unit 4A, a plurality of processing units adjacent to the pre-baking unit 40, and A top view of a simplified configuration of the robot 42. For example, as shown in Fig. 9, it is also possible to carry the pre-drying unit 4〇 in the transport room.

2014-7082-PF 8 19 1331686 41a, two substrate transport robots 411 are disposed at different heights, and the substrate 4 can be moved by moving the hand 4111 of one of the substrate transport robots 411 in the direction of the arrow as shown in the figure. The substrate G is transported from the processing unit 500 adjacent to the pre-baking unit 40 to the transport chamber 41a, and the substrate 4 is moved from the hand 4111 of the other substrate transport robot 411 in the direction of the arrow as shown in the drawing. The other processing unit 501 of 4 turns is transported to the transport chamber 41a. In this case, the substrate transport to the processing unit 500 and the processing unit 501 can be simultaneously performed. Further, as shown in FIG. 10, the substrate transport robot 411 in the transport chamber 41a may be provided to be rotatable in the horizontal direction (in the direction of the arrow shown), and may be adjacent to the pre-bake unit 4A. Which one of the processing units 500 and 501 is provided to transfer the substrate G can change the orientation of the hand 4111. In this case, it suffices that only one substrate transport robot 411 is placed in the transport chamber 4ia, so that the configuration in which the substrate G can be transported in the above two directions can be made relatively simple. Further, the configuration of the substrate transport mechanism between the pre-baking unit 4A and the processing unit adjacent thereto is merely one example, and the configuration is not limited to the above configuration. Further, the substrate transport direction between the pre-baking unit 4A and the processing portion adjacent thereto is not limited to the direction from the edge flushing portion 34 toward the pre-baking unit 40, and the substrate G may be employed in a different direction. (for example, the opposite direction) transport composition. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a view showing a substrate processing apparatus according to an embodiment of the present invention -

Figure of the 2014-7082-PF 20 case. Fig. 2 is a plan view showing a schematic configuration of an edge flushing unit, a pre-baking unit, and a robot. Fig. 3 is a side view showing a schematic configuration of an edge rinsing unit and a pre-baking unit. Fig. 4 is a plan view showing the substrate transport robot in a state of being housed in the transport chamber. Fig. 5 is a plan view showing the substrate transfer robot in a state before the substrate is loaded. Fig. 6 is a plan view showing a state of the substrate transport robot when the substrate is loaded. Fig. 7 is an enlarged side view showing the front end portion of the substrate transport robot hand. Fig. 8 is a side view showing the portion of the substrate detecting sensor provided on the intermediate stage.

Fig. 9 is a side view showing a schematic configuration of a plurality of pre-baking units and a plurality of processing units adjacent to the pre-baking unit. Fig. 10 is a plan view showing a schematic configuration of a pre-baking unit, a plurality of processing units adjacent to the pre-baking unit, and a robot. 11 is a plan view showing a schematic configuration of an edge rinsing unit, a pre-supply unit, and a robot of a conventional substrate processing apparatus. [Description of main component symbols] 1~Substrate processing apparatus 3 4~Edge rinsing section 3 41 a~pin 30~Photoresist coating unit 34Substrate up and down moving mechanism 341b upper surface 21

2014-7082-PF 8 1331686 40~ pre-baking unit 41a to transport chamber 41 processing chamber 41, substrate transport robot 411 hand 4111a, 4111b to strip member 4111c to substrate support pin 411 Id to 4111 f~ substrate guide Pin 4112 - intermediate stage 4112a - upper surface 4112b - air cylinder 4112c - linear motion guiding mechanism 4113 - base portion 4113a - upper surface 4113b - air cylinder 411 3c - linear motion guiding mechanism 4114 - substrate detecting sensor 4114a - light emitting portion 4114b - receiving light Department 42~Robot

42a to hand 500, 501 to processing unit G to substrate

2014-7082-PF 22

Claims (1)

Japanese Patent Application Laid-Open No. 094113925, the scope of the patent application: Date of revision: 98.1.13 Amnesty) The substrate processing device of the positive wooden chamber, the complex processing having a stacked configuration, comprising: a transport chamber, relative to the above complex processing The processing unit is disposed adjacent to the transport chamber. The first transport device includes a hand for loading the substrate and a main body portion that is transported to the inside and moves the hand upward. 4 transported between the processing unit and the processing unit. 2. The second transporting device is further included in the scope of the patent application, and the chamber and the plurality of transport units are transported between the plurality of transports. The substrate is transported. 3 · If you apply for a patent scope? a Middle (four) 2 $ substrate processing split, the Z transport device in the above-mentioned 1st 7th * /, in the state of the transport room in the above-mentioned transport room, the music 1 transport device's abundance + day 4 ^ ^ hand. The substrate is transferred between the crucibles. The substrate processing apparatus according to any one of the preceding claims, wherein the main body of the apparatus for rotating the first hand has a mechanism for rotating the above-mentioned The first processing unit 1 is placed forward and backward with respect to the plurality of processing units adjacent to the transport chamber. In the first embodiment of the invention, the substrate transport device according to any one of the above, and the above-mentioned 3, the ancient "1 transport device is provided with plural, and the plural processing of each first configuration In the case where the hand moves forward and backward with respect to the adjacent processing unit, and each of the first transport devices is predetermined, 2014-7082-PF1 23 1331686, such as any one of the first and third items of the patent application, "3 items" Cup • 'Intermediately disposed processing unit into the retracting table' which causes the above-mentioned hand to be attached to the abutment with respect to the above-mentioned abutment.. 4* J Λς. AJt^N 'part' which causes the above-mentioned intermediate stage to pass along with the intermediate stage The hand advances and retreats in the same direction, and the hands, the intermediate table, and the base are stacked in the vertical direction. 7. The substrate processing apparatus according to claim 6, wherein a substrate detecting sensor that detects whether or not a substrate is mounted on the ® hand is provided on an intermediate stage of the first transporting device. The substrate processing apparatus according to any one of claims 1 to 3, wherein the hand of the first transporting device is provided with a plurality of protrusions on the substrate loading surface that restrict the movement of the substrate to the side surface. The substrate is loaded in a range formed by the plurality of protrusions. 2014-7082-PF1 24