TWI329782B - High resistivity compositions - Google Patents

High resistivity compositions Download PDF

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Publication number
TWI329782B
TWI329782B TW94136187A TW94136187A TWI329782B TW I329782 B TWI329782 B TW I329782B TW 94136187 A TW94136187 A TW 94136187A TW 94136187 A TW94136187 A TW 94136187A TW I329782 B TWI329782 B TW I329782B
Authority
TW
Taiwan
Prior art keywords
coating
group
pigment
modified pigment
modified
Prior art date
Application number
TW94136187A
Other languages
English (en)
Chinese (zh)
Other versions
TW200626363A (en
Inventor
Eugene N Step
Agathagelos Kyrlidis
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of TW200626363A publication Critical patent/TW200626363A/zh
Application granted granted Critical
Publication of TWI329782B publication Critical patent/TWI329782B/zh

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • C09D7/62Additives non-macromolecular inorganic modified by treatment with other compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/44Carbon
    • C09C1/48Carbon black
    • C09C1/56Treatment of carbon black ; Purification
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/44Carbon
    • C09C1/48Carbon black
    • C09C1/56Treatment of carbon black ; Purification
    • C09C1/565Treatment of carbon black ; Purification comprising an oxidative treatment with oxygen, ozone or oxygenated compounds, e.g. when such treatment occurs in a region of the furnace next to the carbon black generating reaction zone
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/41Organic pigments; Organic dyes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/19Oil-absorption capacity, e.g. DBP values
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/40Electric properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/04Carbon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW94136187A 2004-10-15 2005-10-17 High resistivity compositions TWI329782B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US61931704P 2004-10-15 2004-10-15
US64597205P 2005-01-11 2005-01-11
US69820405P 2005-07-07 2005-07-07
US70800005P 2005-08-12 2005-08-12
US71587705P 2005-09-09 2005-09-09

Publications (2)

Publication Number Publication Date
TW200626363A TW200626363A (en) 2006-08-01
TWI329782B true TWI329782B (en) 2010-09-01

Family

ID=35929746

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94136187A TWI329782B (en) 2004-10-15 2005-10-17 High resistivity compositions

Country Status (8)

Country Link
US (2) US7807321B2 (https=)
EP (2) EP2728407B1 (https=)
JP (1) JP4819819B2 (https=)
KR (2) KR101341262B1 (https=)
CN (2) CN102558933B (https=)
CA (1) CA2583739A1 (https=)
TW (1) TWI329782B (https=)
WO (1) WO2006044676A2 (https=)

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JP2007131831A (ja) * 2005-11-09 2007-05-31 Cheil Industries Inc ベンゼン化合物で表面処理されたカーボンブラック及びこれを利用したカラーフィルター用ブラックマトリックスに用いるカーボンブラック分散液組成物
KR100725023B1 (ko) 2006-10-16 2007-06-07 제일모직주식회사 카도계 수지를 함유한 수지 조성물 및 그에 의한 패턴의 제조방법, 이를 이용한 컬러필터
JP6012927B2 (ja) * 2007-04-24 2016-10-25 キャボット コーポレイションCabot Corporation 低構造カーボンブラックおよびその作製方法
TWI465500B (zh) 2010-09-03 2014-12-21 Cabot Corp 經修飾充填物及包含其之彈性複合物
CN102436142B (zh) 2010-09-29 2013-11-06 第一毛织株式会社 黑色光敏树脂组合物以及使用其的光阻层
KR101367253B1 (ko) 2010-10-13 2014-03-13 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
US9238736B2 (en) 2010-10-15 2016-01-19 Cabot Corporation Surface modified organic black pigments, surface modified carbon blacks, pigment mixtures using them, and low dielectric black dispersions, coatings, films, black matrices, and devices containing same
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KR101453771B1 (ko) * 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101486560B1 (ko) 2010-12-10 2015-01-27 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
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KR101596533B1 (ko) * 2011-11-22 2016-02-22 주식회사 엘지화학 열경화성 블랙 잉크 조성물, 이를 이용하여 형성된 패턴 및 이를 포함하는 전자소자
KR101344786B1 (ko) 2011-12-02 2013-12-26 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101696529B1 (ko) 2012-03-02 2017-01-13 캐보트 코포레이션 개질된 충전제 및 관능화 엘라스토머를 함유하는 엘라스토머 복합재
US9175150B2 (en) 2012-03-02 2015-11-03 Cabot Corporation Modified carbon blacks having low PAH amounts and elastomers containing the same
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서
JP6173556B2 (ja) 2013-03-13 2017-08-02 キャボット コーポレイションCabot Corporation 組み合わされた低誘電率、高抵抗率及び光学濃度特性、ならびに、制御された電気抵抗率を有するフィラー−ポリマー組成物を含むコーティング、それから製造されるデバイス及びその製造方法
JP6240924B2 (ja) * 2013-06-07 2017-12-06 株式会社Adeka 光硬化性黒色組成物
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CN109642091B (zh) 2016-07-01 2021-10-08 卡博特公司 具有带有低结构炭黑芯的经包覆的聚集体的复合颗粒、具有高的电阻率和光学密度的涂料和墨、由其制得的器件、以及其制造方法
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JP2006503114A (ja) 2002-01-07 2006-01-26 キャボット コーポレイション 改質ピグメント生成物およびそれを含むブラックマトリクス
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CN102558933B (zh) 2014-12-17
EP1810079A2 (en) 2007-07-25
EP2728407A1 (en) 2014-05-07
EP1810079B1 (en) 2014-08-20
CN102558933A (zh) 2012-07-11
JP2008517330A (ja) 2008-05-22
US7807321B2 (en) 2010-10-05
KR101268232B1 (ko) 2013-05-31
TW200626363A (en) 2006-08-01
CA2583739A1 (en) 2006-04-27
JP4819819B2 (ja) 2011-11-24
KR20070064674A (ko) 2007-06-21
US20110009551A1 (en) 2011-01-13
US20060084751A1 (en) 2006-04-20
US8697778B2 (en) 2014-04-15
CN101371194B (zh) 2012-01-04
KR20120132564A (ko) 2012-12-05
KR101341262B1 (ko) 2013-12-13
CN101371194A (zh) 2009-02-18
WO2006044676A3 (en) 2008-09-18
WO2006044676A2 (en) 2006-04-27

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