TWI316304B - Transistor element, display device and these manufacturing methods - Google Patents
Transistor element, display device and these manufacturing methodsInfo
- Publication number
- TWI316304B TWI316304B TW095136584A TW95136584A TWI316304B TW I316304 B TWI316304 B TW I316304B TW 095136584 A TW095136584 A TW 095136584A TW 95136584 A TW95136584 A TW 95136584A TW I316304 B TWI316304 B TW I316304B
- Authority
- TW
- Taiwan
- Prior art keywords
- display device
- manufacturing methods
- transistor element
- transistor
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/478—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a layer of composite material comprising interpenetrating or embedded materials, e.g. TiO2 particles in a polymer matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
- H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Nonlinear Science (AREA)
- Composite Materials (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005290129A JP2007103584A (ja) | 2005-10-03 | 2005-10-03 | トランジスタ素子、表示装置およびこれらの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200746487A TW200746487A (en) | 2007-12-16 |
TWI316304B true TWI316304B (en) | 2009-10-21 |
Family
ID=37942663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095136584A TWI316304B (en) | 2005-10-03 | 2006-10-02 | Transistor element, display device and these manufacturing methods |
Country Status (7)
Country | Link |
---|---|
US (1) | US20090189148A1 (zh) |
EP (1) | EP1932183B1 (zh) |
JP (1) | JP2007103584A (zh) |
KR (1) | KR100996933B1 (zh) |
CN (1) | CN101278404B (zh) |
TW (1) | TWI316304B (zh) |
WO (1) | WO2007043419A1 (zh) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008135527A (ja) * | 2006-11-28 | 2008-06-12 | Dainippon Printing Co Ltd | 有機半導体素子 |
WO2009004793A1 (ja) * | 2007-07-03 | 2009-01-08 | Panasonic Corporation | 半導体装置とその製造方法および画像表示装置 |
JP5277675B2 (ja) * | 2007-07-11 | 2013-08-28 | 株式会社リコー | 有機薄膜トランジスタの製造方法 |
US20090014716A1 (en) * | 2007-07-11 | 2009-01-15 | Takumi Yamaga | Organic thin-film transistor and method of manufacturing the same |
JP5380831B2 (ja) * | 2007-12-07 | 2014-01-08 | 株式会社リコー | 有機トランジスタ及びその製造方法 |
JP5368013B2 (ja) * | 2008-06-24 | 2013-12-18 | 共同印刷株式会社 | フレキシブル有機elディスプレイの製造方法 |
JP5368014B2 (ja) * | 2008-06-24 | 2013-12-18 | 共同印刷株式会社 | フレキシブル有機elディスプレイの製造方法 |
JP5376287B2 (ja) | 2008-08-06 | 2013-12-25 | セイコーエプソン株式会社 | 回路基板、電気光学装置、電子機器 |
CN101760035B (zh) | 2008-12-24 | 2016-06-08 | 清华大学 | 热界面材料及该热界面材料的使用方法 |
TWI394825B (zh) * | 2009-01-16 | 2013-05-01 | Hon Hai Prec Ind Co Ltd | 熱介面材料及該熱介面材料之使用方法 |
KR101127574B1 (ko) * | 2009-04-06 | 2012-03-23 | 삼성모바일디스플레이주식회사 | 액티브 매트릭스 기판의 제조방법 및 유기 발광 표시장치의 제조방법 |
KR101058105B1 (ko) * | 2009-04-06 | 2011-08-24 | 삼성모바일디스플레이주식회사 | 액티브 매트릭스 기판의 제조방법 및 유기 발광 표시장치의 제조방법 |
JP5446982B2 (ja) * | 2009-05-01 | 2014-03-19 | 株式会社リコー | 画像表示パネル及び画像表示装置 |
WO2011042430A1 (en) | 2009-10-05 | 2011-04-14 | Acreo Ab | Electrochemical device |
KR20120010513A (ko) * | 2010-07-26 | 2012-02-03 | 삼성전자주식회사 | 바이오 물질 수용소자와 그 제조 및 동작방법 |
US9709867B2 (en) | 2010-10-05 | 2017-07-18 | Rise Acreo Ab | Display device |
JP2012115761A (ja) * | 2010-11-30 | 2012-06-21 | Seiko Epson Corp | 印刷方法及び印刷装置 |
JP6035458B2 (ja) | 2011-04-05 | 2016-12-07 | リンテック株式会社 | 電極上での自己整列電解質に基づく電気化学デバイスの製造方法 |
US20140183457A1 (en) * | 2013-01-03 | 2014-07-03 | Lisa H. Stecker | Transistor with Organic Semiconductor Interface |
EP2903046A1 (en) | 2014-01-30 | 2015-08-05 | National Research Council Of Canada | CNT thin film transistor with high K polymeric dielectric |
CN104576758A (zh) * | 2015-01-22 | 2015-04-29 | 合肥京东方光电科技有限公司 | 薄膜晶体管、阵列基板及其制作方法 |
CN104752343B (zh) * | 2015-04-14 | 2017-07-28 | 深圳市华星光电技术有限公司 | 双栅极氧化物半导体tft基板的制作方法及其结构 |
JP2017028165A (ja) * | 2015-07-24 | 2017-02-02 | ソニー株式会社 | 表示装置および撮像装置 |
CN110854302B (zh) * | 2019-10-31 | 2021-02-26 | 深圳市华星光电半导体显示技术有限公司 | Oled显示面板及其制备方法、oled显示装置 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6372534B1 (en) * | 1995-06-06 | 2002-04-16 | Lg. Philips Lcd Co., Ltd | Method of making a TFT array with photo-imageable insulating layer over address lines |
JPH09311342A (ja) * | 1996-05-16 | 1997-12-02 | Semiconductor Energy Lab Co Ltd | 表示装置 |
JP3801271B2 (ja) * | 1996-08-30 | 2006-07-26 | 旭硝子株式会社 | アクティブマトリクス基板 |
CN1148600C (zh) * | 1996-11-26 | 2004-05-05 | 三星电子株式会社 | 薄膜晶体管基片及其制造方法 |
JP3520396B2 (ja) | 1997-07-02 | 2004-04-19 | セイコーエプソン株式会社 | アクティブマトリクス基板と表示装置 |
JP3141860B2 (ja) * | 1998-10-28 | 2001-03-07 | ソニー株式会社 | 液晶表示装置の製造方法 |
US6586791B1 (en) * | 2000-07-19 | 2003-07-01 | 3M Innovative Properties Company | Transistor insulator layer incorporating superfine ceramic particles |
JP4380954B2 (ja) * | 2001-09-28 | 2009-12-09 | 三洋電機株式会社 | アクティブマトリクス型表示装置 |
JP4572501B2 (ja) * | 2002-02-27 | 2010-11-04 | コニカミノルタホールディングス株式会社 | 有機薄膜トランジスタの製造方法 |
US6740900B2 (en) * | 2002-02-27 | 2004-05-25 | Konica Corporation | Organic thin-film transistor and manufacturing method for the same |
JP2004014982A (ja) * | 2002-06-11 | 2004-01-15 | Konica Minolta Holdings Inc | 半導体回路および画像表示装置 |
GB0302485D0 (en) * | 2003-02-04 | 2003-03-05 | Plastic Logic Ltd | Pixel capacitors |
CN1282259C (zh) * | 2003-03-03 | 2006-10-25 | 中国科学院长春应用化学研究所 | 含有保护层的有机半导体场效应晶体管及制作方法 |
JP2005037851A (ja) * | 2003-06-24 | 2005-02-10 | Seiko Epson Corp | 電気泳動分散液、電気泳動表示装置、電気泳動表示装置の製造方法および電子機器 |
KR100542993B1 (ko) * | 2003-07-26 | 2006-01-20 | 삼성에스디아이 주식회사 | 고효율 평판표시장치 및 그의 제조방법 |
JP4254419B2 (ja) * | 2003-08-20 | 2009-04-15 | ブラザー工業株式会社 | 通信システムの質問器 |
DE10340641A1 (de) * | 2003-09-03 | 2005-04-07 | Siemens Ag | Strukturierung von Gate-Dielektrika in organischen Feldeffekt-Transistoren |
JP4444694B2 (ja) * | 2004-03-03 | 2010-03-31 | 株式会社リコー | 液晶表示素子 |
JP2007019014A (ja) * | 2005-07-06 | 2007-01-25 | Samsung Sdi Co Ltd | 平板表示装置及びその製造方法 |
KR100754395B1 (ko) * | 2006-02-10 | 2007-08-31 | 삼성전자주식회사 | 유기 전자발광 디스플레이 및 그 제조방법 |
-
2005
- 2005-10-03 JP JP2005290129A patent/JP2007103584A/ja active Pending
-
2006
- 2006-09-28 CN CN2006800368229A patent/CN101278404B/zh not_active Expired - Fee Related
- 2006-09-28 US US12/067,251 patent/US20090189148A1/en not_active Abandoned
- 2006-09-28 EP EP06811242.4A patent/EP1932183B1/en not_active Not-in-force
- 2006-09-28 WO PCT/JP2006/319904 patent/WO2007043419A1/en active Application Filing
- 2006-09-28 KR KR1020087008131A patent/KR100996933B1/ko active IP Right Grant
- 2006-10-02 TW TW095136584A patent/TWI316304B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1932183A1 (en) | 2008-06-18 |
US20090189148A1 (en) | 2009-07-30 |
CN101278404B (zh) | 2013-01-23 |
KR100996933B1 (ko) | 2010-11-29 |
EP1932183B1 (en) | 2014-07-16 |
JP2007103584A (ja) | 2007-04-19 |
EP1932183A4 (en) | 2010-06-16 |
KR20080053347A (ko) | 2008-06-12 |
WO2007043419A1 (en) | 2007-04-19 |
TW200746487A (en) | 2007-12-16 |
CN101278404A (zh) | 2008-10-01 |
WO2007043419A9 (en) | 2007-06-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |