TWI312179B - Clamping apparatus, substrate transfer apparatus, and in-line fpd automatic optical inspection apparatus - Google Patents

Clamping apparatus, substrate transfer apparatus, and in-line fpd automatic optical inspection apparatus Download PDF

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Publication number
TWI312179B
TWI312179B TW95128337A TW95128337A TWI312179B TW I312179 B TWI312179 B TW I312179B TW 95128337 A TW95128337 A TW 95128337A TW 95128337 A TW95128337 A TW 95128337A TW I312179 B TWI312179 B TW I312179B
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Taiwan
Prior art keywords
substrate
transfer
disposed
plate
vacuum
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TW95128337A
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Chinese (zh)
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TW200711024A (en
Inventor
Min-Suk Kim
Sang-Eun Kim
Yung-Sung Lee
Eun-Kyung Lee
Sang-Sik Min
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Advanced Display Proc Eng Co
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Priority claimed from KR1020050071367A external-priority patent/KR101139371B1/en
Priority claimed from KR1020050071378A external-priority patent/KR101138727B1/en
Priority claimed from KR1020050073713A external-priority patent/KR101210939B1/en
Priority claimed from KR1020050076036A external-priority patent/KR101138728B1/en
Application filed by Advanced Display Proc Eng Co filed Critical Advanced Display Proc Eng Co
Publication of TW200711024A publication Critical patent/TW200711024A/en
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Publication of TWI312179B publication Critical patent/TWI312179B/en

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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Description

1312179 九、發明說明: 【發月所屬之技術領域】 , 發明係有關於失持設備、基材傳送設備以及同線平 面面板顯示器自動光學價測設備,並且更明確地説,係有 關於能夠藉由增加傳送該基材的夾持力來避免基材脫離或 其©定位置改變的奂播同線FPP自 動光學 【先前技術】 在平面面板顯示器(flat panel display,FPD)的製造製 程中’刮痕或所有種類的污點皆有可能形成在一基材上 一顯示器面板偵測設備係用來偵測該等刮痕或所有種類的 污點’以達到降低不良率的目的。例如,一同線FPD自動 光學偵測設備可在引導例如TFT — LCD基材、PDP或彩色 濾光片等顯示器基材時利用一光學透鏡及C C D攝影機捕 捉偵測標的的影像後運用視覺影像處理演算規則來偵測所 有種類的缺陷。 第1圖係示出提供有基材夾持設備以偵測基材5 0 〇之 基材傳送設備的圖示。 如第1圖所示,形成用來漂浮該基材5 〇 〇中央部分的 載具8 00,並在該載具800的兩個相對表面上安裝用來傳 送接收在該載具800上之基材500的夾持設備。同樣地’ 該基材500以該兩個相對表面皆由該失持設備7〇〇支樓的 狀態通過該載具800上方部分。此時,若該基材是一大尺 61312179 IX. Description of the invention: [Technical field to which the moon belongs], the invention relates to the automatic optical price measurement equipment for the lost device, the substrate transfer device and the flat panel display, and more specifically, the The same-line FPP automatic optics is used to increase the clamping force of the substrate to avoid the detachment of the substrate or its position change. [Prior Art] In the manufacturing process of flat panel display (FPD) Traces or all kinds of stains may be formed on a substrate. A display panel detection device is used to detect such scratches or all kinds of stains' to achieve the purpose of reducing the defect rate. For example, a common line FPD automatic optical detection device can use an optical lens and a CCD camera to capture and detect an image of an object after guiding a display substrate such as a TFT-LCD substrate, a PDP, or a color filter, and then use a visual image processing algorithm. Rules to detect all kinds of defects. Fig. 1 is a view showing a substrate transfer apparatus provided with a substrate holding device to detect a substrate 50. As shown in Fig. 1, a carrier 800 for floating the central portion of the substrate 5 is formed, and a base for transporting and receiving on the carrier 800 is mounted on two opposite surfaces of the carrier 800. Clamping device for material 500. Similarly, the substrate 500 passes through the upper portion of the carrier 800 in a state where the two opposing surfaces are supported by the lost device 7 . At this time, if the substrate is a large rule 6

1312179 寸基材,該基材500的中央部分會因為該基材的靜負載產 生傾斜,而不會保持在平坦狀態。據此,該載具上會形成 氣隙,因此該基材500可以氣流懸浮狀態傳送。此外,例 如C CD攝影機的視覺裝置檢視所傳送的基材是否正常,並 且可以設置在該載具800的上方部分。 但是,近來,隨著該基材500之大尺寸及高速傳送的 快速演進,當習知夾持設備7 〇 〇利用一圓柱的機械夾盤力 固定該基材5 0 0時,會有一個不利條件在於該基材在該基 材5 0 0的傳送過程中從該夾持設備7 0 0脫離,因為固定該 基材500的夾盤力。此外,即使該基材500沒有完全脫離, 但該基材5 0 0滑離該夾持設備7 0 0固定的位置一段預定距 離,因此在該基材500上產生破裂。 【發明内容】 據此,本發明係經創造以解決上述發生在先前技藝中 的問題,並且本發明之一目的在於提供一種夾持設備、一 種基材傳送設備以及一種同線F P D自動光學偵測設備,以 嚴密地固定一基材,其可避免該基材從該基材夾持設備脫 離或漂浮。 本發明之其他優勢、目的及特徵的一部分會在如下敘 述中提出,並且一部分會在檢視如下說明後對熟知技藝者 而言變得顯而易見,或可由本發明的實施中習得。 在本發明之一觀點中,提供一種基材夾持設備,其包 含:一上夾盤;以及一下夾盤,配置來將一基材插入該上 7 1312179With a 1312179 inch substrate, the central portion of the substrate 500 will tilt due to the static load of the substrate and will not remain flat. Accordingly, an air gap is formed on the carrier, so that the substrate 500 can be transported in an air suspension state. Further, a visual device such as a C CD camera examines whether or not the substrate conveyed is normal, and may be disposed at an upper portion of the carrier 800. However, recently, with the rapid development of the large size and high-speed conveyance of the substrate 500, when the conventional clamping device 7 is used to fix the substrate 500 by a cylindrical mechanical chuck force, there is an disadvantage. The condition is that the substrate is detached from the holding device 700 during the transfer of the substrate 500 because the chuck force of the substrate 500 is fixed. Further, even if the substrate 500 is not completely detached, the substrate 500 is slid away from the fixed position of the holding device 700 by a predetermined distance, so that cracking occurs on the substrate 500. SUMMARY OF THE INVENTION Accordingly, the present invention has been made to solve the above problems occurring in the prior art, and an object of the present invention is to provide a clamping device, a substrate transfer device, and an on-line FPD automatic optical detection. A device to tightly secure a substrate that prevents the substrate from escaping or floating from the substrate holding device. Some of the advantages, objects, and features of the invention will be set forth in the description which follows. In one aspect of the invention, a substrate holding apparatus is provided, comprising: an upper chuck; and a lower chuck configured to insert a substrate into the upper portion 7 1312179

夾盤和該下夾盤間並夾住該基材,其中一配置來吸附及 定該基材的真空噴孔係形成在面對彼此的上及下夾盤的 對表面之至少一者上。 較佳地,為了避免真空壓力洩漏,該真空喷孔從一 材接觸表面突出一段預定高度,並且係由軟質彈性材料 成。 一穿孔形成在上及下夾盤的相對表面之至少一者上 並且該真空喷孔可設置在該穿孔中,並在該等相對表面 以一或多列配置。此外,提供該等相對表面之至少一者 避震器,包含PEEK(聚醚醚酮)、高分子聚乙烯以及氟化 脂化合物之一,以避免該基材因為基材接觸而損傷。 在本發明之另一觀點中,提供一種基材傳送設備, 包含:一基材炎持設備,包含一上爽盤以及一下央·盤, 置來將一基材插入該上夾盤和該下夾盤間並夾住該基材 其中提供該上及下夾盤的相對表面之至少一者具有用來 附及固定該基材的真空噴孔之基材夾持設備;以及一 具,配置來以一真空壓力支撐該基材,該基材夾持設備 設置在該載具的一側或兩側上。 該載具喷孔包含複數個空氣喷孔,配置來漂浮該 材,以及一滾筒單元,配置來傳送該基材。 較佳地,該載具形成一塗層,例如氟塑料或鐵氟龍 在本發明之一觀點中,提供一種同線FPD自動光學 測設備,其包含:一傳送板,設置在一載具的一側上; 夾持及一固定校直點,設置在該傳送板的一側上;以及 固 相 基 形 上 樹 其 配 5 吸 載 係 基 偵 8The substrate is sandwiched between the chuck and the lower chuck, and a vacuum orifice configured to adsorb and define the substrate is formed on at least one of the pair of surfaces facing the upper and lower chucks of each other. Preferably, in order to avoid vacuum pressure leakage, the vacuum orifice protrudes from the material contact surface by a predetermined height and is made of a soft elastic material. A perforation is formed in at least one of the opposing surfaces of the upper and lower chucks and the vacuum orifices can be disposed in the perforations and disposed in one or more columns on the opposing surfaces. Further, at least one of the opposing surfaces is provided with a shock absorber comprising one of PEEK (polyetheretherketone), high molecular weight polyethylene, and a fluorinated lipid compound to prevent damage to the substrate due to substrate contact. In another aspect of the present invention, a substrate transfer apparatus is provided, comprising: a substrate susceptor device comprising a top plate and a bottom plate for inserting a substrate into the upper chuck and the lower portion Between the chucks and sandwiching the substrate, wherein at least one of the opposite surfaces of the upper and lower chucks has a substrate holding device for attaching a vacuum nozzle of the substrate; and The substrate is supported by a vacuum pressure, and the substrate holding device is disposed on one or both sides of the carrier. The carrier orifice includes a plurality of air orifices configured to float the material, and a roller unit configured to convey the substrate. Preferably, the carrier forms a coating, such as fluoroplastic or Teflon. In one aspect of the invention, an in-line FPD automated optical measuring apparatus is provided, comprising: a transfer plate disposed on a carrier One side; a clamping and a fixed alignment point, disposed on one side of the conveying plate; and a solid-phase base on the tree with 5 suction base detection 8

1312179 可變校直點,設置在該傳送板的另一側上,其中該傳送板 係往與一傳送方向垂直的基材寬度方向移動,並且往一旋 轉方向以與該基材垂直的旋轉轴為中心旋轉。 該同線FPD自動光學偵測設備包含一基材校直單元, 其包含一驅動單元,配置來移動及旋轉該傳送板。 參見第1圖,一基材傳送設備包含用來漂浮一基材5 0 0 的中央部分的載具8 0 0,以及裝設在該載具8 0 0的一側或 兩個相對側上的夾持設備6 0 0。提供該夾持設備6 0 0 —真 空喷孔,形成在面對彼此之上及下央盤的相對表面之至少 —者上。 第2圖係示出設置在一基材傳送設備内的基材夾持設 備之側面圖式。 參見第2圖,配置來夹住該基材5 0 0的邊緣之該基材 夹持設備係配備有形成為板狀的上夾盤 1 〇 〇 a以及下夾 盤,用來夾住插入在該上夾盤 1 0 0 a和該下夾盤間的基材 5 0 0。配置來吸附及固定該基材5 0 0的真空喷孔係形成在面 對彼此的上及下夾盤l〇〇a和100b的相對表面上。 首先,該基材夾持設備包含該上夾盤1 〇 〇 a及該下夾盤 1 0 0b,其係經提供有該真空喷孔1 1 0,會在後方解釋。 根據本發明之基材夾持設備包含一固定單元1 〇 〇,具 有該上及下夾盤1 00a和1 00b,以利用機械壓力和真空吸 附來固定該基材5 0 0的一側,一垂直傳送單元2 0 0,以上 下移動該固定單元100,一水平移動單元300,以朝該基材 500或與該基材500相反的方向(此後稱為「基材寬度方向」) 91312179 A variable straightening point disposed on the other side of the conveying plate, wherein the conveying plate is moved to a width direction of the substrate perpendicular to a conveying direction, and a rotation axis perpendicular to the substrate in a rotating direction Rotate for the center. The in-line FPD automatic optical detection device includes a substrate alignment unit including a drive unit configured to move and rotate the transfer plate. Referring to Fig. 1, a substrate transfer apparatus includes a carrier 80 for floating a central portion of a substrate 500, and is mounted on one or both opposite sides of the carrier 800. Clamping device 600. The gripping device 600 - a vacuum orifice is provided, formed on at least one of the opposing surfaces facing each other and the lower central disc. Fig. 2 is a side view showing a substrate holding device provided in a substrate transfer apparatus. Referring to FIG. 2, the substrate holding device configured to sandwich the edge of the substrate 500 is provided with an upper chuck 1 〇〇a formed in a plate shape and a lower chuck for clamping the insertion therein. The substrate between the upper chuck 1 0 0 a and the lower chuck is 500. Vacuum orifices configured to adsorb and fix the substrate 500 are formed on opposite surfaces of the upper and lower chucks 10a and 100b facing each other. First, the substrate holding device includes the upper chuck 1 〇 〇 a and the lower chuck 100b, which are provided with the vacuum orifice 110, which will be explained later. The substrate holding apparatus according to the present invention comprises a fixing unit 1 〇〇 having the upper and lower chucks 100a and 100b for fixing the side of the substrate 500 by mechanical pressure and vacuum suction, The vertical transfer unit 200 moves the fixed unit 100 and the horizontal moving unit 300 upward and downward toward the substrate 500 or in the opposite direction to the substrate 500 (hereinafter referred to as "substrate width direction") 9

1312179 移動該固定單元100,根據該基材500的尺寸, 送板400,以將該固定單元100往該基材500的 移動。 例如,用來夾住該基材5 0 0的一側或兩側的 100包含該上夾盤l〇〇a及該下夾盤100b,其係與 間隔一段預定距離,並且可上下移動。用來真空 材5 0 0的真空喷孔1 1 0係設置在面對彼此的該上 1 0 0a和1 00b的相對表面上。後方會更詳細解釋 盤1 00b與該上夾盤1 00a的一側接觸,並且經配 基材500進入該上及下夾盤100a和100b間時, 該上夾盤l〇〇a的接觸表面往上移動來固定該基才 時,因為該基材500的厚度約為0.7毫米,該上 1 0 0 a和1 0 Ob間的距離可藉由持續上下移動該下 來控制。 用來上下移動該固定單元100的垂直傳送單 該固定單元100上下移動,以確保該基材500根 500的尺寸或製程設置在相應高度上。該垂直傳 也透過由一般真空壓力圓柱組成的垂直移動單元 單元1 0 0接觸。 用來將該固定單元100往該基材500的寬度 的水平傳送單元300透過一水平傳送工具與該垂 元2 00的一側連接。可用一普通的油壓和真空壓 其可在水平方向移動,來做為該水平傳送單元。 送設備300將該基材500移至固定位置,藉由將 以及一傳 傳送方向 固定單元 該上夾盤 吸附該基 及下夾盤 。該下爽 置以在該 藉由沿著 十5 0 0 °此 及下夾盤 夾盤100b 元2 00將 據該基材 .單元200 與該固定 方向移動 直傳送單 力圓柱, 該水平傳 該固定單 10 1312179 元1 00從該基材5 Ο 0往後移動,以避免在該基材5 Ο 0的接 收製程和取出製程中阻礙到該基材 5 〇 〇,然後在接收該基 材5 0 0後將該固定單元1 0 0朝該基材5 0 0移動。 用來沿著一載具傳送該固定單元1 00的傳送板400支 撐該固定單元100,該垂直傳送單元200以及在其底部支 撐該水平傳送單元 3 0 0,並且可藉由滑動通過沿著該載具 的一側或兩側的長度方向形成的傳送路徑移動。1312179 The fixing unit 100 is moved, and the plate 400 is fed to move the fixing unit 100 toward the substrate 500 according to the size of the substrate 500. For example, 100 for gripping one side or both sides of the substrate 500 includes the upper chuck 10a and the lower chuck 100b spaced apart by a predetermined distance and movable up and down. The vacuum orifices 110 for the vacuum material 500 are disposed on the opposite surfaces of the upper 10a and 100b facing each other. The rear side of the disc 1 00b is in more detail in contact with the side of the upper chuck 100a, and the contact surface of the upper chuck l〇〇a when the substrate 500 is inserted between the upper and lower chucks 100a and 100b When moving up to fix the base, since the thickness of the substrate 500 is about 0.7 mm, the distance between the upper 10 a and the 10 Ob can be controlled by continuously moving up and down. A vertical transfer sheet for moving the fixed unit 100 up and down The fixed unit 100 is moved up and down to ensure that the size or process of the base 500 of the substrate 500 is set at a corresponding height. The vertical transmission is also contacted by a vertical moving unit unit 100 that consists of a general vacuum pressure cylinder. The horizontal transfer unit 300 for moving the fixing unit 100 to the width of the substrate 500 is connected to one side of the vertical member 200 through a horizontal transfer tool. It can be moved horizontally by a common oil pressure and vacuum pressure as the horizontal transfer unit. The feeding device 300 moves the substrate 500 to a fixed position, and the upper and lower chucks are adsorbed by the upper chuck by a fixing unit and a conveying direction. The lower cooling means that the single-force cylinder is directly conveyed according to the base unit 200 and the fixed direction by the bottom chuck chuck 100b, 200 00, and the level is transmitted. The fixed sheet 10 1312179 yuan 1 00 is moved backward from the substrate 5 Ο 0 to avoid obstructing the substrate 5 在 in the receiving process and the take-out process of the substrate 5 Ο 0, and then receiving the substrate 5 After 0 0, the fixed unit 100 moves toward the substrate 500. The transporting plate 400 for transporting the fixed unit 100 along a carrier supports the fixed unit 100, and the vertical transport unit 200 supports the horizontal transport unit 300 at its bottom, and is slidable along the The transport path formed by the longitudinal direction of one or both sides of the carrier moves.

【實施方式】 在下文中,將參考附圖詳細描述本發明之較佳實施例。 上及下夾盤,其可真空吸附一基材,會在後方更詳細 解釋。[Embodiment] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The upper and lower chucks, which vacuum absorb a substrate, are explained in more detail at the rear.

如第3a至5圖所示,用來固定一基材的固定單元100 包含一上夾盤l〇〇a及一下夾盤100b。用來吸附及固定該 基材5 0 0的真空喷孔11 0係形成在面對彼此的該上及下夾 盤100a和1 00b之相對表面之至少一者上。換句話說,提 供該等相對表面的至少一者一穿孔 1 5 0,以穿過該上及下 夾盤100a和100b。該真空喷孔110係設置在該穿孔150 内。此時,該真空喷孔 110可形成在該上及下夾盤 100a 和100b的一或兩個相對表面上。若該真空喷孔110形成在 該等相對表面的兩者上,預期該真空喷孔11 0會形成在面 對彼此的上及下夾盤1 〇〇a和1 00b的相同軸上,以在該基 材5 0 0的一側及另一側上同步吸附相同的點。根據例示實 施例,雖然該真空喷孔係提供在該穿孔1 5 0内,但是該基 11As shown in Figures 3a through 5, the fixing unit 100 for fixing a substrate comprises an upper chuck 10a and a lower chuck 100b. The vacuum orifices 110 for adsorbing and fixing the substrate 500 are formed on at least one of the opposing surfaces of the upper and lower chucks 100a and 100b facing each other. In other words, at least one of the opposing surfaces is provided with a perforation 150 to pass through the upper and lower chucks 100a and 100b. The vacuum orifice 110 is disposed within the perforation 150. At this time, the vacuum nozzle holes 110 may be formed on one or both opposing surfaces of the upper and lower chucks 100a and 100b. If the vacuum nozzle hole 110 is formed on both of the opposite surfaces, it is expected that the vacuum nozzle hole 110 will be formed on the same axis facing the upper and lower chucks 1 〇〇a and 100b of each other to The same point is simultaneously adsorbed on one side and the other side of the substrate 500. According to an exemplary embodiment, although the vacuum orifice is provided within the perforation 150, the base 11

1312179 材可藉由連接一抽氣單元130至該穿孔 150透過該穿孔 1 5 0吸附。 該真空喷孔110具有一接觸表面(即,一上表面),其 與該基材5 0 0接觸,並形成一氣流通道1 2 0,以朝該上表 面内側抽氣。該氣流通道1 2 0與該抽氣單元1 3 0連接以執 行如同抽氣用幫浦之相同操作。此外,該真空喷孔1 1 〇可 在該等相對表面上以一或多列校直。例如,複數個真空喷 孔11 0可在該等相對表面上以矩陣形狀的固定圖案校直。 可在該上及下夾盤1 〇〇a和1 00b的相對表面上裝設強 度比基材5 0 0低的避震器,以避免該基材5 0 0受損。該避 震器可包含高效能熱塑性樹脂之聚醚醚酮(PEEK)、熱塑性 樹脂之高分子聚乙烯,其中乙烯係經聚合,以及氟化樹脂 化合物,其係氟化烴(HFC)的聚合物,之至少一種。 第6至8圖示出根據本發明的夾持設備之例示實施例。 參見第6至8圖,用來夾住該基材5 0 0之一側或兩側 的固定單元100包含該上夾盤l〇〇a,以及可上下移動的下 夾盤1 00b,藉由與該上夾盤1 00a間隔一段預定距離。 此外,一真空喷孔1 1 1係由做為一軟質彈性材料的矽 形成,並且從該相對表面往上突出至1 - 2毫米的高度。此 時,若該真空喷孔1 1 1從該相對表面突出多於2毫米的高 度,可能由一摺層形成洩露氣體的空間,其係產生在由該 軟質彈性材料製成的真空喷孔111的滲透端,並且若該真 空喷孔1 1 1往上突出低於1毫米的高度,則難以讓該真空 噴孔111的突出端可以在柚氣期間吸附同時縮小該基材。 12 1312179 接觸該基材的接觸表面形成在該真空噴孔111的上表 面,而該氣流通道12 0,其中空氣經由能夠扮演幫浦角色 的抽氣單元丨3 〇抽吸,係形成在該真空喷孔111内部中。 在該真空噴孔i 1 1外表面上,複數個階級,其係朝向該真 空噴孔1 1 1的内部傾斜,係藉由以多個階段延伸的方式形 成。此外,該真空喷孔111可在相對表面上以一或多列校 直’並且,例如,以矩陣形式的固定圖案校直’當該真空 喷孔1 1 1在該等相對表面上以一或多列校直時。 第9圖係示出根據另一例示實施例的提供有該真空喷 孔之基材夾持設備的構造的圖式。 如第9圖所示,可提供固定單元1 0 〇 ’能夠扮演真空喷 孔角色的真空墊110’。換句話說,該真空墊110,可以具有 微孔的吸附板形式形成,以在與該基材500接觸期間透過 該接觸表面整體吸附。此外,複數個氣流通道1 2 0 ’可利用 與該真空墊1 1 〇 ’底部間隔一段預定距離的方式連接’以便 透過該抽氣單元130抽氣。 下面將解釋如上建構之本發明的運作。 首先,當該基材5 0 0被接收進入一基材傳送設備時, 該爽持設備藉由吸氣固定該基材500,在以一圓柱機械固 疋該基材5 0 〇的一側或兩側後,然後由該夾持設備固定的 基材5 00沿著該基材傳送設備的載具移動。 例如’當該基材5〇〇進入該夾持設備的上及下失盤 1〇〇a和i〇〇b間時,該下央盤i〇〇b移至該基材5〇〇上半部 分’並且該基材5〇〇固定在該上及下夾盤1〇〇&和i〇〇b間。 131312179 material can be adsorbed by connecting a suction unit 130 to the perforation 150 through the perforation 150. The vacuum orifice 110 has a contact surface (i.e., an upper surface) that contacts the substrate 500 and forms an air flow passage 120 to draw air toward the inside of the upper surface. The air flow path 120 is connected to the air extraction unit 1 30 to perform the same operation as the pump for pumping. Additionally, the vacuum orifices 1 1 〇 can be aligned in one or more rows on the opposing surfaces. For example, a plurality of vacuum orifices 110 can be aligned in a fixed pattern of matrix shapes on the opposing surfaces. A shock absorber having a lower strength than the base material 500 may be attached to the opposite surfaces of the upper and lower chucks 1 〇〇a and 100b to prevent damage to the substrate 500. The shock absorber may comprise polyetheretherketone (PEEK) of high-performance thermoplastic resin, high molecular polyethylene of thermoplastic resin, wherein ethylene is polymerized, and a fluorinated resin compound, which is a polymer of a fluorinated hydrocarbon (HFC). At least one of them. 6 through 8 illustrate an exemplary embodiment of a clamping device in accordance with the present invention. Referring to Figures 6 to 8, the fixing unit 100 for clamping one side or both sides of the substrate 500 includes the upper chuck 10a, and the lower chuck 100b movable up and down, by The upper chuck 100a is spaced apart by a predetermined distance. Further, a vacuum nozzle 1 1 1 is formed of 矽 as a soft elastic material and protrudes upward from the opposite surface to a height of 1-2 mm. At this time, if the vacuum nozzle 1 1 1 protrudes from the opposite surface by a height of more than 2 mm, a space for leaking gas may be formed by a folded layer, which is generated in the vacuum nozzle 111 made of the soft elastic material. The permeation end, and if the vacuum orifice 1 1 1 protrudes upward by a height of less than 1 mm, it is difficult to allow the protruding end of the vacuum orifice 111 to adsorb while the pomelo gas is simultaneously shrinking the substrate. 12 1312179 A contact surface contacting the substrate is formed on an upper surface of the vacuum injection hole 111, and the air flow passage 120, wherein air is sucked through a suction unit 丨3 能够 capable of playing a role of a pump, is formed in the vacuum The inside of the nozzle hole 111. On the outer surface of the vacuum orifice i 1 1 , a plurality of stages which are inclined toward the inside of the vacuum nozzle 1 1 1 are formed by extending in a plurality of stages. Furthermore, the vacuum orifices 111 can be aligned in one or more columns on opposite surfaces and, for example, aligned in a fixed pattern in the form of a matrix, when the vacuum orifices 1 1 1 are on the opposite surfaces When multiple columns are straightened. Fig. 9 is a view showing the configuration of a substrate holding device provided with the vacuum orifice according to another exemplary embodiment. As shown in Fig. 9, a vacuum pad 110' in which the fixed unit 10 〇 ' can function as a vacuum nozzle can be provided. In other words, the vacuum pad 110 may be formed in the form of a microporous adsorption plate for overall adsorption through the contact surface during contact with the substrate 500. Further, a plurality of air flow passages 1 2 0 ' may be connected by a predetermined distance from the bottom of the vacuum cushion 1 1 〇 ' to be evacuated through the suction unit 130. The operation of the present invention constructed as above will be explained below. First, when the substrate 500 is received into a substrate transfer device, the holding device fixes the substrate 500 by suction, and solidifies the substrate on the side of the substrate by a cylindrical mechanism or After both sides, the substrate 500 fixed by the holding device is then moved along the carrier of the substrate transfer device. For example, when the substrate 5〇〇 enters between the upper and lower trays 1〇〇a and i〇〇b of the holding device, the lower central tray i〇〇b moves to the upper half of the substrate 5〇〇 Part 'and the substrate 5〇〇 is fixed between the upper and lower chucks 1〇〇& and i〇〇b. 13

1312179 此時,該避震器,其係設置在該上及下夾盤i 〇〇a和100b 的相對表面上,減少因為該基材 5 0 0接觸該上及下夾盤 1 0 0a和 1 00b引起的磨擦力所造成的傷害。例如聚醚醚酮 (PEEK)、高分子聚乙烯及氟化樹月旨化合物等材料可用來做 為該避震益。 接著,當該基材500由該上及下夾盤100a和100b的 機械力固定時,使用該夾持設備的基材5 0 0的夾盤力藉由 再次利用吸氣來固定該基材5 0 0而增加,其係形成在透過 形成在該上及下夾盤100a和100b的相對表面上的真空喷 孔110接觸該基材500的表面上。此時,該真空喷孔110 可形成在該上及下夾盤100a和10 0b的相對表面的一者或 兩者上。此外,當該真空噴孔11 0形成在該等相對表面的 兩者上時,預期該真空喷孔1 1 0同步吸附該基材5 0 0的一 側及另一側,藉由校直該真空噴孔 1 1 0在該上及下夾盤 1 1 0a和1 1 Ob的相同軸上。該基材5 00由該夾持設備沿著 該載具傳送,在該基材5 00由該上及下夾盤1 00a和1 00b 機械固定的狀態下,並且使用該夾持設備的基材5 0 0的夾 盤力藉由該真空喷孔1 1 0的真空吸附增加。 如上所述,本發明可避免該基材5 0 0從該夾持設備脫 離,即使是高速傳送該基材500時,藉由以一壓力圓柱機 械固定該基材5 0 0,並且透過該真空喷孔1 1 0利用真空吸 附來固定該基材500,藉由避免該基材500的固定位置和 校直位置改變來保證基材傳送可靠度,以及避免破裂,其 係該基材500在固定狀態下滑動所引發。 141312179 At this time, the shock absorber is disposed on the opposite surfaces of the upper and lower chucks i 〇〇 a and 100b to reduce the contact of the upper and lower chucks 1 0 0a and 1 by the substrate 500. The damage caused by the friction caused by 00b. Materials such as polyetheretherketone (PEEK), high molecular weight polyethylene, and fluorinated tree compounds can be used as the shock absorber. Next, when the substrate 500 is fixed by the mechanical force of the upper and lower chucks 100a and 100b, the chuck force of the substrate 500 of the holding device is used to fix the substrate 5 by suction again. The addition of 0 0 is formed by contacting the surface of the substrate 500 through the vacuum orifices 110 formed on the opposite surfaces of the upper and lower chucks 100a and 100b. At this time, the vacuum orifice 110 may be formed on one or both of the opposite surfaces of the upper and lower chucks 100a and 100b. In addition, when the vacuum nozzle hole 110 is formed on both of the opposite surfaces, it is expected that the vacuum nozzle hole 110 simultaneously adsorbs one side and the other side of the substrate 5000, by straightening the The vacuum orifices 110 are on the same axis of the upper and lower chucks 1 1 0a and 1 1 Ob. The substrate 500 is transported by the holding device along the carrier, in a state where the substrate 500 is mechanically fixed by the upper and lower chucks 100a and 100b, and the substrate of the holding device is used. The chuck force of 500 is increased by vacuum adsorption of the vacuum orifice 110. As described above, the present invention can prevent the substrate 500 from being detached from the holding device, and even when the substrate 500 is conveyed at a high speed, the substrate is mechanically fixed by a pressure cylinder and transmitted through the vacuum. The nozzle hole 110 is fixed by vacuum adsorption to the substrate 500, and the base substrate 500 is fixed by avoiding the fixing position and the straightening position of the substrate 500 to ensure substrate transfer reliability and avoiding cracking. Caused by a slide in the state. 14

1312179 參見第1 〇圖,該同線FPD自動光學偵測包含一載具、 一載具機械臂、一機械傳送單元及一傳送漂浮單元。 形成一載具600而在縱方向上延伸,即,傳送該基材 5 0 0的基材傳送方向,並且重新校直所接收的基材5 0 0。該 載具600在與該傳送方向垂直的水平方向上的寬度可以形 成得比該基材5 0 0的寬度短。此外,該載具6 0 0往該傳送 方向引導所接收的基材 5 0 0。該傳送設備的通道單元 6 3 0 係設置在該載具600的水平方向的一側上。該通道單元630 係經形成而在垂直方向上延伸,如該載具6 0 0般,並且該 垂直方向的寬度比該載具600者短。一用來漂浮該基材的 空氣喷孔610係形成在該載具600上。 該基材500係設置在相對於該固定單元100設置的該 載具600的另一側上。用來引導該基材500之移動的滚筒 設備 6 2 0係裝設在該載具 6 0 0的另一側上。該滾筒設備 620,如第11圖所示,包含一滚筒621及一支撐該滚筒用 的滾筒支撐板622。複數個滾筒單元620係裝設在該等通 道單元630之一内,其係裝設在該載具600的水平方向的 兩側。該滾筒6 21可在該基材的承載方向上自由旋轉,並 且運用滚動軸承以降低旋轉期間的摩擦力。該滾筒支撐板 622包含一第一支撐板622a及一第二支撐板622b。該滾筒 支撐板622係裝設在該通道單元630内,而該第二支撐板 622b設置在一真空壓力圓柱上,以可動地裝設至該第一支 撐板622a上。根據該基材500的尺寸,該第一支撐板622a 可以該載具600的基材方向移動。 151312179 Referring to FIG. 1 , the in-line FPD automatic optical detection comprises a carrier, a carrier robot, a mechanical transmission unit and a transfer floating unit. A carrier 600 is formed to extend in the longitudinal direction, i.e., the substrate transport direction of the substrate 500 is transferred, and the received substrate 500 is re-aligned. The width of the carrier 600 in the horizontal direction perpendicular to the conveying direction may be formed to be shorter than the width of the substrate 500. In addition, the carrier 600 directs the received substrate 500 in the direction of transport. The channel unit 630 of the transport device is disposed on one side of the horizontal direction of the carrier 600. The channel unit 630 is formed to extend in the vertical direction as the carrier 600, and the width in the vertical direction is shorter than that of the carrier 600. An air injection hole 610 for floating the substrate is formed on the carrier 600. The substrate 500 is disposed on the other side of the carrier 600 disposed with respect to the fixed unit 100. A roller device 260 for guiding the movement of the substrate 500 is mounted on the other side of the carrier 600. The drum unit 620, as shown in Fig. 11, includes a drum 621 and a drum support plate 622 for supporting the drum. A plurality of roller units 620 are mounted in one of the channel units 630 and are mounted on both sides of the carrier 600 in the horizontal direction. The roller 6 21 is free to rotate in the direction in which the substrate is loaded, and a rolling bearing is utilized to reduce the friction during rotation. The roller support plate 622 includes a first support plate 622a and a second support plate 622b. The roller support plate 622 is mounted in the channel unit 630, and the second support plate 622b is disposed on a vacuum pressure cylinder to be movably mounted to the first support plate 622a. The first support plate 622a can move in the direction of the substrate of the carrier 600 depending on the size of the substrate 500. 15

1312179 如第1 2圖所示,可在該滚筒上裝設皮帶,因此複數個 滾筒6 2 1彼此接合,而增加與該基材接觸的區域。如第1 2 圖所示,僅可裝設一條皮帶,但也可裝設複數條皮帶。 接著,將解釋提供有該基材傳送設備的基材偵測設備 的運作。 參見第10圖,該載具機械臂(未示出)從一基材儲存器 (未示出)取得該基材 500,然後將該基材帶向該載具 600 的入口。當該基材載入該載具6 0 0時,該基材漂浮單元, 其中形成複數個擁有微小直徑的喷孔6 1 0,透過該喷孔6 1 0 使該基材5 0 0漂浮一段預定距離,接著,該固定單元1 0 0 係經設置在該基材5 0 0的一側上。該固定單元1 0 0以與該 傳送方向垂直的水平方向移動,並且將該基材500嚙合在 上頜及下頜間,以固定該基材5 0 0。此外,如第1 3 a至1 3 c 圖所示,根據該基材500的尺寸,位於該固定單元100的 相對側之該滾筒設備6 2 0係相鄰地設置在與該基材5 0 0的 另一側之端點相同的高度處。此時,該固定單元 10 0 a和 1 0 〇b稍微往上,因此避免與該滾筒設備6 2 0衝突,並且朝 該滚筒6 2 0移動,以將基材5 0 0設置在該滾筒設備6 2 0的 上方部分。該固定單元1 〇〇a和1 00b下降以穩固地將該基 材5 0 0設置在該滾筒6 2 0的上方部分上。在被穩固地設置 後,該基材5 0 0利用5點式校直器來校直,其係裝設在該 通道單元630及該載具600内。 當該基材 500以該基材傳送單元可靠地校直並設置 時,該固定單元1 0 0 a和1 0 0 b開始往該傳送方向移動,並 161312179 As shown in Fig. 12, a belt can be attached to the drum, so that a plurality of rollers 6 2 1 are joined to each other to increase the area in contact with the substrate. As shown in Figure 1, only one belt can be installed, but a plurality of belts can be installed. Next, the operation of the substrate detecting device provided with the substrate transfer device will be explained. Referring to Fig. 10, the carrier robot (not shown) takes the substrate 500 from a substrate reservoir (not shown) and then carries the substrate to the inlet of the carrier 600. When the substrate is loaded into the carrier 600, the substrate floating unit, wherein a plurality of nozzle holes 610 having a small diameter are formed, and the substrate 500 is floated through the nozzle hole 6 1 0 A predetermined distance, and then the fixing unit 100 is disposed on one side of the substrate 500. The fixing unit 100 moves in a horizontal direction perpendicular to the conveying direction, and engages the base material 500 between the upper jaw and the lower jaw to fix the base material 500. Further, as shown in FIGS. 1 3 a to 1 3 c, according to the size of the substrate 500, the roller device 620 located on the opposite side of the fixing unit 100 is disposed adjacent to the substrate 50. The other side of the 0 is at the same height. At this time, the fixing units 10 0 a and 10 0 〇 b are slightly upwards, thereby avoiding collision with the drum device 620 and moving toward the drum 260 to set the substrate 500 at the drum device. The upper part of 6 2 0. The fixing units 1 〇〇a and 1 00b are lowered to securely set the substrate 510 on the upper portion of the drum 620. After being securely disposed, the substrate 500 is aligned using a 5-point straightener that is mounted within the channel unit 630 and the carrier 600. When the substrate 500 is reliably aligned and disposed by the substrate transfer unit, the fixed units 10 0 a and 1 0 0 b start moving in the transfer direction, and 16

1312179 且該滾筒設備6 2 0的滾筒開始在該基材的移動方向上自由 旋轉。當抵達該偵測單元時,該基材5 00在以固定速度移 動的同時被偵測。運用例如光學透鏡及C C D攝影機等偵測 設備執行基材5 0 0的圖案偵測和缺陷偵測。該基材5 0 0, 其已經完成偵測,由該基材傳送單元移動至該載具600的 出口 。該取出載具機械臂前後移動同時上抬手臂,以將偵 側過的基材5 0 0從該載具6 0 0取出,以將該基材5 0 0儲存 在一基材儲存器(未示出)中。該固定單元1 〇〇a和1 00b ’其 已經完成該基材5 00的傳送,開始往與該載具方向相反的 方向移動,並且位於原始位置上,因此完成該製程。 雖然未在圖式中示出,預期該載具的上表面係由一塗 層形成,例如氟化樹脂或鐵氟龍,以1 〇 -1 〇 〇微米的厚度。 若形成該塗層,可避免該基材受損,即使該基材在沿著一 具塗層的臺座的氣體浮動器表面高速傳送時有所接觸。 此外,本發明在該基材表面上形成一電極膜,在該載 具上表面的一部分上形成一導電體,並包含一電力單元以 供電至該電極膜或該導電體,以及一接觸偵測單元,以偵 測該電極膜是否與該導電體電氣連接,藉此避免在基材傳 送期間產生刮痕。 分離地,即使當形成在該載具上表面的氣體浮動器表 面在傳送該基材時失調,本發明能夠藉由該滾筒可靠地傳 送該基材,包含一感應器以感應該氣體喷嘴的氣壓,以及 一控制器以進行控制,以使該滾筒可根據通過該感應器的 氣壓是否正常來上/下移動。 171312179 and the drum of the drum unit 620 starts to rotate freely in the moving direction of the substrate. When the detection unit is reached, the substrate 500 is detected while moving at a fixed speed. Pattern detection and defect detection of the substrate 500 is performed using a detecting device such as an optical lens and a C C D camera. The substrate 500 has been detected and moved by the substrate transfer unit to the outlet of the carrier 600. The take-out robot arm moves back and forth while lifting the arm to take the detected substrate 500 from the carrier 600 to store the substrate 500 in a substrate storage device (not Shown). The fixing unit 1 〇〇a and 100b' have completed the transfer of the substrate 500, started moving in the opposite direction to the carrier, and were in the original position, thus completing the process. Although not shown in the drawings, it is contemplated that the upper surface of the carrier is formed of a coating such as a fluorinated resin or Teflon, having a thickness of 1 〇 -1 〇 〇 μm. If the coating is formed, damage to the substrate can be avoided even if the substrate is in contact at high speeds along the surface of the gas floater of a coated pedestal. In addition, the present invention forms an electrode film on the surface of the substrate, forms a conductor on a portion of the upper surface of the carrier, and includes a power unit for supplying power to the electrode film or the conductor, and a contact detection. a unit to detect whether the electrode film is electrically connected to the electrical conductor, thereby avoiding scratches during substrate transfer. Separately, even when the surface of the gas floater formed on the upper surface of the carrier is out of alignment when transporting the substrate, the present invention can reliably transport the substrate by the drum, including an inductor to sense the gas pressure of the gas nozzle And a controller for controlling so that the drum can move up/down according to whether the air pressure passing through the sensor is normal. 17

1312179 參見第14圖,該同線FDP自動光學偵測包含一傳送 台1 8、傳送機械臂1 2 a和1 2b、一基材傳送設備2 0、一氣 體浮動器1 4、一偵測單元1 5及一基材校直單元1 6。 該傳送台18包含一傳送臺座30以及一基底板22。該 傳送臺座3 0係經形成而在縱方向上延伸,即,該基材1 0 的傳送方向,並引導所接收的基材1 〇往該傳送方向。該傳 送設備的基底板2 2係裝設在該傳送臺座3 0的水平方向之 一側。該基底板 2 2係經形成而在該縱向的垂直方向上延 伸,如該傳送臺座3 0般,並且其水平方向的寬度通常比該 傳送臺座3 0的短。此外,一線性軌道2 4係經形成而在該 縱方向上於該基底板22的上表面上延伸。 在該傳送機械臂1 2中,一第一機械臂1 2 a和一第二機 械臂1 2b分別裝設在該傳送台的入口或出口處。該第一傳 送機械臂1 2 a從該基材儲存器(未示出)取出未偵測的基材 1 0,同時利用多關節手臂旋轉、前後移動,並且接收進未 偵測的基材1 〇朝向該傳送台。該第二傳送機械臂1 2b取出 已經完成偵測的基材1 0至該基材儲存器(未示出)。 該偵測設備1 5,其係裝設在該傳送臺座3 0的上方部 分,包含一支撐板 15 a及一與該支撐板連結的偵測裝置 1 5 b。該偵測裝置1 5 b係經裝設而可關於該傳送方向朝前後 方向往上旋轉至一固定角度,因此使該基材1 0可以被詳細 地偵測。 該氣體浮動器1 4係設置在該傳送臺座 3 0的上表面 上。換句話說,該氣體浮動器1 4包含複數個形成在該傳送 181312179 Referring to FIG. 14, the same-line FDP automatic optical detection includes a transfer table 18, transfer robots 1 2 a and 1 2b, a substrate transfer device 20, a gas floater 14, and a detection unit. 1 5 and a substrate alignment unit 16 . The transfer station 18 includes a transfer pedestal 30 and a base plate 22. The transfer pedestal 30 is formed to extend in the longitudinal direction, i.e., the transport direction of the substrate 10, and guide the received substrate 1 to the transport direction. The base plate 22 of the transfer apparatus is mounted on one side of the horizontal direction of the transfer stand 30. The base plate 22 is formed to extend in the longitudinal direction of the longitudinal direction, as in the transfer pedestal 30, and its width in the horizontal direction is generally shorter than that of the transfer pedestal 30. Further, a linear track 24 is formed to extend on the upper surface of the base plate 22 in the longitudinal direction. In the transfer robot 12, a first robot arm 12a and a second robot arm 12b are respectively installed at the entrance or exit of the transfer table. The first transfer robot 1 2 a takes out the undetected substrate 10 from the substrate storage (not shown) while rotating with the multi-joint arm, moving back and forth, and receiving the undetected substrate 1 〇 toward the transfer station. The second transfer robot 1 2b takes out the substrate 10 that has completed detection to the substrate reservoir (not shown). The detecting device 15 is mounted on the upper portion of the transport base 30, and includes a supporting plate 15a and a detecting device 15b connected to the supporting plate. The detecting device 15b is mounted to be rotated up to a fixed angle in the front-rear direction with respect to the conveying direction, so that the substrate 10 can be detected in detail. The gas floater 14 is disposed on the upper surface of the transfer pedestal 30. In other words, the gas floater 14 includes a plurality of formations in the transfer 18

1312179 臺座3 0上表面上的具有微小直徑的噴孔2 1。該基材1 0係 經漂浮至一預定高度,藉由透過該喷孔2 1噴射氣體至該傳 送臺座3 0的上方部分。同樣地,若該基材係以漂浮至距離 該基材傳送臺座3 0該預定距離的狀態傳送,或許可以高速 傳送該基材1 0而不會接觸其他部分,進而避免該基材1 〇 的表面在該傳送製程中受損或污染。 參見第15和16圖,該基材傳送設備包含一第一傳送 板6 0,經設置而可在該基底板2 2的線性軌道2 4上移動, 以及一基材傳送驅動單元7 2,用以往該基材傳送方向傳送 該第一傳送板6 0。一第二傳送板62係裝設在該第一傳送 板6 0上表面上,以便往水平方向移動,即,該基材10的 寬度方向,一垂直旋轉軸7 0係經裝設在該第二傳送板6 2 的上表面上,並且一第三傳送板6 4係經裝設以關於該旋轉 軸旋轉。第一及第二驅動單元66和68與該第一及第二傳 送板6 0和6 2連結,以前/候移動並旋轉該第二及第三傳 送板6 2和6 4。複數個夾具及固定校直點2 0和3 6 a係設置 在該第三傳送板64上。同時,一可變校直點3 6b係設置在 該傳送板的相反側上。 預期使用一步進馬達來做為該第一及第二驅動單元 66和68,其係裝設在該第一及第二傳送板60和62的上表 面上,以前/後移動及旋轉該第二及第三傳送板6 2和6 4。 此外,預期使用一線性馬達來做為該基材傳送驅動單元 7 2,以在該縱方向上移動該第一傳送板6 0。當然,該等驅 動單元的位置可以根據情況做各種改變。例如,該第二驅 191312179 A nozzle hole 2 1 having a small diameter on the upper surface of the pedestal 30. The substrate 10 is floated to a predetermined height, and gas is ejected through the orifice 21 to the upper portion of the transfer pedestal 30. Similarly, if the substrate is transported in a state of being floated to a predetermined distance from the substrate transfer pedestal 30, it is possible to transport the substrate 10 at a high speed without contacting other portions, thereby avoiding the substrate 1 〇 The surface is damaged or contaminated during the transfer process. Referring to Figures 15 and 16, the substrate transfer apparatus includes a first transfer plate 60 that is configured to be movable over the linear track 24 of the base plate 22, and a substrate transfer drive unit 72 for use. In the past, the substrate transfer direction conveyed the first transfer plate 60. A second conveying plate 62 is mounted on the upper surface of the first conveying plate 60 so as to move in the horizontal direction, that is, in the width direction of the substrate 10, a vertical rotating shaft 70 is installed in the first On the upper surface of the two transfer plates 6 2, and a third transfer plate 64 is mounted to rotate about the axis of rotation. The first and second drive units 66 and 68 are coupled to the first and second transfer plates 60 and 62, and previously move and rotate the second and third transfer plates 6 2 and 6 4 . A plurality of jigs and fixed alignment points 20 and 3 6 a are disposed on the third transfer plate 64. At the same time, a variable alignment point 36b is disposed on the opposite side of the transfer plate. It is contemplated that a stepper motor is used as the first and second drive units 66 and 68 that are mounted on the upper surfaces of the first and second transfer plates 60 and 62 to move and rotate the second before/after And third transfer plates 6 2 and 6 4 . Furthermore, it is contemplated to use a linear motor as the substrate transport drive unit 72 to move the first transfer plate 60 in the longitudinal direction. Of course, the position of the drive units can be varied as appropriate. For example, the second drive 19

1312179 動單元6 8係鄰接該垂直軸裝設,以使該第三傳送板6 4可 以運用推拉該第三傳送板6 4的方式旋轉。此外,該第一和 第二驅動單元6 6和6 8係裝設在該第一傳送板6 0上的旋轉 軸7 0兩側,因此該第三傳送板6 4的前/後移動及旋轉可 在該第三傳送板6 4的推及拉方法中控制。據此,該第二傳 送板62可以是用來引導在該第一傳送板60上該基材的寬 度方向上移動的導引,藉由裝設該垂直旋轉軸。 如第17圖所示,一普通的4相步進馬達38包含一轉 子40及一定子42。該轉子40包含一永久磁鐵44,其係經 磁化為軸方向,以及在其外部的上和下鐵線圈4 6和4 8。 該上和下鐵線圈4 6和4 8係分別磁化為該永久磁鐵4 4的北 極和南極,並且一 4相激發線圈圍繞在該定子42上。當一 直流電(DC)在該線圈50上流動時,該定子42即磁化並上 拉該轉子40。之後,該轴52利用該轉子40以一固定角度 旋轉。 同樣地,通常用該步進馬達 3 8來嚴密控制一機械移 動。該步進馬達3 8在精確控制角度方面是便宜且有利的, 與伺服馬達相比。明確地說,因為步進馬達3 8可由脈衝數 位控制,以數微米為單位控制是有利的。此外,因為步進 馬達3 8可以固定角度旋轉,顯著且精確地停止,並且很容 易修復及擁有高可靠度,而不需要反饋以偵測馬達軸的位 置。此外,因為馬達停止時會產生大的靜轉矩,故不需要 例如電子煞車。 配置來夾住該基材1 〇的夾具2 0係根據該基材1 0的尺 201312179 The moving unit 6 8 is attached adjacent to the vertical shaft so that the third conveying plate 6 4 can be rotated by pushing and pulling the third conveying plate 64. In addition, the first and second driving units 6 6 and 6 8 are mounted on both sides of the rotating shaft 70 on the first conveying plate 60, so the front/rear movement and rotation of the third conveying plate 64 It can be controlled in the push and pull method of the third transfer plate 64. Accordingly, the second transfer plate 62 may be a guide for guiding the movement of the substrate in the width direction of the first transfer plate 60 by mounting the vertical rotary shaft. As shown in Fig. 17, a conventional 4-phase stepping motor 38 includes a rotor 40 and a stator 42. The rotor 40 includes a permanent magnet 44 that is magnetized in the axial direction and upper and lower iron coils 46 and 48 on its exterior. The upper and lower iron coils 4 6 and 48 are respectively magnetized to the north and south poles of the permanent magnet 44, and a 4-phase excitation coil is wound around the stator 42. When a direct current (DC) flows over the coil 50, the stator 42 magnetizes and pulls up the rotor 40. Thereafter, the shaft 52 is rotated by the rotor 40 at a fixed angle. Similarly, the stepper motor 38 is typically used to tightly control a mechanical movement. The stepper motor 38 is inexpensive and advantageous in terms of precise control of the angle compared to servo motors. In particular, since the stepper motor 38 can be controlled by the pulse number, it is advantageous to control in units of several micrometers. In addition, because the stepper motor 38 can be rotated at a fixed angle, it stops significantly and accurately, and is easy to repair and has high reliability without feedback to detect the position of the motor shaft. In addition, since a large static torque is generated when the motor is stopped, for example, an electronic brake is not required. The jig 20 configured to clamp the substrate 1 is based on the size of the substrate 10

1312179 寸以適當數量(例如3至5)成一或多列形成在該第 板64上。 再次參見第16圖,該夾具20包含配置來夾住 1 0的上及下頜3 2 a和3 2 b,一間距控制器3 4以及一 動單元3 6。 該上及下頜32a和32b係以一預定間隔上下分 且其中一個可上下移動。據此,該基材1 0係以該」 之水平方向的一側插入該上及下頜32a和32b内的 定。 該間距控制器3 4係形成在該下頜3 2b的下表ί 且上下移動該上及下頜32a和32b的其中之一。該 制器3 4在接收或取出該基材1 0期間在該上及下頜 32b間延伸一段距離,然後在完成接收該基材1 0之 該距離以固定該基材1 0 ’因此該基材1 0和該上及"f 和3 2 b彼此接觸。 該水平移動單元 3 6往基材方向或其相反方向 動該上及下頜3 2 a和3 2b,因為該間距必須根據該 的尺寸做改變。 固定校直點3 6b係平行於該夾具20設置在該第 板6 4上。例如,該固定校直點3 6 b可設置在該夾j 最左及最右側。同時,該可變校直點3 6 a係設置在 板上與該固定校直點3 6b相反的一邊。此外,該可 點3 6 a包含一彈性單元,例如彈簧,其與該基材1 0 觸。該固定校直點3 6b係一固定單元,並且該可變 三傳送 該基材 水平移 離,並 基材10 狀態固 &上,並 間距控 3 2 a和 後縮短 —頜 32a 水平移 基材10 三傳送 20 的 該基底 變校直 伸縮接 校直點 211312179 inches are formed on the first plate 64 in an appropriate number (e.g., 3 to 5) in one or more columns. Referring again to Fig. 16, the clamp 20 includes upper and lower jaws 3 2 a and 3 2 b configured to grip 10, a pitch controller 34 and a moving unit 36. The upper and lower jaws 32a and 32b are divided up and down at a predetermined interval and one of them is movable up and down. Accordingly, the substrate 10 is inserted into the upper and lower jaws 32a and 32b in one side of the horizontal direction. The pitch controller 34 is formed on the lower surface of the lower jaw 32b and moves one of the upper and lower jaws 32a and 32b up and down. The device 34 extends a distance between the upper and lower jaws 32b during receipt or removal of the substrate 10, and then completes the receiving of the substrate 10 to fix the substrate 10'. 1 0 and the upper and "f and 3 2 b are in contact with each other. The horizontal moving unit 36 moves the upper and lower jaws 3 2 a and 3 2b in the direction of the substrate or in the opposite direction, since the spacing must be changed according to the size. A fixed alignment point 3 6b is disposed on the first plate 64 in parallel with the jig 20. For example, the fixed alignment point 3 6 b can be set to the leftmost and rightmost sides of the clip j. At the same time, the variable alignment point 3 6 a is disposed on the opposite side of the board from the fixed alignment point 36b. In addition, the point 36 a includes an elastic unit, such as a spring, which is in contact with the substrate 10 . The fixed alignment point 36b is a fixed unit, and the variable three conveys the substrate horizontally away, and the substrate 10 is in a solid state and is controlled by a distance of 3 2 a and then shortened - the jaw 32a is horizontally moved. The base 10 is conveyed 20 and the base is straightened and telescopically aligned.

1312179 3 6 a可執行直線移動,其利用一特別驅動單元往該基材 寬度方向前後移動。 接著,將解釋提供有該基材校直單元的基材偵測設 的運作。 參見第3圖,在從該基材儲存器(未示出)取得該基 1 0之後,該傳送機械臂1 2 a將該基材1 0朝該傳送台18 入口移動。當該基材10載入該傳送臺座30時,該氣體 動器1 4,其中形成複數個擁有微小直徑的喷孔2 1,開始 直該基材1 0,在透過該喷孔2 1漂浮該基材1 0該預定間 後。 如第1 8 a至1 8 e圖所示,若該基材1 0以未校直狀態 入,該可變校直點3 6 a,其係設置在位於該傳送臺座3 0 一側的基材傳送設備的相反側,開始在該基材方向上 動。此時,該第一傳送板6 0上的第二傳送板6 2開始藉 該第一驅動單元的運作往該基材方向移動。往該基材方 移動的可變校直點3 6 a如第1 8 b圖所示般移動,直到該 材在寬度方向上校直,連同該固定校直點36b在與該夾 2 0同列的位置。此時,該夾具2 0沒有夾住該基材1 0。 夾具2 0理解該基材1 0的位置以如第1 8 c圖所示般夾住 基材1 0,藉由移動該上及下頜以及在該基材方向上與該 體3 2和3 3連接的支撐板3 5,並且該可變校直點3 6 a往 移動。然後,該夾具2 0和該固定校直點3 6 b利用該基材 送驅動單元7 2在該傳送方向上移動該預定間距,以選擇 地校直該基材傳送方向的原點。在完成校直後,該第三 的 備 材 的 浮 校 距 載 的 移 由 向 基 具 該 該 主 後 傳 性 傳 221312179 3 6 a can perform linear movement, which uses a special drive unit to move back and forth in the width direction of the substrate. Next, the operation of the substrate detecting device provided with the substrate straightening unit will be explained. Referring to Fig. 3, after the substrate 10 is taken from the substrate reservoir (not shown), the transfer robot 1 2 a moves the substrate 10 toward the inlet of the transfer table 18. When the substrate 10 is loaded into the transfer pedestal 30, the gas actuator 14 forms a plurality of injection holes 2 1 having a small diameter, starting to directly feed the substrate 10, and floating through the spray hole 2 1 The substrate 10 is after the predetermined interval. As shown in the figures 1 8 a to 18 e, if the substrate 10 is inserted in an unaligned state, the variable alignment point 3 6 a is disposed on the side of the transfer pedestal 30 The opposite side of the substrate transfer device begins to move in the direction of the substrate. At this time, the second transfer plate 6 2 on the first transfer plate 60 starts to move in the direction of the substrate by the operation of the first drive unit. The variable alignment point 3 6 a moving toward the substrate moves as shown in Fig. 18 b until the material is aligned in the width direction, together with the fixed alignment point 36b in the same column as the clamp 20 position. At this time, the jig 20 does not sandwich the substrate 10. The jig 20 understands the position of the substrate 10 to sandwich the substrate 10 as shown in Fig. 18c, by moving the upper and lower jaws and in the direction of the substrate with the bodies 3 2 and 3 3 The support plate 35 is connected, and the variable alignment point 3 6 a moves. Then, the jig 20 and the fixed alignment point 3 6 b are moved by the substrate feed driving unit 72 in the conveying direction by the predetermined pitch to selectively align the origin of the substrate conveying direction. After the completion of the straightening, the floating of the third material is transferred from the base to the base.

1312179 送板6 4藉由驅動該第二驅動單元6 8以該旋轉軸3 9為中心 旋轉該固定角度,因而完成該校直,如第18d和18e圖所 示。在圖式中,以大角度示出旋轉角以顯示出旋轉移動。 但是,該基材1 〇係由數微米的低角度旋轉來校直。 再次參見第14圖,若該基材10已穩固地校直及設置, 該夾具2 0即開始在該傳送方向上移動。該基材10,其已 經抵達該偵測單元1 5,在以固定速度移動的同時被偵測。 執行該基材1 〇的圖案偵測和缺陷偵測,運用例如光學透鏡 和C C D攝影機等偵測設備。然後,根據該基材1 0的圖案, 重複執行該基材1 〇的再校直和彳貞測。進一步,該基材1 〇, 其已完成該偵測,利用該夾具2 0移至該傳送臺座3 0的出 口。用來取出該基材的載具機械臂12b旋轉並前後移動, 同時上抬手臂。接著,從該載具臺座3 0取得已經完成偵測 的基材1 0,並儲存取得的基材1 0在該基材儲存器(未示出) 内。該夾具20,其已完成傳送該基材10,與原始位置校直, 然後該製程即完成。 該夾持設備、該基材傳送設備、以及該同線平面面板 顯示器自動光學偵測設備,根據本發明,產生如下效果。 首先 '當該基材由該基材夾持設備失住面速移動時’ 該基材係避免從該基材爽持設備脫離’因此確保該基材傳 送的可靠度,並改善產品的產率。 再者,避免該基材的位置改變,因此使該基材可以傳 送至該固定位置。 第三,可利用該基材夾持設備機械夾取該基材來避免 23The 1312179 feed plate 6 4 rotates the fixed angle by driving the second drive unit 6 8 around the rotary shaft 39, thereby completing the straightening, as shown in Figs. 18d and 18e. In the drawings, the rotation angle is shown at a large angle to show a rotational movement. However, the substrate 1 is calibrated by a low angle rotation of a few microns. Referring again to Figure 14, if the substrate 10 has been firmly aligned and disposed, the clamp 20 begins to move in the direction of transport. The substrate 10, which has arrived at the detection unit 15, is detected while moving at a fixed speed. Pattern detection and defect detection of the substrate 1 are performed, and detection devices such as an optical lens and a C C D camera are used. Then, according to the pattern of the substrate 10, re-alignment and speculation of the substrate 1 重复 are repeatedly performed. Further, the substrate 1 〇 has completed the detection and is moved to the outlet of the transfer pedestal 30 by the clamp 20 . The carrier robot arm 12b for taking out the substrate rotates and moves back and forth while raising the arm. Next, the substrate 10 that has been detected is taken from the carrier pedestal 30, and the obtained substrate 10 is stored in the substrate reservoir (not shown). The jig 20, which has finished transporting the substrate 10, is aligned with the original position and the process is then completed. The holding device, the substrate transfer device, and the in-line flat panel display automatic optical detecting device, according to the present invention, produce the following effects. First of all, 'When the substrate is moved by the substrate holding device, the substrate speed is removed.' The substrate is prevented from detaching from the substrate holding device. Thus ensuring the reliability of the substrate transfer and improving the yield of the product. . Furthermore, the positional change of the substrate is avoided so that the substrate can be transported to the fixed position. Third, the substrate holding device can be used to mechanically clamp the substrate to avoid 23

1312179 刮痕或破裂產生在該基材表面上。 第四,該真空喷孔係由軟質彈性材料製成,並且係經 形成以從該基材接觸表面突出一段預定高度,因此形成該 真空壓力且不會洩漏空氣,其可藉由緊密密封該基材而產 生在該基材和該真空喷孔間。 第五,該基材偵測設備的基材傳送單元以僅夾住該基 材一端的狀態傳送該基材,因此使該平面顯示器面板可以 有效及穩定地傳送。 第六,藉由控制位於該載具臺座一側的馬達而非用來 同步控制位於該載具臺座的相反側的馬達的既存系統,可 降低製造成本,並且可除去同步控制期間產生的風險因素。 第七,即使該基材在沿著其上形成有塗層的臺座的氣 體浮動器表面高速傳送時有接觸,仍可避免該基材受損。 第八,即使形成在該載具上表面上的氣體浮動器表面 有什麼問題,在傳送該基材時,可藉由用來支撐該基材的 滾筒安全地傳送該基材。 第九,因為檢查過該基材係與該載具上表面接觸,可 避免到痕產生在該基材上。 第十,該基材偵測設備的基材校直單元的校直點僅設 置在該基材的兩個表面上,因此使其構造可以簡化。 第十一,藉由該步進馬達的使用,其係由脈衝驅動, 可執行高精確且高準確的校直,並且可在處理作業時隨時 執行校直修正。 本發明的較佳實施例已經為例示目的描述過,並且熟 24 1312179 知技藝者會了解在不背離本發明如附屬申請專利範圍中揭 示的範圍及精神下可以有各種修飾、增補及置換。因此, 本發明之範圍應由附屬申請專利範圍及其合法等效物界 定。 【圖式簡單說明】1312179 Scratches or cracks are created on the surface of the substrate. Fourth, the vacuum orifice is made of a soft elastic material and is formed to protrude from the substrate contact surface by a predetermined height, thereby forming the vacuum pressure without leaking air, which can be tightly sealed by the base. The material is produced between the substrate and the vacuum orifice. Fifth, the substrate transfer unit of the substrate detecting device transports the substrate in a state of sandwiching only one end of the substrate, thereby enabling the flat display panel to be efficiently and stably transported. Sixth, by controlling the motor located on one side of the carrier pedestal instead of the existing system for synchronously controlling the motor on the opposite side of the carrier pedestal, the manufacturing cost can be reduced, and the generation during synchronization control can be eliminated. Risk factors. Seventh, even if the substrate is in contact with the surface of the gas floater along the pedestal on which the coating is formed at a high speed, the substrate can be prevented from being damaged. Eighth, even if there is any problem with the surface of the gas floater formed on the upper surface of the carrier, the substrate can be safely conveyed by the roller for supporting the substrate when the substrate is transferred. Ninth, since the substrate is inspected to be in contact with the upper surface of the carrier, it is possible to prevent the occurrence of marks on the substrate. Tenth, the alignment point of the substrate alignment unit of the substrate detecting device is disposed only on both surfaces of the substrate, so that the configuration can be simplified. Eleventh, with the use of the stepping motor, which is driven by a pulse, high-accuracy and high-accuracy straightening can be performed, and straightening correction can be performed at any time during the processing work. The preferred embodiments of the present invention have been described by way of example only, and it is understood that various modifications, additions and substitutions can be made without departing from the scope and spirit of the invention as disclosed in the appended claims. Therefore, the scope of the invention should be defined by the scope of the appended claims and their legal equivalents. [Simple description of the map]

本發明之上述及其他目的、特徵和優勢可從上面詳細 敘述連同附圖而更加顯而易見,其中: 第1圖係示出提供有一基材夾持設備的基材傳送設備 之平面圖式, 第2圖係示出根據本發明之一例示實施例的基材夾持 設備之側面圖式, 第3 a及3 b圖係示出根據本發明之該例示實施例的提 供有真空喷孔之基材夾持設備的透視圖式; 第 4 a圖係示出根據本發明之該例示實施例的提供有 該真空0孔之基材爽持設備的構造的圖式, 第 4b圖係示出根據本發明之一不同實施例的提供有 該真空嘴孔之基材央持設備的構造的圖式, 第5圖係示出一設置狀態的圖式,其中一基材係由該 基材夾持設備的真空喷孔固定,根據本發明之該例示實施 例; 第6圖係示出根據本發明之該例示實施例的另一基材 夾持設備的側面圖式; 第7圖係示出根據本發明之該例示實施例的提供有該 25 1312179 真空喷孔之基材夾持設備的構造的圖式; 第8圖係示出一設置狀態的圖式,其中一基材係由該 基材失持設備的真空噴孔固定,根據本發明之該例示實施 例; 第9圖係示出根據本發明之另一例示實施例的提供有 一真空喷孔之基材夾持設備的構造的圖式;The above and other objects, features, and advantages of the present invention will become more apparent from A side view of a substrate holding apparatus according to an exemplary embodiment of the present invention, and FIGS. 3a and 3b are diagrams showing a substrate holder provided with a vacuum orifice according to the exemplary embodiment of the present invention. FIG. 4a is a view showing a configuration of a substrate holding device provided with the vacuum 0 hole according to the exemplary embodiment of the present invention, and FIG. 4b is a view showing a configuration according to the present invention. A drawing of a configuration of a substrate holding device provided with the vacuum nozzle hole in a different embodiment, and FIG. 5 is a view showing a state in which a substrate is held by the substrate holding device Vacuum injection hole fixing according to the exemplary embodiment of the present invention; FIG. 6 is a side view showing another substrate holding device according to the exemplary embodiment of the present invention; FIG. 7 is a view showing the present invention The exemplary embodiment is provided with the 25 131 2179 is a drawing of a structure of a substrate holding device for a vacuum nozzle; FIG. 8 is a view showing a state in which a substrate is fixed by a vacuum nozzle of the substrate holding device, according to the present invention The exemplified embodiment; FIG. 9 is a view showing a configuration of a substrate holding device provided with a vacuum nozzle according to another exemplary embodiment of the present invention;

第 1 0圖係示出根據本發明之同線平面面板顯示器 (FPD)自動光學偵測的簡要圖式; 第1 1圖係示出根據本發明之滾筒的剖面圖式; 第1 2圖係示出該滾筒的不同範例之剖面圖式; 第1 3 a至1 3 c圖係示出一製程的剖面圖式,其中該基 材穩固地設置在該基材傳送設備上; 第1 4圖係示出一同線FPD自動光學偵測的簡要圖式; 第1 5和1 6圖係根據本發明之基材校直單元的平面圖 式及剖面圖式; 第1 7圖係示出一步進馬達的圖式;以及 第1 8 a至1 8 e圖係示出根據本發明之基材校直單元的 運作之平面圖式。 【主要元件符號說明】 10 ' 500 基材 14 氣體浮動器 15a 支撐板 16 基材校直單元 12a > 12b 傳送機械臂 15 偵測單元 15b 偵測裝置 18 傳送台 26 1312179Figure 10 is a schematic view showing the automatic optical detection of the same plane flat panel display (FPD) according to the present invention; Fig. 1 is a sectional view showing the drum according to the present invention; A cross-sectional view showing a different example of the roller; a 1 3 a to 1 3 c diagram showing a cross-sectional view of a process in which the substrate is firmly disposed on the substrate transfer apparatus; A schematic diagram showing an on-line FPD automatic optical detection; Figures 15 and 16 are a plan view and a cross-sectional view of a substrate alignment unit according to the present invention; and Figure 17 shows a stepping motor The drawings; and the 18th to 18th drawings show a plan view of the operation of the substrate alignment unit according to the present invention. [Main component symbol description] 10 '500 substrate 14 gas floater 15a support plate 16 substrate alignment unit 12a > 12b transfer robot 15 detection unit 15b detection device 18 transfer table 26 1312179

20 夾具 2 1 喷孔 22 基底板 24 線性轨道 30 傳送臺座 32、 33 主體 32a 上頜 32b 下頜 34 間距控制器 35 支樓板 36 水平移動單元 36a 固定校直點 36b 可變校直點 3 8 步進馬達 40 轉子 42 定子 44 永久磁鐵 46、 48' 50 線圈 52 軸 60 第一傳送板 62 第二傳送板 64 第三傳送板 66 第一驅動單元 68 第二驅動單元 70 垂直旋轉軸 72 基材傳送驅動單 100 、100’ 固定單元 1 00ί i 上夾盤 loot > 下夾盤 110 ' 111 真空喷孔 110, 真空墊 120 、1 2 0 ’ 氣流通ϋ 130 抽氣單元 150 穿孔 200 垂直傳送單元 300 水平移動單元 400 傳送板 600 ' 700 夾持設備 6 10 空氣喷孔 620 滾筒設備 62 1 滾筒 622 滚筒支撐板 622a 第一支撐板 622b 第二支撐板 630 通道單元 800 載具 2720 Fixture 2 1 Spray hole 22 Base plate 24 Linear track 30 Transfer pedestal 32, 33 Main body 32a Upper jaw 32b Lower jaw 34 Pitch controller 35 Branch plate 36 Horizontal moving unit 36a Fixed alignment point 36b Variable alignment point 3 8 Step Motor 40 Rotor 42 Stator 44 Permanent magnet 46, 48' 50 Coil 52 Shaft 60 First transfer plate 62 Second transfer plate 64 Third transfer plate 66 First drive unit 68 Second drive unit 70 Vertical rotary shaft 72 Substrate transfer drive Single 100, 100' fixed unit 1 00ί i Upper chuck loot > Lower chuck 110 ' 111 Vacuum nozzle 110, vacuum pad 120, 1 2 0 'Air flow ϋ 130 Air extraction unit 150 Perforated 200 Vertical transfer unit 300 Horizontal Mobile unit 400 transfer plate 600' 700 clamping device 6 10 air injection hole 620 roller device 62 1 roller 622 roller support plate 622a first support plate 622b second support plate 630 channel unit 800 carrier 27

Claims (1)

1312179 第㈣7號靜擦飧年/月修正 货年|月丨明條受)_ί 十、申請專利範圍 1. 一種基材夹持設備,其至少包含: 一上失盤;以及 一下夾盤,配置來將一基材插入該上夾盤和該下夾盤 間並爽住該基材’ 其中一配置來吸附及固定該基材的真空喷孔係形成在 面對彼此的上及下夾盤的相對表面之至少一者上。1312179 No. 7 (Seventh) No. 7 static rubbing year/month revised cargo year | 月丨明条受)_ί10. Patent application scope 1. A substrate holding device, which at least includes: an upper disc loss; and a lower chuck, configuration Inserting a substrate between the upper chuck and the lower chuck and cooling the substrate. One of the vacuum orifices configured to adsorb and fix the substrate is formed on the upper and lower chucks facing each other. At least one of the opposite surfaces. 2.如申請專利範圍第1項所述之基材夹持設備,其中上述 之真空噴孔係經形成為從一基材接觸表面突出一段預定高 度。 3 .如申請專利範圍第2項所述之基材夾持設備,其中上述 之真空喷孔係經形成為從該基材接觸表面突出1-2毫米的 面度。2. The substrate holding apparatus of claim 1, wherein the vacuum orifice is formed to protrude from a substrate contact surface by a predetermined height. 3. The substrate holding apparatus of claim 2, wherein the vacuum orifice is formed to protrude from the contact surface of the substrate by a dimension of 1-2 mm. 4.如申請專利範圍第2項所述之基材夾持設備,其中上述 之真空喷孔係由延伸複數個階級形成,該等階級係經形成 而使得該真空喷孔的外表面往下朝向該真空喷孔的内部傾 斜。 5.如申請專利範圍第1或2項所述之基材夾持設備,其中 一穿孔係形成在面對彼此的上夾盤及下夾盤的相對表面之 28 1312179 至少一者上,並且該真空喷孔係設置在該穿孔内。 6. 如申請專利範圍第1或2項所述之基材夾持設備,其中 上述之真空喷孔係以一或多列設置在該等相對表面上。 7. 如申請專利範圍第1或2項所述之基材夾持設備,其中 上述之真空喷孔係由矽彈性材料製成。4. The substrate holding apparatus of claim 2, wherein the vacuum orifice is formed by extending a plurality of stages, the stages being formed such that an outer surface of the vacuum orifice faces downward The inside of the vacuum nozzle is inclined. 5. The substrate holding device of claim 1 or 2, wherein a perforation is formed on at least one of the opposing surfaces of the upper and lower chucks facing each other, and the A vacuum orifice is disposed within the perforation. 6. The substrate holding apparatus of claim 1 or 2, wherein the vacuum orifices are disposed on the opposite surfaces in one or more columns. 7. The substrate holding apparatus of claim 1 or 2, wherein the vacuum orifice is made of a neodymium elastic material. 8. 如申請專利範圍第1或2項所述之基材夾持設備,其中 上述之至少一個相對表面係經提供以一避震器,以避免該 基材受損。 9. 如申請專利範圍第8項所述之基材夾持設備,其中上述 之避震器包含PEEK(聚醚醚酮)、高分子聚乙烯以及氟化樹 脂化合物之至少一種。8. The substrate holding apparatus of claim 1 or 2, wherein at least one of the opposing surfaces is provided with a shock absorber to prevent damage to the substrate. 9. The substrate holding device according to claim 8, wherein the shock absorber comprises at least one of PEEK (polyether ether ketone), high molecular polyethylene, and a fluorinated resin compound. I 0. —種基材傳送設備,其至少包含: 一如申請專利範圍第1或2項所述之基材夾持設備; 以及 一載具,配置來以一真空壓力支撐該基材,藉由將該 基材夾持設備設置在該載具的一側或兩側上。 II .如申請專利範圍第1 0項所述之基材傳送設備,其中上 29 1312179 述之載具更包含複數個空氣喷孔,配置來漂浮該基材,以 及一滾筒單元,配置來傳送該基材。 1 2.如申請專利範圍第1 1項所述之基材傳送設備,其中上 述之滚筒單元包含一滚筒及一滚筒支撐板。A substrate transfer apparatus comprising: at least: a substrate holding device as described in claim 1 or 2; and a carrier configured to support the substrate under a vacuum pressure The substrate holding device is disposed on one or both sides of the carrier. The substrate transfer apparatus of claim 10, wherein the carrier of the above-mentioned 29 1312179 further comprises a plurality of air nozzles configured to float the substrate, and a roller unit configured to transmit the Substrate. The substrate transfer apparatus of claim 11, wherein the drum unit comprises a drum and a drum support plate. 1 3 .如申請專利範圍第1 2項所述之基材傳送設備,其中上 述之複數個滚筒單元係設置在該載具的傳送方向上。 14.如申請專利範圍第12或13項所述之基材傳送設備, 其中上述之滚筒係由一滚動軸承支撐。 1 5.如申請專利範圍第1 2或1 3項所述之基材傳送設備, 其中上述之滚筒支撐板包含一第一支撐板及一第二支撐 板,該第一支撐板係關於該第二支撐板可動地設置在該基 材方向上。 1 6.如申請專利範圍第1 5項所述之基材傳送設備,其中一 真空壓力圓柱係插入在該第一支撐板和該第二支撐板間。 1 7.如申請專利範圍第1 2或1 3項所述之基材傳送設備, 其中一皮帶係纏繞在該複數個滾筒單元上。 30 1312179 1 8 ·如申請專利範圍第1 0項所述之基材傳送設備,其中一 塗層係形成在該載具上表面的一部分上。 1 9.如申請專利範圍第1 8項所述之基材傳送設備,其中上 述之塗層包含氟化樹脂。The substrate transfer apparatus of claim 12, wherein the plurality of roller units are disposed in a conveying direction of the carrier. 14. The substrate transfer apparatus of claim 12, wherein the drum is supported by a rolling bearing. 1 . The substrate transfer device of claim 1 or 2, wherein the roller support plate comprises a first support plate and a second support plate, wherein the first support plate is related to the first The two support plates are movably disposed in the direction of the substrate. The substrate transfer apparatus of claim 15, wherein a vacuum pressure cylinder is interposed between the first support plate and the second support plate. The substrate transfer apparatus of claim 12, wherein a belt is wound around the plurality of drum units. 30 1312179 1 8 The substrate transfer apparatus of claim 10, wherein a coating is formed on a portion of the upper surface of the carrier. The substrate transfer apparatus of claim 18, wherein the coating layer comprises a fluorinated resin. 20.如申請專利範圍第1 8項所述之基材傳送設備,其中上 述之塗層包含鐵氣龍。 21.如申請專利範圍第18項所述之基材傳送設備,其中上 述之塗層係以1 0 -1 0 0毫米的厚度塗覆。 2 2.如申請專利範圍第1 2項所述之基材傳送設備,更包含: 一感應器,配置來感應一空氣喷孔的氣壓;以及 一控制器,配置來根據該感應器感測到的氣壓是否正 常來控制該滚筒的升高及降低。 2 3.如申請專利範圍第1 1項所述之基材傳送設備,其中一 電極膜係形成在該基材表面上,並且提供一導體在該載具 上表面.的一部分上。 24.如申請專利範圍第2 3項所述之基材傳送設備,更包含: 一電源供應單元,配置來施加電力至該電極膜或該導 31 1312179 體;以及 一接觸感測單元,配置來感測該電極膜和該導體間是 否有電流流過。 2 5 .如申請專利範圍第1 2項所述之基材傳送設備,其中上 述之滾筒的表面包含PEEK、高分子聚乙烯以及氟化樹脂 化合物之至少一種。20. The substrate transfer apparatus of claim 18, wherein the coating comprises iron gas dragon. 21. The substrate transfer apparatus of claim 18, wherein the coating is applied at a thickness of from 10 to 100 mm. 2. The substrate transfer apparatus of claim 12, further comprising: an inductor configured to sense air pressure of an air injection hole; and a controller configured to sense according to the sensor Whether the air pressure is normal to control the rise and fall of the drum. 2. The substrate transfer apparatus of claim 1, wherein an electrode film is formed on the surface of the substrate and a conductor is provided on a portion of the upper surface of the carrier. 24. The substrate transfer apparatus of claim 23, further comprising: a power supply unit configured to apply power to the electrode film or the lead 31 1312179 body; and a contact sensing unit configured to A current is sensed between the electrode film and the conductor. The substrate transfer apparatus according to claim 12, wherein the surface of the roller comprises at least one of PEEK, high molecular polyethylene, and a fluorinated resin compound. 26. —種同線FPD自動光學偵測設備,其包含如申請專利 範圍第1 2項所述之基材傳送設備。 2 7.如申請專利範圍第26項所述之偵測設備,更包含: 一傳送板,設置在一傳送臺座的一側;26. A homogeneous FPD automatic optical inspection apparatus comprising the substrate transfer apparatus of claim 12 of the patent application. 2 7. The detecting device according to claim 26, further comprising: a conveying plate disposed on one side of the conveying base; 一夾具及一固定校直點,設置在該傳送板的一侧; 一可變校直點,設置在該傳送板的另一側;以及 一驅動單元,配置來移動及旋轉該傳送板, 其中該傳送板係往與一基材傳送方向垂直的基材寬度 方向移動,並且經設置而往一與該基材垂直的旋轉軸之旋 轉方向旋轉。 2 8.如申請專利範圍第2 7項所述之偵測設備,其中上述之 傳送板包含一第一傳送板,設置在該傳送臺座的一側,以 32 1312179 可朝該基材傳送方向移動,一第二傳送板,設置在該第一 傳送臺座上,以可朝該基材寬度方向移動,以及一第三傳 送板,經設置而繞著與該基材垂直的旋轉軸旋轉,其中該 夾具及固定校直點係設置在該第三傳送板上。 2 9 ·如申請專利範圍第2 8項所述之偵測設備,其中上述之 驅動單元包含第一及第二驅動單元,配置來以該基材寬度 方向移動該第三傳送板,並以一垂直軸為中心旋轉。a fixture and a fixed alignment point disposed on one side of the transfer plate; a variable alignment point disposed on the other side of the transfer plate; and a drive unit configured to move and rotate the transfer plate, wherein The transfer plate is moved in the width direction of the substrate perpendicular to the direction in which the substrate is conveyed, and is set to rotate in a rotation direction of a rotation axis perpendicular to the substrate. [2] The detection device of claim 27, wherein the transfer plate comprises a first transfer plate disposed on one side of the transfer pedestal, and the transfer direction of the substrate can be directed to 32 1312179 Moving, a second transfer plate disposed on the first transfer pedestal to be movable toward the width direction of the substrate, and a third transfer plate disposed to rotate about a rotation axis perpendicular to the substrate The fixture and the fixed alignment point are disposed on the third transfer board. The detection device of claim 28, wherein the driving unit comprises first and second driving units configured to move the third conveying plate in a width direction of the substrate, and to The vertical axis rotates center. 3 0如申請專利範圍第2 9項所述之偵測設備,其中上述之 第一及第二驅動單元係一步進馬達。 3 1.如申請專利範圍第2 7.至3 0項之任一項所述之偵測設 備,其中上述之傳送板係以該基材傳送方向可移動地設置 在該傳送臺座上。The detecting device of claim 29, wherein the first and second driving units are a stepping motor. The detecting device according to any one of claims 2 to 30, wherein the conveying plate is movably disposed on the conveying base in the conveying direction of the substrate. 3 2 ·如申請專利範圍第2 7至3 0項之任一項所述之偵測設 備,更包含一基材驅動單元,配置來在該基材傳送方向上 移動該傳送板。 3 3 .如申請專利範圍第2 7至3 0項之任一項所述之偵測設 備,其中上述之固定校直點係設置在該第三傳送板的最右 及最左侧。 33 1312179 3 4 ·如申請專利範圍第2 7至3 0項之任一項所述之偵測設 備,其中上述之可變校直點更包含一彈性單元,並與該基 材伸縮接觸。 3 5 .如申請專利範圍第2 7至3 0項之任一項所述之偵測設 備,其中上述之可變校直點更包含其自身的驅動單元,並 且往該基材寬度方向移動。The detecting device according to any one of claims 2-7 to 30, further comprising a substrate driving unit configured to move the conveying plate in the conveying direction of the substrate. The detection device according to any one of claims 2-7 to 30, wherein the fixed alignment point is disposed on the rightmost and leftmost sides of the third transfer plate. The detection device according to any one of claims 2-7 to 30, wherein the variable alignment point further comprises an elastic unit and is in a telescopic contact with the substrate. The detecting device according to any one of claims 2-7 to 30, wherein the variable straightening point further includes its own driving unit and moves toward the width direction of the substrate. 3434
TW95128337A 2005-08-04 2006-08-02 Clamping apparatus, substrate transfer apparatus, and in-line fpd automatic optical inspection apparatus TWI312179B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020050071367A KR101139371B1 (en) 2005-08-04 2005-08-04 Panel display clamping apparatus and transfering and inspecting apparatuses having the same
KR1020050071378A KR101138727B1 (en) 2005-08-04 2005-08-04 Panel display clamping apparatus and transfering and inspecting apparatuses having the same
KR1020050073713A KR101210939B1 (en) 2005-08-11 2005-08-11 Substrate Transfering Apparatus and FPD Automatic Optical Inspection Using Same
KR1020050076036A KR101138728B1 (en) 2005-08-19 2005-08-19 Substrate Alignment Apparatus and FPD Automatic Optical Inspection Using Same

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TWI312179B true TWI312179B (en) 2009-07-11

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TWI406802B (en) * 2010-05-26 2013-09-01 Zhen Ding Technology Co Ltd Conveyer

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JP5960275B2 (en) * 2012-10-26 2016-08-02 シャープ株式会社 Optical member transport device
CN107768264A (en) * 2017-09-28 2018-03-06 苏州阿特斯阳光电力科技有限公司 Leak electricity verifying attachment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406802B (en) * 2010-05-26 2013-09-01 Zhen Ding Technology Co Ltd Conveyer

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