TWI301731B - - Google Patents

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Publication number
TWI301731B
TWI301731B TW92105802A TW92105802A TWI301731B TW I301731 B TWI301731 B TW I301731B TW 92105802 A TW92105802 A TW 92105802A TW 92105802 A TW92105802 A TW 92105802A TW I301731 B TWI301731 B TW I301731B
Authority
TW
Taiwan
Prior art keywords
electrode
plasma
frequency power
applying
voltage
Prior art date
Application number
TW92105802A
Other languages
English (en)
Chinese (zh)
Other versions
TW200306137A (en
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200306137A publication Critical patent/TW200306137A/zh
Application granted granted Critical
Publication of TWI301731B publication Critical patent/TWI301731B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
TW92105802A 2002-03-19 2003-03-17 Plasma processing method TW200306137A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002076039 2002-03-19

Publications (2)

Publication Number Publication Date
TW200306137A TW200306137A (en) 2003-11-01
TWI301731B true TWI301731B (ja) 2008-10-01

Family

ID=28035402

Family Applications (1)

Application Number Title Priority Date Filing Date
TW92105802A TW200306137A (en) 2002-03-19 2003-03-17 Plasma processing method

Country Status (2)

Country Link
TW (1) TW200306137A (ja)
WO (1) WO2003079427A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI488546B (zh) * 2012-02-23 2015-06-11 Shinkawa Kk A plasma generating device and a plasma reactor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0634778A (ja) * 1992-07-14 1994-02-10 Nippon Nuclear Fuel Dev Co Ltd 核燃料要素
US5468296A (en) * 1993-12-17 1995-11-21 Lsi Logic Corporation Apparatus for igniting low pressure inductively coupled plasma
US5716534A (en) * 1994-12-05 1998-02-10 Tokyo Electron Limited Plasma processing method and plasma etching method
JPH08213362A (ja) * 1995-02-02 1996-08-20 Sony Corp プラズマ処理装置およびプラズマ処理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI488546B (zh) * 2012-02-23 2015-06-11 Shinkawa Kk A plasma generating device and a plasma reactor

Also Published As

Publication number Publication date
TW200306137A (en) 2003-11-01
WO2003079427A1 (fr) 2003-09-25

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees