TWI293981B - - Google Patents

Download PDF

Info

Publication number
TWI293981B
TWI293981B TW091110040A TW91110040A TWI293981B TW I293981 B TWI293981 B TW I293981B TW 091110040 A TW091110040 A TW 091110040A TW 91110040 A TW91110040 A TW 91110040A TW I293981 B TWI293981 B TW I293981B
Authority
TW
Taiwan
Prior art keywords
raw material
abrasive
pulverization
weight
rare earth
Prior art date
Application number
TW091110040A
Other languages
English (en)
Chinese (zh)
Inventor
Terunori Ito
Hiroyuki Watanabe
Kazuya Ushiyama
Shigeru Kuwabara
Yoshitsugu Uchino
Original Assignee
Mitsui Mining & Smelting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining & Smelting Co filed Critical Mitsui Mining & Smelting Co
Application granted granted Critical
Publication of TWI293981B publication Critical patent/TWI293981B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01FCOMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00Compounds of rare earth metals
    • C01F17/20Compounds containing only rare earth metals as the metal element
    • C01F17/206Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C01F17/224Oxides or hydroxides of lanthanides
    • C01F17/235Cerium oxides or hydroxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/14Anti-slip materials; Abrasives
    • C09K3/1409Abrasive particles per se
    • C09K3/1418Abrasive particles per se obtained by division of a mass agglomerated by sintering
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW091110040A 2001-05-29 2002-05-14 TWI293981B (cg-RX-API-DMAC7.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001160644A JP4002740B2 (ja) 2001-05-29 2001-05-29 セリウム系研摩材の製造方法

Publications (1)

Publication Number Publication Date
TWI293981B true TWI293981B (cg-RX-API-DMAC7.html) 2008-03-01

Family

ID=19004023

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091110040A TWI293981B (cg-RX-API-DMAC7.html) 2001-05-29 2002-05-14

Country Status (8)

Country Link
US (1) US6905527B2 (cg-RX-API-DMAC7.html)
EP (1) EP1391494A1 (cg-RX-API-DMAC7.html)
JP (1) JP4002740B2 (cg-RX-API-DMAC7.html)
KR (1) KR100509267B1 (cg-RX-API-DMAC7.html)
CN (1) CN1239666C (cg-RX-API-DMAC7.html)
MY (1) MY129185A (cg-RX-API-DMAC7.html)
TW (1) TWI293981B (cg-RX-API-DMAC7.html)
WO (1) WO2002097004A1 (cg-RX-API-DMAC7.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6863825B2 (en) 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
WO2006025614A1 (en) * 2004-09-03 2006-03-09 Showa Denko K.K. Mixed rare earth oxide, mixed rare earth fluoride, cerium-based abrasive using the materials and production processes thereof
JP2006206870A (ja) * 2004-12-28 2006-08-10 Mitsui Mining & Smelting Co Ltd セリウム系研摩材用原料及びセリウム系研摩材用原料の製造方法、並びに、セリウム系研摩材及びセリウム系研摩材の製造方法
US8361419B2 (en) 2005-09-20 2013-01-29 Lg Chem, Ltd. Cerium carbonate powder, method for preparing the same, cerium oxide powder made therefrom, method for preparing the same, and CMP slurry comprising the same
CN101268017A (zh) 2005-09-20 2008-09-17 Lg化学株式会社 碳酸铈粉末及其制备方法、由该碳酸铈粉末制备的氧化铈粉末及其制备方法以及含该氧化铈粉末的cmp浆料
KR101450865B1 (ko) * 2006-10-24 2014-10-14 동우 화인켐 주식회사 디스플레이용 유리패널의 연마를 위한 폐연마재의 재생방법
US8066874B2 (en) 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
US8303918B2 (en) 2007-03-16 2012-11-06 Lg Chem, Ltd. Method for preparing cerium carbonate powder using urea
CN101641290A (zh) * 2007-03-16 2010-02-03 株式会社Lg化学 制备碳酸铈粉体的方法
US8252087B2 (en) 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN103923602A (zh) * 2013-01-15 2014-07-16 安阳市岷山有色金属有限责任公司 一种铈系研磨材料的制造方法
AU2015226889B2 (en) 2014-03-07 2019-09-19 Secure Natural Resources Llc Cerium (IV) oxide with exceptional arsenic removal properties
CN104387989B (zh) * 2014-11-04 2016-08-24 南昌大学 高密度碳酸稀土高温爆裂法制备超细高铈稀土抛光粉的方法
MY192996A (en) * 2017-09-11 2022-09-20 Showa Denko Kk Manufacturing method for starting material for cerium-based abrasive agent, and manufacturing method for cerium-based abrasive agent

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08267355A (ja) 1995-04-03 1996-10-15 Fujimi Inkooporeetetsudo:Kk 研磨剤微粉末の製造方法
JP2991952B2 (ja) 1995-07-31 1999-12-20 多木化学株式会社 酸化第二セリウム及びその製造方法
CN1323124C (zh) * 1996-09-30 2007-06-27 日立化成工业株式会社 氧化铈研磨剂以及基板的研磨方法
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
JPH11181404A (ja) 1997-12-18 1999-07-06 Hitachi Chem Co Ltd 酸化セリウム研磨剤および基板の研磨法
KR100475976B1 (ko) * 1998-12-25 2005-03-15 히다치 가세고교 가부시끼가이샤 Cmp 연마제, cmp 연마제용 첨가액 및 기판의 연마방법
US6428392B1 (en) * 1999-03-23 2002-08-06 Seimi Chemical Co., Ltd. Abrasive
JP2001035818A (ja) * 1999-07-16 2001-02-09 Seimi Chem Co Ltd 半導体用研磨剤
EP1243633A4 (en) * 2000-10-02 2009-05-27 Mitsui Mining & Smelting Co CERIUM-SUSPENDED ABRASIVE AND METHOD FOR THE PRODUCTION THEREOF
DE60140621D1 (de) * 2000-11-30 2010-01-07 Showa Denko Kk Cerbasierendes schleifmittel und dessen herstellung

Also Published As

Publication number Publication date
CN1239666C (zh) 2006-02-01
MY129185A (en) 2007-03-30
US6905527B2 (en) 2005-06-14
US20040219791A1 (en) 2004-11-04
KR100509267B1 (ko) 2005-08-18
EP1391494A1 (en) 2004-02-25
CN1489625A (zh) 2004-04-14
JP4002740B2 (ja) 2007-11-07
KR20030093193A (ko) 2003-12-06
JP2002348563A (ja) 2002-12-04
WO2002097004A1 (fr) 2002-12-05

Similar Documents

Publication Publication Date Title
TWI293981B (cg-RX-API-DMAC7.html)
Hoshino et al. Mechanism of polishing of SiO2 films by CeO2 particles
KR100392591B1 (ko) 연마제,그의제조방법및연마방법
US6893477B2 (en) Cerium-based abrasive material slurry and method for producing cerium-based abrasive material slurry
TWI281492B (en) Cerium-oxide-based abrasive and method for producing the cerium-oxide-based abrasive
JP2012011526A (ja) 研磨材およびその製造方法
TW200402462A (en) Description method for producing cerium-based abrasive and cerium-based abrasive produced thereby
TWI338036B (en) Cerium-based oxide abrasive, and producing method and use thereof
CN103555206B (zh) 稀土抛光粉及其制备方法
JP4128906B2 (ja) セリウム系研摩材及びセリウム系研摩材の製造方法
CN1957253B (zh) 研磨材粒子的品质评估方法,玻璃研磨方法及玻璃研磨用研磨材组成物
CN111051463B (zh) 铈系研磨材料用原料的制造方法和铈系研磨材料的制造方法
CN107201178B (zh) 一种铈镨稳定氧化锆抛光粉的制备方法
JP4070180B2 (ja) セリウム系研摩材の製造方法
CN101356248A (zh) 铈系研磨材料
TWI249570B (en) Cerium-based abrasive containing fluorine and method of producing the same
Zhou et al. Study on pitch performance deterioration in chemical mechanical polishing of fused silica
JP3986384B2 (ja) セリウム系研摩材およびその製造方法
Zhang et al. Preparation of Chlorine-doped CeO2 Abrasive and Investigation of Chemical-Mechanical Polishing Properties
JP4394848B2 (ja) セリウム系研摩材の製造方法及びセリウム系研摩材
CN101321841B (zh) 铈系研磨材料
JP3986410B2 (ja) セリウム系研摩材スラリーの製造方法及びそれにより得られたセリウム系研摩材スラリー
JP2003105326A (ja) セリウム系研摩材原料及びセリウム系研摩材原料の分析方法
JP4290465B2 (ja) 酸化セリウムを主成分とするセリウム系研摩材の製造方法
CN115785821A (zh) 一种石材抛光剂及其制备方法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees