1287075 九、發明說明： L發明戶斤屬之技術領域3 發明領域 本發明係有關於一種閘閥及真空閘閥。 5 【才支冬奸】 發明背景 歷來，閘閥多設於真空處理室，以及用以將該真空處 理室排氣成真空狀態的真空泵二者之間，此種閘閥稱為真 空閘閥。近年來，真空閘閥對於用以構成液晶、半導體製 10 造裝置等領域中之真空系統而言係為重要裝置，且占有重 要地位。 真空閘閥在提高真空處理室之真空度時，係令閥為開 閥狀態，並藉由驅動真空泵以提高真空處理室内的真空 度，俾做成高真空狀態。又，藉由令閥為閉閥狀態而讓真 15 空處理室内為低真空（低壓）或大氣壓，可取出於真空處理室 内進行處理之工作件，或者是去除真空處理室内的反應生 成物。進而，可保護真空泵不受低壓或大氣壓影響，防止 真空泵之劣化及受損。 再者，迄今已提供有多數之真空閘閥，具體而言，有 20 一種真空閘閥，其係於閥箱形成真空處理室側排氣口及真 空泵側排氣口，並設有一可自由開啟及關閉地裝卸於該真 空處理側排氣口之真空處理室側閥板，以及一可自由開啟 及關閉地裝卸於真空泵側排氣口之真空泵閥板。 此種習知之真空閘閥係譬如專利文獻1所揭示者。 5 1287075 (專利文獻1 :日本專利公開公報特開平11-99326號) 【發明内容】 發明概要 發明欲解決之課題 5 半導體製程中之層間絕緣膜積層技術，即 CVD(Chemical Vapor Deposition :化學氣相沉積法）製程， 係將以各種方法（電漿、熱、光等）而讓材料氣體進行反應的 反應生成膜積層於矽晶圓上。然而同時，腔室（chember)之 内壁及電極、配管内以及真空閘閥的閥箱内亦會堆積反應 10生成物。特別是，真空閘閥中，有時會因前述堆積的反應 生成物而招致閥滲漏(valve leak)以及閥動作不良的情形， 而無法發揮真空閥之功能。1287075 IX. INSTRUCTIONS INSTRUCTIONS: TECHNICAL FIELD OF THE INVENTION The invention relates to a gate valve and a vacuum gate valve. 5 [Incorporating Winter Maids] BACKGROUND OF THE INVENTION Historically, gate valves have been placed between vacuum processing chambers and vacuum pumps for evacuating the vacuum processing chamber to a vacuum state. Such gate valves are referred to as vacuum gate valves. In recent years, vacuum gate valves have become important devices for vacuum systems in the fields of liquid crystal, semiconductor manufacturing, and the like, and have an important position. When the vacuum gate valve increases the vacuum degree of the vacuum processing chamber, the valve is opened, and the vacuum is driven by the vacuum pump to increase the vacuum in the vacuum processing chamber. Further, by allowing the valve to be in a closed state and allowing the vacuum chamber to have a low vacuum (low pressure) or atmospheric pressure, the workpiece can be taken out for processing in the vacuum processing chamber, or the reaction product in the vacuum processing chamber can be removed. Further, the vacuum pump can be protected from low pressure or atmospheric pressure to prevent deterioration and damage of the vacuum pump. Furthermore, a plurality of vacuum gate valves have been provided so far, specifically, there are 20 types of vacuum gate valves which are formed in the valve box to form a vacuum processing chamber side exhaust port and a vacuum pump side exhaust port, and are provided with a free opening and closing. The vacuum processing chamber side valve plate is detachably mounted on the vacuum processing side exhaust port, and a vacuum pump valve plate detachably attached to the vacuum pump side exhaust port. Such a conventional vacuum gate valve is as disclosed in Patent Document 1. [Patent Document 1: Japanese Laid-Open Patent Publication No. Hei 11-99326] SUMMARY OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION Problem 5 Interlayer insulating film lamination technique in semiconductor manufacturing, that is, CVD (Chemical Vapor Deposition) The deposition method is a process in which a material gas is reacted in various ways (plasma, heat, light, etc.) to form a film deposited on a germanium wafer. At the same time, however, the reaction 10 product is also accumulated in the inner wall of the chamber and in the electrode, the inside of the piping, and the valve box of the vacuum gate valve. In particular, in the vacuum gate valve, valve leakage and valve malfunction may occur due to the reaction product deposited as described above, and the function of the vacuum valve may not be exhibited.
於叩，W迷習知之真空閘閥其目的並不在於完全地I 15 止滲漏。因此，反應生成物不僅附著於密封面，更會附 在閥板及閥箱内，如此不但導致腔室内的真空度降低，^ • 會增加潔淨作業的負擔。進而，假設若因渗漏而變得無; 欲去除腔室_堆積物時，由於無法切斷腔室4 及真玉泵側，因此不得不暫時停止 裝置時，至腔室内之真空度提升為止二而再★啟動cv] 2〇因此，本發明係用以解決前述^化費許多時間。 供-…異_於密封二:=: 真空閘閥。 私王珍漏之閘闕Ά 用 以解決課題之手段 用以解決前述課題之第^务明的閘 閥，係用以開啟及關 1287075 閉相對向地設於流體通道上之密封面者，包含有： 開閥體，係開閥時抵接於前述密封面，且用以連通前 述通道者； 閉閥體，係閉閥時抵接於前述密封面，且用以切斷前 5 述通道者； 閥箱，係用以收納前述開閥體及閉閥體者；及 閥體移動機構，係用以於前述閥箱内讓開閥體及閉閥 體相對於密封面而交互移動者。 用以解決前述課題之第2發明的閘閥，係於第1發明之 10 閘閥中，於前述開閥體及閉閥體設一對閥板， 該閘閥並包含用以將前述一對閥板裝卸於密封面之連 接機構。 用以解決前述課題之第3發明的閘閥，係於第2發明之 閘閥中，於前述開閥體之一對閥板間設一波形管。 15 用以解決前述課題之第4發明的閘閥，係於第1、2或3 發明之閘閥中，於前述閥箱形成可開啟及關閉之檢測口， 並將該檢測口設於與閉閥時進行移動的開閥體相對向之位 置上。 用以解決前述課題之第5發明的閘閥，係於於第1、2 20 或3發明之閘閥中，設有二個開閉閥，該等開閉閥係藉由開 啟及關閉動作而將前述閥箱内之流體供給及排出於前述閥 箱， 又，由開閥狀態操作成閉閥狀態或由閉閥狀態操作成 開閥狀態時，令至少其中一側之前述開閉閥為開啟狀態， 7 1287075 且操作結束後令前述二個開閉閥同為關閉狀態。 用以解決前述課題之第6發明的真空閘閥，係用以開啟 及關閉設於處理室側及泵側二者之間的連通路徑者，包含 有： 5 開閥體，係開閥時，藉由讓一對閥板抵接於前述處理 室側之密封面及前述泵側之密封面，俾形成前述連通路徑 者， 閉閥體，係閉閥時，一對閥板抵接於前述處理室側之 密封面及前述泵側之密封面而切斷前述連通路徑者； 10 閥箱，係用以收納前述開閥體及閉閥體者； 閥體移動機構，係用以於前述閥箱内讓開閥體及閉閥 體相對於密封面而交互移動者； 連接機構，係用以將前述開閥體及閉閥體的一對閥板 裝卸於密封面者； 15 波形管，係設於前述開閥體之一對閥板間，且用以隔 離前述閥箱内及連通路徑内者； 檢測口，係與閉閥時進行移動的前述開閥體相對應地 形成在前述閥箱上，且具有可開啟及關閉之蓋部者； 處理室側開閉閥，係設於用以連通前述閥箱内及處理 20 室内之配管上者；及 泵側開閉閥，係設於用以連通前述閥箱内及泵二者之 配管上者。 發明之效果 依第1發明之閘閥，其係用以開啟及關閉相對向地設於 8 1287075 流體通道上之密封面者，包含有：開閥體，係開閥時抵接 於前述密封面，且用以連通前述通道者；閉閥體，係閉閥 時抵接於前述密封面，且用以切斷前述通道者；閥箱，係 用以收納前述開閥體及閉閥體者；及閥體移動機構，係用 5 以於前述閥箱内讓開閥體及閉閥體相對於密封面而交互移 動者；藉此，可防止異物附著於前述密封面，並防止發生 滲漏。 依第2發明之閘閥，係於第1發明之閘閥中，於前述開 閥體及閉閥體設一對閥板，該閘閥並包含用以將前述一對 10 閥板裝卸於密封面之連接機構；藉此，進行開啟及關閉動 作時，由於可密封住前述密封面，故可防止發生滲漏。 依第3發明之閘閥，係於第2發明之閘閥中，於前述開 閥體之一對閥板間設一波形管；藉此，由於可隔離前述通 道及閥箱内，故可防止異物滲入前述閥箱内，並可防止發 15 生滲漏。 依第4發明之閘閥，係於第1、2或3發明之閘閥中，於 前述閥箱形成可開啟及關閉之檢測口，並將該檢測口設於 與閉閥時進行移動的開閥體相對向之位置上；藉此，可檢 測閉閥時附著於前述開閥體之異物的堆積情形，又，由於 20 可去除異物，故可降低維修費用及工作成本。 依第5發明之閘閥，係於於第1、2或3發明之閘閥中， 設有二個開閉閥，該等開閉閥係藉由開啟及關閉動作而將 前述閥箱内之流體供給及排出於前述閥箱，又，由開閥狀 態操作成閉閥狀態或由閉閥狀態操作成開閥狀態時，令至 9 1287075 少其中一側之前述開閉閥為開啟狀態，且操作結束後令前 述二個開閉閥同為關閉狀態；藉此，可順暢地操作前述開 閥體及閉閥體。 依第6發明之真空閘閥，係用以開啟及關閉設於處理室 5 側及泵側二者之間的連通路徑者，包含有：開閥體，係開 閥時，藉由讓一對閥板抵接於前述處理室側之密封面及前 述泵側之密封面，俾形成前述連通路徑者；閉閥體，係閉 閥時，一對閥板抵接於前述處理室側之密封面及前述泵侧 之密封面而切斷前述連通路徑者；閥箱，係用以收納前述 10 開閥體及閉閥體者；閥體移動機構，係用以於前述閥箱内 讓開閥體及閉閥體相對於密封面而交互移動者；連接機 構，係用以將前述開閥體及閉閥體的一對閥板裝卸於密封 面者；波形管，係設於前述開閥體之一對閥板間，且用以 隔離前述閥箱内及連通路徑内者；檢測口，係與閉閥時進 15 行移動的前述開閥體相對應地形成在前述閥箱上，且具有 可開啟及關閉之蓋部者；處理室側開閉閥，係設於用以連 通前述閥箱内及處理室内之配管上者；及泵側開閉閥，係 設於用以連通前述閥箱内及泵二者之配管上者；藉此，由 於可防止異物附著於前述密封面，並防止發生滲漏，故不 20 會導致真空度降低。又，由於可隔離前述連通路徑及閥箱 内，故可防止異物滲入前述閥箱内，並減少去除前述閥箱 内之堆積物的作業，同時可延長維修效果。進而，由於不 會有因滲漏而產生無法閉閥之問題，潔淨前述處理室内 時，不需停止前述泵，故不需浪費至該泵再次啟動止之時 10 1287075 間。甚而，由於可檢測閉閥時附著於前述開閥體之異物的 堆積情況，並去除異物，故可降低維修費用及工作成本。 並且，由於前述開閥體及閉閥體可順暢地進行移動，故可 提高操作性。 5 圖式簡單說明 第1圖係一橫截面圖，用以例示本發明一實施態樣之真 空閘閥的開閥狀態。 第2圖係一縱截面圖，用以例示本發明一實施態樣之真 空閘閥的開閥狀態。 10 第3圖係一橫截面圖，用以例示本發明一實施態樣之真 空閘閥的閉閥狀態。 第4 (a)〜(c)圖係例示本發明一實施態樣之真空閘閥的 動作，第4(a)圖係例示閉閥狀態的概略圖，第4(b)圖係例示 由閉閥狀態至開閥狀態之動作的概略圖，第4(c)圖係例示開 15 閥狀態的概略圖。 第5圖係本發明其他實施態樣之真空閘閥的概略圖。 第6圖係本發明一實施態樣之真空處理裝置的概略圖。 C實施方式I 較佳實施例之詳細說明 20 以下，參照圖面詳細說明本發明之真空閘閥的實施態 樣。 第1圖係一橫截面圖，用以例示本發明一實施態樣之真 空閘閥的開閥狀態，第2圖係一縱截面圖，用以例示本發明 一實施態樣之真空閘閥的開閥狀態，.第3圖係一橫截面圖， 11 1287075 用以例示本發明一實施態樣之真空閘閥的閉閥狀態，第4圖 係例示本發明一實施態樣之真空閘閥的動作，第4(a)圖係例 示閉閥狀態的概略圖，第4(b)圖係例示由閉閥狀態至開閥狀 態之動作的概略圖，第4(c)圖係例示開閥狀態的概略圖，第 5 5圖係本發明其他實施態樣之真空閘閥的概略圖，第6圖係 -本發明一實施態樣之真空處理裝置的概略圖。 第6圖係例示譬如CVD裝置等真空處理裝置1的概略 ^ 圖。真空閘閥2係設於真空處理室3及真空泵4之間，用以使 真空處理室3及真空泵4之間成密閉狀態者。真空閘閥2與真 10 空處理室3係藉由配管5而相連通，配管5上設有開閉閥6。 同樣地，真空閘閥2與真空泵4係藉由配管7而相連通，配管 7上設有開閉閥8。 參照第1圖〜第3圖詳細說明該真空匣閥2。 如第1圖至第3圖所示，真空閘閥2係由一箱狀之閥箱 15 11，以及配置於該閥箱11上部的圓筒狀箱體12所構成。 • 閥箱11上形成有一與真空處理室3相連通之圓形的處 理室側排氣口 13，以及一與真空泵4相連通之圓形的泵側排 氣口 14，且該處理室側排氣口 13及泵側排氣口 “具有密封 面13a 14a。又，處理室側排氣口 13的下方形成有一用以 20連接配官5之處理室側連通口 15，㈤時果側排氣口⑽下方 形成有〜用以連接配管7之泵側連通口 16。 ^方面，釦體12内，波形管17係朝上下方向延伸配 波形g 17其上端係支撐於波形管支承件μ ，其下端 則支撐m彡管支树19。—2_插人於該波形管17 12 1287075 内，且配置成貫通箱體12。又，波形管支承件18之突起部 18a係插入在箱體12上形成開口之長形孔21内，且可上下滑 動。再者，箱體12之上部設有把手（移動手段)22，把手22 之螺絲部22a係與轴桿20之螺絲部20a相咬合。 5 位於閥箱11内之軸桿20下端，設有一對朝上下方向延 伸設置之閥支撐件23。閥支撐件23的上、下部各設有上部 滾輪支撐件24及下部滾輪支撐件25。即，閥支撐件23係經 由上部滾輪支撐件24而支持於軸桿20。又，上部滾輪支撐 件24及下部滾輪支樓件25分別具有一對滾輪26、27，且該 10等滾輪％、27係抵接在閥箱11之内壁，且可旋轉地支撐。 閥支撐件23的上方配置有一於開閥狀態專用的開閥體 28 ’另一方面，下方配置有一於閉閥狀態專用的閉閥體31。 開閥體28係由真空處理室3側之處理室側開閥板29，以 及真空泵4側之泵側開閥板3〇所構成。前述處理室側開閥板 15 29及泵側開閥板30上，對向地形成有與處理室側排氣口 13 及泵側排氣口 14具相同孔徑之連通孔29a、30a。又，連通 孔29a、30a的周圍形成有可按壓於密封面13&、i4a之密封 面29b、30b。處理室側開閥板29及泵側開閥板30之間，設 有用以連通前述連通孔29a、30a之波形管34。且，該等連 20 通孔29a、30a與波形管34形成一連通路徑35。 處理室側開閥板29及泵側開閥板30係配置成由前後方 向挾住閥支撐件23。處理室側開閥板29及泵側開閥板30在 其兩側端部的上下位置，係以四個連接件36支撐於閥支撐 件23。 13 1287075 連接件36係由二個板材構成，且具有連結部36a及支撐 部36b。連結部36a，係板材其中一端在閥支撐件23的側端 部重疊且相連結之部位。支撐部36b，係其中一側板材的另 一端支撐在處理室側開閥板29的側端部，且另一側板材的 5 另一端支撐在泵側開閥板30的側端部之部位。 同樣地，閉閥體31係由真空處理室3側之處理室側閉閥 板32及真空泵4側之泵側閉閥板33所構成。處理室側閉閥板 32及泵側閉閥板33上，形成有可按壓於處理室側排氣口 13 之密封面13a以及泵側排氣口 14之密封面14a的密封面 10 32a、33a。前述處理室側閉閥板32及泵側閉閥板33係配置 成可由鈾後方向挾住閥支撐件23。處理室側閉閥板32及泵 側閉閥板33在其兩側端部的上下位置，係以四個連接件37 支撐於閥支撐件23。 連接件37係由二個板材構成，且具有連結部37a及支撐 15部37b。連結部37a，係板材其中一端在閥支撐件23的側端 部重疊且相連結之部位。支樓部37b，係其中一側板材的另 一端支撐在處理室側閉閥板32的側端部，且另一側板材的 另一端支撐在泵側閉閥板33的側端部之部位。 再者，連接件36在開閥體28係配置於第3圖所示之位置 2〇上時，連結部36a係配置在較支撐部36b上方之位置。又， 連接件37在閉卿31錢置於f⑽鮮之位置上時，連結 部37a係配置在較支撐部37b下方之位置。 處理室側開閥板2 9及泵側開閥板3 〇上端部的中央，設 置有淚子38，同時處理室側閉閥板^及果側閉闕板％下端 14 1287075 部的中央，設置有滾子39。閥箱_上部及下部之内壁形 成有擋止部40、41，俾讓該等滾子38、39成相對向。土 y 其次，參照第4⑻圖〜第4(c)圖說明真空閘閥2的動作。 首先，使用第4(a)圖說明閉閥狀態。 5 利用旋轉把手22而讓軸桿20朝上方移動，閥支撐件23 亦朝上方移動。藉此，開閥體28朝閥箱丨丨内的上方移動。 此時，連接件36的連結部36a因閥支撐件23的移動而上 馨幵，且連接件36的支撐部36b邊朝閥箱11的中央側移動邊上 昇。因此，支撐於該支撐部36b的處理室側開閥板29及泵側 1〇開閥板30，亦邊朝閥箱11的中央側移動邊上昇。波形管34 因處理室側開閥板29及泵側開閥板30朝閥箱U的中央側移 動而緊縮。再者，滾子38抵接於擋止部40,且開閥體28配 置在閥箱11内的上方。 又 旦閥支撐件23朝上方移動，僅連結部36a會上 15幵’處理室側開閥板29及泵側開閥板30因滾子38的旋轉而 • 更往閥箱11的中央側移動。 另一方面，閉閥體31隨著閥支撐件23朝上方移動之動 作’而移動至與處理室側排氣口 13及泵側排氣口 14相對向 之位置。此時，由於連接件37之連結部37a因閥支撐件23的 移動而上昇，故連接件37的支撐部37b移動至閥箱11的側壁 側°藉此’支撐於該支撐部37b的處理室側閉閥板32及泵側 閉闊板33 ’會將密封面32a按壓在處理室側排氣口 13之密封 面13a上’同時並將密封面33a按壓在泵側排氣口 14之密封 面 14a。 15 1287075 因此，可切斷閥箱11與真空處理室3及真空泵4。即， 可使真空處理室3及真空泵4之間成密封狀態。 其次，使用第4(b)圖說明由閉閥狀態至開闊狀態的動 作。 5 狀態動作至開閥狀態時’藉由旋轉把手22而讓 軸桿2〇朝下方移動，並讓閥支撐件23往下移動。藉此，開 閥體28及閉閥體31亦往下方移動。 • 再者，連接件36的連結部3如因閥支撐件23的移動而下 降且連接件36的支撐部36b邊朝閥箱n的側壁側移動邊下 口此處理至側開閥板29及泵側開閥板3〇亦邊朝閥箱 ⑽側壁側移動邊下降。此時，波形管34朝下方移動，同 柃並t叉慢地拉伸開來。又，連接件”的連結部3%因闊支樓 件23的移動而下降，且連接件37的支樓部奶邊朝閥箱⑽ 中、】矛夕動邊下降。因此，處理室側閉閥板32及泵側閉閥 15板33亦邊朝閥箱Π的中央側移動邊下降。 • 進而，一旦開閥體28及閉閥體31朝下方移動，就成第 4(c)圖所示之開閥狀態。 其次，使用第4(c)圖說明開閥狀態。 開閥體28隨著閥支撐件23朝下方移動之動作，而移動 20至與處理室側排氣口 U及泵側排氣口 14相對向之位置。此 π处里至側開閥板29之連通孔29a及泵側開閥板3〇之連通 孔3〇心係配置在與處理室側排氣口 13及泵側排氣口 14相同 之咼又(位置）。同時，藉由連接件36而移動至閥箱11之側壁 側的處理室側開閥板29及泵側開閥板3〇，會將密封面2外按 16 1287075 壓在處理室側排氣口 13之密封面13a上，同時並將密封面 30b按壓在泵側排氣口 14的密封面14a。又，波形管34亦伸 展至預定的長度。 另一方面’滾子39抵接於播止部41 ’閉閥體μ係配置 5 在閥箱11内的下方。進而，一旦閥支撐件23朝下方移動， 僅連結部37a下降，處理室側閉閥板32及泵側閉閥板33因滾 子39的旋轉而更往閥箱11的中央側移動。 因此，由於形成連通路徑35，真空處理室3及真空果4 相連通’可以真空果4對真空處理室3進行真空處理。又， 10 由於排出之氣體不會滲入閥箱11内，故可防止發生滲漏。 此處’由開閥狀態至閉閥狀態的動作中，由於真空處 理室3及真空泵4内為真空區域，且閥箱11内為低壓或大氣 壓，因此有時並無法輕易地就移動處理側開閥板29及泵側 開閥板30。即，為可順暢地移動處理室側開閥板29及泵側 15開閥板3〇 ’必須讓閥箱11内亦為真空區域，並讓閥箱η内 的壓力與真空處理室3内及真空泵4内的壓力相等。 因此，藉由讓開閉閥6為閉閥狀態且開閉閥8為開閥狀 恶’由於閥箱11内及真空處理室3内及真空泵4内之壓力相 等，故可順暢地移動處理室側開閥板29及泵側開閥板30。 20 同樣地，由閉閥狀態至開閥狀態的動作中，由於真空 處理室3内及真空泵4内之壓力與閥箱11内有壓力差，故有 時並無法輕易地就移動處理室側閉閥板32及泵側閉閥板 33。即，為可順暢地移動處理室側閉閥板32及泵側閉閥板 33，必須讓閥箱Π内之壓力與真空處理室3内之壓力及真空 17 1287075 泵4内的壓力相等。 因此，藉由讓開閉閥6、8為開閥狀態，由於閥箱11内 與真空處理室3内及真空泵4内之壓力相等，故可順暢地移 動處理室侧閉閥板32及泵側閉閥板33。 5 又，如第5圖所示，亦可於與在閉閥時進行移動的處理 室侧開闊板29及泵側開閥板30對應的前述閥箱上，形成處 理室側檢測口 42及泵側檢測口 43。蓋部44、45係可開啟及 關閉地支撐於前述檢測口 42、43。第5圖中，係例示蓋部44 ® 為關閉狀態，而蓋部45為開啟狀態。藉此，閉閥時，讓蓋 10 部44、45為開啟狀態，就可檢測附著於處理室側開閥板29 及泵側開閥板30與連通路徑35之反應生成物的堆積情況， 又，可去除反應生成物。因此，可降低維修費用及工作成 本。進而，以透明材質形成蓋部44、45時，縱或非為開啟 狀態亦可進行檢測。 15 因此，藉由前述之構成，開閥狀態中，由於可隔離閥 _ 箱11内及連通路徑35，故可防止反應生成物滲入閥箱工工 内又’藉由包含有開閥狀態所專用的開閥體28，及閉閥 狀態所使用之閉閥體31，於開閥狀態及閉閥狀態中，由於 密封面13a、14a可經常性地密封住，故可防止反應生成物 2〇 之附著。 藉L 了防止發生渗漏，且不會導致真空度降低。又， 可減少去除閱箱11内之堆積物的作業，並延長維修效果。 進 由於不會有因渗漏而產生無法閉閥之問題，潔淨前 述處理至内日可，不需停止前述泵，故不需浪費至該裝置再 18 1287075 次啟動止之時間。 管17，故不合:⑽干20產生滑動，由於箱體12内設有波形 之突起降低。—形管支承伽 桿加的滑動㈣於相對轴 開_及閉_31 ==滾輪26、27’可讓 ,〇 又上下移動變得流暢，且藉由設置滾Yu Yu, the fascinating vacuum gate valve of W fans is not intended to completely leak leakage. Therefore, the reaction product adheres not only to the sealing surface but also to the valve plate and the valve box, which not only causes a decrease in the degree of vacuum in the chamber, but also increases the burden of clean work. Further, it is assumed that there is no leakage due to leakage; when the chamber_stack is to be removed, since the chamber 4 and the real jade pump side cannot be shut off, when the device has to be temporarily stopped, the vacuum in the chamber is increased. And then start cv] 2 Therefore, the present invention is used to solve the aforementioned time and cost a lot of time. For -... different _ seal two: =: vacuum gate valve. The gate valve for the purpose of solving the above problems is to open and close the sealing surface of the 1270775 closed oppositely disposed on the fluid passage, including : the valve body is closed to the sealing surface when the valve is opened, and is used to communicate with the passage; the valve body is closed to the sealing surface when the valve is closed, and is used to cut the first 5 passages; The valve box is configured to receive the valve body and the valve body; and the valve body moving mechanism is configured to allow the valve body and the valve body to move relative to the sealing surface in the valve box. A gate valve according to a second aspect of the present invention is the valve valve according to the first aspect of the present invention, wherein the valve body and the valve closing body are provided with a pair of valve plates, and the gate valve includes a pair of valve plates for loading and unloading the pair of valve plates. The connection mechanism on the sealing surface. A gate valve according to a third aspect of the present invention is the gate valve according to the second aspect of the invention, wherein a corrugated tube is provided between one of the valve opening bodies and the valve plate. The gate valve according to the fourth aspect of the present invention is the gate valve according to the first, second or third aspect of the present invention, wherein the valve box is formed with a detection port that can be opened and closed, and the detection port is provided at the time of closing the valve. The moving valve body is positioned oppositely. A gate valve according to a fifth aspect of the present invention is the valve of the first, second, or third aspect of the invention, wherein the valve is provided with two on-off valves that open and close the valve box When the internal fluid is supplied and discharged to the valve box, and the valve is operated in the valve-open state or the valve-closed state is opened, the at least one of the opening and closing valves is opened, 7 1287075 After the end of the operation, the two open and close valves are in the closed state. A vacuum gate valve according to a sixth invention for solving the above problems is for opening and closing a communication path provided between the processing chamber side and the pump side, and includes: 5 opening the valve body, when opening the valve, borrowing When a pair of valve plates abuts on the sealing surface on the processing chamber side and the sealing surface on the pump side, the communication path is formed by the dam, and when the valve is closed, the pair of valve plates abuts against the processing chamber. a sealing surface on the side and a sealing surface on the pump side to cut off the communication path; 10 a valve box for accommodating the valve body and the valve body; a valve body moving mechanism for use in the valve box The valve body and the valve body are alternately moved relative to the sealing surface; the connecting mechanism is for attaching and detaching the valve body of the valve body and the valve body to the sealing surface; 15 corrugated pipe is provided One of the valve opening bodies is disposed between the valve plates and the inside of the valve box and the communication path; and the detecting port is formed on the valve box corresponding to the valve opening body that moves when the valve is closed. And has a cover that can be opened and closed; the process chamber side opening and closing valve, Provided in the valve casing and to communicate with the processing chamber 20 by the piping; on-off valve and a pump, provided in the system for communicating the valve casing and the pipe are both on the pump. According to the first aspect of the invention, the gate valve for opening and closing the sealing surface disposed on the fluid passage of the 8 1287075 is provided with: an open body that abuts against the sealing surface when the valve is opened, And the valve body is used for accommodating the valve body and the valve body; and the valve box is used for accommodating the valve body and the valve body; and The valve body moving mechanism is configured to allow the valve body and the valve closing body to move alternately with respect to the sealing surface in the valve casing; thereby preventing foreign matter from adhering to the sealing surface and preventing leakage. According to a second aspect of the invention, in the gate valve of the first aspect of the invention, the valve body and the valve closing body are provided with a pair of valve plates, and the gate valve includes a connection for attaching and detaching the pair of ten valve plates to the sealing surface. In this way, when the opening and closing operations are performed, since the sealing surface can be sealed, leakage can be prevented. According to a third aspect of the invention, in the gate valve of the second aspect of the present invention, a corrugated tube is disposed between the valve body and the valve plate; thereby preventing foreign matter from penetrating due to isolation of the passage and the valve box. In the aforementioned valve box, it can prevent leakage. The gate valve according to the fourth aspect of the invention is the gate valve of the first, second or third invention, wherein the valve box is formed with a detecting port that can be opened and closed, and the detecting port is provided in an open valve body that moves when the valve is closed. In this way, it is possible to detect the accumulation of foreign matter adhering to the valve body at the time of valve closing, and since 20 can remove foreign matter, maintenance cost and work cost can be reduced. The gate valve according to the fifth aspect of the invention is the gate valve of the first, second or third invention, wherein two opening and closing valves are provided for supplying and discharging the fluid in the valve box by opening and closing operations. In the valve box, when the valve opening state is operated to the valve closing state or the valve closing state is operated to the valve opening state, the opening and closing valve to the side of 9 1287075 is opened, and the operation is completed after the operation is completed. The two opening and closing valves are also in a closed state; thereby, the valve opening body and the valve closing body can be smoothly operated. The vacuum gate valve according to the sixth aspect of the invention is for opening and closing a communication path provided between the processing chamber 5 side and the pump side, and includes: opening the valve body, and opening the valve by letting a pair of valves The plate abuts against the sealing surface on the processing chamber side and the sealing surface on the pump side, and forms a communication path; and when the valve is closed, the pair of valve plates abut against the sealing surface of the processing chamber side and a sealing surface of the pump side to cut off the communication path; a valve box for accommodating the 10 open valve body and a valve closing body; and a valve body moving mechanism for releasing the valve body in the valve box and The closing mechanism is mutually movable with respect to the sealing surface; the connecting mechanism is for loading and unloading the pair of valve plates of the valve opening body and the valve closing body on the sealing surface; the corrugated tube is disposed in one of the valve opening bodies Between the valve plates, and for isolating the inside of the valve box and the communication path; the detecting port is formed on the valve box corresponding to the valve opening body that moves in 15 rows when the valve is closed, and has an openable And a closed cover; a process chamber side opening and closing valve is provided to communicate with the aforementioned valve And a pump-side opening and closing valve is provided in a pipe for connecting the inside of the valve box and the pump; thereby preventing foreign matter from adhering to the sealing surface and preventing Leakage occurs, so not 20 will cause a decrease in vacuum. Further, since the communication path and the inside of the valve box can be isolated, foreign matter can be prevented from penetrating into the valve box, and the work of removing the deposit in the valve box can be reduced, and the maintenance effect can be prolonged. Further, since there is no problem that the valve cannot be closed due to leakage, it is not necessary to stop the pump when cleaning the processing chamber, so that it is not wasted until the pump is restarted 10 1087075. Further, since the accumulation of the foreign matter adhering to the valve opening body at the time of valve closing can be detected and the foreign matter is removed, the maintenance cost and the work cost can be reduced. Further, since the valve body and the valve closing body can be smoothly moved, the operability can be improved. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing the valve opening state of a vacuum gate valve according to an embodiment of the present invention. Fig. 2 is a longitudinal sectional view for illustrating an open state of a vacuum gate valve according to an embodiment of the present invention. 10 is a cross-sectional view for illustrating a valve closing state of a vacuum gate valve according to an embodiment of the present invention. 4(a) to 4(c) are diagrams showing the operation of the vacuum gate valve according to an embodiment of the present invention, and Fig. 4(a) is a schematic view showing a closed state, and Fig. 4(b) is an illustration showing a closed valve. A schematic view of the operation from the state to the valve opening state, and Fig. 4(c) is a schematic view showing the state of the open valve. Fig. 5 is a schematic view showing a vacuum gate valve according to another embodiment of the present invention. Fig. 6 is a schematic view showing a vacuum processing apparatus according to an embodiment of the present invention. C. Embodiment I DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a vacuum gate valve of the present invention will be described in detail with reference to the drawings. 1 is a cross-sectional view for illustrating a valve opening state of a vacuum gate valve according to an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view for illustrating a valve opening of a vacuum gate valve according to an embodiment of the present invention. State, Fig. 3 is a cross-sectional view, 11 1287075 is used to illustrate the valve closing state of the vacuum gate valve according to an embodiment of the present invention, and Fig. 4 is a view showing the operation of the vacuum gate valve according to an embodiment of the present invention, (a) is a schematic view showing a closed state, a fourth (b) is a schematic view showing an operation from a closed state to a valve open state, and a fourth (c) is a schematic view showing a valve opening state. Fig. 5 is a schematic view showing a vacuum gate valve according to another embodiment of the present invention, and Fig. 6 is a schematic view showing a vacuum processing apparatus according to an embodiment of the present invention. Fig. 6 is a schematic view showing a vacuum processing apparatus 1 such as a CVD apparatus. The vacuum gate valve 2 is provided between the vacuum processing chamber 3 and the vacuum pump 4 to seal the vacuum processing chamber 3 and the vacuum pump 4. The vacuum gate valve 2 and the vacuum processing chamber 3 are connected by a pipe 5, and the pipe 5 is provided with an opening and closing valve 6. Similarly, the vacuum gate valve 2 and the vacuum pump 4 are connected by a pipe 7, and the pipe 7 is provided with an opening and closing valve 8. This vacuum shut valve 2 will be described in detail with reference to Figs. 1 to 3 . As shown in Figs. 1 to 3, the vacuum gate valve 2 is composed of a box-shaped valve box 1511 and a cylindrical case 12 disposed at the upper portion of the valve box 11. • The valve box 11 is formed with a circular processing chamber side exhaust port 13 communicating with the vacuum processing chamber 3, and a circular pump side exhaust port 14 communicating with the vacuum pump 4, and the processing chamber side row The gas port 13 and the pump side exhaust port "have a sealing surface 13a 14a. Further, a processing chamber side communication port 15 for connecting the dispenser 5 is formed below the processing chamber side exhaust port 13, and (5) the fruit side exhaust Below the port (10), a pump-side communication port 16 for connecting the pipe 7 is formed. In the button body 12, the corrugated tube 17 is extended in the vertical direction with a waveform g17, and its upper end is supported by the corrugated tube support μ. The lower end supports the m彡 tube branch tree 19. 2_ is inserted into the corrugated tube 17 12 1287075 and is arranged to penetrate the case 12. Further, the protrusion 18a of the corrugated tube support member 18 is inserted into the box body 12. The opening is formed in the elongated hole 21 and is slidable up and down. Further, a handle (moving means) 22 is provided on the upper portion of the case 12, and the screw portion 22a of the handle 22 is engaged with the screw portion 20a of the shaft 20. The lower end of the shaft 20 located in the valve box 11 is provided with a pair of valve supports 23 extending in the up and down direction. The upper and lower portions of the valve support member 23 are respectively provided with an upper roller support member 24 and a lower roller support member 25. That is, the valve support member 23 is supported by the shaft rod 20 via the upper roller support member 24. Further, the upper roller support member 24 And the lower roller fulcrum member 25 has a pair of rollers 26, 27, respectively, and the rollers 10, 27 are abutted against the inner wall of the valve box 11, and are rotatably supported. The valve support member 23 is disposed above the valve support member 23. On the other hand, a valve body 31 dedicated to the valve closing state is disposed below. The valve body 28 is a process chamber side valve plate 29 on the side of the vacuum processing chamber 3, and a vacuum pump 4 The pump side opening valve plate 3 is formed on the side of the processing chamber side opening valve plate 15 29 and the pump side opening valve plate 30, and the processing chamber side exhaust port 13 and the pump side exhaust port 14 are formed oppositely. The communication holes 29a and 30a having the same hole diameter are formed, and the sealing faces 29b and 30b which can be pressed against the sealing faces 13 & i4a are formed around the communicating holes 29a and 30a. The process chamber side opening valve plate 29 and the pump side opening valve plate are formed. Between 30, a corrugated tube 34 for connecting the communication holes 29a, 30a is provided. The through holes 29a, 30a form a communication path 35 with the corrugated tube 34. The process chamber side opening valve plate 29 and the pump side opening valve plate 30 are arranged to hold the valve support member 23 from the front and rear direction. The process chamber side opening valve plate 29 And the pump side valve opening plate 30 is supported at the upper and lower positions of the both side ends thereof by the four connecting members 36 to the valve support member 23. 13 1287075 The connecting member 36 is composed of two plates and has a joint portion 36a and a support The portion 36b is a portion where the one end of the plate member overlaps and is joined at the side end portion of the valve support member 23. The support portion 36b is such that the other end of one of the side plates is supported at the side end portion of the process chamber side opening valve plate 29, and the other end of the other side plate 5 is supported at the side end portion of the pump side valve opening plate 30. Similarly, the valve closing body 31 is constituted by the processing chamber side closing valve plate 32 on the vacuum processing chamber 3 side and the pump side closing valve plate 33 on the vacuum pump 4 side. The processing chamber side closing valve plate 32 and the pump side closing valve plate 33 are formed with sealing faces 10 32a, 33a that can be pressed against the sealing surface 13a of the processing chamber side exhaust port 13 and the sealing surface 14a of the pump side exhaust port 14. . The process chamber side shutoff valve plate 32 and the pump side shutoff valve plate 33 are disposed so as to be able to catch the valve support member 23 from the rear direction of the uranium. The process chamber side shutoff valve plate 32 and the pump side shutoff valve plate 33 are supported by the valve support member 23 by four connecting members 37 at upper and lower positions of both end portions thereof. The connecting member 37 is composed of two sheets and has a joint portion 37a and a support portion 15b. The joint portion 37a is a portion where one end of the plate member overlaps and is joined at the side end portion of the valve support member 23. In the branch portion 37b, the other end of one of the side plates is supported at the side end portion of the process chamber side shutoff valve plate 32, and the other end of the other side plate is supported at the side end portion of the pump side shutoff plate 33. Further, when the connector 36 is disposed at the position 2〇 shown in Fig. 3, the connecting portion 36 is disposed at a position above the support portion 36b. Further, when the connector 37 is placed at the position f(10) fresh, the connecting portion 37a is disposed at a position below the support portion 37b. The processing chamber side opening valve plate 29 and the pump side opening valve plate 3 are provided with tears 38 at the center of the upper end portion, and the center of the processing chamber side closing valve plate and the fruit side closing plate portion lower end 14 1287075 are set. There are rollers 39. The inner walls of the upper and lower portions of the valve box _ are formed with stoppers 40, 41 which allow the rollers 38, 39 to face each other. Soil y Next, the operation of the vacuum gate valve 2 will be described with reference to Figs. 4(8) to 4(c). First, the valve closing state will be described using Fig. 4(a). 5 The shaft 20 is moved upward by the rotary handle 22, and the valve support 23 is also moved upward. Thereby, the valve opening body 28 moves upward in the inside of the valve casing. At this time, the joint portion 36a of the link member 36 is slid by the movement of the valve support member 23, and the support portion 36b of the link member 36 is lifted while moving toward the center side of the valve box 11. Therefore, the process chamber side opening valve plate 29 and the pump side 1 which are supported by the support portion 36b are opened, and the valve plate 30 is lifted while moving toward the center side of the valve casing 11. The corrugated tube 34 is contracted by the treatment chamber side opening valve plate 29 and the pump side opening valve plate 30 moving toward the center side of the valve casing U. Further, the roller 38 abuts against the stopper 40, and the valve body 28 is disposed above the valve casing 11. Further, the valve support member 23 is moved upward, and only the connecting portion 36a is placed on the upper side of the processing chamber side opening valve plate 29 and the pump side opening valve plate 30 due to the rotation of the roller 38. • Moving toward the center side of the valve box 11 . On the other hand, the valve closing body 31 moves to a position facing the processing chamber side exhaust port 13 and the pump side exhaust port 14 as the valve support member 23 moves upward. At this time, since the joint portion 37a of the joint member 37 rises due to the movement of the valve support member 23, the support portion 37b of the link member 37 moves to the side wall side of the valve box 11, thereby being 'supported by the treatment chamber of the support portion 37b. The side closing valve plate 32 and the pump side closing plate 33' press the sealing surface 32a against the sealing surface 13a of the processing chamber side exhaust port 13 while pressing the sealing surface 33a against the sealing surface of the pump side exhaust port 14. 14a. 15 1287075 Therefore, the valve box 11 and the vacuum processing chamber 3 and the vacuum pump 4 can be cut. That is, the vacuum processing chamber 3 and the vacuum pump 4 can be sealed. Next, the operation from the closed state to the open state will be described using Fig. 4(b). 5 When the state is actuated to the valve open state, the shaft 2 is moved downward by rotating the handle 22, and the valve support 23 is moved downward. Thereby, the valve body 28 and the valve closing body 31 are also moved downward. • Further, the connecting portion 3 of the connecting member 36 is lowered by the movement of the valve support member 23, and the supporting portion 36b of the connecting member 36 is moved toward the side wall side of the valve box n while the lower port is processed to the side opening valve plate 29 and The pump side opening valve plate 3 is also lowered while moving toward the side wall side of the valve casing (10). At this time, the corrugated tube 34 is moved downward, and is twisted and pulled slowly. Further, the joint portion 3% of the joint member is lowered by the movement of the wide-branch member 23, and the milk edge of the branch portion of the joint member 37 is lowered toward the valve box (10). Therefore, the treatment chamber side is closed. The valve plate 32 and the pump-side shut-off valve 15 are also lowered while moving toward the center side of the valve box 。. Further, once the valve body 28 and the valve body 31 are moved downward, the fourth valve (c) is formed. The valve opening state is shown. Next, the valve opening state is explained using Fig. 4(c). The valve opening body 28 moves 20 to the processing chamber side exhaust port U and the pump as the valve support member 23 moves downward. The side exhaust port 14 is opposed to the position. The communication hole 29a of the side opening valve plate 29 and the communication hole 3 of the pump side opening valve plate 3 are disposed at the processing chamber side exhaust port 13 and The pump side exhaust port 14 is the same again (position). At the same time, the process chamber side opening valve plate 29 and the pump side opening valve plate 3 are moved to the side wall side of the valve box 11 by the connecting member 36, and the seal is sealed. The surface 2 is pressed against the sealing surface 13a of the processing chamber side exhaust port 13 by 16 1287075, and the sealing surface 30b is pressed against the sealing surface 14a of the pump side exhaust port 14. Further, the corrugated tube 34 On the other hand, the 'roller 39 abuts on the damming portion 41'. The valve body μ arrangement 5 is below the inside of the valve casing 11. Further, once the valve support 23 moves downward, only the joint portion When the 37a is lowered, the process chamber side shutoff valve plate 32 and the pump side shutoff valve plate 33 are moved to the center side of the valve box 11 by the rotation of the roller 39. Therefore, since the communication path 35 is formed, the vacuum processing chamber 3 and the vacuum fruit 4 are formed. In the communication, the vacuum processing chamber 3 can be vacuum-treated. Further, since the discharged gas does not penetrate into the valve box 11, leakage can be prevented. Here, the valve is opened to the closed state. In the operation, since the inside of the vacuum processing chamber 3 and the vacuum pump 4 is a vacuum region, and the inside of the valve box 11 is a low pressure or an atmospheric pressure, the processing side opening valve plate 29 and the pump side opening valve plate 30 may not be easily moved. In order to smoothly move the processing chamber side opening valve plate 29 and the pump side 15 to open the valve plate 3〇', it is necessary to make the valve box 11 also a vacuum area, and let the pressure in the valve box η and the vacuum processing chamber 3 and the vacuum pump The pressure in 4 is equal. Therefore, by letting the opening and closing valve 6 be closed Further, since the opening and closing valve 8 is in the open state, the pressure in the inside of the valve casing 11 and in the vacuum processing chamber 3 and in the vacuum pump 4 are equal, so that the processing chamber side opening valve plate 29 and the pump side opening valve plate 30 can be smoothly moved. Similarly, in the operation from the closed state to the open state, since the pressure in the vacuum processing chamber 3 and the vacuum pump 4 is different from the pressure in the valve casing 11, the process chamber side valve cannot be easily moved. The plate 32 and the pump side shutoff plate 33. That is, in order to smoothly move the process chamber side shutoff valve plate 32 and the pump side shutoff valve plate 33, it is necessary to allow the pressure in the valve case and the pressure and vacuum in the vacuum processing chamber 3 17 1287075 The pressure in pump 4 is equal. Therefore, by opening the opening and closing valves 6, 8 to the valve opening state 11, since the pressure in the inside of the vacuum chamber 3 and the vacuum pump 4 is equal in the valve casing 11, the processing chamber side closing valve plate 32 and the pump side closing can be smoothly moved. Valve plate 33. Further, as shown in Fig. 5, the processing chamber side detecting port 42 and the pump may be formed on the valve box corresponding to the processing chamber side opening plate 29 and the pump side opening valve plate 30 that are moved at the time of valve closing. Side detection port 43. The cover portions 44, 45 are supported by the aforementioned detecting ports 42, 43 in an openable and closable manner. In Fig. 5, it is exemplified that the lid portion 44 ® is in a closed state, and the lid portion 45 is in an open state. As a result, when the lids 10 and 44 are opened, the deposition of the reaction product adhering to the processing chamber side valve opening plate 29 and the pump side valve opening plate 30 and the communication path 35 can be detected. The reaction product can be removed. Therefore, maintenance costs and work costs can be reduced. Further, when the lid portions 44 and 45 are formed of a transparent material, the vertical or non-open state can be detected. Therefore, with the above-described configuration, in the valve opening state, since the inside of the valve_box 11 and the communication path 35 can be isolated, it is possible to prevent the reaction product from infiltrating into the valve box worker and to "use the valve opening state" The valve body 28 and the valve body 31 used in the closed state can prevent the reaction product 2 from being sealed because the sealing faces 13a and 14a can be constantly sealed in the valve opening state and the valve closing state. Attached. L is used to prevent leakage and does not cause a decrease in vacuum. Moreover, the work of removing the deposits in the reading box 11 can be reduced, and the maintenance effect can be prolonged. Since there is no problem that the valve cannot be closed due to leakage, the above-mentioned treatment can be stopped until the inner day is cleaned, so there is no need to waste the time until the device starts again. The tube 17 is disjointed: (10) the stem 20 is slid, and the projections having the waveform in the casing 12 are lowered. - The tube supports the gamma plus sliding (4) on the opposite axis _ and the closing _31 == the rollers 26, 27' allow the 〇 to move up and down to become smooth, and by setting the roll
10 侧辟編銘Γ讓開閥體28及閉閥體31朝閥箱11之中央側或 側壁側的移動動作變得順暢。 飞 者雖可利用把手22而移動開閥體28及閉闊體31， 但亦可為使用空氣或油壓等之氣缸。 因此依本發明之真空閘閥，其係用以開啟及關閉相 對向地設於處理室側排氣口 13及栗側排氣口 14上的密封面 13a及14a者’且包含有：開閥體“，係開閥時抵接於密封 面13a 14a’且用以連通處理室側排氣口 13及栗側排氣口 I5 14之間者，閉閥體31，係閉閥時抵接於密封面13a、…，The side movements of the valve body 28 and the valve body 31 toward the center side or the side wall side of the valve box 11 are smooth. Although the flyer can move the valve body 28 and the closed body 31 by the handle 22, it is also possible to use a cylinder such as air or oil pressure. Therefore, the vacuum gate valve according to the present invention is for opening and closing the sealing faces 13a and 14a which are disposed opposite to the process chamber side exhaust port 13 and the chest side exhaust port 14 and includes: the valve body "When the valve is opened, it abuts against the sealing surface 13a 14a' and is used to communicate between the processing chamber side exhaust port 13 and the chest side exhaust port I5 14 . The valve closing body 31 abuts the seal when the valve is closed. Face 13a,...,
且用以切斷處理室側排氣口 13及㈣排氣口 14之間者；閱 箱11 ’係用以收納開閥體28及閉閥體31者；及把手22，係 用以於閥箱11内讓開閥體28及閉閥體31相對於密封面 13a、14a而交互移動者；藉此，可防止反應生成物附著於 2〇 岔封面、14a ’並可防止發生渗漏。 又，開閥體28設有處理室側開閥板29及泵側開閥板 30，同時閉閥體31設有處理室側閉閥板32及泵側閉閥板 33，又，該真空閘閥具有連接件36、37，該等連接件36、 37係用以將處理室側開閥板29之密封面29b及泵側開閥板 19 1287075 30之密封面30b，或處理室側閉閥板32之密封面32a及泵側 閉閥板33之密封面33a裝卸於密封面13a及密封面14& ;藉 此’由於開啟或關閉時可密封住密封面13a、14a，故可防 止發生滲漏。 5 又，藉由在處理室側開閥板29及泵側開閥板30之間設 一波形管34,由於可隔離連通路徑35及閥箱11内，故可防 土反應生成物滲入閥箱11内，並可防止發生滲漏。 又，於閥箱11形成具有可開啟及關閉之蓋部44、45的 檢測口 42、43，並藉由將該等檢測口 42、43設於與在閉閥 10 時進行移動的處理室側開閥板29及泵側開閥板30相對向的 位置上，而可檢測閉閥時附著於處理室側開閥板29及泵側 開閥板30與連通路徑35的反應生成物之堆積情況，又，由 於可輕易地去除反應生成物，故可降低維修費用及工作成 本。 15 進而，由開閥狀態操作為閉閥狀態或由閉閥狀態操作 為開閥狀態時，至少令開閉閥6、8其中一者為開啟狀態， 且操作結束後令開閉閥6、8同為關閉狀態，藉此，由於可 讓閥箱11内與真空處理室3内或真空泵4内的壓力相等，故 可順暢地操作開閥板29、30及閉閥板32、33。 20產業上之可利用性 本發明可適用於具有二個閥體，即開閥狀態所使用的 閥體，以及閉闕狀態所使用的閥體之真空閘閥。 【圖式簡單説明】 第1圖係一橫截面圖，用以例示本發明一實施態樣之真 20 1287075 空閘閥的開閥狀態。 第2圖係一縱截面圖，用以例示本發明一實施態樣之真 空閘閥的開閥狀態。 第3圖係一橫截面圖，用以例示本發明一實施態樣之真 5 空閘閥的閉閥狀態。 第4圖係例示本發明一實施態樣之真空閘閥的動作，第 4(a)圖係例示閉閥狀態的概略圖，第4(b)圖係例示由閉閥狀 態至開閥狀態之動作的概略圖，第4(c)圖係例示開閥狀態的 概略圖。 10 第5圖係本發明其他實施態樣之真空閘閥的概略圖。 第6圖係本發明一實施態樣之真空處理裝置的概略圖。 【主要元件符號說明】 1…真空處理裝置 14...泵側排氣口 2··.真空閘閥 14a...密封面 3···真空處理室 15...處理室側連通口 4...真空泵 16...泵側連通口 5...配管 17...波形管 6...開閉閥 18:..波形管支承件 7.··配管 18a...突起部 8...開閉閥 19...波形管支承件 11…閥箱 20...軸桿 12…箱體 20a...螺絲部 13...處理室側排氣口 21...長形孔 13a...密封面 22...把手 21 1287075 22a...螺絲部 34...波形管 23...閥支撐件 35...連通路徑 24...上部滾輪支撐件 36...連接件 25...下部滾輪支撐件 36a...連結部 26...滾輪 36b...支撐部 27…滾輪 37...連接件 28…開閥體 37a...連結部 29...處理室側開閥板 37b...支撐部 29a...連通孔 38...滾子 29b...密封面 39...滾子 30...泵側開閥板 40...擋止部 30a...連通孔 41...擋止部 30b...密封面 42...處理室側檢測口 31…閉閥體 43...泵側檢測口 32...處理室側閉閥板 44··.蓋部 32a...密封面 33...泵側閉閥板 33a...密封面 45...蓋部 22And used to cut between the processing chamber side exhaust port 13 and (4) the exhaust port 14; the reading box 11' is for housing the valve body 28 and the valve closing body 31; and the handle 22 is for the valve In the tank 11, the valve body 28 and the valve closing body 31 are alternately moved with respect to the sealing faces 13a and 14a; thereby preventing the reaction product from adhering to the cover 2a, 14a' and preventing leakage. Further, the valve opening body 28 is provided with a treatment chamber side valve opening plate 29 and a pump side valve opening plate 30, and the valve closing body 31 is provided with a treatment chamber side valve closing plate 32 and a pump side valve closing plate 33, and the vacuum gate valve is further provided. There are connecting members 36, 37 for sealing the sealing surface 29b of the processing chamber side opening valve plate 29 and the sealing surface 30b of the pump side opening valve plate 19 1287075 30, or the processing chamber side closing valve plate The sealing surface 32a of the sealing surface 32a of 32 and the sealing surface 33a of the pump side closing valve plate 33 are attached to and detached from the sealing surface 13a and the sealing surface 14&; thereby preventing leakage due to sealing of the sealing faces 13a, 14a when opened or closed . Further, by providing a corrugated tube 34 between the process chamber side opening valve plate 29 and the pump side opening valve plate 30, since the communication path 35 and the valve box 11 can be isolated, the soil reaction product can be infiltrated into the valve box. 11 and can prevent leakage. Further, detection ports 42, 43 having opening and closing cover portions 44, 45 are formed in the valve casing 11, and the detection ports 42, 43 are provided on the processing chamber side which is moved when the valve 10 is closed. The valve plate 29 and the pump side valve opening plate 30 are opposed to each other, and the accumulation of reaction products adhering to the process chamber side valve opening plate 29 and the pump side valve opening plate 30 and the communication path 35 at the time of valve closing can be detected. Moreover, since the reaction product can be easily removed, the maintenance cost and the work cost can be reduced. 15 Further, when the valve-opening state is operated to the valve-closed state or the valve-closed state is the valve-opening state, at least one of the opening and closing valves 6 and 8 is opened, and the opening and closing valves 6, 8 are the same after the operation is completed. In the closed state, since the pressure inside the vacuum chamber 3 or the vacuum pump 4 can be made equal to the inside of the valve box 11, the valve opening plates 29, 30 and the valve closing plates 32, 33 can be smoothly operated. [Industrial Applicability] The present invention is applicable to a valve body having two valve bodies, that is, a valve body used in an open state, and a vacuum gate valve of a valve body used in a closed state. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view for illustrating the valve opening state of the true 20 1287075 air gate valve according to an embodiment of the present invention. Fig. 2 is a longitudinal sectional view for illustrating an open state of a vacuum gate valve according to an embodiment of the present invention. Fig. 3 is a cross-sectional view for illustrating a closed state of a true 5 air gate valve according to an embodiment of the present invention. Fig. 4 is a view showing an operation of a vacuum gate valve according to an embodiment of the present invention, and Fig. 4(a) is a schematic view showing a closed state, and Fig. 4(b) is a view showing an operation from a closed state to a valve open state. The schematic view of Fig. 4(c) is a schematic view showing the state of the valve opening. 10 Fig. 5 is a schematic view showing a vacuum gate valve according to another embodiment of the present invention. Fig. 6 is a schematic view showing a vacuum processing apparatus according to an embodiment of the present invention. [Description of main component symbols] 1...vacuum processing device 14...pump side exhaust port 2·..vacuum gate valve 14a...sealing surface 3···vacuum processing chamber 15...processing chamber side communication port 4. .. vacuum pump 16 ... pump side communication port 5 ... piping 17 ... corrugated tube 6 ... opening and closing valve 18 : .. corrugated tube support 7 ... · piping 18a ... protrusion 8 .. Opening and closing valve 19... corrugated tube support 11... valve box 20... shaft 12... housing 20a... screw portion 13... processing chamber side exhaust port 21... elongated hole 13a. .. sealing surface 22...handle 21 1287075 22a...screw portion 34...wave tube 23...valve support 35...communication path 24...upper roller support 36...connecting piece 25...lower roller support 36a...coupling portion 26...roller 36b...support portion 27...roller 37...connector 28...opening body 37a...connecting portion 29...handling The chamber side opening valve plate 37b...the support portion 29a...the communication hole 38...the roller 29b...the sealing surface 39...the roller 30...the pump side opening valve plate 40...stops Portion 30a...communication hole 41...stop portion 30b...sealing surface 42...processing chamber side detecting port 31...closed valve body 43...pump side detecting port 32...processing chamber side closing Valve plate 44·· Cover portion 32a... sealing surface 33... pump side closing valve plate 33a... sealing surface 45... cover portion 22