KR102396369B1 - Substrate processing apparatus - Google Patents

Abstract

The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus in which exposure to outside air is blocked.
The present invention comprises: a process chamber (10) forming a closed processing space and performing substrate processing; a housing 100 forming at least two or more independent inner spaces including a process chamber installation space S1 in which the process chamber 10 is installed; and an exhaust unit 200 provided in communication with the exhaust pump in the housing 100 so that the harmful gas is exhausted through an exhaust pump provided outside the housing 100, the housing 100 comprising: In order to exhaust the harmful gas in the independent internal spaces through the exhaust unit 200, an exhaust frame in which an exhaust flow path for delivering the harmful gas from the internal spaces to the exhaust unit 200 is formed therein. a plurality of frames 110 including at least one 130 and coupled to each other to be installed; Disclosed is a substrate processing apparatus including a plurality of plates 120 coupled to the frames 110 so as to form a plurality of the inner spaces blocked from the outside.

Description

Substrate processing apparatus

The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus that prevents leakage of harmful gases to the outside and facilitates exhaust of harmful gases.

In order to perform a substrate treatment such as etching or deposition on a substrate, various gases for processing or cleaning are supplied into the process chamber of the substrate processing apparatus, thereby injuring the human body not only in the process chamber but also in various installations constituting the substrate processing apparatus. Noxious gases may remain in the substrate, and some of the noxious gases may leak out of the substrate processing apparatus.

In particular, in the case of the conventional substrate processing apparatus, the gas supplied into the process chamber or the harmful gas generated during the process has a complex structure inside the substrate processing apparatus in which a plurality of internal spaces are formed, so that the internal exhaust system operates smoothly There is a problem in that the harmful gas remains in the internal space as it is not.

In addition, in the case of the conventional substrate processing apparatus, there is a problem in that the toxic gas generated in the process is leaked to the outside as the housing constituting the substrate processing apparatus does not achieve complete sealing.

In the above case, the harmful gas inside the substrate processing apparatus leaks to the outside, or in the case of insufficient purge gas in the operation process for maintenance and repair of the substrate processing apparatus, the reaction between the residual powder and the atmosphere, and the internal residual of harmful gas. Noxious gas is exposed to the outside by opening a door, which can have a fatal adverse effect on the worker, so there is a problem in that the life of the worker and the stability of the device cannot be guaranteed.

SUMMARY OF THE INVENTION An object of the present invention is to prevent exposure of harmful gases generated in the process of substrate processing to the outside of a substrate processing apparatus performing substrate processing in order to solve the above problems, and to remove harmful gases from a plurality of internal spaces. An object of the present invention is to provide a substrate processing apparatus capable of stably evacuating without affecting the internal space.

The present invention was created to achieve the object of the present invention as described above, and the present invention comprises: a process chamber 10 for forming a closed processing space and performing substrate processing; a housing 100 forming at least two or more independent inner spaces including a process chamber installation space S1 in which the process chamber 10 is installed; and an exhaust unit 200 provided in communication with the exhaust pump in the housing 100 so that the harmful gas is exhausted through an exhaust pump provided outside the housing 100, the housing 100 comprising: In order to exhaust the harmful gas in the independent internal spaces through the exhaust unit 200 , an exhaust frame in which an exhaust flow path for delivering the harmful gas from the internal spaces to the exhaust unit 200 is formed therein. a plurality of frames 110 including at least one 130 and coupled to each other to be installed; Disclosed is a substrate processing apparatus including a plurality of plates 120 coupled to the frames 110 so as to form a plurality of the inner spaces blocked from the outside.

The housing 100, in order to prevent the harmful gas in the inner spaces from leaking to the outside, the inner spaces may form a lower negative pressure than the outside.

The housing 100 includes a gas supply unit installation space S2 in which a gas supply unit 20 for intermittent supply of a process gas for substrate processing from a lower portion of the process chamber 10 to the process chamber 10 is installed. It may be formed at the lower end of the process chamber installation space (S1).

The housing 100 includes the exhaust frame 130 to exhaust the harmful gas in the process chamber installation space S1 and the gas supply unit installation space S2 through the exhaust unit 200 . It communicates with the process chamber installation space S1 and the gas supply unit installation space S2 through the exhaust space S3, in which the exhaust unit 200 is installed, at the upper end of the process chamber installation space S1. can be formed.

The exhaust frame 130 is installed parallel to the ground between the process chamber installation space S1 and the exhaust space S3, and the exhaust part 200 of the harmful gas in the process chamber installation space S1. ), a horizontal exhaust frame 131 in which a first exhaust passage 132 is formed so that the process chamber installation space S1 and the exhaust space S3 communicate with each other for exhaust through, and vertically installed on the ground. , in order to exhaust the harmful gas in the gas supply unit installation space S2 through the exhaust unit 200, the gas supply unit installation space S2 and the exhaust space S3 communicate with the second inside. It may include a vertical exhaust frame 140 in which the exhaust passage 141 is formed.

The horizontal exhaust frame 131 includes the gas supply unit installation space S2 and the exhaust space S3 for exhausting the harmful gas in the gas supply unit installation space S2 through the exhaust unit 200 . ), a third exhaust passage 135 connected to the second exhaust passage 141 may be additionally formed therein.

The first exhaust passage 132 and the third exhaust passage 135 are formed to be separated from each other so that the process chamber installation space S1 and the gas supply unit installation space S2 are separated from the exhaust space S3 and the gas supply unit installation space S2. Each may be independently communicated.

The exhaust unit 200 includes the horizontal exhaust frame ( A first exhaust pipe 201 coupled to the first exhaust flow path 132 in communication with the 131, and a second exhaust pipe 202 coupled to the horizontal exhaust frame 131 in communication with the third exhaust flow path 135 ) may be included.

The housing 100 has a control unit installation space S4 in which a control unit 30 for controlling the process chamber 10 and the gas supply unit 20 is installed adjacent to the exhaust space S3. is formed, and the exhaust frame 130 is installed between the control unit installation space S4 and the exhaust space S3, and the exhaust part 200 of the harmful gas in the control unit installation space S4. It may include the control unit exhaust frame 150 in which an exhaust flow path is formed so that the control unit installation space S4 and the exhaust space S3 communicate with each other for exhaust through the .

The housing 100 includes a gas source unit installation space S5 in which a gas source unit 40 for supplying the process gas injected for substrate processing in the process chamber 10 is installed is formed in the exhaust space ( It is formed adjacent to S3), and the exhaust frame 130 is installed between the gas source installation space S5 and the exhaust space S3, and the harmful gas in the gas source installation space S5. Includes the gas source unit exhaust frame 160 in which an exhaust passage is formed so that the gas source installation space S5 and the exhaust space S3 communicate with each other for exhaust through the exhaust 200 can do.

In order to detect the harmful gas, one or more gas detection sensors 300 installed inside the housing 100 may be further included.

Whether the door 121 of the housing 100 can be unlocked may be determined based on whether the gas detection sensor 300 detects the harmful gas.

The substrate processing apparatus according to the present invention has an advantage in that a process chamber is installed inside a housing and a negative pressure is formed inside the housing, thereby preventing harmful gases in the substrate processing apparatus from leaking to the outside.

In the substrate processing apparatus according to the present invention, a plurality of independent internal spaces are formed inside a housing, and harmful gases present in each internal space are exhausted without affecting other internal spaces through a relatively simple exhaust structure using a frame. This has the advantage of being able to implement a safe and efficient exhaust system.

In particular, the substrate processing apparatus according to the present invention has a structure in which exposure to outside air of installations installed inside the substrate processing apparatus is blocked, and the movement of gas is blocked between a plurality of independent internal spaces, thereby maintaining a specific space , there is an advantage in that it can prevent damage to workers due to harmful gas during maintenance.

In addition, the substrate processing apparatus according to the present invention, by having a gas detector inside, grasps quantitative values and types of gases present in the internal space, and utilizes them to determine when maintenance and repair of the substrate processing apparatus is possible. There are advantages that can be

Furthermore, in the substrate processing apparatus according to the present invention, the door of the substrate processing apparatus is controlled so that the door of the substrate processing apparatus is not opened when harmful gas is detected by interlocking the gas detector installed therein with opening and closing the door of the substrate processing apparatus. There is an advantage in that unexpected accidents can be prevented in advance.

1 is a perspective view showing a state of a substrate processing apparatus according to the present invention.
FIG. 2 is a front view of the substrate processing apparatus of FIG. 1 in a state in which the plate is removed.
FIG. 3 is a partial cross-sectional view illustrating the substrate processing apparatus and the process chamber of FIG. 1 .
FIG. 4 is a perspective view illustrating a combined installation state of frames of the substrate processing apparatus of FIG. 1 .
5 is a partial cross-sectional view in a V-V direction showing an exhaust structure of the substrate processing apparatus of FIG. 4 .
FIG. 6 is a partial perspective view of the substrate processing apparatus of FIG. 1 in a state in which a part of a ceiling plate is removed, showing an upper space.
7 is a partial perspective view showing the appearance of the upper space according to another embodiment of the present invention in a state in which a part of the plate of the ceiling is removed.

Hereinafter, a substrate processing apparatus according to the present invention will be described with reference to the accompanying drawings.

As shown in FIG. 2, a substrate processing apparatus according to the present invention comprises: a process chamber 10 forming a closed processing space and performing substrate processing; a gas supply unit 20 installed under the process chamber 10 to control supply of process gas for substrate processing to the process chamber 10; Including a process chamber installation space (S1) in which the process chamber (10) is installed, and a gas supply unit installation space (S2) in which the gas supply unit (20) is installed at the lower end of the process chamber installation space (S1) a housing 100 forming at least two or more independent inner spaces; and an exhaust unit 200 provided in communication with the exhaust pump in the housing 100 so as to exhaust harmful gases from the internal spaces through an exhaust pump provided outside the housing 100 , and the housing 100 ), in order to exhaust the harmful gas in the independent internal spaces through the exhaust unit 200, an exhaust flow path for delivering the harmful gas from the internal spaces to the exhaust unit 200 is formed therein. a plurality of frames 110 including one or more exhaust frames 130 to be installed and coupled to each other; A plurality of plates 120 coupled to the frames 110 are included so that the internal spaces blocked from the outside are formed.

The substrate to be treated of the present invention is a configuration in which substrate processing such as deposition and etching is performed, and any substrate such as a semiconductor manufacturing substrate, LCD manufacturing substrate, OLED manufacturing substrate, solar cell manufacturing substrate, and transparent glass substrate is possible.

The process chamber 10 forms a closed processing space and performs substrate processing, and various configurations are possible.

For example, the process chamber 10 is detachably coupled to the chamber body 11 having an opening on the upper side and the opening of the chamber body 11 to form a closed processing space together with the chamber body 11 . It may be configured to include an upper lead (12).

In addition, the process chamber 10 may be provided with a substrate support unit 13 for supporting a substrate therein, and any conventionally disclosed embodiment can be applied as long as a processing space for processing the substrate is formed therein. A detailed description of the bar will be omitted.

The housing 100 is configured to form at least two or more independent internal spaces including the process chamber installation space S1 in which the process chamber 10 is installed, and various configurations are possible.

For example, the housing 100 has an exhaust flow path for delivering the harmful gas from the internal spaces to the exhaust unit 200 side in order to exhaust the harmful gas in the independent internal spaces through the exhaust unit 200 . A plurality of frames 110 including one or more exhaust frames 130 formed in the frame and are coupled to each other to be installed; A plurality of plates 120 coupled to the frames 110 may be included to form internal spaces that are blocked from the outside.

In the housing 100, the process chamber 10 is installed in the inner space, and further, the apparatus for performing the substrate processing process is installed therein, so that the gas used and generated in the process of performing various processes including harmful gases is stored. External leakage can be prevented.

In particular, the housing 100 is configured to form a negative pressure in the inner space in which the process chamber 10 is installed, thereby preventing the harmful gas in the inner space from leaking to the outside, and various configurations are possible.

For example, in the housing 100 , a pressure reducing member may be installed in the inner space in order to form a constant negative pressure in the inner space in which the process chamber 10 is installed, and the inner space is evacuated by using the exhaust through the pressure reducing member. It can be maintained at negative pressure.

In this case, the pressure of the internal space can be adjusted by controlling the amount of exhaust through the pressure reducing member, and by maintaining the internal space at a negative pressure based on the pressure state of the clean room in which the substrate processing apparatus is installed, various External leakage of harmful gas can be prevented.

As shown in FIG. 2 , the housing 100 is provided with a gas supply unit 20 that controls the supply of process gas for substrate processing from the lower part of the process chamber 10 to the process chamber 10 . The unit installation space (S2) may be formed at the lower end of the process chamber installation space (S1).

As shown in FIG. 2, the housing 100 is an exhaust frame ( 130) communicates with the process chamber installation space S1 and the gas supply unit installation space S2, respectively, and the exhaust space S3 in which the exhaust unit 200 is installed is formed at the upper end of the process chamber installation space S1 can be

In addition, as shown in FIG. 2 , the housing 100 includes a control unit installation space S4 in which a control unit 30 for controlling the process chamber 10 and the gas supply unit 20 is installed. It may be formed adjacent to the exhaust space S3, and further, the housing 100 is provided with a gas source unit 40 for supplying a process gas injected for substrate processing in the process chamber 10 is installed. A gas source unit installation space (S5) to be used may be formed adjacent to the exhaust space (S3).

As an example, the process chamber installation space S1 is, as shown in FIG. 3 , a space formed in the center of the three-stage structure of the housing 100 , in which the process chamber 10 may be installed. .

At this time, the process chamber installation space ( S1 ) includes a gas supply unit installation space ( S2 ) and an exhaust space ( S3 ) in order to prevent movement of gas between the gas supply unit installation space ( S2 ) and the exhaust space ( S3 ). and may be formed separately.

The gas supply unit installation space (S2) is a space formed at the lower end of the process chamber installation space (S1) formed in the center in the inner space of the three-stage structure of the housing 100, the process chamber (10) It is installed in the lower part to exhaust not only the gas supply unit 20 that regulates the supply of the process gas for substrate processing to the process chamber 10 , but also the process gas and reaction gas injected into the processing space in the process chamber 10 . For this purpose, an exhaust line communicating with the process chamber 10 and a pump may be additionally installed.

In addition, in the gas supply unit installation space S2, a vertical drive unit for a substrate support unit for driving the substrate support unit 13 for supporting the substrate 10 in the process chamber 10 up and down may be installed, the process A vertical drive unit and a rotation drive unit for vertically moving and rotating the substrate transfer unit for transferring the substrate 10 in the chamber 10 may be additionally installed.

The exhaust space (S3) is a space formed at the upper end of the process chamber installation space (S1) formed in the center in the inner space of the three-stage structure of the housing 100, and the upper lid ( 12) may be provided with a vertical drive unit for moving up and down.

In addition, the exhaust space (S3), the process chamber through the exhaust frame 130 to exhaust the harmful gas in the process chamber installation space (S1) and the gas supply unit installation space (S2) through the exhaust unit 200, It communicates with the installation space S1 and the gas supply unit installation space S2, respectively, and the exhaust unit 200 may be installed.

That is, in order to exhaust harmful gases in the process chamber installation space (S1) and the gas supply unit installation space (S2) through the exhaust unit 200, the process chamber installation space (S1) and the gas supply unit installation space (S2) It may communicate with the exhaust space (S3).

The control unit installation space S4 is a space in which the control unit 30 for controlling the process chamber 10 and the gas supply unit 20 is installed, and may be formed adjacent to the exhaust space S3 .

The gas source unit installation space S5 is a space in which the gas source unit 40 for supplying the process gas injected for substrate processing is installed in the process chamber 10, and is adjacent to the exhaust space S3. can be formed.

For example, the control unit installation space S4 and the gas source installation space S5 are installed at the upper end of the process chamber installation space S1, and are adjacent to each other on both sides based on the exhaust space S3. can be formed.

In this case, the plurality of frames 110 and the plurality of plates 120 are provided so that the exhaust space S3, the control unit installation space S4, and the gas source part installation space S5 are formed separately from each other. They can be installed in combination with each other.

As shown in FIG. 4 , the plurality of frames 110 deliver harmful gases from the internal spaces to the exhaust unit 200 to exhaust the harmful gases in the independent internal spaces through the exhaust unit 200 . As a configuration including at least one exhaust frame 130 in which an exhaust flow path is formed therein, various configurations are possible.

For example, the plurality of frames 110 are coupled to each other and installed to form the structure of the housing 100 , a plurality of vertical frames installed perpendicular to the ground and a plurality of horizontal frames installed parallel to the ground. Including, in order to form a plurality of internal spaces in a state in which at least three or more vertical frames are installed, the horizontal frames may be installed by being coupled to the vertical frames parallel to the ground.

The plurality of plates 120 are coupled to the frames 110 to form internal spaces that are blocked from the outside, and various configurations are possible.

For example, the plurality of plates 120 are attached to the frames 110 so that the process chamber installation space S1, the gas supply unit installation space S2, and the exhaust space S3 are formed independently from the outside. By being combined, the housing 100 may be configured together with the plurality of frames 110 .

That is, the plurality of plates 120 form the side wall and upper and lower surfaces of the housing 100, and may further be configured as the door 121 of each space, the process chamber installation space S1, the gas supply unit installation space (S2) and the exhaust space (S3) are installed inside the housing 100 so that the internal spaces can be independently formed inside the housing 100, so that the respective internal spaces can be formed separately.

In addition, the plurality of plates 120 are of the housing 100 so that the inner space is not exposed to the outside for maintenance and repair of the facilities in the inner space of the housing 100 , and work on the facilities in the inner space is possible. A working glove 122 may be additionally installed on the plate 120 constituting the side wall.

On the other hand, the process gas inside the process chamber 10 due to the exhaust line and the vertical drive unit installed in the gas supply unit installation space S2 through the lower surface of the process chamber 10 installed in the process chamber installation space (S1) And there may be a problem in that the reaction gas or the like leaks into the gas supply unit installation space ( S2 ) or the harmful gas in the gas supply unit installation space ( S2 ) leaks into the process chamber ( 10 ).

In this case, in order to prevent leakage of the process gas injected into the process chamber 10 for substrate processing into the gas supply unit installation space S2, the process chamber installation space S1 and the gas supply unit installation space (S1) A blocking member may be additionally installed between S2).

The blocking member may be installed in close contact with the bottom surface of the process chamber 10 to prevent gas movement between the process chamber 10 and the gas supply unit installation space S2.

The blocking member may be installed instead of the plate 120 installed between the process chamber installation space S1 and the gas supply unit installation space S2, and the process chamber installation space S1 and the gas supply unit installation space Of course, it can also be installed on the upper surface of the plate 120 installed between (S2).

The blocking member may be installed to be coupled to a vertical frame or a horizontal frame, and an elastic member made of an elastic material may be installed at a coupling portion of the vertical frame or the horizontal frame in consideration of a change in length according to an external temperature change.

Furthermore, the blocking member may be installed so that the coupling portion of the vertical frame or the horizontal frame is movable up and down in consideration of the length change according to the external temperature change.

The exhaust frame 130 is, as shown in FIGS. 5 and 6, an exhaust flow path for delivering harmful gas from the internal spaces of the housing 100 to the exhaust unit 200 side is formed therein, Various configurations are possible.

The exhaust frame 130 is not only configured for delivery of harmful gases, but also constitutes the housing 100 by combining with the plurality of frames 110 and the plurality of plates 120 .

For example, the exhaust frame 130 has an exhaust passage formed therein so that the process chamber installation space S1 and the gas supply unit installation space S2 communicate with the exhaust space S3, respectively. It is installed parallel to the ground between the chamber installation space (S1) and the exhaust space (S3), and for exhaust through the exhaust unit 200 of harmful gas in the process chamber installation space (S1), the process chamber installation space (S1) and An exhaust part ( 200), a vertical exhaust frame 140 having a second exhaust passage 141 formed therein so that the gas supply unit installation space S2 and the exhaust space S3 communicate with each other may be included.

In addition, the exhaust frame 130 is installed between the control unit installation space (S4) and the exhaust space (S3), and the control unit for exhausting harmful gases in the control unit installation space (S4) through the exhaust unit (200). The installation space S4 and the exhaust space S3 may include a control unit exhaust frame 150 in which an exhaust flow path is formed to communicate with each other.

Furthermore, the exhaust frame 130 is installed between the gas source installation space S5 and the exhaust space S3, and exhausts harmful gases in the gas source installation space S5 through the exhaust 200. For this purpose, it may include a gas source unit exhaust frame 160 in which an exhaust flow path is formed so that the gas source installation space S5 and the exhaust space S3 communicate with each other.

The horizontal exhaust frame 131 is a frame installed parallel to the ground between the process chamber installation space S1 and the exhaust space S3, and is formed with one or more first suction ports toward the process chamber installation space S1 ( 133), one or more first outlets 134 formed toward the exhaust space S3, and the first inlet 133 and the first outlet 134 are connected by connecting the process chamber installation space S1 and the exhaust space A first exhaust passage 132 through which ( S3 ) communicates may be formed.

In this case, the first exhaust passage 132 is a groove formed inside the horizontal exhaust frame 131 , and includes a first suction port 133 and a first exhaust port 134 along the longitudinal direction of the horizontal exhaust frame 131 . ) may be formed to be connected, and more preferably, the process chamber installation space S1 and the exhaust space S3 may be formed to communicate with each other by the shortest distance.

The vertical exhaust frame 140 is a frame vertically installed on the ground between the gas supply unit installation space S2 and the exhaust space S3, and is formed toward the gas supply unit installation space S2. By connecting the inlet 142, the second outlet 143 formed at least one toward the exhaust space S3, and the second inlet 142 and the second outlet 143, the gas supply unit installation space S2 A second exhaust passage 141 may be formed so that the exhaust space S3 communicates with the second exhaust passage 141 .

In this case, the second exhaust passage 141 is a groove formed inside the vertical exhaust frame 140 , and includes a second suction port 142 and a second exhaust port 143 along the longitudinal direction of the vertical exhaust frame 140 . ) may be formed to be connected.

As another example, the horizontal exhaust frame 131 includes a gas supply unit installation space S2 and an exhaust space S3 for exhausting harmful gases in the gas supply unit installation space S2 through the exhaust unit 200 . A third exhaust flow path 135 connected to the second exhaust flow path 141 may be additionally formed therein so as to communicate with each other, thereby supplying gas through the second exhaust flow path 141 and the third exhaust flow path 135 . Noxious gas in the unit installation space (S2) may move to the exhaust space (S3).

On the other hand, since the first exhaust passage 132 and the third exhaust passage 135 are formed to be separated from each other, the process chamber installation space S1 and the gas supply unit installation space S2 are each independently of the exhaust space S3. can be communicated.

That is, the process chamber installation space S1 and the gas supply unit installation space S2 may each independently communicate with the exhaust space S3, and more specifically, the process chamber installation space S1 and the exhaust space. (S3) is communicated, the gas supply unit installation space (S2) and the exhaust space (S3) are communicated, and the process chamber installation space (S1) and the gas supply unit installation space (S2) are independent without communicating with each other .

At this time, it goes without saying that the second exhaust passage 141 is connected to the first exhaust passage 132 so that the harmful gas in the gas supply unit installation space S2 can move to the exhaust space S3 .

The control unit exhaust frame 150 is installed between the control unit installation space S4 and the exhaust space S3, and controls for exhausting harmful gases in the control unit installation space S4 through the exhaust unit 200 As a configuration in which an exhaust flow path is formed inside the unit installation space (S4) and the exhaust space (S3) to communicate with each other, various configurations are possible.

The control unit exhaust frame 150 has an intake port for inhaling harmful gases on the control unit installation space S4 side, and an exhaust port 152 for discharging harmful gases toward the exhaust space S3 is formed. , an exhaust passage may be formed so that the inlet and the outlet 152 communicate with each other.

The control unit exhaust frame 150 may have an exhaust flow path formed therein in the longitudinal direction, but more preferably, the exhaust flow path is formed to be the shortest distance between the control unit installation space S4 and the exhaust space S3. can be formed.

The gas source part exhaust frame 160 is installed between the gas source part installation space S5 and the exhaust space S3, and exhausts harmful gases in the gas source part installation space S5 through the exhaust part 200. As a configuration in which an exhaust flow path is formed therein so that the gas source installation space S5 and the exhaust space S3 communicate with each other for this purpose, various configurations are possible.

The gas source unit exhaust frame 160, like the control unit exhaust frame 150, has an inlet for inhaling harmful gas on the gas source unit installation space S5 side, and is harmful toward the exhaust space S3. An exhaust port 162 for discharging gas may be formed, and an exhaust flow path may be formed so that the intake port and the discharge port 162 communicate with each other.

The gas source part exhaust frame 160 may have an exhaust flow path formed therein in the longitudinal direction, but more preferably, exhaust the gas so as to be formed in the shortest distance between the gas source part installation space S5 and the exhaust space S3. A flow path may be formed.

The exhaust unit 200 is provided in communication with the exhaust pump in the housing 100 so that harmful gases in internal spaces are exhausted through the exhaust pump provided outside the housing 100 , and various configurations are possible.

The exhaust unit 200 may exhaust noxious gas transferred from the inner spaces of the housing 100 to the upper space S3 through an exhaust pump provided outside, and a process chamber through the exhaust frame 130 . Noxious gas transferred from the installation space S1, the gas supply unit installation space S2, the control unit installation space S4, and the gas source installation space S5 to the exhaust space S3 may be exhausted to the outside.

For example, the exhaust unit 200 is installed on the plate 120 corresponding to the ceiling of the housing 100 and communicates with an external exhaust pump, and includes a process chamber installation space S1 and a gas supply unit. Any type of exhaust port disclosed in the prior art is applicable as long as it is configured to exhaust the harmful gas delivered from the installation space S2, the control unit installation space S4, and the gas source installation space S5 to the outside.

Meanwhile, as shown in FIG. 7 , the exhaust unit 200 includes a process chamber installation space S1 , a gas supply unit installation space S2 , a control unit installation space S4 , and a gas source installation space S5 . ) may include a plurality of exhaust pipes communicating with each of the internal spaces so that the harmful gas delivered through the exhaust frame 130 is directly transmitted from the exhaust frame 130 .

For example, the first exhaust flow path ( It may include a first exhaust pipe 201 coupled in communication with the 132 , and a second exhaust pipe 202 coupled to the horizontal exhaust frame 131 in communication with the third exhaust passage 135 .

The first exhaust pipe 201 is, in order to directly deliver the harmful gas in the process chamber installation space S1 delivered through the first exhaust passage 132 formed in the horizontal exhaust frame 131 to the exhaust unit 200 . , coupled to the first outlet 134 may be configured to be directly connected to the first exhaust passage 132 .

The second exhaust pipe 202, similarly to the first exhaust pipe 201, discharges harmful gas in the gas supply unit installation space S2 delivered through the third exhaust passage 135 formed in the horizontal exhaust frame 131. In order to directly transmit to the exhaust unit 200 , it may be coupled to the second exhaust port 143 and directly connected to the third exhaust passage 135 .

On the other hand, the exhaust unit 200 is a third exhaust pipe coupled to the control unit exhaust frame 150 so that the harmful gas delivered from the control unit installation space S4 through the control unit exhaust frame 150 is directly transmitted ( 203) and a fourth exhaust pipe 204 coupled to the gas source sub-exhaust frame 160 so that the harmful gas delivered from the gas source sub-installation space S5 through the gas source sub-exhaust frame 160 is directly transmitted. may include

The third exhaust pipe 203 and the fourth exhaust pipe 204 are respectively provided at the outlet 152 formed in the control unit exhaust frame 150 and the outlet 162 formed in the gas source sub-exhaust frame 160, respectively. By being combined, the harmful gas in the control unit installation space S4 and the gas source installation space S5 can be directly transferred to the exhaust unit 200 .

In addition, the substrate processing apparatus according to the present invention may further include one or more gas detection sensors 300 installed inside the housing 100 to detect harmful gases.

The gas detection sensor 300 is installed in the inner space of the housing 100 to measure the degree of harmful gas in the inner space, and may have various configurations.

The gas detection sensor 300 can detect various types of gases, such as a process gas used for substrate processing, a reaction gas and a purge gas according to process processing, as well as harmful gases, and Gas types and quantitative values can be detected.

For example, as shown in FIG. 2 , the gas detection sensor 300 is installed in the exhaust space S3 to determine the degree of harmful gas in the exhaust space S3, and more preferably, the process chamber Installed in each of the installation space (S1), the gas supply unit installation space (S2), and the exhaust space (S3), it is possible to detect the type and quantitative value of the gas in each space.

In this case, whether the door 121 of the housing 100 can be unlocked can be determined through whether the detection sensor 300 detects the gas, and the harmful gas is detected in the internal space by the detection sensor 300 . If there is, unlocking may not be possible to prevent the door 121 from being opened.

Since the above has only been described with respect to some of the preferred embodiments that can be implemented by the present invention, as noted, the scope of the present invention should not be construed as being limited to the above embodiments, and It will be said that the technical idea and the technical idea accompanying the fundamental are all included in the scope of the present invention.

10: process chamber 20: gas supply unit
30: control unit 40: gas source unit
100: housing 200: exhaust
300: gas detection sensor

Claims (12)

a process chamber 10 forming a closed processing space and performing substrate processing;
a housing 100 forming at least two or more independent inner spaces including a process chamber installation space S1 in which the process chamber 10 is installed;
and an exhaust unit 200 provided in communication with the exhaust pump in the housing 100 so that harmful gas is exhausted through an exhaust pump provided outside the housing 100,
The housing 100 is
In order to exhaust the harmful gas in the independent internal spaces through the exhaust unit 200, an exhaust frame in which an exhaust flow path for delivering the harmful gas from the internal spaces to the exhaust unit 200 is formed therein. a plurality of frames 110 including at least one 130 and coupled to each other to be installed;
and a plurality of plates (120) coupled to the frames (110) so as to form a plurality of the inner spaces that are blocked from the outside. The method according to claim 1,
The housing 100 is
The substrate processing apparatus, characterized in that in order to prevent the harmful gas from leaking out of the inner spaces, the inner spaces form a lower negative pressure than the outside. 3. The method according to claim 2,
The housing 100 is
The gas supply unit installation space (S2) in which the gas supply unit 20 for controlling the supply of process gas for substrate processing from the lower part of the process chamber 10 to the process chamber 10 is installed is the process chamber installation space ( Substrate processing apparatus, characterized in that formed at the lower end of S1). 4. The method according to claim 3,
The housing 100 is
The process chamber installation space ( S1) and the gas supply unit installation space (S2) communicated with each other, the exhaust space (S3) in which the exhaust unit 200 is installed, characterized in that the substrate is formed at the upper end of the process chamber installation space (S1) processing unit. 5. The method according to claim 4,
The exhaust frame 130 is
The process is installed parallel to the ground between the process chamber installation space S1 and the exhaust space S3, and the harmful gas in the process chamber installation space S1 is exhausted through the exhaust unit 200. A horizontal exhaust frame 131 having a first exhaust passage 132 formed therein so that the chamber installation space S1 and the exhaust space S3 communicate with each other;
The gas supply unit installation space S2 and the exhaust space S3 are installed vertically on the ground and in order to exhaust the harmful gas in the gas supply unit installation space S2 through the exhaust unit 200. A substrate processing apparatus comprising: a vertical exhaust frame 140 having a second exhaust passage 141 formed therein so as to communicate therein. 6. The method of claim 5,
The horizontal exhaust frame 131 is,
In order to exhaust the harmful gas in the gas supply unit installation space S2 through the exhaust unit 200, the second exhaust flow path allows the gas supply unit installation space S2 and the exhaust space S3 to communicate with each other. A substrate processing apparatus, characterized in that a third exhaust passage (135) connected to (141) is additionally formed therein. 7. The method of claim 6,
The first exhaust passage 132 and the third exhaust passage 135 are formed to be separated from each other so that the process chamber installation space S1 and the gas supply unit installation space S2 are separated from the exhaust space S3 and the gas supply unit installation space S2. Substrate processing apparatus, characterized in that each independently communicated. 8. The method of claim 7,
The exhaust unit 200,
The first exhaust flow path to the horizontal exhaust frame 131 so that the harmful gas delivered through the exhaust frame 130 from the process chamber installation space S1 and the gas supply unit installation space S2 is directly transmitted. A first exhaust pipe (201) coupled in communication with (132), and a second exhaust pipe (202) coupled to the horizontal exhaust frame (131) in communication with the third exhaust flow path (135) Substrate processing equipment. 5. The method of claim 4,
The housing 100 is
A control unit installation space (S4) in which a control unit (30) for controlling the process chamber (10) and the gas supply unit (20) is installed is formed adjacent to the exhaust space (S3),
The exhaust frame 130 is
It is installed between the control unit installation space (S4) and the exhaust space (S3), and the control unit installation space (S4) for exhausting the harmful gas through the exhaust unit 200 ( and a control unit exhaust frame (150) having an exhaust flow path formed therein so that S4) and the exhaust space (S3) communicate with each other. 5. The method of claim 4,
The housing 100 is
A gas source part installation space S5 in which a gas source part 40 for supplying the process gas injected for substrate processing is installed in the process chamber 10 is formed adjacent to the exhaust space S3, ,
The exhaust frame 130 is
The gas source unit is installed between the gas source unit installation space (S5) and the exhaust space (S3) to exhaust the harmful gas in the gas source unit installation space (S5) through the exhaust unit (200). and a gas source unit exhaust frame (160) having an exhaust flow path formed therein so that the installation space (S5) and the exhaust space (S3) communicate with each other. 11. The method according to any one of claims 1 to 10,
The substrate processing apparatus according to claim 1, further comprising one or more gas detection sensors (300) installed inside the housing (100) to detect the harmful gas. 12. The method of claim 11,
The substrate processing apparatus, characterized in that whether the door (121) of the housing (100) can be unlocked is determined based on whether the gas detection sensor (300) detects the harmful gas.

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