1285769 (1) 玖、發明說明 【發明所屬之技術領域】 本發明係有關液晶顯示裝置之玻璃基板的再現方法， 其特徵爲··從其表面上依序形成有選自黑格陣膜、濾色膜 、表塗膜、ITO膜、聚醯亞胺膜、金屬膜、合金膜、氧化 膜、氮化膜及密封劑膜之至少一以上的玻璃基板，選擇性 去除一或多數之膜。 【先前技術】 液晶顯示裝置具配置有透明電極、偏光板等之二以上 玻璃板，該玻璃板間夾置液晶物質。於是，賦予該透明電 極電荷，即可因該液晶物質之轉向，穿透光之偏光方向亦 變動，利用偏光板，控制光之穿透/非穿透。於細分化之 區域作上述控制，即可作文字、影像之顯示。液晶顯示裝 置更具有，用以作電荷控制之薄膜電晶體（TFT)，用以使 文字、影像著色之彩色濾光片等。 第1 2圖係呈示液晶顯示裝置之一例的構造之剖視圖。 該例中，位於光之射入側的玻璃基板1 1，及位於光之 射出側的玻璃基板1係相向配置。 於玻璃基板1之一面係形成有格子狀或帶狀之黑格陣 膜（下稱BM膜）2，該BM膜2之格子上或帶上形成具紅（R)、 綠（G)、藍（B)各色之濾色膜（下稱CF膜）3。並且，CF膜3之 上形成有透明樹脂所成之表塗膜（下稱0C膜）4。而BM膜2 通常係由金屬及/或金屬氧化物或合成樹脂所成’ CF膜3係 -6- (2) (2)1285769 由例如丙烯酸共聚物系彩色樹脂所成。而該0C膜4表面上 依序形成有，透明電極ITO膜（銦錫氧化物）5，及用以排列 液晶分子群於一定方向之定向膜聚醯亞胺膜（下稱PI膜）6 。玻璃基板1之另一側形成有偏光膜7。如該玻璃基板1， 依序形成一或多數BM膜2 、CF膜3 、0C膜4 、：[TO膜5 及PI膜6之玻璃基板，在以下之本說明書中稱作彩色濾光 片側玻璃基板。 於玻璃基板1 1之一面，隔特定間隔形成有TFT元件12 。TFT元件12之表面上依序形成有ITO膜15及PI膜16。該 TFT元件12多採用反交錯a-Si TFT，而反交錯^8丨TFT有 通道保護型及通道邊緣型二類。 玻璃基板1 1之另一面形成有偏光膜1 7。 如該玻璃基板11，依序形成一或多數TFT元件12， IT 0膜1 5及PI膜16之玻璃基板，在以下之本說明書中稱作 TFT元件側玻璃基板。 PI膜6與16之間封入有液晶8，爲調整、維持該PI膜6 與16之間隔，於PI膜6與16之間配置有間隔物9。 液晶顯示裝置中，通常在從該玻璃基板11之液晶8側 之反側以持光照射之狀態下，ITO膜5及15之間對應於影像 施加電壓變化液晶8之排列，藉光的穿透/非穿透之控制’ 即可顯示影像。 上述之彩色濾光片側玻璃基板及TFT側玻璃基板，惟 有符合特定品質標準者方才採用於液晶顯示裝置。該品質 標準高，無法符合品質標準即無法用於液晶顯示裝置，經 (3) 1285769 廢棄處置者所在多有。因而，由該廢棄處置物全部去除形 成在玻璃基板上之各膜，或僅去除不符品質標準之部份， 將玻璃基板再現，將該再現物再度利用於彩色濾光片側玻 璃基板及TFT側玻璃基板等之製造。 又，對T F T側玻璃基板，爲製造裝置之維修等停止製 造後，再開始連續製造之前，首先使用成膜條件設定用玻 璃基板（下稱模擬基板）作製造，確認製造裝置之各設定條 件。該模擬基板係使用，於玻璃基板全面形成金屬膜及合 金膜（Ta、Mo、W、Ti、Cr、A1等，及其合金）、氧化膜 (SiOx、Ta205、Al2〇3、ITO)、氮化膜（SiNx)等所成之單層 膜或層合膜，PI膜等，或以密封劑沿圖型塗布者。通常， 該模擬基板不成爲產品，多係用於同目的一或多次後廢棄 。因而，須由該廢棄之模擬基板全部或部份去除所形成之 各種膜等，再現玻璃基板。 發明所欲解決之課題 向來，由玻璃基板去除各種膜等，係使用剝離液。例 如，由Cr製之BM膜、CF膜及ITO膜3者之彩色濾光片側玻 璃基板’全部或部份去除此等膜時，係將該彩色濾光片側 玻璃基板浸浸於表1所示之剝離液槽。 (4) (4)1285769 表1 膜之種類 剝 離 液 硝 酸 姉 銨 與 硝 酸 之 混 合 液 Ci*製BM膜 硝 酸 鈽 銨 與 過 氯 酸 之 混 合水 溶液 含 全 氟 燒 基 酸 之 王 水 CF膜 驗 性 水 溶 液 含 全 氟 烷 基 酸 之 可 性 鈉 水溶 液 鹽 酸 與 硝 酸 之 混 合 液 氯 化 鐵 與 鹽 酸 之 混 合 液 ITO膜 稀 鹽 酸 含 鋅 粉 之 鹽 酸 碘 化 氫 與 磷 酸 之 混 合 液 但以該方法去除種種膜時，有例如下述之問題。 (1) 僅只ITO膜之品質不符時，無法不損傷CF膜而僅 去除ITO膜。 (2) 同時去除CF膜及ITO膜時，無法壓低BM膜及玻璃 基板之侵蝕量，例如使一次之處理中，玻璃基板之侵刻量 在5奈米（50埃）以下。 於是，上述三膜以外，對形成有〇C膜及PI膜之彩色濾 光片側玻璃基板，亦去除品質不符標準之部份的膜或全部 膜，以謀玻璃基板之再現，可不損傷應予保留之膜，玻璃 基板，再現玻璃基板之剝離液尙未得見。 又，於TFT側玻璃基板及模擬基板，一般亦浸入剝離 -9- (5) (5)1285769 液槽以去除TFT元件，特定膜或密封劑，但使用習知剝離 液時，如同彩色濾光片側玻璃基板，有傷及欲予保留之膜 ，侵蝕玻璃基板等之問題。 【發明內容】 本發明係鑑於以上實情，其目的在提供，使用特定之 剝離液，可僅選擇性去除不符品質標準之一或多數膜，不 傷及應予保留之膜，無侵蝕玻璃基板等問題的液晶顯示用 彩色濾光片側玻璃基板，TFT側玻璃基板及模擬基板等之 玻璃基板的再現方法。 更具體而言，本發明之目的在提供以下（1)至（7)之玻 璃基板的再現方法。 (1) 玻璃基板正面有PI膜，其下有ITO膜形成時，用 含中性有機溶劑，或中性有機溶劑及多元醇及/或水之溶 液，可不損傷ITO膜底下之膜，僅去除PI膜之彩色濾光片 側玻璃基板及TFT側玻璃基板的再現方法。 (2) 玻璃基板正面有ITO膜，其下有0C膜及/或CF膜 形成時，用含鹵素系無機酸或有機酸，或此等及多元醇之 水溶液，可不傷及0C膜底下之膜，僅去除IT 0膜的彩色濾 光片側玻璃基板之再現方法。 (3) 玻璃基板正面有0C膜，其下有CF膜及BM膜形成 時，用含無機酸之水溶液，有機或無機鹼性水溶液，可不 傷及BM膜及玻璃基板，去除0C膜及CF膜之彩色濾光片側 玻璃基板的再現方法。 -10- (6) (6)1285769 (4) 於玻璃基板形成有金屬及/或金屬化合物製之BM 膜時，使用無機酸、有機酸或含硝酸鈽銨之水溶液，可不 侵蝕玻璃基板，去除BM膜之彩色濾光片側玻璃基板的再 現方法。 (5) 形成有ITO膜，TFT元件時，使用無機酸、有機 酸或含硝酸鈽銨之水溶液，可完全去除形成之膜的TFT側 玻璃基板之再現方法。 (6) 其特徵爲：玻璃基板上形成有PI膜、ITO膜、金 屬膜、合金膜、氧化膜及氮化膜之一或多數時，利用中性 有機溶劑，或含中性有機溶劑及多元醇及/或水之溶液浸 泡玻璃基板去除PI膜，利用鹵素系無機酸或有機酸，或含 此等及多元醇之水溶液浸泡玻璃基板去除ITO膜，以無機 酸、有機酸或含硝酸鈽銨之水溶液浸泡基板，去除PI膜及 ITO膜以外之膜，可不侵蝕玻璃基板去除所有膜的模擬基 板之再現方法。 (7) 於玻璃基板形成有密封劑膜時，用含無機酸或有 機酸之水溶液，可不侵蝕玻璃基板，僅去除密封劑的模擬 基板之再現方法。 用以解決課題之手段 第一發明係在提供其特徵爲：從依序形成有BM膜、 CF膜、〇C膜' ITO膜及PI膜之一或多數的玻璃基板之形成 膜側的外層側，用特定剝離液選擇性去除該膜之一或多數 的玻璃基板之再現方法。在此，BM膜係用以作彩色濾光 -11 - (7) (7)1285769 片間各色之遮光，通常係形成格子狀或帶狀，但不限於此 。CF膜係由R、B、G各色之濾色膜所成，係形成於玻璃基 板上以顯示特定色，爲落實各色濾色膜間之遮光，以如第 12圖所示，搭於BM膜而形成爲佳。0C膜係爲被覆該CF膜 之表面而設，ITO膜係爲用作透明電極，PI膜係爲使液晶 定向而設之定向膜。第一發明之玻璃基板，可係通常之液 晶顯示裝置用彩色濾光片側玻璃基板。第一發明之玻璃基 板可僅形成有選自BM膜、CF膜、0C膜、ITO膜及PI膜之 一，亦可依序形成有多數膜。或亦可依序形成所有之BM 膜、CF膜、0C膜、ITO膜及PI膜。 從第一發明中如此形成之膜的外層側膜，選擇性去除 一或多數膜。結果可僅去除不符品質標準之一或多數膜， 在保留合乎品質標準之膜的狀態下可再現玻璃基板，故可 有效再利用於液晶顯示裝置用玻璃基板之製造等。 第二發明係其特徵爲：將外層側爲PI膜之形成有PI膜 及ITO膜之玻璃基板，浸泡於含選自碳原子數4至10之環酯 及碳原子數3至1 0之羥基經取代之脂族醚的至少其一之有 機溶劑，或含該有機溶劑及多元醇及/或水之溶劑，選擇 性去除該PI膜的該玻璃基板之再現方法。藉該第二發明之 再現方法，可對ITO膜不產生造成電阻値變化之損傷及污 染，而僅選擇性去除PI膜。該第二發明適用之玻璃基板有 ，液晶顯示裝置用彩色濾光片側玻璃基板及TFT側玻璃基 板，若外層側係PI膜時，具有PI膜、ITO膜以外之膜或元 件者亦可。 -12- (8) (8)1285769 碳原子數4至10之環狀酯及碳原子數3至10之羥基經取 代之脂族醚係中性有機溶劑，其例如r - 丁內酯、甲基溶 纖劑等。浸泡玻璃基板之溶劑係以r - 丁內酯、甲基溶纖 劑及此等之混合溶劑爲佳，尤以含τ -丁內酯50重量％以 上之溶劑爲佳。 第三發明係其特徵爲：將外層側爲ITO膜之形成有ITO 膜及〇C膜及/或CF膜之玻璃基板，浸泡於（1)含一以上選自 氫溴酸、氫碘酸及氯磺酸之鹵素系無機酸之水溶液，（2) 含一以上選自草酸、乙酸及甲酸之有機酸之水溶液，或 (3)含該鹵素系無機酸或有機酸及多元醇之水溶液，選擇 性去除該ITO膜之玻璃基板的再生方法。 藉該第三發明之再現方法，可於CF膜無造成穿透率及 色度變化等之損傷，僅選擇性去除ITO膜。該第三發明適 用之玻璃基板有液晶顯示裝置用彩色濾光片側玻璃基板， 若係外層側爲1丁〇膜者，則具CF膜、ITO膜、OC膜以外之 膜亦可。 第四發明係其特徵爲：將外層側係OC膜，形成有OC 膜、CF膜以及含金屬及/或金屬氧化物之BM膜之玻璃基板 浸泡於（1)含選自鹽酸、硝酸、硫酸及磷酸之一以上的無 機酸水溶液，或（2)含選自N-甲基-2-吡咯烷酮、氫氧化四 甲銨、氫氧化鉀、氫氧化鈉及肼之一以上的鹼性水溶液’ 去除該BM膜以外之例如OC膜、CF膜之玻璃基板的再現方 法。 藉第四發明之再現方法，可不損傷該BM膜及玻璃基 -13- (9) (9)1285769 板，去除0C膜、CF膜等其它膜。該第四發明適用之玻璃 基板有液晶顯示裝置用彩色濾光片側玻璃基板。 第五發明係其特徵爲：將僅形成有含金屬及/或金屬 氧化物的BM膜之玻璃基板浸泡於（1)含選自鹽酸、硝酸、 硫酸、磷酸、氯磺酸、草酸、乙酸及甲酸之至少其一的水 溶液，或（2)含硝酸鈽銨液之水溶液，去除該BM膜之玻璃 基板的再現方法。 藉第五發明之再現方法，可不侵蝕玻璃基板，僅去除 BM膜。該第五發明適用之玻璃基板有液晶顯示裝置用彩 色濾光片側玻璃基板。 第六發明係在提供，其特徵爲：從依序形成有TFT元 件、IT〇膜及PI膜之一或多數之玻璃基板，形成膜及元件 之側的外層側，用特定剝離液，選擇性去除該膜或元件之 一或多數的玻璃基板之再現方法。在此，TFT元件可係通 常用於液晶顯示裝置等之薄膜電晶體，ITO膜及PI膜係各 同於上述第一發明中之ITO膜及PI膜。 第六發明之玻璃基板，係通常用作液晶顯示裝置用之 TFT側玻璃基板者。 第六發明中係由如此形成之膜的外層側，選擇性去除 其一或多數。結果，可僅去除品質不符標準之一或多數膜 ’在保留品質合乎標準之膜或元件的狀態下，再現玻璃基 板’故可有效再利用於液晶顯示裝置用玻璃基板之製造等 〇 第七發明係其特徵爲：將外層側係IT〇膜，形成有IT〇 -14 - (10) (10)1285769 膜及TFT元件之玻璃基板，或外層側爲ITO膜，形成有1丁〇 膜，TFT元件以及選自金屬膜、合金膜、氧化膜及氮化膜 之一以上的玻璃基板，浸泡於（1)含選自鹽酸、氫溴酸、 氫碘酸、硝酸、硫酸、磷酸、氯磺酸、草酸、乙酸及甲酸 之至少其一的水溶液，或（2)含硝酸鈽銨之水溶液之玻璃 基板的再現方法。 藉該第七發明之再現方法，可不侵蝕玻璃基板，去除 所有上述之膜。該第七發明適用之玻璃基板有，液晶顯示 裝置用TFT側玻璃基板。 第八發明係在提供，其特徵爲：從依序形成有PI膜、 ITO膜、金屬膜、合金膜、氧化膜、氮化膜及密封劑膜之 一或多數的玻璃基板之形成膜之側的外層側，用特定剝離 液，選擇性去除該膜之一或多數的玻璃基板之再現方法。 在此，ΙΤΟ膜及ΡΙ膜各係同於上述第一發明之ΙΤΟ膜及ΡΙ膜 〇 第八發明之玻璃基板係通常用作液晶顯示裝置之製造 用的模擬基板者。 第八發明中，從如此形成之膜的外層側，選擇性去除 其一或多數。結果，可僅選擇性去除品質不符標準之一或 多數之膜，在保留品質合乎標準之膜的狀態下再現模擬基 板，故可有效再利用作模擬基板。 第九發明係形成有ΡΙ膜、ΙΤΟ膜、金屬膜、合金膜、 氧化膜及氮化膜之一或多數的玻璃基板之再現方法，其特 徵爲：包括（1)浸泡該玻璃基板於含選自碳原子數4至10之 -15- (11) (11)1285769 環酯及碳原子數3至10之羥基經取代之脂族醚之至少其一 之有機溶劑，或含該有機溶劑及多元醇及/或水之溶劑， 以去除PI膜之過程，（2)浸泡該玻璃基板於含選自鹽酸、氫 溴酸、氫碘酸及氯磺酸之一以上的鹵素系無機酸之水溶液 ，含選自草酸、乙酸及甲酸之一以上的有機酸之水溶液， 或含該鹵素系無機酸或該有機酸，及多元醇之水溶液，去 除ITO膜之過程，以及（3)浸泡該玻璃基板於含選自鹽酸、 硝酸、磷酸、氯磺酸、草酸、乙酸及甲酸之至少其一的水 溶液，或含硝酸鈽銨之水溶液，去除PI膜及ITO膜以外之 膜的過程之至少一過程。 第九發明之玻璃基板通常係用作液晶顯示裝置製造用 之模擬基板者。 第九發明中，可不侵蝕玻璃基板，去除所有不符品質 標準之膜。 第十發明係其特徵爲：將僅形成有密封劑之玻璃基板 ，浸泡於含選自鹽酸、硝酸、硫酸、磷酸、氯磺酸、草酸 、乙酸及甲酸之至少其一的水溶液，去除該密封劑之該玻 璃基板的再生方法。 第十發明之玻璃基板係通常用作液晶顯示裝置之製造 用的模擬基板者。 第十發明中，可不侵蝕玻璃基板，僅去除密封劑。 【實施方式】 發明之實施形態 -16- (12) (12)1285769 以下藉實施例及圖面具體說明本發明。但實施例並非 用以限定本發明之範圍。 實施例1 第1圖及第2圖係例示液晶顯示裝置之彩色濾光片側玻 璃基板之剖視圖。第1圖係施行本實施例之再現處理前， 彩色濾光片側玻璃基板之剖視圖。而第1圖及第2圖係藉顯 微鏡相片確認之示意圖。此於第3至6圖，及第9至11圖亦 馨 同。 如第1圖，處理前之玻璃基板1，依序形成有BM膜2， CF膜3，〇C膜4， ITO膜5及厚2微米之PI膜6。 將該玻璃基板1，以60 °C、2小時浸泡於注有r -丁 內酯100%)所成之剝離液槽後提起、水洗。然後投入單片 或淸洗機作純水淸洗，及氣刀乾燥。 第2圖係作以上處理後的彩色濾光片側玻璃基板之剖 視圖。第1圖不有PI膜6 ’而％ 2圖不無PI膜6 ’僅選擇性去 除PI膜6。並且確認，於ITO膜5無造成電阻値之變化及污 染等之損傷發生。並確認玻璃基板1未受侵蝕。 實施例2 第3圖及第4圖係例示液晶顯示裝置之彩色濾光片側玻 璃基板之剖視圖。第3圖係施行本實施例之再現處理前彩 色濾光片側玻璃基板之剖視圖。 如第3圖，處理前之玻璃基板I，依序形成有B Μ膜2 -17- (13) (13)1285769 、（:？膜3 、〇C膜4及厚度1000埃之ITO膜5。以40 °C，2 小時浸泡該玻璃基板1於注入氫碘酸、乙二醇及水的重量 比30 /3 0 /40之混合溶劑所成之剝離液槽後提起、水洗。 然後，投入單片式淸洗機作純水淸洗及氣刀乾燥。 第4圖係施行以上處理後之彩色濾光片側玻璃基板之 剖視圖及表面狀態之相片。第3圖示有IT〇膜5，第4圖示無 ITO膜5，僅選擇性去除ITO膜5。並確認，於CF膜3無造成 穿透率及色度變化等之損傷發生。並確認，玻璃基板1未 受侵鈾。 而本實施例之剝離液，亦可取代上述，改用含草酸、 乙酸及甲酸之一或多數及多元醇的水溶液。 實施例3 第5圖及第6圖係例示液晶顯示裝置之彩色濾光片側玻 璃基板之剖視圖。第5圖係施行本實施例之再現處理前的 彩色濾光片側玻璃基板之剖視圖。 如第5圖，處理前之玻璃基板1，依序形成有厚度2000 埃之Ch•製BM膜2，厚度1.5微米之CF膜3及厚度1微米之〇C 膜4 〇 以60 °C，2小時浸泡該玻璃基板1於注入N-甲基-2-吡咯烷酮（NMP)、氫氧化四甲銨（TMAH)及水之重量比30 /3 0 /40的混合溶劑所成之剝離液之儲槽後提起、水洗。然 後投入單片式淸洗機作純水淸洗及氣刀乾燥。 第6圖係施行以上處理後的彩色濾光片側玻璃基板之 -18- (14) (14)1285769 剖視圖。第5圖中可確認BM膜2 、0?膜3及0C膜4 ;第6圖 僅示BM膜2，CF膜3及0C膜4已去除。而玻璃基板1亦確認 未受侵蝕。 第7圖示，附有三種厚度之BM膜2，各重複多次實施 例3之再現處理（以實施例3之剝離液處理）時，BM膜2之厚 度與處理次數之關係。厚度乃從玻璃基板1的BM膜2於特 定位置之厚度以探針式表面粗度計測出之厚度。 第8圖示，多次重複實施例3之再現處理時，BM膜2之 〇D値（光學濃度）與處理次數之關係。0D値係以光穿透濃 度計測定之値。 由第7圖及第8圖知，即使處理次數增加，BM膜2之厚 度及0D値大略固定。由0D値之係固定，知BM膜2未受侵 蝕，由BM膜2自玻璃基板1之厚度係固定，知玻璃基板1未 受侵蝕。 而本實施例之剝離液，可取代上述，改用含選自鹽酸 、硝酸、碳酸、磷酸及氯磺酸之一或多數的水溶液，或含 選自氫氧化鉀、氫氧化鈉及肼之一或多數的水溶液。 又，當BM膜2非Cr製而係樹脂製時，藉上述本實施例 之處理，BM膜2連同CF膜3及0C膜4均可去除。此時，玻璃 基板1可再利用作母玻璃。 形成於玻璃基板1之Ci·製BM膜，可藉浸泡該玻璃基板 1於含選自鹽酸、硝酸、硫酸、磷酸、草酸、乙酸及甲酸 之一或多數之水溶液，或含硝酸鈽銨之水溶液予以去除。 如上示，施行實施例1至3之所有處理，可將第1圖所 -19- (15) 1285769 示之彩色濾光片側玻璃基板之所有膜完全去除。並且， BM膜2及玻璃基板1幾無侵蝕，該玻璃基板1可有效再利用 實施例4 第9圖係液晶顯示裝置的TFT側玻璃基板之一例，係施 行本實施例之再現處理前的剖視圖。 如第9圖，處理前之玻璃基板11依序形成有TFT元件12 ，厚1 000埃之ITO膜15及厚2微米之PI膜16。 如同實施例1選擇性去除PI膜16(此時ITO膜未見受損） ，如同實施例2選擇性去除ITO膜15後，浸泡於80 °C之硫 酸2小時，然後80 °C之磷酸2小時，以剝離TFT元件12 。藉該處理，TFT元件12，ITO膜15及PI膜16即完全由玻璃 基板11去除。並確認基板11未受到侵鈾。 亦即，由本實施例可知，從TFT側玻璃基板，TFT元 件12，ITO膜15及PI膜16均可去除，並且玻璃基板11幾乎 不受侵蝕，故該玻璃基板1 1可有效再利用。 實施例5 第1 0圖係模擬基板之一例，於玻璃基板2 1上形成有金 屬膜1 8。 浸泡該模擬基板於80 °C之硫酸2小時，然後80 °C 之磷酸2小時，可完全去除金膜1 8。並可確認玻璃基板2 1 未受侵蝕。 -20- (16) (16)1285769 而本實施例之剝離液可取代上述，改用含選自草酸、 乙酸及甲酸之一或多數的水溶液，或硝酸鈽銨。 實施例6 第1 1圖係模擬基板之一例，其於玻璃基板2 1上塗布有 經圖型化之密封劑1 9。 浸泡該模擬基板於80 °C之硫酸2小時，然後於80 °C之磷酸2小時，可完全去除密封劑1 9。並確認玻璃基板 2 1未受侵蝕。 而本實施例之剝離液可取代上述，改用含選自草酸、 乙酸及甲酸之一或多數的水溶液。 由上述第九發明之說明可知，於模擬基板形成有PI膜 、ITO膜、金屬膜、合金膜、氧化膜及氮化膜之一或多數 時，例如PI膜可藉浸泡上述玻璃基板於含r -丁內酯及/或 甲基溶纖劑之有機溶劑，或該有機溶劑與水之混合溶劑去 除，ITO膜可藉浸泡於含選自鹽酸、氫溴酸、氫碘酸及氯 磺酸之一以上鹵素系無機酸之水溶液，或含選自草酸、乙 酸及甲酸之一以上有機酸的水溶液去除，PI膜及ITO膜以 外之膜，可藉浸泡於含選自鹽酸、硝酸、硫酸、磷酸、氯 磺酸、草酸、乙酸及甲酸之至少其一的水溶液，或含硝酸 鈽銨之水溶液去除，所有膜均可從該玻璃基板去除。 亦即，如由以上實施例可知，由模擬基板，金屬膜1 8 、合金膜、氧化膜、氮化膜、ITO膜、聚醯亞胺膜及密封 劑1 9均可去除，且因可幾無玻璃基板2 1之侵鈾，可將該玻 ~ 21 - (17) (17)1285769 璃基板2 1有效再利用。 發明效果 如以上之說明，根據本發明，可將形成於液晶顯示裝 置用之彩色濾光片側玻璃基板，TFT側玻璃基板及模擬基 板之所有膜、元件去除。並且，可僅選擇性去除製程中品 質標準不符之膜及形成之膜，而保留品質合乎標準之膜， 可有效再現液晶顯示裝置用之彩色濾光片側玻璃基板、 TF丁側玻璃基板及模擬基板。 亦即，利用本發明之再現方法，可由製造中之不良彩 色濾光片側玻璃基板、TFT側玻璃基板及模擬基板，僅去 除品質不符標準之膜、元件，加以再利用。並且可由判定 作廢之上述玻璃基板去除所有膜，予以再利用。 更具體之例有，根據第一、第六及第八發明，可僅選 擇性去除不符品質標準之一或多數膜，可在保留品質合乎 標準之膜等的狀態下，有效再利用玻璃基板。 根據第二發明，可不於ITO膜產生造成電阻値變化之 損傷及污染，僅選擇性去除PI膜，亦無玻璃基板之侵蝕。 根據第三發明，可不對彩色濾光片側玻璃基板等之CF 膜有造成穿透率及色度變化之損傷，僅選擇性去除IT〇膜 ，亦幾無玻璃基板之侵蝕。 根據第四發明，玻璃基板幾無侵蝕，可去除品質不符 標準的ΒΜ膜以外之膜。 根據第五發明，玻璃基板幾無侵蝕，可僅去除ΒΜ膜 -22- (18) (18)1285769 根據第七發明，由TFT側玻璃基板，可對玻璃基板幾 無侵蝕，去除所有品質不符標準之膜。 根據第九發明，可幾無玻璃基板之侵鈾，由模擬基板 去除所有品質不符標準之膜。 根據弟十發明，可幾無玻璃基板之侵鈾，僅去除密封 劑。 【圖面之簡單說明】 第1圖本發明實施例1中，再現處理前的彩色濾光片 側玻璃基板之剖視圖。 第2圖本發明實施例1中，再現處理後的彩色濾光片 側玻璃基板之剖視圖。 第3圖本發明實施例2中，再現處理前的彩色濾光片 側玻璃基板之剖視圖。 第4圖本發明實施例2中，再現處理後的彩色濾光片 側玻璃基板之剖視圖。 第5圖本發明實施例3中，再現處理前彩色濾光片側 玻璃基板之剖視圖。 第6圖本發明實施例3中，再現處理後彩色濾光片側 玻璃基板之剖視圖。 第7圖 BM膜厚與處理次數之關係圖。 第8圖 BM膜0D値與處理次數之關係圖。 第9圖本發明實施例4中，再現處理前TFT側玻璃基 -23- (19) (19)1285769 板之剖視圖。 第1 0圖本發明實施例5中模擬基板之剖視圖。 第1 1圖本發明實施例6中模擬基板之剖視圖。 第1 2圖液晶顯示裝置之一例的構造剖視圖。 【符號說明】 1 、11 、21 玻璃基板 2 BM膜 3 CF膜 4 〇C膜 5 、15 IT〇膜 6 、 16 ΡΙ膜 7 偏光膜 8 液晶 9 間隔物 10 光 12 TFT元件 18 金屬膜 19 密封劑 -24-1285769 (1) Field of the Invention The present invention relates to a method for reproducing a glass substrate of a liquid crystal display device, characterized in that: a black matrix film and a filter are sequentially formed from the surface thereof. At least one or more glass substrates of a color film, a surface coating film, an ITO film, a polyimide film, a metal film, an alloy film, an oxide film, a nitride film, and a sealant film are selectively removed by one or more films. [Prior Art] A liquid crystal display device is provided with two or more glass plates such as a transparent electrode and a polarizing plate, and a liquid crystal material is interposed between the glass plates. Therefore, by imparting the charge of the transparent electrode, the direction of polarization of the transmitted light also changes due to the steering of the liquid crystal material, and the polarizing plate is used to control the penetration/non-penetration of the light. By performing the above control in the subdivided area, the text and image can be displayed. The liquid crystal display device further has a thin film transistor (TFT) for charge control, a color filter for coloring text and images, and the like. Fig. 12 is a cross-sectional view showing the structure of an example of a liquid crystal display device. In this example, the glass substrate 11 on the light incident side and the glass substrate 1 on the light exit side are arranged to face each other. A grid pattern or a strip-shaped black array film (hereinafter referred to as BM film) 2 is formed on one surface of the glass substrate 1, and red (R), green (G), and blue are formed on the grid or on the strip of the BM film 2. (B) Color filter films of various colors (hereinafter referred to as CF films) 3. Further, a surface coating film (hereinafter referred to as an OC film) 4 made of a transparent resin is formed on the CF film 3. The BM film 2 is usually made of a metal and/or a metal oxide or a synthetic resin. The CF film 3 is a -6- (2) (2) 1285769 made of, for example, an acrylic copolymer-based color resin. On the surface of the 0C film 4, a transparent electrode ITO film (indium tin oxide) 5, and an alignment film polyimide film (hereinafter referred to as PI film) for aligning liquid crystal molecules in a certain direction are formed. A polarizing film 7 is formed on the other side of the glass substrate 1. As the glass substrate 1, one or a plurality of BM films 2, CF films 3, OC films 4, and [glass films of the TO film 5 and the PI film 6 are sequentially formed, and are referred to as color filter sides in the following description. glass substrate. The TFT element 12 is formed on one surface of the glass substrate 11 at a predetermined interval. An ITO film 15 and a PI film 16 are sequentially formed on the surface of the TFT element 12. The TFT element 12 is mostly made of an anti-staggered a-Si TFT, and the de-interleaved TFT has a channel protection type and a channel edge type. A polarizing film 17 is formed on the other surface of the glass substrate 11. The glass substrate 11 is sequentially formed with one or a plurality of TFT elements 12, and the glass substrates of the IT 0 film 15 and the PI film 16 are referred to as a TFT element side glass substrate in the following description. The liquid crystal 8 is sealed between the PI films 6 and 16, and a spacer 9 is disposed between the PI films 6 and 16 in order to adjust and maintain the distance between the PI films 6 and 16. In the liquid crystal display device, the arrangement of the liquid crystals 8 is changed between the ITO films 5 and 15 in response to the image application voltage change in the state where the light is irradiated from the opposite side to the liquid crystal 8 side of the glass substrate 11, and the light is penetrated. / Non-penetration control' to display images. The color filter side glass substrate and the TFT side glass substrate described above are used in a liquid crystal display device only in accordance with a specific quality standard. This quality standard is high, and it cannot be used in liquid crystal display devices if it cannot meet the quality standards. It is often disposed of by (3) 1285769. Therefore, all the films formed on the glass substrate are removed from the waste disposal material, or only the portion that does not conform to the quality standard is removed, and the glass substrate is reproduced, and the reproduced material is reused on the color filter side glass substrate and the TFT side. Manufacturing of glass substrates and the like. In addition, after the continuation of the production of the T F T side glass substrate, the glass substrate (hereinafter referred to as a dummy substrate) for film formation conditions is used for manufacturing, and the respective setting conditions of the manufacturing apparatus are confirmed. This analog substrate is used to form a metal film and an alloy film (Ta, Mo, W, Ti, Cr, A1, etc., and alloys thereof), an oxide film (SiOx, Ta205, Al2〇3, ITO), and nitrogen on the glass substrate. A single layer film or a laminate film formed by a film (SiNx) or the like, a PI film or the like, or a pattern coated with a sealant. Usually, the dummy substrate is not a product, and many are used for one or more purposes after the same purpose. Therefore, it is necessary to remove all of the formed films or the like from all or part of the discarded dummy substrate, and to reproduce the glass substrate. OBJECTS TO BE SOLVED BY THE INVENTION In order to remove various films and the like from a glass substrate, a peeling liquid is used. For example, when all or part of the color filter-side glass substrate of the BM film, the CF film, and the ITO film made of Cr is removed, the color filter-side glass substrate is immersed in Table 1. The stripping tank shown. (4) (4) 1285769 Table 1 Types of Membrane Stripping Solution Mixture of Ammonium Nitrate and Nitric Acid Ci* BM Film Mixture of Ammonium Nitrate and Perchloric Acid Aqueous Solution Containing Perfluoroalkyl Acid Aqueous solution containing perfluoroalkyl acid aqueous solution of hydrochloric acid and nitric acid mixture of ferric chloride and hydrochloric acid ITO film diluted hydrochloric acid zinc-containing powder mixture of hydrogen iodide and phosphoric acid, but the film is removed by this method There are problems such as the following. (1) When only the quality of the ITO film does not match, the ITO film cannot be removed without damaging the CF film. (2) When the CF film and the ITO film are simultaneously removed, the amount of erosion of the BM film and the glass substrate cannot be lowered. For example, in one treatment, the amount of intrusion of the glass substrate is 5 nm (50 angstroms) or less. Therefore, in addition to the above-mentioned three films, the color filter side glass substrate on which the 〇C film and the PI film are formed is also removed from the film or the entire film of which the quality does not conform to the standard, so that the glass substrate can be reproduced without damage. The retained film, the glass substrate, and the peeling liquid for reproducing the glass substrate were not seen. Moreover, the TFT side glass substrate and the dummy substrate are generally immersed in a peeling -9-(5) (5) 1285769 liquid tank to remove the TFT element, a specific film or a sealant, but when using a conventional stripping liquid, as a color filter The sheet-side glass substrate has problems of injuring the film to be retained, etching the glass substrate, and the like. SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and an object thereof is to provide a method for selectively removing only one or a plurality of films that do not conform to the quality standard, without damaging the film to be retained, and not eroding the glass substrate, etc., using a specific stripping liquid. A method of reproducing a glass substrate such as a color filter side glass substrate for a liquid crystal display, a TFT side glass substrate, and a dummy substrate. More specifically, an object of the present invention is to provide a method of reproducing a glass substrate of the following (1) to (7). (1) There is a PI film on the front side of the glass substrate. When an ITO film is formed underneath, a solution containing a neutral organic solvent or a neutral organic solvent and a polyol and/or water can be used to remove the film under the ITO film. A method of reproducing a color filter side glass substrate and a TFT side glass substrate of a PI film. (2) An ITO film is formed on the front surface of the glass substrate, and when a 0C film and/or a CF film is formed under the surface, a halogen-containing inorganic acid or an organic acid or an aqueous solution of the polyol can be used to prevent damage to the film under the 0C film. A method of reproducing only the color filter side glass substrate of the IT 0 film. (3) When the CF substrate and the BM film are formed on the front side of the glass substrate, an aqueous solution containing an inorganic acid or an organic or inorganic alkaline aqueous solution can be used to remove the OC film and the CF film without damaging the BM film and the CF film. A method of reproducing a color filter side glass substrate. -10- (6) (6) 1285769 (4) When a BM film made of a metal and/or a metal compound is formed on a glass substrate, an inorganic acid, an organic acid or an aqueous solution containing ammonium cerium nitrate can be used to remove the glass substrate without removing the glass substrate. A method of reproducing a color filter side glass substrate of a BM film. (5) When an ITO film is formed and a TFT element is used, a method of reproducing a TFT-side glass substrate in which a formed film is completely removed by using an aqueous solution of a mineral acid, an organic acid or cerium ammonium nitrate can be used. (6) It is characterized in that when one or more of a PI film, an ITO film, a metal film, an alloy film, an oxide film, and a nitride film are formed on a glass substrate, a neutral organic solvent or a neutral organic solvent and a plurality of substances are used. The glass substrate is immersed in an alcohol and/or water solution to remove the PI film, and the ITO film is removed by using a halogen-based inorganic acid or an organic acid or an aqueous solution containing the polyol or the like, and the inorganic acid, the organic acid or the ammonium cerium nitrate is removed. The aqueous solution is immersed in the substrate to remove the film other than the PI film and the ITO film, and the method of reproducing the dummy substrate from which all the films are removed without eroding the glass substrate. (7) When a sealant film is formed on a glass substrate, an aqueous solution containing a mineral acid or an organic acid can be used to reproduce the dummy substrate without removing the sealant. Means for Solving the Problem A first invention is characterized in that an outer side of a film side on which a BM film, a CF film, a 〇C film 'ITO film, and a PI film are formed in sequence or a plurality of glass substrates is formed A method of reproducing one or a plurality of glass substrates of the film selectively with a specific stripping solution. Here, the BM film is used for color filter -11 - (7) (7) 1285769. The light shielding of each color is usually formed into a lattice shape or a strip shape, but is not limited thereto. The CF film is formed of a color filter film of each of R, B, and G colors, and is formed on a glass substrate to display a specific color. To perform light shielding between the color filter films, as shown in Fig. 12, the BM film is placed on the BM film. And formed as good. The 0C film is provided to cover the surface of the CF film, and the ITO film is used as a transparent electrode, and the PI film is an alignment film provided to orient the liquid crystal. The glass substrate of the first invention can be a color filter side glass substrate for a usual liquid crystal display device. The glass substrate of the first invention may be formed of only one selected from the group consisting of a BM film, a CF film, an OC film, an ITO film, and a PI film, and a plurality of films may be formed in order. Alternatively, all of the BM film, the CF film, the 0C film, the ITO film, and the PI film may be formed in order. From the outer layer side film of the film thus formed in the first invention, one or more films are selectively removed. As a result, only one of the quality standards or a plurality of films can be removed, and the glass substrate can be reproduced while retaining the film conforming to the quality standard, so that it can be effectively reused for the production of a glass substrate for a liquid crystal display device. The second invention is characterized in that the outer surface side is a glass substrate on which a PI film and an ITO film are formed, and is immersed in a hydroxyl group having a carbon atom number of 4 to 10 and a hydroxyl group having 3 to 10 carbon atoms. A method of reproducing the glass substrate of the PI film by selectively removing at least one of the organic solvent of the substituted aliphatic ether or a solvent containing the organic solvent and the polyol and/or water. According to the reproducing method of the second invention, it is possible to prevent damage and contamination of the ITO film from causing a change in resistance ,, and to selectively remove only the PI film. The glass substrate to which the second invention is applied includes a color filter side glass substrate for a liquid crystal display device and a TFT side glass substrate. When the outer layer side is a PI film, a film or a member other than the PI film or the ITO film may be used. -12- (8) (8) 1285769 A cyclic ester of 4 to 10 carbon atoms and an aliphatic ether-substituted neutral organic solvent having 3 to 10 carbon atoms, such as r - butyrolactone, A Base cellosolve, etc. The solvent for soaking the glass substrate is preferably r-butyrolactone, methyl cellosolve or a mixed solvent of these, and particularly preferably a solvent containing 50% by weight or more of τ-butyrolactone. The third invention is characterized in that the outer surface side is an ITO film and a glass substrate on which an ITO film and a 〇C film and/or a CF film are formed, and is immersed in (1) one or more selected from the group consisting of hydrobromic acid and hydroiodic acid. An aqueous solution of a halogen-based inorganic acid of chlorosulfonic acid, (2) an aqueous solution containing one or more organic acids selected from the group consisting of oxalic acid, acetic acid, and formic acid, or (3) an aqueous solution containing the halogen-based inorganic acid or organic acid and a polyhydric alcohol. A method of regenerating a glass substrate of the ITO film. According to the reproducing method of the third invention, only the ITO film can be selectively removed without causing damage to the CF film such as transmittance and chromaticity change. The glass substrate to be used in the third aspect of the invention may be a color filter side glass substrate for a liquid crystal display device, and a film other than the CF film, the ITO film or the OC film may be used if the outer layer side is a butyl film. A fourth invention is characterized in that: an outer layer side OC film, a glass substrate on which an OC film, a CF film, and a BM film containing a metal and/or a metal oxide are formed are immersed in (1) containing a selected from hydrochloric acid, nitric acid, and sulfuric acid. And an aqueous solution of one or more inorganic acids, or (2) an aqueous alkaline solution containing one or more selected from the group consisting of N-methyl-2-pyrrolidone, tetramethylammonium hydroxide, potassium hydroxide, sodium hydroxide and cesium A method of reproducing a glass substrate such as an OC film or a CF film other than the BM film. According to the reproducing method of the fourth invention, the BM film and the glass substrate -13-(9)(9)1285769 can be removed, and other films such as the OC film and the CF film can be removed. The glass substrate to which the fourth invention is applied includes a color filter side glass substrate for a liquid crystal display device. The fifth invention is characterized in that a glass substrate in which only a BM film containing a metal and/or a metal oxide is formed is immersed in (1) containing a selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, chlorosulfonic acid, oxalic acid, acetic acid, and An aqueous solution of at least one of formic acid or (2) an aqueous solution containing an ammonium cerium nitrate solution, and a method of reproducing the glass substrate from which the BM film is removed. According to the reproducing method of the fifth invention, only the BM film can be removed without eroding the glass substrate. The glass substrate to which the fifth invention is applied includes a color filter side glass substrate for a liquid crystal display device. A sixth invention is characterized in that: one or a plurality of glass substrates of a TFT element, an IT film, and a PI film are sequentially formed, and an outer layer side of the film and the element side is formed, and a specific stripping liquid is selectively used. A method of reproducing a glass substrate in which one or a plurality of the films or components are removed. Here, the TFT element can be generally used for a thin film transistor such as a liquid crystal display device, and the ITO film and the PI film are the same as the ITO film and the PI film in the above first invention. The glass substrate of the sixth invention is generally used as a TFT side glass substrate for a liquid crystal display device. In the sixth invention, one or more of the outer side of the film thus formed is selectively removed. As a result, it is possible to remove only one of the standards or the majority of the film 'reproduction of the glass substrate in a state in which the film or the element of the standard quality is retained', so that it can be effectively reused for the manufacture of the glass substrate for a liquid crystal display device, etc. It is characterized in that the outer layer side of the IT film is formed with a glass substrate of IT〇-14 - (10) (10) 1285769 film and TFT element, or the outer layer side is an ITO film, and a butyl film is formed, TFT The element and the glass substrate selected from one or more of a metal film, an alloy film, an oxide film, and a nitride film are immersed in (1) containing a selected from the group consisting of hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, sulfuric acid, phosphoric acid, and chlorosulfonic acid. An aqueous solution of at least one of oxalic acid, acetic acid, and formic acid, or (2) a method for reproducing a glass substrate containing an aqueous solution of cerium ammonium nitrate. According to the reproducing method of the seventh invention, all of the above films can be removed without eroding the glass substrate. The glass substrate to which the seventh invention is applied includes a TFT side glass substrate for a liquid crystal display device. An eighth invention is provided, characterized in that a side of a film formed of one or a plurality of glass substrates of a PI film, an ITO film, a metal film, an alloy film, an oxide film, a nitride film, and a sealant film is sequentially formed On the outer layer side, a method of reproducing one or a plurality of glass substrates of the film is selectively removed with a specific stripping solution. Here, the ruthenium film and the ruthenium film are the same as the ruthenium film and the ruthenium film of the first invention described above. The glass substrate of the eighth invention is generally used as a dummy substrate for manufacturing a liquid crystal display device. In the eighth invention, one or more of them are selectively removed from the outer layer side of the film thus formed. As a result, only the film of which the quality does not conform to one or a plurality of standards can be selectively removed, and the dummy substrate can be reproduced while retaining the film of the standard quality, so that it can be effectively reused as a dummy substrate. The ninth invention is a method for reproducing a glass substrate in which one or more of a ruthenium film, a ruthenium film, a metal film, an alloy film, an oxide film, and a nitride film are formed, which comprises: (1) immersing the glass substrate in an optional manner An organic solvent containing at least one of a carbon atom having 4 to 10 -15-(11) (11) 1285769 cyclic ester and a hydroxyl group having 3 to 10 carbon atoms substituted, or containing the organic solvent and plural a solvent of alcohol and/or water to remove the PI film, and (2) immersing the glass substrate in an aqueous solution containing a halogen-based inorganic acid selected from one or more of hydrochloric acid, hydrobromic acid, hydroiodic acid, and chlorosulfonic acid. An aqueous solution containing an organic acid selected from the group consisting of oxalic acid, acetic acid, and formic acid, or an aqueous solution containing the halogen-based inorganic acid or the organic acid, and a polyol, a process of removing the ITO film, and (3) immersing the glass substrate An aqueous solution containing at least one selected from the group consisting of hydrochloric acid, nitric acid, phosphoric acid, chlorosulfonic acid, oxalic acid, acetic acid, and formic acid, or an aqueous solution containing ammonium cerium nitrate, at least one of a process of removing a film other than the PI film and the ITO film. The glass substrate of the ninth invention is generally used as a dummy substrate for manufacturing a liquid crystal display device. In the ninth invention, it is possible to remove all the films which do not conform to the quality standard without eroding the glass substrate. A tenth invention is characterized in that a glass substrate having only a sealant formed thereon is immersed in an aqueous solution containing at least one selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, chlorosulfonic acid, oxalic acid, acetic acid, and formic acid to remove the seal A method of regenerating the glass substrate of the agent. The glass substrate of the tenth invention is generally used as a dummy substrate for manufacturing a liquid crystal display device. In the tenth invention, only the sealant can be removed without eroding the glass substrate. [Embodiment] Embodiments of the Invention - 16- (12) (12) 1285769 Hereinafter, the present invention will be specifically described by way of embodiments and drawings. However, the examples are not intended to limit the scope of the invention. Embodiment 1 Figs. 1 and 2 are cross-sectional views showing a color filter side glass substrate of a liquid crystal display device. Fig. 1 is a cross-sectional view showing a color filter side glass substrate before the reproduction process of the present embodiment is carried out. Figures 1 and 2 are schematic diagrams confirmed by micro-mirror photos. This is also shown in Figures 3 to 6, and Figures 9 to 11 are also identical. As shown in Fig. 1, a BM film 2, a CF film 3, a 〇C film 4, an ITO film 5, and a PI film 6 having a thickness of 2 μm are sequentially formed on the glass substrate 1 before the treatment. The glass substrate 1 was immersed in a stripping solution tank prepared by injecting r-butyrolactone (100%) at 60 ° C for 2 hours, and then lifted and washed with water. Then, put it into a single piece or a washing machine for pure water washing, and air knife to dry. Fig. 2 is a cross-sectional view showing the color filter side glass substrate after the above treatment. Fig. 1 shows no PI film 6' and %2 shows no PI film 6'. Only the PI film 6 is selectively removed. Further, it was confirmed that the ITO film 5 did not cause a change in resistance 及 and a damage such as contamination. It was also confirmed that the glass substrate 1 was not corroded. Embodiment 2 Figs. 3 and 4 are cross-sectional views showing a color filter side glass substrate of a liquid crystal display device. Fig. 3 is a cross-sectional view showing the color filter side glass substrate before the reproduction process of the present embodiment. As shown in Fig. 3, a glass film I before the treatment is sequentially formed with B film 2 -17-(13) (13) 1285769, (: film 3, 〇C film 4, and ITO film 5 having a thickness of 1000 Å. The glass substrate 1 was immersed at 40 ° C for 2 hours in a stripping solution tank prepared by injecting a mixed solvent of hydriodic acid, ethylene glycol and water in a weight ratio of 30 / 30 / 40, and then lifted and washed with water. The sheet type washing machine is used for pure water washing and air knife drying. Fig. 4 is a cross-sectional view of the color filter side glass substrate after the above treatment and a photo of the surface state. The third figure is an IT film 5, 4 shows that the ITO film 5 is not removed, and only the ITO film 5 is selectively removed. It is confirmed that the CF film 3 does not cause damage such as transmittance and chromaticity change, and it is confirmed that the glass substrate 1 is not invaded by uranium. The stripping solution of the embodiment may be replaced with an aqueous solution containing one or more of oxalic acid, acetic acid and formic acid and a polyhydric alcohol. Embodiment 3 FIGS. 5 and 6 illustrate a color filter side of a liquid crystal display device. Fig. 5 is a cross-sectional view showing a color filter side glass substrate before the reproduction process of the present embodiment. 5, the glass substrate 1 before the treatment, sequentially formed with a thickness of 2000 angstroms of Ch BM film 2, a thickness of 1.5 micron CF film 3 and a thickness of 1 micron 〇C film 4 浸泡 soaked at 60 ° C for 2 hours The glass substrate 1 is lifted after the storage tank of the stripping liquid formed by injecting a mixed solvent of N-methyl-2-pyrrolidone (NMP), tetramethylammonium hydroxide (TMAH) and water in a weight ratio of 30/30/40. Then, it is washed with water, and then put into a one-piece rinsing machine for pure water rinsing and air knife drying. Fig. 6 is a cross-sectional view of -18-(14) (14) 1285769 of the color filter side glass substrate subjected to the above treatment. In Fig. 5, BM film 2, 0? film 3, and OC film 4 were confirmed; Fig. 6 shows only BM film 2, and CF film 3 and OC film 4 were removed. The glass substrate 1 was also confirmed to be uneroded. As shown in the figure, the BM film 2 of three thicknesses is attached, and the relationship between the thickness of the BM film 2 and the number of times of processing is repeated each time the reproduction process of the third embodiment (the treatment with the stripping liquid of the embodiment 3) is repeated. The thickness is from the glass substrate. The thickness of the BM film 2 at a specific position is measured by the thickness of the probe surface roughness. In the eighth diagram, when the reproduction process of the third embodiment is repeated a plurality of times, the BM film 2 is 〇D値( The relationship between the optical density and the number of treatments. The 0D enthalpy is measured by a light penetration densitometer. From Fig. 7 and Fig. 8, it is known that the thickness of the BM film 2 and the 0D 値 are slightly fixed even when the number of treatments is increased. The BM film 2 is fixed without being eroded, and the BM film 2 is fixed from the thickness of the glass substrate 1. The glass substrate 1 is not eroded. The stripping liquid of this embodiment can be replaced by the above-mentioned An aqueous solution of one or more of hydrochloric acid, nitric acid, carbonic acid, phosphoric acid, and chlorosulfonic acid, or an aqueous solution containing one or more selected from the group consisting of potassium hydroxide, sodium hydroxide, and cesium. Further, when the BM film 2 is made of a resin other than Cr, the BM film 2 can be removed together with the CF film 3 and the OC film 4 by the above-described treatment of the present embodiment. At this time, the glass substrate 1 can be reused as a mother glass. The BM film formed on the glass substrate 1 can be immersed in the glass substrate 1 in an aqueous solution containing one or more selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, oxalic acid, acetic acid, and formic acid, or an aqueous solution containing ammonium cerium nitrate. Remove it. As described above, by performing all the processes of the first to third embodiments, all the films of the color filter-side glass substrate shown in Fig. -19-(15) 1285769 can be completely removed. Further, the BM film 2 and the glass substrate 1 are not eroded, and the glass substrate 1 can effectively reuse one example of the TFT side glass substrate of the liquid crystal display device of the ninth embodiment of the present invention, and is a cross-sectional view before the reproduction process of the present embodiment. . As shown in Fig. 9, the glass substrate 11 before the treatment is sequentially formed with a TFT element 12, an ITO film 15 having a thickness of 1 000 Å, and a PI film 16 having a thickness of 2 μm. The PI film 16 was selectively removed as in Example 1 (the ITO film was not damaged at this time), and after selectively removing the ITO film 15 as in Example 2, the sulfuric acid was immersed in 80 ° C for 2 hours, and then the phosphoric acid at 80 ° C was used. Hours to peel off the TFT element 12. By this treatment, the TFT element 12, the ITO film 15 and the PI film 16 are completely removed by the glass substrate 11. It was also confirmed that the substrate 11 was not subjected to uranium. That is, as is apparent from the present embodiment, the glass substrate 12, the TFT element 12, the ITO film 15 and the PI film 16 can be removed from the TFT side glass substrate, and the glass substrate 11 is hardly corroded, so that the glass substrate 11 can be effectively reused. Embodiment 5 Fig. 10 shows an example of a dummy substrate in which a metal film 18 is formed on a glass substrate 21. The gold film 18 can be completely removed by immersing the simulated substrate at 80 ° C for 2 hours and then at 80 ° C for 2 hours. It was confirmed that the glass substrate 2 1 was not corroded. -20- (16) (16) 1285769 The peeling liquid of the present embodiment may be substituted for the above, and an aqueous solution containing one or more of oxalic acid, acetic acid and formic acid, or ammonium cerium nitrate may be used instead. [Embodiment 6] Fig. 1 is an example of a dummy substrate on which a patterned sealant 19 is applied on a glass substrate 21. The sealing substrate was completely removed by immersing the simulated substrate at 80 ° C for 2 hours and then at 80 ° C for 2 hours. It was also confirmed that the glass substrate 21 was not eroded. Instead of the above, the stripping solution of this embodiment may be replaced with an aqueous solution containing one or more selected from the group consisting of oxalic acid, acetic acid and formic acid. According to the description of the ninth invention, when one or a plurality of PI films, ITO films, metal films, alloy films, oxide films, and nitride films are formed on the dummy substrate, for example, the PI film can be immersed in the glass substrate. - an organic solvent of butyrolactone and / or methyl cellosolve, or a mixed solvent of the organic solvent and water, the ITO film may be immersed in a mixture containing hydrochloric acid, hydrobromic acid, hydroiodic acid and chlorosulfonic acid An aqueous solution of one or more halogen-based inorganic acids or an aqueous solution containing one or more organic acids selected from the group consisting of oxalic acid, acetic acid, and formic acid, and a film other than the PI film and the ITO film may be immersed in a mixture selected from the group consisting of hydrochloric acid, nitric acid, sulfuric acid, and phosphoric acid. An aqueous solution of at least one of chlorosulfonic acid, oxalic acid, acetic acid, and formic acid, or an aqueous solution containing ammonium cerium nitrate, and all of the film can be removed from the glass substrate. That is, as can be seen from the above examples, the metal substrate 18, the alloy film, the oxide film, the nitride film, the ITO film, the polyimide film, and the sealant can be removed by the dummy substrate, and The uranium enriched by the glass substrate 21 can be effectively reused for the glass substrate 21 1 (17) (17) 1285769. Advantageous Effects of Invention As described above, according to the present invention, all of the films and elements formed on the color filter side glass substrate, the TFT side glass substrate, and the dummy substrate for the liquid crystal display device can be removed. Moreover, it is possible to selectively remove only the film and the formed film which do not conform to the quality standard in the process, and retain the film of the quality standard, and can effectively reproduce the color filter side glass substrate, the TF side glass substrate and the simulation for the liquid crystal display device. Substrate. In other words, according to the reproducing method of the present invention, only the defective color filter side glass substrate, the TFT side glass substrate, and the dummy substrate can be reused only by removing the film or the component having a non-standard quality. Further, all the films can be removed from the above-mentioned glass substrate which is judged to be invalid, and reused. More specifically, according to the first, sixth, and eighth inventions, only one of the quality standards or a plurality of films can be selectively removed, and the glass substrate can be effectively reused while maintaining the quality of the film or the like. According to the second invention, it is possible to selectively remove the PI film without the damage of the ITO film, which causes damage and contamination of the resistance enthalpy, and there is no erosion by the glass substrate. According to the third aspect of the invention, the CF film such as the color filter side glass substrate is not damaged by the transmittance and the chromaticity change, and only the IT film is selectively removed, and the glass substrate is not eroded. According to the fourth invention, the glass substrate is free from corrosion, and a film other than the standard enamel film can be removed. According to the fifth invention, the glass substrate is free from erosion, and only the ruthenium film can be removed. -22- (18) (18) 1285769 According to the seventh invention, the glass substrate on the TFT side can be eroded to the glass substrate, and all the quality is not in conformity with the standard. The film. According to the ninth invention, it is possible to remove all uranium which is inferior to the standard from the dummy substrate by the uranium entrapment of the glass substrate. According to the invention of the tenth, the uranium entrapped by the glass substrate can be removed, and only the sealant is removed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing a color filter side glass substrate before reproduction processing in a first embodiment of the present invention. Fig. 2 is a cross-sectional view showing a color filter side glass substrate after the reproduction process in the first embodiment of the present invention. Fig. 3 is a cross-sectional view showing a color filter side glass substrate before reproduction processing in the second embodiment of the present invention. Fig. 4 is a cross-sectional view showing a color filter side glass substrate after the reproduction process in the second embodiment of the present invention. Fig. 5 is a cross-sectional view showing the color filter side glass substrate before the reproduction process in the third embodiment of the present invention. Fig. 6 is a cross-sectional view showing the color filter side glass substrate after the reproduction process in the third embodiment of the present invention. Figure 7 BM film thickness and the number of treatments. Fig. 8 is a graph showing the relationship between the BM film 0D値 and the number of times of processing. Fig. 9 is a cross-sectional view showing a TFT-side glass substrate -23-(19) (19) 1285769 before the reproduction process in the fourth embodiment of the present invention. Fig. 10 is a cross-sectional view showing a dummy substrate in a fifth embodiment of the present invention. Fig. 1 is a cross-sectional view showing a dummy substrate in a sixth embodiment of the present invention. Fig. 1 is a cross-sectional view showing the structure of an example of a liquid crystal display device. [Description] 1 , 11 , 21 Glass substrate 2 BM film 3 CF film 4 〇 C film 5 , 15 IT 〇 film 6 , 16 ΡΙ film 7 Polarizing film 8 Liquid crystal 9 Spacer 10 Light 12 TFT element 18 Metal film 19 Seal Agent-24-