JP2001147314A - Color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter for a liquid crystal display device which decreases deterioration in the production yield and in the display quality due to the electrostatic charges caused by electrification in a peeling process from a hot plate, chucks to carry a substrate or the like or by triboelectrification in a coating or dewatering process with a spin coating machine or an air knife, when a color filter and a liquid crystal display device are produced. SOLUTION: This color filter is produced by forming at least a black matrix layer and color layers of the respective three primary colors on the opening of the black matrix and on a part of the black matrix on a transparent substrate. The filter has the black matrix in the non display region.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0007]

The present invention relates to a method for manufacturing a color filter used in a liquid crystal display device.

[0008]

2. Description of the Related Art In general, a color filter is composed of a large number of picture elements, with a coloring layer of three primary colors of red, green and blue formed on a transparent substrate as one picture element. A light-shielding layer (which is generally referred to as black matrix on a screen and is called a black matrix) is provided between the colored layers to increase display contrast. A black matrix of a conventional color filter is formed by patterning a metal thin film or a resin colored with a light-shielding agent in a display region. In addition, a transparent conductive film is formed as an electrode in a display region on the coloring layer of the color filter substrate.

A conventional liquid crystal display device has a structure in which such a color filter is bonded to another transparent substrate, and the liquid crystal is aligned in a state of being twisted in a gap between these two substrates.
For example, when a thin film transistor (TFT) is formed as another transparent substrate, a thin film diode is formed, a transparent electrode is formed in a stripe shape, and a matrix is formed with a striped transparent electrode formed on a color filter side. was there.

In these types of liquid crystal display devices, poor alignment may occur due to surface irregularities of the color filters, and display defects such as light leakage and afterimages may be caused. Further, as the driving voltage of the liquid crystal decreases, display defects may be caused by the influence of pigment impurities remaining on the surface of the color filter.

In recent years, as a measure against these display defects, a transparent electrode is formed after a transparent overcoat layer is provided on a colored layer for the purpose of improving the surface flatness and forming a protective layer for protecting liquid crystal molecules from minute impurities. They are often formed.

Further, the conventional liquid crystal display element has good display characteristics when viewed from the front, but has the disadvantage that the contrast is significantly reduced when viewed from an oblique direction. In order to solve this drawback, in recent years,
A switching (IPS) liquid crystal display device has been developed. In this type of liquid crystal display device, liquid crystals are aligned in parallel between two transparent substrates, and switching is performed by an electric field applied in a parallel direction to the transparent substrates, unlike the related art. For this reason, no transparent electrode is formed on the surface of the color filter that is in contact with the liquid crystal. Further, in order not to disturb the direction of the electric field applied in the horizontal direction, the material of the light shielding layer is Cr
Instead of a metal thin film, a resin in which a light-shielding agent such as a black pigment is dispersed is often used. Also in this IPS system, a transparent overcoat layer is often formed on a colored layer for the purpose of improving the surface flatness and forming a protective layer for protecting liquid crystal molecules from minute impurities.

In manufacturing these color filters and liquid crystal display elements, the hot plate for thermosetting, the peeling and charging with a chuck for transporting the substrate, the spin coating, the coating with an air knife, and the liquid drainage are used. Generates static electricity due to frictional electrification.

In forming these liquid crystal display elements, it is necessary to align liquid crystal molecules in any method. Usually, a thin film made of polyimide resin is formed on the surface of two substrates forming a liquid crystal display element, and the liquid crystal is unidirectionally rubbed by rubbing the thin film with a blanket such as rayon or cotton in one direction. Orientation. In this rubbing process, static electricity is generated by frictional charging.

These static electricity causes point defects due to discharge, particle attraction, etc., poor alignment due to damage to the alignment film, variation in spacer density due to uneven CF surface potential, etc. Became a problem. In particular, when the surface layer is an overcoat layer, a large amount of static electricity is generated, or the generated static electricity is difficult to escape. Therefore, when an overcoat film is provided on a substrate, the substrate is easily affected by the static electricity.

In order to solve this problem, the process has been improved such as attaching a static eliminator.
Since the static electricity is removed after the static electricity is generated, the influence cannot be completely eliminated.

As a color filter, there is a method in which a transparent conductive film is formed also on a non-display portion to remove static electricity.
In this case, it is desirable to form a transparent conductive film on the entire surface of the color filter substrate. However, if a transparent conductive film is formed outside the seal portion of the liquid crystal display element, the reliability may be deteriorated due to corrosion, and depending on the configuration of the panel, the periphery of the display region may be reduced. The presence of the conductive film in the portion causes an electrical short circuit between the TFT substrate and the color filter substrate and causes a failure in the seal portion, resulting in abnormal quality and a decrease in yield.

On the other hand, when a space is provided between the display region and the non-display region, if the space between the conductive film in the display region and the conductive film in the non-display region is too small, it becomes difficult to form a mask and the pattern edge becomes blurred. Or damage to the substrate surface. In addition, the layer structure of the sealing material, the alignment film, and the conductive film is unfavorably formed due to the pattern misalignment. Therefore, the yield is reduced, and the mask design becomes difficult and the cost is increased. Further, in a color filter in which a transparent conductive film such as IPS is not formed on the uppermost layer,
Since the number of steps for forming the transparent conductive film increases, the yield decreases and the cost increases.

Further, there is a method of removing a static electricity by forming a conductive layer on the back side of a transparent substrate not provided with a black matrix layer and a coloring layer. In this case, the cost is increased due to an increase in the number of steps for newly forming a conductive film, and the conductive layer on the back side of the transparent substrate is scratched and stained due to contact with a transport roll or the like, which causes a reduction in yield.

The black matrix layer provided in the non-display area of the color filter having the transparent protective film layer is disposed below the transparent protective film layer instead of the outermost layer. However, studies by the present inventors have revealed that even in a configuration in which a black matrix layer is disposed under a transparent protective film layer, a sufficient static elimination effect is obtained in a liquid crystal display element manufacturing process.

At the periphery of the display area of the liquid crystal display element, a light-shielding portion called a picture frame is provided, and a portion near a seal portion where two substrates are bonded to each other or a portion where liquid crystal alignment is not controlled only by liquid crystal driving wiring is provided. Covered up. Usually, this frame is formed of a black matrix layer. The seal is placed over the black matrix frame. When the black matrix is formed by dispersing a light shielding material in a resin, when the two substrates constituting the liquid crystal display device are peeled off, the black matrix layer and the sealing material are not separated without peeling between the sealing material and the black matrix layer. Peeling may occur between the substrate and the substrate. This is because the adhesion between the black matrix layer and the substrate is lower than the adhesion between the sealant and the black matrix layer. In Japanese Patent Application Laid-Open No. 10-325951, as a countermeasure, a slit is formed in a frame under a seal to provide a portion where a sealant and a substrate are bonded without interposing a black matrix layer. In recent years, the adhesion of the black matrix has been improved,
It is no longer necessary to make the slit of the black matrix narrower or open. To improve black matrix adhesion, for example, increase the amount of black matrix resin,
Alternatively, a light-shielding material having a high light-shielding property is used.
In this case, the resistance value of the black matrix is increased, and it has been found that an appropriate resistance value is necessary in order to dispose the black matrix outside the display area and to find an effect against static electricity.

[0022]

SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a color filter and a liquid crystal display device which are capable of reducing a yield reduction caused by static electricity generated by peeling charge, frictional charge and the like in a process of manufacturing the same. To provide a filter.

[0023]

To solve the above-mentioned problems, the present invention has the following arrangement.

(1) In a color filter having a black matrix layer and three primary color layers in a display area on a transparent substrate, a black matrix layer is provided in a non-display area of the color filter and provided in the non-display area. The volume resistivity of the black matrix layer is 1 × 10 ⁹ Ωc
m or less.

(2) The color filter according to (1), wherein the gap between the black matrix layers provided within 20 mm of the non-display area from the display area black matrix frame is 5 mm or less.

(3) The color filter according to (1), wherein the gap between the black matrix layer provided in the non-display area and the edge of the transparent substrate is 5 mm or less.

(4) The color filter according to any one of (1) to (3), wherein a transparent protective film is formed on the coloring layer.

(5) The black matrix layer is formed by dispersing a light shielding material in a resin (1).
The color filter according to any one of (1) to (4).

[0029]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In manufacturing a color filter and a liquid crystal display element, a hot plate for drying and heat curing, peeling electrification with a chuck for transferring a substrate, spin coating, coating with an air knife, and the like. Drainage and rubbing of the color filter in the rubbing process generate static electricity due to frictional charging and the like, and the color filter substrate is charged, and these are discharged in a later process. Causing damage, adhesion of foreign matter, etc.
The inventors of the present invention have conducted intensive research on the generation of static electricity that causes these defects, especially on hot plates for drying and heat curing, and chucks for transporting substrates. It has been found that it is strongly generated by triboelectric charging at the time of color filter rubbing treatment in the color filter rubbing process in the peeling electrification, spin coating, application with an air knife, liquid removal, rubbing process, etc., and by providing a black matrix layer in this non-display area The present inventors have found that the generation of static electricity can be reduced, and that the yield of color filters and liquid crystal display elements and the display quality can be prevented from deteriorating due to static electricity generated in the process.

The color filter for a liquid crystal display element of the present invention comprises a transparent substrate provided with a black matrix layer and three primary color layers.

The transparent substrate used in the present invention is not particularly limited. Inorganic glasses such as quartz glass, borosilicate glass, aluminosilicate glass, soda lime glass whose surface is coated with silica, and organic plastics Films or sheets are preferably used.

As the black matrix layer, Cr, A
Any of a thin film of l, Ni, zirconium and these metal oxides, and a thin film in which a light-shielding agent is dispersed in a resin may be used. In addition, for an IPS type LCD, which has attracted attention from the viewpoint of wide viewing angle characteristics, a resin thin film in which a light-shielding agent is dispersed is preferably used as a black matrix layer in order to improve the display characteristics. I have.

The resin used for the black matrix layer is not particularly limited, but is a photosensitive or non-photosensitive material such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, and a polyolefin resin. Is preferably used. The resin for the black matrix layer is preferably a resin having a higher heat resistance than the resin used for the pixel or the protective film, and a resin having resistance to the organic solvent used in the step after the formation of the black matrix is preferable. A polyimide resin is particularly preferably used.

As the light-shielding agent for the black matrix, a mixture of red, blue and green pigments in addition to metal oxide powder such as carbon black, titanium oxide and iron tetroxide, metal sulfide powder and metal powder is used. be able to. Among them, carbon black and titanium oxide are particularly preferable because of their excellent light-shielding properties. Mainly, carbon black exhibits a brownish tone and titanium oxide exhibits a blueish tone. Therefore, it is preferable to mix a complementary color pigment to obtain an achromatic color.

The resin for the black matrix is not particularly limited, and may be a polyimide resin, an acrylic resin, a polyvinyl alcohol resin, a polyester resin, or the like.

As a method for producing the resin black matrix,
After a black paste is applied on a transparent substrate and dried, patterning is performed. As a method for applying the black paste, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are suitably used. After that, heat drying (semi-curing) using an oven or a hot plate is performed. Do. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

The black paste film is formed by the above-mentioned method using a paste using a photosensitive or non-photosensitive resin. If the resin is a non-photosensitive resin, after forming a positive photoresist film thereon, or, if the resin is a photosensitive resin, as it is or after forming an oxygen barrier film, Exposure and development are performed. If necessary, remove the positive photoresist or oxygen barrier film,
Heat and dry (this cure). These curing conditions are slightly different depending on the coating amount when a polyimide resin is obtained from the precursor, but it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a black matrix is formed on the transparent substrate.

The thickness of the resin black matrix is preferably 0.5 to 1.5 μm, more preferably 0.8 to 1.
3 μm. If the thickness is smaller than 0.5 μm, the light-shielding property becomes insufficient, which is not preferable. On the other hand, when the film thickness is more than 1.5 μm, although the light-shielding property can be secured, the flatness of the color filter is easily sacrificed, and a step is easily generated, which is not preferable. When a step in a pixel occurs, even if a transparent electrode or a liquid crystal alignment film is formed on the color filter, the step is hardly reduced, and the alignment treatment by rubbing the liquid crystal alignment film becomes non-uniform, and the cell gap varies. For example, the display quality of the liquid crystal display element is degraded. In such a case, it is effective to provide a transparent protective film on the coloring layer in order to reduce the step in the pixel.

The light-shielding property of the resin black matrix is represented by an OD value (common logarithm of the reciprocal of the transmittance). In order to improve the display quality of the liquid crystal display device, the OD value is preferably 2.0. Or more, more preferably 3.0 or more. The preferred range of the thickness of the resin black matrix has been described above, but the upper limit of the OD value should be determined in relation to this.

The reflectance of the resin black matrix is a reflectance (Y value) corrected for visibility in the visible region of 400 to 700 nm in order to reduce the influence of reflected light and improve the display quality of the liquid crystal display device. It is preferably at most 4%, more preferably at most 2%.

Usually, (20)
An opening of (.about.200) .mu.m.times. (20 to 300) .mu.m is provided, and a plurality of colored layers of each of the three primary colors are arranged so as to cover at least this opening. That is, 1
One opening is covered with any one of the three primary color layers, and a plurality of color layers of each color are arranged.

The coloring layer constituting the color filter contains at least three primary colors. That is, when color display is performed by the additive method, red (R), green (G), and blue (B)
When color display is performed by the primary color method, three primary colors of cyan (C), magenta (M), and yellow (Y) are selected. Generally, a picture element for color display can be obtained by using an element including these three primary colors as one unit. For the coloring layer, a resin colored with a coloring agent is used.

As the coloring agent used in the coloring layer, organic pigments, inorganic pigments, dyes and the like can be suitably used. Further, various additives such as an ultraviolet absorber, a dispersing agent and a leveling agent are added. You may. As the organic pigment, phthalocyanine-based, aziraki-based, condensed azo-based, quinacridone-based, anthraquinone-based, perylene-based, and perinone-based pigments are preferably used.

As the resin used for the coloring agent, photosensitive or non-photosensitive materials such as epoxy resins, acrylic resins, urethane resins, polyester resins, polyimide resins, and polyolefin resins are preferably used. It is preferable to disperse or dissolve the agent in these resins for coloring. Examples of the photosensitive resin include photodecomposable resins, photocrosslinkable resins, and photopolymerizable resins.Especially, monomers, oligomers or polymers having an ethylenically unsaturated bond and an initiator that generates radicals by ultraviolet rays are used. A photosensitive composition, a photosensitive polyamic acid composition and the like are preferably used. As the non-photosensitive resin, those which can be developed with the above various polymers are preferably used.
A resin having heat resistance that can withstand such heat in a film forming process of a transparent conductive film or a manufacturing process of a liquid crystal display element is preferable,
In addition, since a resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display element is preferable, a polyimide resin is particularly preferably used. Here, as a preferable polyimide resin, a polyimide resin preferably used as a material of the above-described resin black matrix can be exemplified.

As a method of forming a colored layer, patterning is performed after coating and drying on a substrate on which a resin black matrix is formed. As a method for applying the coloring paste, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are suitably used. After that, heat drying (semi-curing) using an oven or a hot plate is performed. Do. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

In the case where the resin is a non-photosensitive resin, the colored paste film thus obtained is formed after forming a positive type photoresist film on the non-photosensitive resin. In some cases, exposure and development are performed as they are or after forming an oxygen barrier film. If necessary, the positive type photoresist or the oxygen blocking film is removed and dried by heating (this cure). The curing conditions are different depending on the resin, but when the polyimide resin is obtained from the precursor, the curing condition is slightly different depending on the amount of application, but usually 200 to 300 ° C.
For 1 to 60 minutes. Through the above process, a patterned colored layer is formed on the substrate on which the black matrix is formed.

After the first color layer is formed over the entire surface of the substrate on which the black matrix is formed as described above, unnecessary portions are removed by photolithography to obtain a desired pattern of the first color layer. To form In this case, a portion that covers at least the opening of the black matrix and a portion that leaves the colored layer on a part of the black matrix are formed. The same operation is repeated for the second and third colors to form a colored layer.

The thickness of the three primary colors is not particularly limited, but is preferably 0.9 to 3 μm per layer, more preferably 1.
6 to 2.4 μm. When the thickness of the coloring layer is less than 0.9 μm, the inclination angle of the surface of the color filter on the pattern edge of the black matrix becomes large, and poor alignment is likely to occur. On the other hand, if the film thickness exceeds 3 μm, it becomes difficult to apply the colored layer uniformly.

A transparent protective film can be formed on the colored layer, if necessary. As the resin used for the transparent protective film, an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, and gelatin are preferably used. Or a resin having heat resistance such as to withstand such heat in a manufacturing process of a liquid crystal display element,
Since a resin having resistance to an organic solvent used in a liquid crystal display element manufacturing apparatus is preferable, a polyimide resin or an acrylic resin is preferably used.

As a method of applying the transparent protective film, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are preferably used as in the case of the black paste and the colored paste. ,
Heat and dry using an oven or hot plate. At this time, vacuum drying and preliminary heating drying (semi-curing) may be performed as needed for the purpose of improving the leveling property. The semi-curing conditions vary depending on the resin used, the solvent, and the amount of the paste applied.
It is preferable to heat for a minute. The curing conditions during heating and drying vary depending on the resin. When a polyimide resin is obtained from the precursor, heating is usually performed at 200 to 300 ° C. for 1 to 60 minutes. It is.

The thickness of the transparent protective film of the present invention is 0.05 to
3.0 μm is desirable. Thickness is more effective in reducing the level difference in the pixel, but uniform coating becomes difficult. Further, it can be suitably selected from combinations of the thicknesses of the black matrix layer and the colored layer.

A transparent conductive film can be formed on the colored layer or the transparent protective film if necessary. Although there is no particular limitation on the material of the conductive film, a material having excellent transparency is preferably used, and ITO is particularly preferably used.

There is no particular limitation on the film forming method, and a vacuum paste, a CVD method, a sputtering method, an EB method, a material in which conductive fine particles are dispersed in a resin such as polyimide, a black paste,
As in the case of the colored paste, a dip method, a roll coater method, a spinner method, a die coating method, a method of applying and heating with a wire bar, and the like are suitably used.

The method for patterning the conductive film is not particularly limited. After applying a photoresist after forming a conductive film on the entire surface, exposing, developing, and etching, a photolithography method of removing a conductive film at an unnecessary portion, a resin is applied only to an unnecessary portion of the conductive film in advance, and a film is formed over the entire surface, A lift-off method for removing this, a mask sputtering method for masking an unnecessary portion using a metal mask and forming a film by sputtering, and the like are used. Among them, the mask sputtering method is widely used because the production cost is advantageous.

For the purpose of the present invention, it is preferable to form a black matrix continuously over the entire surface of the non-display area of the color filter to prevent static electricity. The effect on the parts becomes remarkable, and antistatic is required more. If the transparent protective film is not formed,
Failure due to an electrical short circuit between the TFT substrate and the color filter and interference with peripheral marks may be caused. In this case, a gap is provided between the black matrices and / or between the black matrix and the edge of the substrate. . In order to perform charge elimination and neutralization by transferring charges, the gap between the black matrices and / or the gap between the black matrix and the substrate edge is preferably 5 mm or less, more preferably 2 mm or less.

For example, in a liquid crystal display element, if a black matrix is formed at the edge of the substrate, a defect such as an electrical short-circuit between the external connection terminal take-out portion of the TFT substrate and the color filter substrate may be caused. In this case, it is desirable to provide a gap between the black matrix provided in the non-display area and the substrate cutting line. However, if the gap between the black matrices is larger than 5 mm, static electricity due to exfoliation charging and frictional charging in the process. Is more likely to occur.

In the present invention, in order for the black matrix to exhibit an effect on static electricity, the volume resistivity should be 1 × 10 ⁹ Ωcm or less, more preferably 1 × 10 ⁴ Ωcm or less. Things. When the volume resistivity is larger than 1 × 10 ⁹ Ωcm, it is difficult to neutralize and neutralize the charge by the movement of the charge between the black matrix and / or the black matrix and the edge of the substrate, and the charge eliminating effect is not seen.

Next, the above color filter will be described with reference to the drawings.

FIG. 1 shows an example of the structure of the color filter of the present invention, and is a schematic view from the surface of the color filter. FIG. 2 is a schematic sectional view showing an example of the configuration of the color filter of the present invention. The display areas in the present invention are indicated by 1 and 2 in FIG. 1, 1 is an opening area of a black matrix, 2 is a frame of the black matrix, 3 is a black matrix of a non-display area, 4 is a gap between the black matrices, Reference numeral 5 denotes a gap between the black matrix and the edge of the substrate. In FIG. 2, 11 is a transparent substrate, 1, 2
Is a display area black matrix, 12 is a colored layer such as (B), 13 is a colored layer such as (G), 14 is a colored layer such as (R), 15 is a transparent protective film, 16 is a transparent conductive film, 1
Reference numeral 7 denotes an alignment film.

A liquid crystal alignment film is provided on the surface of the color filter and the TFT substrate, and is subjected to an alignment process such as rubbing. After the alignment treatment, the color filter and the TFT substrate are bonded and sealed. After the liquid crystal is injected from the injection hole provided in the seal portion, the injection hole is sealed. The liquid crystal display element is completed by mounting an IC driver and the like after attaching the polarizing plate to the outside of the substrate.

[0061]

EXAMPLES The present invention will be described in more detail with reference to the following Examples, which should not be construed as limiting the scope of the present invention.

[Example 1] (Preparation of resin black matrix) 3, 3 ', 4, 4'
-Biphenyltetracarboxylic dianhydride, 4,4'-diaminodiphenylether and bis (3-aminopropyl) tetramethyldisiloxane with N-methyl-2-
The reaction was performed using pyrrolidone as a solvent to obtain a polyimide precursor (polyamic acid) solution.

A carbon black mill base having the following composition was mixed with a homogenizer at 7000 rpm for 3 hours.
0, and the glass beads were filtered to prepare a black paste.

[Carbon black mill base] Carbon black (MA100, manufactured by Mitsubishi Kasei Co., Ltd.):
4.6 parts Polyimide precursor solution: 24.0 parts N-methyl-2-pyrrolidone: 61.4 parts Glass beads: 90.0 parts.

Glass substrate (Corning, 1737 material)
Was coated with a curtain flow coater and dried on a hot plate at 130 ° C. for 10 minutes to form a black resin coating film. After applying a positive photoresist (manufactured by Shipley Co., SRC-100) with a reverse roll coater, pre-baking at 100 ° C. for 5 minutes on a hot plate, and irradiating with 100 mj / cm ² ultraviolet rays using an ultra-high pressure mercury lamp, and then performing mask exposure, Using a 2.25% aqueous solution of tetramethylammonium hydroxide, the development of the photoresist and the etching of the resin coating are simultaneously performed to form a pattern, the resist is peeled off with methyl cellosolve acetate, and heated at 300 ° C. for 10 minutes on a hot plate By doing so, imidization was performed to form a black matrix layer. In the black matrix, a gap of 2 mm was provided from the edge of the substrate, and a gap of 2 mm was provided at the line for cutting the substrate.

The measured thickness of the black matrix layer was 1.15 μm.

When the OD value of the black matrix layer was measured with a Macbeth optical densitometer TD-904 manufactured by Macbeth, the OD value was 3.5.

The reflectance of the black matrix layer was measured with a microspectrophotometer MCPD-2000 manufactured by Otsuka Electronics Co., Ltd. using a glass of BK-7 and found to be 1.5%. (Volume resistivity: Measurement by a four-terminal measurement method) The black matrix prepared above was cut out to an appropriate size, and the volume resistivity was measured by Loresta manufactured by Mitsubishi Yuka. The volume resistivity of the black matrix layer was 1 × 10 ² Ωcm. (Preparation of Colored Layer) Next, as red, green and blue pigments,
color index No. 65300 Pigme
nt Red 177, a dianthraquinone-based pigment, Color index No. 74265 Pi
phthalocyanine green-based pigment represented by Color index No. 7
A phthalocyanine blue pigment represented by 4160 Pigment Blue 15-4 was prepared. Each of the above pigments was mixed and dispersed in a polyimide precursor solution, and red,
Green and blue colored pastes were obtained.

Next, a red paste was applied on a resin black matrix substrate by a curtain flow coater, and dried at 130 ° C. for 10 minutes on a hot plate to form a red resin coating film. Then, a positive photoresist (manufactured by Shipley,
SRC-100) was applied on a reverse roll coater, prebaked on a hot plate at 100 ° C. for 5 minutes, and irradiated with 100 mj / cm ² ultraviolet light using an ultra-high pressure mercury lamp, and then subjected to mask exposure. Simultaneously develop the photoresist and etch the resin coating using an aqueous solution, form a pattern, remove the resist with methyl cellosolve acetate, imidize by heating at 300 ° C for 10 minutes on a hot plate, and color red A layer was formed. The pattern of the mask was an island pattern, and the formed red coloring layer pattern was also an island pattern. When the film thickness of the red coloring layer at the black matrix opening was measured, it was 1.6 μm.
Met.

After washing with water, a green paste is applied to a substrate having a red coloring layer formed on a resin black matrix in the same manner.
Pattern processing was performed to form a green colored layer. The thickness of the green colored layer measured at the black matrix opening was 1.65 μm.

After washing with water, a blue paste was applied and patterned on a substrate having a red and green colored layer formed on the resin black matrix layer in the same manner to form a blue colored layer.
When the film thickness of the blue colored layer at the black matrix opening was measured, it was 1.6 μm. (Formation of Transparent Protective Film) Thereafter, a solution of polyamic acid in N-methyl-2-pyrrolidone / butyl cellosolve was applied by a spin coater to a final thickness of 1.0 μm, and heated on a hot plate at 280 ° C. for 10 minutes. Thus, an overcoat layer was formed. (Formation of Conductive Film) Further, a metal mask was attached on the overcoat layer, and ITO was formed into a mask only in the display region by a sputtering method. At this time, the film thickness is 15 nm,
The surface resistance was 15Ω / □. (Preparation of a color liquid crystal display element) After washing a color filter substrate with a neutral detergent, an alignment film made of a polyimide resin is applied by a printing method, and is heated at 200 ° C. and 10 ° C.
Bake for a minute. The film thickness was 70 nm. Thereafter, the color filter was subjected to a rubbing treatment, a sealant was applied on a black matrix by a dispensing method, and baked at 90 ° C. for 10 minutes on a hot plate.

On the other hand, a substrate having a TFT array formed on a Corning glass substrate 1737 material is similarly washed, and then an alignment film is applied and baked. After that, spray the spacer,
Laminated with the color filter substrate, baking at 160 ° C. for 90 minutes while pressurizing in an oven, curing the resin,
Cut into individual panels. This panel is heated at 150 ° C for 10
After vacuum annealing at ^-3 torr, the pressure was once returned to normal pressure in a nitrogen atmosphere, and liquid crystal was injected again in a vacuum atmosphere. For liquid crystal injection, put the panel in the chamber and at room temperature 10 ^-3 torr
After reducing the pressure, the liquid crystal injection hole was immersed in a liquid crystal tank, and the pressure was returned to normal pressure using nitrogen. After injecting the liquid crystal, the liquid crystal injection hole was sealed using a UV curable resin. The panel was heated to a temperature equal to or higher than the NI transition point to reorient the liquid crystal.

Next, a polarizing plate was attached to the two glass substrates of the panel, and the temperature was set to 50 ° C. and the pressure was set to 5 k in an autoclave.
Processing was performed under the conditions of gf / cm ² to complete the panel.

The cell gap of this panel was measured with a cell gap measuring device RETS-3000 manufactured by Otsuka Electronics Co., Ltd., and a uniform cell gap was obtained over the entire surface.

The panel lighting device L manufactured by Otsuka Electronics Co., Ltd.
As a result of lighting and observation by CD-7000, no display unevenness was observed, and good display characteristics were exhibited.

[Comparative Example 1] As shown in FIG. 3, all were the same as in Example 1 except that the black matrix was provided only in the display area.
A color filter was produced in the same manner as described above. Using this color filter, a liquid crystal display element was prepared in the same manner as in Example 1, and was lit by a panel lighting device. As a result, unevenness was observed in the peripheral gap and in the upper side of the panel.
When the cell gap of this panel was measured, the cell gap near the peripheral frame portion was widened by 0.2 to 0.3 μm, and when the panel was disassembled and observed, the spacer density in the peripheral portion was high. Further, when the panel was disassembled and the color filter on the upper side of the panel was observed, the surface of the color filter was found to be damaged.

Example 2 A color filter was produced in the same manner as in Example 1 except that no transparent protective film was formed, and a liquid crystal display device was produced. As a result of lighting the panel with a panel lighting device and observing it, neither display unevenness nor static electricity failure was observed, and good display characteristics were exhibited.

Example 3 A color filter was produced in the same manner as in Example 1 except that the black matrix was formed of CrOx, and further a liquid crystal display element was produced. As a result of lighting the panel with a panel lighting device and observing it, neither display unevenness nor static electricity failure was observed, and good display characteristics were exhibited.

[Embodiment 4] As shown in FIG. 4, the distance between the black matrix layer and the edge of the transparent substrate was 2 m in Embodiment 1.
A color filter was manufactured in the same manner except that a black matrix was formed on the entire surface except for m, and no ITO was formed on the transparent protective film. Using this color filter, a TFT array substrate to which a voltage was applied in the lateral direction with respect to the thickness of the liquid crystal display element was bonded in the same manner as in Example 1 to produce an IPS type liquid crystal display element. As a result of lighting the panel with a panel lighting device and observing it, neither display unevenness nor static electricity failure was observed, and good display characteristics were exhibited.

Example 5 A color filter was produced in the same manner as in Example 4 except that the distance between the black matrix layer and the edge of the transparent substrate was 5 mm, and a liquid crystal display device was produced. As a result of lighting the panel with a panel lighting device and observing it, neither display unevenness nor static electricity failure was observed, and good display characteristics were exhibited. As a result of measuring the cell gap of this panel, the variation in the gap of the entire CF was large. As a result of disassembling the panel and observing the color filters, variations in the spacer density were found throughout.

Comparative Example 2 A color filter was manufactured in the same manner as in Example 4 except that the distance between the black matrix layer and the edge of the transparent substrate was set to 7 mm. Up 2%.
Further, a liquid crystal display device was manufactured using this color filter. The panel was lit by a panel lighting device, and as a result of observation, gap unevenness occurred on the entire CF surface. When the cell gap of this panel was measured, the density of the spacer was found throughout.

Comparative Example 3 A color filter was produced in the same manner as in Example 1 except that the distance between the black matrix in the non-display area and the substrate cutting line was 7 mm, and a liquid crystal display element was produced. . As a result of lighting this panel with a panel lighting device and observing it, as in Comparative Example 1, unevenness in the peripheral gap and unevenness in the upper side of the panel occurred.

Example 6 A color filter was produced in exactly the same manner as in Example 1, except that the amount of carbon black in the black matrix was reduced and the volume resistivity of the black matrix layer was 1 × 10 ⁴ Ωcm. A liquid crystal display device was manufactured. As a result of illuminating the panel with a panel lighting element and observing it, neither display unevenness nor static electricity failure was observed, and good display characteristics were exhibited.

Example 7 A color filter was produced in exactly the same manner as in Example 1 except that the amount of carbon black in the black matrix was reduced and the volume resistivity of the black matrix layer was 1 × 10 ⁹ Ωcm. A liquid crystal display device was manufactured. As a result of illuminating the panel with a panel lighting element and observing it, neither display unevenness nor static electricity failure was observed, and good display characteristics were exhibited. As a result of measuring the cell gap of this panel, the gap at the peripheral portion was 0.05 to 0.1.
μm wide. As a result of disassembling the panel and observing the color filter, the spacer density in the peripheral portion was slightly increased, but no damage was found on the upper side of the panel.

Comparative Example 4 A color filter was produced in exactly the same manner as in Example 1 except that the amount of carbon black in the black matrix was reduced and the volume resistivity of the black matrix layer was 1 × 10 ¹⁰ Ωcm. A liquid crystal display device was manufactured.

As a result of lighting this panel with a panel lighting device and observing it, as in Comparative Example 1, unevenness in the peripheral gap and unevenness in the upper side of the panel occurred.

[0087]

According to the present invention, when a color filter and a liquid crystal display device are manufactured by providing a black matrix in a non-display area of a color filter, conventionally, a charge is peeled off from a hot plate, a chuck for transporting a substrate, etc. Static electricity generated due to frictional electrification at the time of application, liquid removal, rubbing treatment, etc. can be suppressed. Accordingly, it is possible to reduce the occurrence of defects caused by frictional charging, peeling charging, discharge between substrates, point defects due to particle attraction, and damage to the alignment film in the process.

[Brief description of the drawings]

FIG. 1 is a schematic surface view showing an example of the configuration of a color filter according to the present invention.

FIG. 2 is a schematic cross-sectional view illustrating an example of a configuration of a color filter according to the present invention.

FIG. 3 is a schematic surface view of a color filter produced in a comparative example of the present invention.

FIG. 4 is a schematic surface view of a color filter created in an example of the present invention.

[Explanation of symbols]

 1: display area of liquid crystal display element 2: black matrix frame of display area 3: non-display area black matrix 4: gap between black matrices 5: gap between black matrix and substrate edge 11: transparent substrate (glass substrate) 12 : Colored layer (R) 13: Colored layer (G) 14: Colored layer (B) 15: Transparent protective film 16: Transparent conductive film 17: Alignment film

Continued on the front page F term (reference) 2H025 AA19 AB13 AC01 AD03 BE01 CB25 CC12 DA04 FA29 2H048 BA02 BA11 BA15 BA16 BA20 BA28 BA29 BA30 BA54 BB02 BB14 BB15 BB28 BB37 BB44 2H091 FA02Y FA35Y FB02 FB04 GA05 GA04

Claims (5)

[Detailed description of the invention] [0001] A color filter having a black matrix layer and a three primary color layer in a display area on a transparent substrate, wherein the color filter has a black matrix layer in a non-display area and is provided in the non-display area. A black matrix layer having a volume resistivity of 1 × 10 ⁹ Ωcm or less. [0002] 2. A gap between black matrix layers provided within a non-display area of 20 mm from a display area black matrix frame is 5 mm or less.
The color filter according to 1. [0003] 3. The color filter according to claim 1, wherein the gap between the black matrix layer provided in the non-display area and the edge of the transparent substrate is 5 mm or less. [0004] 4. The color filter according to claim 1, wherein a transparent protective film is formed on the colored layer. [0005] 5. A black matrix layer comprising a resin and a light shielding material dispersed therein.
The color filter according to any of the above. [0006]