JP3358400B2 - Color liquid crystal display device - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color liquid crystal display device using a color filter having a spacer function.

[0002]

2. Description of the Related Art A conventional color liquid crystal display device generally has a thin film transistor (T) as shown in FIG. 1 in order to maintain the thickness (cell gap) of a liquid crystal layer.
Plastic beads or glass fibers are used as spacers between an electrode substrate provided with FT) or a plurality of scanning electrodes and a substrate on the color filter side. Since spacers such as plastic beads are scattered here,
The position (in-plane position) between the electrode substrate and the substrate on the color filter side is not determined.

JP-A-56-140324 and JP-A-63-143
82405, JP-A-4-93924, JP-A-5-196
946 proposes a liquid crystal display element using a structure in which colored layers forming a color filter are overlapped as a spacer.

[0004]

In a color liquid crystal display device using a plastic bead or the like as a spacer, the position of the spacer such as a plastic bead is not fixed, and the liquid crystal is scattered or transmitted by the spacer located on the pixel. There is a problem that the display quality of the display element is reduced.

A liquid crystal display element in which spacers such as plastic beads are scattered and used has the following other problems. That is, since the spacer is spherical or rod-shaped and comes in contact with a point or line during cell crimping,
There was a drawback that the alignment film and the transparent electrode were damaged, and display defects were likely to occur. Further, there is a disadvantage that the liquid crystal is contaminated by the damage of the alignment film and the transparent electrode, and the voltage is easily lowered.

In addition, since a step of uniformly dispersing the spacers is required or the particle size distribution of the spacers needs to be controlled with high precision, a liquid crystal display element having stable display quality can be provided by a simple method. It was difficult to get.

To solve these problems, Japanese Patent Application Laid-Open No.
40324, JP-A-63-82405, JP-A-4-93
924, JP-A-5-196946 describes two colors or three colors.
It has been proposed to use a structure in which colored layers of colors are overlapped as a spacer. The thickness (cell gap) of the liquid crystal layer actually obtained by these disclosed technologies is the thickness of one or two colored layers, and it is difficult to obtain a liquid crystal display device having a sufficient cell gap. Even if the cell gap can be maintained with the thickness of one or two layers, satisfactory reliability such as a decrease in the durability of the ITO film formed on the color filter due to an increase in the thickness of the colored layer. Is difficult to obtain.

Further, in practice, a transparent conductive film is also uniformly formed on a spacer having a structure in which colored layers are superposed, and is extremely different from the transparent conductive film and the circuit on the side of the active matrix substrate which is the opposite substrate. There has been a problem that there is a great risk of short circuiting due to close proximity and contact with a thin alignment film.

In view of the above problems, the present invention realizes a sufficient cell gap and avoids the risk of conduction between the spacer of the color filter and the active matrix substrate.
It is an object of the present invention to provide a liquid crystal display device that overcomes the above-mentioned conventional disadvantages.

[0010]

To achieve the above object, a color liquid crystal display device according to the present invention has the following arrangement.

That is, the present invention is a color filter in which one substrate is provided with a black matrix on a transparent substrate, and a plurality of colored layers of three primary colors are arranged thereon.
A color liquid crystal display device having a structure in which a liquid crystal layer is sandwiched between a pair of substrates, the other substrate being an active matrix substrate including a thin film transistor or a thin film diode, wherein the color liquid crystal display device satisfies the following. is there.

(A) The color filter has a spacer formed by laminating colored layers of three primary colors on a black matrix.

(B) The active matrix substrate has an insulating film at a portion in contact with the spacer of the color filter. (C) The active matrix substrate has an insulating film at a position where the active matrix substrate comes into contact with the spacer of the color filter. (D) The installation position of the insulating film substantially excludes an opening for display. (E) The insulating film is formed during the TFT forming process.
Etching the etching stopper film by patterning
This is an insulating film formed by being left behind.

[0014]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below.

The color filter used in the liquid crystal display device of the present invention is a color filter in which a black matrix is provided on a transparent substrate, and a plurality of colored layers of three primary colors are arranged thereon. The color filter is composed of a large number of picture elements, with a pixel covered by each colored layer of three primary colors as one picture element. The black matrix referred to here indicates a light shielding area arranged between pixels, and is provided to improve the display contrast of the liquid crystal display element.

The transparent substrate used in the color filter of the present invention is not particularly limited, and inorganic glass such as quartz glass, borosilicate glass, aluminosilicate glass, and soda lime glass having a surface coated with silica, Organic plastic films or sheets are preferably used.

A black matrix made of a light-shielding agent is provided on the transparent substrate. Among them, a resin black matrix made of a resin and a light-shielding agent can be preferably used.

As a light shielding agent for a black matrix,
In addition to metal oxides such as carbon black, titanium oxide, iron tetroxide, and chromium oxide, metal sulfides, and metals, red, blue,
A mixture of green pigments and the like can be used. Among them, carbon black is particularly preferable because of its excellent light shielding properties. Since carbon black having a good dispersion and a small particle diameter mainly exhibits a brownish color tone, it is preferable to mix a pigment of a complementary color to the carbon black to obtain an achromatic color.

The resin used for the black matrix is not particularly limited, but may be a photosensitive or non-photosensitive resin such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, and gelatin. Is preferably used. The resin for the black matrix is preferably a resin having higher heat resistance than the resin used for the pixel and the protective film, and a polyimide resin is preferably a resin having resistance to the organic solvent used in the process after the formation of the black matrix. Resins are particularly preferably used.

The polyimide-based resin is not particularly limited, but usually a polyimide precursor (n = 1 to 2) having a structural unit represented by the general formula (1) as a main component is prepared by heating or applying an appropriate catalyst to the polyimide precursor. What is converted is used suitably.

[0021]

Embedded image Further, the polyimide resin may contain a bond other than the imide bond such as an amide bond, a sulfone bond, an ether bond, and a carbonyl bond, in addition to the imide bond.

In the general formula (1), R ₁ is at least 2
A trivalent or tetravalent organic group having at least two carbon atoms. From the viewpoint of heat resistance, R ₁ is preferably a trivalent or tetravalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring and having 6 to 30 carbon atoms. Examples of R ₁ include phenyl, biphenyl, terphenyl, naphthalene, perylene, diphenylether, diphenylsulfone, diphenylpropane, benzophenone, biphenyltrifluoropropane, cyclobutyl, cyclopentyl, and the like. But not limited to these.

R ₂ is a divalent organic group having at least two or more carbon atoms. From the viewpoint of heat resistance, R ₂ contains a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring, and A divalent group having 6 to 30 carbon atoms is preferable. Examples of R ₂ include a phenyl group, a biphenyl group, a terphenyl group, a naphthalene group, a perylene group, a diphenylether group, a diphenylsulfone group, a diphenylpropane group, a benzophenone group, a biphenyltrifluoropropane group, a diphenylmethane group, a dicyclohexylmethane group, and the like. But not limited thereto. In the polymer having the structural unit (1) as a main component, R ₁ and R ₂ may each be composed of one of them, or may be a copolymer composed of two or more of each. . Further, in order to improve the adhesiveness to the substrate, it is preferable to copolymerize bis (3-aminopropyl) tetramethyldisiloxane having a siloxane structure as the diamine component as long as the heat resistance is not reduced.

Specific examples of the polymer having the structural unit (1) as a main component include pyromellitic dianhydride, 3, 3
', 4,4'-benzophenonetetracarboxylic dianhydride, 3,3', 4,4'-biphenyltrifluoropropanetetracarboxylic dianhydride, 3,3 ', 4,4'-
Biphenylsulfonetetracarboxylic dianhydride, 2,
At least one carboxylic acid dianhydride selected from the group consisting of 3,5, -tricarboxycyclopentylacetic acid dianhydride and the like, and paraphenylenediamine, 3,3'-diaminodiphenyl ether, 4,4 ' -Diaminodiphenyl ether, 3,4 'diaminodiphenyl ether, 3,3
Polyimide synthesized from one or more diamines selected from the group of '-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodicyclohexylmethane, 4,4'-diaminodiphenylmethane Precursors, but are not limited thereto.
These polyimide precursors are synthesized by a known method, that is, by selectively combining tetracarboxylic dianhydride and diamine and reacting them in a solvent.

When the resin for the black matrix is polyimide, the black paste solvent is usually N-methyl-2-pyrrolidone, N, N-dimethylacetamide,
Amide polar solvents such as N, N-dimethylformamide and lactone polar solvents such as γ-butyrolactone are preferably used.

As a method of dispersing a light-shielding agent such as a complementary color pigment in carbon black or carbon black,
For example, there is a method in which a light-shielding agent, a dispersant, and the like are mixed in the polyimide precursor solution and then dispersed in a disperser such as a three-roll mill, a sand grinder, and a ball mill, but the method is not particularly limited. In addition, various additives may be added for improving the dispersibility of carbon black, or for improving applicability and leveling property.

As a method for producing the resin black matrix,
After applying and drying the black paste on the transparent substrate, patterning is performed. As a method for applying the black paste, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are suitably used. After that, heat drying (semi-curing) using an oven or a hot plate is performed. Do. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

In the case where the resin is a non-photosensitive resin, the black paste film thus obtained is formed after forming a positive photoresist film on the non-photosensitive resin. In some cases, exposure and development are performed as they are or after forming an oxygen barrier film. If necessary, remove the positive photoresist or oxygen barrier film,
Further, it is heated and dried (this cure). These curing conditions are slightly different depending on the coating amount when a polyimide resin is obtained from the precursor, but it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a black matrix is formed on the transparent substrate.

The thickness of the resin black matrix used in the present invention is preferably 0.5 to 1.5 μm, more preferably 0.8 to 1.2 μm. As described later, the thickness of the resin black matrix is important in securing the cell gap of the liquid crystal display element. When the thickness is smaller than 0.5 μm, it becomes difficult to secure a sufficient cell gap, It is not preferable because the light-shielding property becomes insufficient. When the thickness is more than 1.5 μm, the light-shielding property can be secured, but the flatness of the color filter is easily sacrificed, and a step is easily generated. When a surface step occurs, even if a transparent conductive film or a liquid crystal alignment film is formed on the color filter, the step is hardly reduced, and the alignment treatment by rubbing of the liquid crystal alignment film becomes non-uniform, and the cell gap varies. For example, the display quality of the liquid crystal display element is degraded. To reduce the surface step, it is effective to provide a transparent protective film on the colored layer, but it is disadvantageous in that the structure of the color filter becomes complicated and the production cost increases.

The light-shielding property of the resin black matrix is represented by an OD value (common logarithm of a reciprocal of transmittance).
In order to improve the display quality of the liquid crystal display device, it is preferably at least 2.5, more preferably at least 3.0. The preferred range of the thickness of the resin black matrix has been described above, but the upper limit of the OD value should be determined in relation to this.

The reflectance of the resin black matrix is a reflectance (Y value) corrected for visibility in a visible region of 400 to 700 nm in order to reduce the influence of reflected light and improve the display quality of a liquid crystal display device. It is preferably at most 2%, more preferably at most 1%. Usually, (20 to 200) μm × (20 to 300) μ is provided between the resin black matrices.
m openings are provided, and a plurality of colored layers of three primary colors are arranged so as to cover at least the openings.

The coloring layer constituting the color filter contains at least three primary colors. That is, when color display is performed by the additive method, red (R), green (G), and blue (B)
When the color display is performed by the subtractive color method, the three primary colors of cyan (C), magenta (M), and yellow (Y) are selected. Generally, a picture element for color display can be formed by using an element including these three primary colors as one unit. For the coloring layer, a resin colored with a coloring agent is used.

As the coloring agent used in the coloring layer, organic pigments, inorganic pigments, dyes, and the like can be suitably used.
Further, various additives such as an ultraviolet absorber, a dispersant, and a leveling agent may be added. As the organic pigment, phthalocyanine-based, aziraki-based, condensed azo-based, quinacridone-based, anthraquinone-based, perylene-based, and perinone-based pigments are preferably used.

As the resin used for the colored layer, a photosensitive or non-photosensitive material such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, and gelatin is preferably used. It is preferable to disperse or dissolve the colorant in these resins for coloring. As the photosensitive resin, there are types such as a photodecomposable resin, a photocrosslinkable resin and a photopolymerizable resin, and in particular, a monomer, an oligomer or a polymer having an ethylenically unsaturated bond and an initiator which generates a radical by ultraviolet rays. A photosensitive composition, a photosensitive polyamic acid composition, and the like are preferably used. As the non-photosensitive resin, those which can be developed with the above-mentioned various polymers are preferably used. However, heat-resistant resins capable of withstanding such heat in the process of forming a transparent conductive film and the process of manufacturing a liquid crystal display device are preferably used. Is preferable, and a resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display device is preferable. Therefore, a polyimide resin is particularly preferably used.

As a method of forming a colored layer, a colored paste is applied on a substrate on which a resin black matrix is formed, dried, and then patterned. As a method of obtaining a colored paste by dispersing or dissolving the colorant, after mixing the resin and the colorant in a solvent, three-roll, sand grinder, there is a method of dispersing in a dispersing machine such as a ball mill, The method is not particularly limited.

As a method for applying the colored paste, a dipping method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, or the like is preferably used, as in the case of the black paste. Heat drying (semi-cure) is performed using a plate.
The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes. When the resin is a non-photosensitive resin, the colored paste film thus obtained is formed after forming a positive photoresist film thereon, or when the resin is a photosensitive resin. Exposure / development is performed as it is or after forming an oxygen barrier film. If necessary, the positive photoresist or the oxygen blocking film is removed, and the film is dried by heating (this cure). The curing conditions vary depending on the resin, but when a polyimide resin is obtained from the precursor, it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a patterned colored layer is formed on the substrate on which the black matrix is formed.

After the first color layer is formed over the entire surface of the substrate on which the resin black matrix is formed as described above, unnecessary portions are removed by photolithography, and the desired first color layer is removed. Form a pattern. In this case, the colored layer is left at least in the portion covering the opening of the resin black matrix and in the portion where the spacer is formed by laminating the colored layer. The same operation is repeated for the second color and the third color to form a colored layer such that one colored layer remains on the opening of the resin black matrix and three colored layers remain on the spacer. The coloring layer on the opening and the coloring layer forming the spacer may be continuous or separated. However, when the ITO film formed on the color filter is disconnected between the coloring layer and the spacer on the opening to prevent conduction between the color filter and the counter substrate, the coloring layer and the spacer on the opening are formed. It is preferable that the color layer is separated and fractionated.

The thickness of the three primary color layers is not particularly limited, but is preferably 1 to 3 μm per layer. In this case, the total thickness of the three primary color layers is 3 to 9 μm
Becomes When the total thickness is less than 3 μm, a sufficient cell gap cannot be obtained, and when the total thickness exceeds 9 μm, uniform application of the colored layer becomes difficult, and furthermore, a transparent conductive film formed on the color filter Is undesirably reduced in reliability.

When the cell gap is maintained by using the color filter of the present invention, for example, R, G,
When B is selected, the film thickness of G + B + Bk (resin black matrix) for R, and B + R + Bk for G
The film thickness of R + G + Bk for B corresponds to the cell gap in the liquid crystal display device. In the case of increasing the dispersibility of the coloring agent in the paste for forming the coloring layer or improving the leveling property for the purpose of uniform application, the height of the spacer formed by stacking the coloring layers of the three primary colors is determined by the pixel. It is smaller than the sum of the film thicknesses of the three primary color layers in the portion. That is, the cell gap becomes smaller than the film thickness of G + B + Bk for R, similarly becomes smaller than the film thickness of B + R + Bk for G, and smaller than R + G + Bk for B.

In the present invention, a spacer formed by laminating colored layers of three primary colors is formed on a resin black matrix, and the area and arrangement of the spacer face the color filter when a liquid crystal display element is manufactured. It is greatly affected by the structure of the active matrix substrate. It if there is no restriction of the transparent electrode substrate facing Therefore, the area and location of the spacer is not particularly limited, considering the size of the pixel, the area per single spacer is 10μm ² ~1000μm ² Is preferred. If it is smaller than 10 μm ² , it is difficult to form and laminate a precise pattern, and if it is larger than 1000 μm ² , it will be difficult to completely arrange it on a black matrix depending on the shape of the spacer portion.

Further, according to the present invention, the active matrix substrate has an insulating film at a portion in contact with the spacer of the color filter. The transparent conductive film is also formed uniformly on the spacer, and the transparent conductive film and the circuit on the side of the active matrix substrate, which is the opposite substrate, come into close proximity to and contact with the extremely thin alignment film, resulting in an electrical short circuit. The danger is great. The portion of the insulating film that is in contact with the spacer is selected from an inorganic oxide or polymer having a large resistance value. As the inorganic oxide, for example, SiNx (silicon nitride), Si
O ₂ (silicon oxide), Al ₂ O ₃ (alumina), TaOx (tantalum oxide), MoOx (molybdenum oxide), Cr ₂ O ₃ (chromium oxide), TiO ₂ (titania), ZrO ₂ (zirconia), CeO ₂ (Cerium oxide), MgO (magnesium oxide), BeO (beryllium oxide), and the like. Any polymer may be used as long as it maintains insulation and is insoluble in liquid crystal, such as polyimide, epoxy resin, and acrylic resin.

The insulating film at the portion in contact with the spacer is made of T
Installed during the FT forming process. The installation position of the insulating film can be arbitrarily selected except for the opening for display. It may be provided on the TFT or on the wiring, or it may be installed avoiding them. However, the insulating area is set to be larger than the area of the spacer so as to prevent conduction even if the position is slightly shifted.

By providing the insulating film on the active matrix substrate side, the risk of conduction between the spacer of the color filter and the active matrix substrate can be more reliably avoided. In addition, the insulating film is formed by etching.
Topper film is left unetched by patterning
By doing so, the insulating film installed during the TFT formation process
is there.

Next, the color liquid crystal display device of the present invention will be described.

The color liquid crystal display device of the present invention is produced by making the above color filter and the transparent electrode substrate face each other. The color filter may be provided with a transparent protective film on the colored layer as required, but the configuration is complicated and disadvantageous in terms of manufacturing cost. Further, a transparent electrode such as an ITO film is formed on the color filter. As the transparent electrode substrate facing the color filter, a transparent electrode such as an ITO film is provided in a pattern on the transparent substrate. On the transparent electrode substrate, in addition to the transparent electrode, a thin film transistor (TFT) element, a thin film diode (TFD) element, and an insulating portion of the present invention are provided together with a scanning line, a signal line, and the like. Can be created. A liquid crystal alignment film is provided on the color filter having a transparent electrode and the transparent electrode substrate, and is subjected to an alignment process such as rubbing. After the alignment treatment, the color filter and the transparent electrode substrate are bonded to each other using a sealant, and after the liquid crystal is injected from an injection port provided in the seal portion, the injection port is sealed. The module is completed by mounting an IC driver or the like after attaching the polarizing plate to the outside of the substrate.

The color liquid crystal display device of the present invention is used for display screens of personal computers, word processors, engineering workstations, navigation systems, liquid crystal televisions, videos, etc., and is also suitable for liquid crystal projection for providing clear images. Used for

Hereinafter, the present invention will be described in more detail with reference to preferred embodiments, but the efficacy of the present invention is not limited by the embodiments used.

[0048]

【Example】

(Preparation of resin black matrix) 3, 3 ', 4, 4'
-Biphenyltetracarboxylic dianhydride, 4,4'-diaminodiphenyl ether, and bis (3-aminopropyl) tetramethyldisiloxane with N-methyl-2
The reaction was carried out using pyrrolidone as a solvent to obtain a polyimide precursor (polyamic acid) solution.

A carbon black mill base having the following composition was dispersed at 7000 rpm for 30 minutes using a homogenizer, and the glass beads were filtered to prepare a black paste.

Carbon black mill base Carbon black (MA100, manufactured by Mitsubishi Kasei Corporation) 4.6 parts Polyimide precursor solution 24.0 parts N-methylpyrrolidone 61.4 parts Glass beads 90.0 parts 300 × 350 mm size A black paste is applied on a non-alkali glass (OA-2, manufactured by NEC Corporation) substrate using a spinner, and is then placed in an oven at 135 ° C.
For 20 minutes. Subsequently, a positive resist (Shipley “Microposit” RC100 30 cp) was applied using a spinner and dried at 90 ° C. for 10 minutes. The resist film thickness is 1.
The thickness was 5 μm. Exposure machine PLA-501 manufactured by Canon Inc.
Using F, exposure was performed through a photomask.

Next, an aqueous solution containing 2% by weight of tetramethylammonium hydroxide at 23 ° C. was used as a developer.
The substrate was dipped in a developing solution, and simultaneously, the substrate was swung so as to make one reciprocation in a width of 10 cm in 5 seconds, thereby simultaneously developing the positive resist and etching the polyimide precursor. The development time was 60 seconds. After that, the positive resist was stripped with methylcellosolve acetate,
After curing at 300 ° C. for 30 minutes, a resin black matrix substrate was obtained. The thickness of the resin black matrix is 0.9
0 μm, and the OD value was 3.0. The reflectance (Y value) at the interface between the resin black matrix and the glass substrate was 1.2%.

(Formation of Colored Layer) Next, as red, green and blue pigments, dianthraquinone pigments represented by Color Index No. 65300 Pigment Red 177, Color Index No. 74265, respectively.
A phthalocyanine green pigment represented by Pigment Green 36 and a phthalocyanine blue pigment represented by Color Index No. 74160 Pigment Blue 15-4 were prepared. Each of the above pigments was mixed and dispersed in a polyimide precursor solution, and red,
Green and blue colored pastes were obtained. First, apply a blue paste on a resin black matrix substrate,
For 10 minutes with hot air and semi-cure at 120 ° C. for 20 minutes. After this, a positive resist (Shipley "Microposit" R
C100 30cp) was applied by a spinner and dried at 80 ° C for 20 minutes. Exposure is performed using a mask, and an alkali developer (Shiple
y The substrate was dipped in “Microposit” 351), and the development of the positive resist and the etching of the polyimide precursor were simultaneously performed while simultaneously swinging the substrate. After that, the positive resist is peeled off with methylcellosolve acetate,
Furthermore, it was cured at 300 ° C. for 30 minutes. The thickness of the colored pixel portion was 2.0 μm. By this patterning, the first step of the spacer was formed on the resin black matrix together with the formation of the blue pixel.

After washing with water, the second stage of the spacer was formed on the resin black matrix in the same manner as the formation of the red pixel. The thickness of the red pixel portion was 1.8 μm.

Further, after washing with water, the third step of the spacer was formed on the resin black matrix together with the formation of the green pixel in the same manner to form a color filter. The thickness of the green pixel portion was 1.9 μm.

The area of the spacer portion provided on the resin black matrix by laminating the colored layers was about 100 μm ² per one. The height of the spacer (thickness of three colored layers on the resin black matrix) is 5.0 μm
Which is lower than the total thickness (5.7 μm) of each colored layer. The spacer was provided in the screen at a rate of one per pixel. Also, spacers were provided on a part of the frame formed of a resin black matrix around the screen by color overlapping at the same density as in the screen.

(Preparation of Color Liquid Crystal Display Element) An ITO film was formed as a mask on the color filter by a sputtering method. The thickness of the ITO film was 1500 angstroms, and the surface resistance was 20 Ω / □. This ITO
A polyimide-based alignment film was provided on the film, and a rubbing treatment was performed. On the other hand, a transparent electrode substrate provided with a TFT (thin film transistor) element was prepared as follows.

First, chromium was deposited on a transparent alkali-free glass substrate (OA-2, manufactured by NEC Corporation) by vacuum evaporation, and the gate electrode was patterned by a photoetching technique. Next, a silicon nitride film (SiNx) having a thickness of about 5000 angstroms was formed by plasma CVD to form an insulating film. Subsequently, an amorphous silicon film (a-Si) and SiNx as an etching stopper film layer were continuously formed.
Next, SiNx of the etching stopper layer was patterned by a photo-etching technique. At this time, the portion in contact with the spacer was not etched, and the area per piece was left at about 250 μm ² . Film formation and patterning of n + a-Si for obtaining an ohmic contact, and further, film formation and patterning of a transparent electrode (ITO) serving as a display electrode. At this time, a portion in contact with the spacer was etched to form a portion where there was no transparent electrode having an area of about 250 μm ² per piece and the underlying SiNx was exposed. In addition, the entire surface of aluminum as the wiring material is deposited,
When the drain electrode and the source electrode were formed by the photo-etching method, aluminum deposited on the exposed portion of SiNx having an area of about 250 μm ² , which was to be in contact with the spacer, was removed by etching. Using the drain electrode and the source electrode as masks, the n + a-Si in the channel portion was removed by etching to complete the TFT.

Finally, a polyimide-based alignment film was provided similarly to the color filter, and rubbing treatment was performed.

After the color filter provided with the alignment film and the transparent electrode substrate provided with the thin film transistor element were bonded together using a sealant, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After the liquid crystal was injected, the injection port was sealed, and a polarizing plate was bonded to the outside of the substrate to form a cell. The obtained liquid crystal display element had good display quality.

[0060]

According to the color filter of the present invention, a spacer formed by laminating colored layers is provided on a resin black matrix, and an insulating portion is provided on the active matrix side. The following effects can be obtained when it is created.

(1) Since the spacer does not exist on the pixel portion, the display quality is not degraded due to the scattering or transmission of light by the spacer, and the display contrast is particularly improved.

(2) Since the spacer is in contact with the transparent electrode substrate facing the surface, the alignment film and the transparent electrode are less damaged, and a display with less defects is obtained.

(3) The step of dispersing the spacer is not required, and the manufacturing process of the liquid crystal display element is simplified.

(4) It is not necessary to control the particle size distribution of the spacers with high precision, and the manufacture of the liquid crystal display element is facilitated.

(5) Since the cell gap is maintained by the film thickness of the resin black matrix and the two colored layers, a liquid crystal display element having a sufficient cell gap can be obtained.

(6) The durability of the ITO film on the color filter is good.

(7) The risk of an electrical short circuit between the transparent (common) electrode on the color filter and the transparent electrode or circuit on the active matrix substrate side via the ITO on the spacer can be avoided.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a color liquid crystal display element of the traditional.

[Explanation of symbols]

1, 13: transparent substrate (glass substrate ) 3 : colored layer (B) 4: colored layer (R) 5: colored layer (G) 6: transparent electrode 7, 9, alignment film 8: liquid crystal 10: pixel electrode 11 Insulating film 12 ... Attached electrode for liquid crystal drive circuit 14 ... Chrome black matrix 15 ... Protective film 16 ... Plastic beads

Continuation of the front page (56) References JP-A-4-93924 (JP, A) JP-A-3-59522 (JP, A) JP-A-5-273539 (JP, A) JP-A-3-142416 (JP) JP-A-7-49416 (JP, A) JP-A-7-84119 (JP, A) JP-A-7-35917 (JP, A) JP-A-7-49414 (JP, A) 7-191333 (JP, A) JP-A-7-168188 (JP, A) JP-A-7-84267 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) G02F 1/1339 500 G02F 1/1333 505 G02F 1/1335 500 G02F 1/1335 505 G02F 1/1368

Claims (15)

(57) [Claims] 1. One of the substrates is a color filter in which a black matrix is provided on a transparent substrate, and a plurality of colored layers of three primary colors are arranged thereon, and the other substrate is provided with a thin film transistor or a thin film diode. A color liquid crystal display device having a structure in which a liquid crystal layer is sandwiched between a pair of substrates as an active matrix substrate, wherein the color liquid crystal display device satisfies the following. (A) A color filter has a spacer formed by laminating colored layers of three primary colors on a black matrix. (B) On the color filter on which the spacer is formed,
An alignment film is provided, and a rubbing process is performed. (C) The active matrix substrate has an insulating film at a position where the active matrix substrate comes into contact with the spacer of the color filter. (D) The installation position of the insulating film substantially excludes an opening for display. (E) The insulating film has a pattern stopper which is an etching stopper film.
TF by being etched without being etched
An insulating film provided during the T forming step. 2. The color liquid crystal display device according to claim 1, further satisfying the following. ( F ) The insulating area of the insulating film is set to be larger than the area of the spacer so that conduction does not occur even if some displacement occurs. 3. The color liquid crystal display device according to claim 1, wherein a portion of the color filter on the active matrix substrate which is in contact with the spacer is on a thin film transistor and / or on a wiring. 4. The color liquid crystal display device according to claim 1, wherein the black matrix is a resin black matrix obtained by dispersing a light shielding agent in a resin. 5. The color liquid crystal display device according to claim 1, wherein the resin forming the black matrix is polyimide. 6. A black matrix having a thickness of 0.5 to 0.5.
The color liquid crystal display device according to claim 1, wherein the thickness is 1.5 μm. 7. The color liquid crystal display device according to claim 1, wherein the OD value of the black matrix is 2.5 or more. 8. The color liquid crystal display device according to claim 1, wherein the reflectance of the black matrix is 2% or less. 9. The sum of the film thicknesses of the three primary color layers is
The color liquid crystal display device according to claim 1, wherein the thickness is 3 to 9 μm. 10. The color liquid crystal display device according to claim 1, wherein the colored layer having three primary colors is made of polyimide. 11. A spacer formed by laminating colored layers of three primary colors has an area of 10 μm ^{2 to} 100 μm per spacer.
The color liquid crystal display device according to any one of claims 1 to 3, which has a thickness of 0 µm ² . 12. The method according to claim 1, wherein the insulating film at a position where the active matrix substrate contacts the spacer of the color filter is made of at least one inorganic oxide selected from the following group. Color liquid crystal display device. SiNx (silicon nitride), SiO ₂ (silicon oxide), Al ₂ O ₃ (alumina), TaOx (tantalum oxide), MoOx (molybdenum oxide), Cr ₂ O ₃ (chromium oxide), TiO ₂ (titania), ZrO ₂ (zirconia), CeO ₂ (cerium oxide), MgO (magnesium oxide), BeO (beryllium oxide) 13. The color liquid crystal display device according to claim 1, wherein the insulating film at a portion where the active matrix substrate contacts the spacer of the color filter is made of a polymer. 14. The color liquid crystal display device according to claim 13, wherein the polymer constituting the insulating film is polyimide. 15. The color liquid crystal according to claim 1, wherein the color layer on the opening for display and the color layer forming the spacer are separated and separated. Display element.