JP2001051266A - Color filter and liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent degradation of display quality caused by the scattering or transmission of light by forming a foundation of a black matrix layer and at least one or more kinds of colored layers of the three primary colors outside a screen and providing a resin pole on the foundation. SOLUTION: A foundation is formed of a black matrix layer, and at least one or more kinds of colored layers of the three primary colors outside a screen, and then a resin pole 1 is provided on the foundation. That is, the black matrix layer and one or two or more colored layers of three colored layers of the three primary colors may be laminated to be used as the foundation. The foundation is preferably constituted by forming at least one kind of colored layer of three colored layers of the three primary colors on a pattern of the black matrix. Wherein, the foundation preferably consists of a small number of layers to reduce variation in height of the foundation. Thereby, a display having few defects can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter used for a liquid crystal display device, a method of manufacturing the same, and a liquid crystal display device using the same.

[0002]

2. Description of the Related Art In order to maintain the thickness (cell gap) of a liquid crystal layer, a color liquid crystal display device conventionally used generally includes an electrode substrate having a thin film transistor (TFT), a plurality of scanning electrodes, and the like. Plastic beads or glass fibers are provided as spacers between the filter side substrate. Here, since spacers such as plastic beads are scattered in the airflow, it is not determined at which position (in-plane position) between the electrode substrate and the substrate on the color filter side.

[0003]

In a color liquid crystal display device in which plastic beads or the like are scattered in an air stream and used as spacers, the positions of the spacers such as the plastic beads are not determined, and light is scattered by the spacers located on the pixels. There is a problem that the display quality of the liquid crystal display device is deteriorated due to light transmission.

A liquid crystal display device in which spacers such as plastic beads are scattered and used has the following other problems. That is, since the spacer is spherical or rod-shaped and comes in contact with a point or line during cell crimping,
There was a drawback that the alignment film and the transparent electrode were damaged, and display defects were likely to occur. Further, the liquid crystal is contaminated due to the damage of the alignment film and the transparent electrode, and the voltage holding ratio is reduced, so that the display is likely to be uneven.

[0005] Further, in order to disperse the spacers uniformly in a stable air flow, the tact time is long and productivity is not good, or it is necessary to control the particle size distribution of the spacers by high-precision classification. Because of the cost, it was difficult to obtain a stable display quality liquid crystal display device by a simple method.

Accordingly, it has been invented to form a column functioning as a spacer on a color filter using a resin or the like. JP-A-8-114809 describes that a dummy spacer is provided outside an effective screen.
There is no specific description about a preferable configuration of the dummy spacer forming portion. FIG. 1 of JP-A-10-82909
C describes a method of forming a column with one resin layer on a color filter and functioning as a spacer. Also in the Japanese Patent Application Laid-Open No. H11-264, it is preferable to form a column in a non-display portion when forming a spacer on a color filter, but there is no specific description about the configuration of the column in the non-display portion. When a liquid crystal display device is manufactured according to the Japanese Patent Laid-Open Publication, the cell gap becomes narrower in the peripheral portion of the screen, and when the liquid crystal display device is turned on, interference fringes accompanying the cell gap change are observed, and the display quality is significantly reduced. there were.

As a result of intensive studies on the above problems, the present inventors have found that in order to make the cell gap in the display area uniform, it is necessary to sufficiently consider the configuration of the spacer in the non-display area. Completed the invention.

[0008]

To solve the above-mentioned problems, the present invention has the following arrangement.

(1) In a color filter having at least a black matrix layer, an opening portion of the black matrix, and a colored layer of each of the three primary colors provided in a part of the black matrix in the screen, and further provided with resin pillars, A color filter, wherein a base is formed of at least one of a black matrix layer and three primary color layers, and a resin pillar is further provided on the base.

(2) A base having a structure in which a black matrix pattern is formed outside the screen and at least one of the three primary color layers is laminated, and a resin column is further provided on the base. (1) The color filter according to (1),

(3) A base having a structure in which a pattern of a black matrix layer is not formed outside the screen and at least one of the three primary color layers is laminated, and a resin pillar is further provided on the base. (1) The color filter according to (1).

(4) A base having a structure in which a pattern of a black matrix layer is formed outside the screen and a coloring layer of three primary colors is not provided, and a resin pillar is further provided on the base. A) the color filter described.

(5) In a color filter having at least a black matrix layer, an opening of the black matrix, and a colored layer of each of the three primary colors provided in a part of the black matrix in the screen, and further provided with resin pillars, )
A frame formed of a black matrix layer at an inner peripheral portion of the screen, and (B) a base is formed on the frame by at least one of three primary color layers, and a resin pillar is further formed on the base. A color filter characterized by being provided.

(6) The color filter according to any one of (1) to (5), wherein the columns in the screen are formed on the colored layer.

(7) The color filter according to any one of (1) to (6), wherein a transparent protective film is formed on the coloring layer.

(8) The color filter according to any one of (1) to (7), wherein the black matrix layer is formed by dispersing at least a light shielding agent in a resin.

(9) The color filter according to any one of (1) to (8), wherein a transparent protective film is provided between the base and the pillar.

(10) The color filter according to any one of (1) to (8), wherein a transparent protective film is provided after the columns are formed.

(11) The color filter as described in any one of (1) to (10), wherein the resin pillar contains an acrylic resin.

(12) A liquid crystal display device using the color filter according to any one of (1) to (11).

[0021]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described in detail below.

The color filter of the present invention is one in which a plurality of pixels composed of colored layers are arranged on a substrate. A black matrix may be provided as needed. The black matrix referred to here generally indicates a light-shielding region arranged between pixels, and is provided to improve display contrast of a liquid crystal display device.

The substrate used for the color filter of the present invention is not particularly limited.
Inorganic glasses such as borosilicate glass, aluminosilicate glass, soda-lime glass having a silica-coated surface, and transparent substrates such as plastic films or sheets are preferably used.

A black matrix is formed on this substrate as needed. The black matrix may be formed of a metal such as chromium or nickel, or an oxide thereof, but it is preferable to form a resin black matrix composed of a resin and a light-shielding agent in view of manufacturing costs and waste disposal costs. It is also preferable to use a resin black matrix from the viewpoint of securing the height of the spacer. The resin used for the resin black matrix is not particularly limited, but is a photosensitive or non-photosensitive material such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, and gelatin. Is preferably used. The resin for the black matrix is preferably a resin having higher heat resistance than the resin used for the pixel and the protective film, and a polyimide resin is preferably a resin having resistance to the organic solvent used in the process after the formation of the black matrix. Resins are particularly preferably used.

The polyimide resin is not particularly limited, but usually a polyimide precursor (n = 1 to 2) having a structural unit represented by the general formula (1) as a main component is obtained by heating or an appropriate catalyst. What is converted is used suitably.

[0026]

Embedded image

Further, the polyimide resin may contain a bond other than the imide bond such as an amide bond, a sulfone bond, an ether bond, and a carbonyl bond, in addition to the imide bond.

In the general formula (1), R ₁ is at least 2
A trivalent or tetravalent organic group having at least two carbon atoms. From the viewpoint of heat resistance, R ₁ is preferably a trivalent or tetravalent group containing a cyclic hydrocarbon, an aromatic ring or an aromatic heterocyclic ring and having 6 to 30 carbon atoms.

Examples of R ₁ include phenyl, biphenyl, terphenyl, naphthalene, perylene, diphenyl ether, diphenylsulfone, diphenylpropane, benzophenone, biphenyltrifluoropropane, cyclobutyl, cyclopentyl. And the like, but are not limited thereto.

R_Two Has at least two carbon atoms
Is a divalent organic group, but from the viewpoint of heat resistance, R_Two Is a ring
Containing a hydrocarbon, an aromatic ring or an aromatic heterocycle, and
A divalent group having 6 to 30 carbon atoms is preferable. R_Two As an example
Phenyl, biphenyl, terphenyl, naph
Talene group, perylene group, diphenyl ether group, diphe
Nyl sulfone group, diphenylpropane group, benzopheno
Group, biphenyltrifluoropropane group, diphenyl
Methane group, dicyclohexylmethane group, etc.
However, it is not limited to these. Structural unit (1) as main component
Polymer is R ₁ , R_Two Is from one of each of these
It may be composed of two or more types.
It may be a copolymer. Furthermore, it improves adhesion to the substrate.
Diamine as long as heat resistance is not reduced.
As a component, bis (3-amino) having a siloxane structure
Propyl) tetramethyldisiloxane
Is preferred.

Specific examples of the polymer having the structural unit (1) as a main component include pyromellitic dianhydride, 3, 3
', 4,4'-benzophenonetetracarboxylic dianhydride, 3,3', 4,4'-biphenyltrifluoropropanetetracarboxylic dianhydride, 3,3 ', 4,4'-
Biphenylsulfonetetracarboxylic dianhydride, 2,
At least one carboxylic acid dianhydride selected from the group consisting of 3,5, -tricarboxycyclopentylacetic acid dianhydride and the like, and paraphenylenediamine, 3,3'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether 3,4 'diaminodiphenyl ether, 3,3
Polyimide synthesized from one or more diamines selected from the group of '-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodicyclohexylmethane, 4,4'-diaminodiphenylmethane Precursors, but are not limited thereto.
These polyimide precursors are synthesized by a known method, that is, by selectively combining tetracarboxylic dianhydride and diamine and reacting them in a solvent.

As a light shielding agent for a black matrix,
Metal oxide powders such as carbon black, titanium oxide, titanium oxynitride, and iron tetroxide, metal sulfide powders, metal powders, pigments, and mixtures thereof can be used. Among them, carbon black and titanium oxynitride are particularly preferable because of their excellent light-shielding properties. Since carbon black with a good dispersion and small particle size mainly exhibits a brownish color tone,
It is preferable to mix a pigment of a complementary color to carbon black to make it achromatic.

When the resin for the black matrix is polyimide, the black paste solvent is usually N-methyl-2-pyrrolidone, N, N-dimethylacetamide,
Amide polar solvents such as N, N-dimethylformamide and lactone polar solvents such as γ-butyrolactone are preferably used.

As a method of dispersing a light-shielding agent such as a pigment of a complementary color to carbon black or carbon black,
For example, there is a method in which a light-shielding agent, a dispersant, and the like are mixed in the polyimide precursor solution and then dispersed in a disperser such as a three-roll mill, a sand grinder, and a ball mill, but the method is not particularly limited. In addition, various additives may be added for improving the dispersibility of carbon black, or for improving applicability and leveling property.

As a method for producing the resin black matrix,
For example, there is a method of performing patterning after applying and drying a black paste on a substrate. As a method for applying the black paste, a dip method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are suitably used. After that, heat drying (semi-curing) using an oven or a hot plate is performed. Do. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

When the resin is a non-photosensitive resin, the black paste coating obtained in this manner is used after forming a photoresist coating thereon, or when the resin is a photosensitive resin. Is exposed or developed as it is or after forming an oxygen barrier film. If necessary, the photoresist or the oxygen blocking film is removed, and the film is dried by heating (this cure). These curing conditions are slightly different depending on the coating amount when a polyimide resin is obtained from the precursor, but it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, a black matrix is formed on the substrate.

The thickness of the resin black matrix used in the present invention is preferably 0.5 to 2.0 μm, more preferably 0.8 to 1.5 μm. As will be described later, the thickness of the resin black matrix is important for securing the cell gap of the liquid crystal display device. When the thickness is smaller than 0.5 μm, the light-shielding properties become insufficient, which is not preferable. When the film thickness is more than 2.0 μm, the light-shielding property can be secured, but the flatness of the color filter is sacrificed, and a step is likely to occur. When a surface step occurs, even if a transparent conductive film or a liquid crystal alignment film is formed on the color filter, the step is hardly reduced, and the alignment treatment by rubbing of the liquid crystal alignment film becomes non-uniform, and the cell gap varies. For example, the display quality of the liquid crystal display device is deteriorated. To reduce the surface step, it is effective to provide a transparent protective film on the colored layer, but it is disadvantageous in that the structure of the color filter becomes complicated and the production cost increases.

The light shielding property of the black matrix is O
It is represented by D value (common logarithm of the reciprocal of transmittance). In order to improve the display quality of the liquid crystal display device, the OD value is preferably 2.0 or more, more preferably 2.5 or more. Preferably it is 3.0 or more. The preferred range of the thickness of the resin black matrix has been described above, but the upper limit of the OD value should be determined in relation to this. O
For measurement of D value, microspectroscopic light MCPD2 manufactured by Otsuka Electronics Co., Ltd.
000 using a substrate on which a black matrix is not formed as a reference.

In order to reduce the influence of the reflected light and improve the display quality of the liquid crystal display device, the reflectance of the black matrix is 2 (the luminosity-corrected reflectance (Y value) in the visible region of 400 to 700 nm). % Or less, more preferably 1% or less. The reflectance was measured by using a microspectroscopic light MCPD2000 manufactured by Otsuka Electronics Co., Ltd. using an aluminum thin film as a reference.

Between the black matrices in the display screen,
Usually, an opening of (20 to 200) μm × (20 to 300) μm is provided, and a plurality of colored layers of three primary colors are arranged so as to cover at least this opening.

The coloring layer forming the pixels constituting the color filter contains at least three primary colors. That is,
When color display is performed by the additive color method, three primary colors of red (R), green (G), and blue (B) are selected. When color display is performed by the subtractive color method, cyan (C) and magenta (M) are used. ),
Three primary colors of yellow (Y) are selected. Generally, a picture element for color display can be formed by using an element including these three primary colors as one unit. For the coloring layer, a resin colored with a coloring agent is used.

As a coloring agent used in the coloring layer, an organic pigment, an inorganic pigment, a dye, and the like can be preferably used.
Further, various additives such as an ultraviolet absorber, a dispersant, and a leveling agent may be added. As the organic pigment, phthalocyanine-based, aziraki-based, condensed azo-based, quinacridone-based, anthraquinone-based, perylene-based, and perinone-based pigments are preferably used.

As the resin used for the colored layer, a photosensitive or non-photosensitive material such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, and gelatin is preferably used. It is preferable to disperse or dissolve the colorant in these resins for coloring. As the photosensitive resin, there are types such as a photodecomposable resin, a photocrosslinkable resin and a photopolymerizable resin, and in particular, a monomer, an oligomer or a polymer having an ethylenically unsaturated bond and an initiator which generates a radical by ultraviolet rays. A photosensitive composition, a photosensitive polyamic acid composition, and the like are preferably used. As the non-photosensitive resin, those which can be developed with the above-mentioned various polymers are preferably used. However, heat-resistant resins capable of withstanding such heat in the process of forming a transparent conductive film and the process of manufacturing a liquid crystal display device are preferably used. Is preferable, and a resin having resistance to an organic solvent used in a manufacturing process of a liquid crystal display device is preferable. Therefore, a polyimide resin is particularly preferably used.

As a method for forming a colored layer, for example,
There is a method of performing patterning after applying and drying a colored paste on a substrate. As a method of obtaining a colored paste by dispersing or dissolving the colorant, after mixing the resin and the colorant in a solvent, three-roll, sand grinder, there is a method of dispersing in a dispersing machine such as a ball mill, The method is not particularly limited.

As a method for applying the colored paste, a dipping method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are preferably used, as in the case of the black paste. Heat drying (semi-cure) is performed using a plate.
The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes.

When the resin is a non-photosensitive resin, the colored paste film obtained as described above is formed after forming a photoresist film thereon, or when the resin is a photosensitive resin. Is exposed or developed as it is or after forming an oxygen barrier film such as polyvinyl alcohol. If necessary, the photoresist or the oxygen blocking film is removed, and the film is dried by heating (this cure). The curing conditions are different depending on the resin. However, when a polyimide resin is obtained from the precursor, the curing condition is usually 1 to 6 at 200 to 300 ° C.
It is common to heat for 0 minutes. Through the above process, a patterned colored layer is formed on the substrate.

The column material formed on the screen or on the base includes epoxy resin, acrylic resin, urethane resin, polyester resin, polyimide resin, polyolefin resin, gelatin, novolak resin and naphthoquinonediadisulfone. A photosensitive or non-photosensitive resin material such as a mixture with an acid ester is preferably used. Among these resins, an acrylic resin or a polyimide resin is particularly preferably used because of ease of lamination. There are two types of photosensitive resin, a negative type and a positive type. In the present invention, either type may be used. However, when the size per column is small (100 μm ² or less), the positive type is preferable from the viewpoint of ease of pattern formation. On the other hand, a negative type is preferable from the viewpoint of productivity of column formation. The opening area of the photomask used for photolithographically processing the spacer with the negative type material is significantly smaller than that of the positive type. Therefore, even if the photomask becomes dirty during production,
In the case of a negative-type photomask, the probability that stains occur in the opening region is reduced. From such a point, a negative type is preferable from the viewpoint of productivity of column formation. As the negative material, an acrylic material is particularly preferable. Commercially available products include, for example, JSR's Optmer NN700 series and Optmer NN800 series, and Nippon Steel Chemical's V-25.
9PA and the like are preferred.

When the column material is photosensitive as described above, it is possible to simultaneously form the resin column and the transparent protective layer. In this case, for example, this is achieved by performing double exposure combining flash exposure of the entire surface and pattern exposure of the pillar portion. In the case of the negative type, the exposed area remains the pattern after development. Therefore, the integrated exposure amount of the resin column may be larger than that of the transparent protective layer. In the case of the positive type, the unexposed area remains after development, so that the integrated exposure amount of the resin column may be smaller than that of the transparent protective layer. As the non-photosensitive resin, those which can be developed with the above various polymers are preferably used.

In these resins, if necessary, various additives such as a coloring agent used in the resin black matrix and the coloring layer described above, an ultraviolet absorber, a dispersant, and a leveling agent are added. You may. Specifically, for example, as inorganic particles, silica, barium sulfate, barium carbonate, calcium carbonate, extender pigments such as talc, and black, red, blue, green and other coloring pigments, and alumina, zirconia, magnesia, beryllia, Ceramic powders such as mullite and cordierite, and glass-ceramic composite powders are used. Of the extender pigments, barite, barium sulfate, calcium carbonate, silica and talc are preferred. Further, metal oxide powders such as carbon black, titanium black, manganese oxide, iron tetrachloride, and aluminum oxide, metal sulfide powders, and metal powders may be used. The same material may be used as the coloring layer constituting the color filter, but it is formed separately from the formation of the pixels.

As a method of forming a resin pillar, for example, after an uncured resin material is applied to a substrate and dried,
There is a method of performing patterning. As a method of dispersing or dissolving the colorant in the resin material, after mixing the resin and the colorant in a solvent, there is a method of dispersing in a disperser such as a three-roll, sand grinder, ball mill, and the like. The method is not particularly limited.

As a method for applying the resin material, a dipping method, a roll coater method, a spinner method, a die coating method, a method using a wire bar, and the like are preferably used, as in the case of the black paste. Heat drying (semi-cure) is performed using a plate. The semi-curing conditions vary depending on the resin, solvent and paste applied amount, but it is usually preferable to heat at 60 to 200 ° C. for 1 to 60 minutes. The resin material film obtained in this manner, when the resin is a non-photosensitive resin, after forming a positive type or photoresist film thereon,
When the resin is a photosensitive resin, exposure and development are performed as it is or after forming an oxygen blocking film. If necessary, the photoresist or the oxygen blocking film is removed, and the film is dried by heating (this cure). The curing conditions vary depending on the resin, but when a polyimide resin is obtained from the precursor, it is generally heated at 200 to 300 ° C. for 1 to 60 minutes. Through the above process, columns are formed on the substrate.

The upper area of the resin column thus formed is preferably equal to or smaller than the lower area from the viewpoint of obtaining the strength of the column. If the lower area of the resin pillar is smaller than the upper area,
When manufacturing a liquid crystal display device, cracks may occur around the upper area. Here, the upper area and the lower area will be described with reference to an example of the shape of the resin pillar, as shown in FIG.

It is preferable that the areas of the surfaces facing the resin pillar and the pattern constituting the adjacent base are different from each other (FIG. 10). If the areas of the opposing surfaces are different from each other, it is possible to prevent variations in the thickness of the columns due to displacement during the formation of the resin layer.

From a similar viewpoint, the edge of the pattern forming the base and the edge of the pattern forming the pillar are 1.5 μm.
m or more. More preferably 2.5μ
m, more preferably 5 μm or more. When the edge of the pattern forming the pillar and the edge of the base are close to each other, the shape tends to be unstable when the pillar is formed. In particular, when pillars are formed by photolithography, the etching rate becomes unstable and the pillar area varies. In addition, the column edge is liable to crack or chip. When such a color filter in which columns having pattern edges close to each other is formed is used in a liquid crystal display device, cell gap instability due to variations in column area, and poor alignment due to cracks or chipping of column edges are likely to occur. A conductive film, a transparent protective film, or the like may be interposed between the resin pillar and the base.

A column material, a base material adjacent to the column material,
There is compatibility between the transparent protective films formed as necessary. This is explained by a difference in thermal expansion coefficient, a difference in Young's modulus, adhesion, heat resistance temperature and the like between materials. When the pillar is made of an acrylic material, the base and the transparent protective film are preferably made of a polyimide material, an acrylic material, or an epoxy material. Heat resistance above the temperature at which the columns harden is necessary for the base and for the transparent protective film (if formed between the base and the columns). For heat resistance, for example, it is preferable to expose the substrate to a temperature equal to or higher than the temperature at which the pillar was formed before the pillar was formed.

The resin pillars provided in the screen are formed after at least the black matrix layer, the openings of the black matrix, and the colored layers of the three primary colors are provided on a part of the black matrix in the screen. The pillar in the screen may be formed anywhere in the screen. Specifically, (1) on the black matrix layer, (2) one more colored layer is laminated on the black matrix layer, (3) a plurality of colored layers are laminated on the black matrix layer, (4) the colored layer Above (no black matrix layer below) is preferred.
However, since the thickness variation in the screen of each layer is directly connected to the variation in the column height in the screen, it is preferable that the column formation portion is formed of as few layers as possible. Therefore, it is more preferable that the column formation portion be (1) on the black matrix layer and (2) one more colored layer laminated on the black matrix layer. As described above, a conductive film, a transparent protective film, or the like may be interposed between the black matrix layer and / or the colored layer adjacent to the resin column. FIG. 4 shows an example of a pillar formed in the screen.

Next, columns formed outside the screen will be described. Outside the screen, a base is formed by at least one of the black matrix layer and the three primary color layers, and then a resin pillar is further provided on the base. That is, one of the black matrix layer and the three primary color layers may be used as a base, or two or more layers may be stacked and used as a base. For example, as the base, (1) a base provided with a black matrix layer and one of the three primary color layers, (2) a base provided with a black matrix layer and two layers of the three primary color layers, 3) a base on which three layers of the black matrix layer and the three primary color layers are stacked; (4) a base on which all four layers of the black matrix layer and three primary color layers are stacked; (5) a black matrix layer There is only a foundation. (2) to (4) as a specific configuration of the base, a configuration in which at least one of the three primary color layers is formed on the pattern of the black matrix layer, or a base of the three primary color layers. A configuration in which at least one of them is formed is preferable. However, in order to reduce the variation in the height of the base, the base is preferably composed of a small number of layers. Therefore, (1) a base in which one of the black matrix layer and one of the three primary color layers is stacked,
(2) A base in which two layers of a black matrix layer and three primary color layers are stacked, and (5) a base including only a black matrix layer are particularly preferable. Among (2), a configuration in which the base forms one of the three primary color layers on the pattern of the black matrix layer and a configuration in which the base forms two of the three primary color layers are preferable. . A plurality of types of bases may be formed outside the screen. In other words, by forming one or more types of bases of (1), (2), (3), (4), and (5), pillars can be formed in accordance with the unevenness formed on the substrate facing the color filter. The distance between the substrates inside and outside the screen becomes uniform, and a liquid crystal display device having a uniform cell gap can be obtained. The case where a base is formed by one of the coloring layers of the three primary colors and a resin pillar is further provided on the base will be described. As described above, after forming the first color layer on the entire surface of the substrate on which the black matrix is formed, unnecessary portions are removed by photolithography, and the desired pattern of the first color layer is removed from the screen. Formed inside and on the base. For the second color and the third color, the same operation is repeated in the screen to form a colored layer so that one colored layer remains on the pixel portion. Next, after forming a transparent conductive film in the screen, a resin layer is formed on the entire surface inside and outside of the screen, and unnecessary portions are removed by photolithography, and desired resin pillars are formed in the screen and on the base. Form. FIG. 1 shows an example of a base and columns formed outside the screen.

Next, the columns formed on the picture frame at the inner peripheral portion of the screen will be described. The frame is a non-display area on the inner edge of the screen. The picture frame is composed of a black matrix layer. On the base on the frame, after forming the base with at least one or more of the three primary color layers, a resin column is further provided on the base. That is, one of the three primary color layers
The layers may be used as a base, or two or more layers may be stacked and used as a base. For example, as a base, (1) 3
A base in which one of the primary color layers is laminated, a base in which two of the three primary color layers are laminated, and a base in which three of the three primary color layers are laminated. can give. However, in order to reduce the variation in the height of the base, it is preferable that the base be made of as few layers as possible.
Particularly preferred is a base in which one of the three primary color layers is stacked, and (2) a base in which two of the three primary color layers are stacked. The bases having different heights may be formed on the frame by changing the number and combination of the layers constituting the plurality of types of bases. That is, (1) and (2) may be formed on the frame in combination.
By using one or more types of bases of (1) and (2), columns can be formed in accordance with irregularities formed on a substrate opposed to a color filter, and a liquid crystal display device having a uniform cell gap can be obtained. . The case where a base is formed by one of the coloring layers of the three primary colors and a resin pillar is further provided on the base will be described. As described above, after forming the first color layer over the entire surface of the substrate on which the black matrix and the frame are formed, unnecessary portions are removed by photolithography, and the desired pattern of the first color layer is removed. Is formed in the screen and on the frame base. The same operation is repeated for the second color and the third color in the screen, and a colored layer is formed such that one colored layer remains on the pixel portion and one colored layer remains on the base. Next, after forming a transparent conductive film in the screen and forming a resin layer over the entire surface, unnecessary portions are removed by photolithography, and columns of a desired resin are formed in the screen and in the frame portion. FIG. 2 shows an example of a base and a pillar formed on a picture frame.

The coloring layer in the screen and the coloring layer forming the frame portion and / or the base outside the screen may be continuous or separated.

The pillars may be formed both on the outside of the screen and on the frame, or may be provided on either one of them. A base without columns may be provided.

As for the base, it is preferable that the upper area of the base thus formed is equal to or smaller than the lower area from the viewpoint of obtaining the strength of the spacer. If the lower area of the colored layer is smaller than the upper area, cracks may occur around the upper area when manufacturing a liquid crystal display device.

Also, it is preferable that the colored layers of at least two colors forming the spacers have different areas of the surfaces facing each other between the colored layers and the adjacent colored layers. If the areas of the opposing surfaces are different from each other, it is possible to prevent variations in the thickness of the spacer due to misalignment when forming the resin layer.

In the present invention, the area and location of the columns are greatly affected by the structure of the substrate facing the color filters when manufacturing a liquid crystal display device. Therefore, when there is no restriction on the opposing substrate side, the area and arrangement location of the spacer are not particularly limited, but considering the size of the pixel,
The upper area of columns formed in the screen is 10 μm ^{2 to} 100
It is preferably 0 μm ² . If less than 10 [mu] m ^2, it is difficult formation and lamination of precise pattern, also, is greater than 1000 .mu.m ^2, it depending on the shape of the spacer portion completely arranged in the black matrix portion corresponding in the display screen Becomes difficult. The area of pillars outside the screen and on the frame is 50 μm ^{2 to} 1,000,000 μm ²
Is preferred. This is because precise pattern processing is more difficult than on the screen because it is outside the screen, on the frame, or around the substrate.

In the present invention, the term "within the screen" refers to the area used for display inside the frame, including the frame. The term “outside the screen” refers to an area that is not used for display outside and does not include the frame. The seal portion is provided in a frame portion and / or an area outside the screen.

The total thickness of the layers including the pillars and the base is preferably 1 μm or more and 10 μm or less. If it is less than 1 μm, it becomes difficult to control the cell gap. On the other hand, if it is larger than 10 μm, it becomes difficult to form columns. The thickness of the resin layer of the column is determined by the relationship with the height of the base, but is preferably 0.2 μm or more and 5 μm or less from the viewpoint of ease of pattern formation.

In the present invention, if necessary, a conductive film necessary for driving the liquid crystal may be formed. The conductive film is manufactured through a method such as dipping, chemical vapor deposition, vacuum evaporation, sputtering, or ion plating. As the conductive film used in the present invention, those having a low resistance value, high transparency, and which do not impair color display characteristics are preferable. As a specific example of a typical transparent conductive film, indium tin oxide (ITO), zinc oxide, tin oxide, or an alloy thereof can be used. The thickness of such a transparent conductive film is 0.01 to 1 μm, preferably 0.1 to 1 μm.
03 to 0.5 μm. The order of forming the conductive film is not particularly limited, but it is preferable to form the base after driving the liquid crystal.
Further, it is preferable to form the electrode between the formation of the base and the formation of the column from the viewpoint of reducing display defects due to a short circuit between the electrode formed on the spacer and the electrode provided on the substrate facing the color filter.

The color filter may be provided with a transparent protective film on the colored layer if necessary. The transparent protective film is preferably formed after the base is formed or after the columns are formed. However,
When a transparent electrode is formed on a color filter, the transparent protective film is preferably formed before the formation of the transparent electrode in order to reduce loss of driving voltage.

The color filter of the present invention may include a thin film transistor element and a thin film diode (TFD) as necessary.
An element, a scan line, a signal line, and the like may be provided.

Next, a color liquid crystal display device manufactured by using the color filter of the present invention will be described. FIG. 8 shows an example of the color liquid crystal display device of the present invention. The color filter and the counter substrate are attached to each other. On the opposing substrate, besides the pixel electrode, a thin film transistor (TF)
T) A TFT liquid crystal display device can be manufactured by providing elements, scanning lines, signal lines, and the like. A liquid crystal alignment film is provided on the color filter and the counter substrate, and an alignment process such as rubbing is performed. After the alignment treatment, the color filter and the counter substrate are attached to each other using a sealant, and after the liquid crystal is injected from an injection port provided in the seal portion, the injection port is sealed. The module is completed by mounting an IC driver or the like after attaching the polarizing plate to the outside of the substrate.

The substrate facing the color filter of the present invention is preferably a substrate provided with a TFT element, and the TFT is preferably an amorphous silicon TFT.
And a low-temperature polysilicon TFT. In particular, in a substrate having a low-temperature polysilicon TFT, as a feature, in addition to the pixel driving TFT, a driving circuit in place of a crystalline silicon-LSI is integrally integrated on the substrate. In accordance with the unevenness generated by such a circuit pattern, a base is provided as necessary to form a pillar.

There is no particular limitation on the portion on the opposing substrate where the spacer contacts. A projection pattern having a role of a spacer may be provided.

The liquid crystal used is not particularly limited, but more preferably, a nematic liquid crystal or a smectic liquid crystal is used for obtaining a good display. The smectic liquid crystal includes a ferroelectric liquid crystal, an antiferroelectric liquid crystal, a thresholdless antiferroelectric liquid crystal, and the like.

Similarly, there is no particular limitation on the display method. For example, display methods using a nematic liquid crystal include a twisted nematic type (TN), a super twisted nematic type (STN), a vertical alignment type (VA), an in-plane switching type (IPS), and the like. Is raised. A system in which these liquid crystals are divided into alignments, for example, a display system in which vertical alignment is divided, for example, a so-called multi-domain vertical alignment type (MVA) (as a document, for example, (1) MV
A Alignment control technology in liquid crystal displays, P117
EKISHO Vol. 3 No. 2 1999, (2)
SID2000 25.3: An Ultra-hig
h-quality MVA-LCD Using a
NewMulti-Layer CF Resin
Spacer and Black-Matrix,
(3) SID2000 23.1: Fast-Switc
hing LCD with Multi-Domai
n Vertical Alignment Drive
en by an Oblique Electric
Field, (4) Patent Publication No. 2947350) and the like.

The color filter of the present invention and the color liquid crystal display device using the same are used for display screens of personal computers, word processors, engineering workstations, navigation systems, liquid crystal televisions, videos, etc. It is preferably used. Further, in the field of optical communication and optical information processing, it is suitably used as a spatial modulation element using a liquid crystal. A spatial modulation element modulates the intensity, phase, deflection direction, etc. of light incident on the element according to an input signal to the element, and is used for real-time holography, a spatial filter, incoherent / coherent conversion, and the like. It is.

[0075]

Hereinafter, the present invention will be described in more detail with reference to preferred embodiments, but the efficacy of the present invention is not limited by the embodiments used.

Example 1 (1. Preparation of color filter) (Preparation of resin black matrix) 3, 3 ', 4, 4'
-Biphenyltetracarboxylic dianhydride, 4,4'-diaminodiphenyl ether, and bis (3-aminopropyl) tetramethyldisiloxane with N-methyl-2
The reaction was carried out using pyrrolidone as a solvent to obtain a polyimide precursor (polyamic acid) solution.

A carbon black mill base having the following composition was dispersed at 7000 rpm for 30 minutes using a homogenizer, and the glass beads were filtered to prepare a black paste.

Carbon black mill base Carbon black (MA100, manufactured by Mitsubishi Kasei Corporation): 4.6 parts Polyimide precursor solution: 24.0 parts N-methylpyrrolidone: 61.4 parts Glass beads: 90.0 parts 300 × A black paste is applied on a 350 mm-sized non-alkali glass (OA-2, manufactured by NEC Corporation) substrate using a spinner, and placed in an oven at 135 ° C.
For 20 minutes. Subsequently, a positive resist (Shipley “Microposit” RC100 30 cp) was applied using a spinner and dried at 90 ° C. for 10 minutes. The resist film thickness is 1.
The thickness was 5 μm. Exposure machine PLA-501 manufactured by Canon Inc.
Using F, exposure was performed through a photomask having a pattern of a black matrix portion, a frame portion, and a base portion.

Next, an aqueous solution containing 2% by weight of tetramethylammonium hydroxide (TMAH) at 23 ° C. was used as a developing solution, and the substrate was dipped in the developing solution.
The substrate was oscillated so as to make one reciprocation of the cm width in 5 seconds, and the development of the positive resist and the etching of the polyimide precursor were simultaneously performed. The development time was 60 seconds. afterwards,
The positive resist was stripped with methylcellosolve acetate, and cured at 300 ° C. for 30 minutes to obtain a resin black matrix substrate having a pattern of a black matrix portion, a frame portion, and a base portion. The thickness of the resin black matrix was 0.90 μm, and the OD value was 3.0. The reflectance (Y value) at the interface between the resin black matrix and the glass substrate was 1.2%. The area of the base of the pillar by the resin black matrix outside the screen was about 50,000 μm ² .

(Formation of Colored Layer) Next, as red, green and blue pigments, a dianthraquinone pigment represented by Color Index No. 65300 Pigment Red 177, Color Index No. 74265, respectively.
A phthalocyanine green pigment represented by Pigment Green 36 and a phthalocyanine blue pigment represented by Color Index No. 74160 Pigment Blue 15-4 were prepared. Each of the above pigments was mixed and dispersed in a polyimide precursor solution, and red,
Green and blue colored pastes were obtained. First, a blue paste is applied on a substrate and dried with hot air at 80 ° C. for 10 minutes.
Semi-cure at 0 ° C for 20 minutes. Thereafter, a positive resist (Shipley "Microposit" RC100 30cp) was applied by a spinner, and dried at 80 ° C for 20 minutes. Exposure was performed using a mask, the substrate was dipped in an alkali developing solution (Shipley "Microposit" 351), and simultaneously developing the positive resist and etching the polyimide precursor were performed while simultaneously swinging the substrate. Thereafter, the positive resist was stripped with methyl cellosolve acetate, and cured at 300 ° C. for 30 minutes. The thickness of the colored pixel portion was 1.7 μm. By this patterning, a blue colored layer was further formed on the frame and on the black matrix base outside the screen together with the formation of the blue pixels. Foundation area approximately 25000Myuemu ² of the colored layer of offscreen blue area of the base of the blue color layers on the frame was about 500 [mu] m ^2. After washing with water, red pixels were formed in the same manner. No new pillar base was formed. The thickness of the red pixel portion was 1.8 μm. After washing with water, green pixels were formed in the same manner. The pillar base did not form. The thickness of the green pixel portion was 1.5 μm.

Next, an ITO film was formed as a mask by sputtering. The thickness of the ITO film was 150 nm, and the surface resistance was 20 Ω / □. After further washing with water,
The resin layer for the pillar was laminated. The polyimide precursor solution described above was used for the resin layer. The polyimide precursor solution was applied, dried with hot air at 90 ° C. for 15 minutes, and semi-cured at 125 ° C. for 20 minutes. After this, a positive resist (Shipley "M
After applying icroposit "RC100 30cp) with spinner, 80 ℃
For 20 minutes. Exposure was performed using a mask, the substrate was dipped in an alkali developing solution (Shipley "Microposit" 351), and simultaneously developing the positive resist and etching the polyimide precursor were performed while simultaneously swinging the substrate. Thereafter, the positive resist was stripped with methyl cellosolve acetate, and cured at 300 ° C. for 30 minutes. The thickness of the resin layer was 5.2 μm. By this patterning, pillars were formed in the screen and on the frame, and on the base of the black matrix outside the screen. The area above the resin pillar in the screen is about 120 μm ² , and the area below the resin layer is about 13 μm.
It was 0 μm ² . The area above the resin pillar on the picture frame is also about 12
Is 0 .mu.m ^2, under the area of the resin layer it was also about 130 .mu.m ^2. The upper area of the resin column outside the screen was about 10,000 μm ² (size 100 × 100 μm), and the lower area of the resin layer was about 12000 μm ² (size 110 × 110 μm). Note that one pillar in the screen was provided for every three pixels.

(2. Fabrication of Color Liquid Crystal Display Device) A polyimide-based alignment film was provided on the color filter and rubbed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. After a color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device had no short circuit between the color filter substrate and the opposing substrate, could secure a uniform cell gap, and had good display quality.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap of each liquid crystal display device from the edge of the screen to 2 cm inside the screen in 1 mm increments, the average value of the cell gap was 4.60 μm, the standard deviation was 0.016 μm, and the cell gap variation was small. A liquid crystal display device was obtained. The cell gap of the liquid crystal display device was determined by an LCD cell gap measurement device (manufactured by Otsuka Electronics, RETS-2000).

Comparative Example 1 (1. Production of Color Filter) In the same manner as in Example 1, a black matrix, a frame, red, blue and green pixels were formed. However, the base of the colored layer on the frame and the base of the black matrix layer and the colored layer outside the screen were not formed. Next, an ITO film was formed in the same manner as in Example 1 to form a pillar resin layer. The pillars were formed inside the screen, on the picture frame, and outside the screen.

(2. Production of Color Liquid Crystal Display) A liquid crystal display was produced in the same manner as in Example 1 using the above color filters. In the obtained liquid crystal display device, there was no short circuit between the color filter substrate and the opposing substrate, but unevenness in brightness and darkness such as interference fringes was observed around the screen, and degradation in display quality was visually recognized.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap in the same manner as in Example 1, the average value of the cell gap was 4.60 μm,
The standard deviation was 0.203 μm, and the cell gap variation was large.

Example 2 As in Example 1, black matrix, picture frame, red,
After forming blue and green pixels and forming pillar bases outside the screen and on the frame, a hydrolyzate of γ-aminopropylmethyldiethoxysilane (1 molar equivalent) and p- Phenylenediamine (0.5 molar equivalent), 3,
A solution of a curable composition (polyimide siloxane precursor) obtained by reacting with 3 ′, 4,4′-biphenyltetracarboxylic dianhydride (1 molar equivalent) is spin-coated, and the solution is treated at 280 ° C. for 40 minutes. Heat treatment was performed to form a 0.5 μm thick transparent protective film made of polyimidesiloxane. Thereafter, in the same manner as in Example 1, formation of an ITO film, lamination of a pillar resin layer, and the like were performed. Using this color filter substrate, a color liquid crystal display device was manufactured. In the obtained liquid crystal display device, there is no short circuit between the color filter substrate and the opposing substrate, a sufficient cell gap can be secured, and the overcoat film (transparent protective film) reduces the inclination around the spacer. In this case, poor display did not easily occur and the display quality was good.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap in the same manner as in Example 1, the average value of the cell gap was 4.20 μm,
The standard deviation was 0.013 μm, and the cell gap variation was small.

Example 3 As in Example 2, black matrix, picture frame, red,
Blue and green pixels were formed, and pillar bases were formed. However, the base of the colored layer was not formed on the frame. Next, in the same manner as in Example 2, a transparent protective film was formed, an ITO film was formed, and a column resin layer was formed. Pillars were formed inside and outside the screen. A liquid crystal display device was manufactured using the above color filters. A polyimide-based alignment film was provided on the color filter and rubbed. Further, a counter substrate with a transparent electrode provided with a low-temperature polysilicon type thin film transistor element was prepared, and a polyimide-based alignment film was similarly provided, followed by rubbing treatment. A color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant. A rod-shaped spacer was mixed in the sealing material. Next, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device is
There was no short circuit between the color filter substrate and the opposing substrate, a uniform cell gap was secured, and the display quality was good.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap in the same manner as in Example 1, the average value of the cell gap was 4.25 μm,
The standard deviation was 0.018 μm, and the cell gap variation was small.

Example 4 As in Example 3, black matrix, picture frame, red,
Blue and green pixels were formed, and pillar bases were formed. No base of colored layer was formed on the picture frame. The base outside the screen was not formed of a black matrix, but formed only of a colored layer. Next, as in the second embodiment, a transparent protective film is formed,
A film was formed, and a pillar resin layer was formed. Pillars were formed inside and outside the screen. A liquid crystal display device was manufactured using the above color filters. A polyimide-based alignment film was provided on the color filter and rubbed. Further, a counter substrate with a transparent electrode provided with a thin film transistor element was prepared, a polyimide-based alignment film was similarly provided, and a rubbing treatment was performed. In the counter substrate with the transparent electrode, a driving wiring pattern different from that of the third embodiment is formed in a column abutting portion outside the screen. A color filter provided with an alignment film and a transparent electrode substrate provided with a thin film transistor element were bonded together using a sealant. A rod-shaped spacer was mixed in the sealing material. Next, liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a cell. The obtained liquid crystal display device is
There was no short circuit between the color filter substrate and the opposing substrate, a uniform cell gap was secured, and the display quality was good.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap in the same manner as in Example 1, the average value of the cell gap was 4.05 μm,
The standard deviation was 0.020 μm, and the cell gap variation was small.

Example 5 As in Example 1, a black matrix, a picture frame, a red
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. However, different from Example 1, a light-shielding film in which a chromium-based metal was formed on a black matrix was used. Also, no transparent protective film was provided. Thereafter, in the same manner as in Example 1, formation of an ITO film, lamination of a pillar resin layer, and the like were performed. Using this color filter substrate, a color liquid crystal display device was manufactured. The obtained liquid crystal display device had no short circuit between the color filter substrate and the opposing substrate, a sufficient cell gap was secured, and had a good display quality.

Example 6 As in Example 1, a black matrix, a picture frame, a red
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. After forming an acrylic transparent protective film, lamination of a pillar resin layer and the like were performed. A photosensitive negative acrylic material was used as the column resin material. No ITO film was formed. A color liquid crystal display device was manufactured using this color filter substrate. As the substrate on the side opposite to the color filter, a substrate having a comb-shaped electrode of a pixel electrode and a common electrode and a thin film transistor was used. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device which does not have a common electrode on the color filter substrate side. The obtained liquid crystal display device also had a sufficient cell gap, and had good display quality with uniform cell gap accuracy.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap in the same manner as in Example 1, the average value of the cell gap was 3.85 μm,
The standard deviation was 0.008 μm, and the cell gap variation was small.

Example 7 As in Example 1, a black matrix, a picture frame, a red
Blue and green pixels were formed, and pillar bases were formed on the picture frame. After forming the epoxy-based transparent protective film, lamination of a pillar resin layer and the like were performed. After the formation of the ITO film, a photosensitive negative acrylic material was used as the column resin material. A color liquid crystal display device was manufactured using this color filter substrate. In the obtained liquid crystal display device, there is no short circuit between the color filter substrate and the opposing substrate, a sufficient cell gap can be secured, and the overcoat film (transparent protective film) reduces the inclination around the spacer. In this case, poor display did not easily occur and the display quality was good.

Based on such a method, 100 liquid crystal display devices were manufactured. As a result of measuring the cell gap in the same manner as in Example 1, the average value of the cell gap was 4.25 μm,
The standard deviation was 0.018 μm, and the cell gap variation was small.

Example 8 As in Example 1, a black matrix, a picture frame, a red
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. After forming the acrylic transparent protective film, a transparent conductive film (ITO film) was formed. Thereafter, lamination of the resin layer for the pillar was performed in the screen, on the frame, and outside the screen. As the column resin material, a photosensitive JSR negative type acrylic material (NN81) is used.
0 or NN700) or V-259 manufactured by Nippon Steel Chemical Co., Ltd.
PA was used.

For example, in the case of NN700, patterning of columns was performed as follows. First, NN700 is applied on a substrate by a slit die coater, and then coated on a hot plate.
Prebaking was performed at a contact temperature of 3 ° C. for 3 minutes. Next, the exposure machine (c
150, 20 using anon PLA-501F).
Irradiation was performed at 0, 250, and 300 mJ / cm2 (i-line).
After the exposure, development was carried out with a TMAH aqueous solution (0.15%). Next, the exposed product having the best shape after development was rinsed with ultrapure water for 60 seconds, and then post-baked (220 ° C. for 60 minutes in a clean oven). A pillar is formed by the above steps.

The columns NN810 and V-259PA were also formed on the color filter by optimizing the exposure conditions, prebake temperature and the like.

Using this color filter substrate, a color liquid crystal display device was manufactured. The substrate on the opposite side of the color filter has a pixel electrode, a thin film transistor, and the like.
The present color liquid crystal display device is a so-called TN liquid crystal display device. Regarding the obtained liquid crystal display device, both the one using NN810 and the one using NN700
In the case of using A, a sufficient cell gap was secured, and the display quality was uniform and the display quality was uniform.

Example 9 As in Example 1, black matrix, picture frame, red,
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. However, the base of the colored layer outside the screen and on the frame was formed of a red colored layer instead of a blue colored layer. After forming the acrylic transparent protective film, a transparent conductive film (ITO film) was formed.
Thereafter, lamination of the resin layer for the pillar was performed in the screen, on the frame, and outside the screen. As the column resin material, a photosensitive JSR negative type acrylic material (NN810 or NN700) or Nippon Steel Chemical's V-259PA was used. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has pixel electrodes, thin film transistors, and the like, but has an array structure different from that of the eighth embodiment. For example, the height and material of the portion where the column on the color filter side is abutted are different from those of the eighth embodiment. The present color liquid crystal display device is a so-called TN liquid crystal display device. The obtained liquid crystal display device is NN810
And NN700, V-25
The one using 9PA can secure a sufficient cell gap,
The display quality was uniform and the display quality was uniform.

Example 10 As in Example 1, black matrix, picture frame, red,
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. However, by changing the photomask, the base outside the screen and on the picture frame is divided into two parts: (1) where the red coloring layer is laminated on the black matrix and (2) where the green coloring layer is laminated on the black matrix. is there. Then, after forming an acrylic transparent protective film, a transparent conductive film (ITO film) was formed. Thereafter, a stack of pillar resin layers was formed at the locations (1) and (2). The column material used had the same composition as in Example 9. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has pixel electrodes, thin film transistors, and the like, but has an array structure different from that of the eighth embodiment. Embodiment 9 is different from Embodiment 9 in the configuration of the location where the column on the color filter side is abutted. Depending on the height and mechanical properties of the place where the column is abutted, the density distribution between the configuration with the column formed on (1) and the configuration with the column formed on (2) differs. This color liquid crystal display device
This is a so-called TN liquid crystal display device. Regarding the obtained liquid crystal display devices, those using NN810 and those using NN700 were able to secure a sufficient cell gap of V-259PA and had good display quality with uniform cell gap accuracy. Example 11 As in Example 8, a black matrix, a picture frame, red,
Blue and green pixels were formed, and pillar bases were formed. However, a photomask different from that in Example 8 was used, and no base was formed on the frame. The base outside the screen was not formed of a black matrix, but formed only of a colored layer. An acrylic transparent protective film was formed in the same manner as in Example 8, and an ITO film was formed.
SR negative acrylic material (NN810 or NN7
00) or V-259PA manufactured by Nippon Steel Chemical Co., Ltd. to form a pillar resin layer. Pillars were formed inside and outside the screen. Using this color filter substrate, a color liquid crystal display device was manufactured. The substrate on the opposite side of the color filter has a pixel electrode, a thin film transistor, and the like, but has a structure different from that of the eighth embodiment. The present color liquid crystal display device is a so-called TN type liquid crystal display device. The obtained liquid crystal display device had a sufficient cell gap and a good display quality with uniform cell gap accuracy.

Example 12 In each of Examples 8 to 11, a color filter substrate was produced using an epoxy-based transparent protective film or a polyimidesiloxane transparent protective film instead of an acrylic-based transparent protective film.
Using this color filter substrate, a color liquid crystal display was produced. The present color liquid crystal display device is a so-called TN type liquid crystal display device. The obtained liquid crystal display device had a sufficient cell gap and a good display quality with uniform cell gap accuracy.

Example 13 As in Example 1, a black matrix, a picture frame, a red
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. However, different from Example 1, a light-shielding film in which a chromium-based metal was formed on a black matrix was used. A photosensitive acrylic resin was used as a material for the colored layer.
Also, no transparent protective film was provided. Thereafter, in the same manner as in Example 1, formation of an ITO film, lamination of a pillar resin layer, and the like were performed. Using this color filter substrate, a color liquid crystal display device was manufactured. The present color liquid crystal display device is a so-called TN type liquid crystal display device. The obtained liquid crystal display device had a sufficient cell gap and a good display quality with uniform cell gap accuracy. Example 14 As in Example 6, a black matrix, a picture frame, red,
Blue and green pixels were formed, and pillar bases were formed outside the screen. However, no pillar base was formed on the picture frame. After forming an acrylic transparent protective film, lamination of a pillar resin layer and the like were performed. As the resin material for the pillar, a photosensitive negative acrylic material (Optomer NN700 and NN810 manufactured by JSR)
Alternatively, V-259PA manufactured by Nippon Steel Chemical was used. ITO
No film was formed. A color liquid crystal display device was manufactured using this color filter substrate. As the substrate on the side opposite to the color filter, a substrate having a comb-shaped electrode of a pixel electrode and a common electrode and a thin film transistor was used.
The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device which does not have a common electrode on the color filter substrate side. Both the one using NN700 and the one using NN800 series have V-259P
The liquid crystal display device using A also had a sufficient cell gap and a good display quality with uniform cell gap accuracy.

Example 15 As in Example 6, a black matrix, a picture frame, red,
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. After forming the acrylic transparent protective film, lamination of the pillar resin layer was performed inside the screen, on the frame, and outside the screen. As the column resin material, a photosensitive JSR negative type acrylic material (NN810 or NN700) or Nippon Steel Chemical V
-259PA was used. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a common electrode, a pixel electrode, a thin film transistor, and the like. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. The obtained liquid crystal display device using NN810, using NN700, or using V-259PA can secure a sufficient cell gap, and has good display quality with uniform cell gap accuracy. Met.

Example 16 As in Example 6, black matrix, picture frame, red,
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. However, the base of the colored layer outside the screen and on the frame was formed of a red colored layer instead of a blue colored layer. After forming the acrylic transparent protective film, laminate the resin layer for pillars in the screen, on the frame,
Went off the screen. Photosensitive JSR as a resin material for pillars
Negative type acrylic material (NN810 or NN70)
0) or V-259PA manufactured by Nippon Steel Chemical Co., Ltd. was used. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a common electrode, a pixel electrode, a thin film transistor, and the like, but has an array structure different from that of the fifteenth embodiment. For example, the height and material of the portion where the column on the color filter side is abutted are different from those of the fifteenth embodiment. The present color liquid crystal display device is a so-called TN liquid crystal display device. The obtained liquid crystal display device using NN810, using NN700, or using V-259PA can secure a sufficient cell gap, and has good display quality with uniform cell gap accuracy. Met.

Example 17 As in Example 6, a black matrix, a picture frame, red,
Blue and green pixels were formed, and pillar bases were formed outside the screen and on the frame. However, by changing the photomask, the base outside the screen and on the picture frame is divided into two parts: (1) where the red coloring layer is laminated on the black matrix and (2) where the green coloring layer is laminated on the black matrix. is there. Thereafter, after forming an acrylic transparent protective film, a stack of pillar resin layers was formed at the locations (1) and (2). The column material used had the same composition as in Example 9. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a common electrode, a pixel electrode, a thin film transistor, and the like, but is different from Example 16 in the configuration where the column on the color filter side abuts. Depending on the height and mechanical properties of the place where the column is abutted, the density distribution between the configuration with the column formed on (1) and the configuration with the column formed on (2) differs. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. The obtained liquid crystal display device uses NN810,
Both the one using 700 and the one using V-259PA were able to secure a sufficient cell gap, and had good display quality with uniform cell gap accuracy.

Example 18 As in Example 6, a black matrix, a picture frame, red,
Blue and green pixels were formed, and pillar bases were formed. However, a photomask different from that of Example 6 was used, and no base was formed on the frame. The base outside the screen was not formed of a black matrix, but formed only of a colored layer. In the same manner as in Example 6, an acrylic transparent protective film was formed, and a column resin layer was formed using a negative type acrylic material (NN810 or NN700) manufactured by JSR and V-259PA manufactured by Nippon Steel Chemical. Pillars were formed inside and outside the screen. A color liquid crystal display device was manufactured using this color filter substrate. The substrate on the opposite side of the color filter has a common electrode, a thin film transistor, a pixel electrode, and the like, but has a structure different from that of the seventeenth embodiment. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. The obtained liquid crystal display device uses NN810,
Both the one using 700 and the one using V-259PA were able to secure a sufficient cell gap, and had good display quality with uniform cell gap accuracy.

Example 19 In Examples 15 to 18, a color filter substrate was produced using an epoxy-based transparent protective film or a polyimidesiloxane transparent protective film instead of an acrylic-based transparent protective film.
Using this, a color liquid crystal display device was manufactured. The substrate on the opposite side of the color filter has a common electrode, a thin film transistor, a pixel electrode, and the like, but has a structure different from that of the seventeenth embodiment. The present color liquid crystal display device is a so-called in-plane switching type liquid crystal display device. Regarding the obtained liquid crystal display device, a device using an epoxy-based transparent protective film and a device using a polyimidesiloxane-based transparent protective film can secure a sufficient cell gap and have a good display quality with uniform cell gap accuracy. there were.

Example 20 In the same manner as in Example 5, a chromium-based BM was used, and a black matrix, a picture frame, and a pillar base were formed outside the screen. Next, using an acrylic coloring resin, a red pixel, a blue pixel, and a green pixel were formed, and a colored layer of a blue pixel was laminated on a black matrix base outside the screen to form a base. Then, after forming a transparent conductive film (ITO film), columns are formed on the base inside and outside the screen using an acrylic column material (NN700 or NN810 manufactured by JSR) or V-259PA manufactured by Nippon Steel Chemical. did. Using this color filter substrate, a color liquid crystal display device was produced. The present color liquid crystal display device is a so-called TN type liquid crystal display device. The obtained liquid crystal display device uses NN700,
Both those using N810 and those using V-259PA were able to secure a sufficient cell gap, and had good display quality with uniform cell gap accuracy.

Example 21 A plurality of square bases (size: 110 × 110 μm) of a blue coloring layer (thickness: 1.3 μm) were provided on a substrate. Next, a pillar (thickness of 4.2μ) was formed at the center on the base by photolithography.
m) was formed. The pillar material is NN810, NN700,
V-259PA was used. Pillar size target value is 90 × 9
0 μm (10 μm between the edge of the pillar pattern and the edge of the base pattern), 100 × 100 μm (5 μm), 10
3 × 103 μm (3.5 μm), 105 × 105 μm
(2.5 μm), 107 × 107 μm (1.5 μm)
m), 109 × 109 μm (0.5 μm), 109.
5 × 109.5 μm (0.25 μm), 110 × 11
0 μm (0 μm), 110.5 × 110.5 μm (0.25 μm), 111 × 111 μm (0.5 μm)
m), 113 × 113 μm (1.5 μm), 115 ×
115 μm (2.5 μm), 117 × 117 μm (3.5 μm), 120 × 120 μm (5 μm), 13
100 pieces each having a size of 0 × 130 μm (10 μm) were manufactured. The length of the prototype pillar was measured, and the range (maximum value-minimum value) was calculated from the maximum value and the minimum value. 90 × 9
0 μm to 107 × 107 μm and 113 × 113 to 1
At the level of 30 × 130 μm, the range of the column size was very small as compared with the other levels, and especially the pattern edge of the column was formed clearly.

[0113]

According to the color filter of the present invention, at least a black matrix layer, an opening of the black matrix, a colored layer of each of the three primary colors are provided on a part of the black matrix, and a resin column is provided. It is a color filter, and a black matrix layer and 3
A base is formed of at least one of the primary color layers, and a resin pillar is further provided on the base. Further, in a color filter provided with at least a black matrix layer, an opening of the black matrix, and a colored layer of each of the three primary colors in a part of the black matrix in the screen, and further provided with resin columns,
(A) a frame formed of a black matrix layer at the inner peripheral portion of the screen; (B) a base formed by at least one of the three primary color layers on the frame within the screen; A resin pillar is provided. Since the liquid crystal display device is manufactured using this, the following effects can be obtained. (1) The spacer does not exist on the pixel portion, and the display quality is not degraded due to the scattering or transmission of light by the spacer, and the display contrast is particularly improved. (2) When a conventional spherical spacer or rod-shaped spacer is used, since the spacer comes into contact with the substrate at a point or a line, the alignment film and the transparent electrode are damaged, and display defects appear. Since the spacer in the present invention comes in contact with the transparent electrode substrate facing the surface, the alignment film and the transparent electrode are less damaged and a display with less defects is obtained. (3) The step of dispersing the spacer is not required, and the manufacturing process of the liquid crystal display device is simplified. (4) It is not necessary to control the particle size distribution of the spacer with high precision, and the manufacture of the liquid crystal display device is facilitated. (5) It is possible to obtain a liquid crystal display device of high display quality without gap unevenness not only in the central part of the screen but also in the peripheral part of the screen. (6) The height of the base and the height of the columns are controlled according to the unevenness of the substrate facing the color filter, and the gap can be made uniform. (8) When forming an electrode layer, forming a colored layer and a base,
By forming the electrode layer and stacking the columns in this order, it is not necessary to form an electrode on the top of the columns. It is possible to prevent the occurrence of display defects caused by the electrodes formed on the pillars. (9) By providing a transparent protective film between the base and the pillar or after the pillar is formed, the reliability of the liquid crystal display device can be improved and the cell gap can be controlled.

[Brief description of the drawings]

FIG. 1 is an example of a cross-sectional view of an off-screen base and columns obtained by the present invention.

FIG. 2 is an example of a cross-sectional view of a base and a pillar of a picture frame in a screen obtained by the present invention.

FIG. 3 is an example of a diagram illustrating a frame of a pillar forming portion in a screen of a color filter and an outside of the screen.

FIG. 4 is an example of a sectional view of a column forming portion in a screen of a color filter according to the present invention.

FIG. 5 is an example of a cross-sectional view outside a screen of a conventional color filter having columns.

FIG. 6 is an example of a cross-sectional view of a frame of a conventional color filter having columns.

FIG. 7 is an example of a cross-sectional view of a liquid crystal display device using a color filter having a base and columns obtained according to the present invention.

FIG. 8 is an example of a cross-sectional view of a conventional liquid crystal display device using a color filter having columns.

FIG. 9 is a perspective view showing the shape of a resin layer of a pillar.

FIG. 10 is a perspective view showing the area of the opposite surface of a colored layer adjacent to a resin pillar.

[Explanation of symbols]

 1: Column 2: Glass substrate 3: Part of base using black matrix 4: Part of base using colored layer 4 ′: Part of base using colored layer 5: Transparent protective film 6: Picture frame 7 : Inside the screen 8: Outside the screen 9: Frame 10: Colored film 11: Colored film 12: Black matrix 13: Transparent conductive film 14: Pixel electrode 15: Alignment film 16: Liquid crystal 17: Sealant 18: Electrode 19: Upper area 20 : Lower area 21: Area of the surface where the pillar faces the adjacent base 22: Area of the surface where the base faces the pillar

 ──────────────────────────────────────────────────の Continued on the front page (72) Inventor Tomohiko Hatano 1-1-1 Sonoyama, Otsu City, Shiga Prefecture

Claims (12)

[Claims] 1. A color filter in which at least a black matrix layer, an opening of the black matrix, and a colored layer of each of the three primary colors are provided in a portion of the black matrix, and resin columns are provided. A color filter, wherein a base is formed by at least one of a black matrix layer and three primary color layers, and a resin pillar is further provided on the base. 2. A base having a structure in which a black matrix pattern is formed outside a screen and at least one of three primary color layers is laminated, and a resin column is further provided on the base. The color filter according to claim 1, wherein: 3. A base having a structure in which a pattern of a black matrix layer is not formed outside a screen and at least one of three primary color layers is laminated, and a resin pillar is further provided on the base. The color filter according to claim 1, wherein: 4. A base having a structure in which a pattern of a black matrix layer is formed outside the screen and a coloring layer of three primary colors is not laminated, and a resin pillar is further provided on the base. The color filter described. 5. A color filter in which at least a black matrix layer, an opening of the black matrix, and a colored layer of each of the three primary colors are provided in a screen, and resin columns are provided. (B) at least one of the three primary color layers on the frame,
A color filter, wherein a base is formed by seeds or more, and a resin pillar is further provided on the base. 6. The color filter according to claim 1, wherein the pillars in the screen are formed on a colored layer. 7. The color filter according to claim 1, wherein a transparent protective film is formed on the coloring layer. 8. The black matrix layer according to claim 1, wherein at least a light shielding agent is dispersed in a resin.
8. The color filter according to any one of items 7 to 7. 9. The color filter according to claim 1, wherein a transparent protective film is provided between the base and the pillar. 10. The color filter according to claim 1, wherein a transparent protective film is provided after the columns are formed. 11. The color filter according to claim 1, wherein the resin pillar contains an acrylic resin. 12. A liquid crystal display device using the color filter according to claim 1.