KR100752208B1 - Liquid crystal display and method for manufacturing the same - Google Patents

Abstract

The present invention is to provide a liquid crystal display device and a method of manufacturing the liquid crystal display to maintain a uniform density of the spacers scattered on the substrate, the liquid crystal display device according to the present invention is a plurality of gate lines intersected on the first substrate And a spacer movement formed by photoresist on the black matrix pattern and a thin film transistor formed at the intersection of the data line, each gate line, a color filter layer and a black matrix pattern formed on the second substrate, and a spacer to limit the movement of the spacer. And a liquid crystal layer formed between the prevention pattern and the first substrate and the second substrate, and the method of manufacturing the liquid crystal display device includes a TFT substrate, a color filter substrate, and a liquid crystal encapsulated therebetween. Forming a black matrix pattern on the insulating substrate, and using a photoresist on the black matrix pattern. Forming a spacer movement preventing pattern to limit the movement of the spacer; forming a color filter layer in a space between the black matrix patterns; forming a color filter substrate; and a liquid crystal between the TFT substrate facing the color filter substrate. It characterized by comprising a step of forming a layer.

Spacer, photoresist

Description

Liquid crystal display and method for manufacturing the same {Liquid crystal display and method for manufacturing the same}

1 is a cross-sectional view of a structure of a liquid crystal display device according to the prior art.

2 is a cross-sectional view of a structure of a liquid crystal display device according to a first embodiment of the present invention;

3A to 3C are cross-sectional views illustrating a method of manufacturing a liquid crystal display device according to a first embodiment of the present invention.

4 is a cross-sectional view of a structure of a liquid crystal display device according to a second embodiment of the present invention;

5A through 5C are cross-sectional views illustrating a method of manufacturing a liquid crystal display device according to a second embodiment of the present invention.

Explanation of symbols for the main parts of the drawings

201a: Insulating substrate 201b: Second insulating substrate

202: black matrix pattern 203: spacer movement prevention pattern

204: color filter layer 205: transparent electrode

206: gate insulating film 207: data line

208: protective film 209: pixel electrode

The present invention relates to a display device, and more particularly, to a liquid crystal display device and a manufacturing method thereof.

The manufacturing process of the liquid crystal display device is largely divided into TFT process, color filter process, LCD process and module process. The TFT process is similar to the semiconductor fabrication process, and the thin film transistor array is fabricated on the insulating substrate by repeating deposition, photolithography, and etching processes. After forming a red, green, and blue color filter layer using a dye or a pigment on a substrate, it is a step of forming the ITO for the common electrode. In the LCD process, an insulating substrate on which a TFT process is completed and an insulating substrate on which a color filter process is completed are bonded together so that a predetermined gap is maintained between the two substrates, and then a liquid crystal is injected into the gap to make an LCD cell. The module process is a process of manufacturing a module by attaching a fixture after manufacturing a circuit part for signal processing, connecting the TFT-LCD panel and the signal processing circuit part to each other through mounting technology.

When describing the LCD process technology related to the present invention in the manufacturing process of the liquid crystal display device in more detail as follows.

The LCD process consists of the following unit processes. First, as an alignment layer forming process, a uniform alignment of liquid crystal molecules is formed to enable normal liquid crystal driving and to have uniform display characteristics. Second, as a rubbing process, the liquid crystal molecules are aligned in the rubbing direction by rubbing the alignment film in a predetermined direction using a cloth. Third, as a cell gap forming process, as a process of maintaining the TFT substrate and the color filter substrate at regular intervals, a spacer is dispersed in the seal material. Fourth, as an assembly process, a process of joining a TFT substrate and a color filter substrate requires a precision of several micrometers, and the flatness of the table during the process, the parallelism of the upper and lower surfaces when pressing, and the uniformity of spatial pressure and temperature are required. Fifth, the cell cutting process is a process of cutting and separating each cell from the substrate after the seal pattern curing process, and using a scribe process and a force to form a cutting line on the glass surface with a diamond pen having a hardness higher than that of glass. It consists of a cutting process of cutting by adding. Sixthly, a liquid crystal injection process, generally a vacuum injection method for injecting a liquid crystal using a pressure difference between the inside and outside of the cell is widely used, and a process of preventing the liquid crystal from flowing out into the injection hole of the cell where the liquid crystal injection is completed is added. Seventh, as a polarizing film attaching process, the cell injected with liquid crystal is attached by attaching a polarizing plate to both sides of the cell after applying the optical and electrical signals to be inspected, and attaching the polarizing plate in the TN-LCD using the polarization characteristic of light due to the birefringence of the liquid crystal molecules. Is an essential process.

Hereinafter, a liquid crystal display according to the related art will be described with reference to the accompanying drawings.

1 is a structural cross-sectional view of a liquid crystal display device according to the prior art.

As shown in FIG. 1, the two insulating substrates 101 and 101a are opposed to each other, and the liquid crystal 111 is enclosed therebetween. The red, blue, and green color filter layers 102 for expressing color are formed on the upper plate. Is formed, and a black matrix 103 is formed in a matrix form to block light transmission to portions other than the pixel electrode formed on the lower plate.                         

The common electrode 105 is formed over the color filter layer 102 and the black matrix 103, and an overcoat 104 may be formed before the common electrode is formed.

In the lower plate, a thin film transistor including a gate electrode 106 extending from the gate line and a source electrode 107 and a drain electrode 108 extending from the data line intersecting the gate line is formed at regular intervals. A pixel electrode connected to the drain electrode 108 and the via hole is formed, and a backlight 112 is provided on the bottom of the lower plate.

In addition, a spacer 109 is dispersed between the color filter substrate and the thin film transistor substrate so as to maintain a cell gap.

However, the conventional liquid crystal display device and its manufacturing method have the following problems.

In the liquid crystal inlet portion, the spacers evenly distributed on the substrate for the purpose of maintaining the cell gap, due to the fine difference in the cell gap depending on the injection speed of the liquid crystal and the position in the substrate during liquid crystal injection, The spacers are driven around the gate or data wiring.

The present invention has been made to solve the above problems, and an object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same to reduce the mobility of the spacer to maintain a stable cell gap.

A liquid crystal display according to a first embodiment of the present invention for achieving the above object is a plurality of gate lines and data lines intersected on the first substrate, a thin film transistor formed at the intersection of each gate line, A color filter layer and a black matrix pattern formed on the second substrate, a spacer movement preventing pattern formed of photoresist on the black matrix pattern to limit the movement of the spacer, and a liquid crystal layer formed between the first substrate and the second substrate In the manufacturing of the liquid crystal display device in which the liquid crystal is enclosed between the TFT substrate, the color filter substrate and the liquid crystal display device therebetween, forming a black matrix pattern on the insulating substrate; It is formed of photoresist on the black matrix pattern to form a spacer movement prevention pattern that restricts the movement of the spacer. And forming a color filter substrate by forming a color filter layer in a space between the black matrix patterns, and forming a liquid crystal layer between the TFT substrate facing the color filter substrate. It is done.

The spacer movement prevention pattern uses a photosensitive material such as a photoresist, and after the photolithography process of patterning the black matrix, the photoresist remaining on the patterned black matrix pattern is etched or peeled off in the related art. It was removed using but is left as it is in the present invention. In addition, the remaining thickness of the photoresist maintains 1/2 of the cell gap of the upper and lower plates of the liquid crystal display.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to the first embodiment of the present invention will be described in detail with reference to the drawings.

2 is a structural cross-sectional view of a liquid crystal display device according to a first embodiment of the present invention.

As shown in FIG. 2, a liquid crystal is encapsulated between a first substrate and a second substrate, and a data line 207 formed on a second substrate on an insulating substrate 201a in the first substrate. The black matrix layer 202 is formed at regular intervals to prevent transmission of light to the gate line and the thin film transistor (not shown), and restricts the movement of the spacer on the black matrix layer 202. For this purpose, a spacer resist pattern 203 of photoresist material is formed, and color filter layers 204 of R, G, and B for realizing color expression are formed in the spaces between the black matrix layers 202. . The common electrode 205 is formed on the entire surface of the substrate including the color filter layer 204, and an overcoat may be formed before the common electrode 205 is formed.

The gate insulating layer 206 is formed on the insulating substrate 201b on the second substrate, and the data lines 207 are patterned on the gate insulating layer 206. A silicon nitride protective film 208 is stacked on the entire surface of the substrate including the data line 207, and the pixel electrode 209 of ITO material is formed on the protective film 208 at regular intervals.

Here, the photoresist is not formed using a separate process, but is formed for black matrix patterning and is left without being removed after patterning.                     

3A to 3C are cross-sectional views illustrating a method of manufacturing a liquid crystal display device according to the present invention.

On the other hand, the characteristic of the liquid crystal display device according to the present invention is on the upper plate is formed color filter layer, detailed description of the lower plate will be omitted.

As shown in FIG. 3A, a black matrix material 202a is deposited on an insulating substrate 201a, and then a photosensitive material 203 such as a photoresist is deposited.

The black matrix material 202a is a metal material such as chromium (Cr), chromium oxide (CrO _x ), or a carbon-based organic material such as black resin.

3B, the photoresist is selectively patterned using a photolithography process, and then the black matrix material layer 202a is patterned using the patterned photoresist as a mask to form the black matrix pattern 202. Let's do it.

After the black matrix pattern is formed, the photoresist 203 remaining on the black matrix pattern is not removed. The formation thickness of the photoresist is about 1/2 of a cell gap, and serves to limit the movement of a spacer to be scattered on a substrate.

As shown in FIG. 3C, a color filter layer 204 of R, G, and B is formed to implement color expression in the space between the black matrix layers, and a transparent conductive film of ITO material is deposited on the color filter layer. The common electrode 205 is formed.                     

Subsequently, although not shown in the drawing, after the dispersion of spacers for maintaining a cell gap on the substrate on which the color filter layer is formed, the substrates opposed thereto are bonded to each other, and then the liquid crystal is encapsulated to complete the manufacturing process according to the present invention. .

The liquid crystal display according to the second exemplary embodiment of the present invention includes a plurality of gate lines and data lines intersecting on a first substrate, a thin film transistor formed at an intersection of the gate lines, and a color formed on a second substrate. A filter layer and a black matrix pattern, a common electrode formed on an entire surface of the substrate including the black matrix pattern, a spacer movement preventing pattern formed on the common electrode corresponding to a portion where the black matrix pattern is formed, and the first substrate and the first substrate. It characterized in that it comprises a liquid crystal layer formed between the two substrates, the manufacturing method is a black matrix pattern on the insulating substrate in the manufacturing of the TFT substrate and the color filter substrate and the liquid crystal is enclosed between the liquid crystal display device Forming a color filter layer in a space between the black matrix patterns, and Including forming a common electrode on the front substrate including a matrix pattern, comprising: forming a spacer preventing movement pattern formed on the common electrode corresponding to the region above the black matrix pattern is formed is characterized in that formed.

As in the first embodiment, the spacer movement prevention pattern uses a photosensitive material such as photoresist, and the thickness thereof is maintained at about 1/2 of the cell gap.

Hereinafter, a liquid crystal display according to a second exemplary embodiment of the present invention and a manufacturing method thereof will be described in detail.                     

4 is a structural cross-sectional view of a liquid crystal display device according to a second embodiment of the present invention.

As shown in FIG. 4, a liquid crystal is encapsulated between a first substrate and a second substrate, and a data line 407 formed on a second substrate on an insulating substrate 401a. The black matrix layer 402 is formed at regular intervals to prevent light from being transmitted to the gate line and the thin film transistor (not shown), and R is formed to express color in the space between the black matrix layer 402. , G, B color filter layers 403 are formed. The common electrode 404 is formed on the entire surface of the substrate including the color filter layer 403, and an overcoat may be formed before the common electrode 404 is formed. The spacer movement preventing pattern 405 of photoresist material is formed on the common electrode 404 to limit the movement of the spacer.

A gate insulating layer 406 is formed on the insulating substrate 401b on the second substrate, and data lines 407 are patterned on the gate insulating layer 406. A silicon nitride protective film 408 is stacked on the entire surface of the substrate including the data line 407, and a pixel electrode 409 made of ITO is formed on the protective film 408 at predetermined intervals.

5A through 5C are cross-sectional views illustrating a method of manufacturing a liquid crystal display device according to a second embodiment of the present invention.

As shown in FIG. 5A, the black matrix layer 402 is formed on the insulating substrate 401a by using a photolithography process for preventing light from being transmitted to regions other than the pixel electrode. The material of the black matrix is a metal material such as chromium (Cr), chromium oxide (CrO _x ), or a carbon-based organic material such as black resin.

Subsequently, as shown in FIG. 5B, a color filter layer 403 of R, G, and B for implementing color expression in the space between the black matrix layers 402 is formed, and on the color filter layer 403. A transparent conductive film made of ITO is deposited using a sputtering method to form a common electrode 404.

As shown in FIG. 5C, a photosensitive material such as a photoresist is coated on the common electrode 404 to pattern the black matrix pattern 402 to be formed on a common electrode corresponding to a portion where the black matrix pattern 402 is formed to prevent spacer movement. Pattern 405 is formed. In this case, the thickness of the spacer movement prevention pattern 405 is about 1/2 of the cell gap.

As described above, the liquid crystal display of the present invention and its manufacturing method have the following effects.

By forming a pattern restricting the movement of the spacer on the black matrix pattern or on the transparent electrode, there is an advantage of enabling the spacer distribution of a certain density throughout the substrate even after the liquid crystal injection.

Claims (14)

A plurality of gate lines and data lines intersected on the first substrate; Thin film transistors formed at intersections of the gate lines; A color filter layer and a black matrix pattern formed on the second substrate; A spacer movement prevention pattern formed of photoresist on the black matrix pattern to limit movement of the spacer; And a liquid crystal layer formed between the first substrate and the second substrate. delete The liquid crystal display device according to claim 1, wherein the photoresist has a thickness of 1/2 of a cell gap. In the manufacture of a TFT substrate, a color filter substrate, and a liquid crystal display device in which liquid crystal is enclosed therebetween, Forming a black matrix pattern on the insulating substrate; Forming a spacer movement prevention pattern formed on the black matrix pattern by photoresist to limit movement of the spacer; Forming a color filter substrate by forming a color filter layer in a space between the black matrix patterns; And forming a liquid crystal layer between the TFT substrate facing the color filter substrate. delete The method of claim 4, wherein the forming of the spacer movement prevention pattern comprises: Forming a layer of a black matrix material on the insulating substrate and then applying a photoresist thereon; Patterning the photoresist; And patterning the black matrix material layer using the patterned photoresist as a mask to form a black matrix pattern having photoresist laminated thereon. The method of claim 6, wherein the thickness of the photoresist is adjusted to be 1/2 of a cell gap. The method of claim 6, further comprising: forming a seal pattern on the color filter substrate prior to forming the liquid crystal layer; And dispersing a spacer on the thin film transistor substrate. A plurality of gate lines and data lines intersected on the first substrate; Thin film transistors formed at intersections of the gate lines; A color filter layer and a black matrix pattern formed on the second substrate; A common electrode formed on an entire surface of the substrate including the color filter layer; A spacer movement prevention pattern formed of photoresist on the common electrode to limit the movement of the spacer; And a liquid crystal layer formed between the first substrate and the second substrate. delete 10. The liquid crystal display device according to claim 9, wherein the photoresist has a thickness of 1/2 of a cell gap. In the manufacture of a TFT substrate, a color filter substrate, and a liquid crystal display device in which liquid crystal is enclosed therebetween, Forming a black matrix pattern on the insulating substrate; Forming a color filter layer in a space between the black matrix patterns; Forming a common electrode on a front surface of the substrate including the color filter layer; Forming a spacer movement preventing pattern formed of photoresist on the common electrode to limit movement of the spacer; And forming a liquid crystal layer between the TFT substrate facing the color filter substrate. delete The method of claim 12, wherein the thickness of the photoresist is adjusted to be 1/2 of a cell gap.

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