JPH05341118A - Method and device for manufacturing color filter - Google Patents
Method and device for manufacturing color filterInfo
- Publication number
- JPH05341118A JPH05341118A JP777393A JP777393A JPH05341118A JP H05341118 A JPH05341118 A JP H05341118A JP 777393 A JP777393 A JP 777393A JP 777393 A JP777393 A JP 777393A JP H05341118 A JPH05341118 A JP H05341118A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- color filter
- transparent substrate
- colored layer
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
- Optical Filters (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】この発明はカラ−フィルタの製造
方法及び製造装置に係り、特にその着色層が不良の場
合、透明基板の再利用に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a color filter, and more particularly to reusing a transparent substrate when the colored layer is defective.
【０００２】[0002]
【従来の技術】近年、カラ−液晶表示装置は、ＣＲＴ以
外では唯一フルカラ−表示が可能な表示装置として、テ
レビジョン受像機やＯＡ用の表示装置に広く用いられる
ようになって来た。この種のカラ−液晶表示装置にはカ
ラ−フィルタが使用されているが、このカラ−フィルタ
は、一般にガラス等からなる透明基板上に、金属クロム
（Ｃｒ）あるいは黒色顔料を含有するレジスト剤等から
なる遮光層が所定パタ−ンに形成され、この遮光層上に
透明な着色層が形成され、この着色層上に透明導電膜，
配向膜が順次積層して形成されている。尚、着色層と透
明導電膜との間に透明保護膜が形成されることもある。2. Description of the Related Art In recent years, color liquid crystal display devices have come to be widely used in television receivers and OA display devices as the only display device capable of full color display other than CRTs. A color filter is used in this type of color liquid crystal display device. This color filter is generally used on a transparent substrate made of glass or the like, a resist agent containing metallic chromium (Cr) or a black pigment, and the like. Is formed in a predetermined pattern, a transparent colored layer is formed on the light shielding layer, and a transparent conductive film is formed on the colored layer.
The alignment film is formed by sequentially stacking. A transparent protective film may be formed between the colored layer and the transparent conductive film.
【０００３】[0003]
【発明が解決しようとする課題】液晶表示装置用カラ−
フィルタに使用されている材料の多くは、ＩＣ製造技術
の延長線上にあり、材料費が極めて高価である。又、透
明基板１枚から取れる製品の数は表示エリアの大形化に
伴ない、１乃至２枚である。従って、製造コストに占め
る材料費の割合が非常に高い。又、着色層の欠陥は数画
素であっても不良カラ−フィルタとなるため、従来の製
造方法では廃棄処分するしか方法がなかった。A color for a liquid crystal display device.
Most of the materials used for the filter are an extension of IC manufacturing technology, and the material cost is extremely high. Also, the number of products that can be obtained from one transparent substrate is 1 or 2 as the display area becomes larger. Therefore, the ratio of the material cost to the manufacturing cost is very high. Further, even if a defect of the colored layer is a few pixels, it causes a defective color filter. Therefore, in the conventional manufacturing method, there is no choice but to discard.
【０００４】この発明は、上記事情に鑑みなされたもの
で、着色層が不良であった場合、この着色層を除去し
て、透明基板を再利用出来るようにしたカラ−フィルタ
の製造方法及び製造装置を提供することを目的とする。The present invention has been made in view of the above circumstances. When the colored layer is defective, the colored layer is removed and the transparent substrate can be reused. The purpose is to provide a device.
【０００５】[0005]
【課題を解決するための手段】この発明は、透明基板上
に遮光層を形成し、この遮光層上に着色層を形成する
際、着色層が不良である場合、その着色層を硝酸２乃至
５０重量％、及び硫酸を含む酸水溶液を用いて除去し、
透明基板を再利用する工程を含むカラ−フィルタの製造
方法である。According to the present invention, when a light-shielding layer is formed on a transparent substrate and a colored layer is formed on this light-shielding layer, if the colored layer is defective, the colored layer is replaced with nitric acid 2 or more. Removed by using an acid aqueous solution containing 50% by weight and sulfuric acid,
It is a manufacturing method of a color filter including a step of reusing a transparent substrate.
【０００６】又、この発明は、遮光層，着色層を形成し
た透明基板より着色層のみ除去する硝酸２乃至５０重量
％、及び硫酸を含む酸水溶液処理工程を行なう酸水溶液
処理槽と、酸水溶液処理後のリンスのために急速給水，
排水，シャワ−を行なうリピ−ト水洗槽と、リンスと透
明基板のパ−ティクル除去を行なう超音波洗浄槽と、周
波数の高いメガソニック洗浄槽と、温純水引上げ乾燥槽
と、各槽へ透明基板を自動搬送する手段とを具備するカ
ラ−フィルタの製造装置である。The present invention also provides an acid aqueous solution treatment tank for performing an acid aqueous solution treatment step containing 2 to 50% by weight of nitric acid and sulfuric acid for removing only the colored layer from a transparent substrate having a light-shielding layer and a colored layer, and an acid aqueous solution. Rapid water supply for post-treatment rinse,
A repeat water washing tank for draining and showering, an ultrasonic cleaning tank for removing particles from the rinse and transparent substrate, a megasonic cleaning tank with a high frequency, a hot pure water pulling drying tank, and transparent substrates for each tank. Is a manufacturing apparatus of a color filter including a means for automatically transporting
【０００７】[0007]
【作用】この発明によれば、不良着色層が原因で従来処
分していたカラ−フィルタの不良品について、着色層を
酸水溶液を用いて除去し、透明基板として再利用するこ
とにより、カラ−フィルタの材料費において可成りの割
合を占める透明基板の材料費が節約可能となり、低価格
のカラ−フィルタを作ることが出来る。According to the present invention, a defective color filter that has been conventionally disposed of due to a defective coloring layer is removed by using an acid aqueous solution and reused as a transparent substrate. The material cost of the transparent substrate, which occupies a considerable proportion in the material cost of the filter, can be saved, and a low-cost color filter can be manufactured.
【０００８】[0008]
【実施例】以下、図面を参照して、この発明の一実施例
を詳細に説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings.
【０００９】この発明によるカラ−フィルタの製造方法
は、図１の（ａ）〜（ｃ）に示す工程からなっており、
図３に示す製造装置により行なう。そこで、製造方法を
説明する前に、製造装置について述べることにする。即
ち、この発明の製造装置は図３に示すように構成され、
遮光層，着色層を形成した透明基板より着色層のみ除去
する硝酸２乃至５０重量％、及び硫酸を含む酸水溶液処
理工程を行なう酸水溶液処理槽７１と、酸水溶液処理後
のリンスのために急速給水，排水，シャワ−を行なうリ
ピ−ト水洗槽７２と、リンスと透明基板のパ−ティクル
除去を行なう超音波洗浄槽７３と、周波数の高いメガソ
ニック（１ＭＨｚ近傍）洗浄槽７４と、温純水引上げ乾
燥槽７５と、各槽へ透明基板を自動搬送する手段と、ロ
−ダ７６及びアンロ−ダ７７とを具備している。尚、図
３中の符号１１〜２１及び６１〜７０はいずれも弁、２
５〜２８はセンサ−、３１〜３４は流量計、４１〜４４
はポンプ、５１〜５４はフィルタを示している。そし
て、下記に詳述するように、カセットに搭載した再生し
ようとする複数枚の透明基板を一度に同時にロ−ダ７６
→酸水溶液処理槽７１→リピ−ト水洗槽７２→超音波洗
浄槽７３→メガソニック洗浄槽７４→温純水引上げ乾燥
槽７５→アンロ−ダ７７の順に自動搬送し、再生処理を
行なうのである。The method of manufacturing a color filter according to the present invention comprises the steps shown in FIGS.
The manufacturing apparatus shown in FIG. 3 is used. Therefore, before explaining the manufacturing method, the manufacturing apparatus will be described. That is, the manufacturing apparatus of the present invention is configured as shown in FIG.
An acid aqueous solution treatment bath 71 for performing an acid aqueous solution treatment step containing 2 to 50% by weight of nitric acid and sulfuric acid for removing only the colored layer from the transparent substrate on which the light shielding layer and the color layer are formed, and a rapid rinse for rinsing after the acid aqueous solution treatment. Repeat water washing tank 72 for water supply, drainage and showering, ultrasonic cleaning tank 73 for removing particles on the rinse and transparent substrate, megasonic (around 1 MHz) cleaning tank 74 with high frequency, and hot pure water pulling up. It is equipped with a drying tank 75, means for automatically transporting a transparent substrate to each tank, a loader 76 and an unloader 77. In addition, reference numerals 11 to 21 and 61 to 70 in FIG.
5-28 are sensors, 31-34 are flow meters, 41-44
Is a pump and 51 to 54 are filters. Then, as will be described in detail below, a plurality of transparent substrates mounted on the cassette and to be reproduced are loaded into the loader 76 at the same time.
The acidic aqueous solution treatment tank 71, the repeat water washing tank 72, the ultrasonic cleaning tank 73, the megasonic cleaning tank 74, the hot pure water pulling and drying tank 75, and the unloader 77 are automatically conveyed in this order to perform the regeneration process.
【００１０】さて、上記のような製造装置によりカラ−
フィルタを製造するには、先ず図１の（ａ）に示すよう
に、ガラス等からなる透明基板１上に、金属Ｃｒからな
る遮光層２、顔料及び溶剤を含むエポキシ樹脂系ワニス
を主体とする着色インクからなる着色層３Ｒ，３Ｇ，３
Ｂを周知の方法で順次積層形成する。Now, with the manufacturing apparatus as described above, the color
In order to manufacture a filter, first, as shown in FIG. 1A, a light-shielding layer 2 made of metal Cr and an epoxy resin varnish containing a pigment and a solvent are mainly formed on a transparent substrate 1 made of glass or the like. Colored layers 3R, 3G, 3 made of colored ink
B is sequentially laminated by a known method.
【００１１】この製造途中品において、着色層３Ｒ，３
Ｇ，３Ｂに画素部パタ−ン欠陥４が存在する場合、この
製造途中品を硝酸５重量％、硫酸８９重量％、水６重量
％からなる７０℃，酸水溶液中に３０分間浸す。する
と、主に下記式の反応が進む。 ２ＨＮＯ3 →２ＮＯ2 ＋Ｈ2 Ｏ＋Ｏ Ｈ2 ＳＯ4 →Ｈ2 Ｏ＋ＳＯ2 ＋ＯIn this intermediate product, the colored layers 3R, 3
When the pixel pattern defect 4 exists in G and 3B, this intermediate product is immersed in an acid aqueous solution containing 5% by weight of nitric acid, 89% by weight of sulfuric acid and 6% by weight of water at 70 ° C. for 30 minutes. Then, the reaction of the following formula mainly proceeds. 2HNO 3 → 2NO 2 + H 2 O + OH H 2 SO 4 → H 2 O + SO 2 + O
【００１２】この反応で発生する酸素の酸化力により、
図１の（ｂ）に示すように、着色層３Ｒ，３Ｇ，３Ｂの
みが分解・除去される。金属Ｃｒからなる遮光層２はＳ
Ｎ溶液と反応しないため、侵されずにそのまま残る。続
いて、再び図１の（ｃ）に示すように、新たに着色層３
Ｒ，３Ｇ，３Ｂを形成することにより、透明基板１及び
遮光層２を再利用することが可能となる。 （変形例）Due to the oxidizing power of oxygen generated in this reaction,
As shown in FIG. 1B, only the colored layers 3R, 3G, 3B are decomposed and removed. The light shielding layer 2 made of metal Cr is S
Since it does not react with the N solution, it remains unaffected. Then, as shown in FIG. 1C again, a new colored layer 3 is newly formed.
By forming R, 3G, and 3B, the transparent substrate 1 and the light shielding layer 2 can be reused. (Modification)
【００１３】図２の（ａ）〜（ｃ）はこの発明の変形例
であり、上記実施例と同様効果が得られる。図１と同一
箇所には同一符号を付してあるが、５は黒色レジスト等
からなる有機物系遮光層である。先ず、図２の（ａ）に
示すように、ガラス等からなる透明基板１上に黒色レジ
スト等からなる有機物系遮光層５，着色層３Ｒ，３Ｇ，
３Ｂが形成されているカラ−フィルタ製造途中品におい
て、着色層３Ｒ，３Ｇ，３Ｂに画素部パタ−ン欠陥４が
存在する。次に、この製造途中品を硝酸５重量％、硫酸
８９重量％、水６重量％からなる７０℃，酸水溶液中に
３０分間浸す。すると、図２の（ｂ）に示すように、着
色層３Ｒ，３Ｇ，３Ｂおよび黒色レジスト等からなる有
機物系遮光層５が除去される。続いて、再び図２の
（ｃ）に示すように、透明基板１上に黒色レジスト等か
らなる有機物系遮光層５，着色層３Ｒ，３Ｇ，３Ｂを形
成することにより、透明基板１を再利用することが可能
となる。又、黒色レジスト等からなる有機物系遮光層５
の欠陥についても有効である。2 (a) to 2 (c) are modified examples of the present invention, and the same effects as those of the above embodiment can be obtained. Although the same parts as those in FIG. 1 are denoted by the same reference numerals, 5 is an organic light-shielding layer made of a black resist or the like. First, as shown in FIG. 2A, an organic light-shielding layer 5 made of a black resist or the like, colored layers 3R, 3G, a transparent substrate 1 made of glass or the like,
In the color filter manufacturing intermediate product in which 3B is formed, the pixel portion pattern defect 4 exists in the colored layers 3R, 3G and 3B. Next, this intermediate product is immersed in an acid aqueous solution containing 5% by weight of nitric acid, 89% by weight of sulfuric acid and 6% by weight of water at 70 ° C. for 30 minutes. Then, as shown in FIG. 2B, the organic light-shielding layer 5 composed of the colored layers 3R, 3G, 3B and the black resist is removed. Subsequently, as shown in FIG. 2C again, the transparent substrate 1 is reused by forming the organic light-shielding layer 5 and the coloring layers 3R, 3G, 3B made of a black resist or the like on the transparent substrate 1. It becomes possible to do. In addition, the organic light-shielding layer 5 made of black resist or the like
It is also effective for the defect of.
【００１４】又、上記実施例及び変形例では、酸水溶液
は硝酸５重量％、硫酸８９重量％、水６重量％であった
が、硝酸は２乃至５０重量％、硫酸は５０乃至９６重量
％、残部が水という範囲であれば良い。Further, in the above-mentioned embodiments and modifications, the acid aqueous solution was 5% by weight of nitric acid, 89% by weight of sulfuric acid, and 6% by weight of water, but 2 to 50% by weight of nitric acid and 50 to 96% by weight of sulfuric acid. , The balance is water.
【００１５】更に、乾燥方式は上記実施例及び変形例以
外のイソプロピルアルコ−ル［（ＣＨ3 ）2 ＣＨＯＨ］
ベ−パ乾燥方式があるが、イソプロピルアルコ−ルのコ
スト、イソプロピルアルコ−ルの取扱いの点等で有利の
ため、この発明では温純水引上げ乾燥方式を採用してい
る。Further, the drying method is isopropyl alcohol [(CH 3 ) 2 CHOH] other than the above-mentioned embodiment and modification.
Although there is a vapor drying method, the hot pure water pull-up drying method is adopted in the present invention because it is advantageous in terms of cost of isopropyl alcohol, handling of isopropyl alcohol, and the like.
【００１６】[0016]
【発明の効果】この発明の製造方法によれば、着色層が
不良である場合、その着色層を硝酸２乃至５０重量％、
及び硫酸を含む酸水溶液を用いて除去し、透明基板を再
利用する工程を含んでいるので、不良着色層をより完全
に容易に除去して透明基板を再利用することが出来る。According to the manufacturing method of the present invention, when the colored layer is defective, the colored layer is mixed with 2 to 50% by weight of nitric acid,
Since the method includes the step of reusing the transparent substrate by removing it with an acid aqueous solution containing sulfuric acid, the defective colored layer can be more completely removed and the transparent substrate can be reused.
【００１７】又、この発明の製造装置によれば、硝酸２
乃至５０重量％、及び硫酸を含む酸水溶液処理、洗浄、
乾燥を自動的に且つ清浄な透明基板を再生することが出
来る。Further, according to the manufacturing apparatus of the present invention, nitric acid 2
To 50% by weight and sulfuric acid aqueous solution treatment, washing,
It is possible to automatically dry and regenerate a clean transparent substrate.
【図１】（ａ）〜（ｃ）はこの発明の一実施例に係るカ
ラ−フィルタの製造方法を示す断面図。1A to 1C are cross-sectional views showing a method for manufacturing a color filter according to an embodiment of the present invention.
【図２】（ａ）〜（ｃ）はこの発明の変形例に係るカラ
−フィルタの製造方法を示す断面図。2A to 2C are cross-sectional views showing a method of manufacturing a color filter according to a modification of the present invention.
【図３】この発明の一実施例に係るカラ−フィルタの製
造装置を示す構成図。FIG. 3 is a configuration diagram showing a color filter manufacturing apparatus according to an embodiment of the present invention.
１…透明基板、２，５…遮光層、３Ｒ，３Ｇ，３Ｂ…着
色層、４…画素部パタ−ン欠陥、７１…酸水溶液処理
槽、７２…リピ−ト水洗槽、７３…超音波洗浄槽、７４
…メガソニック洗浄槽、７５…温純水引上げ乾燥槽、７
６…ロ−ダ、７７…アンロ−ダ。DESCRIPTION OF SYMBOLS 1 ... Transparent substrate, 2, 5 ... Light-shielding layer, 3R, 3G, 3B ... Coloring layer, 4 ... Pixel pattern defect, 71 ... Acid aqueous solution treatment tank, 72 ... Repeat water washing tank, 73 ... Ultrasonic cleaning Tank, 74
… Megasonic cleaning tank, 75… Hot water pull-up drying tank, 7
6 ... Roda, 77 ... Unloader.
Claims (2)
層上に着色層を形成するカラ−フィルタの製造方法にお
いて、 上記着色層が不良である場合、該着色層を硝酸２乃至５
０重量％、及び硫酸を含む酸水溶液を用いて除去し、上
記透明基板を再利用する工程を含むことを特徴とするカ
ラ−フィルタの製造方法。1. A method for manufacturing a color filter, comprising forming a light-shielding layer on a transparent substrate and forming a colored layer on the light-shielding layer. When the colored layer is defective, the colored layer is replaced with nitric acid 2-5.
A method for producing a color filter, comprising a step of reusing the transparent substrate by removing it with an acid aqueous solution containing 0% by weight and sulfuric acid.
上記着色層のみ除去する硝酸２乃至５０重量％、及び硫
酸を含む酸水溶液処理工程を行なう酸水溶液処理槽と、
上記酸水溶液処理後のリンスのために急速給水，排水，
シャワ−を行なうリピ−ト水洗槽と、上記リンスと透明
基板のパ−ティクル除去を行なう超音波洗浄槽と、周波
数の高いメガソニック洗浄槽と、温純水引上げ乾燥槽
と、上記各槽へ上記透明基板を自動搬送する手段とを具
備することを特徴とするカラ−フィルタの製造装置。2. An acid aqueous solution treatment tank for performing an acid aqueous solution treatment step containing 2 to 50% by weight of nitric acid and sulfuric acid for removing only the colored layer from a transparent substrate on which a light shielding layer and a colored layer are formed,
Rapid water supply, drainage, and rinse for rinsing after the above acid solution treatment
A repeat water washing tank for showering, an ultrasonic cleaning tank for removing particles of the rinse and the transparent substrate, a megasonic cleaning tank with a high frequency, a hot pure water pull-up drying tank, and the above-mentioned transparent to each tank. An apparatus for manufacturing a color filter, comprising: a means for automatically transporting a substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP777393A JPH05341118A (en) | 1992-04-07 | 1993-01-20 | Method and device for manufacturing color filter |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8538892 | 1992-04-07 | ||
| JP4-85388 | 1992-04-07 | ||
| JP777393A JPH05341118A (en) | 1992-04-07 | 1993-01-20 | Method and device for manufacturing color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05341118A true JPH05341118A (en) | 1993-12-24 |
Family
ID=26342132
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP777393A Pending JPH05341118A (en) | 1992-04-07 | 1993-01-20 | Method and device for manufacturing color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05341118A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002201046A (en) * | 2000-12-27 | 2002-07-16 | Fuji Photo Film Co Ltd | Reclaiming method of glass substrate, production method of dry plate and reclaiming apparatus of glass substrate |
| KR100307451B1 (en) * | 1998-11-20 | 2002-07-18 | 김순택 | Filter apparatus for solution break up color filter |
| JP2004319321A (en) * | 2003-04-17 | 2004-11-11 | Sony Corp | Manufacturing device and manufacturing method of organic light-emitting display device |
| US7008282B2 (en) | 2002-03-08 | 2006-03-07 | Seiko Epson Corporation | Method for eliminating materials, method for reclaiming base, method for manufacturing display, and electronic appliances comprising display manufactured by the manufacturing method |
| CN1332249C (en) * | 2002-01-16 | 2007-08-15 | 西山不锈化学股份有限公司 | Regenerating method of liquid crystal device |
| JP2009009147A (en) * | 2008-08-13 | 2009-01-15 | Dainippon Printing Co Ltd | Color filter production line system |
-
1993
- 1993-01-20 JP JP777393A patent/JPH05341118A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100307451B1 (en) * | 1998-11-20 | 2002-07-18 | 김순택 | Filter apparatus for solution break up color filter |
| JP2002201046A (en) * | 2000-12-27 | 2002-07-16 | Fuji Photo Film Co Ltd | Reclaiming method of glass substrate, production method of dry plate and reclaiming apparatus of glass substrate |
| CN1332249C (en) * | 2002-01-16 | 2007-08-15 | 西山不锈化学股份有限公司 | Regenerating method of liquid crystal device |
| US7008282B2 (en) | 2002-03-08 | 2006-03-07 | Seiko Epson Corporation | Method for eliminating materials, method for reclaiming base, method for manufacturing display, and electronic appliances comprising display manufactured by the manufacturing method |
| JP2004319321A (en) * | 2003-04-17 | 2004-11-11 | Sony Corp | Manufacturing device and manufacturing method of organic light-emitting display device |
| JP2009009147A (en) * | 2008-08-13 | 2009-01-15 | Dainippon Printing Co Ltd | Color filter production line system |
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