TWI277485B - Abrasive articles and methods for the manufacture and use of same - Google Patents
Abrasive articles and methods for the manufacture and use of same Download PDFInfo
- Publication number
- TWI277485B TWI277485B TW092105131A TW92105131A TWI277485B TW I277485 B TWI277485 B TW I277485B TW 092105131 A TW092105131 A TW 092105131A TW 92105131 A TW92105131 A TW 92105131A TW I277485 B TWI277485 B TW I277485B
- Authority
- TW
- Taiwan
- Prior art keywords
- friction
- performance index
- workpiece
- article
- index
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 86
- 238000004519 manufacturing process Methods 0.000 title abstract description 26
- 230000008569 process Effects 0.000 claims abstract description 53
- 238000005520 cutting process Methods 0.000 claims description 76
- 239000002245 particle Substances 0.000 claims description 37
- 239000002783 friction material Substances 0.000 claims description 14
- 238000005259 measurement Methods 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 239000011230 binding agent Substances 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 239000007767 bonding agent Substances 0.000 claims description 4
- 239000010432 diamond Substances 0.000 claims description 2
- 229910003460 diamond Inorganic materials 0.000 claims description 2
- 238000004806 packaging method and process Methods 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 239000004744 fabric Substances 0.000 description 39
- 239000000463 material Substances 0.000 description 30
- 238000000227 grinding Methods 0.000 description 25
- 238000012360 testing method Methods 0.000 description 22
- 238000005498 polishing Methods 0.000 description 18
- 229910000831 Steel Inorganic materials 0.000 description 11
- 239000010959 steel Substances 0.000 description 11
- 238000012545 processing Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 239000000314 lubricant Substances 0.000 description 5
- 238000007670 refining Methods 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- -1 calcium sulfite) Chemical class 0.000 description 4
- 238000004364 calculation method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229920006037 cross link polymer Polymers 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000003763 carbonization Methods 0.000 description 2
- 238000012512 characterization method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 230000001568 sexual effect Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 241000283690 Bos taurus Species 0.000 description 1
- DHNQMJPIVOCZMQ-UHFFFAOYSA-N C(C=C)(=O)O.[N+](#[C-])N1C(=O)NC=2NC(=O)NC2C1=O Chemical compound C(C=C)(=O)O.[N+](#[C-])N1C(=O)NC=2NC(=O)NC2C1=O DHNQMJPIVOCZMQ-UHFFFAOYSA-N 0.000 description 1
- 229910021532 Calcite Inorganic materials 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 235000019738 Limestone Nutrition 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910000503 Na-aluminosilicate Inorganic materials 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 244000236658 Paeonia lactiflora Species 0.000 description 1
- 235000008598 Paeonia lactiflora Nutrition 0.000 description 1
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 241001416177 Vicugna pacos Species 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- RREGISFBPQOLTM-UHFFFAOYSA-N alumane;trihydrate Chemical compound O.O.O.[AlH3] RREGISFBPQOLTM-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 229910001570 bauxite Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 235000021028 berry Nutrition 0.000 description 1
- 150000001621 bismuth Chemical class 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- FNAQSUUGMSOBHW-UHFFFAOYSA-H calcium citrate Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O FNAQSUUGMSOBHW-UHFFFAOYSA-H 0.000 description 1
- 239000001354 calcium citrate Substances 0.000 description 1
- 235000012241 calcium silicate Nutrition 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- GBAOBIBJACZTNA-UHFFFAOYSA-L calcium sulfite Chemical compound [Ca+2].[O-]S([O-])=O GBAOBIBJACZTNA-UHFFFAOYSA-L 0.000 description 1
- 235000010261 calcium sulphite Nutrition 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- HHSPVTKDOHQBKF-UHFFFAOYSA-J calcium;magnesium;dicarbonate Chemical compound [Mg+2].[Ca+2].[O-]C([O-])=O.[O-]C([O-])=O HHSPVTKDOHQBKF-UHFFFAOYSA-J 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000010433 feldspar Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 235000019634 flavors Nutrition 0.000 description 1
- IVJISJACKSSFGE-UHFFFAOYSA-N formaldehyde;1,3,5-triazine-2,4,6-triamine Chemical compound O=C.NC1=NC(N)=NC(N)=N1 IVJISJACKSSFGE-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000013023 gasketing Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
- 239000006028 limestone Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000004579 marble Substances 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- BPLYVSYSBPLDOA-GYOJGHLZSA-N n-[(2r,3r)-1,3-dihydroxyoctadecan-2-yl]tetracosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCCCC(=O)N[C@H](CO)[C@H](O)CCCCCCCCCCCCCCC BPLYVSYSBPLDOA-GYOJGHLZSA-N 0.000 description 1
- RCHKEJKUUXXBSM-UHFFFAOYSA-N n-benzyl-2-(3-formylindol-1-yl)acetamide Chemical compound C12=CC=CC=C2C(C=O)=CN1CC(=O)NCC1=CC=CC=C1 RCHKEJKUUXXBSM-UHFFFAOYSA-N 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000011146 organic particle Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 238000000611 regression analysis Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000429 sodium aluminium silicate Substances 0.000 description 1
- 235000012217 sodium aluminium silicate Nutrition 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 235000011083 sodium citrates Nutrition 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229920006132 styrene block copolymer Polymers 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 235000013337 tricalcium citrate Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 150000003754 zirconium Chemical class 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/115,538 US7160173B2 (en) | 2002-04-03 | 2002-04-03 | Abrasive articles and methods for the manufacture and use of same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200405842A TW200405842A (en) | 2004-04-16 |
| TWI277485B true TWI277485B (en) | 2007-04-01 |
Family
ID=28673794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092105131A TWI277485B (en) | 2002-04-03 | 2003-03-10 | Abrasive articles and methods for the manufacture and use of same |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US7160173B2 (enExample) |
| EP (1) | EP1490830B1 (enExample) |
| JP (1) | JP2005521565A (enExample) |
| KR (1) | KR100971567B1 (enExample) |
| CN (1) | CN100577357C (enExample) |
| AT (1) | ATE324639T1 (enExample) |
| AU (1) | AU2003210922A1 (enExample) |
| DE (1) | DE60304849T2 (enExample) |
| MY (1) | MY141485A (enExample) |
| TW (1) | TWI277485B (enExample) |
| WO (1) | WO2003085595A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7758403B2 (en) * | 2007-11-16 | 2010-07-20 | Hitachi Global Storage Technologies Netherlands B.V. | System, method and apparatus for lapping workpieces with soluble abrasives |
| JP5415735B2 (ja) * | 2008-09-26 | 2014-02-12 | 株式会社荏原製作所 | ドレッシング方法、ドレッシング条件の決定方法、ドレッシング条件決定プログラム、および研磨装置 |
| KR20120030048A (ko) * | 2009-04-17 | 2012-03-27 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 금속 입자 전달 용품, 금속 개질된 기판 및 이의 제조 및 이용 방법 |
| US8236163B2 (en) * | 2009-09-18 | 2012-08-07 | United Technologies Corporation | Anode media for use in electroplating processes, and methods of cleaning thereof |
| JP5671554B2 (ja) * | 2009-12-30 | 2015-02-18 | スリーエム イノベイティブ プロパティズ カンパニー | 有機微粒子装填研磨パッド、並びにその製造及び使用方法 |
| US9205530B2 (en) | 2010-07-07 | 2015-12-08 | Seagate Technology Llc | Lapping a workpiece |
| EP2651651B1 (en) * | 2010-12-17 | 2019-01-23 | 3M Innovative Properties Company | Transfer article having multi-sized particles and methods |
| PL2665583T3 (pl) * | 2011-01-22 | 2017-01-31 | Rud. Starcke Gmbh & Co. Kg | Korpus ścierny |
| DE102011103815A1 (de) * | 2011-06-01 | 2012-12-06 | Rud. Starcke Gmbh & Co. Kg | Schleifkörper |
| US9440205B1 (en) * | 2012-08-24 | 2016-09-13 | E. & J. Gallo Winery | System and method for micro dosing |
| CN103341889A (zh) * | 2013-06-26 | 2013-10-09 | 上海点派企业形象策划有限公司 | 切削抛光有机玻璃的金刚石刀具的模型及其应用 |
| TWI546158B (zh) * | 2013-12-20 | 2016-08-21 | 中國砂輪企業股份有限公司 | 低磁性化學機械研磨修整器 |
| SG10201600301SA (en) * | 2016-01-14 | 2017-08-30 | 3M Innovative Properties Co | CMP Pad Conditioner, Pad Conditioning System And Method |
| CN105669032A (zh) * | 2016-01-20 | 2016-06-15 | 广西丛欣实业有限公司 | 耐热玻璃 |
| CN106336814A (zh) * | 2016-08-27 | 2017-01-18 | 宁波市鄞州伴佰精密机械有限公司 | 不锈钢零件防嵌粒抛光液的制备方法 |
| CN106349949A (zh) * | 2016-08-27 | 2017-01-25 | 宁波市鄞州伴佰精密机械有限公司 | 一种用于不锈钢零件的抛光液的制备方法 |
| JP6732381B2 (ja) * | 2016-10-03 | 2020-07-29 | 株式会社ディスコ | 切削装置 |
| JP6517873B2 (ja) * | 2017-05-17 | 2019-05-22 | ファナック株式会社 | 鏡面加工方法および鏡面加工用工具の製造方法 |
| FI131501B1 (en) * | 2023-11-23 | 2025-05-26 | Mirka Ltd | Grinding process control |
Family Cites Families (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3656265A (en) * | 1969-10-14 | 1972-04-18 | Schaffner Mfg Co Inc | Method of making an abrasive belt |
| CS206626B1 (en) | 1978-02-23 | 1981-06-30 | Miroslav Mirsch | Method of adaptive control of necking-down cycle on grinding machine and device for execution of the said cycle |
| US4351029A (en) | 1979-12-05 | 1982-09-21 | Westinghouse Electric Corp. | Tool life monitoring and tracking apparatus |
| US4535571A (en) * | 1981-03-30 | 1985-08-20 | Energy-Adaptive Grinding, Inc. | Grinding control methods and apparatus |
| JPS57194876A (en) * | 1981-05-21 | 1982-11-30 | Seiko Seiki Co Ltd | Controlling method of grinding machine |
| US4590573A (en) | 1982-09-17 | 1986-05-20 | Robert Hahn | Computer-controlled grinding machine |
| DE3518902C2 (de) | 1985-05-25 | 1994-06-09 | Schaudt Maschinenbau Gmbh | Vorrichtung zur Identifikation von Schleifscheiben |
| ATE70708T1 (de) * | 1987-07-24 | 1992-01-15 | Siemens Ag | Einrichtung fuer in zahnaerztliche behandlungsinstrumente einsetzbare werkzeuge. |
| US5177901A (en) | 1988-11-15 | 1993-01-12 | Smith Roderick L | Predictive high wheel speed grinding system |
| US5012989A (en) | 1989-11-24 | 1991-05-07 | Eastman Kodak Company | Apparatus and method for tape velocity and tension control in a capstanless magnetic tape transport |
| GB2241911B (en) | 1990-03-14 | 1993-11-17 | Norville Optical Co Ltd | Ophthalmic lens manufacture |
| US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| DE4111016C1 (en) | 1991-04-05 | 1992-07-16 | Herminghausen-Werke Gmbh, 6052 Muehlheim, De | Grinding machine setter matching monitored tool condition - uses data store for condition parameter in form of magnetisable or optically writable code carrier directly mountable on regulating or grinding wheel |
| US5344688A (en) * | 1992-08-19 | 1994-09-06 | Minnesota Mining And Manufacturing Company | Coated abrasive article and a method of making same |
| DE69401915T2 (de) | 1993-01-12 | 1997-10-09 | Minnesota Mining & Mfg | Spurservoregelungsverfahren fur datenkassettenbandantrieb |
| US5441549A (en) * | 1993-04-19 | 1995-08-15 | Minnesota Mining And Manufacturing Company | Abrasive articles comprising a grinding aid dispersed in a polymeric blend binder |
| DE4318102A1 (de) * | 1993-06-01 | 1994-12-08 | Zahnradfabrik Friedrichshafen | Verfahren zur Vermeidung von Überbeanspruchungen eines Werkstückes beim Schleifen |
| CZ144294A3 (en) | 1993-06-14 | 1994-12-15 | Stiefenhofer Gmbh C | Method of controlling movement of material during its treatment by sterilization and apparatus for making the same |
| US5508596A (en) | 1993-10-07 | 1996-04-16 | Omax Corporation | Motion control with precomputation |
| US5514028A (en) | 1994-01-07 | 1996-05-07 | Ali; Christopher A. | Single sheet sandpaper delivery system and sandpaper sheet therefor |
| US5452150A (en) | 1994-06-27 | 1995-09-19 | Minnesota Mining And Manufacturing Company | Data cartridge with magnetic tape markers |
| US5643044A (en) | 1994-11-01 | 1997-07-01 | Lund; Douglas E. | Automatic chemical and mechanical polishing system for semiconductor wafers |
| US5897424A (en) | 1995-07-10 | 1999-04-27 | The United States Of America As Represented By The Secretary Of Commerce | Renewable polishing lap |
| US5609718A (en) * | 1995-09-29 | 1997-03-11 | Micron Technology, Inc. | Method and apparatus for measuring a change in the thickness of polishing pads used in chemical-mechanical planarization of semiconductor wafers |
| US5738574A (en) * | 1995-10-27 | 1998-04-14 | Applied Materials, Inc. | Continuous processing system for chemical mechanical polishing |
| US5725421A (en) * | 1996-02-27 | 1998-03-10 | Minnesota Mining And Manufacturing Company | Apparatus for rotative abrading applications |
| US5653044A (en) * | 1996-03-22 | 1997-08-05 | California Pellet Mill Company | Horizontal cooler and dryer with solid pans |
| US5833519A (en) * | 1996-08-06 | 1998-11-10 | Micron Technology, Inc. | Method and apparatus for mechanical polishing |
| US6475253B2 (en) * | 1996-09-11 | 2002-11-05 | 3M Innovative Properties Company | Abrasive article and method of making |
| US5908283A (en) * | 1996-11-26 | 1999-06-01 | United Parcel Service Of Americia, Inc. | Method and apparatus for palletizing packages of random size and weight |
| DE19722121A1 (de) * | 1997-05-27 | 1998-12-03 | Wendt Gmbh | Vorrichtung zur Kennzeichnung und automatischen Identifikation und Klassifikation von Werkzeugen |
| US6146248A (en) | 1997-05-28 | 2000-11-14 | Lam Research Corporation | Method and apparatus for in-situ end-point detection and optimization of a chemical-mechanical polishing process using a linear polisher |
| TW374050B (en) | 1997-10-31 | 1999-11-11 | Applied Materials Inc | Method and apparatus for modeling substrate reflectivity during chemical mechanical polishing |
| US6123612A (en) | 1998-04-15 | 2000-09-26 | 3M Innovative Properties Company | Corrosion resistant abrasive article and method of making |
| US6000997A (en) * | 1998-07-10 | 1999-12-14 | Aplex, Inc. | Temperature regulation in a CMP process |
| US6428407B1 (en) * | 1998-09-03 | 2002-08-06 | James Tait Elder | Coated abrasive tool and construction method |
| US6206759B1 (en) * | 1998-11-30 | 2001-03-27 | Micron Technology, Inc. | Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines |
| DE19915909C2 (de) | 1998-12-11 | 2003-05-28 | Steinemann Technology Ag St Ga | Verfahren zur Steuerung des Schleifprozesses sowie Rechnersteuerung für Breitschleifmaschine |
| US6322427B1 (en) * | 1999-04-30 | 2001-11-27 | Applied Materials, Inc. | Conditioning fixed abrasive articles |
| US6264533B1 (en) * | 1999-05-28 | 2001-07-24 | 3M Innovative Properties Company | Abrasive processing apparatus and method employing encoded abrasive product |
| TW466153B (en) | 1999-06-22 | 2001-12-01 | Applied Materials Inc | Method and apparatus for measuring a pad profile and closed loop control of a pad conditioning process |
| US6293139B1 (en) * | 1999-11-03 | 2001-09-25 | Memc Electronic Materials, Inc. | Method of determining performance characteristics of polishing pads |
| JP4387010B2 (ja) | 1999-11-10 | 2009-12-16 | 株式会社ディスコ | 切削装置 |
| US6280288B1 (en) * | 2000-02-04 | 2001-08-28 | Norton Company | Process for determining optimum grinding conditions |
| US6896583B2 (en) | 2001-02-06 | 2005-05-24 | Agere Systems, Inc. | Method and apparatus for conditioning a polishing pad |
| US6612917B2 (en) * | 2001-02-07 | 2003-09-02 | 3M Innovative Properties Company | Abrasive article suitable for modifying a semiconductor wafer |
| DE60121292T2 (de) * | 2001-04-02 | 2007-07-05 | Infineon Technologies Ag | Verfahren zur Konditionierung der Oberfläche eines Polierkissens |
| US6564116B2 (en) * | 2001-04-06 | 2003-05-13 | Gou-Jen Wang | Method for determining efficiently parameters in chemical-mechanical polishing (CMP) |
-
2002
- 2002-04-03 US US10/115,538 patent/US7160173B2/en not_active Expired - Lifetime
-
2003
- 2003-02-07 EP EP03746029A patent/EP1490830B1/en not_active Expired - Lifetime
- 2003-02-07 AT AT03746029T patent/ATE324639T1/de not_active IP Right Cessation
- 2003-02-07 AU AU2003210922A patent/AU2003210922A1/en not_active Abandoned
- 2003-02-07 DE DE60304849T patent/DE60304849T2/de not_active Expired - Lifetime
- 2003-02-07 JP JP2003582709A patent/JP2005521565A/ja active Pending
- 2003-02-07 KR KR1020047015671A patent/KR100971567B1/ko not_active Expired - Fee Related
- 2003-02-07 CN CN03807901A patent/CN100577357C/zh not_active Expired - Fee Related
- 2003-02-07 WO PCT/US2003/003775 patent/WO2003085595A1/en not_active Ceased
- 2003-03-07 MY MYPI20030807A patent/MY141485A/en unknown
- 2003-03-10 TW TW092105131A patent/TWI277485B/zh not_active IP Right Cessation
-
2006
- 2006-11-07 US US11/557,305 patent/US20070084131A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| HK1073516A1 (en) | 2005-10-07 |
| KR20040097263A (ko) | 2004-11-17 |
| CN1647103A (zh) | 2005-07-27 |
| AU2003210922A1 (en) | 2003-10-20 |
| JP2005521565A (ja) | 2005-07-21 |
| MY141485A (en) | 2010-04-30 |
| EP1490830A1 (en) | 2004-12-29 |
| WO2003085595A1 (en) | 2003-10-16 |
| US20070084131A1 (en) | 2007-04-19 |
| KR100971567B1 (ko) | 2010-07-20 |
| EP1490830B1 (en) | 2006-04-26 |
| DE60304849D1 (de) | 2006-06-01 |
| TW200405842A (en) | 2004-04-16 |
| ATE324639T1 (de) | 2006-05-15 |
| US20030190868A1 (en) | 2003-10-09 |
| DE60304849T2 (de) | 2006-11-23 |
| US7160173B2 (en) | 2007-01-09 |
| CN100577357C (zh) | 2010-01-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI277485B (en) | Abrasive articles and methods for the manufacture and use of same | |
| TW565488B (en) | Fixed abrasive articles | |
| US8678878B2 (en) | System for evaluating and/or improving performance of a CMP pad dresser | |
| TW400567B (en) | The polishing device and its polishing method for the substrate | |
| US7014538B2 (en) | Article for polishing semiconductor substrates | |
| US7278901B2 (en) | Method and apparatus for measuring abrasion amount and pad friction force of polishing pad using thickness change of slurry film | |
| JP2008018528A (ja) | 複数の半導体ウェハを同時に両面研磨する方法および半導体ウェハ | |
| WO2005043132A1 (en) | Polishing endpoint detection system and method using friction sensor | |
| WO2007131094A2 (en) | Method and apparatus for chemical mechanical polishing of large size wafer with capability of polishing individual die | |
| US8337276B2 (en) | Automated detection of characteristics of abrasive products during use | |
| EP2181805A2 (en) | Device and method for determining the coefficient of friction of conditioner discs | |
| TWI784082B (zh) | 具有多用途複合窗口的拋光墊 | |
| CN1252336A (zh) | 化学机械研磨垫 | |
| US20080078231A1 (en) | Method of determining the number of active diamonds on a conditioning disk | |
| KR102607153B1 (ko) | 패드 마모 지표를 구비한 연마 패드 | |
| KR101342063B1 (ko) | 벨트형 연마패드 | |
| HK1073516B (en) | Abrasive articles and methods for the manufacture and use of same | |
| WO2005095053A1 (ja) | 直進型研磨方法及び装置 | |
| JP6500764B2 (ja) | 研磨ヘッドの評価方法及びウェーハの研磨方法 | |
| WO2023248086A1 (en) | Abrasive articles, systems and methods of use | |
| JP2006102830A (ja) | 研磨方法 | |
| TWM480759U (zh) | 具有特定切削能力之化學機械研磨修整器 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |