A7 1264618 五、發明說明（/ ) 【發明之詳細說明】 【發明所屬之技術領域】 本發明係有關於液晶基板製程或印刷基板製造、半導 體基板製程中使用後的感光性有機樹脂用鹼系顯影液的再 生裝置。 【習知技術】 在液晶基板製造過程或印刷基板製造、半導體基板製 造過程中，作爲樹脂的顯影液之氫氧化四甲基銨(TMAH)7jc 溶液(如2.380wt%)、氫氧化鉀水溶液等的鹼性水溶液係以 噴霧方式或浸漬方式等被使用著。習知法中，所採用之方 式係對顯影處理槽充塡既定濃度、一定量的新液鹼系顯影 液而開始，根據經驗等，以基板處理片數等作爲判斷依據 ’當該鹼系顯影液的鹼濃度或光阻濃度達到既定濃度的時 候’乃與預先準備的新液進行全量交換。 【發明所欲解決之課題】 然而，在習知的方式中，由於鹼系顯影液係一直連續 使用到既定的變質程度，所以鹼系顯影液的光阻濃度或鹼 濃度隨時間而變化，有不能控制線寬或膜厚（此決定顯影的 光阻圖案形狀)尺寸之問題。進而，製品的品質變得不安定 有不良品增加的問題。 又’因爲需要更換液體全部，有液體更換時的操作停 止時間延長，大幅地降低了運轉率，以及液體更換操作所 需的勞動成本增加的問題。 因此’爲解決上述問題，本發明被提出，以提供以下 4 本紙張^度適用中國國家標準（CNS)A4規格（210 X 297公ϋ -*·*»* --------------------訂—^------線 (請先閱讀背面之注意事項再填寫本頁) 1264618 A7 p—----— B7 五、發明說明（立） 的顯影液再生裝置爲目的··藉將感光性有機樹脂用鹼系顯 影液(在液晶基板製程或印刷基板製程、半導體基板製程等 中被重複使用）的光阻濃度及鹼濃度自動控制在既定的濃度 ，既可保持顯影性能的一定性，又可大幅的縮短操作停止 時間，進而降低整體製造成本。 【用以解決課題之手段】 爲了達到此目的，申請專利範圍第1項之顯影液再生 裝置，其特徵在於，具備：第1光阻濃度測定機構，係用 以測定感光性有機樹脂用鹼系顯影廢液之光阻濃度；第1 廢棄機構，係依據第1光阻濃度測定機構的測定結果將既 定比例的前述顯影廢液加以廢棄；第1補給機構，係依據 第1廢棄機構所廢棄的顯影廢液之量來補給鹼系顯影新液 或純水；第1鹼濃度測定機構，係用以測定顯影液(由第1 補給機構之補給結果所得者)之鹼濃度；以及，第2補給機 構’係依據第1鹼濃度測定機構的測定結果來補給鹼系顯 影原液。 申請專利範圍第2項之顯影液再生裝置，其特徵在於 ’具備：錯流(cross flow)式第1膜分離機構，係用以對感 光性有機樹脂用鹼系顯影廢液進行膜分離；第1供給機構 ’係將前述顯影廢液供給於第1膜分離機構；錯流式第2 膜分離機構，係進一步對第1透過液（由前述第1膜分離機 構的膜分離結果所得者)進行膜分離；第2供給機構，係將 前述第1透過液供給於第2膜分離機構；第1回流機構， 係將第1非透過液(由前述第1膜分離機構的膜分離結果所 5 0 家鮮（CNS)A4 雜（21() χ 297 )----- ^-------- ϋυ (請先閱讀背面之注意事項再填寫本頁) A7 1264618 五、發明說明（S ) 得者)回流至顯影廢液（由第1供給機構所供給者）；第2光 阻濃度測定機構，係用以測定第1非透過液(藉第1回流機 構所回流前者）、或回流後的顯影廢液的光阻濃度；以及， 第2廢棄機構’係依據第2光阻濃度測定機構的測定結果 ’將則述第1非透過液、或回流後的顯影廢液加以廢棄。 申請專利範圍第3項之顯影液再生裝置，係在申請專 利範圍第2項之顯影液再生裝置中具備第2回流機構，該 第2回流機構係將第2非透過液（由第2膜分離機構的膜分 離結果所得者）回流至顯影廢液（由第1供給機構所供給者) 〇 申請專利範圍第4項之顯影液再生裝置，係在申請專 利範圍第2項之顯影液再生裝置中具備：第3回流機構， 係將第2非透過液（由第2膜分離機構的膜分離結果所得者 )回流至第1透過液(由第2供給機構所供給）；第2光阻濃 度測定機構，係用以測定藉第3回流機構所回流前之第2 非透過液或回流後的第1透過液中的光阻濃度；以及，第 2廢棄機構’係依據第2光阻濃度測定機構的測定結果， 將前述第2非透過液、或回流後的第丨透過液加以廢棄。 申請專利範圍第5項之顯影液再生裝置，係在申請專 ‘利範圍第2〜4項中任一項之顯影液再生裝置中具備：第2 鹼濃度測定機構，係用以測定第2透過液（由第2膜分離機 構的膜分離結果所得者)的鹼濃度；以及，第3補給機構， 係用以補給鹼系顯影新液或鹼系顯影原液(依據第2鹼濃度 測定機構之測定結果之量）。 6 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 X 297公餐） (請先閱讀背面之注意事項再填寫本頁) —tr^il-------線』 1264618 A7 _______B7__ 五、發明說明（4 ) 申請專利範圍第6項之顯影液再生裝置，係在申請專 利範圍第5項之顯影液再生裝置中，由第3補給機構所補 給的液體係鹼系顯影原液。 首先’依據本發明，一旦由第1光阻濃度測定機構測 定出顯影廢液（感光性有機樹脂用的鹼系顯影廢液）的光阻 濃度，則藉第1廢棄機構，將根據相關光阻濃度測定結果 的量的顯影廢液廢棄，並藉由第1補給機構，補給依照所 廢棄量之量的顯影新液或純水。因此，顯影廢液（「供做 顯影後之液體」）能以含有所需濃度（含適當濃度之意，以 下亦同）的光阻成分而再生，進而能保持良好的塗佈性。 又’依據本發明，在顯影新液或純水補給後，藉由第 1鹼濃度測定機構，測定顯影液(由上述第1補給機構之補 給結果所得)之鹼濃度。在測定鹼濃度後，藉由第2補給機 構，補給鹼系顯影原液（根據鹼濃度測定結果之量）。因此 ’顯影廢液中的鹼濃度得以逐漸再生成爲所需濃度(含適當 濃度之意，以下亦同）。 另外，依據本發明，藉由錯流式第1膜分離機構，進 行顯影廢液之光阻成分被除去之第1透過液與光阻成分被 濃縮之第1非透過液之膜分離。同樣地，藉由錯流式第2 J莫分離機構，對相關之第1透過液進一步進行光阻成分被 除去之第2透過液與光阻成分被濃縮之第2非透過液之膜 分離。是以，可妥善地除去顯影廢液所含的光阻成分。 而且，依據本發明，藉由第1回流機構，讓第1非透 過液回流至顯影廢液(第1供給機構所供給者），藉由第2 7 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） -------------m裝— (請先閱讀背面之注意事項再填寫本頁) tr-ih------線 爾 1264618 A7 -— _B7 _____ 五、發明說明（f ) 光阻濃度測定機構，測定第1非透過液、或回流後的顯影 廢液的光阻濃度，藉由第2廢棄機構，依據前述測定結果 ’將第1非透過液、或被回流後的顯影廢液加以廢棄◦因 此’顯影廢液係以光阻成分濃縮之狀態被廢棄。 又’依據本發明，藉由第2回流機構，讓第2非透過 液(由第2膜分離機構的膜分離結果所得)回流至顯影廢液( 藉第1供給機構所供給者）。在此，第2非透過液已經藉由 第1膜分離機構進行膜分離，第1供給機構之顯影廢液供 給對象係第1膜分離機構。即就是，一度光阻成分被除去 的顯影液可再次與顯影廢液一起被第1膜分離機構做膜分 離。因此，既可降低操作成本，又可有效地利用資源。 且，依據本發明，藉由第3回流機構，讓第2非透過 液（由第2膜分離機構的膜分離結果所得）回流至第1透過 液(藉第2供給機構所供給）。又，藉由第2光阻濃度測定 機構，測定回流前的第2非透過液、或回流後的第1透過 液的濃度；藉由第2廢棄機構，依據測定結果，來將第2 非透過液、或第1透過液加以廢棄。即就是，一度光阻成 分被除去的顯影液可再次被循環至第2膜分離機構。因此 ，既可降低操作成本，又可有效地利用資源。 且，依據本發明，當藉由第2鹼濃度測定機構測定出 第2透過液(由第2膜分離機構的膜分離結果所得)的鹼濃 度，則藉由第3補給機構，補給鹼系顯影新液或鹼系顯影 原液(根據第2鹼濃度測定機構之測定結果之量）。因此， 供做顯影後的顯影廢液的鹼濃度可逐漸再生成爲所需濃度 8 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） ------------4 (請先閱讀背面之注意事項再填寫本頁)A7 1264618 V. DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to an alkali-based development of a photosensitive organic resin after use in a liquid crystal substrate process or a printed circuit board manufacturing process and a semiconductor substrate process. Liquid regeneration device. [Technical Technology] In the liquid crystal substrate manufacturing process, the manufacturing of a printed circuit board, and the manufacturing process of a semiconductor substrate, tetramethylammonium hydroxide (TMAH) 7jc solution (such as 2.380 wt%), a potassium hydroxide aqueous solution, etc. as a developing solution of a resin The alkaline aqueous solution is used by a spray method, an immersion method, or the like. In the conventional method, the method is adopted in which the developing treatment tank is filled with a predetermined concentration and a certain amount of a new liquid alkali-based developing solution, and based on experience, the number of substrates to be processed is used as a basis for judgment. When the alkali concentration or the photoresist concentration of the liquid reaches a predetermined concentration, it is exchanged with the new liquid prepared in advance. [Problems to be Solved by the Invention] However, in the conventional method, since the alkali-based developing solution is continuously used to a predetermined degree of deterioration, the photoresist concentration or the alkali concentration of the alkali-based developing solution changes with time. The problem of the line width or film thickness (which determines the shape of the developed resist pattern) cannot be controlled. Furthermore, the quality of the product becomes unstable and there is a problem that the number of defective products increases. Further, since it is necessary to replace all of the liquid, the operation stop time at the time of liquid replacement is prolonged, the operation rate is greatly reduced, and the labor cost required for the liquid replacement operation is increased. Therefore, in order to solve the above problems, the present invention has been proposed to provide the following four papers to the Chinese National Standard (CNS) A4 specification (210 X 297 ϋ -*·*»* --------- -----------Book-^------Line (please read the note on the back and fill in this page) 1264618 A7 p------ B7 V. Invention Description The purpose of the developer regenerating device is to automatically control the photoresist concentration and alkali concentration of the photosensitive organic resin in an alkali-based developing solution (repeated in a liquid crystal substrate process, a printed substrate process, or a semiconductor substrate process). The predetermined concentration can maintain the certainty of the developing performance, and can greatly shorten the operation stop time, thereby reducing the overall manufacturing cost. [Means for Solving the Problem] In order to achieve this, the developer of the first application of the patent scope is applied. The regenerative device includes a first photoresist concentration measuring mechanism for measuring a photoresist concentration of an alkali-based developing waste liquid for a photosensitive organic resin, and a first disposal mechanism according to a first photoresist concentration measuring mechanism. The measurement result will be a predetermined ratio of the aforementioned developing waste liquid The first supply mechanism supplies the alkali-developing new liquid or the pure water according to the amount of the development waste liquid discarded by the first waste facility; the first alkali concentration measuring mechanism is used to measure the developer (by the first The alkali concentration of the replenishment result of the replenishing means; and the second replenishing means' replenishes the alkali-developing stock solution based on the measurement result of the first alkali concentration measuring means. It is characterized in that it includes a cross flow type first membrane separation mechanism for performing membrane separation on an alkali-based development waste liquid for a photosensitive organic resin, and a first supply mechanism for supplying the development waste liquid to the first 1 membrane separation mechanism; a cross-flow type membrane separation mechanism further performs membrane separation on a first permeate (a result of membrane separation by the first membrane separation means); and a second supply mechanism is the first The permeate is supplied to the second membrane separation mechanism, and the first reflux mechanism is a first non-permeate (the result of the membrane separation by the first membrane separation mechanism is 50 (CNS) A4 (21() χ 297 )----- ^-------- ϋυ (please read first Note on the back side of the page. A7 1264618 V. Inventor's Note (S) The person who returns to the developing waste liquid (provided by the first supply mechanism); the second photoresist concentration measuring mechanism is used to determine The first non-permeate (the former reflow by the first reflow mechanism) or the photoresist concentration of the development waste liquid after reflow; and the second waste mechanism 'based on the measurement result of the second photoresist concentration measuring mechanism' The developer liquid recycling device according to claim 3, wherein the developer liquid regenerating device of the second aspect of the invention is provided with a second reflow mechanism. In the second reflow mechanism, the second non-permeate (the result of the membrane separation by the second membrane separation mechanism) is returned to the development waste liquid (provided by the first supply mechanism). In the developer regenerating apparatus of the second aspect of the invention, the third recirculation mechanism is configured to reflow the second non-permeate (the result of the membrane separation by the second membrane separation mechanism) to the first permeation. Liquid (by the second supply The second photoresist concentration measuring mechanism is configured to measure the photoresist concentration in the first permeate before returning from the third reflow mechanism or in the first permeate after reflow; and the second discarding The mechanism "disposes the second non-permeate or the second-permeate permeate after reflow according to the measurement result of the second photoresist concentration measuring means. The developing solution regenerating device according to any one of the items of the second aspect of the present invention, wherein the second alkali concentration measuring means is for measuring the second transmission. The alkali concentration of the liquid (obtained by the membrane separation result of the second membrane separation means); and the third supply means for replenishing the alkali-based developing solution or the alkali-based developing solution (measured by the second alkali concentration measuring means) The amount of results). 6 This paper size applies to China National Standard (CNS) A4 specification (21〇X 297 public meals) (please read the notes on the back and fill out this page) —tr^il-------Line 1264618 A7 _______B7__ 5. Description of the Invention (4) The developing solution regenerating device of the sixth aspect of the invention is the liquid system alkali developing stock solution supplied by the third supply mechanism in the developing solution regenerating device of the fifth application. First, according to the present invention, when the photoresist concentration of the development waste liquid (the alkali-based development waste liquid for the photosensitive organic resin) is measured by the first photoresist concentration measuring means, the first disposal mechanism is used, and the relevant photoresist is used. The developing waste liquid in the amount of the concentration measurement result is discarded, and the developing liquid or the pure water in accordance with the amount discarded is supplied by the first supply mechanism. Therefore, the developing waste liquid ("liquid for development") can be regenerated with a photoresist component containing a desired concentration (including an appropriate concentration, the same applies hereinafter), thereby maintaining good coatability. Further, according to the present invention, after the development of the new liquid or the pure water, the alkali concentration of the developer (obtained by the supply of the first supply means) is measured by the first alkali concentration measuring means. After the alkali concentration was measured, the alkali-developing stock solution (the amount based on the alkali concentration measurement result) was supplied by the second supply mechanism. Therefore, the concentration of alkali in the developing waste liquid is gradually regenerated to the desired concentration (including the appropriate concentration, the same applies hereinafter). Further, according to the present invention, the first permeation liquid from which the photoresist component of the development waste liquid is removed is separated from the membrane of the first non-permeation liquid in which the photoresist component is concentrated by the cross-flow type first membrane separation means. Similarly, the second permeation liquid from which the photoresist component is removed in the first permeated liquid is separated from the second non-permeation membrane in which the photoresist component is concentrated by the cross-flow type second J-separation mechanism. Therefore, the photoresist component contained in the developing waste liquid can be properly removed. Further, according to the present invention, the first non-permeate is returned to the developing waste liquid by the first recirculation mechanism (the one supplied by the first supply means), and the Chinese National Standard (CNS) A4 is applied by the second paper size. Specifications (210 x 297 mm) -------------m installed - (Please read the notes on the back and fill out this page) tr-ih------Line 1264618 A7 - _B7 _____ V. DESCRIPTION OF THE INVENTION (f) The photoresist concentration measuring means measures the photoresist concentration of the first non-permeate or the developed waste liquid after reflow, and the second waste mechanism is based on the measurement result (1) The non-permeate or the developing waste liquid after being refluxed is discarded, so that the developing waste liquid is discarded in a state where the photoresist component is concentrated. Further, according to the present invention, the second non-transmissive liquid (obtained as a result of the membrane separation by the second membrane separation means) is returned to the development waste liquid (by the supplier of the first supply means) by the second recirculation means. Here, the second non-permeate has been subjected to membrane separation by the first membrane separation mechanism, and the development waste liquid of the first supply mechanism is supplied to the first membrane separation mechanism. That is, the developer whose first photoresist component is removed can be separated from the developing waste liquid by the first membrane separation mechanism. Therefore, it is possible to reduce operating costs and utilize resources efficiently. According to the present invention, the second non-transmissive liquid (obtained by the membrane separation by the second membrane separation means) is returned to the first permeate (supplied by the second supply means) by the third recirculation means. Further, the second non-permeate before reflow or the concentration of the first permeated liquid after reflow is measured by the second photoresist concentration measuring means, and the second non-permeating means is used to measure the second non-permeate according to the measurement result. The liquid or the first permeate is discarded. That is, the developer whose first photoresist component is removed can be recycled to the second membrane separation mechanism again. Therefore, both operating costs can be reduced and resources can be utilized efficiently. Further, according to the present invention, when the alkali concentration of the second permeated liquid (obtained by the membrane separation of the second membrane separation means) is measured by the second alkali concentration measuring means, the alkali replenishing means is used to replenish the alkali-developing means. A new liquid or an alkali-based developing stock solution (amount based on the measurement result of the second alkali concentration measuring means). Therefore, the alkali concentration of the developing waste liquid for development can be gradually regenerated to the desired concentration. 8 The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 x 297 mm) ---------- --4 (Please read the notes on the back and fill out this page)
----訂ij-------線I 1264618 五、發明說明（6 ) 〇 且，依據本發明，藉由第3補給機構，補給鹼系顯影 原液。這裡，第1膜分離機構或第2膜分離機構雖然係錯 流式的，惟透過液與濃縮液的比率是透過液高出許多。因 此’供做顯影後的顯影液之鹼濃度雖有降低，仍可防止爲 了將鹼濃度調整至所需濃度所造成之顯影液本身的量發生 變化。若液量發生變化，會被要求進行使顯影液的量達到 適當範圍之監控般之繁瑣處理(操作）。例如，顯影液的量 太多的時候，會要求將還未惡化到廢棄處分的顯影液加以 廢棄；另一方面，在顯影液的量不足的時候，爲使顯影液 中的鹼濃度及光阻濃度達到所需濃度，會被要求顯影原液 、顯影新液、純水的補給。 【發明之實施形態】 以下，對本發明的最佳實施例，參照附圖加以說明。 本發明的顯影液再生設備，係用以對在液晶製程、印刷基 板製程、半導體基板製程中所使用之供顯影後的顯影廢液 進行再生處理用者。圖1係本發明的一實施例的顯影液再 生設備100的槪略流程圖。且，在各附圖中，爲使發明的 理解簡單化，係顯示簡略化的各裝置。 如圖1所示，顯影液再生設備100中，設有第1儲 存槽1、第1槽送液閥2、第1泵3、第1送返液量調節閥 4、第1吸光光度計5、第1送液量調節閥6、第1廢液量 調節閥7、第1再使用液量調節閥8、第1新液供給量調節 閥9、及第2儲存槽1〇、第1鹼濃度計11、第1溫度計12 9 ^紙張尺度適用中國國家標準(CNS)A4規格（210 X 297公釐） - -—I--------·—11 —tl'·丨^ — I—I (請先閱讀背面之注意事項再填寫本頁) A7 1264618 五、發明說明（7 ) 、第1負荷感應器(load cell)13、第2槽送液閥I4、第3泵 15、第1原液供給量調節閥16、第1調合槽17、第2負荷 感應器18、第3泵19、第1熱交換器20、第1小槽21、 第2鹼濃度計22、第2溫度計23、第1調合槽送液閥24 、第4泵25、第4儲存槽26、第4槽送液閥27、第5泵 28、微細粒子除去過濾器29、氮氣送氣管30。 第1儲存槽1係一用以將於顯影製程(光微影製程）中 所使用、即是供做顯影後的顯影液（顯影廢液）加以儲存的 槽。此第1儲存槽1中，形成有顯影廢液流入的流入區la 與顯影廢液流出的流出區lb，同時，於流入區la與流出 區lb之間，設有由樹脂篩網所形成的除泡過濾器lc。流 入區la中係流入有未經過任何再生處理的顯影廢液(以下 ’爲方便起見，簡稱爲「未再生顯影廢液」）。流出區lb 中，係將流經此流入區la、且經過由除泡過濾器lc來除 去未再生顯影廢液中的泡沬後的顯影廢液(以下，爲方便起 見，簡稱爲「未再生顯影廢液」）加以儲存。如此般地，由 於未再生顯影廢液中的泡沫被除泡過濾器lc除去，可除去 以後的顯影液再生處理的障礙。 第1槽送液閥2係一用以對接在第1儲存槽1下方之 ‘第1送液管51的流路進行開閉，來調節第1次再生處理完 顯影廢液(送入第1送液管51中）之流量(當然，在第1槽 送液閥2關閉時，爲「〇」升(litre)。對於以下所說明的閥 亦相同）的閥。第1泵3係一用以讓第1次再生處理完顯影 廢液通過第1送液管51而送向下一製程側(下流側)的泵。 10 本中國國家標準（CNS)A4規格（210 X 297公釐^ ' -------------up裝 (請先閱讀背面之注意事項再填寫本頁)----Book ij-------Line I 1264618 V. Inventive Note (6) Further, according to the present invention, the alkali-based developing solution is supplied by the third supply mechanism. Here, although the first membrane separation mechanism or the second membrane separation mechanism is of a cross-flow type, the ratio of the permeate to the concentrate is much higher than that of the permeate. Therefore, although the alkali concentration of the developer after development is lowered, it is possible to prevent the amount of the developer itself from being changed in order to adjust the alkali concentration to the desired concentration. If the amount of liquid changes, it is required to perform a tedious process (operation) for monitoring the amount of the developer to an appropriate range. For example, when the amount of the developer is too large, it is required to discard the developer which has not deteriorated to the disposal site; on the other hand, when the amount of the developer is insufficient, the alkali concentration and the photoresist in the developer are made. When the concentration reaches the desired concentration, it will be required to supply the original solution, the developed new solution, and the pure water. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. The developer regenerating apparatus of the present invention is used for regenerating a developing waste liquid for development which is used in a liquid crystal process, a printing substrate process, or a semiconductor substrate process. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic flow chart of a developer regenerating apparatus 100 according to an embodiment of the present invention. Further, in each of the drawings, in order to simplify the understanding of the invention, each device is simplified. As shown in FIG. 1, the developer storage device 100 is provided with a first storage tank 1, a first tank liquid supply valve 2, a first pump 3, a first return liquid amount adjusting valve 4, and a first absorption photometer 5. The first liquid supply amount adjusting valve 6, the first waste liquid amount adjusting valve 7, the first reuse liquid amount adjusting valve 8, the first new liquid supply amount adjusting valve 9, and the second storage tank 1 and the first alkali Concentration meter 11, first thermometer 12 9 ^ paper scale applicable to China National Standard (CNS) A4 specification (210 X 297 mm) - - - I-------- · 11 - tl' · 丨 ^ — I-I (please read the precautions on the back and fill out this page) A7 1264618 V. Invention description (7), first load cell 13 (load cell) 13, second tank liquid supply valve I4, third pump 15, The first stock solution supply amount adjusting valve 16, the first mixing tank 17, the second load sensor 18, the third pump 19, the first heat exchanger 20, the first small tank 21, the second alkali concentration meter 22, and the second thermometer 23. The first mixing tank liquid supply valve 24, the fourth pump 25, the fourth storage tank 26, the fourth tank liquid supply valve 27, the fifth pump 28, the fine particle removal filter 29, and the nitrogen gas supply pipe 30. The first storage tank 1 is a tank for storing in a developing process (photolithography process), that is, a developing solution (developing waste liquid) for development. In the first storage tank 1, an inflow region 1a in which the developing waste liquid flows in and an outflow region 1b in which the developing waste liquid flows out are formed, and a resin mesh is formed between the inflow region 1a and the outflow region 1b. Defoaming filter lc. In the inflow zone la, there is a developing waste liquid which has not undergone any regeneration treatment (hereinafter referred to as "unregenerated developing waste liquid" for convenience). In the outflow zone lb, the developing waste liquid which flows through the inflow zone la and passes through the bubble in the unregenerated developing waste liquid by the defoaming filter lc (hereinafter, for convenience, simply referred to as "not Regeneration waste liquid") is stored. In this way, since the foam in the unregenerated developing waste liquid is removed by the defoaming filter lc, the obstacle of the subsequent developer regeneration processing can be removed. The first tank liquid supply valve 2 is configured to open and close the flow path of the first liquid supply pipe 51 that is butted under the first storage tank 1 to adjust the first regeneration process to the development waste liquid (to send the first delivery) The flow rate of the liquid pipe 51 (of course, when the first tank liquid supply valve 2 is closed, it is "lit". The valve is the same as the valve described below). The first pump 3 is a pump for sending the development waste liquid to the next process side (downstream side) through the first liquid supply pipe 51 in the first regeneration process. 10 China National Standard (CNS) A4 specifications (210 X 297 mm ^ ' -------------up installed (please read the notes on the back and fill out this page)
---^ i ^-------線 L A7 1264618 五、發明說明（S ) 第1送返液量調節閥4係一藉開閉第2送液管52的流 路來調節顯影廢液(送入第2送液管52中）之流量的閥。第 2送液管52，係由第1送液管51分出的一條流路。此第2 送液管52的一端，係連接著第1送液管51，另一方面， 第2送液管52的另一端，係與第1儲存槽1相接。即就是 ，藉第1送返液量調節閥4，調節送返第1儲存槽1的顯 影廢液之量。 第1吸光光度計5，係用以測定第1次再生處理完顯 影廢液(通過第2送液管52所送液)之光阻濃度的測定器， 相對於第2送液管52，並排地裝著。根據此第1吸光光度 計5的測定結果，即是，依照第1次再生處理完顯影廢液 之光阻濃度，來控制再使用或廢棄的顯影液之比例。 第1送液量調節閥6 ’係用以調節第1次再生處理完 顯影廢液(通過第3送液管53所送液)之流量。第3送液管 53係由第1送液管SI所分出的流路，其一端連接著第i 送液管51，而另一端與第2儲存槽10相連接。 第1廢液量調節閥7，係藉開閉第1廢液管61的流路 來調節第1次再生處理完顯影廢液(流經第i廢液管61中) 之量。這裡，第1廢液管61係從第丨送液管y分出的 ‘流路，其一端連接著第1送液管51，而另一端與既定的 廢液槽或廢液處理裝置連接。另一方面，第丨再使用液量 調節閥8，係藉由開閉第3送液管53的流路來調節第丨次 再生處理完顯影廢液(流經第3送液管53中）之液最。 此等第1廢液量調節閥7及第i再使用液量調節閥8 11 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱) --—-一- --------------------^ . I h------ (請先閱讀背面之注意事項再填寫本頁) 1264618 五、發明說明（？） ，係互相連動的，此等第1廢液量調節閥7及第1再使用 液量調節閥8之開放量及開放時間，係根據第1吸光光度 計5的測定結果來控制的。又，通過第1廢液量調節閥7 的第1次再生處理完顯影廢液之量，與通過第1再使用液 量調節閥8的顯影廢液之量的總合液量，係與通過第1送 液量調節閥6的顯影廢液之量一致的。因此，可依照第1 次再生處理完顯影廢液之光阻濃度，控制再使用或廢棄的 顯影液之比例。 第1新液供給量調節閥9，係藉開閉第1供給管71的 流路來調節鹼系顯影新液(流經第1供給管71中）之量。這 裡，所謂的鹼系顯影新液，係將鹼系顯影原液(氫氧化四甲 基銨，TMAH)稀釋成2.38wt%的顯影液。此鹼系顯影原液 ’係通常爲了縮減運輸成本而預先由工廠生產後運往(運送 至)顯影液再生設備100的設置場所之20〜25wt%的鹼系顯 影液。 第1供給管71的下流側一端，係第1再使用液量調節 閥8的下流側，與第3送液管53相連。即就是，藉由第1 新液供給量調節閥9，可調節對第3送液管中流動的顯影 廢液所追加供給之顯影新液的量。第2儲存槽10，係將對 ，顯影廢液追加供給顯影新液後的液體(以下，將對顯影廢液 追加供給顯影新液後的液體，稱爲「第2次再生處理完的 顯影液」），暫時儲存用的槽(容器體）。 第1鹼濃度計11，係測定「第2次再生處理完的顯影 液」（儲存在第2儲存槽1〇中）的鹼濃度用的測定儀器。此 12 本紙張尺度國家標準（CNS)A4規格⑵〇 χ观公餐） 一" --------------------訂—」------•線‘ (請先閱讀背面之注意事項再填寫本頁) 1264618 A7 ^ 一 B7 五、發明說明（,c ) 第1鹼濃度計11的測定原理，係將顯影廢液作爲觸媒，使 電流流經一次線圈與二次線圈間的同時，測定在二次線圈 所產生的交流電流，進而推導出一次線圏的流動電流之相 位與二次線圈的流動電流之相位差，來測定鹼濃度。 第1溫度計12，係用以測定第2次再生處理完的顯影 液(儲存在第2儲存槽1〇)的溫度的測定儀器，依照此溫度 計的測定結果，修正第2次再生處理完的顯影液的溫度値( 由第1鹼濃度計11的測定値推導出）。因此，可提高第2 次再生處理完的顯影液的鹼濃度之測定精度。此係因爲， 第1鹼濃度計11的測定値，隨著第2次再生處理完的顯影 液的溫度變化，會有若干的變動。 第1負荷感應器13，係輸出與負荷大小相對應之電流 値，被夾於突出部l〇a(以突出於第2儲存槽10的外壁之狀 態來設置)及底部l〇b (台座)之間。因此，根據由第1負荷 感應器13所輸出的電流値，可測定第2儲存槽10全體的 重量。而且，從此測定値，將第2儲存槽10的本身重量値 減去，可導出於第2儲存槽10內儲存的顯影廢液的量。另 外，根據此第1負荷感應器13之測定結果，來控制第1新 液供給量調節閥9之開放量及開放時間。 第2槽送液閥14係一用以對連接於第2儲存槽10的 下方(下端)之第4送液管54的流路進行開閉，來調節第2 次再生處理完顯影廢液(送入第4送液管54中）之流量的閥 。第3泵15係一用以通過第4送液管54來將第2次再生 處理完顯影廢液送往向下一製程側(下流側)的泵。 13 ---------------------訂—„------- (請先閱讀背面之注意事項再填寫本頁}---^ i ^-------Line L A7 1264618 V. INSTRUCTION DESCRIPTION (S) The first return liquid amount adjusting valve 4 adjusts the development waste by opening and closing the flow path of the second liquid supply pipe 52. A valve for the flow rate of the liquid (into the second liquid supply pipe 52). The second liquid supply pipe 52 is a flow path branched by the first liquid supply pipe 51. One end of the second liquid supply pipe 52 is connected to the first liquid supply pipe 51, and the other end of the second liquid supply pipe 52 is in contact with the first storage tank 1. That is, the amount of the developing waste liquid sent back to the first storage tank 1 is adjusted by the first return liquid amount adjusting valve 4. The first absorptiometer 5 is a measuring device for measuring the photoresist concentration of the developing waste liquid (the liquid fed through the second liquid supply tube 52) after the first regeneration treatment, and is arranged side by side with respect to the second liquid supply tube 52. The ground is loaded. According to the measurement result of the first absorptiometer 5, the ratio of the developer to be reused or discarded is controlled in accordance with the photoresist concentration of the development waste liquid after the first regeneration treatment. The first liquid supply amount adjusting valve 6' is for adjusting the flow rate of the developing waste liquid (the liquid fed through the third liquid supply pipe 53) after the first regeneration process. The third liquid supply pipe 53 is a flow path branched by the first liquid supply pipe SI, and one end of the flow path is connected to the i-th liquid supply pipe 51, and the other end is connected to the second storage tank 10. The first waste liquid amount adjusting valve 7 adjusts the amount of the developing waste liquid (flowing through the i-th waste liquid pipe 61) after the first regeneration process by opening and closing the flow path of the first waste liquid pipe 61. Here, the first waste liquid pipe 61 is a "flow path" branched from the second liquid supply pipe y, and one end of the first waste liquid pipe 61 is connected to the first liquid feed pipe 51, and the other end is connected to a predetermined waste liquid tank or waste liquid processing device. On the other hand, in the second use of the liquid amount adjusting valve 8, the flow path of the third liquid supply pipe 53 is opened and closed to adjust the third-stage regeneration processing waste liquid (flowing through the third liquid supply pipe 53). The most liquid. These 1st waste volume control valve 7 and the ith re-use liquid volume adjustment valve 8 11 This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 public) ------ ----------------^ . I h------ (Please read the notes on the back and fill out this page) 1264618 V. Inventions (?) The opening amount and the opening time of the first waste liquid amount adjusting valve 7 and the first reuse liquid amount adjusting valve 8 are controlled based on the measurement results of the first absorptive photometer 5 in conjunction with each other. In addition, the amount of the development waste liquid that has been processed by the first regeneration of the first waste liquid amount adjustment valve 7 and the total amount of the liquid waste that has passed through the first reuse liquid amount adjustment valve 8 are passed through The amount of developing waste liquid of the first liquid supply amount adjusting valve 6 is the same. Therefore, the proportion of the developer to be reused or discarded can be controlled in accordance with the photoresist concentration of the development waste liquid after the first regeneration treatment. The first fresh liquid supply amount adjusting valve 9 adjusts the amount of the alkali-based developing new liquid (flowing through the first supply pipe 71) by opening and closing the flow path of the first supply pipe 71. Here, the so-called alkali-developing new solution is obtained by diluting an alkali-based developing stock solution (tetramethylammonium hydroxide, TMAH) into a developing solution of 2.38 wt%. This alkali-based developing stock solution is usually produced in advance by the factory in order to reduce the transportation cost, and is transported to (to the storage of) the alkali-based developing solution of 20 to 25 wt% of the installation site of the developing solution regeneration apparatus 100. The downstream side of the first supply pipe 71 is the downstream side of the first reuse liquid amount adjusting valve 8, and is connected to the third liquid supply pipe 53. In other words, the first fresh liquid supply amount adjusting valve 9 can adjust the amount of the developing new liquid additionally supplied to the developing waste liquid flowing through the third liquid feeding pipe. In the second storage tank 10, the liquid after the development waste liquid is additionally supplied to the development liquid (hereinafter, the liquid after the development waste liquid is additionally supplied to the development liquid is referred to as "the second regeneration-processed developer" "), a tank (container body) for temporary storage. The first alkali concentration meter 11 is a measuring instrument for measuring the alkali concentration of the "developing solution after the second regeneration treatment" (stored in the second storage tank 1). The 12 national standards for paper quality (CNS) A4 specifications (2) 〇χ 公 public meal) a " -------------------- order -"----- -•Line' (Please read the note on the back and fill out this page) 1264618 A7 ^ A B7 V. Inventive Note (,c) The principle of the first alkali concentration meter 11 is to use the developing waste liquid as a catalyst. The current flows through the primary coil and the secondary coil, and the alternating current generated in the secondary coil is measured, and the phase difference between the phase of the flowing current of the primary coil and the flowing current of the secondary coil is derived to determine the alkali concentration. . The first thermometer 12 is a measuring instrument for measuring the temperature of the developing solution (stored in the second storage tank 1) after the second regeneration treatment, and corrects the development after the second regeneration processing based on the measurement result of the thermometer. The temperature 値 of the liquid (derived from the measurement of the first alkali concentration meter 11). Therefore, the measurement accuracy of the alkali concentration of the developer after the second regeneration treatment can be improved. This is because the measurement of the first alkali concentration meter 11 varies depending on the temperature of the developer that has been subjected to the second regeneration treatment. The first load sensor 13 outputs a current 相对 corresponding to the magnitude of the load, and is sandwiched between the protruding portion 10a (provided to protrude from the outer wall of the second storage tank 10) and the bottom portion lb (pedestal) between. Therefore, the weight of the entire second storage tank 10 can be measured based on the current 输出 output from the first load sensor 13. Further, from this measurement, the weight of the second storage tank 10 itself is subtracted, and the amount of the development waste liquid stored in the second storage tank 10 can be derived. Further, based on the measurement result of the first load sensor 13, the opening amount and the opening time of the first fresh liquid supply amount adjusting valve 9 are controlled. The second tank liquid supply valve 14 is configured to open and close the flow path of the fourth liquid supply tube 54 connected to the lower (lower end) of the second storage tank 10 to adjust the second regeneration processing waste liquid (send A valve that flows into the fourth liquid supply pipe 54). The third pump 15 is a pump for sending the second regeneration processing waste liquid to the next process side (downstream side) through the fourth liquid supply pipe 54. 13 --------------------- Order — „------- (Please read the notes on the back and fill out this page)
本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） A7 1264618 五、發明說明（丨丨） 第1原液供給量調節閥16係一藉開閉第2供給管72 的流路來調節流經第2供給管72中的鹼系顯影原液 (20〜25%的TMAH水溶液)之流量的閥。第2供給管72的 下流側一端係與第1調合槽P相連。 第1調合槽17係用以儲存第2次再生處理完顯影廢液 (通過第4送液管54所送液），及鹼系顯影原液(通過第1 原液供給量調節閥16所送液)的兩液之槽。第1調合槽17 中，裝設有攪拌葉片Pa及驅動馬達17b。此等攪拌葉片 17a及驅動馬達17b ’係用以攪拌儲存在第1調合槽17內 的溶液。因此，可以將第2次再生處理完顯影廢液(經由第 4送液管54所送液)及顯影原液(通過第2供給管72所供給 )之兩顯影液均等地混合。如此般的混合液被稱爲「第3次 再生處理完顯影廢液」。 第2負荷感應器18，係與第1負荷感應器13同樣地 ，輸出與負荷的大小相對應之電流値，其夾在突出部分 17a(以突出於第1調合槽17外壁的狀態所設置）與底部 17b(台座)之間。因此，能以與第1負荷感應器13同樣的 要領，推導出於第1調合槽Π內所儲存的顯影廢液之量。 對第1原液供給量調節閥16的開放量及開放時間之控制， .係依照第2負荷感應器18的輸出電流値而進行的。 第3泵19係一通過第1循環管81，向第1熱交換器 2〇側送入第3次再生處理完顯影廢液的泵。此處，第1循 環管81係用以使得第3次再生處理完顯影廢液(儲存在第 1調合槽17內）循環的流路。藉由測定於此流路中流動的 14 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) tr-· 線」 1264618 五、發明說明（α) 第3次再生處理完顯影廢液之鹼濃度，可正確地測定第3 次再生處理完顯影廢液之鹼濃度。 第1熱交換器20，係用以冷卻於第1循環管81中流 動的顯影液之裝置◦其用以防止：因第3次再生處理完顯 影廢液(儲存於第1調合槽17內）受到攪拌而液溫上昇所造 成之第2鹼濃度計22的測定結果產生誤差。 第1小槽21，係一用以儲存顯影液(通過第1循環管 81送液(循環))的小槽，裝於第1熱交換器2()的下流側。 第2鹼濃度計22，係用以測定第3次再生處理完顯影廢液 (儲存於第丨小槽21內）之鹼濃度的測定儀器。第2鹼濃度 計22的測定原理，因與第1鹼濃度計11的測定原理相同 ，所以省略其說明。 第2溫度計23 ’係用以測定第3次再生處理完顯影廢 液(儲存於第1小槽21內）的液溫。根據第2溫度計23的 測定結果，來修正第2鹼濃度計22的測定結果’如此可提 高第2鹼濃度計22的測定精度。 第1調合槽送液閥24係一藉由將連接於第3儲存槽 16的下端之第5送液管55的流路加以開閉，來調節第3 次再生處理完顯影廢液(送入第5送液管55中）之流量的閥 ，。第4泵25係一通過第5送液管55，將第3次再生處理 完顯影廢液送液至下流側的泵。 第4儲存槽26係一用以儲存第3次再生處理完顯影廢 液(通過第5送液管55向下流側送液)的槽。由第4儲存槽 26,將顯影製程所必需程度的第3次再生處理完顯影廢液 15 (請先閱讀背面之注意事項再填寫本頁)This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public). A7 1264618 V. Description of the Invention (丨丨) The first stock solution adjusting valve 16 is opened and closed by the flow path of the second supply pipe 72. A valve that regulates the flow rate of the alkali-based developing stock solution (20 to 25% of the TMAH aqueous solution) flowing through the second supply pipe 72. One end of the second supply pipe 72 on the downstream side is connected to the first mixing tank P. The first mixing tank 17 is for storing the second-stage regeneration-processed development waste liquid (the liquid supplied through the fourth liquid supply tube 54) and the alkali-based development stock solution (the liquid is supplied through the first raw liquid supply amount adjustment valve 16). The two liquid tank. The first mixing tank 17 is provided with a stirring blade Pa and a drive motor 17b. The agitating blades 17a and the driving motor 17b' are used to agitate the solution stored in the first mixing tank 17. Therefore, the two developing solutions of the developing waste liquid (the liquid fed through the fourth liquid supply pipe 54) and the developing raw liquid (supplied by the second supply pipe 72) can be uniformly mixed. Such a mixed liquid is referred to as "the third regeneration treatment waste liquid". Similarly to the first load sensor 13, the second load sensor 18 outputs a current 相对 corresponding to the magnitude of the load, which is sandwiched by the protruding portion 17a (provided to protrude from the outer wall of the first mixing groove 17) Between the bottom 17b (pedestal). Therefore, the amount of the development waste liquid stored in the first mixing tank can be derived in the same manner as the first load sensor 13. The control of the opening amount and the opening time of the first stock solution supply amount adjusting valve 16 is performed in accordance with the output current 第 of the second load sensor 18. The third pump 19 passes through the first circulation pipe 81, and feeds the third regeneration treatment waste liquid to the first heat exchanger 2 side. Here, the first circulation pipe 81 is a flow path for circulating the development waste liquid (stored in the first mixing tank 17) in the third regeneration process. By measuring the 14 paper grades flowing in this flow path, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applied (please read the notes on the back and fill out this page) tr-· Line" 1264618 V (Invention) (α) The alkali concentration of the development waste liquid after the third regeneration treatment can accurately measure the alkali concentration of the development waste liquid after the third regeneration treatment. The first heat exchanger 20 is a device for cooling the developer flowing through the first circulation pipe 81, and is for preventing the development waste liquid from being stored in the first mixing tank 17 by the third regeneration process. The measurement result of the second alkali concentration meter 22 caused by the increase in the liquid temperature caused by the stirring causes an error. The first small tank 21 is a small tank for storing a developing solution (liquid feeding (circulation) through the first circulation pipe 81), and is attached to the downstream side of the first heat exchanger 2 (). The second alkali concentration meter 22 is a measuring instrument for measuring the alkali concentration of the developing waste liquid (stored in the second small tank 21) after the third regeneration treatment. Since the measurement principle of the second alkali concentration meter 22 is the same as that of the first alkali concentration meter 11, the description thereof will be omitted. The second thermometer 23' is used to measure the liquid temperature of the third-stage regenerated processing waste liquid (stored in the first small tank 21). The measurement result of the second alkali concentration meter 22 is corrected based on the measurement result of the second thermometer 23, so that the measurement accuracy of the second alkali concentration meter 22 can be improved. The first mixing tank liquid supply valve 24 is configured to open and close the flow path of the fifth liquid supply pipe 55 connected to the lower end of the third storage tank 16, thereby adjusting the third regeneration processing waste liquid (feeding the first 5 valve of the flow rate of the liquid supply pipe 55). The fourth pump 25 passes through the fifth liquid supply pipe 55, and feeds the developing waste liquid to the downstream side of the pump after the third regeneration. The fourth storage tank 26 is a tank for storing the third-stage regeneration-processed development waste liquid (the liquid is supplied to the downstream side through the fifth liquid supply pipe 55). From the fourth storage tank 26, the third generation of the development process is necessary to complete the development waste liquid 15 (please read the back of the note before filling in this page)
本紙張尺度適用中國國家標準（CNS)A4規格（21〇 X 297公釐） 1264618 A7 ______B7 r 1 ---------- —— -—-- 五、發明說明（) 儲存著。第4槽送液閥27係一藉由將連接於第4儲存槽 26下流側之第6送液管56的流路加以開閉，來調節第3 次再生處理完顯影廢液(送入第6送液管56中）之流量的閥 ◦第5泵28係一將第3次再生處理完顯影廢液(儲存於第 4儲存槽26內），通過第6送液管56送往向下一製程(即顯 影製程)的泵。 微細粒子除去過濾器29，係用以自第3次再生處理完 顯影廢液（送往顯影製程）中去除更微少粒子者，此除去了 微少粒子的顯影廢液係作爲再生處理後的顯影液，被送至 顯影製程側。 氮氣送氣管30，係構成對於第1儲存槽1、第2儲存 槽10、第1調合槽17、及第4儲存槽26的所有儲存槽送 氮氣的流路。因此，可防止各儲存槽1、10、17、26內所 儲存的顯影廢液與空氣反應所導致之鹼濃度發生變化。 以下，對上述實施例(第1實施例）的變形例加以說明 。圖2係第2實施例的顯影液再生設備200的槪略流程圖 ，圖3係第3實施例的顯影液再生設備300的槪略流程圖 ，圖4係第4實施例的顯影液再生設備400的槪略流程圖 。這裡，從第2實施例至第4實施例的顯影液再生設備 ,200、300、400的任一者，與第丨實施例的顯影液再生設 備1〇〇相比，皆具有較高的光阻成分除去能力。 「第2實施例」 如圖2所示，第2實施例的顯影液再生設備200中， 具備：第1儲存槽201、第1儲存槽送液閥202、第1泵 16 本紙適用中國國家標準（CNS)A4規格(210 x 297公爱) ' (請先閱讀背面之注意事項再填寫本頁) 許· 線， A7 1264618 五、發明說明（^ ) (請先閱讀背面之注意事項再填寫本頁) 203、第1過濾器204、第1奈米(nano)過濾器205、第2 泵206、第1吸光光度計207、第1閥208、第2閥209、 第1熱交換器21〇、第2奈米過爐器211、第1 §周合槽212 、第2吸光光度計213、第3閥214、第4閥215、第1負 荷感應器216、第3泵217、第2熱交換器218、第1小槽 219、第1驗濃度計220、第1溫度計221、弟1調合槽迗 液閥222、第4泵223、第2儲存槽224、第2儲存槽送液 閥225、第5泵226、微細粒子除去過濾器227。且，與第 1實施例相同的部分’則用同一符號’並省略其說明’僅 不同的部分進行說明。 第i儲存槽201、第1儲存槽送液閥202、第1泵203 分別與實施例1中的第1儲存槽1、第1儲存槽送液閥2、 第1泵3呈大致相同的構造，此處省略其說明。 第1過濾器204係用以從第1次再生處理完的顯影廢 液(通過第1送液管251所送液的）除去微少粒子者’可防 止第1奈米過濾器及第2奈米過濾器的透過膜被微少粒子 塞住，使光阻成分的除去處理變得順利。 在第1過濾器204的下流側，裝有第1奈米過濾器 205。此第1奈米過濾器205具有可除去一般數nm(奈米) 大小的粒子或高分子之NF 吴205a ’屬錯流(cross flow)式 。因此，通過NF膜205a的顯影廢液係光阻成分被大量除 去後的顯影廢液，相對地，未通過NF膜205a的顯影廢液 中含有大量的光阻成分。 未通過第1奈米過濾器205的顯影廢液，通過第1回 17 本紙張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） A7 1264618 五、發明說明（π) 流管252，與第1送液管251中的顯影廢液合流後’再通 過第2泵206被送至第1奈米過濾器205。 第1吸光光度計207，係用以測定顯影廢液(通過第1 回流管252送返者）中光阻濃度的測定儀器’與第1回流管 252並列設置。根據此第1吸光光度計207的測定結果’ 來控制第1閥208及第2閥209的開閉量。這裡的第1閥 208，係裝設在第1回流管252上，調整第1回流管252中 的顯影廢液之流量。第2閥209，係裝設在第1廢液管253 上，調整流入第1廢液管253中的顯影廢液之流量。因此 ，由第1吸光光度計207所得到的光阻濃度測定結果’顯 影廢液可一直再使用，直到其光阻濃度惡化至不能再使用 的程度。進而，可降低顯影廢液的廢棄量，甚至可降低操 作成本，並且可有效地利用資源。 第1熱交換器210，係用以冷卻第1回流管252中流 動的顯影廢液，藉此第1熱交換器210，可防止於第1吸 光光度計207的測定値中產生誤差。 第2奈米過濾器211，與第1奈米過濾器205有大致 相同的構造。其藉由對顯影廢液(通過第2送液管254所送 液)進行膜分離，將含有大量光阻成分的顯影液，與光阻成 ，分被除去的顯影廢液加以分離。通過此第2奈米過濾器 211的顯影廢液，經由第3送液管255，被送至第1調合槽 212側。未通過第2奈米過濾器211的顯影廢液，經由第2 回流管256，與第2送液管254合流。 第2吸光光度計213，係用以測定測定顯影廢液(通過 18 ^紙張尺度適用中國國家ϋ (CNS)A4規格（210 X 297 ^釐) " ' ----------------- (請先閱讀背面之注意事項再填寫本頁)This paper scale applies to China National Standard (CNS) A4 specification (21〇 X 297 mm) 1264618 A7 ______B7 r 1 ---------- —— -——-- V. Invention description () Stored. The fourth tank liquid supply valve 27 is configured to open and close the flow path of the sixth liquid supply pipe 56 connected to the downstream side of the fourth storage tank 26, thereby adjusting the third regeneration processing waste liquid (feeding the sixth) The fifth pump 28 of the flow rate of the liquid supply pipe 56 is configured to discharge the development waste liquid (stored in the fourth storage tank 26) after the third regeneration, and send it to the next one through the sixth liquid supply pipe 56. Process (ie development process) pump. The fine particle removal filter 29 is used to remove fine particles from the third regeneration treatment waste liquid (to the development process), and the development waste liquid from which the fine particles are removed is used as the developer after the regeneration treatment. , is sent to the development process side. The nitrogen gas supply pipe 30 constitutes a flow path for supplying nitrogen gas to all the storage tanks of the first storage tank 1, the second storage tank 10, the first mixing tank 17, and the fourth storage tank 26. Therefore, it is possible to prevent the alkali concentration caused by the reaction of the developing waste liquid stored in each of the storage tanks 1, 10, 17, and 26 from reacting with air. Hereinafter, a modification of the above embodiment (first embodiment) will be described. 2 is a schematic flow chart of the developer regenerating apparatus 200 of the second embodiment, FIG. 3 is a schematic flow chart of the developer regenerating apparatus 300 of the third embodiment, and FIG. 4 is a developing apparatus regenerating apparatus of the fourth embodiment. The flow chart of the 400. Here, any of the developer regeneration apparatuses 200, 300, and 400 of the second embodiment to the fourth embodiment has higher light than the developer regeneration apparatus 1 of the second embodiment. Resistance to component removal. "Second Embodiment" As shown in Fig. 2, the developer regenerating apparatus 200 of the second embodiment includes a first storage tank 201, a first storage tank liquid supply valve 202, and a first pump 16. The paper is applied to the Chinese national standard. (CNS) A4 specification (210 x 297 public) ' (Please read the note on the back and fill out this page) Xu Line, A7 1264618 V. Invention description (^ ) (Please read the notes on the back and fill in the form) 203. The first filter 204, the first nano filter 205, the second pump 206, the first absorptiometer 207, the first valve 208, the second valve 209, and the first heat exchanger 21〇 The second nanocompressor 211, the first § circumferential groove 212, the second absorption photometer 213, the third valve 214, the fourth valve 215, the first load sensor 216, the third pump 217, and the second heat The exchanger 218, the first small tank 219, the first concentration meter 220, the first thermometer 221, the first mixing tank liquid shutoff valve 222, the fourth pump 223, the second storage tank 224, and the second storage tank liquid supply valve 225 The fifth pump 226 and the fine particle removal filter 227. The same components as in the first embodiment are denoted by the same reference numerals, and the description thereof will be omitted. The i-th storage tank 201, the first storage tank liquid supply valve 202, and the first pump 203 have substantially the same structure as the first storage tank 1, the first storage tank liquid supply valve 2, and the first pump 3 in the first embodiment. The description thereof is omitted here. The first filter 204 is used to prevent the first nano filter and the second nanometer from being removed from the development waste liquid (which is sent through the first liquid supply tube 251) after the first regeneration treatment. The permeable membrane of the filter is blocked by a small number of particles, and the removal process of the photoresist component is smoothed. On the downstream side of the first filter 204, a first nano filter 205 is installed. The first nano filter 205 has a cross flow type in which NF Wu 205a' which is a particle or a polymer which can remove a general number of nm (nano) size. Therefore, the developing waste liquid which has been removed by the developing waste liquid-based photoresist component of the NF film 205a is relatively large, and the developing waste liquid which has not passed through the NF film 205a contains a large amount of photoresist component. The developing waste liquid that has not passed through the first nano filter 205 passes through the first back. This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm). A7 1264618 V. Description of the Invention (π) Flow Tube 252 After being merged with the development waste liquid in the first liquid supply pipe 251, it is sent to the first nano filter 205 by the second pump 206. The first absorptiometer 207 is provided in parallel with the first return pipe 252 for measuring the photoresist concentration in the developing waste liquid (returned by the first return pipe 252). The opening and closing amounts of the first valve 208 and the second valve 209 are controlled based on the measurement result ' of the first absorptiometer 207'. Here, the first valve 208 is installed in the first return pipe 252, and the flow rate of the developing waste liquid in the first return pipe 252 is adjusted. The second valve 209 is attached to the first waste liquid pipe 253, and adjusts the flow rate of the development waste liquid flowing into the first waste liquid pipe 253. Therefore, the photoreceptor measurement result obtained by the first absorptiometer 207 can be used until the photoresist concentration is deteriorated to such an extent that it can no longer be used. Further, the amount of waste of the development waste liquid can be reduced, and even the operation cost can be reduced, and resources can be utilized efficiently. The first heat exchanger 210 is for cooling the developing waste liquid flowing through the first return pipe 252, whereby the first heat exchanger 210 can prevent an error from occurring in the measurement enthalpy of the first absorptiometer 207. The second nano filter 211 has substantially the same structure as the first nano filter 205. The developing waste liquid (the liquid fed through the second liquid supply tube 254) is subjected to membrane separation, and the developing solution containing a large amount of the photoresist component is separated from the developing waste liquid which is removed by the photoresist. The developing waste liquid passing through the second nano filter 211 is sent to the first mixing tank 212 side via the third liquid supply pipe 255. The developing waste liquid that has not passed through the second nano filter 211 is merged with the second liquid supply tube 254 via the second return pipe 256. The second absorbance photometer 213 is used to measure the development waste liquid (Applicable to China National Standard (CNS) A4 specification (210 X 297 ^ PCT) by 18 ^ paper scale " ' ---------- ------- (Please read the notes on the back and fill out this page)
—tri·^-------線 I A7 1264618 __B7___ 五、發明說明（17 ) (請先閱讀背面之注意事項再填寫本頁) 交換器210、第2奈米過濾器211、第1調合槽212、第2 吸光光度計213、第1負荷感應器216、第3泵217、第2 熱交換器218、第1小槽219、第1鹼濃度計220、第1溫 度計221、第1調合槽送液閥222、第4泵2M、第2儲存 槽224、第2儲存槽送液閥225、第5泵226、以及微細粒 子除去過爐器227。 此第3實施例的顯影液再生設備300，與第2實施例 的顯影液再生設備200相比’係改變了未通過第2奈米過 濾器211的顯影廢液的回流處。具體地說’第3實施例的 顯影液再生設備2〇〇中’未通過第2奈米過濾器211的顯 影廢液的回流對象，係設定成第1儲存槽201(通過第2回 流管）。藉如此般的構造’通過第2奈米過濾器211的顯影 廢液爲一度藉由第1奈米過濾器2〇5進行膜分離之顯影廢 液，所以使其回到第1儲存槽201 ’可有效地利用資源。 且，未通過第2奈米過濾器211的顯影廢液的回流對象， 不僅限於第1儲存槽201，例如亦可係第1回流管252。 「第4實施例」 以下，對第4實施例的顯影液再生設備400加以說明 。在說明第4實施例時’與第1實施例及第2實施例相同 部分加上同一符號，並省略其說明。 如圖4所示，第4實施例的顯影液再生設備400中， 具備：第1儲存槽2〇1、第1儲存槽送液閥202、第1泵 203、第1過濾器204、第1奈米過濾器205、第2泵206 、第1吸光光度計2〇7、第1閥208、第2閥209、第1熱 20 本紙張尺度適用中國國家標準（CNS)A4規格（21〇x 297公釐） A7 1264618 ________B7____ 五、發明說明（0 ) (請先閱讀背面之注意事項再填寫本頁) 交換器210、第2奈米過濾器211、第3儲存槽401、第3 儲存槽送液閥402、第6泵403、第3回流量調節閥404、 第3送液量調節閥405、第1調合槽212、第2吸光光度計 2Π、第1負荷感應器216、第3泵217、第2熱交換器 218、第1小槽219、第1鹼濃度計220、第1溫度計221 、第1調合槽送液閥222、第4泵223、第2儲存槽224、 第2儲存槽送液閥225、第5泵226、微細粒子除去過濾器 227 ° 第3儲存槽401，係將通過第1奈米過濾器205的NF 膜205a的顯影廢液，暫時儲存的槽。第3儲存槽送液閥 402，係調整顯影廢液(儲存在第3儲存槽401內)送往下一 製程側的送液量。第6泵403，係將顯影廢液(儲存在第3 儲存槽401內)送往下一製程側的泵。 第3回流量調節閥404，係將顯影廢液（由第6泵403 送往下一製程側)再次回流至第3儲存槽401側。第3送液 量調節閥405，係一用以控制送往第2奈米過濾器211側 的顯影廢液流量的閥。 即就是，第4實施例的顯影液再生設備400中’係在 第3實施例的顯影液再生設備300中之第1奈米過濾器 205與第2奈米過濾器211之間裝設有第3儲存槽401，且 裝設有第6泵403。因此，通過第1奈米過濾器205的顯 影液廢液的壓力雖有降低，但可經過第6泵403而再度加 壓，從而使第2奈米過濾器211的面積，與第3實施例時 的相比，可大幅地減小。進而，可降低製造成本及操作成 21 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 1264618 五、發明說明（i?) 本。且，未必要在第1奈米過濾器205與第2奈米過濾器 211之間裝設第3儲存槽。 以上，雖然根據實施例說明了本發明，但本發明不僅 僅限於上述實施例，在不違背本發明主旨的範圍內，種種 改良變形亦係可容易推知者。 【發明之效果】 依據申請專利範圍第1項之顯影液再生裝置，其藉由 第1廢棄機構，根據第1光阻濃度測定機構的測定結果(顯 影廢液的光阻濃度），將既定量之顯影廢液廢棄，並藉由第 1補給機構，依照所廢棄之量，補給對應量之顯影新液或 純水。而且，在顯影新液或純水補給後，用第1鹼濃度測 定機構，測定顯影液(由上述第1補給機構之補給結果所得 )之鹼濃度；用第2補給機構，補給鹼系顯影原液(根據第i 鹼濃度測定機構所得的測定結果之量）。因此，供做顯影後 的液體、即顯影廢液中的光阻濃度及鹼濃度，得以逐漸再 生成爲所需濃度（含適當濃度之意，以下亦同）。進而，可 防止產品品質的不安定及不良品之增加，更能保持良好的 附著性。又，因可大幅降低將液體全部更換的次數，從而 可防止運轉率的降低，及伴隨液體更換操作所需的勞務成 ，本增加。 依據申請專利範圍第2項之顯影液再生裝置，用錯流 式第1膜分離機構，達成「供做顯影後的液體」一顯影廢 液之第1透過液(光阻成分被除去)與第1非透過液(光阻成 分被濃縮)之膜分離。同樣地，用錯流式第2膜分離機構， 22 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） «裝 (請先閱讀背面之注意事項再填寫本頁)—tri·^-------Line I A7 1264618 __B7___ V. Description of Invention (17) (Please read the note on the back and fill out this page) Switch 210, 2nd Nano Filter 211, 1st The mixing tank 212, the second absorption photometer 213, the first load sensor 216, the third pump 217, the second heat exchanger 218, the first small tank 219, the first alkali concentration meter 220, the first thermometer 221, and the first The mixing tank liquid supply valve 222, the fourth pump 2M, the second storage tank 224, the second storage tank liquid supply valve 225, the fifth pump 226, and the fine particle removal furnace 227 are provided. The developer regenerating apparatus 300 of the third embodiment changes the recirculation of the developing waste liquid that has not passed through the second nano filter 211 as compared with the developer regenerating apparatus 200 of the second embodiment. Specifically, in the developer regenerating apparatus 2 of the third embodiment, the object to be reflowed by the developing waste liquid that has not passed through the second nano filter 211 is set to the first storage tank 201 (through the second return pipe). . With the above-described structure, the developing waste liquid passing through the second nano filter 211 is the development waste liquid which was once separated by the first nano filter 2〇5, so that it is returned to the first storage tank 201'. Resources can be used effectively. Further, the object to be reflowed by the developing waste liquid that has not passed through the second nano filter 211 is not limited to the first storage tank 201, and may be, for example, the first return pipe 252. "Fourth embodiment" Hereinafter, the developer regenerating apparatus 400 of the fourth embodiment will be described. In the fourth embodiment, the same portions as those in the first embodiment and the second embodiment will be denoted by the same reference numerals and will not be described. As shown in FIG. 4, the developer regenerating apparatus 400 of the fourth embodiment includes a first storage tank 2〇1, a first storage tank liquid supply valve 202, a first pump 203, a first filter 204, and a first The nano filter 205, the second pump 206, the first absorptiometer 2〇7, the first valve 208, the second valve 209, and the first heat 20 are applicable to the Chinese National Standard (CNS) A4 specification (21〇x). 297 mm) A7 1264618 ________B7____ V. Description of invention (0) (Please read the note on the back and fill out this page) Switch 210, 2nd nano filter 211, 3rd storage tank 401, 3rd storage tank The liquid valve 402, the sixth pump 403, the third return flow rate adjusting valve 404, the third liquid supply amount adjusting valve 405, the first mixing tank 212, the second absorption photometer 2A, the first load sensor 216, and the third pump 217 The second heat exchanger 218, the first small tank 219, the first alkali concentration meter 220, the first thermometer 221, the first mixing tank liquid supply valve 222, the fourth pump 223, the second storage tank 224, and the second storage tank The liquid supply valve 225, the fifth pump 226, and the fine particle removal filter 227°. The third storage tank 401 is a tank for temporarily storing the development waste liquid that has passed through the NF membrane 205a of the first nano filter 205. The third storage tank liquid supply valve 402 adjusts the amount of liquid supplied to the next process side by the development waste liquid (stored in the third storage tank 401). The sixth pump 403 sends the developing waste liquid (stored in the third storage tank 401) to the pump on the next process side. The third flow rate adjustment valve 404 recirculates the development waste liquid (from the sixth pump 403 to the next process side) to the third storage tank 401 side. The third liquid supply amount adjusting valve 405 is a valve for controlling the flow rate of the developing waste liquid sent to the second nano filter 211 side. In the developer regenerating apparatus 400 of the fourth embodiment, the first nano filter 205 and the second nano filter 211 in the developer regenerating apparatus 300 of the third embodiment are mounted. 3 The storage tank 401 is equipped with a sixth pump 403. Therefore, although the pressure of the developer waste liquid passing through the first nano filter 205 is lowered, the second pump 403 can be pressurized again to increase the area of the second nano filter 211 and the third embodiment. Compared to the time, it can be greatly reduced. In addition, the manufacturing cost can be reduced and the operation can be carried out in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7 1264618 V. Inventive Note (i?). Further, it is not necessary to install a third storage tank between the first nano filter 205 and the second nano filter 211. The present invention has been described above with reference to the embodiments, but the present invention is not limited to the above-described embodiments, and various modifications can be easily made without departing from the spirit and scope of the invention. [Effect of the Invention] The developer liquid regenerating device according to the first aspect of the invention is based on the measurement result of the first photoresist concentration measuring means (the photoresist concentration of the developing waste liquid) by the first disposal means The developing waste liquid is discarded, and the corresponding amount of developing liquid or pure water is supplied in accordance with the amount discarded by the first supply mechanism. After the development of the new liquid or the pure water, the alkali concentration of the developer (the result of the supply by the first supply means) is measured by the first alkali concentration measuring means, and the alkali developing solution is supplied by the second supply means. (Amount based on the measurement result obtained by the i-th alkali concentration measuring means). Therefore, the concentration of the photoresist and the alkali concentration in the developing waste liquid, that is, the developing waste liquid, can be gradually regenerated to the desired concentration (including the appropriate concentration, the same applies hereinafter). Further, it is possible to prevent the instability of the product quality and the increase in defective products, and to maintain good adhesion. Further, since the number of times the liquid is completely replaced can be greatly reduced, the decrease in the operation rate and the labor required for the liquid replacement operation can be prevented. According to the developer liquid regenerating device of the second application of the patent application, the first flow separation means for "developing the liquid" and the first permeate (the photoresist component is removed) and the first 1 membrane separation of non-permeate (the photoresist component is concentrated). Similarly, using the cross-flow type 2 membrane separation mechanism, 22 paper scales are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) «Package (please read the back note first and then fill out this page)
訂---------線I 1264618 A7 ______JB7___ 五、發明說明（〆） 達成相關之第1透過液進一步除去光阻成分之第2透過液 與光阻成分被濃縮之第2非透過液之膜分離。因此，可妥 善地除去顯影廢液所含的光阻成分，進而，可在基板上對 光阻圖案建構原樣的回路。具體地，可防止曝光後凝固的 樹脂溶解。例如，在製造半導體元件(LSI或記憶體)等時， 有許多微細的回路構造。但是，即便如此，亦可防止回路 的斷線或混線。 另一方面，用第1回流機構，將第1非透過液(第1膜 分離機構的膜分離結果所得)回流至第1供給機構所供給的 顯影廢液；藉由第2光阻濃度測定機構，測定第1非透過 液、或回流後的顯影廢液的光阻濃度，依照該測定結果， 將第1非透過液、或回流後的顯影廢液廢棄。因此，可在 光阻成分呈濃縮之狀態將顯影廢液廢棄，可降低顯影液廢 棄量，此爲效果所在。又，也有可防止光阻成分阻塞於膜 分離機構所造成之膜分離量降低之效果。 依據申請專利範圍第3項之顯影液再生裝置，除了可 達成申請專利範圍第2項之顯影液再生裝置的效果以外’ 進一步，藉由第2回流機構，將第2非透過液回流至顯影 廢液(第1供給機構所供給），所以可讓一度光阻成分被除 ，去的顯影液再次與顯影廢液一起由第1膜分離機構來進行 膜分離，可降低操作成本，更能有效地利用資源，此爲效 果所在。 依據申請專利範圍第4項之顯影液再生裝置，除了申 請專利範圍第2項之顯影液再生裝置的效果以外，進一步 23 ------------—0M (請先閱讀背面之注意事項再填寫本頁)订----Line I 1264618 A7 ______JB7___ V. OBJECT DESCRIPTION OF THE INVENTION (〆) The second permeate in which the first permeate is further removed, and the second permeate and the photoresist component are concentrated. The membrane of the liquid is separated. Therefore, the photoresist component contained in the developing waste liquid can be properly removed, and the circuit of the photoresist pattern can be constructed on the substrate. Specifically, the resin solidified after exposure can be prevented from being dissolved. For example, when manufacturing a semiconductor element (LSI or memory) or the like, there are many fine circuit structures. However, even in this case, it is possible to prevent the circuit from being broken or mixed. On the other hand, the first non-permeate (resulting as a result of membrane separation by the first membrane separation means) is returned to the development waste liquid supplied from the first supply means by the first recirculation means; and the second photoresist concentration measuring means is used. The photoresist concentration of the first non-permeation liquid or the development waste liquid after the reflow is measured, and the first non-permeation liquid or the development waste liquid after the reflow is discarded according to the measurement result. Therefore, the development waste liquid can be discarded in a state where the photoresist component is concentrated, and the amount of developer waste can be reduced, which is an effect. Further, there is an effect of preventing a decrease in the amount of separation of the film caused by the blocking of the photoresist component by the membrane separation mechanism. In addition to the effect of the developer regenerating device of the second application of the patent application, the developing solution regenerating device according to the third application of the patent application is further configured to return the second non-permeate to the developing waste by the second reflow mechanism. Since the liquid (supplied by the first supply means) allows the one-time photoresist component to be removed, the removed developer is again separated from the development waste liquid by the first membrane separation means, thereby reducing the operating cost and more effectively Use resources, this is the effect. In addition to the effect of the developer regenerating device of claim 2, in addition to the effect of the developer regenerating device of the second application of the patent application, the second embodiment of the invention is read on the back. Note on this page)
I - * ----訂---------線J 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1264618 A7 ______B7 五、發明說明（J ) ，藉由第3回流機構，將第2非透過液回流至第1透過液 ;藉由廢棄機構，依據回流前的第2非透過液、或第1透 過液的濃度來廢棄相關之液體，所以一度光阻成分被除去 的顯影液可再次與顯影廢液一起由第1膜分離機構進行膜 分離，可降低操作成本，更可有效地利用資源，此爲效果 所在。 依據申請專利範圍第5項之顯影液再生裝置，除了申 請專利範圍第2〜4項的任何一項之顯影液再生裝置的效果 以外，進一步，藉由第3補給機構，補給鹼系顯影新液或 鹼系顯影原液(根據第2鹼濃度測定機構之測定結果之量) ，因此，供做顯影後的顯影廢液的鹼濃度可逐漸再生成所 需濃度。進而，可防止製品的不安定及不良率的增加。更 因可大幅降低將液體全部更換的次數，從而可防止運轉率 的降低，及更換液體操作引起的勞務成本的增高，此爲效 果所在。 依據申請專利範圍第6項之顯影液再生裝置，除了申 請專利範圍第5項之顯影液再生裝置的效果以外，進一步 ，由第3補給機構所補給的液體係鹼系顯影原液，所以可 防止爲了使鹼濃度再生成爲所需濃度而造成顯影液的量發 生變化，此爲所具效果。 【圖式之簡單說明】 圖1係本發明的一實施例的顯影液再生設備的槪略流 程圖。 圖2係本發明的其他實施例(第2實施例)的顯影液再 ____24 本紙張尺度適用中國國家標準(CNS)A4規格（210 x 297公釐）— --------------- (請先閱讀背面之注意事項再填寫本頁) 乾· A7 1264618 五、發明說明（v>) 生設備的槪略流程圖。 ----------------- (請先閱讀背面之注意事項再填寫本頁) 圖3係本發明的別的實施例(第3實施例)的顯影液再 生設備的槪略流程圖。 圖4係本發明的別的實施例(第4實施例)的顯影液再 生設備的槪略流程圖。 【符號說明】 5 第1吸光光度計(第1光阻濃度測定機構） 7 第1廢液量調節閥(第1廢棄機構的一部分） 第1新液供給量調節閥(第1補給機構的一部 9 分） 第1原液供給量調節閥(第2補給機構及第3補給機 16 構的一部分） 22 第2鹼濃度計(第1鹼濃度測定機構） 線· 61 第1廢棄管(第1廢棄機構的一部分） 71 第1供給管(第1補給機構的一部分） 72 第2供給管(第2補給機構及第3補給機構的一部分) 100 顯影液再生設備 200 顯影液再生設備 203 第1泵(第1供給機構的一部分） 205 第1奈米過爐器(第1膜分離機構） 206 第2泵(第1供給機構的一部分） 207 第1吸光光度計(第2光阻濃度測定機構） 208 第1閥(第1回流機構的一部分） _25_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 1264618 五、發明說明（〆> ) 209 第2閥(第2廢棄機構的一部分） 211 第2奈米過濾器(第2膜分離機構） 213 第2吸光光度計(第2光阻濃度測定機構） 214 第3閥(第3回流機構的一部分） 215 第4閥(第2廢棄機構的一部分） 220 第1鹼濃度計(第2鹼濃度測定機構的一部分) 251 第1送液管(第1供給機構的一部分） 252 第1回流管(第1回流機構的一部分） 253 第1廢棄管(第2廢棄機構的一部分） 256 第2回流管(第3回流機構的一部分） 300 顯影液再生設備 351 第2回流管(第2回流機構） 400 顯影液再生設備 (請先閱讀背面之注意事項再填寫本頁) *tT.· 線· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）I - * ----订--------- Line J This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1264618 A7 ______B7 V. Invention Description (J), borrow The third non-permeate is returned to the first permeate by the third reflow mechanism, and the liquid is discarded by the disposal mechanism according to the concentration of the second non-permeate or the first permeate before reflow. The developer in which the resist component is removed can be separated from the developer waste liquid by the first membrane separation mechanism again, and the operation cost can be reduced, and resources can be utilized more effectively. In addition to the effects of the developer regenerating apparatus according to any one of claims 2 to 4, the developing solution regenerating apparatus according to the fifth aspect of the invention is further supplemented with the alkali developing solution by the third replenishing mechanism. Or an alkali-based developing stock solution (according to the measurement result of the second alkali concentration measuring means), the alkali concentration of the developing waste liquid after development can be gradually regenerated to a desired concentration. Further, it is possible to prevent the instability of the product and the increase in the defective rate. Further, since the number of times the liquid is completely replaced can be greatly reduced, the operation rate can be prevented from being lowered, and the labor cost caused by the liquid replacement operation can be increased, which is an effect. According to the developing solution regenerating device of the sixth aspect of the patent application, in addition to the effect of the developing solution regenerating device of the fifth aspect of the patent application, the liquid system supplied by the third replenishing mechanism is used to develop the stock solution, thereby preventing Reducing the alkali concentration to a desired concentration causes a change in the amount of the developer, which is an effect. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic flow chart of a developing solution reproducing apparatus according to an embodiment of the present invention. Figure 2 is a developer solution according to another embodiment (second embodiment) of the present invention. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 x 297 mm) — --------- ------ (Please read the notes on the back and then fill out this page) Dry · A7 1264618 V. Description of invention (v >) The flow chart of the raw equipment. ----------------- (Please read the precautions on the back and fill out this page.) Figure 3 shows the developer regeneration in another embodiment (third embodiment) of the present invention. A schematic flow chart of the device. Fig. 4 is a schematic flow chart showing a developer regenerating apparatus of another embodiment (fourth embodiment) of the present invention. [Description of Symbols] 5 First absorbance photometer (first photoresist concentration measuring mechanism) 7 First waste liquid amount adjustment valve (part of the first waste mechanism) First new liquid supply amount control valve (one of the first supply mechanism) Part 9) First stock supply adjustment valve (part of the second supply mechanism and the third supply unit) 22 Second alkali concentration meter (first alkali concentration measuring mechanism) Line · 61 First waste pipe (1st) Part of the disposal mechanism 71 First supply pipe (part of the first supply mechanism) 72 Second supply pipe (part of the second supply mechanism and the third supply mechanism) 100 Developer regeneration device 200 Developer regeneration device 203 First pump (Part of the first supply mechanism) 205 1st nano-pulverizer (first membrane separation mechanism) 206 Second pump (part of the first supply mechanism) 207 First absorption photometer (second photoresist concentration measuring mechanism) 208 1st valve (part of the 1st recirculation mechanism) _25_ This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) A7 1264618 V. Invention description (〆>) 209 2nd valve (2nd) Part of the waste facility) 211 2nd nanofiltration filter (2nd membrane separation mechanism) 21 3 second absorbance photometer (second photoresist concentration measuring mechanism) 214 third valve (part of the third recirculation mechanism) 215 fourth valve (part of the second waste mechanism) 220 first alkali concentration meter (second alkali concentration) Part of the measuring mechanism 251 First feeding pipe (part of the first supply mechanism) 252 First return pipe (part of the first return mechanism) 253 First waste pipe (part of the second waste mechanism) 256 Second return pipe (Part of the third recirculation mechanism) 300 Developer regenerating equipment 351 Second recirculation pipe (2nd recirculation mechanism) 400 Developer regenerating equipment (please read the precautions on the back side and fill in this page) *tT.· Line · This paper The scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)