TWI668529B - Positive and negative type photoresist separation device for developer regeneration system - Google Patents

Abstract

The present invention relates to a positive-negative photoresist separation device for a developer regeneration system, which is mainly connected from a storage tank through a liquid supply group and a pressure/flow sensor to an ultrafiltration membrane, and is connected to the discharge membrane by the ultrafiltration membrane. The quantity/time ratio control group is composed; when a developing waste liquid is in the storage tank, and the developing waste liquid is caused to flow into the ultrafiltration membrane by the liquid supply group to separate the positive and negative type photoresists, the ultrafiltration membrane system is Collecting a clear developing solution after separation by filtration to a developing solution regeneration device for regeneration treatment, and adjusting a high photoresist waste liquid through the discharge amount/time ratio control group to discharge a high concentration resist waste liquid; By pre-separating the excessively large photoresist particles in the development waste liquid, the purpose of improving system durability, alkalinity, and developer regeneration quality is achieved.

Description

Positive and negative type photoresist separation device for developer regeneration system

The present invention relates to a developer regeneration system, and more particularly to a positive-negative photoresist separation device for a developer regeneration system.

With the vigorous development of China's optoelectronics, semiconductor and other industries, in the substrate manufacturing process, printing plate manufacturing or semiconductor manufacturing process, the developer is often recycled and reused as a developer for displaying positive/negative photoresist or pigment photoresist. Including: tetramethylammonium hydroxide (TMAH), sodium hydroxide (NaOH), sodium bicarbonate / sodium carbonate (NaHCO3 / Na2CO3), potassium hydroxide (KOH).

For example, the invention of the invention No. I264618 "developing solution regeneration device" (hereinafter referred to as the previous case) mainly supplies a developing waste liquid to a cross flow type first membrane separation mechanism (such as Nai) by a first supply mechanism. a rice filter), the first membrane separation mechanism performs membrane separation on the photosensitive organic resin with an alkali-based developing waste liquid, and supplies the first permeate to a second membrane separation mechanism (such as nanofiltration) by a second supply mechanism. The membrane separation is performed, and the membrane separation result of the first membrane separation mechanism is returned to the developing waste liquid of the first supply mechanism through a first reflux mechanism, and transmitted through at least one photoresist concentration measuring mechanism side. The concentration of the photoresist of the non-permeate or the developed waste liquid after the reflux of the reflow mechanism is measured, and the non-permeate or the development waste is discarded by a waste mechanism according to the measurement result of the resist concentration measuring means.

Although the developer regenerating device of the prior embodiment automatically controls the alkali concentration and the photoresist concentration of the alkali-based developing solution to a predetermined concentration, and provides a plurality of nano filters to enhance the filtering effect, by maintaining the developing performance, It can also reduce the cost of liquid replacement, but as the technology changes with each passing day, it is used as a developing solution for displaying positive/negative photoresist or pigment photoresist, such as tetramethylammonium hydroxide (TMAH), sodium hydroxide (NaOH), hydrogencarbonate. Sodium/sodium carbonate (NaHCO3/Na2CO3), KOH potassium hydroxide, etc. In the developer, the photoresist particles are too large, which often causes the nano filter disposed in the developer regeneration device or the developer regeneration device of the previous case to be clogged, so that the durability is lowered and the cost of the replacement mechanism is increased, so how to adapt to the future The photoresist particles of the type of developer are too large, which causes problems such as poor quality and frequent replacement of the developer regeneration equipment, and it is indeed necessary for the employer to further propose a better solution.

In view of the above-mentioned deficiencies of the prior art, the main object of the present invention is to provide a positive-negative photoresist separation device for a developer regeneration system, which utilizes a pretreatment technique for separating positive/negative photoresists to prematurely develop the development waste liquid. The photoresist particles are filtered and separated to improve the durability, alkalinity and developer regeneration quality of the system.

The main technical means adopted for achieving the above object is that the positive-negative type photoresist separation device of the developing solution regeneration system comprises: a first storage tank for storing a photoresist-containing developing waste liquid; and a first liquid supply group; Connected to the first storage tank and used to adjust the flow rate of the photoresist-containing waste liquid; a first pressure/flow sensor is disposed on the first liquid supply group to sense the photoresist-containing developing waste liquid The pressure and flow rate of the first liquid supply group are used as a reference for adjusting the flow rate; an ultrafiltration membrane is connected to the first liquid supply group, and is supplied to the photoresist-containing development waste liquid, and the photoresist-containing development waste The liquid passes through the ultrafiltration membrane such that the positive/negative photoresist is separated to generate a high photoresist waste liquid and a clear developing solution; a discharge amount/time ratio control group is connected to the ultrafiltration membrane for flowing into the high light Resist the waste liquid and adjust the discharge ratio to discharge a high concentration resist waste liquid.

According to the above configuration, the photoresist storage waste liquid is collected in the first storage tank, and the development waste liquid is caused to flow into the ultrafiltration membrane by the first liquid supply group to plate the substrate, the semiconductor, the package, and the like. The positive and negative photoresist used in the production, or the pigment photoresist is separated and filtered by a developing solution such as TMAH, NaOH, NaHCO3/Na2CO3, or KOH, and the clear developing solution separated and separated by filtration is recovered from the ultrafiltration membrane system. a developer regeneration device for recovering and reusing the developer by the developer regeneration device; in addition, the ultrafiltration membrane further adjusts a high photoresist waste liquid through the discharge amount/time ratio control group to adjust the height The concentration photoresist waste liquid is discharged; by separating the excessive photoresist particles in the development waste liquid in advance, the purpose of improving system durability, alkalinity, and developer regeneration quality is achieved.

10‧‧‧ positive and negative resistive separation device

11‧‧‧First storage tank

121‧‧‧first valve

122‧‧‧First pump

123‧‧‧Second valve

13‧‧‧First pressure/flow sensor

14‧‧‧Ultrafiltration membrane

151‧‧‧Second pressure/flow sensor

152‧‧‧Waste discharge control valve

153‧‧‧Flow sensor

16‧‧‧Temperature sensor

17‧‧‧First heat exchanger

180‧‧‧ Fine particle filter

181‧‧‧First control valve

182‧‧‧Second control valve

183‧‧‧third control valve

184‧‧‧fourth control valve

185‧‧‧ fifth control valve

186‧‧‧ sixth control valve

187‧‧‧ seventh control valve

19‧‧‧ Third pressure/flow sensor

20‧‧‧developer regeneration equipment

201‧‧‧First recycling storage tank

204‧‧‧First filter

205‧‧‧First nano filter

207‧‧‧First photometer

210‧‧‧second heat exchanger

21‧‧‧Second recovery storage tank

211‧‧‧Second Nano Filter

212‧‧‧First blending slot

213‧‧‧Second photometer

216‧‧‧Load sensor

218‧‧‧ third heat exchanger

219‧‧‧ small slot

22‧‧‧ Third recovery storage tank

223‧‧‧Particle filter

1 is a block diagram of a system architecture of a preferred embodiment of the present invention.

2 is a schematic diagram showing the configuration of a system component of still another preferred embodiment of the present invention.

3 is a schematic diagram of still another system component configuration of another preferred embodiment of the present invention.

Figure 4 is a schematic view showing the system component configuration of the developer regenerating apparatus of the preferred embodiment of the present invention.

A preferred embodiment of a developer regenerating system is provided in the present invention. Referring to FIG. 1 , the method is mainly composed of a positive-negative photoresist separation device 10 connected to a developer regeneration device 20 through a liquid supply line. The positive and negative resistive separation device 10 includes a first storage tank 11, a first liquid supply group, a first pressure/flow sensor 13, an ultrafiltration membrane (UF) 14, and a discharge/time ratio. a first storage tank 11 for storing a photoresist-containing development waste liquid, the first liquid supply group being connected to the first storage tank 11 and for adjusting a flow rate of the photoresist-containing development waste liquid, the first pressure / flow sensor 13 is installed on the first liquid supply group for sensing the pressure and flow rate of the photoresist-containing waste liquid in the first liquid supply group, and as a reference for adjusting the flow rate, the ultrafiltration The membrane 14 has an input end, a first output end and a second output end, and the input end of the ultrafiltration membrane 14 is connected to the first sending a liquid group for flowing into the photoresist-containing developing waste liquid, so that the photoresist film-containing waste liquid passes through the ultrafiltration membrane to separate the positive/negative photoresist to produce a high-resistance waste liquid and a clear developing solution .

The clear developing solution flows into the developing solution regeneration device 20 through the first output end of the ultrafiltration membrane 14 for regeneration treatment, and the developing waste liquid flows into the ultrafiltration membrane 14 by the first liquid supply group to cover the panel and the semiconductor. Positive and negative photoresists used for substrate production such as sealing and measuring, or pigment photoresists such as TMAH, NaOH, NaHCO3/Na2CO3, KOH, etc., are separated and filtered, and the ultrafiltration membrane 14 is separated and separated by filtration. The clear developing solution is recovered to the developer regenerating device 20, and the developer regenerating device 20 recovers and reuses the developing solution; in addition, the high photoresist waste liquid can flow into the discharge through the second output end of the ultrafiltration membrane 14 a quantity/time ratio control group, when the high photoresist waste liquid flows into the discharge amount/time ratio control group, the emission amount/time ratio control group performs emission ratio adjustment to discharge a high concentration photoresist waste liquid; The technique of developing excessive photoresist particles in the waste liquid improves the durability, alkalinity, and developer regeneration quality of the system.

As shown in FIG. 1 , in the preferred embodiment, the first liquid supply group includes a first valve 121 , a first pump 122 , and a second valve 123 ; wherein the first valve 121 and the first The pump 122 is disposed on the liquid supply line between the first storage tank 11 and the first pressure/flow sensor 13, and the first pump 122 is connected to the first pressure/flow sensor 13, the first The valve 121 is respectively connected to the first storage tank 11 and the first pump 122 for adjusting the flow rate of the photoresist-containing developing waste liquid; the second valve 123 has an input end and an output end, and the second valve 123 The input end is connected to the second output end of the ultrafiltration membrane 14 , and the output end of the second valve 123 is connected to the liquid supply line between the first storage tank 11 and the first valve 121 , thereby The high-resistance waste liquid is returned to the ultrafiltration membrane 14 for separation and filtration treatment.

Further, in the preferred embodiment, the emission/time ratio control group includes a second pressure/flow sensor 151, a waste liquid discharge regulating valve 152, and a flow sensor 153, the second pressure/flow The inductor 151 is connected to the second output end of the ultrafiltration membrane 14, the waste liquid The discharge regulating valve 152 is respectively connected to the second pressure/flow sensor 151 and the flow sensor 153, and the waste liquid discharge regulating valve 152 is used for adjusting the discharge/time ratio of the photoresist-containing waste liquid, and In order to increase the developer recovery rate, the high-resistance waste liquid flows through the second pressure/flow sensor 151, the waste liquid discharge regulating valve 152, the flow sensor 153, and the waste liquid discharge regulating valve. 152 performs a discharge ratio adjustment to discharge the high concentration photoresist waste liquid.

Referring to FIG. 2, the main technical content of the present invention is substantially the same as that of the previous embodiment. However, the preferred embodiment further includes a temperature sensor 16 and a first heat exchange. The temperature sensor 16 is disposed on the liquid supply line between the first pressure/flow sensor 13 of the first liquid supply group and the input end of the ultrafiltration membrane 14 for sensing the The first pump 122 of the first liquid supply group generates the circulating heat energy/power; the first heat exchanger 17 is disposed at the second output end of the ultrafiltration membrane 14 and the second valve 123 of the first liquid supply group. The first heat exchanger 17 can be cooled according to the thermal energy/power sensed by the temperature sensor 16 exceeding a threshold value, through the temperature sensor 16, the first heat exchanger. 17 temperature control to protect and enhance system safety. In the preferred embodiment, the ultrafiltration membrane 14 has a columnar shape, and the ultrafiltration membrane 14 has a filter pore size and a molecular weight cut off. In the preferred embodiment, the filtration pore size is 0.02 to 0.005 (um/ The molecular weight cut-off (MWCO) is 1500 to 50000 (Dalton/unit), and is separated and filtered by the ultrafiltration membrane 14 in a cross-flow manner, and is applied to a panel, a semiconductor, or the like. Positive and negative photoresists used for substrate fabrication, such as sealing and measuring, or pigment photoresists such as TMAH, NaOH, NaHCO3/Na2CO3, KOH, etc., can be separated and filtered to achieve better separation. In addition, pigment photoresist properties and development The liquid properties can be filtered by ultrafiltration membranes of different molecular weight cutoffs.

Referring to FIG. 3, the main technical content of the present invention is substantially the same as that of the foregoing embodiments. However, the preferred embodiment further includes a primary filter module and a third pressure/ a flow sensor 19; wherein the third pressure/flow sensor 19 is installed The primary filter module is disposed on the liquid supply line near the input end of the ultrafiltration membrane 14 , and the primary filter module is disposed between the first pressure/flow sensor 13 and the third pressure/flow sensor 19 On the line, the positive/negative photoresist is stripped by the re-process of the primary filter module to extend/protect the ultrafiltration membrane 14 to achieve double filtration protection.

In the preferred embodiment, further, as shown in FIG. 3, the primary filter module further includes a fine particle filter 180, a first control valve 181, a second control valve 182, and a third control valve. 183, a fourth control valve 184, a fifth control valve 185, a sixth control valve 186 and a seventh control valve 187; the first control valve 181 is connected to the first pressure / flow sensor 13, the fine particles The filter 180 is disposed between the first control valve 181 and the second control valve 182, and the second control valve 182 is connected to the third pressure/flow sensor 19.

As shown in FIG. 3, the third control valve 183, the fourth control valve 184, the fifth control valve 185, the sixth control valve 186, and the seventh control valve 187 are respectively associated with the fine particle filter 180. The third control valve 183 is configured to regulate the flow rate of a Clean Dry Air (CDA), and the fourth control valve 184 and the fifth control valve 185 are used to adjust an ultrapure water (De The flow rate of the -ionized water (DIW), the sixth control valve 186 and the seventh control valve 187 are used for discharging the residual high-concentration photoresist waste liquid so as not to affect the change of the alkali concentration of the recovered developer; In the example, the first pressure/flow sensor 13 of the first liquid supply group, the third pressure/flow sensor 19, and the primary filter module form an automatic backflow mechanism.

To illustrate the operation mode of the automatic counterflow mechanism, as shown in FIG. 3, the corresponding pressure/flow rate is sensed by the first pressure/flow sensor 13 and the third pressure/flow sensor 19. a current/voltage value, and determining whether the current/voltage value exceeds a critical value, and if so, indicating that the fine particle filter 180 is blocked by the filter photoresist; when the fine particle filter 180 is blocked, it is necessary to Starting the automatic counterflow mechanism, first closing the first control valve 181, the second The valve 182 is controlled so as not to affect the quality/alkali concentration change of the recovered developer, and the following steps are continued: the third control valve 183, the fifth control valve 185 and the sixth control valve 186 are closed, and the fourth control valve is opened. 184 to inject the ultrapure water, and discharge the high concentration photoresist waste liquid by the seventh control valve 187; close the third control valve 183, the fourth control valve 184 and the seventh control valve 187, and open the first a fifth control valve 185 for injecting the ultrapure water, and discharging the high concentration photoresist waste liquid by the sixth control valve 186; and closing the third control valve 183, the fifth control valve 185 and the sixth control valve 186, the fourth control valve 184 is opened to inject the ultrapure water, and the seventh control valve 187 discharges the high concentration photoresist waste liquid; the fourth control valve 184, the fifth control valve 185, and the first The sixth control valve 186 opens the third control valve 183 to inject the clean dry air, and the remaining high-concentration photoresist waste liquid and water are discharged by the seventh control valve 187 so as not to affect the change of the alkali concentration of the recovered developer.

The positive and negative photoresist used for fabricating a substrate such as a panel, a semiconductor, or a package, or the like, or TMAH, NaOH, NaHCO3/ for a photoresist photoresist, by flowing the development waste liquid into the ultrafiltration membrane 14 by the first liquid supply group. The developing solution such as Na2CO3 or KOH is subjected to separation and filtration treatment, and the clear developing solution separated and separated by filtration is collected by the ultrafiltration membrane 14 to the developing solution regenerating device 20, and then developed by the developing solution regenerating device 20. In the preferred embodiment, the structure of the developer regeneration device 20 is further disclosed. Referring to FIG. 4, the developer regeneration device 20 includes a first recovery storage tank 201, a first The filter 204, a first nano filter 205, a first photometer 207, a second heat exchanger 210, a second recovery storage tank 21, a second nano filter 211, and a first blending tank 212, a second photometer 213, a load sensor 216, a third heat exchanger 218, a small tank 219 having an alkali concentration meter and a thermometer, a third recovery storage tank 22, and a particle filter 223.

After the clear developing solution is recovered to the developer regenerating device 20, the clear developing solution enters the first recovery storage tank 201, and the first nano filter 205 and the second in the developing solution regeneration device 20 are utilized. Since the nano filter 211 and the particle filter 223 are subjected to regeneration processing, the positive and negative resistive separation device 10 can preliminarily separate the excessive photoresist particles in the development waste liquid to enhance the durability of the developer regeneration device 20. Properties, alkalinity, and developer regeneration quality.

Claims (8)

A positive-negative photoresist separation device for a developer regeneration system, comprising: a first storage tank for storing a photoresist-containing developing waste liquid; and a first liquid supply group connected to the first storage tank and used for Adjusting the flow rate of the photoresist-containing waste liquid; a first pressure/flow sensor is disposed on the first liquid supply group, and sensing the pressure of the photoresist-containing waste liquid in the first liquid supply group The flow rate is used as a reference for adjusting the flow rate; an ultrafiltration membrane is connected to the first liquid supply group and is configured to flow into the photoresist-containing development waste liquid, and the photoresist-containing development waste liquid passes through the ultrafiltration membrane to make positive/negative The photoresist is separated to generate a high photoresist waste liquid and a clear developing solution; a discharge amount/time ratio control group is connected to the ultrafiltration membrane for flowing into the high photoresist waste liquid, and the emission ratio is adjusted. Discharging a high concentration photoresist waste liquid; wherein the discharge/time ratio control group includes a second pressure/flow sensor, a waste liquid discharge regulating valve, and a flow sensor, the second pressure/flow sensor Connecting the ultrafiltration membrane, the waste liquid discharge adjustment System respectively, the flow sensor is connected to the second pressure / flow rate sensor, adjusting the waste containing photoresist development of emissions / time ratio; the photoresist waste containing a high concentration is not returned to the first storage tank. The positive and negative type photoresist separation device of the developer regeneration system of claim 1, wherein the first liquid supply group comprises a first valve and a first pump, and the first valve and the first pump are disposed at the first The flow rate is adjusted between the storage tank and the first pressure/flow sensor. The positive and negative type photoresist separation device of the developer regeneration system of claim 1, further comprising a temperature sensor and a first heat exchanger, wherein the temperature sensor is disposed in the first liquid supply group and the ultrafiltration Between the membranes, sensing the circulating heat energy/power of the first liquid supply group; the first heat exchanger is disposed between the ultrafiltration membrane and the first liquid supply group, the first heat exchanger according to the temperature The sensor's sensed thermal energy/power exceeds a threshold and is cooled. The positive and negative type photoresist separation device of the developer regeneration system according to any one of claims 1 to 3, further comprising a primary filter module, a third pressure/flow sensor, wherein the third pressure/ The flow sensor is installed adjacent to the ultrafiltration membrane, and the primary filter module is disposed between the first pressure/flow sensor and the third pressure/flow sensor. The positive and negative type photoresist separation device of the developer regeneration system according to claim 4, wherein the primary filter module further comprises a fine particle filter, a first control valve, a second control valve, and a third control valve. a fourth control valve, a fifth control valve, a sixth control valve and a seventh control valve; the first control valve is connected to the first pressure/flow sensor, and the fine particle filter is disposed in the first control Between the valve and the second control valve, the second control valve is connected to the third pressure/flow sensor; the third control valve, the fourth control valve, the fifth control valve, the sixth control valve, the a seventh control valve is respectively connected to the fine particle filter; wherein the third control valve adjusts a flow rate of a clean dry air, and the fourth control valve and the fifth control valve adjust a flow rate of the ultrapure water, The sixth control valve and the seventh control valve discharge residual high-concentration photoresist waste liquid. The positive-negative type photoresist separation device of the developer regeneration system according to claim 5, wherein the ultrafiltration membrane has a molecular weight cut off, and the molecular weight cut-off (MWCO) is 1500 to 50000 (Dalton/unit). . A developer regenerating system, comprising: a positive-negative type photoresist separation device, wherein the positive-negative type photoresist separation device of the developer regenerating system according to any one of claims 1 to 6; It is connected to the positive and negative type photoresist separation device, and receives a clear developing solution to recover and reuse the developing solution. The developer regenerating system according to claim 7, wherein the developer regenerating apparatus comprises a first recovery storage tank, a first nano filter, a second nano filter, and a particle filter, when the clear development After the liquid is recovered to the developer regeneration device, the clear developer enters the first recovery storage In the tank, the first nano filter, the second nano filter, and the particle filter in the developer regeneration device are subjected to regeneration treatment.