TW202006479A - Positive and negative photoresists separation device of developing liquid regeneration system for improving the system durability, alkalinity, and developing liquid regeneration quality by separating excessively large photoresist particles in the waste of developing liquid in advance - Google Patents

Abstract

The present invention relates to a positive and negative photoresists separation device of a developing liquid regeneration system, which is generally formed of a storage tank that is connected to an Ultra Filtration (UF) membrane through a liquid-feeding set and a pressure/flow rate sensor, with the Ultra Filtration (UF) membrane being connected to a discharge amount/time ratio control set. When a waste of developing liquid is in the storage tank and the waste of the developing liquid is caused by the liquid-feeding set to flow into the Ultra Filtration (UF) membrane to separate the positive and negative photoresists, the Ultra Filtration (UF) membrane recovers a clear developing liquid after filtration and separation to a developing liquid regeneration device to carry out regeneration treatment. Also, a waste of high photoresist content is subjected to regulation by the discharge amount/time ratio control set in order to discharge the waste liquid having a high concentration of photoresist. By separating excessively large photoresist particles in the waste of developing liquid in advance, the purposes of improving the system durability, alkalinity, and developing liquid regeneration quality are achieved.

Description

Positive and negative photoresist separation device for developer regeneration system

The invention relates to a developer regeneration system, in particular to a positive and negative photoresist separation device of the developer regeneration system.

With the vigorous development of China's optoelectronics and semiconductor industries, in the substrate manufacturing process, printing machine board manufacturing or semiconductor manufacturing process, the developer is often recycled and reused as a developer for displaying positive/negative photoresist or pigment photoresist Including: tetramethylamine hydroxide (TMAH), sodium hydroxide (NaOH), sodium bicarbonate/sodium carbonate (NaHCO3/Na2CO3), potassium hydroxide (KOH).

For example, our country's invention bulletin No. I264618 "Developing liquid regeneration device" (hereinafter referred to as the previous case), which is mainly a first supply mechanism to supply developing waste liquid to a cross-flow (Cross Flow) type first mold separation mechanism (such as Nai Rice filter), the first mold separation mechanism performs membrane separation on the alkali-based developing waste liquid for photosensitive organic digital grease, and a second supply mechanism supplies the first permeate to a type of second mold separation mechanism (such as nano Filter) for membrane separation, the membrane separation result of the first mold separation mechanism is returned to the developing waste liquid of the first supply mechanism through a first reflux mechanism, and is transmitted through at least one photoresist concentration measuring mechanism side The photoresist concentration of the non-permeated liquid before reflow or the developed waste liquid after reflow is measured by the first reflow mechanism, and the non-permeated liquid or development waste liquid is discarded through a discarding mechanism according to the measurement result of the photoresist concentration measuring mechanism .

Although the developer regeneration device in the previous case automatically controls the alkali concentration and the photoresist concentration of an alkali-based developer to a predetermined concentration, and is provided with a plurality of nano filters to enhance the filtering effect, by maintaining the development performance, It can also reduce the cost of liquid exchange, but as the technology changes, it is used as a developer for displaying positive/negative photoresist or pigment photoresist, such as tetramethylamine hydroxide (TMAH) and sodium hydroxide (NaOH). , Sodium bicarbonate/sodium carbonate (NaHCO3/Na2CO3), KOH potassium hydroxide and other developers, the photoresist particles are too large, often causing the nano filter installed in the developer regeneration equipment or the developer regeneration device of the previous case Blockage reduces the durability and increases the cost of the replacement mechanism. Therefore, in response to the problem that the photoresist particles of different types of developer in the future are too large, the quality of the developer regeneration equipment is poor, frequent replacement, etc. The need to propose more solutions.

In view of the above-mentioned shortcomings of the prior art, the main object of the present invention is to provide a positive and negative photoresist separation device for a developer regeneration system, which uses a front-end technology for separating positive/negative photoresist to pre-develop waste Excessively large photoresist particles are filtered and separated to improve system durability, alkalinity, and developer regeneration quality.

The main technical means adopted to achieve the above purpose is that the positive and negative photoresist separation device of the aforementioned developer regeneration system includes: a first storage tank for storing a photoresist-containing developing waste liquid; a first liquid delivery group, which is It is connected to the first storage tank and is used to adjust the flow rate of the waste liquid containing photoresist development; a first pressure/flow sensor is provided on the first liquid supply group to sense the waste liquid containing photoresist development The pressure and flow rate in the first liquid supply group are used as a reference for adjusting the flow rate; an ultrafiltration membrane is connected to the first liquid supply group and is used to flow into the photoresist development waste liquid, and the photoresist development waste The liquid passes through the ultrafiltration membrane so that the positive/negative photoresist is separated to produce a high-resistance waste solution and a clear developer; an emission/time ratio control group is connected to the ultrafiltration membrane for the inflow of the highlight Prevent waste liquid, and adjust the discharge ratio to discharge a waste liquid containing high concentration of photoresist.

According to the above configuration, the first storage tank collects the photoresist-containing development waste liquid, and the first liquid supply group causes the development waste liquid to flow into the ultrafiltration membrane to manufacture panels, semiconductors, packaging and testing substrates, etc. The positive and negative type photoresist, or pigment photoresist is separated and filtered with developer solutions such as TMAH, NaOH, NaHCO3/Na2CO3, KOH, etc. The clear filter solution after separation and filtration is recovered by the ultrafiltration membrane system to a development Liquid regeneration equipment, which uses the developer regeneration equipment to recover and reuse the developer; in addition, the ultrafiltration membrane adjusts a high light resistance waste liquid through the discharge volume/time ratio control group to adjust the high concentration light Prevent waste liquid discharge; by preliminarily separating the oversized photoresist particles in the developing waste liquid, the purpose of improving system durability, alkalinity and developer regeneration quality is achieved.

For a preferred embodiment of a developer regeneration system proposed by the present invention, please refer to FIG. 1, which is mainly composed of a positive and negative photoresist separation device 10 connected to a developer regeneration device 20 through a liquid supply line. The positive and negative photoresist separation device 10 includes a first storage tank 11, a first liquid supply group, a first pressure/flow sensor 13, an ultrafiltration membrane (Ultra Filtration, UF) 14 and a discharge/time ratio Control group, the first storage tank 11 is used to store a photoresist developing waste liquid, the first liquid feeding group is connected to the first storage tank 11, and used to adjust the flow rate of the photoresist developing waste liquid, the first pressure / Flow sensor 13 is installed on the first liquid supply group, used to sense the pressure and flow of the photoresist development waste liquid in the first liquid supply group, and as a reference to adjust the flow, the ultrafiltration The membrane 14 has an input end, a first output end, and a second output end. The input end of the ultrafiltration membrane 14 is connected to the first liquid supply group and is supplied to the photoresist development waste liquid, so that the When the photoresist developing waste liquid passes through the ultrafiltration membrane, the positive/negative photoresist is separated to produce a high photoresist waste liquid and a clear developing liquid.

The clear developing solution flows into a developing solution regeneration device 20 through the first output end of the ultrafiltration membrane 14 for regeneration processing, and the developing waste liquid flows into the ultrafiltration membrane 14 through the first liquid supply group to transfer the panel and semiconductor , Positive and negative photoresists used in the manufacture of substrates such as packaging and testing, or pigment photoresist is separated and filtered by developing solutions such as TMAH, NaOH, NaHCO3/Na2CO3, KOH, etc. The ultrafiltration membrane 14 system separates and filters The clear developer is recovered to the developer regeneration device 20, and the developer regeneration device 20 recovers and reuses the developer; in addition, the high-photoresistance waste liquid can flow into the discharge through the second output end of the ultrafiltration membrane 14 Volume/time ratio control group, when the high photoresist waste liquid flows into the discharge volume/time ratio control group, the discharge volume/time ratio control group performs discharge ratio adjustment to discharge a high concentration photoresist waste liquid; The technology of excessively large photoresist particles in the developing waste liquid improves the system durability, alkalinity, and developer regeneration quality.

As shown in FIG. 1, in the preferred embodiment, the first liquid sending group includes a first valve 121, a first pump 122, and a second valve 123; wherein, the first valve 121 and the first The pump 122 is disposed on the liquid supply line between the first storage tank 11 and the first pressure/flow sensor 13, and the first pump 122 is connected to the first pressure/flow sensor 13, the first The valve 121 is respectively connected to the first storage tank 11 and the first pump 122 to adjust the flow rate of the waste liquid containing photoresist development; the second valve 123 has an input end and an output end, and the second valve 123 Is connected to the second output end of the ultrafiltration membrane 14, and the output end of the second valve 123 is connected to the liquid supply line between the first storage tank 11 and the first valve 121, thereby The high-photoresistance waste liquid is refluxed, and flows into the ultrafiltration membrane 14 again for separation and filtration treatment.

Further, in the preferred embodiment, the discharge volume/time ratio control group includes a second pressure/flow sensor 151, a waste liquid discharge regulating valve 152, and a flow sensor 153, the second pressure/flow The sensor 151 is connected to the second output end of the ultrafiltration membrane 14, the waste liquid discharge regulating valve 152 is respectively connected to the second pressure/flow sensor 151, the flow sensor 153, and the waste liquid discharge regulating valve 152 It is used to adjust the discharge volume/time ratio of the photoresist development waste liquid and to improve the recovery rate of the developer. Therefore, when the high photoresist waste liquid flows through the second pressure/flow sensor 151, the waste liquid The discharge regulating valve 152, the flow sensor 153, and the discharge proportion adjustment are performed through the waste liquid discharge regulating valve 152 to discharge the waste liquid containing high concentration photoresist.

For another preferred embodiment of the present invention, please refer to FIG. 2, the main technical content is substantially the same as the previous embodiment, but the preferred embodiment further includes a temperature sensor 16 and a first heat exchange 17; wherein, the temperature sensor 16 is disposed on the liquid supply line between the first pressure/flow sensor 13 of the first liquid supply group and the input end of the ultrafiltration membrane 14 for sensing the The circulating heat energy/power generated by the first pump 122 of the first liquid delivery group; the first heat exchanger 17 is disposed between the second output end of the ultrafiltration membrane 14 and the second valve 123 of the first liquid delivery group On the liquid supply line between the two, the first heat exchanger 17 can be cooled according to the thermal energy/power sensed by the temperature sensor 16 exceeding a threshold, through the temperature sensor 16, the first heat exchanger 17 Perform temperature control to protect and enhance system security. In this preferred embodiment, the ultrafiltration membrane 14 is in the shape of a column, and the ultrafiltration membrane 14 has a filter pore size and a molecular weight cutoff. In this preferred embodiment, the filter pore size is 0.02 to 0.005 (um/ Unit), the molecular weight cut-off (MWCO) is 1500 ~ 50000 (Dalton / unit), through the ultrafiltration membrane 14 and cross-flow (Cross Flow) type separation, filtration, for panel, semiconductor, Positive and negative photoresists used in the production of substrates such as packaging and testing, or pigment photoresist can be separated and filtered with developer solutions such as TMAH, NaOH, NaHCO3/Na2CO3, KOH, etc., to achieve a better separation effect; Liquid characteristics can be filtered according to ultrafiltration membranes with different molecular weight cutoffs.

For another preferred embodiment of the present invention, please refer to FIG. 3, the main technical content is substantially the same as the previous embodiments, but the preferred embodiment further includes a primary filter module and a third pressure/ Flow sensor 19; wherein, the third pressure/flow sensor 19 is installed on the liquid supply line near the input end of the ultrafiltration membrane 14, the primary filter module is disposed on the first pressure/flow sensor The positive/negative photoresist stripped by the re-process of the primary filter module on the liquid supply line between the device 13 and the third pressure/flow sensor 19 to extend/protect the ultrafiltration membrane 14 to achieve The effect of double filter protection.

In this preferred embodiment, further, as shown in FIG. 3, the primary filtration module further includes a fine particle filter 180, a first control valve 181, a second control valve 182, and a third control valve 183, a fourth control valve 184, a fifth control valve 185, a sixth control valve 186, and a seventh control valve 187; the first control valve 181 is connected to the first pressure/flow sensor 13, the fine particles The filter 180 is disposed between the first control valve 181 and the second control valve 182, and the second control valve 182 is connected to the third pressure/flow sensor 19.

As shown in FIG. 3 again, the third control valve 183, the fourth control valve 184, the fifth control valve 185, the sixth control valve 186, and the seventh control valve 187 are respectively connected to the fine particle filter 180 Connection; wherein, the third control valve 183 is used to adjust the flow of a clean dry air (Clean Dry Air, CDA), the fourth control valve 184, the fifth control valve 185 are used to adjust an ultrapure water (De -ionized water, DIW), the sixth control valve 186 and the seventh control valve 187 are used to discharge the remaining high-concentration photoresist waste liquid, so as not to affect the alkali concentration change of the recovered developer; in this preferred implementation In the example, the first pressure/flow sensor 13 of the first liquid supply group, the third pressure/flow sensor 19, and the primary filtration module constitute an automatic counter-flow mechanism.

To illustrate the operation of the automatic reverse flow mechanism, as shown in FIG. 3, the corresponding magnitudes generated by the pressure/flow sensed by the first pressure/flow sensor 13 and the third pressure/flow sensor 19 A current/voltage value, and determine whether the current/voltage value exceeds a critical value, if it is, it means that the fine particle filter 180 is blocked due to the photoresist filter; when the fine particle filter 180 is blocked, it must be To start the automatic reverse flow mechanism, first close the first control valve 181 and the second control valve 182 to avoid affecting the quality/alkali concentration change of the recovered developer, and continue to perform the following steps: close the third control valve 183, the The fifth control valve 185 and the sixth control valve 186 open the fourth control valve 184 to inject the ultrapure water, and the seventh control valve 187 discharges the high-concentration photoresist waste liquid; the third control valve is closed 183. The fourth control valve 184 and the seventh control valve 187 open the fifth control valve 185 to inject the ultrapure water, and the sixth control valve 186 discharges the high-concentration photoresist waste liquid; and then closes The third control valve 183, the fifth control valve 185, and the sixth control valve 186 open the fourth control valve 184 to inject the ultra-pure water, and the seventh control valve 187 removes the high-concentration photoresist waste liquid Discharge; close the fourth control valve 184, the fifth control valve 185 and the sixth control valve 186, open the third control valve 183 to inject the clean dry air, and the seventh control valve 187 will remain high Concentration of photoresist waste liquid and water discharge, so as not to affect the alkali concentration change of recovered developer.

With regard to the foregoing, the developing liquid is flowed into the ultrafiltration membrane 14 through the first liquid feeding group to convert the positive and negative photoresists used in the manufacture of panels, semiconductors, packaging and testing substrates, or TMAH, NaOH, NaHCO3/ The developing solutions such as Na2CO3 and KOH are separated and filtered, and the ultra-filtration membrane 14 system recovers the separated and filtered and separated clear developing solution to the developing solution regeneration device 20, which is then developed by the developing solution regeneration device 20. Recovery and reuse of liquid; in this preferred embodiment, the structure of the developer regeneration device 20 is further disclosed. Please refer to FIG. 4, the developer regeneration device 20 includes a first recovery storage tank 201, a first Filter 204, a first nano filter 205, a first photometer 207, a second heat exchanger 210, a second recovery storage tank 21, a second nano filter 211, a first mixing tank 212, a second photometer 213, a load sensor 216, a third heat exchanger 218, a small tank 219 with an alkali concentration meter and a thermometer, a third recovery storage tank 22, and a particle filter 223.

After the clear developer is recovered to the developer regeneration device 20, the clear developer enters the first recovery storage tank 201, and the first nano filter 205 and the second in the developer regeneration device 20 are used. The nano filter 211 and the particle filter 223 are regenerated. Therefore, through the positive and negative photoresist separation device 10, the photoresist particles that are too large in the developing waste liquid can be separated in advance, so as to improve the durability of the developing liquid regeneration device 20 Property, alkalinity, developer regeneration quality.

10‧‧‧ Positive and negative photoresist separation device 11‧‧‧ First storage tank 121‧‧‧ First valve 122‧‧‧ First pump 123‧‧‧ Second valve 13‧‧‧ First pressure/flow sensor 14‧‧‧Ultrafiltration membrane 151‧‧‧Second pressure/flow sensor 152‧‧‧ Waste liquid discharge regulating valve 153‧‧‧Flow sensor 16‧‧‧Temperature sensor 17‧‧‧First heat exchanger 180‧‧‧fine particle filter 181‧‧‧ first control valve 182‧‧‧ second control valve 183‧‧‧ third control valve 184‧‧‧ fourth control valve 185‧‧‧ fifth control valve 186‧ ‧‧Sixth control valve 187‧‧‧Seventh control valve 19‧‧‧ Third pressure/flow sensor 20‧‧‧Developing liquid regeneration equipment 201‧‧‧First recovery storage tank 204‧‧‧First filter 205‧‧‧First nanofilter 207‧‧‧First photometer 210‧‧‧Second heat exchanger 21‧‧‧Second recovery storage tank 211‧‧‧Second nanofilter 212‧‧‧ The first mixing tank 213‧‧‧The second photometer 216‧‧‧ Load sensor 218‧‧‧The third heat exchanger 219‧‧‧Small tank 22‧‧‧The third recovery storage tank 223‧‧‧Particle filter

FIG. 1 is a block diagram of a system architecture according to a preferred embodiment of the present invention. FIG. 2 is a schematic diagram of a system component configuration of another preferred embodiment of the present invention. FIG. 3 is a schematic diagram of another system component configuration according to another preferred embodiment of the present invention. 4 is a schematic diagram of the system component configuration of the developer regenerating apparatus of the preferred embodiment of the present invention.

10‧‧‧ Positive and negative photoresist separation device

11‧‧‧ First storage tank

121‧‧‧ First valve

122‧‧‧First pump

123‧‧‧Second valve

13‧‧‧ First pressure/flow sensor

14‧‧‧Ultrafiltration membrane

151‧‧‧ Second pressure/flow sensor

152‧‧‧ Waste liquid discharge regulating valve

153‧‧‧Flow sensor

20‧‧‧Development liquid regeneration equipment

Claims (10)

A positive and negative photoresist separation device for a developer regeneration system, which includes: a first storage tank for storing a photoresist-containing development waste liquid; and a first liquid supply group connected to the first storage tank and used for Adjusting the flow rate of the photoresist development waste liquid; a first pressure/flow sensor is provided on the first liquid supply group to sense the pressure and the pressure of the photoresist development waste liquid in the first liquid delivery group The flow rate is used as a reference to adjust the flow rate; an ultrafiltration membrane is connected to the first liquid supply group and is supplied to the photoresist-containing developing waste liquid, and the photoresist-containing developing waste liquid passes through the ultrafiltration membrane to make the positive/negative The photoresist is separated to produce a high-resistance waste liquid and a clear developer; a discharge/time ratio control group is connected to the ultrafiltration membrane for the flow of the high-resistance waste liquid and adjusting the discharge ratio to Discharge a waste liquid containing high concentration of photoresist. According to the positive and negative photoresist separation device of the developer regeneration system according to claim 1, the first liquid supply group includes a first valve and a first pump, and the first valve and the first pump are provided on the first The flow rate is adjusted between the storage tank and the first pressure/flow sensor. According to the positive and negative type photoresist separation device of the developer regeneration system described in claim 2, the first liquid sending group further includes a second valve, the second valve is connected to the ultrafiltration membrane, the first storage tank 11 and Between the first valve 121, the high-photoresistance waste liquid is allowed to flow into the ultrafiltration membrane again. The positive and negative type photoresist separation device of the developer regeneration system according to claim 1, the discharge volume/time ratio control group includes a second pressure/flow sensor, a waste liquid discharge regulating valve, and a flow sensor, the The second pressure/flow sensor is connected to the ultrafiltration membrane, and the waste liquid discharge regulating valve is respectively connected to the second pressure/flow sensor and the flow sensor to adjust the discharge amount of the waste liquid containing photoresist development/ Time ratio. The positive and negative photoresist separation device of the developer regeneration system according to claim 1, further comprising a temperature sensor and a first heat exchanger, the temperature sensor is provided in the first liquid supply group and the ultrafiltration Between the membranes, the circulating heat energy/power of the first liquid feed group is sensed; the first heat exchanger is arranged between the ultrafiltration membrane and the first liquid feed group, and the first heat exchanger is based on the temperature The thermal energy/power sensed by the sensor exceeds a threshold to cool down. The positive and negative photoresist separation device of the developer regeneration system according to any one of claims 1 to 5, further comprising a primary filter module and a third pressure/flow sensor; wherein, the third The pressure/flow sensor is installed near the ultrafiltration membrane, and the primary filter module is installed between the first pressure/flow sensor and the third pressure/flow sensor. The positive and negative photoresist separation device of the developer regeneration system as described in claim 6, the primary filter module further includes a fine particle filter, a first control valve, a second control valve, and a third control Valve, a fourth control valve, a fifth control valve, a sixth control valve, and a seventh control valve; the first control valve is connected to the first pressure/flow sensor, and the fine particle filter is provided at the first Between a control valve and the second control valve, the second control valve is connected to the third pressure/flow sensor; the third control valve, the fourth control valve, the fifth control valve, the sixth control valve The seventh control valve is connected to the fine particle filter; wherein, the third control valve regulates the flow of a clean and dry air, and the fourth control valve and the fifth control valve regulates the flow of ultrapure water , The sixth control valve and the seventh control valve discharge residual high-concentration photoresist waste liquid. The positive and negative photoresist separation device of the developer regeneration system as described in claim 7, wherein the ultrafiltration membrane has a molecular weight cut-off (Molecular Weight Cut-Off, MWCO) of 1500 to 50000 (Dalton/ unit). A developer regeneration system, comprising: a positive and negative photoresist separation device, which is the positive and negative photoresist separation device of the developer regeneration system according to any one of claims 1 to 8; a developer regeneration device, It is connected with the positive and negative photoresist separation device, and receives a clear developing solution to recover and reuse the developing solution. The developer regeneration system as described in claim 9, the developer regeneration device includes a first recovery storage tank, a first nano filter, a second nano filter, and a particle filter. After the clear developer solution is recovered to the developer regeneration device, the clear developer solution enters the first recovery storage tank, and the first nano filter, the second nano filter and the second nano filter in the developer regeneration device are used. The particle filter is regenerated.

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