WO1998029900A1 - Patterning chemical liquid centralized controller - Google Patents

Patterning chemical liquid centralized controller Download PDF

Info

Publication number
WO1998029900A1
WO1998029900A1 PCT/JP1997/004718 JP9704718W WO9829900A1 WO 1998029900 A1 WO1998029900 A1 WO 1998029900A1 JP 9704718 W JP9704718 W JP 9704718W WO 9829900 A1 WO9829900 A1 WO 9829900A1
Authority
WO
WIPO (PCT)
Prior art keywords
tank
chemical
developer
chemical solution
stored
Prior art date
Application number
PCT/JP1997/004718
Other languages
French (fr)
Japanese (ja)
Inventor
Yoshio Ishiura
Kimiaki Tanaka
Masanobu Kanauchi
Original Assignee
Nippon Zeon Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co., Ltd. filed Critical Nippon Zeon Co., Ltd.
Publication of WO1998029900A1 publication Critical patent/WO1998029900A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Definitions

  • the present invention relates to a chemical processing centralized management device for pattern processing, and more specifically, for example, centrally manages a chemical such as a developer for pattern processing of a liquid crystal substrate or a semiconductor wafer, and aims to reuse the chemical.
  • the present invention relates to a chemical processing centralized control device for pattern processing, which can automatically supply a chemical liquid of a constant quality to a plurality of processing chambers.
  • a management device disclosed in Japanese Patent Application Laid-Open No. 5-44035 is known.
  • This control device controls the concentration of the dissolved resin and the concentration of the developer in the tank in which the used developer is stored to be within a predetermined range, and supplies the developer in the tank directly. It is. That is, in this control device, when controlling the concentration of the dissolved resin and the concentration of the resin in the developing solution in the tank in which the used developer is stored to be within a predetermined range, after measuring the concentration with the sensor, The water is drained from the tank so that the concentration falls within a predetermined range, and a developing solution and / or pure water is added.
  • the developer in the tank storing the used developer since the developer in the tank storing the used developer is directly supplied to the substrate to be processed, the developer supplied to the substrate to be patterned is There is a problem that the quality of the product is unstable. That is, the developer is continuously supplied from the time the concentration of the used developer in the tank is measured until the concentration is controlled to be within a certain range. Outside quality developer may continue to be used.
  • the allowable concentration range which is a parameter for concentration control, is made narrower than it actually is. It is necessary to control the discharge of the developer in the container and the addition of the undiluted solution and pure water. However, in such control, the reusable used developer is wasted, and the significance of reusing the developer is reduced. Disclosure of the invention
  • the present invention has been made in view of such circumstances, and for example, centrally manages chemicals such as a developer for patterning a liquid crystal substrate or a semiconductor wafer, and maximizes the reuse of reusable chemicals. It is an object of the present invention to provide a chemical processing centralized control device for pattern processing, which can automatically supply a chemical liquid of a certain quality to a plurality of processing chambers.
  • the pattern processing chemical solution centralized management device includes a first tank that collects and temporarily stores processed chemical solutions sent from a plurality of processing chambers,
  • a second tank to which a part of the medicinal solution stored in the first tank is sent; a third tank to which a part of the medicinal solution stored in the second tank is sent;
  • An electrolyte ion concentration measuring means for measuring an electrolyte ion concentration value of a certain chemical solution;
  • Processing object concentration measuring means for measuring the concentration of the pattern processing object contained in the chemical solution stored in the second tank
  • Control means for controlling the amount of the undiluted chemical solution and / or diluent supplied to the second tank so that the measurement results obtained by the electrolyte ion concentration measuring means and / or the workpiece concentration measuring means fall within a certain range.
  • Batch-type chemical liquid supply means for feeding a part of the chemical liquid stored in the second tank to the third tank only when the quality of the chemical liquid stored in the second tank is within a certain range
  • Main supply means for supplying a chemical stored in the third tank to a plurality of processing chambers.
  • the chemical solution is, for example, a developing solution for patterning the exposed resist film into a predetermined pattern
  • the processing chamber is, for example, a developing chamber.
  • the chemical solution according to the present invention may be a stripping solution for stripping a resist film or the like after pattern processing. According to the apparatus of the present invention, the stripping solution can be reused.
  • the means for measuring the electrolyte ion concentration is not particularly limited as long as it can measure the pH of a chemical solution.
  • a measuring instrument utilizing an electrotitration method such as a potentiometric titration method, a polarization titration method, or a current titration method. , PH meter and conductivity meter are used.
  • the processing object concentration measuring means is not particularly limited as long as it is a means capable of measuring the concentration in the chemical solution of the pattern-processed object to be patterned by the chemical solution.
  • a refractometer For example, a refractometer; TOC (T otal Organic Carbon) Analyzer; COD meter; absorption spectrophotometer; emission spectrometer such as a fluorescence spectrometer or a phosphorescence spectrometer.
  • TOC Total Organic Carbon
  • COD meter COD meter
  • absorption spectrophotometer emission spectrometer such as a fluorescence spectrometer or a phosphorescence spectrometer.
  • emission spectrometer such as a fluorescence spectrometer or a phosphorescence spectrometer.
  • refractometers that determine the concentration by measuring the refractive index of light generated at the interface between the chemical and the prism accurately measure the concentration in the chemical of the pattern processing target that is patterned by the chemical
  • processed chemicals sent from a plurality of processing chambers are first temporarily stored in the first tank.
  • a part of the chemical stored in the first tank is sent to the second tank.
  • the feed amount to the second tank is, for example, substantially equal to the amount of the chemical solution flowing into the first tank per unit time.
  • the pH in the tank is measured by the electrolyte ion concentration measurement means, and the concentration of the pattern processing object in the chemical solution is measured by the processing object concentration measurement means, and the measured values are within a certain range. Is controlled as follows. More specifically, if the concentration of the pattern processing target in the chemical solution exceeds the allowable range, it cannot be said that the chemical solution can be reused as it is, so the chemical solution in the second tank is discharged and Thereafter, the stock solution and / or diluent is supplied into the second tank.
  • the electrolyte ion concentration of the chemical solution in the second tank is measured, and the undiluted chemical solution and / or diluent solution in the second tank are adjusted so that the electrolyte ion concentration falls within a predetermined allowable range.
  • the chemical solution stored in the second tank is stored in the second tank only when the quality (electrolyte ion concentration value and concentration of the object to be processed in the chemical solution) is within a certain range. A part of a certain chemical is sent to the third tank.
  • the amount sent to the third tank is determined based on the liquid level of the chemical stored in the third tank.c For example, if the liquid level of the chemical in the third tank is low, the second tank Increase the feed amount from the first sunset to the third sunset. However, chemicals of unacceptable quality should be returned to the second tank without being sent to the third tank.
  • the amount of the chemical solution stored in the third tank is extremely small, such as at startup or in an emergency, a freshly adjusted electrolyte ion concentration from the fourth tank for backup is used. Supply the appropriate chemical to the third tank.
  • the chemical is supplied to each processing chamber by the main chemical supply means.
  • the processed chemical liquid is sent to the third tank through the first tank and the second tank, and then sent to each processing chamber. Therefore, the used chemical solution can be reused.
  • the chemical stored in the third tank is designed so that only a chemical of constant quality is stored, the quality of the chemical supplied to each processing chamber is stabilized.
  • the tank for storing the chemical solution to be supplied to each processing chamber and the tank for adjusting the concentration are separate, the risk that the chemical solution before the concentration control is supplied to the processing chamber is reduced, and furthermore, disposal The amount of chemical solution to be used can be reduced.
  • FIG. 1 is a schematic configuration diagram of a centralized chemical processing apparatus for pattern processing according to an embodiment of the present invention
  • FIG. 2 is a conceptual diagram of a plurality of processing chambers
  • FIG. 3 shows a correlation between a refractometer and a resist concentration. It is a graph.
  • the management device 2 according to the present embodiment shown in FIG.
  • each coater 4 has, for example, a resist coating chamber 5, an exposure chamber 6, and a developing chamber 7.
  • a resist is coated on the surface of a glass substrate 8 of a liquid crystal display device by a spin coat method or the like.
  • a predetermined pattern is exposed on the surface of the substrate 8 coated with the resist.
  • a developing solution is spray-coated or dived on the surface of the resist on which a predetermined pattern has been exposed, and development is performed.
  • the resist is processed into a predetermined pattern by the current image, and the resin constituting the processed resist is sent to the first tank 12 shown in FIG. 1 through the return line 10 while being contained in the used developer. .
  • a first discharge line 14 is connected to the first tank 12 c , and a pump 16 is mounted to the first discharge line 14.
  • the discharge line 14 is branched on the discharge side of the pump 16 into a circulation line 18 and a feed line 20.
  • Opening / closing control valves 19 and 21 are mounted on each of the lines 18 and 20.
  • the open / close control valves 19 and 21 are switched between open and closed states by the control device according to the liquid level of the first tank and the state of the second and third tanks.
  • a part of the used developer in the first tank 12 sent by the pump 16 through the first discharge line 14 is transferred to the second tank by switching the open / close control valve 21 through the feed line 20.
  • Sent to 2 2 The amount sent to the second tank is calculated by the control device according to the liquid level of the first and third tanks 12, 68, and is used to return from the return line 10 to the first tank. Approximately the same amount as the used developer is supplied to the second tank 22 through the feed line 20.
  • the first tank 12 sent by the pump 16 through the first discharge line 14 is used.
  • the used developer is returned into the first tank 12.
  • a measurement line 23 is connected to the second tank 22.
  • an electrolyte ion concentration measuring means 24, a workpiece concentration measuring means 26, and a particle measuring means 28 are mounted in parallel.
  • the electrolyte ion concentration measuring means 24 measures the electrolyte ion concentration value of the developer stored in the second tank 22, and
  • the object concentration measuring means 26 measures the concentration of the resist resin, which is the object to be processed, and the particle measuring means 28 allows the proportion of impurities such as dust contained in the developer to be measured. I have.
  • the measurement data of these measurement means 24, 26, and 28 is output to a control device not shown.
  • the control device may be a specific electric circuit or a control device using a microcomputer and a personal computer.
  • control device controls the electrolyte ion concentration value of the developing solution stored in the second tank 22 and the resist as a processing target contained in the developing solution.
  • the flow control valve which will be described later, is controlled so that the concentration of (resin) and the proportion of particles in the developer become a predetermined allowable value.
  • the predetermined allowable range of the developer concentration differs depending on the type of the resist to be developed and the type of the developer, but for example, for example, tetramethylammonium hydroxide (TMAH) was used as the developing solution.
  • TMAH concentration is preferably about 2.38 ⁇ 0.05%. If a developer having a quality exceeding the allowable range is supplied to the developing chamber, the sensitivity during development may fluctuate, and a pattern having a constant line width may not be obtained.
  • the allowable range of the concentration of resin contained in the developer is a force determined according to the line width of the resist to be patterned. ⁇ For example, when the line width varies ⁇ 5% in a 5 ⁇ m pattern, the developer The total amount is preferably at most 0.1 part by weight, more preferably at most 0.075 parts by weight, based on 100 parts by weight. When a positive type development is performed using a developing solution in which the resin concentration exceeds the allowable range, the resin in the unexposed portion which should not be dissolved tends to be dissolved, and a desired line width is obtained. Not preferred.
  • a conductivity meter is used as the electrolyte ion concentration measuring means 24, and a refractometer capable of measuring the concentration of the resin contained in the developer is used as the processing object concentration measuring means 26. And a particle counter in liquid is used as the particle measuring means 28.
  • Figure 3 shows the results of the actual measurement of the resist resin concentration in the developer using a refractometer.
  • the horizontal axis in FIG. 3 indicates the concentration of the resist resin in the developer, and the vertical axis indicates the scale of the refractometer.
  • DD-7 digital differential densitometer manufactured by Atago Co., Ltd. was used.
  • FIG. 3 is a scale of the number of grams of sucrose contained in 10 () g of sucrose solution.
  • the concentration completely matches the actual concentration, and in the present embodiment, as shown in FIG. 3, the concentration is in direct proportion to the concentration of the resist resin. That is, it was confirmed that the refractometer can accurately measure the resist resin concentration.
  • “D ev” on the horizontal axis in FIG. 3 means a developer.
  • the second tank 22 has a second discharge line 3 () connected to it.c
  • the second discharge line 30 has a pump 32 and a filter 34 installed in this order. Yes.
  • the second discharge line 30 is branched on the downstream side of the filter 34 into a circulation line 36 and a feed line 38.
  • the circulation line 36 is equipped with an on-off control valve 4 () and a line mixer 44.
  • a part of the developer discharged through the second discharge line 3 () is returned to the inside of the second tank 22.
  • impurities such as particles contained in the developer are removed by passing through the filter 34.
  • the line mixer 4 facilitates mixing of the liquid passing therethrough.
  • the opening and closing control valves 40 and 42 are switched by the control device according to the adjustment state of the second tank 22.
  • an undiluted solution supply line 46 and a pure water supply line 48 are connected.
  • Flow control valves 50 and 52 are connected to these lines 46 and 48, respectively.
  • the opening control of the flow control valves 50 and 52 is performed by a flow meter 51.
  • the stock solution (chemical solution) and pure water (diluent) supplied through the developing solution supply line 46 and the pure water supply line 48 can be mixed through the line mixer 44 and supplied to the second tank 22. It has become.
  • the undiluted developing solution is not particularly limited.
  • an aqueous solution of an inorganic alkali containing an inorganic alkali such as potassium hydroxide, sodium hydroxide, sodium phosphate, sodium silicate, or tetramethylammonium hydroxide (TMAH)
  • organic aqueous solutions such as trimethyl monoethanol ammonium hydroxide (choline).
  • the supply amount of the developing solution and / or pure water to the second tank 22 is controlled based on the measurement result by the electrolyte ion concentration measuring means 24, based on the electrolyte ions of the developer stored in the second tank 22. Opening of flow control valves 50 and 52 so that the concentration value is constant Is controlled by controlling The control of the supply amount of the undiluted developing solution and / or pure water to the second tank 22 is performed according to the measurement result of the liquid level meter 69 attached to the third tank 68 described later and the drain line 58
  • the required amount to be sent from the second tank 22 to the third tank is calculated by the control device based on the amount of developer that is discarded through the controller, and the calculation is performed based on the calculated amount.
  • a feed line 38 branched from the second discharge line 30 is connected to the third tank 68.
  • the feed line 38 is provided with an open / close control valve 42 (batch type chemical liquid supply means).
  • the opening / closing control valve 42 measures the electrolyte ion concentration measured by the electrolyte ion concentration measuring means 24 attached to the measuring line 23 of the second tank 22 and the concentration measured by the object concentration measuring means 26. Is controlled to open only when the measured concentration and the amount of particles measured by the particle measurement means are all within the allowable range, so that only the developer having an allowable range of quality is supplied to the third tank 68. ing. If the quality of the developer is out of the allowable range, the developer is controlled to return to the second tank through the circulation line 36.
  • the opening / closing control valve 42 also controls the amount of developer supplied from the second tank 22 to the third tank 68.
  • the amount of the developer supplied from the second tank 22 to the third tank 68 is controlled based on the measurement result of the liquid level meter 69 mounted on the third tank 68. In other words, when the measurement result of the liquid level meter 69 is low (the liquid level is low), the opening and closing of the on-off control valve 42 is controlled so that the amount of the developing solution that makes up for it is supplied. .
  • the control described above does not supply a developer with a quality outside the allowable range
  • the third tank 68 always stores a developer of a constant quality.
  • the second tank 22 is also connected with a drain discharge line 54.
  • the drain line 54 for drain is equipped with a pump 56.
  • the drain discharge line 54 is branched into a drain line 58 and a circulation line 60 on the downstream side of the pump 56.
  • An open / close control valve 62 is attached to the drain line 58.
  • the opening / closing control valve 62 controls the control valve 62 by detecting the increase in the concentration, and controls the control valve 62.
  • the present The disposal amount of the image liquid is calculated based on the measurement result of the processing object concentration measuring means 26 and the measurement result of the liquid level meter 69 of the third tank 68.
  • a flow control valve 64 and a filter 66 are connected to the circulation line 60.
  • the flow control valve 64 is also connected to a control device (not shown) and is controlled by the control device.
  • the flow control valve 64 is controlled so as to be closed when the flow control valve 62 is opened, and to be opened when the flow control valve 62 is closed. That is, as long as the flow control valve 62 is not opened, the developer discharged from the drain discharge line 54 returns to the second tank 22 through the circulation line 60. In that case, since it passes through the filter 66, the concentration of impurities such as particles contained in the developer becomes low.
  • the third tank 68 is connected to a main chemical supply line (main chemical supply means) # 0.
  • the main chemical supply line 70 is equipped with a pump 72 and a filter 74 in this order.
  • the chemical solution main supply line 70 is connected to each of the developing chambers 7 shown in FIG. 2, and supplies a reused developer of a constant quality to each of the developing chambers 7 through this line 70.
  • This line 7 () is on the downstream side of the filter 74, and a branch line 69 is connected.
  • the branch line 69 is a return line to the third tank 68, and a pressure gauge 71 and a flow control valve 73 are attached to this line.
  • the flow control valve 73 is controlled based on the pressure 71, and opens greatly when the pressure is too high to return the liquid to the tank 68.
  • the device 2 has a fourth tank 76 in addition to the first tank 12, the second tank 22, and the third tank 68.
  • the fourth ink tank 76 is a tank for fresh start-up or emergency backup in which fresh developer is stored.
  • the fourth tank 76 is provided with electrolyte ion concentration measuring means 88. The result measured by the electrolyte ion concentration measuring means 88 is output to a control device not shown.
  • a developer supply line 78 is connected to the fourth tank 76.
  • a line mixer 8 ⁇ is connected to the supply line 78.
  • the line mixer 80 of the supply line 78 has a pure water supply branch line 81 branched from the pure water supply line 48 and a developing solution supply branch line 82 branched from the developing solution supply line 46. Connected.
  • Flow control valves 84, 86 are attached to these branch lines 81, 82, respectively. These flow control valves 84 and 86 are controlled by a controller (not shown) based on the measurement result of the flow meter 8 ⁇ .
  • the control device monitors the level of the fresh developer stored in the fourth tank 76, and based on the result measured by the electrolyte ion concentration measuring means 88, the electrolyte ion of the developer in the tank is measured.
  • the openings of the flow control valves 84 and 86 so that the concentration value falls within a predetermined range, pure water and a raw solution or a developing solution are supplied into the fourth tank 76.
  • the fourth discharge line 90 is connected to the fourth tank 76.
  • the fourth discharge line 90 is provided with a pump 92, a filter 94 and particle measuring means 96 in this order.
  • the measurement result of the particle measuring means 96 is output to a control device not shown.
  • On the downstream side of the particle measuring means 96 it is branched into a circulation line 98 and a feed line 100.
  • On / off control valves 102 and 104 are mounted on these lines 98 and 100, respectively.
  • Each of the on / off control valves 102 and 104 is controlled by a control device (not shown).
  • C Normally, the on / off control valve 104 is closed, the on / off control valve 102 is open, The developer in the fourth tank circulates through a circulation line 98.
  • the liquid level sensor 69 detects the state, and based on the detection signal, Then, the control device opens the opening / closing control valve 104 and closes the opening / closing control valve 102.
  • the fresh developer in the fourth tank 76 is fed into the third tank 68, and from the third tank 68 to the developing chamber 7 shown in FIG. Is sent.
  • the processed developing solution sent from the plurality of developing chambers 7 shown in FIG. 2 is first concentrated in the first tank 12 shown in FIG. Is temporarily stored.
  • a part of the developer stored in the first tank 12 is sent to the second tank 22 through the feed line 20.
  • the amount of the developer fed to the second tank 22 is, for example, substantially equal to the amount of the used developer flowing into the first tank 12 per unit time.
  • the concentration of the resin in the developer is measured by the processing object concentration measuring means 26, and the measured values are controlled so as to be within a certain range. More specifically, if the resin concentration in the developing solution exceeds the allowable range, it cannot be said that the developing solution can be reused as it is, so the developing solution in the second tank 22 is drained to the drain line 5. 8 and at the same time or afterwards, the undiluted developing solution and / or pure water are supplied into the second tank 22 through the supply lines 46, 48 and the circulation line 36. At the same time, the pH of the developer in the second tank 22 is measured, and the developing solution and / or pure water into the second tank 22 is adjusted so that the pH falls within a predetermined allowable range. Control the supply of water.
  • the opening / closing control valve 42 uses the second tank 2 only when the quality of the developer stored in the second tank 22 (electrolyte ion concentration value, resin concentration and particle content ratio) is within a certain range. A part of the developer stored in 2 is sent to the third tank 68. The feed amount to the third tank 68 is determined based on the measurement result of the liquid level meter 69 attached to the third tank 68, and the like. For example, when the liquid level of the developer stored in the third tank 68 is low, the opening / closing control valve 42 of the feed line 38 is opened, and the second tank 22 to the third tank 68 is opened. Increase the feed amount.
  • the feed line 1 can be transferred from the fourth tank 76 for backup. Through ⁇ ⁇ ⁇ ⁇ 0, a fresh chemical solution with the adjusted electrolyte ion concentration value is supplied to the third tank 68.
  • the developer is supplied from the third tank 68 to each of the developing chambers 7 shown in FIG. 2 through a developer main supply line 70.
  • the processed developer is sent to the third tank 68 through the first tank 12 and the second tank 22, and from there, each developing chamber 7 Sent to. Therefore, the used developer can be reused.
  • the chemical stored in the third tank 68 is designed so that only a developer of a constant quality is always stored, the quality of the developer supplied to each developing chamber 7 is stabilized.
  • the third tank 68 for storing the developer supplied to each developing chamber 7 and the second tank 22 for performing the concentration adjustment are separate, the concentration before the concentration control is performed. The possibility that the chemical solution is supplied to the developing chamber is reduced, and the amount of the developer solution to be discarded through the drain line 58 can be reduced.
  • a developing solution is used as the chemical solution.
  • the chemical solution used in the pattern processing chemical solution supply device according to the present invention is not limited to the developing solution, but may be a stripping solution, a cleaning solution (such as isopropanol). , Wafer surface treatment solution, adhesive solution, etc.
  • the processed chemical liquid through the first tank Contact and second tank is sent to the third tank, c thus sent from here to the respective processing chambers, spent The chemical solution can be reused.
  • the chemical stored in the third tank is designed so that only a chemical of constant quality is stored, the quality of the chemical supplied to each processing chamber is stabilized.
  • the tank for storing the chemical solution to be supplied to each processing chamber and the tank for adjusting the concentration are separate, the risk that the chemical solution before concentration control is supplied to the processing chamber is reduced, and furthermore, disposal The amount of chemical solution used can be reduced.

Abstract

A centralized controller has a 1st tank (12) in which all used developer which is sent from a plurality of development chambers (7) is collected and temporarily stored, a 2nd tank (22) into which a part of the developer stored in the 1st tank (12) is sent, a 3rd tank (68) into which a part of the developer stored in the 2nd tank (22) is sent, a pH measuring means (26) which measures the pH value of the developer stored in the 2nd tank (22), a concentration measuring means (26) which measures the concentration of resin contained in the developer stored in the 2nd tank (22), control valves (50 and 52) which control the quantities of unused developer and pure water which are supplied to the 2nd tank (22), and a control valve (42) which feeds a part of the developer stored in the 2nd tank (22) into the 3rd tank (68) only when the quality of the developer stored in the 2nd tank (22) is within a certain range. The chemical liquid for patterning is controlled in a centralized way, the recyclable chemical liquid can be recycled as much as possible and, further, the chemical liquid having a constant quality can be automatically supplied to a plurality of treatment chambers.

Description

明 細 書 パターン加工用薬液集中管理装置 技術分野  Description Central chemical liquid management system for pattern processing Technical field
本発明は、 パターン加工用薬液集中管理装置に係り、 さらに詳しくは、 たとえ ば液晶基板あるいは半導体ウェハのパターン加工を行うための現像液などの薬液 を集中的に管理し、 薬液の再利用を図ると共に、 複数の処理室に一定の品質の薬 液を自動的に供給することができるパターン加工用薬液集中管理装置に関する。 背景技術  The present invention relates to a chemical processing centralized management device for pattern processing, and more specifically, for example, centrally manages a chemical such as a developer for pattern processing of a liquid crystal substrate or a semiconductor wafer, and aims to reuse the chemical. In addition, the present invention relates to a chemical processing centralized control device for pattern processing, which can automatically supply a chemical liquid of a constant quality to a plurality of processing chambers. Background art
液晶基板などの微細加工に用いる現像液を管理する装置としては、 たとえば特 開平 5 - 4 0 3 4 5号公報に示す管理装置が知られている。  As a device for managing a developer used for fine processing of a liquid crystal substrate or the like, for example, a management device disclosed in Japanese Patent Application Laid-Open No. 5-44035 is known.
この管理装置では、 各現像室毎に、 現像液管理装置が装着してあり、 各現像室 毎に現像液の品質を管理し、 現像液を再利用している。 この管理装置では、 使用 済み現像液が貯留されるタンク内の現像液の溶解樹脂濃度とアル力リ濃度とが所 定範囲となるように制御し、 そのタンク内の現像液を直接供給する構成となって いる。 すなわち、 この管理装置では、 使用済み現像液が貯留されるタンク内の現 像液の溶解樹脂濃度とアル力リ濃度とが所定範囲となるように制御する際に、 セ ンサにより濃度測定した後に、 その濃度が所定範囲となるように、 タンクから排 水を行い、 現像原液および/ または純水を追加するようにしてある。  In this management device, a developer management device is installed for each developing room, and the quality of the developing solution is managed for each developing room, and the developing solution is reused. This control device controls the concentration of the dissolved resin and the concentration of the developer in the tank in which the used developer is stored to be within a predetermined range, and supplies the developer in the tank directly. It is. That is, in this control device, when controlling the concentration of the dissolved resin and the concentration of the resin in the developing solution in the tank in which the used developer is stored to be within a predetermined range, after measuring the concentration with the sensor, The water is drained from the tank so that the concentration falls within a predetermined range, and a developing solution and / or pure water is added.
ところが、 この管理装置では、 使用済み現像液が貯留してあるタンク内の現像 液を直接に加工対象となる基板に供給する構成であるため、 パターン加工の対象 となる基板に供給される現像液の品質が不安定であるという課題を有する。 すな わち、 タンク内の使用済み現像液の濃度を測定してから、 その濃度が一定範囲と なるように制御するまでの間も、 その現像液が供給され続けることから、 許容で きる範囲外の品質の現像液が使用され続けるおそれがある。  However, in this management device, since the developer in the tank storing the used developer is directly supplied to the substrate to be processed, the developer supplied to the substrate to be patterned is There is a problem that the quality of the product is unstable. That is, the developer is continuously supplied from the time the concentration of the used developer in the tank is measured until the concentration is controlled to be within a certain range. Outside quality developer may continue to be used.
このようなおそれを回避するためには、 濃度制御のためのパラメータとなる濃 度許容範囲を実際よりも狭め、 少しでも溶解樹脂濃度が増大した場合には、 タン ク内の現像液の排出を行い、 現像原液および純水の追加を行う制御を行う必要が ある。 ところが、 このような制御では、 再利用可能な使用済み現像液を無駄に捨 てることになり、 現像液の再利用を図る意義が少なくなる。 発明の開示 In order to avoid such a risk, the allowable concentration range, which is a parameter for concentration control, is made narrower than it actually is. It is necessary to control the discharge of the developer in the container and the addition of the undiluted solution and pure water. However, in such control, the reusable used developer is wasted, and the significance of reusing the developer is reduced. Disclosure of the invention
本発明は、 このような実状に鑑みてなされ、 たとえば液晶基板あるいは半導体 ウェハのパターン加工を行うための現像液などの薬液を集中的に管理し、 再使用 可能な薬液を最大限に再利用することができ、 しかも複数の処理室に一定の品質 の薬液を自動的に供給することができるパターン加工用薬液集中管理装置を提供 することを目的とする。  The present invention has been made in view of such circumstances, and for example, centrally manages chemicals such as a developer for patterning a liquid crystal substrate or a semiconductor wafer, and maximizes the reuse of reusable chemicals. It is an object of the present invention to provide a chemical processing centralized control device for pattern processing, which can automatically supply a chemical liquid of a certain quality to a plurality of processing chambers.
上記目的を達成するために、 本発明に係るパターン加工用薬液集中管理装置は、 複数の処理室から送られてくる処理済みの薬液を集中的に集めて一時貯留する 第 1タンクと、  To achieve the above object, the pattern processing chemical solution centralized management device according to the present invention includes a first tank that collects and temporarily stores processed chemical solutions sent from a plurality of processing chambers,
前記第 1タンクに貯留されている薬液の一部が送り込まれる第 2タンクと、 前記第 2タンクに貯留されている薬液の一部が送り込まれる第 3タンクと、 前記第 2タンクに貯留してある薬液の電解質ィォン濃度値を測定する電解質ィ オン濃度測定手段と、  A second tank to which a part of the medicinal solution stored in the first tank is sent; a third tank to which a part of the medicinal solution stored in the second tank is sent; An electrolyte ion concentration measuring means for measuring an electrolyte ion concentration value of a certain chemical solution;
前記第 2タンクに貯留してある薬液に含まれるパターン加工対象物の濃度を測 定する加工対象物濃度測定手段と、  Processing object concentration measuring means for measuring the concentration of the pattern processing object contained in the chemical solution stored in the second tank;
前記電解質ィォン濃度測定手段および/または加工対象物濃度測定手段での測 定結果が一定範囲となるように、 第 2タンクへ供給される薬液原液および/ また は希釈液の量を制御する制御手段と、  Control means for controlling the amount of the undiluted chemical solution and / or diluent supplied to the second tank so that the measurement results obtained by the electrolyte ion concentration measuring means and / or the workpiece concentration measuring means fall within a certain range. When,
前記第 2タンクに貯留してある薬液の品質が一定の範囲内の場合にのみ、 第 2 タンクに貯留してある薬液の一部を前記第 3タンクへ送り込むバッチ式薬液供給 手段と、  Batch-type chemical liquid supply means for feeding a part of the chemical liquid stored in the second tank to the third tank only when the quality of the chemical liquid stored in the second tank is within a certain range,
前記第 3タンクに貯留してある薬液を複数の処理室へ供給する薬液主供給手段 とを有する。  Main supply means for supplying a chemical stored in the third tank to a plurality of processing chambers.
前記第 3タンク内に貯留してある薬液が所定以下の場合に、 前記第 3タンク内 へ、 電解質ィオン濃度値が調整された新鮮な薬液を供給する第 4タンクをさらに 有することが好ましい。 A fourth tank for supplying a fresh chemical solution having an adjusted electrolyte ion concentration value into the third tank when the chemical solution stored in the third tank is equal to or less than a predetermined value; It is preferred to have.
前記薬液は、 たとえば露光後のレジス卜膜を所定パターンにパターン加工する ための現像液であり、 前記処理室は、 たとえば現像室である。 本発明に係る薬液 としては、 パターン加工された後のレジスト膜などを剥離するための剥離液であ つても良い。 本発明に係る装置によれば、 剥離液の再利用も可能である。  The chemical solution is, for example, a developing solution for patterning the exposed resist film into a predetermined pattern, and the processing chamber is, for example, a developing chamber. The chemical solution according to the present invention may be a stripping solution for stripping a resist film or the like after pattern processing. According to the apparatus of the present invention, the stripping solution can be reused.
本発明では、 電解質イオン濃度測定手段としては、 薬液の p Hを測定できるも のであれば特に限定されず、 たとえば電位差滴定法、 分極適定法、 電流適定法な どの電気滴定法を利用した測定器、 p H計、 導電率計が用いられる。  In the present invention, the means for measuring the electrolyte ion concentration is not particularly limited as long as it can measure the pH of a chemical solution. For example, a measuring instrument utilizing an electrotitration method such as a potentiometric titration method, a polarization titration method, or a current titration method. , PH meter and conductivity meter are used.
また、 加工対象物濃度測定手段としては、 薬液によりパターン加工されるパタ ーン加ェ対象物の薬液中濃度を測定することができる手段であれば特に限定され ず、 たとえば屈折計； T O C ( T o t a l O r g a n i c C a r b o n ) 分 析計； C 0 D計；吸光光度計； けい光分析計、 りん光分析計などの発光分析計な どが用いられる。 中でも特に、 薬液とプリズムとの界面で生じる光の屈折率を測 定することにより濃度を求める屈折率計は、 薬液によりパターン加工されるパタ -ン加工対象物の薬液中濃度を正確に測定することができるので好ましい。  The processing object concentration measuring means is not particularly limited as long as it is a means capable of measuring the concentration in the chemical solution of the pattern-processed object to be patterned by the chemical solution. For example, a refractometer; TOC (T otal Organic Carbon) Analyzer; COD meter; absorption spectrophotometer; emission spectrometer such as a fluorescence spectrometer or a phosphorescence spectrometer. Above all, refractometers that determine the concentration by measuring the refractive index of light generated at the interface between the chemical and the prism accurately measure the concentration in the chemical of the pattern processing target that is patterned by the chemical. It is preferable because it can be used.
本発明に係るパターン加工用集中管理装置では、 複数の処理室から送られてく る処理済みの薬液は、 まず第 1タンク内に集中的に一時貯留される。 第 1タンク 内に貯留してある薬液の一部は、 第 2タンクへと送られる。 第 2タンクへの送り 量は、 たとえば第 1タンクへ単位時間当たりに流入してくる薬液の量と略同等で ある。  In the central processing apparatus for pattern processing according to the present invention, processed chemicals sent from a plurality of processing chambers are first temporarily stored in the first tank. A part of the chemical stored in the first tank is sent to the second tank. The feed amount to the second tank is, for example, substantially equal to the amount of the chemical solution flowing into the first tank per unit time.
第 2タンクでは、 電解質ィォン濃度測定手段によりタンク内の p Hが測定され、 加工対象物濃度測定手段により薬液中のパターン加工対象物濃度が測定され、 そ れらの測定値が一定範囲となるように制御される。 より具体的には、 薬液中のパ ターン加工対象物濃度が許容範囲よりも増大した場合には、 そのままでは再利用 できる薬液とはいえないので、 第 2タンク内の薬液を排出し、 同時またはその後 に、 薬液原液および/ または希釈液を第 2タンク内に供給する。 また、 それと平 行して、 第 2タンク内の薬液の電解質イオン濃度が測定され、 その電解質イオン 濃度が所定の許容範囲となるように、 第 2タンクへの薬液原液および,'または希 釈液の供給量を制御する。 バッチ式薬液供給手段では、 第 2タンクに貯留してある薬液の品質 （電解質ィ オン濃度値および薬液中加工対象物濃度） が一定の範囲内の場合にのみ、 第 2夕 ンクに貯留してある薬液の一部を前記第 3タンクへ送り込む。 第 3タンクへの送 り量は、 第 3タンク内に貯留してある薬液の液面レベルなどに基づき決定される c たとえば第 3タンクの薬液の液面レベルが低い場合には、 第 2タンクから第 3夕 ンクへの送り量を増大させる。 ただし、 許容範囲を越える品質の薬液は、 第 3夕 ンクへ送らずに第 2タンクへ戻す。 In the second tank, the pH in the tank is measured by the electrolyte ion concentration measurement means, and the concentration of the pattern processing object in the chemical solution is measured by the processing object concentration measurement means, and the measured values are within a certain range. Is controlled as follows. More specifically, if the concentration of the pattern processing target in the chemical solution exceeds the allowable range, it cannot be said that the chemical solution can be reused as it is, so the chemical solution in the second tank is discharged and Thereafter, the stock solution and / or diluent is supplied into the second tank. At the same time, the electrolyte ion concentration of the chemical solution in the second tank is measured, and the undiluted chemical solution and / or diluent solution in the second tank are adjusted so that the electrolyte ion concentration falls within a predetermined allowable range. To control the supply amount. In the batch-type chemical solution supply means, the chemical solution stored in the second tank is stored in the second tank only when the quality (electrolyte ion concentration value and concentration of the object to be processed in the chemical solution) is within a certain range. A part of a certain chemical is sent to the third tank. The amount sent to the third tank is determined based on the liquid level of the chemical stored in the third tank.c For example, if the liquid level of the chemical in the third tank is low, the second tank Increase the feed amount from the first sunset to the third sunset. However, chemicals of unacceptable quality should be returned to the second tank without being sent to the third tank.
もし仮に、 スタートアップ時や非常時の場合などのように、 第 3タンクに貯留 してある薬液の量がかなり少ない場合には、 バックアップ用の第 4タンクから、 電解質ィォン濃度値が調整された新鮮な薬液を第 3タンクへ供給する。  If the amount of the chemical solution stored in the third tank is extremely small, such as at startup or in an emergency, a freshly adjusted electrolyte ion concentration from the fourth tank for backup is used. Supply the appropriate chemical to the third tank.
第 3タンクからは、 薬液主供給手段により、 各処理室に薬液が供給される。 本発明に係るパターン加工用薬液集中管理装置では、 処理済みの薬液は、 第 1 タンクおよび第 2タンクを通して、 第 3タンクへ送られ、 ここから各処理室へと 送られる。 したがって、 使用済み薬液の再利用が可能になる。 しかも、 第 3タン クに貯留される薬液は、 常に一定の品質の薬液のみが貯留されるように工夫して あるため、 各処理室へ供給される薬液の品質が安定する。 また、 各処理室へ供給 される薬液を貯留するタンクと、 濃度調節が行われるタンクとが別々であるため、 濃度制御される前の薬液が処理室に供給されるおそれが少なくなり、 しかも廃棄 する薬液の量も少なくすることができる。 図面の簡単な説明  From the third tank, the chemical is supplied to each processing chamber by the main chemical supply means. In the centralized chemical liquid processing apparatus for pattern processing according to the present invention, the processed chemical liquid is sent to the third tank through the first tank and the second tank, and then sent to each processing chamber. Therefore, the used chemical solution can be reused. In addition, since the chemical stored in the third tank is designed so that only a chemical of constant quality is stored, the quality of the chemical supplied to each processing chamber is stabilized. In addition, since the tank for storing the chemical solution to be supplied to each processing chamber and the tank for adjusting the concentration are separate, the risk that the chemical solution before the concentration control is supplied to the processing chamber is reduced, and furthermore, disposal The amount of chemical solution to be used can be reduced. BRIEF DESCRIPTION OF THE FIGURES
図 1は本発明の 1実施形態に係るパターン加工用薬液集中管理装置の概略構成 図、 図 2は複数の処理室の概念図、 図 3は屈折率計とレジス卜濃度との相関関係 を示すグラフである。 発明を実施するための最良の態様  FIG. 1 is a schematic configuration diagram of a centralized chemical processing apparatus for pattern processing according to an embodiment of the present invention, FIG. 2 is a conceptual diagram of a plurality of processing chambers, and FIG. 3 shows a correlation between a refractometer and a resist concentration. It is a graph. BEST MODE FOR CARRYING OUT THE INVENTION
以下、 本発明を図面に示す実施形態に基づき詳細に説明する。  Hereinafter, the present invention will be described in detail based on embodiments shown in the drawings.
図 1に示す本実施形態に係る管理装置 2は、 たとえば図 2に示す複数のコ一タ The management device 2 according to the present embodiment shown in FIG.
4 , 4 , 4 · · ·の各現像室 7 , 7， 7…から、 使用済み現像液を集め、 集中的に濃 度管理制御を行い、 制御された現像液を各現像室 7， 7 , 7…に供給するための 装置である。 図 2に示すように、 各コータ 4は、 たとえばレジスト塗布室 5と、 露光室 6と、 現像室 7とを有する。 Collect used developer from each of the developing chambers 7, 7, 7, ... of 4, 4, 4 This is a device that controls the temperature and supplies the controlled developer to each of the developing chambers 7, 7, 7,. As shown in FIG. 2, each coater 4 has, for example, a resist coating chamber 5, an exposure chamber 6, and a developing chamber 7.
レジスト塗布室 5では、 たとえば液晶表示装置のガラス基板 8の表面にレジス トをスピンコ一卜法などで塗布する。 露光室 6では、 レジストが塗布された基板 8の表面に所定パターンを露光する。 現像室 7では、 所定パターンが露光された レジス卜の表面に現像液をスプレー塗布あるいはディビングして現像を行う。 現 像によりレジストは所定パターンに加工され、 加工されたレジストを構成する樹 脂は使用済み現像液に含まれた状態で、 戻りライン 1 0を通して図 1に示す第 1 タンク 1 2へと送られる。  In the resist coating chamber 5, for example, a resist is coated on the surface of a glass substrate 8 of a liquid crystal display device by a spin coat method or the like. In the exposure chamber 6, a predetermined pattern is exposed on the surface of the substrate 8 coated with the resist. In the developing chamber 7, a developing solution is spray-coated or dived on the surface of the resist on which a predetermined pattern has been exposed, and development is performed. The resist is processed into a predetermined pattern by the current image, and the resin constituting the processed resist is sent to the first tank 12 shown in FIG. 1 through the return line 10 while being contained in the used developer. .
図 1に示すように、 第 1タンク 1 2には、 第 1排出ライン 1 4が接続してある c 第 1排出ライン 1 4には、 ポンプ 1 6が装着してある。 排出ライン 1 4は、 ボン プ 1 6の吐出側で、 循環ライン 1 8と送りライン 2 0とに分岐してある。 各ライ ン 1 8 , 2 0には、 開閉制御弁 1 9， 2 1が装着してある。 開閉制御弁 1 9， 2 1は、 第 1タンクの液面レベル、 第 2、 第 3タンクの状態に応じて、 制御装置に より開閉状態が切換えられる。 As shown in FIG. 1, a first discharge line 14 is connected to the first tank 12 c , and a pump 16 is mounted to the first discharge line 14. The discharge line 14 is branched on the discharge side of the pump 16 into a circulation line 18 and a feed line 20. Opening / closing control valves 19 and 21 are mounted on each of the lines 18 and 20. The open / close control valves 19 and 21 are switched between open and closed states by the control device according to the liquid level of the first tank and the state of the second and third tanks.
第 1排出ライン 1 4を通してポンプ 1 6により送られた第 1タンク 1 2内の使 用済み現像液の一部は、 送りライン 2 0を通して開閉制御弁 2 1の切換えによつ て第 2タンク 2 2へと送られる。 第 2タンクへ送られる量は、 第 1および第 3タ ンク 1 2， 6 8の液面レベルに応じた制御装置の演算によって行われ、 戻りライ ン 1 0から第 1タンクへ戻ってくる使用済み現像液と略同一の量が送りライン 2 0を通して第 2タンク 2 2へと供給される。  A part of the used developer in the first tank 12 sent by the pump 16 through the first discharge line 14 is transferred to the second tank by switching the open / close control valve 21 through the feed line 20. Sent to 2 2 The amount sent to the second tank is calculated by the control device according to the liquid level of the first and third tanks 12, 68, and is used to return from the return line 10 to the first tank. Approximately the same amount as the used developer is supplied to the second tank 22 through the feed line 20.
循環ライン 1 8では、 攪拌のために第 1タンク 1 2から第 2タンク 2 2への供 給のない場合に第 1排出ライン 1 4を通してポンプ 1 6により送られた第 1タン ク 1 2内の使用済み現像液を第 1タンク 1 2内へ戻すようになつている。  In the circulation line 18, when there is no supply from the first tank 12 to the second tank 22 for stirring, the first tank 12 sent by the pump 16 through the first discharge line 14 is used. The used developer is returned into the first tank 12.
第 2タンク 2 2には測定ライン 2 3が接続してある。 この測定ライン 2 3には、 電解質イオン濃度測定手段 2 4と、 加工対象物濃度測定手段 2 6と、 パーティク ル測定手段 2 8とが並列に装着してある。 電解質イオン濃度測定手段 2 4では、 第 2タンク 2 2内に貯留してある現像液の電解質イオン濃度値を測定し、 加工対 象物濃度測定手段 2 6では、 加工対象物であるレジスト樹脂の濃度を測定し、 パ 一テイクル測定手段 2 8では、 現像液中に含まれるゴミなどの不純物の割合を測 定可能になっている。 これら測定手段 2 4 , 2 6， 2 8の測定データは、 図示省 略してある制御装置へ出力するようになっている。 制御装置としては、 特定の電 気回路でも、 マイコンゃパーソナルコンピュータを用いた制御装置であっても良 い。 A measurement line 23 is connected to the second tank 22. On the measurement line 23, an electrolyte ion concentration measuring means 24, a workpiece concentration measuring means 26, and a particle measuring means 28 are mounted in parallel. The electrolyte ion concentration measuring means 24 measures the electrolyte ion concentration value of the developer stored in the second tank 22, and The object concentration measuring means 26 measures the concentration of the resist resin, which is the object to be processed, and the particle measuring means 28 allows the proportion of impurities such as dust contained in the developer to be measured. I have. The measurement data of these measurement means 24, 26, and 28 is output to a control device not shown. The control device may be a specific electric circuit or a control device using a microcomputer and a personal computer.
制御装置では、 これらの測定データに基づき、 第 2タンク 2 2に貯留される現 像液の電解質イオン濃度値、 現像液中に含まれる加工対象物としてのレジス卜 Based on these measurement data, the control device controls the electrolyte ion concentration value of the developing solution stored in the second tank 22 and the resist as a processing target contained in the developing solution.
(樹脂） の濃度、 現像液中のパーティクルの割合が、 所定の許容値となるように、 後述する流量制御弁を制御する。 現像液濃度の所定の許容範囲とは、 現像される レジストの種類や現像液の種類によっても相違するが、 たとえば一例として、 現 像液としてテトラメチルアンモニゥムハイ ドロォキサイ ド （T M A H ) を用いた 場合、 T M A H濃度は 2 . 3 8 ± 0 . 0 5 %程度が好ましい。 この許容範囲を超 える品質の現像液が現像室へ供給されると、 現像の際の感度が変動し、 一定線幅 のパターンが得られないおそれがあり好ましくない。 The flow control valve, which will be described later, is controlled so that the concentration of (resin) and the proportion of particles in the developer become a predetermined allowable value. The predetermined allowable range of the developer concentration differs depending on the type of the resist to be developed and the type of the developer, but for example, for example, tetramethylammonium hydroxide (TMAH) was used as the developing solution. In this case, the TMAH concentration is preferably about 2.38 ± 0.05%. If a developer having a quality exceeding the allowable range is supplied to the developing chamber, the sensitivity during development may fluctuate, and a pattern having a constant line width may not be obtained.
現像液中に含まれる樹脂濃度の許容範囲は、 パターン加工されるレジス卜の線 幅などに応じて決定される力^ たとえば一例として、 5〃mパターンで線幅変動 ± 5 %のとき現像液全体を 1 0 0重量部として、 0 . 1重量部以下好ましくは 0 . 0 7 5重量部以下の範囲が好ましい。 この樹脂濃度が許容範囲を超える状態の現 像液を用いてポジ型現像を行った場合には、 溶解してはならない未露光部分の樹 脂を溶解させる傾向にあり、 所望の線幅が得られず好ましくない。  The allowable range of the concentration of resin contained in the developer is a force determined according to the line width of the resist to be patterned. ^ For example, when the line width varies ± 5% in a 5〃m pattern, the developer The total amount is preferably at most 0.1 part by weight, more preferably at most 0.075 parts by weight, based on 100 parts by weight. When a positive type development is performed using a developing solution in which the resin concentration exceeds the allowable range, the resin in the unexposed portion which should not be dissolved tends to be dissolved, and a desired line width is obtained. Not preferred.
本実施形態では、 電解質イオン濃度測定手段 2 4としては、 導電率計が用いら れ、 加工対象物濃度測定手段 2 6としては、 現像液中に含まれる樹脂の濃度を測 定可能な屈折計が用いられ、 パーティクル測定手段 2 8としては、 液中パーティ クルカウンターが用いられる。 屈折率計を用いて実際に現像液中に含まれるレジ スト樹脂の濃度を測定した結果を図 3に示す。 図 3に示す横軸が、 現像液中のレ ジスト樹脂の濃度を示し、 縦軸が、 屈折率計の目盛りを示す。 屈折計としては、 (株） ァタゴ社製の D D— 7デジタル示差濃度計を用いた。 図 3の縦軸における B r i x %とは、 蔗糖液 1 0 () g中に含まれる蔗糖のグラム数を目盛ったもので、 蔗糖を計る場合には実際濃度と全く合致し、 本実施形態では、 図 3に示すように、 レジスト樹脂の濃度と正比例関係で一致する。 すなわち、 屈折率計によれば、 レ ジスト樹脂濃度を正確に測定することができることが確認された。 なお、 図 3中 の横軸における 「D e v」 とは、 現像液の意味である。 In the present embodiment, a conductivity meter is used as the electrolyte ion concentration measuring means 24, and a refractometer capable of measuring the concentration of the resin contained in the developer is used as the processing object concentration measuring means 26. And a particle counter in liquid is used as the particle measuring means 28. Figure 3 shows the results of the actual measurement of the resist resin concentration in the developer using a refractometer. The horizontal axis in FIG. 3 indicates the concentration of the resist resin in the developer, and the vertical axis indicates the scale of the refractometer. As a refractometer, DD-7 digital differential densitometer manufactured by Atago Co., Ltd. was used. The Brix% on the vertical axis in Fig. 3 is a scale of the number of grams of sucrose contained in 10 () g of sucrose solution. In the case of measuring sucrose, the concentration completely matches the actual concentration, and in the present embodiment, as shown in FIG. 3, the concentration is in direct proportion to the concentration of the resist resin. That is, it was confirmed that the refractometer can accurately measure the resist resin concentration. “D ev” on the horizontal axis in FIG. 3 means a developer.
図 1に示すように、 第 2タンク 2 2には、 第 2排出ライン 3 ()が接続してある c 第 2排出ライン 3 0には、 ポンプ 3 2とフィルター 3 4とがこの順で装着してあ る。 第 2排出ライン 3 0は、 フィルター 3 4の後流側で、 循環ライン 3 6と送り ライン 3 8とに分岐してある。 循環ライン 3 6には、 開閉制御弁 4 ()およびライ ンミキサー 4 4が装着してある。 第 2排出ライン 3 ()を通して排出される現像液 の一部を第 2タンク 2 2内部に戻すようになつている。 その際に、 フィルター 3 4を通過することにより現像液中に含まれるパーティクルなどの不純物が除去さ れる。 ラインミキサー 4 4では、 そこを通過する液の混合を促進する。 なお、 開 閉制御弁 4 0及び 4 2は、 第 2タンク 2 2での調整状態に応じて、 制御装置によ り切換えられる。 As shown in Fig. 1, the second tank 22 has a second discharge line 3 () connected to it.c The second discharge line 30 has a pump 32 and a filter 34 installed in this order. Yes. The second discharge line 30 is branched on the downstream side of the filter 34 into a circulation line 36 and a feed line 38. The circulation line 36 is equipped with an on-off control valve 4 () and a line mixer 44. A part of the developer discharged through the second discharge line 3 () is returned to the inside of the second tank 22. At this time, impurities such as particles contained in the developer are removed by passing through the filter 34. The line mixer 4 facilitates mixing of the liquid passing therethrough. The opening and closing control valves 40 and 42 are switched by the control device according to the adjustment state of the second tank 22.
循環ライン 3 6における開閉制御弁 4 0とラインミキサ一 4 4との間には、 現 像原液供給ライン 4 6と純水供給ライン 4 8とが接続される。 これらライン 4 6 , 4 8には、 それぞれ流量制御弁 5 0 , 5 2が接続してある。 これら流量制御弁 5 0， 5 2の開度制御は、 流量計 5 1により行われる。 現像原液供給ライン 4 6お よび純水供給ライン 4 8を通して供給される現像原液 （薬液原液） および純水 (希釈液） は、 ラインミキサー 4 4を通して混合されて第 2タンク 2 2へ供給可 能になっている。  Between the opening / closing control valve 40 and the line mixer 44 in the circulation line 36, an undiluted solution supply line 46 and a pure water supply line 48 are connected. Flow control valves 50 and 52 are connected to these lines 46 and 48, respectively. The opening control of the flow control valves 50 and 52 is performed by a flow meter 51. The stock solution (chemical solution) and pure water (diluent) supplied through the developing solution supply line 46 and the pure water supply line 48 can be mixed through the line mixer 44 and supplied to the second tank 22. It has become.
現像原液としては、 特に限定されないが、 たとえば水酸化カリウム、 水酸化ナ トリウム、 リン酸ナトリウム、 珪酸ナトリゥムなどの無機アル力リを含む無機ァ ルカリ水溶液、 あるいはテトラメチルアンモニゥムハイ ドロォキサイ ド （T M A H ) 、 トリメチルモノエタノ一ルアンモニゥムハイ ドロォキサイ ド （コリン） な どの有機アル力リ水溶液などを例示することができる。  The undiluted developing solution is not particularly limited. For example, an aqueous solution of an inorganic alkali containing an inorganic alkali such as potassium hydroxide, sodium hydroxide, sodium phosphate, sodium silicate, or tetramethylammonium hydroxide (TMAH) ), And organic aqueous solutions such as trimethyl monoethanol ammonium hydroxide (choline).
現像原液および/ または純水の第 2タンク 2 2への供給量の制御は、 電解質ィ オン濃度測定手段 2 4による測定結果に基づき、 第 2タンク 2 2内に貯留される 現像液の電解質イオン濃度値が一定となるように、 流量制御弁 5 0， 5 2の開度 を制御することにより行う。 また、 現像原液および/または純水の第 2タンク 2 2への供給量の制御は、 後述する第 3タンク 6 8に装着してある液面レベル計 6 9の測定結果と、 ドレインライン 5 8を通して廃棄される現像液の量とに基づき、 第 2タンク 2 2から第 3タンクへと送られる必要量を制御装置で算出し、 その算 出量に基づき行われる。 The supply amount of the developing solution and / or pure water to the second tank 22 is controlled based on the measurement result by the electrolyte ion concentration measuring means 24, based on the electrolyte ions of the developer stored in the second tank 22. Opening of flow control valves 50 and 52 so that the concentration value is constant Is controlled by controlling The control of the supply amount of the undiluted developing solution and / or pure water to the second tank 22 is performed according to the measurement result of the liquid level meter 69 attached to the third tank 68 described later and the drain line 58 The required amount to be sent from the second tank 22 to the third tank is calculated by the control device based on the amount of developer that is discarded through the controller, and the calculation is performed based on the calculated amount.
第 2排出ライン 3 0から分岐する送りライン 3 8は、 第 3タンク 6 8に接続し てある。 この送りライン 3 8には開閉制御弁 4 2 (バッチ式薬液供給手段） が装 着してある。 この開閉制御弁 4 2は、 第 2タンク 2 2の測定ライン 2 3に装着し てある電解質ィォン濃度測定手段 2 4により測定した電解質ィォン濃度値と、 加 ェ対象物濃度測定手段 2 6で測定した濃度と、 パーテイクル測定手段で測定した パーティクル量とが全て許容範囲内である場合にのみ開くように制御され、 許容 範囲の品質の現像液のみを第 3タンク 6 8へと供給するようになっている。 現像 液の品質が許容範囲外である場合には、 その現像液は循環ライン 3 6を通して第 2タンクへと戻るように制御される。  A feed line 38 branched from the second discharge line 30 is connected to the third tank 68. The feed line 38 is provided with an open / close control valve 42 (batch type chemical liquid supply means). The opening / closing control valve 42 measures the electrolyte ion concentration measured by the electrolyte ion concentration measuring means 24 attached to the measuring line 23 of the second tank 22 and the concentration measured by the object concentration measuring means 26. Is controlled to open only when the measured concentration and the amount of particles measured by the particle measurement means are all within the allowable range, so that only the developer having an allowable range of quality is supplied to the third tank 68. ing. If the quality of the developer is out of the allowable range, the developer is controlled to return to the second tank through the circulation line 36.
また、 開閉制御弁 4 2は、 第 2タンク 2 2から第 3タンク 6 8へと供給される 現像液の量も制御する。 第 2タンク 2 2から第 3タンク 6 8へ供給される現像液 の量は、 第 3タンク 6 8に装着してある液面レベル計 6 9の測定結果に基づき制 御される。 すなわち、 液面レベル計 6 9の測定結果が低い場合 （液面が低下） に は、 それを補うような現像液の量が供給されるように開閉制御弁 4 2の開閉が制 御される。 ただし、 前述した制御 （許容範囲外の品質の現像液は供給しない） が 優先される。 したがって、 第 3タンク 6 8には、 常に一定の品質の現像液が貯留 されることになる。  The opening / closing control valve 42 also controls the amount of developer supplied from the second tank 22 to the third tank 68. The amount of the developer supplied from the second tank 22 to the third tank 68 is controlled based on the measurement result of the liquid level meter 69 mounted on the third tank 68. In other words, when the measurement result of the liquid level meter 69 is low (the liquid level is low), the opening and closing of the on-off control valve 42 is controlled so that the amount of the developing solution that makes up for it is supplied. . However, the control described above (do not supply a developer with a quality outside the allowable range) has priority. Therefore, the third tank 68 always stores a developer of a constant quality.
第 2タンク 2 2には、 ドレイン用排出ライン 5 4も接続してある。 ドレイン用 排出ライン 5 4にはポンプ 5 6が装着してある。 ドレイン用排出ライン 5 4は、 ポンプ 5 6の後流側でドレインライン 5 8と循環ライン 6 0とに分岐している。 ドレインライン 5 8には開閉制御弁 6 2が装着してある。  The second tank 22 is also connected with a drain discharge line 54. The drain line 54 for drain is equipped with a pump 56. The drain discharge line 54 is branched into a drain line 58 and a circulation line 60 on the downstream side of the pump 56. An open / close control valve 62 is attached to the drain line 58.
この開閉制御弁 6 2は、 たとえば加工対象物濃度測定手段 2 6で測定した濃度 が許容範囲を超えて増大した場合に、 それを制御装置が検出して制御弁 6 2を制 御し、 第 2タンク 2 2内部の現像液をドレインライン 5 8から廃棄する。 その現 像液の廃棄量は、 加工対象物濃度測定手段 2 6での測定結果と、 第 3タンク 6 8 の液面レベル計 6 9の測定結果とに基づき演算される。 For example, when the concentration measured by the workpiece concentration measuring means 26 exceeds an allowable range, the opening / closing control valve 62 controls the control valve 62 by detecting the increase in the concentration, and controls the control valve 62. 2 Discard the developer inside the tank 2 2 from the drain line 58. The present The disposal amount of the image liquid is calculated based on the measurement result of the processing object concentration measuring means 26 and the measurement result of the liquid level meter 69 of the third tank 68.
循環ライン 6 0には、 流量制御弁 6 4とフィルター 6 6とが接続してある。 こ の流量制御弁 6 4も、 図示省略してある制御装置に接続してあり、 その制御装置 により制御される。 この流量制御弁 6 4は、 流量制御弁 6 2が開いた場合に閉じ、 流量制御弁 6 2が閉じた場合に開くように制御される。 すなわち、 流量制御弁 6 2が開かない限りは、 ドレイン用排出ライン 5 4から排出された現像液は、 循環 ライン 6 0を通して第 2タンク 2 2内へ戻るようになつている。 その際には、 フ ィルター 6 6を通過するので、 現像液に含まれるパーティクルなどの不純物濃度 は小さくなる。  A flow control valve 64 and a filter 66 are connected to the circulation line 60. The flow control valve 64 is also connected to a control device (not shown) and is controlled by the control device. The flow control valve 64 is controlled so as to be closed when the flow control valve 62 is opened, and to be opened when the flow control valve 62 is closed. That is, as long as the flow control valve 62 is not opened, the developer discharged from the drain discharge line 54 returns to the second tank 22 through the circulation line 60. In that case, since it passes through the filter 66, the concentration of impurities such as particles contained in the developer becomes low.
第 3タンク 6 8には、 薬液主供給ライン （薬液主供給手段） Ί 0が接続してあ る。 薬液主供給ライン 7 0には、 ポンプ 7 2およびフィルター 7 4力、 この順で 装着してある。 薬液主供給ライン 7 0は、 図 2に示す各現像室 7に接続してあり、 このライン 7 0を通して、 各現像室 7へ一定品質の再利用現像液を供給するよう になっている。 なお、 このライン 7 ()は、 フィルター 7 4の後流側で、 分岐ライ ン 6 9が接続してある。 分岐ライン 6 9は、 第 3タンク 6 8への戻りラインであ り、 このラインには、 圧力計 7 1および流量制御弁 7 3が装着してある。 流量制 御弁 7 3は、 圧力 7 1に基づき制御され、 圧力が高すぎる場合に大きく開き、 液 をタンク 6 8へ戻すようになつている。  The third tank 68 is connected to a main chemical supply line (main chemical supply means) # 0. The main chemical supply line 70 is equipped with a pump 72 and a filter 74 in this order. The chemical solution main supply line 70 is connected to each of the developing chambers 7 shown in FIG. 2, and supplies a reused developer of a constant quality to each of the developing chambers 7 through this line 70. This line 7 () is on the downstream side of the filter 74, and a branch line 69 is connected. The branch line 69 is a return line to the third tank 68, and a pressure gauge 71 and a flow control valve 73 are attached to this line. The flow control valve 73 is controlled based on the pressure 71, and opens greatly when the pressure is too high to return the liquid to the tank 68.
図 1に示すように、 本実施形態に係る装置 2では、 第 1タンク 1 2、 第 2タン ク 2 2および第 3タンク 6 8以外に、 第 4タンク 7 6を有している。 この第 4夕 ンク 7 6は、 新鮮な現像液が貯留されたスタートアップ時用あるいは非常時のバ ックアップ用のタンクである。  As shown in FIG. 1, the device 2 according to the present embodiment has a fourth tank 76 in addition to the first tank 12, the second tank 22, and the third tank 68. The fourth ink tank 76 is a tank for fresh start-up or emergency backup in which fresh developer is stored.
この第 4タンク 7 6には、 電解質イオン濃度測定手段 8 8が装着してある。 電 解質イオン濃度測定手段 8 8で測定した結果は、 図示省略してある制御装置へと 出力される。 この第 4タンク 7 6には、 現像液供給ライン 7 8が接続してある。 供給ライン 7 8には、 ラインミキサー 8 ϋが接続してある。 この供給ライン 7 8 のラインミキサー 8 0には、 純水供給ライン 4 8から分岐した純水供給分岐ライ ン 8 1と現像原液供給ライン 4 6から分岐した現像原液供給分岐ライン 8 2とが 接続される。 The fourth tank 76 is provided with electrolyte ion concentration measuring means 88. The result measured by the electrolyte ion concentration measuring means 88 is output to a control device not shown. A developer supply line 78 is connected to the fourth tank 76. A line mixer 8 ϋ is connected to the supply line 78. The line mixer 80 of the supply line 78 has a pure water supply branch line 81 branched from the pure water supply line 48 and a developing solution supply branch line 82 branched from the developing solution supply line 46. Connected.
これら分岐ライン 8 1 , 8 2には、 流量制御弁 8 4 , 8 6が装着してある。 こ れら流量制御弁 8 4 , 8 6は、 流量計 8 δの測定結果に基づき、 図示省略してあ る制御装置により制御される。 制御装置では、 第 4タンク 7 6内に貯留してある 新鮮な現像液の液面を監視すると共に、 電解質イオン濃度測定手段 8 8で測定し た結果に基づき、 タンク内の現像液の電解質ィォン濃度値が所定範囲となるよう に、 流量制御弁 8 4， 8 6の開度を制御して第 4タンク 7 6内へ純水およびノま たは現像原液を供給する。  Flow control valves 84, 86 are attached to these branch lines 81, 82, respectively. These flow control valves 84 and 86 are controlled by a controller (not shown) based on the measurement result of the flow meter 8δ. The control device monitors the level of the fresh developer stored in the fourth tank 76, and based on the result measured by the electrolyte ion concentration measuring means 88, the electrolyte ion of the developer in the tank is measured. By controlling the openings of the flow control valves 84 and 86 so that the concentration value falls within a predetermined range, pure water and a raw solution or a developing solution are supplied into the fourth tank 76.
この第 4タンク 7 6には、 第 4排出ライン 9 0が接続してある。 第 4排出ライ ン 9 0には、 ポンプ 9 2、 フィルタ一 9 4およびパーティクル測定手段 9 6カ^ この順で装着してある。 パーティクル測定手段 9 6の測定結果は、 図示省略して ある制御装置へ出力される。 パーティクル測定手段 9 6の後流側では、 循環ライ ン 9 8と、 送りライン 1 0 0とに分岐してある。 これらライン 9 8 , 1 0 0には、 それぞれ開閉制御弁 1 0 2， 1 0 4が装着してある。  The fourth discharge line 90 is connected to the fourth tank 76. The fourth discharge line 90 is provided with a pump 92, a filter 94 and particle measuring means 96 in this order. The measurement result of the particle measuring means 96 is output to a control device not shown. On the downstream side of the particle measuring means 96, it is branched into a circulation line 98 and a feed line 100. On / off control valves 102 and 104 are mounted on these lines 98 and 100, respectively.
各開閉制御弁 1 0 2， 1 0 4は、 図示省略してある制御装置により制御される c 通常は、 開閉制御弁 1 0 4が閉であり、 開閉制御弁 1 0 2が開であり、 第 4タン ク内の現像液は、 循環ライン 9 8を通して循環している。 装置 2のスタートアツ プ時や、 非常時の場合には、 第 3タンク 6 8内に現像液がほとんど貯留されてい ないので、 その状態を液面センサ 6 9が検知し、 その検知信号に基づき、 制御装 置が開閉制御弁 1 0 4を開き、 開閉制御弁 1 0 2を閉じる。 その結果、 第 4タン ク 7 6内の新鮮な現像液が第 3タンク 6 8内に送り込まれ、 第 3タンク 6 8から 現像液主供給ライン 7 0を通して、 図 2に示す各現像室 7へと送液される。 Each of the on / off control valves 102 and 104 is controlled by a control device (not shown). C Normally, the on / off control valve 104 is closed, the on / off control valve 102 is open, The developer in the fourth tank circulates through a circulation line 98. At the start-up of the device 2 or in an emergency, since the developer is hardly stored in the third tank 68, the liquid level sensor 69 detects the state, and based on the detection signal, Then, the control device opens the opening / closing control valve 104 and closes the opening / closing control valve 102. As a result, the fresh developer in the fourth tank 76 is fed into the third tank 68, and from the third tank 68 to the developing chamber 7 shown in FIG. Is sent.
本実施形態に係るパターン加工用集中管理装置 2では、 図 2に示す複数の現像 室 7から送られてくる処理済みの現像液は、 まず、 図丄に示す第 1タンク 1 2内 に集中的に一時貯留される。 第 1タンク 1 2内に貯留してある現像液の一部は、 送りライン 2 0を通して第 2タンク 2 2へと送られる。 第 2タンク 2 2への現像 液の送り量は、 たとえば第 1タンク 1 2へ単位時間当たりに流入してくる使用済 み現像液液の量と略同等である。  In the central processing apparatus 2 for pattern processing according to the present embodiment, the processed developing solution sent from the plurality of developing chambers 7 shown in FIG. 2 is first concentrated in the first tank 12 shown in FIG. Is temporarily stored. A part of the developer stored in the first tank 12 is sent to the second tank 22 through the feed line 20. The amount of the developer fed to the second tank 22 is, for example, substantially equal to the amount of the used developer flowing into the first tank 12 per unit time.
第 2タンク 2 2では、 電解質イオン濃度測定手段 2 4によりタンク 2 2内の p Hが測定され、 加工対象物濃度測定手段 2 6により現像液中の樹脂濃度が測定さ れ、 それらの測定値が一定範囲となるように制御される。 より具体的には、 現像 液中の樹脂濃度が許容範囲よりも増大した場合には、 そのままでは再利用できる 現像液とはいえないので、 第 2タンク 2 2内の現像液を、 ドレインライン 5 8を 通して排出し、 同時またはその後に、 現像原液および/ または純水を、 供給ライ ン 4 6， 4 8および循環ライン 3 6を通して第 2タンク 2 2内に供給する。 また、 それと平行して、 第 2タンク 2 2内の現像液の p Hが測定され、 その p Hが所定 の許容範囲となるように、 第 2タンク 2 2への現像原液および/ または純水の供 給量を制御する。 In the second tank 22, p in the tank 22 is measured by the electrolyte ion concentration measuring means 24. H is measured, the concentration of the resin in the developer is measured by the processing object concentration measuring means 26, and the measured values are controlled so as to be within a certain range. More specifically, if the resin concentration in the developing solution exceeds the allowable range, it cannot be said that the developing solution can be reused as it is, so the developing solution in the second tank 22 is drained to the drain line 5. 8 and at the same time or afterwards, the undiluted developing solution and / or pure water are supplied into the second tank 22 through the supply lines 46, 48 and the circulation line 36. At the same time, the pH of the developer in the second tank 22 is measured, and the developing solution and / or pure water into the second tank 22 is adjusted so that the pH falls within a predetermined allowable range. Control the supply of water.
開閉制御弁 4 2では、 第 2タンク 2 2に貯留してある現像液の品質 （電解質ィ オン濃度値、 樹脂濃度およびパーティクル含有割合） が一定の範囲内の場合にの み、 第 2タンク 2 2に貯留してある現像液の一部を第 3タンク 6 8へ送り込む。 第 3タンク 6 8への送り量は、 第 3タンク 6 8に装着してある液面レベル計 6 9 の測定結果などに基づき決定される。 たとえば第 3タンク 6 8内に貯留してある 現像液の液面レベルが低い場合には、 送りライン 3 8の開閉制御弁 4 2を開き、 第 2タンク 2 2から第 3タンク 6 8への送り量を増大させる。  The opening / closing control valve 42 uses the second tank 2 only when the quality of the developer stored in the second tank 22 (electrolyte ion concentration value, resin concentration and particle content ratio) is within a certain range. A part of the developer stored in 2 is sent to the third tank 68. The feed amount to the third tank 68 is determined based on the measurement result of the liquid level meter 69 attached to the third tank 68, and the like. For example, when the liquid level of the developer stored in the third tank 68 is low, the opening / closing control valve 42 of the feed line 38 is opened, and the second tank 22 to the third tank 68 is opened. Increase the feed amount.
もし仮に、 スタートアップ時や非常時の場合などのように、 第 3タンク 6 8に 貯留してある現像液の量がかなり少な 、場合には、 バックアップ用の第 4タンク 7 6から、 送りライン 1 ϋ 0を通して、 電解質イオン濃度値が調整された新鮮な 薬液を第 3タンク 6 8へ供給する。  If the amount of developer stored in the third tank 68 is very small, such as at startup or in an emergency, if the amount of developer stored in the third tank 68 is very small, the feed line 1 can be transferred from the fourth tank 76 for backup. Through を 通 し て 0, a fresh chemical solution with the adjusted electrolyte ion concentration value is supplied to the third tank 68.
第 3タンク 6 8からは、 現像液主供給ライン 7 0を通して、 図 2に示す各現像 室 7に現像液が供給される。  The developer is supplied from the third tank 68 to each of the developing chambers 7 shown in FIG. 2 through a developer main supply line 70.
本実施形態に係るパターン加工用薬液集中管理装置 2では、 処理済みの現像液 は、 第 1タンク 1 2および第 2タンク 2 2を通して、 第 3タンク 6 8へ送られ、 ここから各現像室 7へと送られる。 したがって、 使用済み現像液の再利用が可能 になる。 しかも、 第 3タンク 6 8に貯留される薬液は、 常に一定の品質の現像液 のみが貯留されるように工夫してあるため、 各現像室 7へ供給される現像液の品 質が安定する。 また、 各現像室 7へ供給される現像液を貯留する第 3タンク 6 8 と、 濃度調節が行われる第 2タンク 2 2とが別々であるため、 濃度制御される前 の薬液が現像室に供給されるおそれが少なくなり、 しかもドレイ ンライ ン 5 8を 通して廃棄する現像液の量も少なくすることができる。 In the pattern processing chemical liquid central control device 2 according to the present embodiment, the processed developer is sent to the third tank 68 through the first tank 12 and the second tank 22, and from there, each developing chamber 7 Sent to. Therefore, the used developer can be reused. In addition, since the chemical stored in the third tank 68 is designed so that only a developer of a constant quality is always stored, the quality of the developer supplied to each developing chamber 7 is stabilized. . In addition, since the third tank 68 for storing the developer supplied to each developing chamber 7 and the second tank 22 for performing the concentration adjustment are separate, the concentration before the concentration control is performed. The possibility that the chemical solution is supplied to the developing chamber is reduced, and the amount of the developer solution to be discarded through the drain line 58 can be reduced.
なお、 本発明は、 上述した実施形態に限定されるものではなく、 本発明の範囲 内で種々に改変することができる。  Note that the present invention is not limited to the above-described embodiment, and can be variously modified within the scope of the present invention.
たとえば、 上述した実施形態では、 薬液として現像液を用いたが、 本発明に係 るパターン加工用薬液供給装置に用いられる薬液としては、 現像液に限らず、 剥 離液、 洗浄液 （イソプロパノールなど） 、 ウェハ表面処理液、 密着剤溶液などで あつ 、ο  For example, in the above-described embodiment, a developing solution is used as the chemical solution. However, the chemical solution used in the pattern processing chemical solution supply device according to the present invention is not limited to the developing solution, but may be a stripping solution, a cleaning solution (such as isopropanol). , Wafer surface treatment solution, adhesive solution, etc.
以上説明してきたように、 本発明によれば、 処理済みの薬液は、 第 1タンクお よび第 2タンクを通して、 第 3タンクへ送られ、 ここから各処理室へと送られる c したがって、 使用済み薬液の再利用が可能になる。 しかも、 第 3タンクに貯留さ れる薬液は、 常に一定の品質の薬液のみが貯留されるように工夫してあるため、 各処理室へ供給される薬液の品質が安定する。 また、 各処理室へ供給される薬液 を貯留するタンクと、 濃度調節が行われるタンクとが別々であるため、 濃度制御 される前の薬液が処理室に供給されるおそれが少なくなり、 しかも廃棄する薬液 の量も少なくすることができる。 As described above, according to the present invention, the processed chemical liquid through the first tank Contact and second tank is sent to the third tank, c thus sent from here to the respective processing chambers, spent The chemical solution can be reused. In addition, since the chemical stored in the third tank is designed so that only a chemical of constant quality is stored, the quality of the chemical supplied to each processing chamber is stabilized. In addition, since the tank for storing the chemical solution to be supplied to each processing chamber and the tank for adjusting the concentration are separate, the risk that the chemical solution before concentration control is supplied to the processing chamber is reduced, and furthermore, disposal The amount of chemical solution used can be reduced.

Claims

請 求 の 範 囲 The scope of the claims
1 . 複数の処理室から送られてくる処理済みの薬液を集中的に集めて一 時貯留する第 1タンクと、 1. A first tank that collects and temporarily stores processed chemicals sent from multiple processing chambers,
前記第 1タンクに貯留されている薬液の一部が送り込まれる第 2タンクと、 前記第 2タンクに貯留されている薬液の一部が送り込まれる第 3タンクと、 前記第 2タンクに貯留してある薬液の電解質イオン濃度値を測定する電解質ィ オン濃度測定手段と、  A second tank to which a part of the medicinal solution stored in the first tank is sent; a third tank to which a part of the medicinal solution stored in the second tank is sent; Electrolyte ion concentration measuring means for measuring an electrolyte ion concentration value of a certain chemical solution;
前記第 2タンクに貯留してある薬液に含まれるパターン加工対象物の濃度を測 定する加工対象物濃度測定手段と、  Processing object concentration measuring means for measuring the concentration of the pattern processing object contained in the chemical solution stored in the second tank;
前記電解質ィォン濃度測定手段および/または加工対象物濃度測定手段での測 定結果が一定範囲となるように、 第 2タンクへ供給される薬液原液および/ また は希釈液の量を制御する制御手段と、  Control means for controlling the amount of the undiluted chemical solution and / or diluent supplied to the second tank so that the measurement results obtained by the electrolyte ion concentration measuring means and / or the workpiece concentration measuring means fall within a certain range. When,
前記第 2タンクに貯留してある薬液の品質が一定の範囲内の場合にのみ、 第 2 タンクに貯留してある薬液の一部を前記第 3タンクへ送り込むバッチ式薬液供給 手段と、  Batch-type chemical liquid supply means for feeding a part of the chemical liquid stored in the second tank to the third tank only when the quality of the chemical liquid stored in the second tank is within a certain range,
前記第 3タンクに貯留してある薬液を複数の処理室へ供給する薬液主供給手段 とを有するパターン加工用薬液集中管理装置。  A chemical solution central supply device for pattern processing, comprising: a chemical solution main supply unit configured to supply a chemical solution stored in the third tank to a plurality of processing chambers.
2 . 前記第 3タンク内に貯留してある薬液が所定以下の場合に、 前記第 3タンク内へ、 電解質ィォン濃度値が調整された新鮮な薬液を供給する第 4夕ン クをさらに有する請求項 1に記載のパターン加工用薬液集中管理装置。  2. A fourth tank for supplying a fresh chemical solution having an adjusted electrolyte ion concentration value into the third tank when the chemical solution stored in the third tank is equal to or less than a predetermined value. Item 1. A chemical liquid central control device for pattern processing according to item 1.
3 . 前記薬液が、 露光後のレジスト膜を所定パターンにパターン加工す るための現像液であり、 前記処理室が現像室である請求項 1または 2に記載のパ 夕一ン加工用薬液集中管理装置。  3. The chemical processing agent according to claim 1, wherein the chemical is a developer for patterning the exposed resist film into a predetermined pattern, and the processing chamber is a developing chamber. Management device.
4 . 前記第 2タンクには、 当該第 2タンクに貯留してある薬液の一部を 排出する排出手段が装着してある請求項 1〜 3のいずれかに記載のパタ一ン加工 用薬液集中管理装置。  4. The chemical solution concentration for pattern processing according to any one of claims 1 to 3, wherein the second tank is provided with a discharge means for discharging a part of the chemical solution stored in the second tank. Management device.
5 . 前記加工対象物濃度測定手段が、 屈折率計である請求項 1〜 4のい ずれかに記載のパターン加工用薬液集中管理装置。 5. The chemical processing central control device for pattern processing according to any one of claims 1 to 4, wherein the object concentration measuring means is a refractometer.
6 . 電解質ィォン濃度測定手段が、 導電率計である請求項 1〜 5のいず れかに記載のパタ一ン加工用薬液集中管理装置。 6. The centralized chemical liquid management device for pattern processing according to any one of claims 1 to 5, wherein the electrolyte ion concentration measuring means is a conductivity meter.
7 . 前記第 2タンクに貯留してある薬液中に含まれる不純物の割合を測 定するパーティクル測定手段をさらに有する請求項 1〜 6のいずれかに記載のパ 夕一ン加工用薬液集中管理装置。  7. The chemical centralized control device for pattern processing according to any one of claims 1 to 6, further comprising a particle measuring means for measuring a ratio of an impurity contained in the chemical solution stored in the second tank. .
PCT/JP1997/004718 1996-12-25 1997-12-19 Patterning chemical liquid centralized controller WO1998029900A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP35610396 1996-12-25
JP8/356103 1996-12-25

Publications (1)

Publication Number Publication Date
WO1998029900A1 true WO1998029900A1 (en) 1998-07-09

Family

ID=18447350

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1997/004718 WO1998029900A1 (en) 1996-12-25 1997-12-19 Patterning chemical liquid centralized controller

Country Status (3)

Country Link
KR (1) KR20000062334A (en)
TW (1) TW386900B (en)
WO (1) WO1998029900A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000081700A (en) * 1998-07-02 2000-03-21 Nippon Zeon Co Ltd Formation of pattern
JP2004170451A (en) * 2002-11-15 2004-06-17 Tokyo Electron Ltd Developing method and developing apparatus
KR100441249B1 (en) * 2001-07-27 2004-07-21 삼성전자주식회사 Toc measure apparatus for a semiconductor device fabrication installation and toc measure method for using the apparatus
JP2007171232A (en) * 2005-12-19 2007-07-05 Mitsubishi Chemical Engineering Corp Developer supply system
JP2014077937A (en) * 2012-10-11 2014-05-01 Panasonic Corp Preparation method and preparation apparatus for resist stripping solution
CN108255024A (en) * 2018-01-31 2018-07-06 京东方科技集团股份有限公司 A kind of developing apparatus and its developing method, lithographic equipment

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI298423B (en) * 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
KR100734659B1 (en) * 2005-12-28 2007-07-02 동부일렉트로닉스 주식회사 Apparatus and method for controlling a develop process
CN107479342B (en) * 2017-09-23 2020-11-06 武汉华星光电技术有限公司 Developing device and developing method
CN112414906B (en) * 2020-10-22 2023-02-14 北京北方华创微电子装备有限公司 Detection device for concentration of particulate matter in liquid medicine and liquid change control method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0540345A (en) * 1991-08-07 1993-02-19 Hirama Rika Kenkyusho:Kk Developer managing device
JPH0629207A (en) * 1992-07-10 1994-02-04 Tokyo Ohka Kogyo Co Ltd Preparation method of developing solution
JPH08108054A (en) * 1994-10-13 1996-04-30 Mitsubishi Gas Chem Co Inc Liquid medicine preparing apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0540345A (en) * 1991-08-07 1993-02-19 Hirama Rika Kenkyusho:Kk Developer managing device
JPH0629207A (en) * 1992-07-10 1994-02-04 Tokyo Ohka Kogyo Co Ltd Preparation method of developing solution
JPH08108054A (en) * 1994-10-13 1996-04-30 Mitsubishi Gas Chem Co Inc Liquid medicine preparing apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000081700A (en) * 1998-07-02 2000-03-21 Nippon Zeon Co Ltd Formation of pattern
KR100441249B1 (en) * 2001-07-27 2004-07-21 삼성전자주식회사 Toc measure apparatus for a semiconductor device fabrication installation and toc measure method for using the apparatus
JP2004170451A (en) * 2002-11-15 2004-06-17 Tokyo Electron Ltd Developing method and developing apparatus
JP2007171232A (en) * 2005-12-19 2007-07-05 Mitsubishi Chemical Engineering Corp Developer supply system
JP2014077937A (en) * 2012-10-11 2014-05-01 Panasonic Corp Preparation method and preparation apparatus for resist stripping solution
TWI585043B (en) * 2012-10-11 2017-06-01 松下知識產權經營股份有限公司 The blending method and blending device of photoresist stripping liquid
CN108255024A (en) * 2018-01-31 2018-07-06 京东方科技集团股份有限公司 A kind of developing apparatus and its developing method, lithographic equipment

Also Published As

Publication number Publication date
TW386900B (en) 2000-04-11
KR20000062334A (en) 2000-10-25

Similar Documents

Publication Publication Date Title
JP2561578B2 (en) Developer management device
WO1998029900A1 (en) Patterning chemical liquid centralized controller
WO2008065755A1 (en) Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
JPH1022261A (en) Device for controlling resist peeling liquid
JP4366490B2 (en) Developer supply method and apparatus
US4857750A (en) Sensor for determining photoresist developer strength
TWI312105B (en)
JP2866749B2 (en) Photosensitive material processing equipment
TWI264618B (en) Developer regeneration unit
JPH041756A (en) Method for adding water to photosensitive material processing device
JP2602179B2 (en) Resist stripper management system
TW201827947A (en) Developing solution management apparatus comprising a control means and a display means
JP2000147785A (en) Developing device
JPH05197114A (en) Apparatus for monitoring and automatically correc- ting evaporation of various kinds of chemical treating in automatic device for developing negative film and printedpaper
JP2003197508A (en) Developing device and developing method
JPH0641664B2 (en) Chemical processing equipment
JPH0428296B2 (en)
JPS62118346A (en) Method and device for treating photographic processing wastes
TWI707383B (en) Concentration monitoring apparatus for developing solution and developing solution management apparatus
TW201827950A (en) Developing apparatus capable of maintaining desired developing performance and maintaining a desired line width and residual film thickness of a wiring pattern on a substrate
JPH07110580A (en) Substrate developing device
TW201827808A (en) Device for displaying carbon dioxide concentration in developing solution and developing solution management device which are equipped with a densitometer for measuring the density of a developing solution
JP3238834B2 (en) Method for forming thin film pattern and chemical reaction apparatus
JPS61175641A (en) Treatment of photosensitive printing plate and its device
JPH0741001Y2 (en) Fixer replenisher for automatic processor

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): JP KR US

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 1019997005791

Country of ref document: KR

122 Ep: pct application non-entry in european phase
WWP Wipo information: published in national office

Ref document number: 1019997005791

Country of ref document: KR

WWR Wipo information: refused in national office

Ref document number: 1019997005791

Country of ref document: KR