TW386900B - Developer solution centrally managing device for processing patterns - Google Patents

Developer solution centrally managing device for processing patterns Download PDF

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Publication number
TW386900B
TW386900B TW086119549A TW86119549A TW386900B TW 386900 B TW386900 B TW 386900B TW 086119549 A TW086119549 A TW 086119549A TW 86119549 A TW86119549 A TW 86119549A TW 386900 B TW386900 B TW 386900B
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TW
Taiwan
Prior art keywords
tank
solution
processing
stored
concentration
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TW086119549A
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Chinese (zh)
Inventor
Masanobu Kanauchi
Yoshio Ishiura
Kimiaki Tanaka
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Nippon Zeon Co
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Publication of TW386900B publication Critical patent/TW386900B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3092Recovery of material; Waste processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Abstract

A developer solution centrally managing device for processing patterns includes a first tank (12) for centrally gathering and temporarily storing developer solutions transferred from a plurality of development room (7), a second tank (22) for receiving a portion of developer solutions stored in the first tank (12), a third tank (68) for receiving portion of developer solutions stored in the second tank (22), a pH value gauging device (24) to measure the pH value of the developer solutions stored in said second tank (22), a concentration gauging device (26) to measure the concentration of resin contained in the developer solutions of said second tank (22), controlling valves (50, 52) to control the quantities of original developer and/or pure water to keep the gauging value measured by said gauging devices (24, 26) within a specific range, and a controlling valve (42) through which portion of developer solutions stored in the second tank (22) is transferred to the third tank (68) only when the quality of the developer solutions in the second tank (22) is within a certain range. Accordingly, the developer solutions for processing patterns can be managed centrally and make reusable developer solutions be used again as much as possible, and qualified developer solutions can be automatically provided to a plurality of treatment rooms.

Description

經濟部中央標準局貝工消費合作社印製 A7 B7 五、發明説明(1 ) 本發明係有關於一種圖案加工用藥液集中管理裝置, 詳而言之,係可將例如液晶基板或半導體晶圓的圖案加工 用的顯像液等集中地管理,以謀求藥液的再利用,並可將 既定品質的藥液自動地供給至複數個處理室之圖案加工用 藥液集中管理裝置。 用以將液晶基板等的微細加工用之顯像液管理之裝 置,已知有例如特開平5-40345號公報所示之管理裝置。 該管理裝置中,各顯像室中分別裝設顯像液管理裝 置,以對各顯像室分別管理顯像液的品質,並將顯像液再 利用。該管理裝置之構造,係將用以貯留使用完的顯像液 之槽内的顯像液之溶解樹脂濃度和鹼濃度控制在既定的範 圍内,並將該槽内的顯像液直接供給出。詳而言之,該管 理裝置中,在將用以貯留使用完的顯像液之槽内的顯像液 之溶解樹脂濃度和鹼濃度控制在既定的範圍時,係藉由感 應器進行濃度測定後,藉由將水從槽中排出、或追加顯像 純液及/或純水,以使得該濃度形成既定的範圍内。 然而,該管理裝置中,由於係形成可將貯留有使用完 的顯像液之槽内的顯像液直接供給至加工對象的基板之構 造,而產生被供給至圖案加工對象的基板之顯像液的品質 不穩定的問題。詳而言之,在將槽内使用完顯像液的濃度 鄉定後,在直到將其濃度控制在既定範圍為止的期間,由 於顯像液將持續地被供給,故將有品質在容許範圍外的顯 像液被使用之虞。 為了避免上述情形的產生,係將濃度控制用參數之濃 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ297公釐) (請先閱讀背面之注意事項再填寫本頁) 一裝- 訂 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(2 ) 度容許範圍設定成比實際所需狹小,如此在溶解樹脂濃度 稍增大的場合,就必須進行將顯像液從槽内排出、追加顯 像液原液和純水的控制。然而,依如此般之控制,可再利 用之使用完的顯像液將白白地被丟棄,而使得將顯像液再 利用的意義變低。 本發明係有鑑於如此般的現狀,目的係提供一種圖案 加工用藥液集中管理裝置,可將例如液晶基板或半導體晶 圓的圖案加工用的顯像液等藥液集中地管理,並將可再使 用的藥液儘可能地再利用,且可將既定品質的藥液自動地 供給至複數個處理室。 為了達成上述目的,依本發明之圖案加工用藥液集中 管理裝置,係具有: 第1槽,用以將複數個處理室所送出之處理完的藥液 集中地收集並暫時貯留; 第2槽,前述第1槽所貯留的藥液的一部分係被送到 此處; 第3槽,前述第2槽所貯留的藥液的一部^係被送到 此處, 電解質離子濃度測定裝置,用以將前述第2槽所貯留 的藥液之電解質離子濃度值測定之; 加工對象物濃度測定裝置,用以將前述第2槽所貯留 的藥液中所含之圖案加工對象物的濃度測定之; 控制裝置,用以將朝第2槽供給之藥液原液及/或稀釋 液的量控制成,可使得前述電解質離子濃度測定裝置及/ 本紙張尺度適用中國國家標率(CNS ) A4規格(210X297公釐) ------^---裝— -' (讀先閱讀背面之注意事項再填寫本頁) 訂- A7 B7 五、發明説明(ττ~ ——一^— 或加工對象物測定裝置之測定結果形成既定範圍内; 批式藥液供給裝置,僅在前述第2槽所貯留的藥液品 ----;----Θ裝—— ·*t (請先閱讀背面之注意事項再填寫本頁) 質在既定範圍内之場合,將第2槽所貯留的藥液之一部分 朝别述第3槽送出;以及 、藥液主供給裝置,用以將前述第3槽所貯留的藥液朝 複數個處理室供給。 又’且另具有第4槽’在前述第3槽内所貯留的藥液 量在既定以下之場合,用以將電解質離子濃度值經調整後 之新鮮的藥液供給至前述第3槽内。 -訂 前述藥液,係例如用以將曝光後的光阻膜加工成既定 圖案之顯像液;前述處理室,係例如顯像室。依本發明之 藥液’亦可為用以將圖案加工後的光阻膜等剝離之剝離 液。藉由採用依本發明的裝置,亦可進行剝離液的再利用。 本發明中,作為電解質離子濃度測定裝置,只要是可 測定藥液的pH值者即可而沒有特別的限定,可使用例如 利用電位差滴定法、分極滴定法、電流滴定法等電性滴定 法之測定器、pH計、導電率計。 經濟部中央標準局CW:工消費合作;^印^ 、—又,作為加工對象物濃度測定裝置,只要是可測定應 被藥液施加圖案加工之圖案加工對象物的藥液中濃度之裝 蕈p 了而沒有特別的限定,例如可使用折射計、T〇c(全有 機碳)分析計、C〇D計、吸絲度計、魏分析計、碟光 分析計等發光分析計等。其中,可藉由測'定藥液和棱鏡的 界面所產生之光的折射率以求出濃度之折射率計,由於可 將應被藥液施加圖案加工之圖案加工對象物的藥液中濃度 6Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, A7 B7 V. Description of the invention (1) The present invention relates to a centralized management device for pattern processing chemicals. In particular, it can be used to transfer liquid crystal substrates or semiconductor wafers, for example. The developing solution for pattern processing is centrally managed to reuse the chemical solution, and the chemical solution for pattern processing can be automatically supplied to a plurality of processing chambers. As a device for managing a developing solution for microfabrication of a liquid crystal substrate or the like, a management device such as that disclosed in Japanese Patent Application Laid-Open No. 5-40345 is known. In this management device, a developing solution management device is installed in each developing room to manage the quality of the developing solution for each developing room and reuse the developing solution. The structure of the management device is to control the dissolved resin concentration and alkali concentration of the developing solution in the tank for storing the used developing solution within a predetermined range, and directly supply the developing solution in the tank. . Specifically, in the management device, when the dissolved resin concentration and alkali concentration of the developing solution in the tank for storing the used developing solution are controlled within a predetermined range, the concentration measurement is performed by a sensor. After that, the water is discharged from the tank, or the pure developing solution and / or pure water is added so that the concentration is within a predetermined range. However, this management device has a structure in which the developing solution in the tank containing the used developing solution is directly supplied to the substrate to be processed, so that a developing image is supplied to the substrate to be patterned. The problem of unstable liquid quality. Specifically, after the concentration of the developing solution in the tank is stabilized, the developing solution is continuously supplied until the concentration is controlled to a predetermined range, so the quality is within the allowable range. The external developing solution may be used. In order to avoid the above situation, the paper size of the density control parameters is applied to the Chinese National Standard (CNS) Α4 specification (210 × 297 mm) (please read the precautions on the back before filling this page). Printed by the Consumer Standards Cooperative of the Ministry of Standards, A7 and B7. 5. The description of the invention (2) The tolerance range is set to be narrower than the actual requirement. In this case, if the concentration of the dissolved resin is slightly increased, the developer must be removed from the tank. Control of discharging and adding developer liquid and pure water. However, with such control, the developer solution that can be reused and used up is discarded in vain, so that the significance of reusing the developer solution becomes low. The present invention has been made in view of such a situation, and an object thereof is to provide a centralized processing chemical solution for pattern processing, which can centrally manage a chemical solution such as a developing solution for pattern processing of a liquid crystal substrate or a semiconductor wafer, and can further The used chemical liquid is reused as much as possible, and a predetermined quality chemical liquid can be automatically supplied to a plurality of processing chambers. In order to achieve the above-mentioned object, according to the present invention, the centralized processing chemical solution for pattern processing comprises: a first tank for collecting and temporarily storing the processed chemical liquids sent out from the plurality of processing chambers; and the second tank, A part of the medicinal solution stored in the first tank is sent here; in the third tank, a part of the medical solution stored in the second tank is sent here, and the electrolyte ion concentration measuring device is used for Measuring the electrolyte ion concentration value of the chemical solution stored in the second tank; the processing object concentration measuring device is used to measure the concentration of the pattern processing object contained in the medical solution stored in the second tank; A control device for controlling the amount of the medicinal solution stock solution and / or diluent supplied to the second tank so that the aforementioned electrolyte ion concentration measuring device and / or the paper size are applicable to the Chinese National Standard (CNS) A4 specification (210X297 Mm) ------ ^ --- packing--'(read the precautions on the back before filling this page) Order-A7 B7 V. Description of the invention (ττ ~ —— 一 ^ — or processing object The measurement result of the measurement device is established Within; batch type medicinal liquid supply device, only medicinal liquid products stored in the aforementioned second tank ----; ΘΘ-· * t (Please read the precautions on the back before filling this page ) When the quality is within a predetermined range, a part of the medicinal solution stored in the second tank is sent to the other third tank; and, the main medicinal liquid supply device is used to direct the medicinal solution stored in the third tank to a plurality. It is supplied by a processing chamber. When the amount of the medicinal solution stored in the third tank is less than a predetermined value, and also has a fourth tank, it is used to supply a fresh chemical solution with an adjusted electrolyte ion concentration value to the foregoing. In the third tank.-Order the aforementioned chemical solution, for example, a developing solution for processing the exposed photoresist film into a predetermined pattern; the aforementioned processing chamber, such as a developing room. The chemical solution according to the present invention may also be used. It is a peeling liquid for peeling off a photoresist film and the like after pattern processing. By using the device according to the present invention, the peeling liquid can be reused. In the present invention, the electrolyte ion concentration measuring device can be measured as long as it can measure The pH of the medicinal solution is not particularly limited, and for example, it can be used Detectors, pH meters, and conductivity meters using electrical titration methods such as potentiometric titration, polarimetric titration, and current titration. Central Standards Bureau of the Ministry of Economics CW: Industrial and consumer cooperation; ^ 印 ^,-Also, as processing objects The concentration measuring device is not particularly limited as long as it is capable of measuring the concentration in the chemical solution of the pattern processing object to be patterned by the chemical solution, and for example, a refractometer, Toc (total organic carbon) can be used. Luminescence analyzers such as analyzers, COD meters, absorber meters, Wei analyzers, dish-light analyzers, etc. Among them, the refractive index of light generated at the interface between a fixed solution and a prism can be measured to determine Refractive index meter for concentration, because the concentration in the chemical solution of the pattern processing object to be pattern-processed by the chemical solution can be 6

經濟部中央標準局負工消費合作社印製Printed by the Consumer Standards Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs

五、發明説明(4 正確地測定出,故較佳 個處發r之圖案加工用集中管理裝置,係將來自複數 留之。第至二:完的藥液―,首先在第1槽内集中並暫時貯 送往第2/所貯留之藥液的一部分,係被送往第2槽。 槽之量,例如和單位時間流入第1槽之藥液量大 抻二第槽中’係藉由電解質離子濃度測定裝置以測定 :、P ’並藉由加工對象物濃度測定裝置以測定藥 2圖:加工對象物濃度,並將這些測定值控制在既定範 超出容許ΐ:而言’藥液中之圖案加工對象物濃度增大至 °範圍之場合’由於無法直接作為可再利用之藥 故將第2槽内之藥液排出,在此同時或 原液及/或稀釋液供給至第 槽内的藥液之電解質離子濃度,並控制朝第2槽之藥液原 稀釋㈣供給量,錢得該電解質料濃度形成既 疋的谷許範圍内。 批式藥液供給裝置,係僅在第2槽所貯以藥液之品 =(電解質離子濃度值和藥液中加讀象物濃度)為既定範 内之場合,將第2槽所貯留的藥液之-部分送往前述第 槽朝第3槽之送出量,係基於第3槽内所貯留的藥液 之,面位準等以決定出。例如第3槽的藥液之液面位準低 之場合’係將由第2槽送往第3槽之送出量增大。然而, 品質超出容許範圍之藥液,將不送往第3槽而回到第2槽。 假定,在剛開始作業或緊急時的場合等般之第3槽所V. Description of the invention (4) It was measured correctly, so the central processing device for pattern processing for sending r is better. It will be kept from the plural. The second to the second: finished chemical solution-first concentrated in the first tank And temporarily stored part of the medicinal solution stored in the second / second, is sent to the second tank. The amount of the tank, for example, the amount of medicinal solution flowing into the first tank and the second tank per unit time The electrolyte ion concentration measuring device measures P, P 'and the processed object concentration measuring device to measure the medicine. 2 Figure: The processed object concentration, and controls these measured values to exceed a predetermined range. When the concentration of the object to be pattern-processed increases to the range of °, 'The chemical solution in the second tank is discharged because it cannot be directly used as a reusable medicine, and at the same time, the original solution and / or the diluted solution are supplied to the second tank. The concentration of the electrolyte ions in the chemical solution, and the supply of the original diluted solution of the chemical solution to the second tank is controlled, so that the concentration of the electrolyte material forms the range of the existing range. The batch-type chemical solution supply device is only in the second tank. Stored product of medicinal solution = (electrolyte ion concentration When the concentration of the reading substance in the chemical solution is within the predetermined range, the-part of the chemical solution stored in the second tank is sent to the aforementioned third tank toward the third tank, based on the amount stored in the third tank The level of the medicinal solution and the level of the medicinal solution are determined. For example, when the level of the medicinal solution of the third tank is low, the amount of the liquid sent from the second tank to the third tank is increased. However, the quality exceeds the allowable The medicinal solution in the range will not be sent to the third tank and will return to the second tank. It is assumed that the third tank will be used in the beginning of work or in an emergency.

本紙張峨用开(2丨 A7 B7 五、發明説明(5 ) 槽留的藥液量相當少的煬合,係從備用之第4槽,以將電 解質離子濃度經調整後之新鮮的藥液朝第3槽供^。 從第3槽起,係藉由藥液主供給裝置以將藥^供給至 各處理室。 依‘發明之圖案加工用藥液集中管理裴置,處理完之 藥液係通過第1槽和第2槽而被送到第3槽,再從第7槽 送至各處理室。因此,巧將使用完的藥液再利用之。且 第3槽所貯留的藥液,由於被控制成僅既定品質的藥液方 可貯留,故可使得朝各處理室供給的藥液之品質保持安 定。又’由於用以貯留朝各處理室供給的藥液之槽 '和濃 度調節用槽係獨立地設置著’故完成濃度控制前的藥液被 供給至處理室的疑慮將滅少,且可將廢棄的藥液減少。 【圖式之簡單說明】 圖1係顯示依本發明的1實施.形態之圖案加工用藥取 集中管理裝置的概略構造圖。 圖2係顯示複數個處理室之概念圖。 圖3係顯示折射率計和光阻濃度的相關關係之圖形 【用以實施發明的最佳形態】 以下,辞基於圖示之實施形態以詳細地說明本發明。 圖1所示之本實施形態的管理裝置2,係例如將來自 圖2所示的複數個塗布器4,4,4···之各顯像室7,7,7…之使 用完的顯像液收集,以集中地進行濃度管理控制,並將控 制後的顯像液供給至各顯像室7,7,7…。如圖2所示般,各 塗布器4,係例如具有光阻塗布室5、曝光室6及顯像室7。 本紙張尺度適用中國國家標準(CNS > A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)This paper is open for use (2 丨 A7 B7 V. Description of the invention (5) The amount of chemical solution left in the tank is relatively small. The fourth tank is used to adjust the electrolyte ion concentration of the fresh chemical solution. Supply ^ to the third tank. Starting from the third tank, the main medicament liquid supply device is used to supply the medicament to each processing chamber. According to the invention's pattern processing chemical liquid, Pei Zhi is centrally managed, and the processed chemical liquid is It is sent to the third tank through the first tank and the second tank, and then sent to each processing chamber from the seventh tank. Therefore, the used chemical solution is reused. The chemical solution stored in the third tank, Since it is controlled to store only the chemical solution of a predetermined quality, the quality of the chemical solution supplied to each processing chamber can be kept stable. It is also 'because of the tank for storing the chemical solution supplied to each processing chamber' and the concentration adjustment The tank system is provided independently, so there is less doubt that the chemical solution is supplied to the processing chamber before the concentration control is completed, and the discarded chemical solution can be reduced. [Simplified description of the drawing] FIG. 1 shows the present invention. 1. The schematic diagram of the centralized processing device for pattern processing medicine collection and implementation in the first embodiment. Figure 2 A conceptual diagram showing a plurality of processing chambers is shown. Fig. 3 is a graph showing a correlation between a refractive index and a photoresist concentration [best form for implementing the invention] Hereinafter, the present invention will be described in detail based on the illustrated embodiment. The management device 2 of the present embodiment shown in FIG. 1 is, for example, a used display unit 7, 7, 7,... Of each of the plurality of applicators 4, 4, 4, ... shown in FIG. The image liquid is collected to perform concentration management control in a centralized manner, and the controlled development liquid is supplied to each development chamber 7, 7, 7, ... As shown in FIG. 2, each applicator 4, for example, has a photoresist Coating room 5, exposure room 6, and development room 7. This paper size applies to Chinese national standards (CNS > A4 size (210X297 mm) (Please read the precautions on the back before filling this page)

經濟部中央標準局員工消費合作社印褽 、發明説明(6) — 通過回流管10而 如圖1所示般,第 下 光阻塗布室5中’例如係在液晶顯示裝置的玻璃基板 8表面將光阻藉由旋轉塗布法等塗布之。曝光室6中係 在塗布光阻後之基板8的表面將既定的圖案曝光。顯像室 7中,係在既定的圖案曝光後之光阻表面將顯像液喷塗或 浸塗以進行顯像。藉由顯像以將光阻加工成既定的圖形, t工後的光阻之構成Γ旨係在含有❹完_像液之狀態 ,被送往圖1所示之第丨槽12。 1槽12上係接續有第1排出管14。 第1排出管14上裝^有泵16。排出管14,在泵16之吐 出侧,係分枝成循環泵18和送出管20。管18、20上分 別裝設有開閉控制閥19、21。開閉控制閥19、21,將 配合第1槽的液面位準、第2、f 3槽的狀態,而藉由控 制裝置以將開閉狀態切換之。 通過第1排出管14而被$16送出之第wi2内的使 用完的顯像液之-部分,係通過送出管2G而藉由開閉控制 閥21之切換以朝第2槽22送出。朝第2槽之送出量’係 ,由依第!及第3槽12、68的液面位準之控制,裝置的演 算以控制之,以將和從回流管1〇朝第丨槽送回之使用完的 顯像液的量大致同-#,通過送出管2G而朝第⑽以供 給。 循環管18中,為了授拌起見,在第Wl2向第2槽 22的供給未進行之場合,係騎過第i排㈣μ而被栗 16送出之第1槽12内的使用完的顯像液導向第内。 第2槽22上接續有測定管23'該測定管23上,電 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(7 ) 質離子濃度測定裝置24、加工對象物濃度測定裝置26、 以及粒子測定裝置28係呈並列般地裝設著。電解質離子濃 度測定裝置24中,係將第2槽22内所貯留之顯像液的電 解質離子濃度測定之;加工對象物濃度測定裝置26中,係 將加工對象物之光阻樹脂的濃度測定之;粒子測定裝置28 中,係將顯像液中所含之殘渣等不純物的比例測定之。這 些測定裝置24、26、28之測定資料,係朝未圖示出之控 制裝置輸出。作為控制裝置,可為特定的電路,也可以是 使用微電腦或個人電腦之控制裝置。 控制裝置中,係基於這些測定資料,以將後述之流量 控制閥控制成:第2槽22所貯留的顯像液之電解質離子濃 度值、顯像液中所含之加工對象物的光阻(樹脂)濃度、顯 像液中之粒子比例形成既定的容許值。所謂顯像液濃度之 既定容許範圍,雖然會因應顯像之光阻種類和顧像液的種 類而異,但例如在使用四甲基溴化銨氧化物(TMAH)以作為 顯像液之場合,TMAH濃度宜為2.38±0.05%左右。若將品 質超出此容許範圍之顯像液朝顯像室供給,將造成顯像時 之靈敏度變動,而有無法得出既定線隔的圖案之虞,故不 佳。 • 顯像液中所含的樹脂濃度之容許範圍,雖然係依被圖 案加工之線幅等以決定出,但例如在5从m圖案之線幅變 動±5%時,把顯像液全體當作100重量部,而以0.1重量部 以下為佳,以0.075重量部以下為更佳。使用樹脂濃度超 出容許範圍之顯像液以進行正型顯像之場合,不該溶解的 10 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) (請先聞讀背面之注意事項再填寫本頁) 裝· 訂 ΑΊ __Β7_ 五、發明説明(8 ) 未曝光部分之樹脂會有被溶解的傾向,而無法得出所望的 ,•-. 線幅,故不佳。 本實施形態中,作為電解質離子濃度測定裝置24,可 使用導電率計;作為加工對象物濃度測定裝置26,可使用 可測定顯像液中所含的樹脂濃度之折射計;作為粒子測定 裝置28,可使用液中粒子計數器。使用折射率計以實際夫也 將顯像液中所含的光阻樹脂濃度測定之結果係顯示於圖 中。圖3所示之橫軸,係代表顯像液中之光阻樹脂濃度 縱軸係代表折射率計的刻度。折射計係使用(株)阿塔各狂 製之DD-7數位示差濃度計。圖3的縱轴之Brix%,係以蔗 糖液100g中所含之蔗糖克數作為刻度,而在計測蔗糖之場 合係和實際濃度完全一致;本實施形態中,係如圖3所示 般,和光阻樹脂濃度係呈正比例關係。亦即,係確認出可 使用折射率計以正確地測定光阻樹脂濃度。又,圖3中橫 軸之「Dev」係代表顯像液。 經濟部中央標準局員工消費合作社印製 (請先閲讀背面之注意事項再填寫本頁) 如圖1所示般,第2槽22上接讀有第2排出管30。 第2排出管30上,依序裝設有泵32和過濾器34。第2排 出管30,在過濾器34的後流侧,係分枝成循環泵36和送 出管38。循環管36上裝設有開閉控制閥40和管混合器 44。通過第2排出管30而排出的顯像液之一部分係形成 可返回第2槽22的内部般《此時,係藉由通過過濾器34Printed by the Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs of the People's Republic of China, Description of Invention (6) — As shown in FIG. 1 through the return pipe 10, the lower photoresist coating chamber 5 'is, for example, attached to the surface of the glass substrate 8 of the liquid crystal display device. The photoresist is applied by a spin coating method or the like. In the exposure chamber 6, a predetermined pattern is exposed on the surface of the substrate 8 after the photoresist is applied. In the developing chamber 7, the developing solution is spray-painted or dip-coated on the photoresist surface after the predetermined pattern is exposed for development. The photoresist is processed into a predetermined pattern by development, and the structure of the photoresist after the process t is intended to be in the state containing the image solution, and is sent to the first groove 12 shown in FIG. 1. A first discharge pipe 14 is connected to the one tank 12. A pump 16 is mounted on the first discharge pipe 14. The discharge pipe 14 is branched into a circulation pump 18 and a discharge pipe 20 on the discharge side of the pump 16. The pipes 18 and 20 are provided with opening and closing control valves 19 and 21, respectively. The opening / closing control valves 19 and 21 will be in accordance with the liquid level of the first tank, and the state of the second and fth tanks, and the open / closed state will be switched by the control device. The part of the used developer liquid in wi2 which is sent out by $ 16 through the first discharge pipe 14 is sent to the second tank 22 by switching the opening and closing control valve 21 through the discharge pipe 2G. The delivery amount to the 2nd slot ’is , YiYi! And the control of the liquid level of the third tank 12, 68, and the calculation of the device to control it, so that the amount of the used imaging liquid returned from the return tube 10 to the first tank is approximately the same as-#, It is supplied toward the third through the delivery tube 2G. In the circulation tube 18, for the purpose of mixing, when the supply of the Wl2 to the second tank 22 is not performed, the used imaging in the first tank 12 that has been passed through the i-th row ㈣μ and sent out by the chestnut 16 is used. Fluid is directed inside. The second tank 22 is connected with a measuring tube 23 ′. The measuring tube 23 is printed by the Consumer Cooperative of the Central Standards Bureau of the Ministry of Electricity and Economics. A7 B7 V. Description of the invention (7) Mass ion concentration measuring device 24, processing object concentration measuring device 26, and the particle measurement device 28 are installed side by side. The electrolyte ion concentration measuring device 24 measures the electrolyte ion concentration of the developing solution stored in the second tank 22, and the processing object concentration measuring device 26 measures the concentration of the photoresist resin of the processing object. The particle measurement device 28 measures the proportion of impurities such as residues contained in the developing solution. The measurement data of these measurement devices 24, 26, and 28 are output to a control device (not shown). The control device may be a specific circuit or a control device using a microcomputer or a personal computer. Based on these measurement data, the control device controls the flow control valve described below to the electrolyte ion concentration value of the developing solution stored in the second tank 22, and the photoresist of the processing object contained in the developing solution ( Resin) concentration and particle ratio in the developing solution form predetermined tolerances. The predetermined allowable range of the concentration of the developing solution varies depending on the type of photoresist and the type of the developing solution, but for example, when using tetramethylammonium bromide oxide (TMAH) as the developing solution The TMAH concentration should be about 2.38 ± 0.05%. Supplying a developing solution with a quality exceeding this allowable range to the developing chamber will cause a change in sensitivity during development, and there is a risk that a pattern of a predetermined line separation cannot be obtained, which is not preferable. • Although the allowable range of the resin concentration contained in the developing solution is determined by the pattern width of the pattern, etc., for example, when the line width of the m pattern changes by ± 5%, the entire developing solution is regarded as It is preferably 100 parts by weight, preferably 0.1 parts by weight or less, and more preferably 0.075 parts by weight. When using a developer with a resin concentration outside the allowable range for positive development, 10 paper sizes that should not be dissolved apply the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the precautions on the back first) (Fill in this page again) Binding and ordering ΑΊ __Β7_ V. Description of the invention (8) The resin of the unexposed part will tend to be dissolved, and the desired result cannot be obtained. •-. The line width is not good. In this embodiment, as the electrolyte ion concentration measuring device 24, a conductivity meter can be used; as the processing object concentration measuring device 26, a refractometer that can measure the resin concentration contained in the developing solution can be used; and as the particle measuring device 28, You can use a particle counter in liquid. The results of measuring the concentration of the photoresist resin contained in the developing solution using a refractive index meter are also shown in the figure. The horizontal axis shown in Fig. 3 represents the concentration of the photoresist resin in the developing solution. The vertical axis represents the scale of the refractive index meter. The refractometer is a DD-7 digital differential density meter manufactured by Atago. The Brix% of the vertical axis in FIG. 3 is based on the gram of sucrose contained in 100g of sucrose solution, and when measuring sucrose, it is completely consistent with the actual concentration; in this embodiment, as shown in FIG. 3, It is directly proportional to the concentration of the photoresist resin. That is, it was confirmed that the refractive index can be used to accurately measure the concentration of the photoresist resin. The "Dev" on the horizontal axis in Fig. 3 represents a developer. Printed by the Consumers' Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling this page) As shown in Figure 1, the second exhaust pipe 30 is read on the second tank 22. The second discharge pipe 30 is provided with a pump 32 and a filter 34 in this order. The second discharge pipe 30 is branched into a circulation pump 36 and a discharge pipe 38 on the downstream side of the filter 34. The circulation pipe 36 is provided with an on-off control valve 40 and a pipe mixer 44. A part of the developing liquid discharged through the second discharge pipe 30 is formed so as to return to the inside of the second tank 22. At this time, it passes through the filter 34

S 以將顯像液中所含的粒子等不純物除去。管混合器4 4可促 進通過其間之液的混合。又,開閉控制閥40及42,係配 合第2槽22之調整狀態而藉由控制裝置以切換之。 11 本紙張尺度適用中國國家標準(CNS ) A4規格(210X297公釐) 經濟部中央標準局舅工消費合作社印製 A7 ----__B7 五、發明説^丨9 ) "—〜、'' 循環管36上,在開閉控制間4〇和管混合器料之間, 係接續有顯像原液供給管46和純水供給管48。這些管 46、48上,分別接續著流量控制間%、^。這些流量控 制閥50、52之開度控制,係藉由流量計51以進行之。通 賴像原液供給管46及純水供给管抑而供給之顯像原液 (藥液原液)及純水(稀釋液),可通過管混合器44而在混合 後向第2槽供給。 作為顯像原液’並沒有特別的限定,可舉氫氧化鉀、 氫氧化納、構義、β義等含無機敎無錢水溶液, 或四曱基溴化銨氧化物(ΤΜΑΗ)、三甲基溴化單乙銨氧化物 (膽驗)等有機驗水溶液等為例。 顯像原液及/或純水之朝第2槽22之供給量的控制, 係基於電解質離子濃度測定裝置24之測定結果,藉由控制 流量控制閥50、52的開度以將第2槽22内所貯留的顯像 液之電解質離子濃度值控制成一定般。又,顯像原液及/ 或純水之朝第2槽22之供給量的控制,係基於後述之裝設 於第3槽68之液面位準計69的測定結果和通過排出管% 之廢棄顯像液的量’藉由控制裝置以將從第2槽22應送往 第3槽之必要量算出’並基於該算出量以進行^制。 第2排出管30所分枝出之送出管38係接續在第3槽 6-8上。該送出管38上裝设有開閉控制閥42(批式藥液供給 裝置)。該開閉控制閥42係被控制成’僅在藉由裝設在第2 槽22的測定管23之電解質離子濃度測定裝置24測定出之 濃度、藉由加工對象物濃度測定裝置26所測定之濃度、以 本紙張尺度適用中國國家標準(CNS ) Α4規格(210 X 297公釐) (請先閲讀背面之注意事項再填寫本頁) ΐτ 經濟部中央標準局貝工消費合作社印製 A7 B7 五、發明説明(10 ) 一~ 及藉由粒子測定裝置所測定之粒子量等皆在容許範圍内之 場合,形成打開般,以僅將品質在容許範圍内的顯像液朝 第3槽68供給。顯像液的品質在容許範圍外之場合,該顯 像液係被控制成通過循環管36而流回第2槽。 又,開閉控制閥42,亦可將從第2槽22朝第^槽68 供給之顯像液的量控制之。從第2槽22朝第3槽68供給 之顯像液的量’係基於裝設在第3槽68上之液面位準計69 的測定結果以控制之。詳而言之,在液面位準計69的測定 結果低之場合(液面低),開閉控制閥42之開閉係被控制成 可供給顯像液的補充量。然而,係以前述控制(不致供給品 質在容許範圍外的顯像液)為優先。因此,第3槽68中係 經常貯留著既定品質的顯像液。 第2槽22上同時接續有排出用排出管54。排出用排 出管54上裝設有泵56。排出用排出管54,在泵%的後 流側係分枝成排出管58和循環管6〇。排出管58上裝設有 開閉控制閥62。 該開閉控制62,例如加工對象物濃度測,定裝置% 所測定的濃度超出容許範圍之場合,藉由控制裝置之檢出 以控制控制62 ’以將第2槽22内部的顯像液經由排出 管58以廢棄之。該顯像液之廢棄量,係基於加工對象物濃 度測定裝置26之測定結果、和第3槽砧之液面位準計矽 的測定結果以計算之。 ( 循環管6〇上接續有流量控制閥64和過濾器66。該流 量控制閥64上亦接續著未圖示出之控制裝置,而藉由該控 13 k紙張尺度適财關家標準(cns > I ! I HI m n ^MM .... 丁 -·· (讀先閱讀背面之注意事項再填寫本買) 經濟部中央標準局員工消費合作社印製 A7 B7 五、發明説明(11 ) 制裝置以控制之。該流量控制閥64係被控制成,流量控制 閥62打開的場合關閉,流量控制閥62關閉的場合打開。 詳而言之,僅限於流量控制閥62未打開之場合,排出用排 出管54所排出之顯像液’將通過循環管60而流回第2槽 22内。此時,由於通過過濾器66,故可將顯像液所含之 粒子等的不純物濃度減少。 第3槽68上接續有藥液主供給管(藥液主供給裝 置)70。藥液主供給管70上依序裝設著泵72和過濾器74。 藥液主供給管70 ’係如圖2所示般接續於各顯像室7,而 通過該管70,以將既定品質的再利用顯像液供給至各顯像 室7。又,該管70 ’在過濾器74之後流侧,接續有分枝 管69。分枝管69 ’係朝向第3槽之回流管,該管上裝設 有壓力計71及流量控制閥73。流量控制閥73,係藉由壓 力計71以控制著’在壓力過高之場合打開,以使得液朝向 槽68流回。 如圖1所示般’依本實施形態之裝置2,除了第丨槽 12、第2槽22及第3槽68以外,係設有第4槽76。該第 4槽70,係作為貯留有新鮮的顯像液之作業開始時用槽、 或緊急時之備用槽。 該第4槽76上裝設有電解質離子濃度測定裝置88。 電解質離子濃度測定裝置88之測定結果,係輸出至未圖示 出之控制裝置。該第4槽76上接續有顯^液供給管78。 該供給管78上接續有管混合器80。該供給管78之管混合 器80上,接續有分枝自純水供給管48之純水供給分枝管 本紙張尺廑逍用中國國定拔座f rNS、/款 (請先閲讀背面之注意事項再填寫本頁) 訂 0.S removes impurities such as particles contained in the developing solution. The tube mixer 44 can promote mixing of the liquid passing therethrough. The on-off control valves 40 and 42 are switched by the control device in accordance with the adjustment state of the second tank 22. 11 This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm). Printed by A7 Consumers Cooperatives, Central Standards Bureau, Ministry of Economic Affairs ----__ B7 V. Invention ^ 丨 9) "-~, '' Between the opening and closing control room 40 and the tube mixer, the circulation pipe 36 is connected with a developing raw liquid supply pipe 46 and a pure water supply pipe 48. These pipes 46 and 48 are respectively connected with flow control rooms% and ^. The opening degree control of these flow control valves 50 and 52 is performed by the flow meter 51. The imaging stock solution (medicine stock solution) and pure water (diluent solution) supplied through the image stock solution supply pipe 46 and the pure water supply tube can be supplied to the second tank after being mixed through the tube mixer 44. The imaging stock solution is not particularly limited, and examples thereof include inorganic hydroxide-containing nonaqueous aqueous solutions such as potassium hydroxide, sodium hydroxide, structural meaning, and β meaning, or tetramethylammonium bromide oxide (TMA) and trimethyl. As an example, an organic aqueous solution such as monoethylammonium bromide oxide (biliary test) is used. The control of the supply amount of the developing solution and / or pure water to the second tank 22 is based on the measurement result of the electrolyte ion concentration measuring device 24, and the second tank 22 is controlled by controlling the openings of the flow control valves 50 and 52. The electrolyte ion concentration value of the developing solution stored in the inside is controlled to be constant. In addition, the control of the supply amount of the developing solution and / or pure water to the second tank 22 is based on the measurement result of the liquid level gauge 69 installed in the third tank 68 described later and the waste through the drain pipe%. The amount of the developing solution is 'calculated by the control device with a necessary amount to be sent from the second tank 22 to the third tank', and is manufactured based on the calculated amount. The delivery pipe 38 branched from the second discharge pipe 30 is connected to the third tank 6-8. An opening / closing control valve 42 (batch type chemical liquid supply device) is attached to the delivery pipe 38. This on-off control valve 42 is controlled to be a concentration measured only by the electrolyte ion concentration measurement device 24 installed in the measurement tube 23 installed in the second tank 22 and the concentration measured by the processing object concentration measurement device 26. 、 Applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) at this paper size (please read the precautions on the back before filling out this page) ΐτ Printed by the Bayer Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs Description of the Invention (10) First and when the amount of particles measured by the particle measuring device is within the allowable range, it is opened so as to supply only the developing liquid having the quality within the allowable range to the third tank 68. When the quality of the developing solution is outside the allowable range, the developing solution is controlled to flow back to the second tank through the circulation pipe 36. The opening and closing control valve 42 may also control the amount of the developing solution supplied from the second tank 22 to the second tank 68. The amount of the developing solution supplied from the second tank 22 to the third tank 68 is controlled based on the measurement result of the liquid level gauge 69 installed in the third tank 68. Specifically, when the measurement result of the liquid level gauge 69 is low (the liquid level is low), the opening and closing system of the on-off control valve 42 is controlled to supply the replenishing amount of the developing liquid. However, priority is given to the aforementioned controls (which do not cause the developer to be supplied outside the tolerance range). Therefore, in the third tank 68, a developer of a predetermined quality is often stored. A discharge pipe 54 for discharge is simultaneously connected to the second tank 22. A pump 56 is attached to the discharge pipe 54 for discharge. The discharge discharge pipe 54 is branched into a discharge pipe 58 and a circulation pipe 60 on the downstream side of the pump. The discharge pipe 58 is provided with an opening and closing control valve 62. This opening and closing control 62 is, for example, when the concentration of the processing object is measured, and the measuring device% exceeds the allowable range. The detection by the control device controls the control 62 ′ to discharge the imaging liquid in the second tank 22 through. The tube 58 is discarded. The discarded amount of the developing solution is calculated based on the measurement result of the processing object concentration measuring device 26 and the measurement result of the liquid level gauge silicon of the third anvil. (The circulation tube 60 is connected to a flow control valve 64 and a filter 66. The flow control valve 64 is also connected to a control device not shown in the figure, and the 13 k paper standard is used to control financial standards (cns). > I! I HI mn ^ MM .... Ding -... (Read the precautions on the back before filling in this purchase) Printed by the Consumer Standards Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs A7 B7 V. Description of Invention (11) System The flow control valve 64 is controlled to be closed when the flow control valve 62 is opened and opened when the flow control valve 62 is closed. Specifically, the flow control valve 64 is discharged only when the flow control valve 62 is not opened. The developing solution 'discharged by the discharge pipe 54 will flow back to the second tank 22 through the circulation pipe 60. At this time, since the filter 66 passes, the concentration of impurities such as particles contained in the developing solution can be reduced. The third tank 68 is followed by a main liquid medicine supply pipe (main liquid medicine supply device) 70. The main liquid medicine supply pipe 70 is sequentially installed with a pump 72 and a filter 74. The main liquid medicine supply pipe 70 'is shown in the figure 2 is connected to each developing chamber 7 as shown in FIG. The developing solution is supplied to each developing chamber 7. The pipe 70 'is connected to the flow side after the filter 74, and a branch pipe 69 is connected to the branch pipe 69'. The branch pipe 69 'is a return pipe toward the third tank. A pressure gauge 71 and a flow control valve 73 are installed. The flow control valve 73 is controlled by the pressure gauge 71 to be opened when the pressure is too high so that the liquid flows back toward the tank 68. As shown in FIG. 1 'In the apparatus 2 according to this embodiment, in addition to the first groove 12, the second groove 22, and the third groove 68, a fourth groove 76 is provided. The fourth groove 70 is used as a reservoir for storing fresh developing solution. A tank is used at the beginning of work, or a spare tank at an emergency. The fourth tank 76 is provided with an electrolyte ion concentration measuring device 88. The measurement result of the electrolyte ion concentration measuring device 88 is output to a control device (not shown). A liquid supply pipe 78 is connected to the fourth tank 76. A pipe mixer 80 is connected to the supply pipe 78. A pure water branched from the pure water supply pipe 48 is connected to the pipe mixer 80 of the supply pipe 78. Water supply branch tube, paper ruler, free use of Chinese national seat f rNS, / (Please read the precautions on the back first Complete this page) set to zero.

袭 請 k, 閱 -¾ 背 面 之- 注 事 項 再 i 訂 五 A7 B7 經濟部中央榇準局員工消费合作社印装 、,明說明(13) — 被=複數個顯像室7所送出之處理完的顯像液,首先,係 内在圖1所示之第1槽12内以暫時貯留。第1槽12 槽2 Μτ留之顯像液的一部分,係通過送出管2〇而送往第2 ^ 2。朝第2槽22之顯像液的送出量,例如和單位時間 入第1槽12之使用完的顯像液量大致相當。 測〜第2槽22中,係藉由電解質離子濃度測定裝置24以 以^槽22内的PH,並藉由加工對象物濃度測定裝置26 既^1顯像液中的樹脂濃度,並將這些測定值控制成位於 容園内。具體而言,顯像液中的樹脂濃度增大至超出 園之場合,由於並非可直接再利用的顯像液,故將 將2槽22内的顯像液通過排出管58以排出,同時或之後, 肩像原液及/或純水通過供給管46、48及循環管36以 ^、、’D至第2槽22内。又,在此同時,並測定第2槽22内 佴液之pH,以將朝第2槽22之顯像原液及/或純水的 /、、〜量控制成該pH位於既定容許範圍内。 。開閉控制閥42,僅在第2槽22中所貯留的顯像液之 質(電解質離子濃度、樹脂濃度及粒子含有比例)在既定 ^園内之場合,才會將第2槽22中所貯留的顯像液之—部 分送往第3槽68。朝第3槽68之送出量,係基於第3槽 68上裝設的液面位準計69之測定結果等以決定出。例如 第3槽68内所貯留的顯像液的液面位準低之場合,係將送 出管38的開閉控制閥42打開,以增大從第2槽22朝第3 槽68之送出量。 假定,在剛開始作業時或緊急時等場合般第3槽68内 16 本紙張尺度適用中國國家標準(CNS ) Α4规格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 、τ Γ 經濟部中央標準局貝工消費合作社印装 A7 B7 五、發明説明(14 ) 所貯留的顯像液的量相當少之場合,係從備用第4槽76而 通過送出管100,以將電解值離子濃度值經調整後之新鮮 的藥液朝第3槽68供給。 從第3槽68起,係通過顯像液主供給管70以將顯像 液供給至圖2所示之各顯像室7。 在依本實施形態之圖案加工用藥液集中管理裝置2 中,處理完的顯像液,係通過第1槽12及第2槽22而送 往第3槽68,並由第3槽送往各顯像室7。因此,即可將 使用完的顯像液再利用之。且,第3槽6,8内所貯留的藥液, 由於係經常地控制成僅既定品質的顯像液被貯留著,故朝 各顯像室7供給之顯像液的品質乃是相當地安定。又,由 於用以貯留朝各顯像室7供給的顯像液之第3槽68和濃度 調節用之第2槽22乃是獨立地設置著,故經濃度控制前的 藥液被供給至顯像室之虞將減少,且同時可將通過排出管 58而廢棄之顯像液的量減少。 又,本發明並非以上述之實施形態為限,只要在本發 明的範圍内進行各種不同的改變皆可。 ' 例如,上述之實施形態中,係使用顯像液以作為藥液, 但依本發明之圖案加工用藥液供給裝置所用之藥液,並非 以顯像液為限,亦可為剝離液、洗淨液(異丙醇等)、晶圓 表面處理液、密著劑溶液等。 如以上所說明般,依本發明,處理完的藥液,係通過 第1槽及第2槽而送往第3槽,並由第3槽送往各處理室。 因此,即可將使用完的藥液再利用之。且,第3槽内所貯 17 本紙張尺度適用中國國家標準(CNS ) Α4規格(210Χ 297公釐) (請先閱讀背面之注意事項再填寫本頁)Please k, read -¾ of the back-Note matters and then order five A7 B7 Printed by the Consumer Cooperatives of the Central Government Bureau of the Ministry of Economic Affairs, clearly stated (13) — was processed by a number of imaging rooms 7 First, the developing solution is temporarily stored in the first tank 12 shown in FIG. 1. A part of the imaging solution retained in the first tank 12 and the second tank 2 Mτ is sent to the second tank 2 through the delivery tube 20. The amount of the developer solution sent to the second tank 22 is, for example, approximately the same as the amount of developer solution that has been used in the first tank 12 per unit time. In the second tank 22, the electrolyte ion concentration measuring device 24 is used to measure the resin concentration in the developing solution using the pH in the tank 22 and the processing object concentration measuring device 26 to measure the resin concentration in the developing solution. The measured value is controlled to be located in the capacity garden. Specifically, when the resin concentration in the developing solution is increased beyond the garden, the developing solution in the second tank 22 is discharged through the discharge pipe 58 at the same time or because the developing solution is not directly reusable. After that, the shoulder image raw liquid and / or pure water passes through the supply pipes 46 and 48 and the circulation pipe 36 to the second tank 22. At the same time, the pH of the mash solution in the second tank 22 is measured to control the amount of the developing solution and / or pure water toward the second tank 22 so that the pH is within a predetermined allowable range. . The opening / closing control valve 42 will store the storage solution in the second tank 22 only when the quality of the developing solution (electrolyte ion concentration, resin concentration, and particle content ratio) stored in the second tank 22 is within a predetermined range. Part of the developing solution is sent to the third tank 68. The delivery amount to the third tank 68 is determined based on the measurement result of the liquid level gauge 69 installed in the third tank 68 and the like. For example, when the liquid level of the developing solution stored in the third tank 68 is low, the opening / closing control valve 42 of the delivery pipe 38 is opened to increase the output amount from the second tank 22 to the third tank 68. It is assumed that the size of 16 papers in the third slot 68 in the beginning of work or in an emergency, etc., is 16 Chinese paper standard (CNS) A4 size (210X297 mm) (please read the precautions on the back before filling this page), τ Γ Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, printed A7 B7 V. Description of the invention (14) Where the amount of developing solution stored is relatively small, it is sent from the spare fourth tank 76 through the delivery tube 100 to The fresh chemical solution after the electrolytic value ion concentration value is adjusted is supplied to the third tank 68. From the third tank 68, the developer is supplied to each developer chamber 7 shown in Fig. 2 through a developer main supply pipe 70. In the centralized processing chemical solution 2 for pattern processing according to this embodiment, the processed developing liquid is sent to the third tank 68 through the first tank 12 and the second tank 22, and is sent from the third tank to each展室 7。 Development room 7. Therefore, the used developer can be reused. In addition, since the medicinal solution stored in the third tanks 6 and 8 is constantly controlled so that only a developing solution of a predetermined quality is stored, the quality of the developing solution supplied to each developing chamber 7 is equivalent. stable. In addition, the third tank 68 and the second tank 22 for adjusting the concentration of the developing solution supplied to the developing chambers 7 are independently provided. Therefore, the chemical solution before the concentration control is supplied to the developing chamber. The risk of an image chamber will be reduced, and at the same time, the amount of the developing solution to be discarded through the discharge pipe 58 can be reduced. In addition, the present invention is not limited to the above-mentioned embodiments, and various changes may be made within the scope of the present invention. 'For example, in the above embodiment, a developing solution is used as the chemical solution, but the chemical solution used in the pattern processing chemical solution supplying device according to the present invention is not limited to the developing solution, and may be a peeling solution or a washing solution. Clean liquid (isopropyl alcohol, etc.), wafer surface treatment liquid, adhesive solution, etc. As described above, according to the present invention, the processed chemical solution is sent to the third tank through the first tank and the second tank, and is sent from the third tank to each processing chamber. Therefore, the used chemical solution can be reused. In addition, the 17 paper sizes stored in slot 3 are in accordance with Chinese National Standard (CNS) Α4 specifications (210 × 297 mm) (Please read the precautions on the back before filling this page)

-、1T A7 B7 五、發明説明(15 ) 留的藥液,由於係經常地控制成僅既定品質的藥液被貯留 著,故朝各處理室供給之藥液的品質乃是相當地安定。又, 由於用以貯留朝各處理室供給的藥液之槽和濃度調節用槽 乃是獨立地設置著,故經濃度控制前的藥液被供給至處理 室之虞將減少,且同時可將應廢棄之藥液量減少。 --------,裝-- (請先閱讀背面之注意事項再填寫本頁) 訂 A. 經濟部中央標準局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4規格(210X 297公釐)-、 1T A7 B7 V. Description of the invention (15) Since the remaining liquid medicine is often controlled so that only a predetermined quality liquid medicine is stored, the quality of the liquid medicine supplied to each processing chamber is quite stable. In addition, since the tank for storing the chemical solution supplied to each processing chamber and the tank for concentration adjustment are independently provided, the risk that the chemical solution before concentration control is supplied to the processing chamber will be reduced, and at the same time, the chemical solution can be supplied to the processing chamber. Reduce the amount of medicinal solution that should be discarded. --------, Install-(Please read the notes on the back before filling out this page) Order A. Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs This paper is printed in accordance with China National Standard (CNS) A4 specifications (210X 297 mm)

Claims (1)

385900 A8 B8 C8 D8385900 A8 B8 C8 D8 六、申請專利範圍 1·一種圖案加工用藥液集中管理裝置,包括· 第1槽’用以將複數個處理室所送出之處理 集中地收集並暫時貯留; 樂液 此處 此處 第2槽’前述第i槽所貯留的藥液的—部分係被送 ; 第3槽’前述第2槽所貯留的藥液的一部分係被送到 電解質離子濃度測定裝置,用以將前述第2槽所貯留 的藥液之電解質離子濃度值測定之; #加工對象物濃度測定裝置,用以將前述第2槽所貯留 的藥液中所含之圖案加工對象物的濃度測定之; 控制裝置,用謂㈣2槽供給之藥液原液及/或稀釋 液的量控制成,可使得前述電解質離子濃度測定裝置及/ 或加工對象物測定裝置之測定結果形成既定範圍内^ 批式藥液供給裝置,僅在前述第2槽所貯留的藥液品 質在既定範圍内之場合,將第2槽所貯㈣藥H部分 朝前述第3槽送出;以及 ' ’ 藥液主供給裝置,用以將前述第3槽所貯留的藥液朝 複數個處理室供給。 ’ 2. 如申請專利範圍第1項所述之圖案加工用藥液集中 管理裝置’其中,另具有第4槽,在前述第3槽内所貯留 的藥液量在既定以下之場合,用以將電解質離子濃度值經 調整後之新鮮的藥液供給至前述第3槽内。 3. 如申請專利範園第1或第2項所述之圖案加工用藥 19 ) A4^ ( 210X29-^iT 386¾❹❹ 六 申請專利範園 、集中S理裝置’其中,前述藥液係用以將曝光後的光 工成蚊圖案之圖案加卫用顯像液;前述處理室係 顯像至。 y隹t如巾請專利範圍帛1或第2項所述之圖案加工用藥 ::管理裝置’其中,前述第2槽上,係裝設有用以將 該第2槽所貯㈣藥液之—部分排出之排出裝'置。 货隹如中請專利範圍第1或第2項所述之®案加工用藥 液集中管理裝置,其φ,斗、丄 ^ 士 、中前逃加工對象物濃度測定裝置係 折射率計。 6·如申明專利|&圍第丨或第2項所述之圖案加工用藥 液集中管理裝置, 則4電解質離子濃度測定裝置係 導電率計。 7·如申請專利範圍第1或第2項所述之圖案加工用藥 液集中管理裝置’其中,另具有粒子測定裝置,以將前述 第2槽内所貯留的藥液中所含之不純物比例測定之。 請 先 聞 讀 面 之。 注 意 费 裝 訂 經濟部中央標準局員工消費合作社印製 本紙張尺度適用中國國家標準(CNS ) A4规名·( 210X297公釐)6. Scope of patent application 1. A centralized management device for pattern processing chemicals, including: 1st tank 'for centrally collecting and temporarily storing the processing sent out by a plurality of processing chambers; here, the 2nd tank of Leye here' A part of the medicinal solution stored in the i-th tank is sent; a part of the medicinal solution stored in the second tank is sent to the electrolyte ion concentration measuring device for storing the second tank. The electrolyte ion concentration value of the chemical solution is measured; #Processing object concentration measuring device is used to measure the concentration of the pattern processing object contained in the chemical solution stored in the aforementioned second tank; the control device is called ㈣2 The amount of the chemical liquid stock solution and / or diluent supplied from the tank is controlled so that the measurement results of the foregoing electrolyte ion concentration measuring device and / or processing object measuring device can be formed within a predetermined range ^ Batch type chemical liquid supplying device When the quality of the medicinal solution stored in the second tank is within a predetermined range, the H part of the peony stored in the second tank is sent to the aforementioned third tank; Said first grooves 3 toward the liquid storing a plurality of processing chambers supplied. '2. The centralized medical liquid management device for pattern processing as described in item 1 of the scope of the patent application', which additionally has a fourth tank, where the amount of the chemical liquid stored in the third tank is below a predetermined level, for The fresh chemical solution with the adjusted electrolyte ion concentration value is supplied into the third tank. 3. The medicine for pattern processing described in item 1 or 2 of the patent application park 19) A4 ^ (210X29- ^ iT 386¾❹❹) Six patent application parks, centralized S-processing devices' wherein the aforementioned chemical solution is used to expose The patterning solution for the guarding of the pattern of the mosquito-formed mosquitoes; the aforementioned processing room is used for developing the image. The aforementioned second tank is provided with a discharge device for partially discharging the tincture medicinal solution stored in the second tank. The product is described in the item 1 or 2 of the patent scope. Centralized management device for processing chemical liquid, the φ, bucket, tanker, and front-end escape processing object concentration measuring device is a refractive index meter. 6 · As stated in the patent | & If a chemical liquid centralized management device is used, then the 4 electrolyte ion concentration measurement device is a conductivity meter. 7. The centralized chemical liquid management device for pattern processing as described in the first or second item of the patent application scope, wherein a particle measurement device is additionally provided. Impurities contained in the medicinal solution stored in the second tank Determination of the cases. Please read first heard the plane. Note that the fee stapling Ministry of Economic Affairs Bureau of Standards Co-op staff paper printed this scale applicable Chinese National Standard (CNS) A4 gauge name · (210X297 mm)
TW086119549A 1996-12-25 1997-12-22 Developer solution centrally managing device for processing patterns TW386900B (en)

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