JP4839820B2 - Developer supply device - Google Patents
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- JP4839820B2 JP4839820B2 JP2005364396A JP2005364396A JP4839820B2 JP 4839820 B2 JP4839820 B2 JP 4839820B2 JP 2005364396 A JP2005364396 A JP 2005364396A JP 2005364396 A JP2005364396 A JP 2005364396A JP 4839820 B2 JP4839820 B2 JP 4839820B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/06—Apparatus for electrographic processes using a charge pattern for developing
- G03G15/10—Apparatus for electrographic processes using a charge pattern for developing using a liquid developer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/06—Apparatus for electrographic processes using a charge pattern for developing
- G03G15/08—Apparatus for electrographic processes using a charge pattern for developing using a solid developer, e.g. powder developer
- G03G15/0822—Arrangements for preparing, mixing, supplying or dispensing developer
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2215/00—Apparatus for electrophotographic processes
- G03G2215/06—Developing structures, details
- G03G2215/0602—Developer
- G03G2215/0626—Developer liquid type (at developing position)
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2215/00—Apparatus for electrophotographic processes
- G03G2215/06—Developing structures, details
- G03G2215/0634—Developing device
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G2215/00—Apparatus for electrophotographic processes
- G03G2215/06—Developing structures, details
- G03G2215/0634—Developing device
- G03G2215/0658—Liquid developer devices
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- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本発明は、現像液の供給装置に関するものであり、詳しくは、液晶基板やプリント基板の現像プロセスから回収された現像液のアルカリ濃度および樹脂濃度を管理すると共に、一定濃度に再調節した現像液を現像プロセスに供給する現像液の供給装置に関するものである。 The present invention relates to a developer supply device, and more particularly, a developer that manages the alkali concentration and resin concentration of a developer recovered from a development process of a liquid crystal substrate or a printed circuit board and is readjusted to a constant concentration. The present invention relates to a developer supply apparatus for supplying a developer to a developing process.
液晶基板やプリント基板を製造する際のフォトレジストの現像プロセスでは、テトラメチルアンモニウムハイドロオキサイド（ＴＭＡＨ）等のアルカリ水溶液が現像液として使用される。斯かる現像液は、昨今、基板サイズの大型化やプロセスの進歩により多量に使用されるため、コスト低減の観点から現像プロセスに対してリサイクルするのが望ましいが、リサイクルを繰り返すうちに、樹脂中の酸との反応、空気中の炭酸ガスや酸素との反応によってアルカリ濃度が低下し、また、レジスト用樹脂の溶解によって樹脂濃度が上昇し、これにより、レジストパターンの寸法精度や未露光部の膜厚精度が低下するため、アルカリ濃度および溶解樹脂濃度を出来る限り一定に管理する必要がある。 In the development process of a photoresist when manufacturing a liquid crystal substrate or a printed circuit board, an alkaline aqueous solution such as tetramethylammonium hydroxide (TMAH) is used as a developer. Since such a developer is used in large quantities due to an increase in substrate size and process progress recently, it is desirable to recycle the development process from the viewpoint of cost reduction. Reaction with acid, reaction with carbon dioxide or oxygen in the air decreases the alkali concentration, and dissolution of the resist resin increases the resin concentration. Since the film thickness accuracy decreases, it is necessary to manage the alkali concentration and the dissolved resin concentration as constant as possible.
現像プロセスから排出される使用済現像液を再生してリサイクルする現像液の供給装置としては、供給すべき現像液を調製する供給貯槽（調製槽）と、使用済現像液を一旦回収液貯槽に収容して前記の供給貯槽に送液する回収液供給機構と、新たな現像液原液を供給貯槽に供給する原液供給機構と、希釈水を供給貯槽に供給する希釈水供給機構とを備え、供給貯槽の現像液のアルカリ濃度および樹脂濃度に基づき、原液供給機構による現像液原液の送液および希釈水供給機構による希釈水の送液を制御可能になされたものが知られている。 As a developer supply device that recycles and recycles the used developer discharged from the development process, a supply storage tank (preparation tank) for preparing the developer to be supplied, and a used developer stored in the recovered liquid storage tank once. A recovery liquid supply mechanism for storing and supplying the supply liquid to the supply storage tank, a raw liquid supply mechanism for supplying a new developer stock solution to the supply storage tank, and a dilution water supply mechanism for supplying dilution water to the supply storage tank. Based on the alkali concentration and the resin concentration of the developer in the storage tank, it is known that the supply of the developer stock solution by the stock solution supply mechanism and the feed of the dilution water by the dilution water supply mechanism can be controlled.
上記の様な現像液の供給装置においては、現像プロセスから回収した使用済現像液のアルカリ濃度が目標濃度よりも低い場合には高濃度の現像液原液（例えば２５質量％のＴＭＡＨ）を追加供給し、使用済現像液の樹脂濃度が目標濃度よりも高い場合には前記の現像液原液および希釈用純水を追加供給することにより、適切な濃度の現像液を調製している。そして、現像液の超音波伝播速度と電磁導電率に基づいてアルカリ濃度および樹脂濃度を高精度に検出ことにより、正確に濃度調節された現像液をプロセス側へ供給できる。
ところで、前述の現像液の供給装置においては、現像プロセスから調製槽への使用済現像液の回収量が調製槽から現像プロセスへの供給量よりも多くなったり、現像液原液や新たな現像液の追加供給量が予定以上に多くなった場合、調製される現像液の全体量が供給貯槽（調製槽）の収容量を超えるため、余剰の現像液を調製槽から廃棄しなければならない。これにより、追加供給した現像液原液や新たな現像液の一部も廃棄されるため、コストな損失を惹起する。 By the way, in the developer supply device described above, the amount of used developer collected from the development process to the preparation tank is larger than the amount supplied from the preparation tank to the development process, or the developer stock solution and the new developer When the amount of the additional supply exceeds a predetermined amount, the total amount of the developer to be prepared exceeds the capacity of the supply storage tank (preparation tank), so that the excess developer must be discarded from the preparation tank. As a result, a part of the additionally supplied developer stock solution and a new developer solution are also discarded, which causes a cost loss.
一方、現像処理においては、被処理物の変更によりプロセスの処理条件も変更され、また、一般的には複数のプロセスがそれぞれ異なる処理条件で稼働している。そして、昨今、現像液中の樹脂濃度に関しては、その好ましい濃度範囲が現像プロセスの処理条件によって異なることが確認されている。すなわち、現像液中の樹脂濃度が低いときに現像プロセスが安定する場合と、樹脂濃度が比較的高いときに現像プロセスが安定する場合とがある。 On the other hand, in the development processing, the processing conditions of the process are also changed by changing the object to be processed, and generally, a plurality of processes are operating under different processing conditions. And recently, regarding the resin concentration in the developer, it has been confirmed that the preferred concentration range varies depending on the processing conditions of the development process. That is, there are cases where the development process is stable when the resin concentration in the developer is low and cases where the development process is stable when the resin concentration is relatively high.
これに対し、前述の現像液の供給装置では、１つの現像プロセスを対象に現像液を調製するため、回収された使用済現像液のうちの余剰分については、仮に他の現像プロセスで再利用可能であっても廃棄されている。従って、現像プロセスにおける処理コストの低減と言う観点からも、回収された使用済現像液のより有効な再利用が望まれる。 On the other hand, in the developer supply apparatus described above, the developer is prepared for one development process, and therefore the surplus of the collected used developer is reused in another development process. It is discarded even if possible. Therefore, from the viewpoint of reducing the processing cost in the development process, more effective reuse of the collected used developer is desired.
本発明は上記の実情に鑑みてなされたものであり、その目的は、液晶基板やプリント基板の現像プロセスから回収された現像液のアルカリ濃度および樹脂濃度を管理すると共に、一定濃度に再調製した現像液を現像プロセスに供給する現像液の供給装置であって、再調製に使用される新たな現像液の消費量を低減できる現像液の供給装置を提供することにある。また、本発明の目的は、現像プロセスから回収された使用済現像液を更に有効利用できる現像液の供給装置を提供することにある。 The present invention has been made in view of the above circumstances, and its purpose is to manage the alkali concentration and the resin concentration of the developer recovered from the development process of the liquid crystal substrate and the printed circuit board, and to re-adjust it to a constant concentration. An object of the present invention is to provide a developer supply device that supplies a developer to a development process and that can reduce the consumption of a new developer used for re-preparation. Another object of the present invention is to provide a developer supply apparatus that can further effectively use a used developer recovered from a development process.
本発明では、調整槽における現像液の過剰な再調製を防止し、現像液原液または新たな現像液のロスを防止するため、調整槽内の使用済現像液中のアルカリ濃度、樹脂濃度および調整槽の液面を検出し、再調製される現像液の全体量が調整槽の収容範囲内で例えば最大となる様に、再調製に必要な現像液原液または新たな現像液もしくは希釈水の追加供給量と共に使用済現像液の使用量を算出し、調整槽に回収された使用済現像液の量が前記の使用量を超えた場合、現像プロセスから返流される使用済現像液を調製槽に供給することなく装置外に排出する様にした。 In the present invention, in order to prevent excessive re-preparation of the developer in the adjustment tank and prevent loss of the developer stock solution or new developer, the alkali concentration, resin concentration and adjustment in the used developer in the adjustment tank Add the developer stock solution or new developer solution or dilution water necessary for re-preparation so that the total amount of developer solution to be re-prepared is maximum within the storage range of the adjustment tank. Calculate the used amount of the used developer together with the supply amount, and if the amount of the used developer collected in the adjustment tank exceeds the above-mentioned used amount, the used developer returned from the developing process is prepared in the preparation tank It was made to discharge out of the device without supplying it.
また、本発明では、現像プロセスから回収された使用済現像液を更に有効利用するため、他の現像プロセスから排出された使用済現像液を回収貯槽に一旦貯留すると共に、対象とする現像プロセスの現像液を再調製する際、必要とされる樹脂濃度に応じて回収貯槽の使用済現像液を利用する様にした。例えば、対象とする現像プロセス用に現像液を調製する際、他の現像プロセスから排出される樹脂濃度の低い使用済現像液を希釈用として利用する。また、対象とする現像プロセス用に現像液を調製する際、他の現像プロセスから排出される樹脂濃度の高い使用済現像液を樹脂濃度調節用として利用する。 Further, in the present invention, in order to further effectively use the used developer recovered from the development process, the used developer discharged from the other development process is temporarily stored in the recovery storage tank, and the target development process is also stored. When the developer was re-prepared, the spent developer in the collection tank was used according to the required resin concentration. For example, when preparing a developing solution for a target developing process, a used developing solution having a low resin concentration discharged from another developing process is used for dilution. Further, when preparing a developing solution for a target developing process, a used developing solution having a high resin concentration discharged from another developing process is used for adjusting the resin concentration.
すなわち、本発明の第１の要旨は、アルカリ水溶液から成る現像液を現像プロセスに供給する現像液の供給装置であって、現像液原液を供給する機構および新たな現像液または希釈水を供給する機構が付設された調整槽と、現像プロセスから回収された使用済現像液を前記調整槽に送液する回収流路と、前記調整槽で再調製された現像液を前記現像プロセスに送液する供給流路とを備え、前記調整槽には、アルカリ濃度および樹脂濃度を検出する濃度計ならびに液面計が設けられ、前記回収流路には、前記現像プロセスから送液される使用済現像液を装置外に排出する排出流路が設けられ、そして、前記調整槽の現像液のアルカリ濃度、樹脂濃度および液面を検出し、再調製される現像液の量が前記調整槽の収容範囲内の予め設定された上限量となる様に、使用済現像液の使用量を算出し、前記調整槽に回収された使用済現像液の量が前記使用量を超えた場合に前記排出流路から使用済現像液を排出する様に構成され、更に、他の現像プロセスから回収された使用済現像液を貯留する回収貯槽と、当該回収貯槽から前記調整槽に使用済現像液を送液する混合流路とを備え、前記回収貯槽の使用済現像液の樹脂濃度が前記調整槽の現像液の樹脂濃度よりも低い場合、前記調整槽にて樹脂濃度を低くする操作の際、前記回収貯槽の使用済現像液を前記混合流路から前記調整槽に供給する様に構成されていることを特徴とする現像液の供給装置に存する。 That is, the first gist of the present invention, there is provided a developer supply device for supplying a developing solution comprising an alkali aqueous solution in the developing process, supplying mechanism for supplying a developer stock solution and a new developer or dilution water An adjustment tank provided with a mechanism, a recovery channel for sending used developer recovered from the development process to the adjustment tank, and a developer re-prepared in the adjustment tank to the development process A supply flow path, the adjustment tank is provided with a concentration meter and a liquid level gauge for detecting an alkali concentration and a resin concentration, and the recovery flow path is a spent developer fed from the development process. A discharge passage for discharging the developer to the outside of the apparatus, and the alkali concentration, the resin concentration and the liquid level of the developer in the adjustment tank are detected, and the amount of the developer to be reconstituted is within the accommodation range of the adjustment tank. Preset limit for In such a manner, the used amount of the used developer is calculated, and when the amount of the used developer collected in the adjustment tank exceeds the used amount, the used developer is discharged from the discharge channel. Further comprising a recovery storage tank for storing used developer recovered from another development process, and a mixing channel for sending the used developer from the recovery storage tank to the adjustment tank, When the resin concentration of the used developer in the recovery tank is lower than the resin concentration of the developer in the adjustment tank, the spent developer in the recovery tank is mixed when the resin concentration is lowered in the adjustment tank. The developer supply device is configured to supply the adjustment tank from a flow path .
また、本発明の第２の要旨は、アルカリ水溶液から成る現像液を現像プロセスに供給する現像液の供給装置であって、現像液原液を供給する機構および新たな現像液または希釈水を供給する機構が付設された調整槽と、現像プロセスから回収された使用済現像液を前記調整槽に送液する回収流路と、前記調整槽で再調製された現像液を前記現像プロセスに送液する供給流路とを備え、前記調整槽には、アルカリ濃度および樹脂濃度を検出する濃度計ならびに液面計が設けられ、前記回収流路には、前記現像プロセスから送液される使用済現像液を装置外に排出する排出流路が設けられ、そして、前記調整槽の現像液のアルカリ濃度、樹脂濃度および液面を検出し、再調製される現像液の量が前記調整槽の収容範囲内の予め設定された上限量となる様に、使用済現像液の使用量を算出し、前記調整槽に回収された使用済現像液の量が前記使用量を超えた場合に前記排出流路から使用済現像液を排出する様に構成され、更に、他の現像プロセスから回収された使用済現像液を貯留する回収貯槽と、当該回収貯槽から前記調整槽に使用済現像液を送液する混合流路とを備え、前記回収貯槽の使用済現像液の樹脂濃度が前記調整槽の現像液の樹脂濃度よりも高い場合、前記調整槽にて樹脂濃度を高くする操作の際、前記回収貯槽の使用済現像液を前記混合流路から前記調整槽に供給する様に構成されていることを特徴とする現像液の供給装置に存する。 According to a second aspect of the present invention , there is provided a developer supply device for supplying a developer comprising an alkaline aqueous solution to a development process, a mechanism for supplying a developer stock solution, and a new developer or dilution water. An adjustment tank provided with a mechanism, a recovery channel for sending used developer recovered from the development process to the adjustment tank, and a developer re-prepared in the adjustment tank to the development process A supply flow path, the adjustment tank is provided with a concentration meter and a liquid level gauge for detecting an alkali concentration and a resin concentration, and the recovery flow path is a spent developer fed from the development process. A discharge passage for discharging the developer to the outside of the apparatus, and the alkali concentration, the resin concentration and the liquid level of the developer in the adjustment tank are detected, and the amount of the developer to be reconstituted is within the accommodation range of the adjustment tank. Preset amount of In such a manner, the used amount of the used developer is calculated, and when the amount of the used developer collected in the adjustment tank exceeds the used amount, the used developer is discharged from the discharge channel. And a recovery storage tank for storing used developer recovered from another development process, and a mixing channel for sending the used developer from the recovery storage tank to the adjustment tank. When the resin concentration of the used developer in the storage tank is higher than the resin concentration of the developer in the adjustment tank, the spent developer in the recovery storage tank is mixed with the mixed flow during the operation of increasing the resin concentration in the adjustment tank. A developing solution supply apparatus is configured to supply the adjustment tank from a path .
本発明に係る現像液の供給装置によれば、調整槽に回収される使用済現像液の量が再調製に必要な使用量を超える場合に調整槽の上流側の排出流路から使用済現像液を排出するため、調整槽における現像液の過剰な再調製を防止でき、廃棄される現像液原液または新たな現像液のロスを防止することが出来る。また、本発明に係る現像液の供給装置によれば、回収貯槽に回収された他の現像プロセスの使用済現像液を有効に再利用できるため、現像プロセスにおける処理コストを一層低減することが出来る。 According to the developer supply apparatus of the present invention, when the amount of the used developer collected in the adjustment tank exceeds the amount necessary for re-preparation, the used development from the discharge channel on the upstream side of the adjustment tank. Since the solution is discharged, excessive re-preparation of the developer in the adjustment tank can be prevented, and loss of the developer solution to be discarded or new developer can be prevented. Further, according to the developer supply apparatus of the present invention , the spent developer for another development process collected in the collection storage tank can be effectively reused, so that the processing cost in the development process can be further reduced. .
本発明に係る現像液の供給装置の実施形態を図面に基づいて説明する。図１は、本発明の第１の態様に係る現像液の供給装置の主な構成要素を示すフロー図であり、第１の態様に係る現像液の供給装置は、現像液の過剰な再調製を防止し、現像液原液または新たな現像液のロスを防止する様にした装置である。また、図２は、本発明の第２の態様および第３の態様に係る現像液の供給装置の主な構成要素を示すフロー図であり、第２の態様および第３の態様に係る現像液の供給装置は、他の現像プロセスから排出される使用済現像液を有効利用する様にした装置である。以下、実施形態の説明においては、現像液の供給装置を「供給装置」と略記する。 An embodiment of a developer supply apparatus according to the present invention will be described with reference to the drawings. FIG. 1 is a flowchart showing the main components of the developer supply apparatus according to the first aspect of the present invention. The developer supply apparatus according to the first aspect is an excessive re-preparation of the developer. Is a device that prevents the loss of the developer stock solution or the new developer. FIG. 2 is a flowchart showing main components of the developer supply apparatus according to the second and third aspects of the present invention, and the developer according to the second and third aspects. The supply apparatus is an apparatus that effectively uses a used developer discharged from another development process. Hereinafter, in the description of the embodiments, the developer supply device is abbreviated as “supply device”.
本発明の供給装置は、液晶基板やプリント基板を製造する際のフォトレジストの現像プロセス、例えばスピンデベロッパ装置などの現像装置を含む現像プロセス（図中に符号（８）で示す）に対し、アルカリ水溶液から成る現像液を供給する装置であり、現像プロセスから回収された使用済現像液を一定のアルカリ濃度および樹脂濃度の現像液に再調製し、再調製された現像液を現像プロセスに供給する機能を有する。 The supply device according to the present invention provides a photoresist development process for producing a liquid crystal substrate or a printed circuit board, for example, a development process including a development device such as a spin developer device (indicated by symbol (8) in the figure). This is a device that supplies a developing solution consisting of an aqueous solution. The used developing solution recovered from the developing process is re-prepared to a developing solution having a constant alkali concentration and resin concentration, and the re-prepared developing solution is supplied to the developing process. It has a function.
本発明において、アルカリ系の現像液としては、水酸化カリウム、水酸化ナトリウム、リン酸ナトリウム、ケイ酸ナトリウムなどの無機アルカリの単独又は混合物からなる無機アルカリ水溶液や、テトラメチルアンモニウムハイドロオキサイド（ＴＭＡＨ）、トリメチルモノエタノールアンモニウムハイドロオキサイド（コリン）などの有機アルカリ水溶液などが挙げられる。 In the present invention, the alkaline developer includes an inorganic alkaline aqueous solution composed of an inorganic alkali such as potassium hydroxide, sodium hydroxide, sodium phosphate, sodium silicate or a mixture thereof, or tetramethylammonium hydroxide (TMAH). And an organic alkaline aqueous solution such as trimethylmonoethanolammonium hydroxide (choline).
先ず、本発明の第１の態様に係る供給装置について説明する。本発明の供給装置は、図１に示す様に、現像液原液を供給する機構、および、新たな現像液または希釈水を供給する機構が付設された調整槽（１）と、現像プロセス（８）から回収された使用済現像液を調整槽（１）に送液する回収流路（２２）と、調整槽（１）で再調製された現像液を現像プロセス（８）に送液する供給流路（２１）とを備えている。 First, the supply device according to the first aspect of the present invention will be described. As shown in FIG. 1, the supply device of the present invention includes a mechanism for supplying a developing solution stock solution, an adjustment tank (1) provided with a mechanism for supplying a new developer or dilution water, and a developing process (8). ) A collecting flow path (22) for sending the used developer collected from the adjustment tank (1) and a supply for feeding the developer re-prepared in the adjustment tank (1) to the development process (8). And a flow path (21).
調整槽（１）は、回収した使用済現像液のアルカリ濃度を一定の目標値に調節し且つ樹脂濃度を一定範囲に調節して使用済現像液を再生すると共に、再生された現像液を必要に応じて現像プロセス（８）に供給する機能を備え、例えば、１００〜２０００リットル程度の内容積の耐腐食性を備えた容器によって構成される。 The adjustment tank (1) regenerates the used developer by adjusting the alkali concentration of the collected used developer to a certain target value and adjusting the resin concentration within a certain range, and also requires a regenerated developer. The container is provided with a function of supplying to the development process (8) according to the above, and is constituted by a container having an internal volume of about 100 to 2000 liters and corrosion resistance.
調整槽（１）には、貯留する現像液を均一な濃度に調節し且つ維持するため、ポンプ及び循環流路から成る撹拌手段（図示省略）が設けられる。上記の様な循環による撹拌手段は、スクリュー等の撹拌装置に比べ、パーティクルの発生が少なく、現像液の汚染を低減することが出来る。更に、後述する濃度計（１２）によって正確に現像液の濃度を測定するため、図示しないが、調整槽（１）には、当該調整槽内の現像液の温度を一定に保持する温度調節手段が付設される。斯かる温度調節手段は、例えば、上記の撹拌手段の循環流路または別途設けられた循環流路と、当該循環流路の途中に配置された恒温槽とから構成される。 The adjustment tank (1) is provided with stirring means (not shown) including a pump and a circulation channel in order to adjust and maintain the stored developer at a uniform concentration. Compared to a stirring device such as a screw, the stirring means by circulation as described above generates less particles and can reduce contamination of the developer. Further, in order to accurately measure the concentration of the developer with a densitometer (12) described later, although not shown, the adjustment tank (1) has a temperature adjusting means for keeping the temperature of the developer in the adjustment tank constant. Is attached. Such temperature adjusting means is constituted by, for example, a circulation flow path of the above stirring means or a separately provided circulation flow path, and a thermostatic bath disposed in the middle of the circulation flow path.
現像液原液を供給する機構は、原液貯槽（図示省略）から調整槽（１）に至る原液供給流路（３２）と、当該新液供給流路の途中に介装された開閉弁（５２）とから構成され、開閉弁（５２）の制御により、必要時に現像液原液を調整槽（１）に供給する様になされている。なお、上記の原液貯槽に予め収容される現像液原液としては、高濃度の未使用の現像液、例えば、ＴＭＡＨ濃度が２５質量％の現像液が挙げられる。 The mechanism for supplying the developing solution stock solution includes a stock solution supply channel (32) from the stock solution storage tank (not shown) to the adjustment tank (1), and an on-off valve (52) interposed in the middle of the new solution supply channel. The developer stock solution is supplied to the adjustment tank (1) when necessary by controlling the on-off valve (52). The developer stock solution previously stored in the stock solution storage tank includes a high-concentration unused developer, for example, a developer having a TMAH concentration of 25% by mass.
新たな現像液を供給する機構は、現像液貯槽（図示省略）から調整槽（１）に至る新液供給流路（３１）と、当該新液供給流路の途中に介装された開閉弁（５１）とから構成され、開閉弁（５１）の制御により、必要時に新たな現像液を調整槽（１）に供給する様になされている。なお、上記の現像液貯槽に予め収容される現像液としては、使用濃度に濃度調節された現像液、例えば、ＴＭＡＨ濃度が２．３８質量％の現像液が挙げられる。 The mechanism for supplying a new developer includes a new liquid supply channel (31) from a developer storage tank (not shown) to the adjustment tank (1), and an on-off valve interposed in the middle of the new liquid supply channel. (51), and a new developer is supplied to the adjusting tank (1) when necessary by controlling the on-off valve (51). In addition, as a developing solution previously accommodated in said developing solution storage tank, the developing solution adjusted to the use density | concentration, for example, the developing solution whose TMAH density | concentration is 2.38 mass% is mentioned.
また、本発明の供給装置では、上記の様な現像液原液を供給する機構が設けられることにより、新たな現像液を供給する機構に代え、希釈水を供給する機構が設けられてもよい。図示しないが、例えば、希釈水を供給する機構は、純水製造装置から調整槽（１）至る純水供給流路および当該純水供給流路に介装された開閉弁から構成され、上記の現像液原液を供給する機構と共に稼働させて調整槽（１）に純水を供給することにより、調整槽（１）において新たな現像液を調製する様になされている。 Further, in the supply device of the present invention, a mechanism for supplying dilution water may be provided instead of a mechanism for supplying a new developer by providing a mechanism for supplying the developer stock solution as described above. Although not shown, for example, the mechanism for supplying dilution water is composed of a pure water supply channel from the pure water production apparatus to the adjustment tank (1), and an on-off valve interposed in the pure water supply channel. A new developer is prepared in the adjustment tank (1) by operating together with a mechanism for supplying the developer stock solution and supplying pure water to the adjustment tank (1).
更に、上記の調整槽（１）には、アルカリ濃度および樹脂濃度を検出する濃度計（１２）並びに液面計（１１）が設けられる。濃度計（１２）は、調整槽（１）内の現像液の濃度を検出するため、例えば、調整槽（１）に付設されたサンプリング用の循環流路（図示省略）の途中に配置される。本発明の供給装置においては、樹脂濃度の変動に影響を受けることなく高精度に樹脂濃度およびアルカリ濃度を検出するために特定の濃度計が使用される。具体的には、濃度計（１２）としては、現像液における超音波伝播速度および現像液の電磁導電率を計測し、予め作成された所定温度および所定濃度における超音波伝播速度と電磁導電率との関係（マトリックス）に基づき、アルカリ濃度および樹脂濃度を検出する多成分濃度計が使用される。 Further, the adjustment tank (1) is provided with a concentration meter (12) and a liquid level meter (11) for detecting the alkali concentration and the resin concentration. The densitometer (12) is arranged in the middle of a sampling circulation channel (not shown) attached to the adjustment tank (1), for example, in order to detect the concentration of the developer in the adjustment tank (1). . In the supply device of the present invention, a specific densitometer is used to detect the resin concentration and the alkali concentration with high accuracy without being affected by the fluctuation of the resin concentration. Specifically, the densitometer (12) measures the ultrasonic propagation velocity in the developer and the electromagnetic conductivity of the developer, and determines the ultrasonic propagation velocity and electromagnetic conductivity at a predetermined temperature and a predetermined concentration. Based on the relationship (matrix), a multi-component densitometer that detects the alkali concentration and the resin concentration is used.
上記の多成分濃度計は、一定温度の溶液中の超音波伝播速度および電磁導電率を測定することにより、３成分系溶液の２成分の濃度を同時にリアルタイムで測定可能な濃度計である。すなわち、多成分濃度計は、溶液の温度が一定ならば、各成分の濃度に応じて液中の超音波の伝播速度および電磁導電率が一義的に特定されると言う原理に基づくものであり、主に、超音波変換器、超音波発信器、電磁導電率変換器、電磁導電率発信器および所定の演算を行うマイクロプロセッサーから成る。 The multi-component concentration meter is a concentration meter that can simultaneously measure the concentration of two components of a three-component solution in real time by measuring the ultrasonic propagation velocity and electromagnetic conductivity in a solution at a constant temperature. That is, the multi-component concentration meter is based on the principle that if the temperature of the solution is constant, the propagation speed and electromagnetic conductivity of the ultrasonic wave in the liquid are uniquely specified according to the concentration of each component. , Mainly composed of an ultrasonic transducer, an ultrasonic transmitter, an electromagnetic conductivity converter, an electromagnetic conductivity transmitter and a microprocessor for performing a predetermined calculation.
上記の多成分濃度計においては、現像液の濃度測定に適用する場合、アルカリ濃度および樹脂濃度の各種組み合わせ毎に一定温度条件下で予め計測された超音波伝播速度と電磁導電率の関係をマトリックスとして予め準備されることにより、当該マトリックスに基づき、測定値からアルカリ濃度および樹脂濃度を正確に推定演算できる。上記の様な多成分濃度計としては、富士工業社製の商品名「ＦＵＤ−１ Ｍｏｄｅｌ−５１」として知られる液体用超音波多成分濃度計が好適に使用できる。なお、本発明において、濃度計は、アルカリ濃度検出用濃度計と樹脂濃度検出用濃度計とを別個に設置してもよい。 In the above multi-component densitometer, when applied to developer concentration measurement, a matrix is used to show the relationship between ultrasonic propagation velocity and electromagnetic conductivity measured in advance at a constant temperature for each combination of alkali concentration and resin concentration. As described above, it is possible to accurately estimate and calculate the alkali concentration and the resin concentration from the measured values based on the matrix. As the multi-component concentration meter as described above, an ultrasonic multi-component concentration meter for liquid known as a trade name “FUD-1 Model-51” manufactured by Fuji Kogyo Co., Ltd. can be suitably used. In the present invention, the densitometer may be provided separately with an alkali concentration detection densitometer and a resin concentration detection densitometer.
液面計（１１）としては、差圧型、フロート型、光電センサー型、超音波型などの信号出力可能な各種の液面計測機器を使用できる。液面計（１１）は、調整槽（１）内の現像液の液面を検出し、前述の開閉弁（５１）及び（５２）並びに後述する切替弁（４）を制御するために使用される。すなわち、液面計（１１）は、調整槽の収容範囲内の予め設定された上限量（Ｈ）（例えば最大収容量）と、現像プロセス（８）へ安全に供給操作し得る予め設定された下限量（Ｌ）とを検出し、それぞれ所定の信号を出力すると共に、調整槽（１）の液量の基準となる液面レベルを常時検出して信号出力する様に設定される。 As the liquid level gauge (11), various liquid level measuring devices capable of outputting signals such as a differential pressure type, a float type, a photoelectric sensor type, and an ultrasonic type can be used. The level gauge (11) is used for detecting the level of the developer in the adjustment tank (1) and controlling the on-off valves (51) and (52) and the switching valve (4) described later. The That is, the liquid level gauge (11) is set in advance so that it can be safely supplied to the developing process (8) and the upper limit amount (H) set in advance within the accommodation range of the adjustment tank (H). The lower limit amount (L) is detected and a predetermined signal is output, respectively, and the liquid level serving as a reference for the liquid amount in the adjustment tank (1) is always detected and a signal is output.
本発明の供給装置は、現像プロセス（８）から調整槽（１）に至り且つポンプ（図示省略）が介装された回収流路（２２）を備えており、現像プロセス（８）から排出された使用済現像液を回収流路（２２）によって調整槽（１）に回収する様になされている。また、調整槽（１）から現像プロセス（８）に至り且つポンプ（７１）が介装された供給流路（２１）を備えており、調整槽（１）で再調製された現像液を供給流路（２１）によって現像プロセス（８）に供給する様になされている。 The supply device of the present invention includes a recovery flow path (22) from the development process (8) to the adjustment tank (1) and provided with a pump (not shown), and is discharged from the development process (8). The used developer is recovered in the adjustment tank (1) by the recovery channel (22). Further, a supply flow path (21) from the adjustment tank (1) to the development process (8) and provided with a pump (71) is provided, and the reconstituted developer is supplied in the adjustment tank (1). The flow path (21) supplies the developing process (8).
本発明の供給装置においては、必要量よりも多くの量の使用済現像液が調整槽（１）に回収されるのを規制するため、回収流路（２２）には、現像プロセス（８）から送液される使用済現像液を装置外に排出する排出流路（２３）が設けられる。排出流路（２３）は、回収流路（２２）の途中に配置された切替弁（４）を介して回収流路（２２）から分岐して設けられる。なお、上記の様な調整槽（１）、現像液原液を供給する機構、新たな現像液または希釈水を供給する機構、供給流路（２１）及び回収流路（２２）を含む系内は、現像液の空気との接触を防止するため、窒素などの不活性ガスによってシールする様になされている。 In the supply device of the present invention, the collection channel (22) is provided with a development process (8) in order to regulate that a larger amount of used developer than required is collected in the adjustment tank (1). A discharge channel (23) for discharging the used developer fed from the outside to the outside of the apparatus is provided. The discharge channel (23) is provided to be branched from the recovery channel (22) via a switching valve (4) disposed in the middle of the recovery channel (22). The system including the adjustment tank (1), the mechanism for supplying the developer stock solution, the mechanism for supplying a new developer or dilution water, the supply channel (21), and the recovery channel (22) is as follows. In order to prevent the developer from coming into contact with air, the developer is sealed with an inert gas such as nitrogen.
本発明の供給装置においては、装置全体の稼働制御の他、上記の様な濃度計（１２）及び液面計（１１）の測定に基づいて開閉弁（５１）、（５２）及び切替弁（４）を制御するための演算機能を有する制御装置（図示省略）が設けられる。斯かる制御装置は、各計測機器の信号をデジタル変換する入力装置と、プログラムコントローラやコンピュータ等の演算処理装置と、演算処理装置からの制御信号をアナログ変換する出力装置とを含む。そして、本発明の供給装置は、上記の制御装置の機能により、調整槽（１）の現像液のアルカリ濃度、樹脂濃度および液面を検出し、再調製される現像液の量が調整槽（１）の収容範囲内の予め設定された上限量（Ｈ）となる様に、使用済現像液の使用量を算出し、調整槽（１）に回収された使用済現像液の量が前記の使用量を超えた場合に切替弁（４）を制御し、排出流路（２３）から使用済現像液を装置外へ排出する様に構成される。 In the supply device of the present invention, in addition to the operation control of the entire device, the on-off valves (51), (52) and the switching valve (on the basis of the measurements of the concentration meter (12) and the liquid level meter (11) as described above ( A control device (not shown) having an arithmetic function for controlling 4) is provided. Such a control device includes an input device that digitally converts the signals of each measuring instrument, an arithmetic processing device such as a program controller and a computer, and an output device that converts a control signal from the arithmetic processing device into an analog signal. The supply device of the present invention detects the alkali concentration, the resin concentration and the liquid level of the developer in the adjustment tank (1) by the function of the control device, and the amount of the developer to be reconstituted is adjusted in the adjustment tank ( The usage amount of the used developer is calculated so that the upper limit amount (H) set in advance within the accommodation range of 1), and the amount of the used developer collected in the adjustment tank (1) is the above-mentioned amount. When the usage amount is exceeded, the switching valve (4) is controlled, and the used developer is discharged from the apparatus through the discharge channel (23).
本発明の供給装置の機能は以下の通りである。すなわち、本発明の供給装置では、現像プロセス（８）で排出された使用済現像液が回収流路（２２）を通じて調整槽（１）に回収される。調整槽（１）においては、撹拌手段により使用済現像液を撹拌し且つ温度調節手段により使用済現像液を一定温度に保持する。そして、濃度計（１２）により使用済現像液のアルカリ濃度および樹脂濃度を測定する。 The function of the supply device of the present invention is as follows. That is, in the supply device of the present invention, the used developer discharged in the development process (8) is collected in the adjustment tank (1) through the collection channel (22). In the adjustment tank (1), the used developer is stirred by the stirring means, and the used developer is kept at a constant temperature by the temperature adjusting means. Then, the alkali concentration and the resin concentration of the used developer are measured by the densitometer (12).
一方、制御装置は、上記の濃度計（１２）からの信号に基づき、一定のアルカリ濃度（例えばＴＭＡＨ濃度２．３８質量％）及び一定範囲の樹脂濃度の現像液を調整槽（１）の収容範囲内の上限量（Ｈ）だけ再調製するのに必要な使用済現像液の使用量（回収量）、および、現像液原液または新たな現像液（若しくは希釈水）の追加供給量を演算する。 On the other hand, based on the signal from the densitometer (12), the control device accommodates a developer having a constant alkali concentration (for example, TMAH concentration 2.38 mass%) and a resin concentration within a certain range in the adjustment tank (1). Calculate the used amount (recovered amount) of the spent developer necessary for re-preparing only the upper limit amount (H) within the range, and the additional supply amount of the developer stock solution or new developer (or diluted water). .
次いで、制御装置は、液面計（１１）からの信号を参照しながら、必要に応じて開閉弁（５２）を制御して調整槽（１）に所要量の現像液原液を供給し、また、必要に応じて開閉弁（５１）を制御して調整槽（１）に所要量の新たな現像液（又は希釈水）を供給する。そして、液面計（１１）の信号に基づき、調整槽（１）に回収された使用済現像液の量が上記の使用量（再調製に必要な量）を超えた場合には、切替弁（４）を切換え操作し、現像プロセス（８）から回収流路（２２）を通じて送液される使用済現像液を排出流路（２３）から排出する。 Next, the control device controls the on-off valve (52) as necessary while referring to the signal from the liquid level gauge (11) to supply a required amount of the developer stock solution to the adjustment tank (1). If necessary, the opening / closing valve (51) is controlled to supply a necessary amount of new developer (or dilution water) to the adjustment tank (1). Then, based on the signal from the liquid level gauge (11), when the amount of the used developer recovered in the adjustment tank (1) exceeds the above-mentioned usage amount (the amount necessary for re-preparation), the switching valve (4) is switched, and the used developer fed from the development process (8) through the recovery channel (22) is discharged from the discharge channel (23).
なお、アルカリ濃度や樹脂濃度の調節のための現像液原液や希釈水あるいは新たな現像液（新液）の供給制御は、濃度計（１２）による検出濃度に基づき、現像液原液の供給量、希釈水、新液の供給量をカスケード制御して行うことが出来、斯かる制御においては、例えば、特開平１０−１８００７６号公報に記載の「アルカリ現像原液の希釈方法および希釈装置」にて開示されたいわゆる漸近法が利用できる。 Note that the supply control of the developer stock solution, dilution water or new developer (new solution) for adjusting the alkali concentration or resin concentration is based on the detected concentration by the densitometer (12), The supply amount of the dilution water and the new solution can be controlled by cascade control. Such control is disclosed in, for example, “Dilution method and dilution apparatus of alkali developing stock solution” described in JP-A-10-180076. So-called asymptotic methods can be used.
本発明の供給装置においては、上記の様に、再調製される現像液の全体量が調整槽（１）の収容範囲内の例えば上限量（Ｈ）となる様に、現像液原液または新たな現像液もしくは希釈水の追加供給量と共に、再調製に必要な使用済現像液の使用量を算出し、当該使用量を超える量の使用済現像液については、調整槽（１）に回収することなく、調整槽（１）の上流側の排出流路（２３）から排出するため、調整槽（１）における現像液の過剰な再調製を防止できる。その結果、廃棄されることによる現像液原液または新たな現像液もしくは希釈水のロスを防止することが出来る。 In the supply device of the present invention, as described above, the developer stock solution or the new developer solution is prepared so that the total amount of the re-prepared developer becomes, for example, the upper limit amount (H) within the accommodation range of the adjustment tank (1). Calculate the used amount of used developer necessary for re-preparation along with the additional supply amount of developer or diluted water, and collect the used developer exceeding the used amount in the adjustment tank (1). However, since it discharges from the discharge flow path (23) on the upstream side of the adjustment tank (1), excessive re-preparation of the developer in the adjustment tank (1) can be prevented. As a result, it is possible to prevent loss of the developer stock solution or new developer or diluted water due to disposal.
因に、上記の第１の態様に係る供給装置を稼働させ、使用済現像液として回収されたＴＭＡＨの水溶液を調整槽（１）で再調製し、ＴＭＡＨ濃度を２．３８０質量％、樹脂濃度を１０００±１５０ｐｐｍに調節して現像プロセス（８）に供給したところ、使用済現像液の全量を回収して再生していた従来の供給装置に比べ、現像原液および新たな現像液（新液）の消費量が新液換算で約３０％低減できた。 Incidentally, the supply device according to the first aspect is operated, and the aqueous solution of TMAH recovered as a used developer is re-prepared in the adjustment tank (1), the TMAH concentration is 2.380% by mass, the resin concentration Was adjusted to 1000 ± 150 ppm and supplied to the development process (8). Compared with the conventional supply device that recovered and regenerated the entire amount of the used developer, a developing stock solution and a new developer (new solution) Was reduced by about 30% in terms of new solution.
次に、本発明の第２の態様に係る供給装置について説明する。第２の態様の供給装置は、他の現像プロセス（８ｂ）から排出される樹脂濃度の低い使用済現像液を対象の現像プロセス（８）に有効利用するための装置である。第２の態様において、他の現像プロセス（８ｂ）は、対象の現像プロセス（８）とは異なる現像処理（異なる被処理物の処理や異なる条件による処理）を行うプロセスであり、第２の態様は、他の現像プロセス（８ｂ）から排出される使用済現像液の樹脂濃度が対象の現像プロセス（８）から排出される使用済現像液の樹脂濃度よりも低い場合に適用される。 Next, the supply device according to the second aspect of the present invention will be described. The supply apparatus according to the second aspect is an apparatus for effectively using the used developer having a low resin concentration discharged from the other development process (8b) for the development process (8). In the second aspect, the other development process (8b) is a process for performing development processing (processing of different objects to be processed or processing under different conditions) different from the target development process (8). Is applied when the resin concentration of the used developer discharged from the other developing process (8b) is lower than the resin concentration of the used developer discharged from the target developing process (8).
本発明の供給装置は、図２に示す様に、現像液原液を供給する機構、および、新たな現像液または希釈水を供給する機構が付設された調整槽（１）と、現像プロセス（８）から回収された使用済現像液を調整槽（１）に送液する回収流路（２２）と、調整槽（１）で再調製された現像液を現像プロセス（８）に送液する供給流路（２１）とを備えている。調整槽（１）、供給流路（２１）、回収流路（２２）の構成は、前述の第１の態様におけるのと同様である。また、調整槽（１）には、第１の態様におけるのと同様の濃度計（１２）並びに液面計（１１）が設けられ、回収流路（２２）には、第１の態様におけるのと同様の排出流路（２３）が設けられる。 As shown in FIG. 2, the supply device of the present invention comprises a mechanism for supplying a developing solution stock solution, an adjustment tank (1) provided with a mechanism for supplying a new developer or dilution water, and a developing process (8). ) A collecting flow path (22) for sending the used developer collected from the adjustment tank (1) and a supply for feeding the developer re-prepared in the adjustment tank (1) to the development process (8). And a flow path (21). The configurations of the adjustment tank (1), the supply channel (21), and the recovery channel (22) are the same as those in the first embodiment. The adjustment tank (1) is provided with the same concentration meter (12) and liquid level meter (11) as in the first embodiment, and the recovery channel (22) is provided with the same as in the first embodiment. The same discharge channel (23) is provided.
第２の態様に係る供給装置は、回収貯槽（６）及び混合流路（２５）を備えている点が前述の態様と異なる。すなわち、図２に示す供給装置は、上記の構成に加え、他の現像プロセス（８ｂ）から回収された使用済現像液を貯留する回収貯槽（６）と、当該回収貯槽から調整槽（１）に使用済現像液を送液する混合流路（２５）とを備えている。 The supply apparatus which concerns on a 2nd aspect differs from the above-mentioned aspect in the point provided with the collection | recovery storage tank (6) and the mixing flow path (25). That is, the supply device shown in FIG. 2 includes, in addition to the above configuration, a recovery storage tank (6) for storing used developer recovered from another development process (8b), and an adjustment tank (1) from the recovery storage tank. And a mixing channel (25) for feeding the used developer.
他の現像プロセス（８ｂ）は、従来型の他の現像液供給装置から現像液をされ、前記の他の現像液供給装置は、調整槽（１ｂ）、他の現像プロセス（８ｂ）への現像液の供給流路（２１ｂ）、他の現像プロセス（８ｂ）から排出される使用済現像液の回収流路（２２ｂ）とを備えており、使用済現像液の一部は、回収流路（２２ｂ）に切替弁（４ｂ）を設け、これを切換え操作することにより、回収流路（２２ｂ）から分岐した排出流路（２４）を通じて上記の回収貯槽（６）に回収することが出来る。 In the other development process (8b), the developer is taken from another conventional developer supply apparatus, and the other developer supply apparatus is used to develop the adjustment tank (1b) and the other development process (8b). A liquid supply flow path (21b) and a used developer recovery flow path (22b) discharged from another development process (8b). By providing a switching valve (4b) in 22b) and switching the switching valve (4b), it can be recovered in the recovery storage tank (6) through the discharge channel (24) branched from the recovery channel (22b).
回収貯槽（６）は、例えば、５００〜３０００リットル程度の内容積の耐腐食性を備えた容器によって構成される。図示しないが、回収貯槽（６）には、後述する様に調整槽（１）に供給した際に当該調整槽内の現像液の温度変化を防止して濃度測定を正確に行うため、当該回収貯槽内の現像液の温度を一定に保持する温度調節手段が付設される。斯かる温度調節手段は、調整槽（１）におけるのと同様に、例えば、循環流路とその途中に配置された恒温槽とから構成される。 The recovery storage tank (6) is constituted by a container having an internal volume of about 500 to 3000 liters and corrosion resistance. Although not shown in the drawing, the recovery storage tank (6) is provided with the recovery storage tank (6) in order to accurately measure the concentration by preventing the temperature change of the developer in the adjustment tank when supplied to the adjustment tank (1) as described later. A temperature adjusting means for keeping the temperature of the developer in the storage tank constant is added. Such temperature adjusting means is composed of, for example, a circulation channel and a thermostatic chamber disposed in the middle thereof, as in the adjustment tank (1).
混合流路（２５）は、回収貯槽（６）から調整槽（１）に亙って設けられ、混合流路（２５）には、送液用のポンプ（７２）及び開閉弁（５３）が付設される。これにより、回収貯槽（６）に一旦回収された使用済現像液は、ポンプ（７２）を稼働させ、開閉弁（５３）を開放することにより、混合流路（２５）を通じて調整槽（１）に供給することが出来る。 The mixing flow path (25) is provided from the collection storage tank (6) to the adjustment tank (1), and the mixing flow path (25) includes a pump (72) for feeding liquid and an on-off valve (53). It is attached. Thus, the used developer once recovered in the recovery storage tank (6) operates the pump (72) and opens the on-off valve (53), thereby opening the adjustment tank (1) through the mixing channel (25). Can be supplied.
また、第２の態様においても、第１の態様と同様の制御装置（図示省略）が設けられ、斯かる制御装置により、第１の態様と同様に、開閉弁（５１）、（５２）及び切替弁（４）の作動を制御し、使用済現像液の回収および排出を制御する様になされている。また、第２の態様に係る供給装置においては、切替弁（４ｂ）の作動、ならびに、ポンプ（７２）及び開閉弁（５３）の作動も上記の制御装置によって制御する様になされている。 Also in the second mode, a control device (not shown) similar to that in the first mode is provided, and with this control device, as in the first mode, the on-off valves (51), (52) and The operation of the switching valve (4) is controlled to control the collection and discharge of the used developer. In the supply device according to the second aspect, the operation of the switching valve (4b) and the operations of the pump (72) and the on-off valve (53) are also controlled by the control device.
更に、第２の態様に係る供給装置は、上記の制御装置の機能により、前述の様に回収貯槽（６）の使用済現像液の樹脂濃度が調整槽（１）の現像液の樹脂濃度よりも低い場合、調整槽（１）にて樹脂濃度を低くする操作、すなわち、希釈操作の際、回収貯槽（６）の使用済現像液を混合流路（２５）から調整槽（１）に供給する様に構成される。なお、第２の態様において、調整槽（１）に対する使用済現像液の回収量の制御では、現像プロセス（８）から排出された使用済現像液の使用量と他の現像プロセス（８ｂ）から排出された使用済現像液の使用量との合計量を再調整に利用する使用済現像液の使用量として取り扱われる。 Furthermore, the supply device according to the second aspect allows the resin concentration of the used developer in the collection storage tank (6) to be greater than the resin concentration of the developer in the adjustment tank (1) as described above by the function of the control device. If the value is too low, the spent developing solution in the collection storage tank (6) is supplied from the mixing channel (25) to the adjustment tank (1) in the operation of lowering the resin concentration in the adjustment tank (1), that is, in the dilution operation. Configured to do. In the second aspect, in the control of the collected amount of the used developer with respect to the adjustment tank (1), the used amount of the used developer discharged from the developing process (8) and the other developing processes (8b) are used. The total amount of the used developer that has been discharged is used as the amount of used developer that is used for readjustment.
本発明の第２の態様に係る供給装置の機能は以下の通りである。すなわち、第２の態様に係る供給装置においては、切替弁（４ｂ）の操作により、前述の他の現像液供給装置（調整槽（１ｂ）を含む装置）の運転状況に応じて、予め、他の現像プロセス（８ｂ）から排出された使用済現像液を回収貯槽（６）に貯留しておく。 The function of the supply apparatus according to the second aspect of the present invention is as follows. That is, in the supply device according to the second aspect, the operation of the switching valve (4b) is performed in advance according to the operation status of the other developer supply device (the device including the adjustment tank (1b)). The used developer discharged from the developing process (8b) is stored in the recovery storage tank (6).
一方、第２の態様に係る供給装置において、現像プロセス（８）の現像液を再調整する場合は、第１の態様におけるのと同様に、現像プロセス（８）から排出された使用済現像液を調整槽（１）に回収すると共に、濃度計（１２）により使用済現像液のアルカリ濃度および樹脂濃度を測定する。そして、必要に応じて現像液原液または新たな現像液（若しくは希釈水）を追加供給する。 On the other hand, in the supply device according to the second aspect, when the developer in the development process (8) is readjusted, the spent developer discharged from the development process (8) is the same as in the first aspect. Is collected in the adjustment tank (1), and the alkali concentration and resin concentration of the used developer are measured by the densitometer (12). Then, if necessary, a developer stock solution or a new developer (or dilution water) is additionally supplied.
その際、濃度計（１２）の測定により、調整槽（１）内の現像液の樹脂濃度が目標濃度を越えていると判別された場合には、混合流路（２５）のポンプ（７２）を作動させ且つ開閉弁（５３）を開放する。これにより、他の現像プロセス（８ｂ）から回収された回収貯槽（６）の樹脂濃度の低い使用済現像液を調整槽（１）に供給する。その結果、現像液原液および希釈水、あるいは、新たな現像液を多量に使用することなく、調整槽（１）内の現像液の樹脂濃度を目標濃度まで下げることが出来る。 At this time, if it is determined by the measurement of the densitometer (12) that the resin concentration of the developer in the adjustment tank (1) exceeds the target concentration, the pump (72) of the mixing channel (25). And the on-off valve (53) is opened. Thereby, the used developing solution with low resin concentration of the collection | recovery storage tank (6) collect | recovered from other image development processes (8b) is supplied to an adjustment tank (1). As a result, the resin concentration of the developer in the adjustment tank (1) can be lowered to the target concentration without using a large amount of the developer stock solution and dilution water or a new developer.
上記の様に、本発明の第２の態様に係る供給装置においては、調整槽（１）にて現像プロセス（８）から排出された使用済現像液を再調整する際、他の現像プロセス（８ｂ）から排出された樹脂濃度の低い使用済現像液を希釈用として有効に再利用するため、現像液原液および希釈水、あるいは、新たな現像液の追加供給量を低減でき、その結果、現像プロセス（８）における処理コストを一層低減することが出来る。 As described above, in the supply device according to the second aspect of the present invention, when the spent developer discharged from the development process (8) is readjusted in the adjustment tank (1), another development process ( In order to effectively reuse the used developer having a low resin concentration discharged from 8b) for dilution, it is possible to reduce the additional supply amount of the developer stock solution and dilution water, or a new developer, and as a result, development The processing cost in the process (8) can be further reduced.
因に、上記の第２の態様に係る供給装置を稼働させ、現像プロセス（８）から使用済現像液として回収されたＴＭＡＨの水溶液を再調製するに際し、他の現像プロセス（８ｂ）から回収された使用済現像液（樹脂濃度５００ｐｐｍ）を希釈用に使用し、調整槽（１）でＴＭＡＨ濃度を２．３８０質量％、樹脂濃度を１０００±１５０ｐｐｍに調節して現像プロセス（８）に供給したところ、１つの現像プロセス（８）から使用済現像液の全量を回収して再生していた従来の供給装置に比べ、現像原液および新たな現像液（新液）の消費量が新液換算で約４５％低減できた。 Incidentally, when the supply device according to the second aspect is operated and the aqueous solution of TMAH recovered as the used developer from the development process (8) is re-prepared, it is recovered from the other development process (8b). The used developer (resin concentration 500 ppm) was used for dilution, and the TMAH concentration was adjusted to 2.380% by mass and the resin concentration was adjusted to 1000 ± 150 ppm in the adjustment tank (1), and supplied to the development process (8). However, compared with the conventional supply device that collects and regenerates all of the used developer from one development process (8), the consumption of the developing stock solution and the new developer (new solution) is equivalent to the new solution. It was reduced by about 45%.
次に、本発明の第３の態様に係る供給装置について説明する。第３の態様の供給装置は、他の現像プロセス（８ｂ）から排出される樹脂濃度の高い使用済現像液を対象の現像プロセス（８）に有効利用するための装置である。第３の態様において、他の現像プロセス（８ｂ）は、対象の現像プロセス（８）とは異なる現像処理（異なる被処理物の処理や異なる条件による処理）を行うプロセスであり、第３の態様は、他の現像プロセス（８ｂ）から排出される使用済現像液の樹脂濃度が対象の現像プロセス（８）から排出される使用済現像液の樹脂濃度よりも高い場合に適用される。 Next, a supply device according to a third aspect of the present invention will be described. The supply device according to the third aspect is an apparatus for effectively using the used developer having a high resin concentration discharged from the other development process (8b) in the target development process (8). In the third aspect, the other development process (8b) is a process for performing development processing (processing of different objects to be processed or processing under different conditions) different from the target development process (8). Is applied when the resin concentration of the used developer discharged from the other developing process (8b) is higher than the resin concentration of the used developer discharged from the target developing process (8).
本発明の供給装置は、機械構成的には前述の第２の態様に係る供給装置と同様である。すなわち、図２に示す様な装置構成を備えている。そして、第３の態様においても、第１の態様と同様の制御装置（図示省略）が設けられ、斯かる制御装置により、第１の態様と同様に、開閉弁（５１）、（５２）及び切替弁（４）の作動を制御し、使用済現像液の回収および排出を制御する様になされている。また、第２の態様に係る供給装置においては、切替弁（４ｂ）の作動、ならびに、ポンプ（７２）及び開閉弁（５３）の作動も上記の制御装置によって制御する様になされている。 The supply device of the present invention is the same as the supply device according to the second aspect described above in terms of mechanical configuration. That is, an apparatus configuration as shown in FIG. 2 is provided. Also in the third aspect, a control device (not shown) similar to that in the first aspect is provided, and with such a control device, as in the first aspect, the on-off valves (51), (52) and The operation of the switching valve (4) is controlled to control the collection and discharge of the used developer. In the supply device according to the second aspect, the operation of the switching valve (4b) and the operations of the pump (72) and the on-off valve (53) are also controlled by the control device.
第３の態様に係る供給装置は、上記の制御装置の機能により、回収貯槽（６）の使用済現像液の樹脂濃度が調整槽（１）の使用済現像液の樹脂濃度よりも高い場合、調整槽（１）にて樹脂濃度を高くする操作、すなわち、樹脂濃度の調節操作の際、回収貯槽（６）の使用済現像液を混合流路（２５）から調整槽（１）に供給する様に構成されいる点が前述の第２の態様と異なる。なお、調整槽（１）に対する使用済現像液の回収量の制御において、現像プロセス（８）から排出された使用済現像液の使用量と他の現像プロセス（８ｂ）から排出された使用済現像液の使用量との合計量を再調整に利用する使用済現像液の使用量として取り扱われる点は第２の態様と同様である。 When the supply concentration of the used developer in the collection storage tank (6) is higher than the resin concentration of the used developer in the adjustment tank (1) by the function of the control device described above, In the operation of increasing the resin concentration in the adjustment tank (1), that is, in the operation of adjusting the resin concentration, the spent developer in the collection storage tank (6) is supplied from the mixing channel (25) to the adjustment tank (1). This is different from the second aspect described above. In the control of the collected amount of the used developer with respect to the adjustment tank (1), the used amount of the used developer discharged from the developing process (8) and the used developer discharged from the other developing process (8b). The point that it is handled as the used amount of the used developer that is used for readjustment is the same as in the second aspect.
本発明の第３の態様に係る供給装置の機能は以下の通りである。すなわち、第３の態様に係る供給装置においては、予め、第２の態様の場合と同様に、切替弁（４ｂ）の操作により、他の現像プロセス（８ｂ）から排出された使用済現像液を回収貯槽（６）に貯留しておく。そして、現像プロセス（８）の現像液を再調整する場合は、第１の態様におけるのと同様に、現像プロセス（８）から排出された使用済現像液を調整槽（１）に回収すると共に、濃度計（１２）により使用済現像液のアルカリ濃度および樹脂濃度を測定し、必要に応じて現像液原液または新たな現像液（若しくは希釈水）を追加供給する。 The function of the supply device according to the third aspect of the present invention is as follows. That is, in the supply device according to the third aspect, as in the case of the second aspect, the spent developer discharged from the other development process (8b) is previously discharged by operating the switching valve (4b). Store in the collection storage tank (6). When the developer in the development process (8) is readjusted, the spent developer discharged from the development process (8) is collected in the adjustment tank (1) as in the first embodiment. Then, the alkali concentration and the resin concentration of the used developer are measured by the densitometer (12), and a developer stock solution or a new developer (or dilution water) is additionally supplied as necessary.
その際、濃度計（１２）の測定により、調整槽（１）内の現像液の樹脂濃度が目標濃度をよりも低いと判別された場合には、混合流路（２５）のポンプ（７２）を作動させ且つ開閉弁（５３）を開放することにより、他の現像プロセス（８ｂ）から回収された回収貯槽（６）の樹脂濃度の高い使用済現像液を調整槽（１）に供給する。これにより、従来は廃棄されていた他の現像プロセス（８ｂ）の使用済現像液を有効利用することが出来る。しかも、対象の現像プロセス（８）に対し、常に所定の樹脂濃度に保たれた現像液を供給できるため、現像プロセス（８）をより安定させることが出来る。 At that time, if it is determined by the measurement of the concentration meter (12) that the resin concentration of the developer in the adjustment tank (1) is lower than the target concentration, the pump (72) of the mixing channel (25). And the open / close valve (53) is opened to supply a used developer having a high resin concentration in the recovery storage tank (6) recovered from the other development process (8b) to the adjustment tank (1). As a result, it is possible to effectively use the used developer of the other development process (8b) that has been discarded. In addition, since the developer always maintained at a predetermined resin concentration can be supplied to the target development process (8), the development process (8) can be further stabilized.
上記の様に、本発明の第３の態様に係る供給装置においては、調整槽（１）にて現像プロセス（８）から排出された使用済現像液を再調整する際、他の現像プロセス（８ｂ）から排出された樹脂濃度の高い使用済現像液を樹脂濃度調節用として有効に再利用できるため、現像プロセス（８）及び他の現像プロセス（８ｂ）を含むプロセス全体として処理コストを低減することが出来、しかも、比較的高い樹脂濃度の現像液を必要とする現像プロセス（８）をより安定させることが出来る。 As described above, in the supply device according to the third aspect of the present invention, when the used developer discharged from the development process (8) is readjusted in the adjustment tank (1), another development process ( Since the spent developer having a high resin concentration discharged from 8b) can be effectively reused for adjusting the resin concentration, the processing cost of the entire process including the developing process (8) and the other developing process (8b) is reduced. In addition, the development process (8) that requires a developer having a relatively high resin concentration can be made more stable.
因に、上記の第３の態様に係る供給装置を稼働させ、現像プロセス（８）から使用済現像液として回収されたＴＭＡＨの水溶液を再調製するに際し、他の現像プロセス（８ｂ）から回収された樹脂濃度の高い使用済現像液（樹脂濃度２０００ｐｐｍ）を樹脂濃度調節用に使用し、調整槽（１）でＴＭＡＨ濃度を２．３８０質量％、樹脂濃度を１５００±１５０ｐｐｍに調節して現像プロセス（８）に供給した。その結果、現像プロセス（８）が安定し、現像処理における歩留まりが約５％向上した。更に、１つの現像プロセス（８）から使用済現像液の全量を回収して再生していた従来の供給装置に比べ、プロセス全体として、現像原液および新たな現像液（新液）の消費量が新液換算で約３６％低減できた。 Incidentally, when the TMAH aqueous solution recovered as the used developer from the development process (8) is re-prepared by operating the supply device according to the third aspect, it is recovered from the other development process (8b). Development process with high resin concentration (resin concentration 2000ppm) is used for resin concentration adjustment, TMAH concentration is adjusted to 2.380% by mass and resin concentration is 1500 ± 150ppm in the adjustment tank (1). (8). As a result, the development process (8) was stabilized and the yield in the development process was improved by about 5%. Furthermore, compared to the conventional supply device that collects and regenerates the entire amount of used developer from one development process (8), the entire process consumes a developing stock solution and a new developer (new solution). It was reduced by about 36% in terms of new solution.
１ ：調整槽
１１：液面計
１２：濃度計
２１：供給流路
２２：回収流路
２３：排出流路
２４：排出流路
２５：混合流路
３１：新液供給流路（新たな現像液を供給する機構）
３２：原液供給流路（現像液原液を供給する機構）
４ ：切替弁
５１：開閉弁
５２：開閉弁
５３：開閉弁
６ ：回収貯槽
７１：ポンプ
７２：ポンプ
８ ：現像プロセス
８ｂ：他の現像プロセス
1: Adjustment tank 11: Level gauge 12: Concentration meter 21: Supply flow path 22: Recovery flow path 23: Discharge flow path 24: Discharge flow path 25: Mixing flow path 31: New liquid supply flow path (new developer) Supply mechanism)
32: Stock solution supply channel (mechanism for supplying developer stock solution)
4: Switching valve 51: On-off valve 52: On-off valve 53: On-off valve 6: Collection storage tank 71: Pump 72: Pump 8:
Claims (2)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005364396A JP4839820B2 (en) | 2005-12-19 | 2005-12-19 | Developer supply device |
| TW095136736A TWI402634B (en) | 2005-12-19 | 2006-10-03 | The supply device for the developer |
| KR1020060103878A KR20070065209A (en) | 2005-12-19 | 2006-10-25 | Apparatus for providing develper soultion |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005364396A JP4839820B2 (en) | 2005-12-19 | 2005-12-19 | Developer supply device |
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| Publication Number | Publication Date |
|---|---|
| JP2007171232A JP2007171232A (en) | 2007-07-05 |
| JP4839820B2 true JP4839820B2 (en) | 2011-12-21 |
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| JP2005364396A Active JP4839820B2 (en) | 2005-12-19 | 2005-12-19 | Developer supply device |
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| Country | Link |
|---|---|
| JP (1) | JP4839820B2 (en) |
| KR (1) | KR20070065209A (en) |
| TW (1) | TWI402634B (en) |
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| JP6712415B2 (en) * | 2017-01-23 | 2020-06-24 | 株式会社平間理化研究所 | Developer management device |
| JP2018120901A (en) * | 2017-01-23 | 2018-08-02 | 株式会社平間理化研究所 | Development device |
| JP7202229B2 (en) * | 2019-03-20 | 2023-01-11 | 株式会社Ｓｃｒｅｅｎホールディングス | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
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| JP3728945B2 (en) * | 1998-10-30 | 2005-12-21 | オルガノ株式会社 | Method and apparatus for recovering and reusing developer from photoresist developer waste |
| JP3686822B2 (en) * | 2000-05-19 | 2005-08-24 | 東京エレクトロン株式会社 | Development processing apparatus and development processing method |
| JP3894104B2 (en) * | 2002-11-15 | 2007-03-14 | 東京エレクトロン株式会社 | Developing method, developing apparatus, and developer regenerating apparatus |
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| Publication number | Publication date |
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| KR20070065209A (en) | 2007-06-22 |
| TW200728938A (en) | 2007-08-01 |
| TWI402634B (en) | 2013-07-21 |
| JP2007171232A (en) | 2007-07-05 |
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