TWI263865B - Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor - Google Patents

Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

Info

Publication number
TWI263865B
TWI263865B TW089102927A TW89102927A TWI263865B TW I263865 B TWI263865 B TW I263865B TW 089102927 A TW089102927 A TW 089102927A TW 89102927 A TW89102927 A TW 89102927A TW I263865 B TWI263865 B TW I263865B
Authority
TW
Taiwan
Prior art keywords
composition containing
photoresist composition
plasma etch
metal oxide
titania precursor
Prior art date
Application number
TW089102927A
Other languages
English (en)
Inventor
Tony D Flaim
Douglas J Guerrero
Michelle R Fowler
William J James
Vladimir Petrovsky
Original Assignee
Brewer Science Inc
Univ Missouri
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc, Univ Missouri filed Critical Brewer Science Inc
Application granted granted Critical
Publication of TWI263865B publication Critical patent/TWI263865B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Drying Of Semiconductors (AREA)
TW089102927A 1999-03-01 2000-02-21 Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor TWI263865B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/259,229 US6303270B1 (en) 1999-03-01 1999-03-01 Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

Publications (1)

Publication Number Publication Date
TWI263865B true TWI263865B (en) 2006-10-11

Family

ID=22984091

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089102927A TWI263865B (en) 1999-03-01 2000-02-21 Highly plasma etch-resistant photoresist composition containing a photosensitive polymeric titania precursor

Country Status (3)

Country Link
US (1) US6303270B1 (zh)
TW (1) TWI263865B (zh)
WO (1) WO2000052531A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI576663B (zh) * 2014-10-28 2017-04-01 三星Sdi 股份有限公司 光固化性組成物以及含有該組成物的封裝裝置
TWI581329B (zh) * 2015-04-23 2017-05-01 東芝股份有限公司 圖案形成方法

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EP1231511B1 (en) * 2001-02-09 2014-04-02 Dai Nippon Printing Co., Ltd. Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording
US6664023B2 (en) * 2001-03-13 2003-12-16 International Business Machines Corporation Controlled aging of photoresists for faster photospeed
US6740469B2 (en) * 2002-06-25 2004-05-25 Brewer Science Inc. Developer-soluble metal alkoxide coatings for microelectronic applications
US7189204B2 (en) 2002-12-04 2007-03-13 Cardiac Pacemakers, Inc. Sleep detection using an adjustable threshold
US20040171743A1 (en) * 2003-01-21 2004-09-02 Terry Brewer, Ph.D. Hybrid organic-inorganic polymer coatings with high refractive indices
US7979122B2 (en) 2003-04-11 2011-07-12 Cardiac Pacemakers, Inc. Implantable sudden cardiac death prevention device with reduced programmable feature set
US20040230229A1 (en) * 2003-04-11 2004-11-18 Lovett Eric G. Hybrid transthoracic/intrathoracic cardiac stimulation devices and methods
US7302294B2 (en) 2003-04-11 2007-11-27 Cardiac Pacemakers, Inc. Subcutaneous cardiac sensing and stimulation system employing blood sensor
US7570997B2 (en) * 2003-04-11 2009-08-04 Cardiac Pacemakers, Inc. Subcutaneous cardiac rhythm management with asystole prevention therapy
US8002553B2 (en) 2003-08-18 2011-08-23 Cardiac Pacemakers, Inc. Sleep quality data collection and evaluation
US7787946B2 (en) 2003-08-18 2010-08-31 Cardiac Pacemakers, Inc. Patient monitoring, diagnosis, and/or therapy systems and methods
US7510531B2 (en) 2003-09-18 2009-03-31 Cardiac Pacemakers, Inc. System and method for discrimination of central and obstructive disordered breathing events
US7887493B2 (en) 2003-09-18 2011-02-15 Cardiac Pacemakers, Inc. Implantable device employing movement sensing for detecting sleep-related disorders
US7396333B2 (en) 2003-08-18 2008-07-08 Cardiac Pacemakers, Inc. Prediction of disordered breathing
US8606356B2 (en) 2003-09-18 2013-12-10 Cardiac Pacemakers, Inc. Autonomic arousal detection system and method
US7656768B2 (en) * 2004-01-27 2010-02-02 Micron Technology, Inc. Phase masks for use in holographic data storage
US7680534B2 (en) 2005-02-28 2010-03-16 Cardiac Pacemakers, Inc. Implantable cardiac device with dyspnea measurement
US7479114B2 (en) * 2005-12-01 2009-01-20 Cardiac Pacemakers, Inc. Determining blood gas saturation based on measured parameter of respiration
US7767926B2 (en) * 2006-03-29 2010-08-03 Tokyo Electron Limited Method and system for dry development of a multi-layer mask using sidewall passivation and mask passivation
WO2007127758A2 (en) * 2006-04-24 2007-11-08 Displaytech, Inc Spatial light modulators with changeable phase masks for use in holographic data storage
US9087739B2 (en) * 2009-10-19 2015-07-21 International Business Machines Corporation Pattern improvement in multiprocess patterning
TWI412459B (zh) * 2009-12-08 2013-10-21 Univ Nat Taiwan The method of forming a roller for embossing
US8647809B2 (en) 2011-07-07 2014-02-11 Brewer Science Inc. Metal-oxide films from small molecules for lithographic applications
US9070548B2 (en) 2012-03-06 2015-06-30 Rohm And Haas Electronic Materials Llc Metal hardmask compositions
US8795774B2 (en) * 2012-09-23 2014-08-05 Rohm And Haas Electronic Materials Llc Hardmask
US9171720B2 (en) 2013-01-19 2015-10-27 Rohm And Haas Electronic Materials Llc Hardmask surface treatment
US9136123B2 (en) 2013-01-19 2015-09-15 Rohm And Haas Electronic Materials Llc Hardmask surface treatment
GB201405335D0 (en) 2014-03-25 2014-05-07 Univ Manchester Resist composition
JP2015199916A (ja) * 2014-04-02 2015-11-12 Jsr株式会社 膜形成用組成物及びパターン形成方法
US9515272B2 (en) 2014-11-12 2016-12-06 Rohm And Haas Electronic Materials Llc Display device manufacture using a sacrificial layer interposed between a carrier and a display device substrate
EP3486290A1 (en) * 2017-11-21 2019-05-22 Allnex Belgium, S.A. Adhesion promoting compounds for apolar substrates
JP7059070B2 (ja) * 2018-03-29 2022-04-25 大阪瓦斯株式会社 樹脂組成物及びその製造方法
CN114527630B (zh) * 2022-04-21 2022-08-05 之江实验室 一种二氧化锆微纳图案的飞秒激光直写方法
CN114755884B (zh) * 2022-06-14 2022-09-16 之江实验室 一种有机无机杂化飞秒激光直写光刻胶

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US5254638A (en) * 1991-03-25 1993-10-19 The Reagents Of The University Of California Composite materials of interpenetrating inorganic and organic polymer networks
US5250395A (en) 1991-07-25 1993-10-05 International Business Machines Corporation Process for imaging of photoresist including treatment of the photoresist with an organometallic compound
US5627013A (en) * 1991-11-14 1997-05-06 Rohm Co., Ltd. Method of forming a fine pattern of ferroelectric film
US5328975A (en) * 1993-04-02 1994-07-12 Ppg Industries, Inc. Ultraviolet radiation absorbing coating
JP3899546B2 (ja) * 1996-03-11 2007-03-28 株式会社豊田中央研究所 層状有機チタノシリケートおよび層状有機チタノシリケートの成形体

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI576663B (zh) * 2014-10-28 2017-04-01 三星Sdi 股份有限公司 光固化性組成物以及含有該組成物的封裝裝置
TWI581329B (zh) * 2015-04-23 2017-05-01 東芝股份有限公司 圖案形成方法

Also Published As

Publication number Publication date
WO2000052531A1 (en) 2000-09-08
US6303270B1 (en) 2001-10-16

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Legal Events

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