TWI262902B - Article having prescribed surface shape and method for producing thereof - Google Patents
Article having prescribed surface shape and method for producing thereofInfo
- Publication number
- TWI262902B TWI262902B TW091103471A TW91103471A TWI262902B TW I262902 B TWI262902 B TW I262902B TW 091103471 A TW091103471 A TW 091103471A TW 91103471 A TW91103471 A TW 91103471A TW I262902 B TWI262902 B TW I262902B
- Authority
- TW
- Taiwan
- Prior art keywords
- article
- film
- hydrolysate
- sol
- surface shape
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G79/00—Macromolecular compounds obtained by reactions forming a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon with or without the latter elements in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L85/00—Compositions of macromolecular compounds obtained by reactions forming a linkage in the main chain of the macromolecule containing atoms other than silicon, sulfur, nitrogen, oxygen and carbon; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0031—Replication or moulding, e.g. hot embossing, UV-casting, injection moulding
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Silicon Polymers (AREA)
- Laminated Bodies (AREA)
- Chemically Coating (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001055431 | 2001-02-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWI262902B true TWI262902B (en) | 2006-10-01 |
Family
ID=18915618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW091103471A TWI262902B (en) | 2001-02-28 | 2002-02-26 | Article having prescribed surface shape and method for producing thereof |
Country Status (7)
Country | Link |
---|---|
US (1) | US6849350B2 (zh) |
EP (1) | EP1277571A4 (zh) |
KR (1) | KR20020093954A (zh) |
CN (1) | CN1457293A (zh) |
CA (1) | CA2407378A1 (zh) |
TW (1) | TWI262902B (zh) |
WO (1) | WO2002068183A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI394802B (zh) * | 2007-11-22 | 2013-05-01 | Shinetsu Chemical Co | 含金屬氧化物之膜形成用組成物,含金屬氧化物膜、含金屬氧化物膜所形成之基板及使用其之圖型形成方法 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7081278B2 (en) | 2002-09-25 | 2006-07-25 | Asml Holdings N.V. | Method for protection of adhesives used to secure optics from ultra-violet light |
US6917471B2 (en) * | 2003-01-24 | 2005-07-12 | Sumitomo Electric Industries, Ltd. | Diffraction grating element |
WO2005095101A1 (ja) * | 2004-03-31 | 2005-10-13 | Nippon Sheet Glass Company, Limited | 有機無機複合膜が形成された物品およびその製造方法 |
US7556189B2 (en) * | 2004-05-26 | 2009-07-07 | Georgia Tech Research Corporation | Lead-free bonding systems |
JP2005354846A (ja) * | 2004-06-11 | 2005-12-22 | Seiko Epson Corp | 電極基板の製造方法、ならびに、電極基板、静電アクチュエータ、液滴吐出ヘッド、および液滴吐出装置 |
DE102004036343B4 (de) * | 2004-07-27 | 2007-02-15 | Ipgr International Partners In Glass Research | Beschichtungsmaterial für eine Glasform und Verfahren zum Beschichten einer Glasform |
KR100649023B1 (ko) * | 2004-11-09 | 2006-11-28 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서의 제조방법 |
JP4479535B2 (ja) * | 2005-02-21 | 2010-06-09 | セイコーエプソン株式会社 | 光学素子の製造方法 |
WO2007040258A1 (ja) | 2005-10-05 | 2007-04-12 | Nippon Sheet Glass Company, Limited | 有機無機複合膜形成物品 |
US7511813B2 (en) * | 2006-01-26 | 2009-03-31 | Schlumberger Technology Corporation | Downhole spectral analysis tool |
JP5189772B2 (ja) * | 2007-02-09 | 2013-04-24 | 昭和電工株式会社 | 微細パターン転写材料 |
TWI432523B (zh) | 2011-06-21 | 2014-04-01 | Asahi Kasei E Materials Corp | And an inorganic composition for transfer of fine asperity structure |
FR2993266B1 (fr) | 2012-07-13 | 2014-07-18 | Saint Gobain | Vitrage translucide comprenant au moins un motif, de preference transparent |
JPWO2018123537A1 (ja) * | 2016-12-28 | 2019-10-31 | Jsr株式会社 | 感放射線性組成物、パターン形成方法及び金属酸化物 |
KR20190103229A (ko) * | 2017-01-26 | 2019-09-04 | 제이에스알 가부시끼가이샤 | 감방사선성 조성물 및 패턴 형성 방법 |
KR102069345B1 (ko) * | 2018-03-06 | 2020-01-22 | 에스케이씨 주식회사 | 반도체 공정용 조성물 및 반도체 공정 |
CN110330891B (zh) * | 2019-07-05 | 2021-08-03 | 武汉华星光电半导体显示技术有限公司 | 柔性盖板及其制作方法 |
CN113759445A (zh) * | 2021-07-26 | 2021-12-07 | 南开大学 | 一种部分随机微透镜阵列的加工 |
CN115477821A (zh) * | 2022-11-15 | 2022-12-16 | 苏州海天运动器材有限公司 | 一种蹦床用护垫 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62102445A (ja) * | 1985-10-28 | 1987-05-12 | Nippon Sheet Glass Co Ltd | 光デイスク基板の製造方法 |
US4810547A (en) * | 1986-03-26 | 1989-03-07 | Nippon Sheet Glass Co., Ltd. | Substrate with fine grooves and method for manufacturing the same |
JPS62225273A (ja) | 1986-03-26 | 1987-10-03 | Nippon Sheet Glass Co Ltd | 溝つき基板の製造方法 |
JP2532237B2 (ja) * | 1987-03-26 | 1996-09-11 | セイコー電子工業株式会社 | 組合せレンズの製造方法 |
US5638479A (en) * | 1988-07-19 | 1997-06-10 | Nippon Sheet Glass Co., Ltd. | Optical part |
JP3381945B2 (ja) * | 1992-10-05 | 2003-03-04 | 日本板硝子株式会社 | 基板上に微細な凹凸パターンを形成する方法 |
JPH06242303A (ja) | 1993-02-19 | 1994-09-02 | Nippon Sheet Glass Co Ltd | 平板状レンズアレイおよびその製造方法 |
JP3750393B2 (ja) * | 1998-02-05 | 2006-03-01 | 日本板硝子株式会社 | 凹凸表面を有する物品の製造方法 |
WO1999039890A1 (fr) | 1998-02-05 | 1999-08-12 | Nippon Sheet Glass Co., Ltd. | Article a surface rugueuse, procede de production dudit article et composition a cet effet |
WO2001003901A1 (fr) * | 1999-07-07 | 2001-01-18 | Nippon Sheet Glass Co., Ltd. | Article a surface irreguliere et son procede de production |
JP2001240800A (ja) | 2000-02-25 | 2001-09-04 | Nippon Sheet Glass Co Ltd | 所定表面形状を有する物品の製造方法 |
-
2002
- 2002-02-22 KR KR1020027014380A patent/KR20020093954A/ko not_active Application Discontinuation
- 2002-02-22 CA CA002407378A patent/CA2407378A1/en not_active Abandoned
- 2002-02-22 US US10/258,809 patent/US6849350B2/en not_active Expired - Fee Related
- 2002-02-22 EP EP02703887A patent/EP1277571A4/en not_active Withdrawn
- 2002-02-22 WO PCT/JP2002/001624 patent/WO2002068183A1/ja not_active Application Discontinuation
- 2002-02-22 CN CN02800439A patent/CN1457293A/zh active Pending
- 2002-02-26 TW TW091103471A patent/TWI262902B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI394802B (zh) * | 2007-11-22 | 2013-05-01 | Shinetsu Chemical Co | 含金屬氧化物之膜形成用組成物,含金屬氧化物膜、含金屬氧化物膜所形成之基板及使用其之圖型形成方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2002068183A1 (fr) | 2002-09-06 |
KR20020093954A (ko) | 2002-12-16 |
US6849350B2 (en) | 2005-02-01 |
EP1277571A4 (en) | 2006-08-30 |
CA2407378A1 (en) | 2002-10-24 |
CN1457293A (zh) | 2003-11-19 |
EP1277571A1 (en) | 2003-01-22 |
US20030146415A1 (en) | 2003-08-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |