1260243 (1) 九、發明說明 【發明所屬之技術領域】 本發明係關於在平板（flat panel)的製造過程中，爲 了在基板上塗敷糊膏或滴下液晶等之塗敷裝置及塗敷方法 【先前技術】 | 作爲習知的技術，如日本特開平7 - 2 7 5 7 7 0號公報中所 記載，其構成爲：藉由先將玻璃基板載置在可以往XYZ方 向移動的平台上，並以噴嘴的吐出口可以面對玻璃基板的 主面之方式，一邊自該吐出口將已經充塡在糊膏收容筒內 的糊膏吐在該基板上，一邊改變該基板和該噴嘴之相對位 置關係，而在基板上，塗敷所要形狀的糊膏圖案。 前述習知技術，在LCD等的平板的領域，隨著玻璃基 板尺寸持續地大型化，塗敷頭的塗敷範圍也擴大，因此， 鲁用來支持塗敷頭之門型框架也變長、變大，在裝置的搬送 途中和搬入潔淨室內以及潔淨室的溫度變動等的情況，由 於裝置的溫度狀態會變化，所以在門型框架中，會發生由 於熱伸長所造成的熱應力，而處於門型框架發生變形、和 難以將糊膏圖案塗敷描繪出所要的形狀的狀況。 如前述般，伴隨著玻璃基板尺寸的大型化，用來支持 塗敷頭之門型框架也變長、變大，在裝置的搬送途中和搬 入潔淨室內以及在潔淨室內的溫度變動等的情況，裝置的 溫度狀態會變化。因此，在門型框架中，會發生由於熱伸 (2) 1260243 長所造成的熱應力，而變成難以將糊膏圖案，在規定位置 ，塗敷描繪出所要的形狀的狀況。 【發明內容】 因此，本發明的目的在於實現一種裝置，防止由於熱 伸長所造成的門型框架的變形和塗敷位置精度的降低，而 可以將糊膏圖案的形狀作成所要的形狀。 | 本發明的糊膏塗敷機，對於藉由直接驅動導引複數的 包含該噴嘴之塗敷頭部來加以支持之門型框架，藉由作成 利用直接驅動導件來加以支持，而構成能夠防止在框架中 發生熱應力；又，藉由基準器，測量在裝置設置環境下的 框架的熱伸長量，並能夠進行補正控制而將該噴嘴定位在 該基板上的所希望的位置，而作成能夠塗敷描繪出所希望 的糊膏圖案。 Φ 【實施方式】 本發明，具備門型框架的框架（橫梁），該框架具有 用來直接驅動導引包含噴嘴之複數的塗敷頭之塗敷頭X軸 移動機構。伴隨著裝置的大型化’此框架由於周圍的環境 溫度等，而發生伸長，框架彎曲’於是會發生塗敷位置誤 差，變成會有無法正確的糊膏塗敷或液晶滴下等的問題。 因此，在本發明中，爲了防止由於此框架的長邊方向的熱 伸長（X軸方向的伸長）所造成的變形，係構成將前述框 架（橫梁）的其中一側加以固定支持，另一側則利用直接 -6 - (3) 1260243 驅動導件加以支持，使其可以在X軸方向移動（Y軸方向 固定）。藉此，構成能夠防止在框架中發生熱應力。又’ 採用一種補正控制方法，藉由基準器，測量在裝置設置環 境下的框架的熱伸長量，並將該噴嘴定位在該基板上的所 要的位置，而能夠塗敷描繪出所要的糊膏圖案。在以下的 實施例中，加以詳細地說明。 φ 〔實施例1〕 ’ 以下，使用圖面來說明關於本發明的一實施形態。在 - 本實施例中，係以在基板面上描繪出糊膏圖案（密封材圖 案）之裝置爲例來進行說明；同樣的，當然也適用在屬於 門型框架構造之將液晶滴在基板上之滴下裝置中。 第1圖係表示根據本發明的糊膏塗敷機的一實施形態 的斜視圖。再者，對向設置之複數的塗敷頭各部的號碼， 爲了避免繁雜，在以下的說明中，係對各部的號碼，標上 • a〜f的字母來加以說明。 各框架（橫梁）2 a、2 b的其中一端，係被固定在支持 ， 腳31 a或線性馬達4b上，使其無法在X軸方向移動。又，各 橫梁2a、2b的另一端側，係被支持在熱伸長導引導件25a 、25b上，使其可以在X軸方向移動。此熱伸長導引導件， * 例如係作成在其中一側被設在X方向之軌條、和可以在該 軌條上移動之滑動軸承或滾動軸承構造。再者，只要是能 夠在X軸方向自由地移動的構造，並不被限定於前述構造 (4) 1260243 在第1圖中，在架台1上的其中一側，橫梁2 a的其中一 方端側，被固定於支持構件3 1 a上，熱伸長導引導件2 5 a則 設在其另一方端側；而該橫梁2 a係具備使分別配備線性馬 達之複數的塗敷頭部，各自在X軸方向移動之移動機構（ 線性軌條）。在面對橫梁2 a的位置，設置橫梁2 b ;此橫粱 2 b具備使分別配備線性馬達之複數的塗敷頭部，各自在χ 軸方向移動之移動機構（線性軌條）。設置用來調整被固 φ 定於架台1側之塗敷頭的間隔之機構3 a、3 b也就是線性軌 ’ 條，並在橫梁2 b的兩端，設置間隔調整用線性馬達4 a、4 b • ，使得此橫梁2 b能夠在Y軸方向移動。又，此橫梁2 b的其 中一端側，被固定支持在線性馬達4b上，使其在X軸方向 不會移動，而另一端側則經由熱伸長導引導件25b，被支 持成可以在X軸方向移動。又，在面對橫梁2a、2b之架台1 上，設置用來支持基板7並使其在Y軸方向移動之Y軸移動 平台6。 φ 在複數的塗敷頭的橫梁2a、2b上，設置直接驅動導件 ;在塗敷頭部側，設置線性伺服馬達，各自的塗敷頭，在 X軸方向被移動控制。複數的塗敷頭部，係將爲了支持複 數的塗敷頭之X軸方向移動用線性伺服馬達，設在背面側 ，而在表面側，則具備設有z軸伺服馬達10a〜1 Of之Z軸移 動平台支持托架8a〜8f。設置藉由此Z軸伺服馬達10a〜1 Of ，使塗敷部往上下移動之Z軸移動平台9a〜9f。在此Z軸移 動平台上，安裝：糊膏收容筒（注射器）1 3 a、設有噴嘴 之噴嘴支持器1 4 a、距離I十1 6 a及具有可以照明的光源之1¾ -8- (5) 1260243 筒和畫像辨識攝影機1 5 a。 再者，具有可以照明的光源之鏡筒和畫像辨識攝影機 1 5 a，除了被使用於各塗敷噴嘴的平行調整或間隔調整用 以外，爲了基板的定位或糊膏圖案的形狀辨識等，係被設 成可以面對基板。 在架台1的內部，設置主控制部1 7 a，對用來進行各機 構的驅動之線性馬達4am、4bm、8 am〜8 fm和用來移動平 φ 台之伺服馬達6 m，進行控制。此主控制部1 7 a，經由纜線BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating apparatus and a coating method for applying a paste or dropping a liquid crystal on a substrate during the manufacture of a flat panel. In the prior art, as described in Japanese Laid-Open Patent Publication No. Hei 07-275777, the glass substrate is placed on a platform that can move in the XYZ direction. And the nozzle of the nozzle can face the main surface of the glass substrate, and the paste that has been filled in the paste storage tube is spit on the substrate from the discharge port, and the relative relationship between the substrate and the nozzle is changed. Positional relationship, and on the substrate, a paste pattern of a desired shape is applied. According to the prior art, in the field of flat panels such as LCDs, as the size of the glass substrate continues to increase in size, the application range of the coating head is also expanded, and therefore, the gate frame for supporting the coating head is also elongated. When the temperature of the device changes during the transport of the device and during the movement of the device into the clean room or the clean room, the temperature of the device changes, so that the thermal stress caused by the thermal elongation occurs in the portal frame. The door frame is deformed and it is difficult to apply the paste pattern to the desired shape. As described above, as the size of the glass substrate increases, the size of the door frame for supporting the coating head becomes longer and larger, and the temperature is changed during transportation of the apparatus and during movement into the clean room and in the clean room. The temperature state of the device will change. Therefore, in the portal frame, thermal stress caused by the heat extension (2) 1260243 is generated, and it becomes difficult to apply the paste pattern to the desired shape at a predetermined position. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a device which can prevent the deformation of a portal frame and the reduction in the accuracy of a coating position due to thermal elongation, and can form a shape of a paste pattern into a desired shape. The paste applicator of the present invention is configured to support a door frame that supports a plurality of coating heads including the nozzles by direct driving, and is configured to be supported by a direct drive guide. Preventing thermal stress from occurring in the frame; and, by means of the reference, measuring the amount of thermal elongation of the frame in the setting environment of the device, and performing correction control to position the nozzle at a desired position on the substrate, thereby creating It is possible to apply a paint to draw a desired paste pattern. Φ [Embodiment] The present invention provides a frame (beam) of a door frame having an applicator head X-axis moving mechanism for directly driving a plurality of applicator heads including nozzles. With the increase in the size of the device, the frame is stretched due to the surrounding ambient temperature, and the frame is bent, so that the coating position error occurs, and there is a problem that the paste application or the liquid crystal drop cannot be performed correctly. Therefore, in the present invention, in order to prevent deformation due to thermal elongation (election in the X-axis direction) of the longitudinal direction of the frame, one side of the frame (beam) is fixedly supported, and the other side is supported. It is supported by the direct -6 - (3) 1260243 drive guide so that it can move in the X-axis direction (fixed in the Y-axis direction). Thereby, the configuration can prevent thermal stress from occurring in the frame. And 'using a correction control method, by means of a reference, measuring the thermal elongation of the frame in the setting environment of the device, and positioning the nozzle at a desired position on the substrate, and being capable of coating and painting the desired paste pattern. This will be described in detail in the following examples. φ [Embodiment 1] Hereinafter, an embodiment of the present invention will be described using the drawings. In the present embodiment, a device in which a paste pattern (sealing material pattern) is drawn on a substrate surface is taken as an example; similarly, it is also applicable to a liquid crystal drop on a substrate belonging to a gate frame structure. Drop the device. Fig. 1 is a perspective view showing an embodiment of a paste applicator according to the present invention. Further, in order to avoid complication, the numbers of the respective portions of the applicator heads which are provided in the opposite direction will be described with the letters a to f in the following description. One end of each of the frames (beams) 2a, 2b is fixed to the support, the foot 31a or the linear motor 4b so that it cannot move in the X-axis direction. Further, the other end sides of the respective beams 2a, 2b are supported by the thermally elongated guides 25a, 25b so as to be movable in the X-axis direction. The thermally elongated guide member, for example, is formed as a rail in which one side is disposed in the X direction, and a sliding bearing or rolling bearing configuration on which the rail can be moved. Further, as long as it is a structure that can freely move in the X-axis direction, it is not limited to the above-described structure (4) 1260243. In the first figure, on one side of the gantry 1, one end side of the beam 2a , the fixing member 3 1 a is fixed on the supporting member 3 1 a, and the thermal elongation guiding member 25 5 a is disposed on the other end side thereof; and the beam 2 a is provided with a plurality of coating heads respectively equipped with linear motors, each of which is Movement mechanism (linear rail) that moves in the X-axis direction. At a position facing the beam 2a, a beam 2b is provided; this yoke 2b is provided with a moving mechanism (linear bar) for moving a plurality of coating heads respectively provided with linear motors in the yaw axis direction. a mechanism 3a, 3b for adjusting the interval of the coating head fixed to the gantry 1 side is also provided as a linear rail' strip, and at both ends of the beam 2b, a linear motor 4a for spacing adjustment is provided. 4 b • allows the beam 2 b to move in the Y-axis direction. Further, one end side of the beam 2 b is fixedly supported on the linear motor 4b so as not to move in the X-axis direction, and the other end side is supported to be supported on the X-axis via the heat-expansion guide 25b. Move in direction. Further, on the gantry 1 facing the beams 2a, 2b, a Y-axis moving platform 6 for supporting the substrate 7 and moving it in the Y-axis direction is provided. φ Direct drive guides are provided on the beams 2a, 2b of the plurality of coating heads; on the application head side, linear servo motors are provided, and the respective coating heads are moved and controlled in the X-axis direction. The plurality of application heads are provided on the back side in order to support the movement of the plurality of application heads in the X-axis direction, and on the surface side, the Z-axis servo motors 10a to 1 are provided. The shaft moving platform supports the brackets 8a to 8f. The Z-axis moving stages 9a to 9f are moved by the Z-axis servo motors 10a to 1 Of to move the coating portion up and down. On this Z-axis mobile platform, install: paste storage cylinder (syringe) 1 3 a, nozzle holder with nozzle 1 4 a, distance I 16 6 a and 13⁄4 -8- with illuminable light source ( 5) 1260243 Tube and portrait recognition camera 1 5 a. Further, the lens barrel and the image recognition camera 15a having a light source that can be illuminated are used for positioning of the substrate or shape recognition of the paste pattern, in addition to the parallel adjustment or interval adjustment used for each application nozzle. It is set to face the substrate. Inside the gantry 1, a main control unit 17a is provided to control the linear motors 4am, 4bm, 8am to 8fm for driving the respective mechanisms and the servo motor 6m for moving the flat φ table. This main control unit 1 7 a, via cable
• 1 7e，被接續至副控制部1 7b。副控制部1 7b控制用來驅動Z • 軸移動平台之伺服馬達10a〜10f。監視器17f、鍵盤17g、 外部記憶裝置也就是硬碟1 7c、磁碟片1 7d，被接續至主控 制部1 7a。在這樣的主控制部1 7a中的各種處理的資料，係 從鍵盤17g被輸入，並根據利用畫像辨識攝影機15a〜15f 所捕捉到的畫像、和在主控制部1 7a中所進行的畫像處理 等所算出的位置，求出框架的伸長量，並利用監視器1 7f 顯示出這些處理狀況。又，從鍵盤17g被輸入的資料等， 係被記憶保管在外部記憶裝置也就是硬碟1 7c或磁碟片1 7d 等的記憶媒體中。 第2圖係擴大表示第1圖中的糊膏收容筒1 3和距離計 I 6 a的部分之斜視圖。自糊膏收容筒至噴嘴前端，係藉由 噴嘴支持具14a而被支持。在第2圖中，對應第1圖的部分 ’標上相同的符號。 距離計1 6a，係相對於噴嘴的前端部，利用非接觸的 二角測量法，測量至由玻璃所形成的基板7的表面（頂面 -9- (6) 1260243 )爲止的距離。亦即，發光元件被設在距離計1 6的框體內 ，自此發光元件放射出來雷射光L，在基板7上的測量點反 射，再利用被設在相同的框體內的受光元件受光。又’在 基板7上的雷射光的測量點S和噴嘴1 3 an的正下方位置’在 基板7上僅偏移稍微的距離，但是此種程度的偏移’對於 基板7的表面的凹凸而言，由於沒有差異，所以距離計16a 的測量結果和自噴嘴1 3 an的前端部至基板7的表面（頂面 )爲止的距離之間，幾乎沒有存在差異。 因此，藉由此距離計1 6的測量結果來進行控制，能夠 配合基板7的表面的凹凸（起伏），而將自噴嘴1 3 an的前 端部至基板7的表面（頂面）爲止的距離，維持一定。 如此，藉由將自噴嘴1 3 an的前端部至基板7的表面（ 頂面）爲止的距離，維持一定，且自噴嘴1 3 an吐出的每單 位時間的糊膏量維持定量，被塗敷描繪在基板7上的糊膏 圖案，其寬度和厚度等，將會一樣。 .接著，說明關於本實施例中的控制方法。 第3圖係表示第1圖中的主控制部的構成的方塊圖；符 號17aa是微電腦、符號17ab是馬達控制器、符號17ac是資 料通訊匯流排、符號1 7 ad是外部介面、符號1 7 ae是畫像辨 識裝置、符號17af是各塗敷頭移動用X軸線性馬達用驅動 器、符號1 7 a g、1 7 ah是用來調整塗敷頭的間隔之γ軸線性 馬達用驅動器、符號1 7 ai是平台用γ軸馬達用驅動器、符 號1 7aj是塗敷頭Y軸調整移動用馬達用驅動器；對應前述 的圖面中的部分，標上相同的符號。 -10- (7) 1260243 在該圖中，主控制部17a，內建：微電腦17aa ;馬達 控制器17ab ; X軸、Y軸、平台Y軸等的各軸驅動器17af〜 1 7 a j ;處理利用畫像辨識攝影機1 5 a所得到的影像資料之畫 像處理裝置1 7 a e ;及用來進行與副控制部1 7 b之間的訊號 傳送和進行調整器22a〜22f、23a〜23f、閥組件24a〜24f 的控制之外部介面17ad。 又，在微電腦1 7aa中雖然沒有圖示出來，具備：主運 φ 算部和用來儲存爲了進行後述的塗敷描繪之處理程式之 • ROM、用來儲存在主運算部中的處理結果和自外部介面 - 17ad與馬達控制器17ab來的輸入資料之RAM、及與外部介 面1 7 a d和馬達控制益1 7 a b之間進丫了資料的傳送之輸出入部 等。 在各馬達8am〜8fm、4am、4bm、6m中，內建用來檢 測位置之線性標尺、和用來檢測旋轉量之編碼器；使該檢 測結果反饋至X軸、Y軸、平台Y軸等的各軸驅動器1 7af〜 # 17aj，來進行位置控制。 又，第4圖係表示在第1圖中的副控制部1 7b的構成的 方塊圖；符號17ba是微電腦、符號17bb是馬達控制器、符 號17bc是資料通訊匯流排、符號17bd是外部介面、符號 17be是Z軸馬達用驅動器；對應前述圖面中的部分，標上 相同的符號。 在該圖中，副控制部1 7b，內建：微電腦1 7ba、馬達 控制器17bb、Z軸驅動器17be、及用來進行利用距離計16a 〜1 6f所得到的高度資料的輸入和與主控制部1 7a之間的訊 > 11 - (8) !260243 號傳送之外部介面17bd。又，在微電腦17ba中雖然沒有圖 示出來，具備：主運算部和用來儲存爲了進行後述的塗敷 描繪時的噴嘴1 3 an的高度控制之處理程式之R Ο Μ、用來儲 存在主運算部中的處理結果和自外部介面1 7bd與馬達控制 器17bb來的輸入資料之RAM、及與外部介面17bd和馬達控 制器17bb之間進行資料的傳送之輸出入部等。在Z軸馬達 1 Oa〜1 Of中，內建用來檢測旋轉量之編碼器；使該檢測結 φ 果反饋至Z軸驅動器17be，來進行位置控制。 ^ 在主控制部1 7a和副控制部1 7b聯合控制之下，各馬達 ^ 8am〜8 fm、4am、4b m、6m、10a〜10f，藉由基於自鍵盤 1 7g輸入而被儲存於微電腦1 7aa的RAM中的資料，來進行 移動·旋轉，使被保持在基板保持機構5 (第1圖）上之基 板7，在Y軸方向，移動任意的距離，且經由使噴嘴部上下 移動之Z軸移動平台9a〜9f，藉由塗敷頭的X移動機構2a、 2b，將所支持的噴嘴13an (第2圖）〜13fn，在X軸方向， 鲁移動任意的距離，而在移動中，對糊膏收容筒1 3 a〜1 3 f持 續地施加規定的氣壓，於是糊膏自噴嘴1 3 an〜1 3 fn的前端 部的吐出口被吐出，而在基板7上，塗敷所要的糊膏圖案 〇 在噴嘴13an〜13fn往X軸方向水平移動中，距離計16a 〜16f測量噴嘴I3an〜13fn與基板7之間的距離，且噴嘴 1 3an〜1 3fn利用Z軸移動平台9a〜9 f的上下移動而被控制， 使得其可以經常維持一定的間隔。 接著，根據第5圖，說明關於在此實施形態中的裝置 -12- (9) 1260243 的動作。在第5圖中，若投入電源（步驟100)，首先，實 行塗敷機的初期設定（步驟2 0 0 )。此初期設定工程，於 第1圖中，係藉由驅動各軸移動用馬達與Z軸移動平台9， 使基板保持機構5在Y方向移動，而定位在規定的基準位置 ;又，將噴嘴1 3 an (第2圖）設定在規定的原點位置，使 得其糊膏吐出口可以位於開始糊膏塗敷的位置（亦即糊膏 塗敷開始點），並進而進行糊膏圖案資料、基板位置資料 φ 、和糊膏吐出結束位置資料的設定。 ’ 此種資料輸入係由鍵盤1 7g (第1圖）進行，被輸入的 ' 資料，如前所述，被儲存於內建在微電腦1 7aa (第3圖） 內的RAM中。 若此初期設定工程（步驟200 )結束，接著，實行熱 伸長補正資料最終的採取處理。在本發明中，係使用基準 器來測量框架的伸長量；作爲基準器，係由；設在先前所 述的各塗敷頭中之攝影機、承載在平台側之基準基板或是 φ設在平台端部側之基準構件等、及根據攝影機位置和利用 攝影機所求得的標記或刻度的位置來求出框架伸長量之控 制裝置內的處理部，所構成。 此處，利用手動操作等的方法，將用來進行校正之第 6圖所示的基準基板，承載在平台上。 在基準基板上，位置校正用的標記，以設定在XY軸 方向的節距，確保規定的位置精度，而被形成於薄膜上。 利用被承載於塗敷頭上之攝影機，照出此標記，再根據其 位置座標來算出熱伸長長度，而作爲在步驟600的糊膏圖 -13- (10) 1260243 案的塗敷描繪工程中的塗敷位置的補正資料來使用。 又，如第6圖所示，利用預先在要塗敷糊膏圖案之實 際基板的塗敷面上，形成位置校正標記，也可以在步驟 4 0 0的基板承載處理之後，實施步驟3 0 0的熱伸長補正資料 採取工程。 又，也可以在平台的端部，設置由因爲熱而造成的伸 長量少之玻璃等的材料所形成，並設有基準刻度之構件； φ 測量此基準構件的刻度，來測出框架伸長量。 • 接著，將基板7承載在基板保持機構5 (第1圖）上而 * 使其保持（步驟4 0 0 )。 繼續’進行基板預備定位處理（步驟500)。在此處 理中，使用自畫像辨識攝影機1 5 a〜1 5 f中所設定的攝影機 ’照出被承載於基板保持機構5上之基板7的定位用標記， 再利用畫像處理求出定位用標記的重心位置，而檢測出基 板7的0方向的傾斜，對應此傾斜，驅動伺服馬達3〇am〜 • 3 0 fm，使塗敷頭在Y軸方向移動，來補正此0方向的傾斜 。根據上述，結束基板預備定位處理（步驟5 0 〇 )。 接著，進行糊骨圖案描繪處理（步驟6 0 0 )。 在此處理中，使噴嘴1 3 an〜1 3 fn的吐出口，移動位置 至基板7的塗敷開始位置，並進行噴嘴位置的比較·調整 移動。此處的比較·調整移動，係使用在先前的步驟3 〇〇 中所求出的熱伸長補正資料，來進行控制。 接者’使伺服馬達1 〇 a〜1 〇 f及z軸移動平台9 a〜9 f動作 ，將噴嘴13an〜13 fn的高度設定成糊膏圖案描繪高度。 -14- (11) 1260243 基於噴嘴的初期移動距離資料，使噴嘴1 3 an〜1 3 fn下 降初期移動距離量。在接下來的動作中，係藉由距離計 1 6 a〜1 6 f來測量基板7的表面高度，並確認噴嘴1 3 an〜1 3 fn 的前端是否被設定在描繪高度，而在沒有設定在描繪高度 的情況，使噴嘴1 3 an〜1 3 fn下降微小距離，以此方式反覆 實行前述基板7的表面測量和噴嘴1 3 an〜1 3 fn的微小距離 下降，來將噴嘴1 3 an〜1 3 fn的前端設定在糊膏圖案的塗敷 描繪高度。 若以上的處理結束，接著，基於被儲存於微電腦1 7aa 的RAM中之糊膏圖案資料和補正0方向的傾斜，線性馬達 6!11、8&111〜8£111被驅動，藉此，噴嘴13311〜13“的糊膏吐出 口，在面對基板7的狀態下，對應此糊膏圖案資料，噴嘴 13an〜13fn和基板7各自在X、Y方向移動，同時對糊膏收 容筒1 3 a〜1 3 f施加設定的氣壓，開始從噴嘴1 3 an〜1 3 fn的 糊膏吐出口吐出糊膏。藉此，開始對基板7塗敷糊膏圖案 〇 而且，與此同時，如先前所述，副控制部1 7b的微電 腦17ba，根據距離計16a〜16f，輸入噴嘴13an〜13fn的糊 膏吐出口和基板7的表面之間的間隔的實測資料，來測量 基板7的表面的起伏，並藉由對應此測量値來驅動伺服馬 達10a〜10f，自基板7的表面算起的噴嘴13an〜13fn的設定 高度，被維持一定。藉此，能夠以所要的塗敷量，塗敷糊 膏圖案。 如前述般，進行糊膏圖案的描繪；噴嘴1 3 an〜1 3 fn的 -15- (12) 1260243 糊膏吐出口，藉由判斷是否爲基板7上的前述糊膏圖案資 料所決定的描繪圖案的終端’若不是此終端，則再度返回 基板的的表面起伏的測量處理中，以下，反覆前述的塗敷 描繪’繼續到糊膏圖案形成到達至描繪圖案的終端爲止。 而且’右到達此描繪圖案的終端，則驅動伺服馬達} 〇 ，使噴嘴1 3 a上升，而結束此糊膏圖案描繪工程（步驟6 〇 〇 )° , 接著，進行基板排出處置（步驟7〇〇)，在第I圖中， 先解除基板7的保持，在排出至裝置外。 然後’判斷是否停止以上的全部工程（步驟8 〇 〇 )， 在複數枚基板上，以相同的圖案形成糊膏膜的情況，係自 基板承載處理（步驟4 0 0 )開始反覆進行，就全部的基板 ’若此種一連串的處理結束，則作業全部結束（步驟9〇0 )° 如前述般，在本發明中，並沒有壓抑框架伴隨著周圍 •環境溫度的變化所發生的熱伸長，而利用在其中一方側自 由地伸展，抑制由於發生在框架中的熱應力所造成的框架 彎曲的發生，並構成可以一邊補正由於熱身長的變化而產 生的框架長度的變化，一邊進行塗敷或滴下，而實現高精 度的塗敷或低下。 又，若根據本發明，能夠提供一種糊膏塗敷機，當在 基板主面上，塗敷描繪四邊框狀的糊膏圖案之際，防止由 於裝置的設置環境所造成的熱伸長而發生門型框架的熱變 形，又，降低糊膏圖案的塗敷位置誤差，而得到所要的圖 -16- (13) 1260243 案形狀。 【圖式簡單說明】 第1圖係表示根據本發明的糊膏塗敷機的一實施形態 的斜視圖。 第2圖係表示在第1圖所示的實施形態中的塗敷頭的構 造的斜視圖。 | 第3圖係表示在第1圖所示的實施形態中的主控制系統 的方塊圖。 第4圖係表示在第1圖所示的實施形態中的副控制系統 的方塊圖。 第5圖係表示在第1圖所示的實施形態的全體動作的流 程圖。 第6圖係用來說明糊膏圖案的塗敷狀態的圖。 φ 【主要元件符號說明】 1 :架台 2a、2b :框架（橫梁） 3 a、3 b :機構（線性軌條） 4 a、4 b :(間隔調整用）線性馬達 4am、4bm、8am〜8fm :線性馬達 5 :基板保持機構 6 : Y軸移動平台 6m :伺服馬達 -17- 1260243 i14) 7 :基板 8a〜8f : Z軸移動平台支持托架 9a〜9f : Z軸移動平台 1 0 a〜1 0 f : Z軸伺服馬達 1 3 a :糊膏收容筒（注射器） 1 3an〜13fn :噴嘴 14a :噴嘴支持具• 1 7e, connected to the sub-controller 1 7b. The sub control unit 1 7b controls the servo motors 10a to 10f for driving the Z axis moving platform. The monitor 17f, the keyboard 17g, and the external memory device, that is, the hard disk 17c and the magnetic disk 1 7d, are connected to the main control unit 17a. The data of the various processes in the main control unit 17a are input from the keyboard 17g, and the images captured by the image recognition cameras 15a to 15f and the image processing performed in the main control unit 17a are processed. The calculated position is obtained by the calculated position, and these processing conditions are displayed by the monitor 1 7f. Further, the data or the like input from the keyboard 17g is stored in a memory medium such as a hard disk 1 7c or a disk 1 7d in an external storage device. Fig. 2 is a perspective view showing a portion in which the paste accommodating cylinder 13 and the distance meter I 6 a in Fig. 1 are enlarged. The paste receiving cylinder is attached to the tip end of the nozzle by the nozzle holder 14a. In Fig. 2, the portions corresponding to Fig. 1 are denoted by the same reference numerals. The distance meter 16a measures the distance to the surface (top surface -9-(6) 1260243) of the substrate 7 formed of glass by a non-contact two-angle measurement method with respect to the tip end portion of the nozzle. That is, the light-emitting elements are provided in the housing of the distance meter 16 from which the laser light L emits the laser light L, and is reflected by the measurement points on the substrate 7, and is received by the light-receiving elements provided in the same casing. Further, 'the measurement point S of the laser light on the substrate 7 and the position ' directly below the nozzle 13 an are shifted by only a slight distance on the substrate 7, but this degree of offset' is uneven with respect to the surface of the substrate 7. In other words, since there is no difference, there is almost no difference between the measurement result of the distance meter 16a and the distance from the tip end portion of the nozzle 13 an to the surface (top surface) of the substrate 7. Therefore, by controlling the measurement result of the distance meter 16 , the distance from the tip end portion of the nozzle 13 an to the surface (top surface) of the substrate 7 can be matched with the unevenness (undulation) of the surface of the substrate 7 . , maintain a certain. In this manner, the distance from the tip end portion of the nozzle 13 an to the surface (top surface) of the substrate 7 is maintained constant, and the amount of paste per unit time discharged from the nozzle 13 an is maintained constant, and is applied. The paste pattern drawn on the substrate 7 will have the same width, thickness, and the like. Next, the control method in the present embodiment will be explained. Fig. 3 is a block diagram showing the configuration of the main control unit in Fig. 1; symbol 17aa is a microcomputer, symbol 17ab is a motor controller, symbol 17ac is a data communication bus, symbol 17 is an external interface, symbol 17 Ae is an image recognition device, a symbol 17af is an X-axis motor driver for each application head movement, and a symbol of 1 7 ag and 1 7 ah is a γ-axis linear motor driver for adjusting the interval between the application heads, and a symbol 17 Ai is a driver for a γ-axis motor for a platform, and a symbol 17aj is a driver for a Y-axis adjustment movement motor for a coating head; the same reference numerals are used for the portions corresponding to the above-described drawings. -10- (7) 1260243 In the figure, the main control unit 17a is built-in: a microcomputer 17aa; a motor controller 17ab; each axis driver 17af to 1 7 aj such as an X-axis, a Y-axis, and a platform Y-axis; The image processing device 1 7 ae of the image recognition camera 1 5 a; and the signal transmission between the sub-control unit 1 7 b and the adjusters 22a to 22f, 23a to 23f, and the valve assembly 24a ~24f controls the external interface 17ad. Further, the microcomputer 1 7aa is not shown, and includes a main operation φ calculation unit and a ROM for storing a processing program for performing coating drawing described later, a processing result for storing in the main operation unit, and The input interface of the data input from the external interface - 17ad and the motor controller 17ab, and the external interface 1 7 ad and the motor control benefit 1 7 ab. In each of the motors 8am to 8fm, 4am, 4bm, and 6m, a linear scale for detecting the position and an encoder for detecting the amount of rotation are built in; the detection result is fed back to the X-axis, the Y-axis, the platform Y-axis, and the like. Each axis drive 1 7af~ # 17aj is used for position control. 4 is a block diagram showing the configuration of the sub-control unit 17b in FIG. 1; the symbol 17ba is a microcomputer, the symbol 17bb is a motor controller, the symbol 17bc is a data communication bus, and the symbol 17bd is an external interface. The symbol 17be is a driver for the Z-axis motor; the same reference numerals are used for the portions corresponding to the aforementioned drawings. In the figure, the sub-control unit 17b is built-in: a microcomputer 1 7ba, a motor controller 17bb, a Z-axis driver 17be, and an input and master control for performing height data obtained by the distance meters 16a to 16f. The external interface 17bd transmitted between the parts 1 7a > 11 - (8) !260243. Further, the microcomputer 17ba is not shown, and includes a main calculation unit and a R Ο 用来 for storing a processing program for controlling the height of the nozzle 13 an when the coating is described later, for storage in the main The processing result in the calculation unit, the RAM of the input data from the external interface 17bd and the motor controller 17bb, and the input/output portion for transferring data between the external interface 17bd and the motor controller 17bb. In the Z-axis motor 1 Oa~1 Of, an encoder for detecting the amount of rotation is built in; the detection result φ is fed back to the Z-axis driver 17be for position control. ^ Under the joint control of the main control unit 17a and the sub-control unit 17b, the motors ^8am~8fm, 4am, 4bm, 6m, 10a~10f are stored in the microcomputer by input from the keyboard 1 7g. The data in the RAM of 7aa is moved and rotated, and the substrate 7 held by the substrate holding mechanism 5 (first drawing) is moved by an arbitrary distance in the Y-axis direction, and the nozzle portion is moved up and down. The Z-axis moving platforms 9a to 9f move the supported nozzles 13an (Fig. 2) to 13fn in the X-axis direction by the X moving mechanisms 2a and 2b of the coating head, and move them by an arbitrary distance while moving. The predetermined pressure is continuously applied to the paste storage cylinders 1 3 a to 1 3 f, so that the paste is discharged from the discharge port of the tip end portion of the nozzles 13 3 an to 1 3 fn, and the coating is applied to the substrate 7 The paste pattern 水平 is horizontally moved in the X-axis direction by the nozzles 13an to 13fn, the distance gauges 16a to 16f measure the distance between the nozzles I3an to 13fn and the substrate 7, and the nozzles 1 3an to 1 3fn use the Z-axis to move the stage 9a~ 9 f is moved up and down to be controlled so that it can always maintain a certain interval. Next, the operation of the device -12-(9) 1260243 in this embodiment will be described based on Fig. 5. In Fig. 5, when the power is turned on (step 100), first, the initial setting of the coater is performed (step 200). In the first drawing, in the first drawing, the substrate holding mechanism 5 is moved in the Y direction by the driving of each axis moving motor and the Z axis moving platform 9, and is positioned at a predetermined reference position; 3 an (Fig. 2) is set at a predetermined origin position so that the paste discharge port can be located at the position where the paste is applied (i.e., the paste application start point), and further the paste pattern data, the substrate The position data φ and the paste end position data are set. The data input is performed by the keyboard 1 7g (Fig. 1), and the input 'data, as described above, is stored in the RAM built into the microcomputer 1 7aa (Fig. 3). When the initial setting process (step 200) is completed, the final process of taking the heat elongation correction data is performed. In the present invention, a reference is used to measure the elongation of the frame; as a reference, a camera provided in each of the previously described coating heads, a reference substrate carried on the platform side, or φ is disposed on the platform The reference member on the end side and the like, and the processing unit in the control device for determining the amount of elongation of the frame based on the position of the camera and the position of the mark or the scale obtained by the camera. Here, the reference substrate shown in Fig. 6 for performing the correction is carried on the stage by a method such as manual operation. On the reference substrate, the mark for position correction is formed on the film by setting the pitch in the XY-axis direction to ensure a predetermined positional accuracy. The mark is taken out by the camera carried on the coating head, and the thermal elongation length is calculated based on the position coordinates thereof, and is used as a coating drawing process in the paste diagram of the step 600-13-(10) 1260243. The correction information of the application position is used. Further, as shown in FIG. 6, the position correction mark may be formed on the application surface of the actual substrate on which the paste pattern is to be applied in advance, or the step 300 0 may be performed after the substrate carrying process in step 400. The thermal elongation correction data was taken for engineering. Further, a member made of a material such as glass having a small amount of elongation due to heat may be provided at the end of the stage, and a member having a reference scale may be provided. φ The scale of the reference member is measured to measure the elongation of the frame. . • Next, the substrate 7 is carried on the substrate holding mechanism 5 (Fig. 1) and held (step 480). Continuing to perform the substrate preliminary positioning process (step 500). In this process, the camera set in the camera 1 5 a to 1 5 f is used to photograph the positioning mark of the substrate 7 carried on the substrate holding mechanism 5, and the positioning mark is obtained by the image processing. At the position of the center of gravity, the inclination of the substrate 7 in the 0 direction is detected, and the servo motor 3 〇am to • 3 0 fm is driven to move the coating head in the Y-axis direction to correct the tilt in the zero direction. According to the above, the substrate preliminary positioning processing (step 5 0 〇 ) is ended. Next, a paste bone pattern drawing process (step 610) is performed. In this process, the discharge ports of the nozzles 1 3 an to 1 3 fn are moved to the application start position of the substrate 7, and the nozzle positions are compared and adjusted. Here, the comparison/adjustment movement is controlled by using the thermal elongation correction data obtained in the previous step 3 〇〇. The picker moves the servo motor 1 〇 a 〜 a 〇 f and the z-axis moving stages 9 a to 9 f , and sets the heights of the nozzles 13an to 13 fn to the paste pattern drawing height. -14- (11) 1260243 Based on the initial movement distance data of the nozzle, the nozzle 1 3 an~1 3 fn is lowered by the initial movement distance. In the next operation, the surface height of the substrate 7 is measured by the distance meter 1 6 a to 1 6 f, and it is confirmed whether the front end of the nozzles 1 3 an to 1 3 fn is set at the drawing height, and is not set. In the case of drawing the height, the nozzles 1 3 an to 1 3 fn are dropped by a small distance, and in this way, the surface measurement of the substrate 7 and the small distance drop of the nozzles 1 3 an to 1 3 fn are repeatedly performed to bring the nozzles 1 3 an The front end of the ~1 3 fn is set at the height of the coating drawing of the paste pattern. When the above processing is completed, the linear motors 6!11, 8&111~8£111 are driven based on the paste pattern data stored in the RAM of the microcomputer 1 7aa and the tilt in the correction 0 direction, whereby the nozzle 13311 to 13" of the paste discharge port, in the state of facing the substrate 7, corresponding to the paste pattern data, the nozzles 13an to 13fn and the substrate 7 are each moved in the X and Y directions, and simultaneously to the paste storage tube 1 3 a 〜1 3 f applies the set air pressure, and starts to discharge the paste from the paste discharge port of the nozzles 1 3 an to 1 3 fn. Thereby, the application of the paste pattern to the substrate 7 is started, and at the same time, as before The microcomputer 17ba of the sub-control unit 17b inputs the measured data of the interval between the paste discharge port of the nozzles 13an to 13fn and the surface of the substrate 7 based on the distance meters 16a to 16f, and measures the undulation of the surface of the substrate 7. The servo motors 10a to 10f are driven in response to the measurement, and the set heights of the nozzles 13an to 13fn from the surface of the substrate 7 are maintained constant. Thereby, the paste can be applied at a desired application amount. Pattern. As described above, the description of the paste pattern is performed. Painted; nozzle 1 3 an~1 3 fn -15- (12) 1260243 paste discharge port, by determining whether the terminal of the drawing pattern determined by the aforementioned paste pattern data on the substrate 7 is not the terminal, Then, in the measurement process of returning the surface undulation of the substrate again, hereinafter, the above-described application drawing is continued until the formation of the paste pattern reaches the end of the drawing pattern. Further, when the terminal reaches the end of the drawing pattern, the servo motor is driven. } 〇, the nozzle 13 3 a is raised, and the paste pattern drawing process (step 6 〇〇) ° is completed, and then the substrate discharge processing (step 7 〇〇) is performed. In the first figure, the substrate 7 is first released. Hold and discharge to the outside of the device. Then 'determine whether to stop all the above works (step 8 〇〇), and form the paste film in the same pattern on the plurality of substrates, from the substrate carrying process (step 40) 0) Start to repeat, and if all the processes of the substrate are completed, the operation is completed (step 9〇0). As described above, in the present invention, there is no suppression frame accompanying the week. The heat elongation which occurs in the change of the ambient temperature is freely extended on one side, and the occurrence of frame bending due to thermal stress occurring in the frame is suppressed, and the change in the length of the warm body can be corrected. The resulting change in the length of the frame is applied or dropped to achieve high-precision coating or lowering. Further, according to the present invention, it is possible to provide a paste applicator which is applied to the main surface of the substrate. At the time of the four-border paste pattern, the thermal deformation of the door frame is prevented due to the thermal elongation caused by the installation environment of the device, and the application position error of the paste pattern is lowered, and the desired pattern is obtained. (13) 1260243 case shape. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing an embodiment of a paste applicator according to the present invention. Fig. 2 is a perspective view showing the structure of the coating head in the embodiment shown in Fig. 1. Fig. 3 is a block diagram showing the main control system in the embodiment shown in Fig. 1. Fig. 4 is a block diagram showing a sub-control system in the embodiment shown in Fig. 1. Fig. 5 is a flow chart showing the overall operation of the embodiment shown in Fig. 1. Fig. 6 is a view for explaining the state of application of the paste pattern. Φ [Description of main component symbols] 1 : Stand 2a, 2b: frame (beam) 3 a, 3 b : mechanism (linear bar) 4 a, 4 b : (for interval adjustment) linear motors 4am, 4bm, 8am~8fm : Linear motor 5 : Substrate holding mechanism 6 : Y-axis moving platform 6 m : Servo motor -17 - 1260243 i14) 7 : Substrate 8a to 8f : Z-axis moving platform support bracket 9a to 9f : Z-axis moving platform 1 0 a~ 1 0 f : Z-axis servo motor 1 3 a : Paste storage tube (syringe) 1 3an~13fn : Nozzle 14a: Nozzle holder
15a〜15f :畫像辨識攝影機 1 6 a〜1 6 f :距離計 17a :主控制部 1 7 a a ·微電腦 17ab :馬達控制器 17ac :資料通訊匯流排 1 7 a d :外部介面 17ae :畫像辨識裝置15a~15f : Image recognition camera 1 6 a~1 6 f : Distance meter 17a : Main control unit 1 7 a a · Microcomputer 17ab : Motor controller 17ac : Data communication bus 1 7 a d : External interface 17ae : Image recognition device
1 7 a f . X軸線性馬達用驅動益 17ag、17ah: Y軸線性馬達用驅動器 17ai :平台用Y軸馬達用驅動器 1 7 aj :塗敷頭Y軸調整移動用馬達用驅動器 1 7 b :副控制部 1 7 b a :微電腦 17bb :馬達控制器 1 7bc :資料通訊匯流排 17bd :外部介面 -18- (15) 1260243 17be : Z軸馬達用驅動器 1 7 c :硬碟 1 7 d :磁碟片 1 7 e :纜線 17f :監視器 1 7 g :鍵盤 22a〜22f、23a〜23f:調整器1 7 af . X-axis motor drive Yage 17ag, 17ah: Y-axis motor driver 17ai: Y-axis motor driver for platform 1 7 aj : Applicator head Y-axis adjustment motor driver 1 7 b : Control unit 1 7 ba : Microcomputer 17bb : Motor controller 1 7bc : Data communication bus 17bd : External interface -18- (15) 1260243 17be : Z-axis motor driver 1 7 c : Hard disk 1 7 d : Disk 1 7 e : Cable 17f : Monitor 1 7 g : Keyboards 22a to 22f, 23a to 23f: Adjuster
2 4 a〜2 4 f :閥組件 25a、25b :熱伸長導引導件 3 1 a :支持構件（支持腳）2 4 a~2 4 f : Valve assembly 25a, 25b : Thermal elongation guide 3 1 a : Support member (supporting foot)
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