TWD219673S - Cover ring - Google Patents
Cover ring Download PDFInfo
- Publication number
- TWD219673S TWD219673S TW110302985F TW110302985F TWD219673S TW D219673 S TWD219673 S TW D219673S TW 110302985 F TW110302985 F TW 110302985F TW 110302985 F TW110302985 F TW 110302985F TW D219673 S TWD219673 S TW D219673S
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- TW
- Taiwan
- Prior art keywords
- view
- cover ring
- same
- article
- design
- Prior art date
Links
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 238000002230 thermal chemical vapour deposition Methods 0.000 abstract description 2
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Abstract
【物品用途】;本設計物品是一種半導體製造裝置(例如熱化學氣相沉積(CVD)裝置)中在圓柱狀腔體的頂板開口部安裝氣環用的蓋環。;【設計說明】;後視圖與前視圖相同，故省略後視圖。右側視圖與左側視圖相同，故省略右側視圖。[Use of article] This design article is a cover ring for installing a gas ring on the top opening of a cylindrical cavity in a semiconductor manufacturing device (such as a thermal chemical vapor deposition (CVD) device). ;[Design Note];The rear view is the same as the front view, so the rear view is omitted. The right view is the same as the left view, so the right view is omitted.
Description
本設計物品是一種半導體製造裝置(例如熱化學氣相沉積(CVD)裝置)中在圓柱狀腔體的頂板開口部安裝氣環用的蓋環。 This designed article is a cover ring for mounting a gas ring in a top plate opening of a cylindrical cavity in a semiconductor manufacturing apparatus (for example, a thermal chemical vapor deposition (CVD) apparatus).
後視圖與前視圖相同，故省略後視圖。右側視圖與左側視圖相同，故省略右側視圖。 The rear view is the same as the front view, so the rear view is omitted. The right side view is the same as the left side view, so the right side view is omitted.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-026581 | 2020-02-19 | ||
| JPD2020-26581F JP1692955S (en) | 2020-12-10 | 2020-12-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD219673S true TWD219673S (en) | 2022-07-01 |
Family
ID=77270610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110302985F TWD219673S (en) | 2020-12-10 | 2021-06-09 | Cover ring |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP1692955S (en) |
| TW (1) | TWD219673S (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD208042S (en) | 2019-08-20 | 2020-11-01 | 南韓商吉佳藍科技股份有限公司 | A vessel for plasma processing device |
-
2020
- 2020-12-10 JP JPD2020-26581F patent/JP1692955S/ja active Active
-
2021
- 2021-06-09 TW TW110302985F patent/TWD219673S/en unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD208042S (en) | 2019-08-20 | 2020-11-01 | 南韓商吉佳藍科技股份有限公司 | A vessel for plasma processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1692955S (en) | 2021-08-16 |
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