TWD218677S - 半導體成膜裝置用氣體供給噴嘴(三) - Google Patents

半導體成膜裝置用氣體供給噴嘴(三) Download PDF

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Publication number
TWD218677S
TWD218677S TW110305383F TW110305383F TWD218677S TW D218677 S TWD218677 S TW D218677S TW 110305383 F TW110305383 F TW 110305383F TW 110305383 F TW110305383 F TW 110305383F TW D218677 S TWD218677 S TW D218677S
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TW
Taiwan
Prior art keywords
view
design
article
semiconductor film
film formation
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Application number
TW110305383F
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English (en)
Chinese (zh)
Inventor
及川大海
高村侑矢
坂下訓康
Original Assignee
日商東京威力科創股份有限公司
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Publication of TWD218677S publication Critical patent/TWD218677S/zh

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TW110305383F 2020-01-17 2020-07-08 半導體成膜裝置用氣體供給噴嘴(三) TWD218677S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-000750 2020-01-17
JPD2020-750F JP1682708S (https=) 2020-01-17 2020-01-17

Publications (1)

Publication Number Publication Date
TWD218677S true TWD218677S (zh) 2022-05-01

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ID=75268261

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Application Number Title Priority Date Filing Date
TW110305383F TWD218677S (zh) 2020-01-17 2020-07-08 半導體成膜裝置用氣體供給噴嘴(三)

Country Status (2)

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JP (1) JP1682708S (https=)
TW (1) TWD218677S (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI648426B (zh) 2016-05-27 2019-01-21 東芝三菱電機產業系統股份有限公司 活性氣體生成裝置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI648426B (zh) 2016-05-27 2019-01-21 東芝三菱電機產業系統股份有限公司 活性氣體生成裝置

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Publication number Publication date
JP1682708S (https=) 2021-04-05

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