TWD209199S - 製造半導體裝置用的膜片 - Google Patents

製造半導體裝置用的膜片 Download PDF

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Publication number
TWD209199S
TWD209199S TW109301937D01F TW109301937D01F TWD209199S TW D209199 S TWD209199 S TW D209199S TW 109301937D01 F TW109301937D01 F TW 109301937D01F TW 109301937D01 F TW109301937D01 F TW 109301937D01F TW D209199 S TWD209199 S TW D209199S
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TW
Taiwan
Prior art keywords
film
manufacturing semiconductor
semiconductor device
design
diaphragm
Prior art date
Application number
TW109301937D01F
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English (en)
Chinese (zh)
Inventor
尾崎義信
田澤強
谷口紘平
矢羽田達也
板垣圭
Original Assignee
日商昭和電工材料股份有限公司
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Application filed by 日商昭和電工材料股份有限公司 filed Critical 日商昭和電工材料股份有限公司
Publication of TWD209199S publication Critical patent/TWD209199S/zh

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TW109301937D01F 2019-10-25 2020-04-10 製造半導體裝置用的膜片 TWD209199S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-023720 2019-02-13
JPD2019-23720F JP1660178S (enrdf_load_stackoverflow) 2019-10-25 2019-10-25

Publications (1)

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TWD209199S true TWD209199S (zh) 2021-01-01

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TW109301937D01F TWD209199S (zh) 2019-10-25 2020-04-10 製造半導體裝置用的膜片

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JP (1) JP1660178S (enrdf_load_stackoverflow)
TW (1) TWD209199S (enrdf_load_stackoverflow)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200937508A (en) 2007-09-21 2009-09-01 Semiconductor Energy Lab Substrate provided with semiconductor films and manufacturing method thereof
TW201622010A (zh) 2014-11-13 2016-06-16 Shindengen Electric Mfg 半導體裝置的製造方法以及玻璃膜形成裝置
TW201934683A (zh) 2018-02-05 2019-09-01 南韓商三星電子股份有限公司 保護膜組成物及使用保護膜組成物製造半導體封裝的方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200937508A (en) 2007-09-21 2009-09-01 Semiconductor Energy Lab Substrate provided with semiconductor films and manufacturing method thereof
TWI470682B (zh) 2007-09-21 2015-01-21 Semiconductor Energy Lab 設置有半導體膜的基底及其製造方法
TW201622010A (zh) 2014-11-13 2016-06-16 Shindengen Electric Mfg 半導體裝置的製造方法以及玻璃膜形成裝置
TWI584381B (zh) 2014-11-13 2017-05-21 Shindengen Electric Manufacturing Co Ltd A method of manufacturing a semiconductor device, and a glass film forming apparatus
TW201934683A (zh) 2018-02-05 2019-09-01 南韓商三星電子股份有限公司 保護膜組成物及使用保護膜組成物製造半導體封裝的方法

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JP1660178S (enrdf_load_stackoverflow) 2020-05-25

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