TWD191983S - 離子發生器 - Google Patents
離子發生器Info
- Publication number
- TWD191983S TWD191983S TW106306111F TW106306111F TWD191983S TW D191983 S TWD191983 S TW D191983S TW 106306111 F TW106306111 F TW 106306111F TW 106306111 F TW106306111 F TW 106306111F TW D191983 S TWD191983 S TW D191983S
- Authority
- TW
- Taiwan
- Prior art keywords
- static electricity
- article
- air
- workpieces
- workpiece
- Prior art date
Links
- 230000005611 electricity Effects 0.000 abstract description 5
- 230000003068 static effect Effects 0.000 abstract description 5
- 150000002500 ions Chemical class 0.000 abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 abstract 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-008795 | 2017-04-25 | ||
| JPD2017-8795F JP1588202S (cs) | 2017-04-25 | 2017-04-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD191983S true TWD191983S (zh) | 2018-08-01 |
Family
ID=60046959
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106306111F TWD191983S (zh) | 2017-04-25 | 2017-10-18 | 離子發生器 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD848572S1 (cs) |
| JP (1) | JP1588202S (cs) |
| TW (1) | TWD191983S (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD208774S (zh) | 2019-11-11 | 2020-12-11 | 日商Smc股份有限公司 | 離子發生器之部分 |
| CN113967315A (zh) * | 2020-11-06 | 2022-01-25 | 肖龙 | 用于纹身装置的针组件 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD899560S1 (en) * | 2018-11-06 | 2020-10-20 | Panasonic Intellectual Property Management Co., Ltd. | Unit for ion generator |
| USD878518S1 (en) * | 2018-12-14 | 2020-03-17 | Hytecon Ag | Water purification device |
| JP1641221S (cs) * | 2019-01-30 | 2019-09-17 | ||
| JP1659027S (cs) * | 2019-07-19 | 2020-05-11 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4371142B2 (ja) * | 2004-12-28 | 2009-11-25 | 株式会社村田製作所 | イオン発生ユニットおよびイオン発生装置 |
| USD652480S1 (en) * | 2009-09-29 | 2012-01-17 | Kubota Corporation | Membrane module for membrane separation |
| KR101645492B1 (ko) * | 2010-01-21 | 2016-08-05 | 엘지전자 주식회사 | 휴대용 이온 발생장치 |
| JP4773568B2 (ja) * | 2010-02-17 | 2011-09-14 | 株式会社コガネイ | イオン生成装置 |
| USD806828S1 (en) * | 2016-02-19 | 2018-01-02 | Smc Corporation | Ionizer controller module |
-
2017
- 2017-04-25 JP JPD2017-8795F patent/JP1588202S/ja active Active
- 2017-10-11 US US29/621,768 patent/USD848572S1/en active Active
- 2017-10-18 TW TW106306111F patent/TWD191983S/zh unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD208774S (zh) | 2019-11-11 | 2020-12-11 | 日商Smc股份有限公司 | 離子發生器之部分 |
| CN113967315A (zh) * | 2020-11-06 | 2022-01-25 | 肖龙 | 用于纹身装置的针组件 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP1588202S (cs) | 2017-10-16 |
| USD848572S1 (en) | 2019-05-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWD191983S (zh) | 離子發生器 | |
| MY197515A (en) | Base station and cleaning robot system | |
| TWD179095S (zh) | 基板保持環 | |
| TWD193438S (zh) | Jet ring for plasma processing unit | |
| TWD189312S (zh) | Sealing material for semiconductor manufacturing equipment | |
| TWD199479S (zh) | 半導體製造裝置用離子遮蔽器 | |
| TWD177427S (zh) | 電漿處理裝置用電極板 | |
| TWD204223S (zh) | 電漿處理裝置用接地電極 | |
| TWD175855S (zh) | 電漿處理裝置用下腔室 | |
| MX2016005435A (es) | Dispositivo para limpiar una aguja de una sonda de medición. | |
| TWD163542S (zh) | 基板處理裝置用晶舟 | |
| MY155778A (en) | Manufacturing method of a glass substrate for a magnetic disk | |
| PH12017501030A1 (en) | Polishing device and polishing method | |
| SG10201805185SA (en) | Electrostatic Attraction Method | |
| TWD174920S (zh) | 基板處理裝置用氣體供給噴嘴 | |
| SG11201804212TA (en) | Article carrying system | |
| PH12017501970B1 (en) | Method for producing rare-earth magnet | |
| TW201612944A (en) | Plasma processing apparatus | |
| TWD182309S (zh) | 離化器用高電壓電源模組 | |
| TWD213830S (zh) | 液體噴吐用噴嘴 | |
| TWD187378S (zh) | 離化器用高電壓電源模組 | |
| MY188084A (en) | Wafer-like substrate processing method, apparatus and use thereof | |
| TWD167113S (zh) | 半導體晶圓硏磨裝置用彈性膜 | |
| TWD178183S (zh) | 半導體製造裝置用靜電吸盤之部分 | |
| TWD181609S (zh) | 離化器用控制器 |