TWD154970S - 海綿刷的刷心 - Google Patents

海綿刷的刷心

Info

Publication number
TWD154970S
TWD154970S TW100306710F TW100306710F TWD154970S TW D154970 S TWD154970 S TW D154970S TW 100306710 F TW100306710 F TW 100306710F TW 100306710 F TW100306710 F TW 100306710F TW D154970 S TWD154970 S TW D154970S
Authority
TW
Taiwan
Prior art keywords
sponge brush
brush core
core
sponge
design description
Prior art date
Application number
TW100306710F
Other languages
English (en)
Chinese (zh)
Inventor
Robert Willis
Bradley S Withers
Original Assignee
伊利諾工具工程公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US29/393,743 external-priority patent/USD727579S1/en
Application filed by 伊利諾工具工程公司 filed Critical 伊利諾工具工程公司
Publication of TWD154970S publication Critical patent/TWD154970S/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/001—Cylindrical or annular brush bodies

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Brushes (AREA)
TW100306710F 2011-06-08 2011-12-08 海綿刷的刷心 TWD154970S (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161494786P 2011-06-08 2011-06-08
US29/393,743 USD727579S1 (en) 2011-06-08 2011-06-08 Brush core for a sponge brush
US13/464,810 US8898845B2 (en) 2011-06-08 2012-05-04 Brush mandrel for PVA sponge brush

Publications (1)

Publication Number Publication Date
TWD154970S true TWD154970S (zh) 2013-07-21

Family

ID=46298710

Family Applications (3)

Application Number Title Priority Date Filing Date
TW100306710F TWD154970S (zh) 2011-06-08 2011-12-08 海綿刷的刷心
TW100306710D01F TWD161994S (zh) 2011-06-08 2011-12-08 海綿刷的刷心之部分（一）
TW101120689A TWI561315B (en) 2011-06-08 2012-06-08 Device comprising brush mandrel for pva sponge brush and method using the same

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW100306710D01F TWD161994S (zh) 2011-06-08 2011-12-08 海綿刷的刷心之部分（一）
TW101120689A TWI561315B (en) 2011-06-08 2012-06-08 Device comprising brush mandrel for pva sponge brush and method using the same

Country Status (6)

Country Link
US (2) US8898845B2 (enExample)
EP (1) EP2718031B1 (enExample)
JP (1) JP6027101B2 (enExample)
CN (1) CN103648666B (enExample)
TW (3) TWD154970S (enExample)
WO (1) WO2012170767A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10271636B2 (en) * 2014-11-10 2019-04-30 Illinois Tool Works Inc. Archimedes brush for semiconductor cleaning
CN104759423A (zh) * 2015-04-14 2015-07-08 夏云美 一种陶瓷管清洗用滚刷
CN105665308A (zh) * 2016-04-22 2016-06-15 安徽捷迅光电技术有限公司 一种新型色选机的清灰装置
CN105772426A (zh) * 2016-05-17 2016-07-20 侯如升 一种纺织设备用清洁装置
WO2018124211A1 (ja) * 2016-12-28 2018-07-05 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
CN110473800A (zh) * 2018-05-10 2019-11-19 弘塑科技股份有限公司 清洗装置及方法
US10758946B2 (en) * 2019-01-23 2020-09-01 Tung An Development Ltd. Device of cleaning brush
JP7595907B2 (ja) * 2020-08-07 2024-12-09 アイオン株式会社 洗浄用スポンジローラ
WO2022115671A1 (en) * 2020-11-30 2022-06-02 Araca, Inc. Brush for cleaning a substrate
US20250229300A1 (en) * 2024-01-16 2025-07-17 Illinois Tool Works Inc. Brushes and systems with improved brush mandrels

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5949016U (ja) * 1982-09-25 1984-03-31 利昌工業株式会社 複合材ロ−ラ
JPH0240624A (ja) 1988-07-29 1990-02-09 Fuji Photo Film Co Ltd 液晶表示素子
JPH077153Y2 (ja) * 1989-07-13 1995-02-22 日本ポリペンコ株式会社 熱可塑性樹脂被覆金属成形品
US6502273B1 (en) 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6286169B1 (en) 1997-01-27 2001-09-11 Tennant Company Tessellated cylindrical brush
JP2999745B2 (ja) * 1998-01-09 2000-01-17 鐘紡株式会社 多孔質ロールとその製造方法及び保管方法
US6070284A (en) 1998-02-04 2000-06-06 Silikinetic Technology, Inc. Wafer cleaning method and system
US6240588B1 (en) 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US20020020434A1 (en) 2000-07-07 2002-02-21 Mcmullen Daniel T. Injection molded disposable core featuring recessed pores for substrate treatment member
EP1680260B1 (en) 2003-08-08 2014-04-30 Entegris, Inc. Methods and materials for making a monolithic porous pad cast onto a rotatable base
US6981291B2 (en) 2003-09-26 2006-01-03 The Hartz Mountain Corporation Motorized cleaning apparatus
WO2005072560A2 (en) 2004-01-29 2005-08-11 Applied Materials, Inc. Methods and apparatus for installing a scrubber brush on a mandrel
US20070006405A1 (en) 2005-07-07 2007-01-11 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for wafer cleaning
US7841035B2 (en) * 2005-10-13 2010-11-30 Hitachi High-Technologies Corporation Disc cleaning machinery, disc cleaning device thereof and rotary brush thereof
JP4516508B2 (ja) * 2005-10-13 2010-08-04 株式会社日立ハイテクノロジーズ ディスク洗浄装置
KR101324870B1 (ko) 2005-12-06 2013-11-01 엔테그리스, 아이엔씨. 다공성 패드를 위한 성형된 회전가능 기부
US8407846B2 (en) * 2006-03-07 2013-04-02 Applied Materials, Inc. Scrubber brush with sleeve and brush mandrel for use with the scrubber brush
USD622920S1 (en) 2007-05-02 2010-08-31 Entegris Corporation Cleaning sponge roller
JP4934644B2 (ja) 2007-06-25 2012-05-16 株式会社日立ハイテクノロジーズ ディスク洗浄機構およびディスク洗浄装置
US8505145B2 (en) * 2008-06-06 2013-08-13 Aion Co., Ltd. Central core for a cleaning sponge roller
US9524886B2 (en) * 2009-05-15 2016-12-20 Illinois Tool Works Inc. Brush core and brush driving method
KR101119951B1 (ko) 2009-09-29 2012-03-16 방선정 반도체 웨이퍼용 브러쉬 롤
CN202096154U (zh) 2011-05-23 2012-01-04 钟因翔 用于吸尘器的滚刷

Also Published As

Publication number Publication date
WO2012170767A1 (en) 2012-12-13
TWI561315B (en) 2016-12-11
EP2718031A1 (en) 2014-04-16
CN103648666A (zh) 2014-03-19
JP2014516784A (ja) 2014-07-17
US20120312322A1 (en) 2012-12-13
TW201302328A (zh) 2013-01-16
US9455163B2 (en) 2016-09-27
TWD161994S (zh) 2014-08-01
JP6027101B2 (ja) 2016-11-16
EP2718031B1 (en) 2015-08-12
US20140373874A1 (en) 2014-12-25
US8898845B2 (en) 2014-12-02
CN103648666B (zh) 2015-09-23

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