TWI561315B - Device comprising brush mandrel for pva sponge brush and method using the same - Google Patents

Device comprising brush mandrel for pva sponge brush and method using the same

Info

Publication number
TWI561315B
TWI561315B TW101120689A TW101120689A TWI561315B TW I561315 B TWI561315 B TW I561315B TW 101120689 A TW101120689 A TW 101120689A TW 101120689 A TW101120689 A TW 101120689A TW I561315 B TWI561315 B TW I561315B
Authority
TW
Taiwan
Prior art keywords
brush
same
mandrel
pva sponge
sponge brush
Prior art date
Application number
TW101120689A
Other languages
English (en)
Other versions
TW201302328A (zh
Inventor
Robert Willis
Bradley S Withers
Original Assignee
Illinois Tool Works
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Illinois Tool Works filed Critical Illinois Tool Works
Publication of TW201302328A publication Critical patent/TW201302328A/zh
Application granted granted Critical
Publication of TWI561315B publication Critical patent/TWI561315B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/34—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis parallel to the surface
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • A—HUMAN NECESSITIES
    • A46—BRUSHWARE
    • A46B—BRUSHES
    • A46B13/00—Brushes with driven brush bodies or carriers
    • A46B13/001—Cylindrical or annular brush bodies

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Brushes (AREA)
TW101120689A 2011-06-08 2012-06-08 Device comprising brush mandrel for pva sponge brush and method using the same TWI561315B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161494786P 2011-06-08 2011-06-08
US13/464,810 US8898845B2 (en) 2011-06-08 2012-05-04 Brush mandrel for PVA sponge brush

Publications (2)

Publication Number Publication Date
TW201302328A TW201302328A (zh) 2013-01-16
TWI561315B true TWI561315B (en) 2016-12-11

Family

ID=46298710

Family Applications (3)

Application Number Title Priority Date Filing Date
TW100306710F TWD154970S (zh) 2011-06-08 2011-12-08 海綿刷的刷心
TW100306710D01F TWD161994S (zh) 2011-06-08 2011-12-08 海綿刷的刷心之部分（一）
TW101120689A TWI561315B (en) 2011-06-08 2012-06-08 Device comprising brush mandrel for pva sponge brush and method using the same

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW100306710F TWD154970S (zh) 2011-06-08 2011-12-08 海綿刷的刷心
TW100306710D01F TWD161994S (zh) 2011-06-08 2011-12-08 海綿刷的刷心之部分（一）

Country Status (6)

Country Link
US (2) US8898845B2 (zh)
EP (1) EP2718031B1 (zh)
JP (1) JP6027101B2 (zh)
CN (1) CN103648666B (zh)
TW (3) TWD154970S (zh)
WO (1) WO2012170767A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10271636B2 (en) * 2014-11-10 2019-04-30 Illinois Tool Works Inc. Archimedes brush for semiconductor cleaning
CN104759423A (zh) * 2015-04-14 2015-07-08 夏云美 一种陶瓷管清洗用滚刷
CN105665308A (zh) * 2016-04-22 2016-06-15 安徽捷迅光电技术有限公司 一种新型色选机的清灰装置
CN105772426A (zh) * 2016-05-17 2016-07-20 侯如升 一种纺织设备用清洁装置
KR102185140B1 (ko) * 2016-12-28 2020-12-01 시바우라 메카트로닉스 가부시키가이샤 기판 처리 장치 및 기판 처리 방법
CN110473800A (zh) * 2018-05-10 2019-11-19 弘塑科技股份有限公司 清洗装置及方法
US10758946B2 (en) * 2019-01-23 2020-09-01 Tung An Development Ltd. Device of cleaning brush
JP2022030618A (ja) * 2020-08-07 2022-02-18 アイオン株式会社 洗浄用スポンジローラ
WO2022115671A1 (en) * 2020-11-30 2022-06-02 Araca, Inc. Brush for cleaning a substrate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007105624A (ja) * 2005-10-13 2007-04-26 Hitachi High-Technologies Corp ディスク洗浄装置
TW200950893A (en) * 2008-06-06 2009-12-16 Aion Co Ltd Core for a cleaning sponge roller
US20100288305A1 (en) * 2009-05-15 2010-11-18 Illinois Tool Works Inc. Brush core and brush driving method

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JPS5949016U (ja) * 1982-09-25 1984-03-31 利昌工業株式会社 複合材ロ−ラ
JPH0240624A (ja) 1988-07-29 1990-02-09 Fuji Photo Film Co Ltd 液晶表示素子
JPH077153Y2 (ja) * 1989-07-13 1995-02-22 日本ポリペンコ株式会社 熱可塑性樹脂被覆金属成形品
US6502273B1 (en) 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
US6286169B1 (en) 1997-01-27 2001-09-11 Tennant Company Tessellated cylindrical brush
JP2999745B2 (ja) * 1998-01-09 2000-01-17 鐘紡株式会社 多孔質ロールとその製造方法及び保管方法
US6070284A (en) 1998-02-04 2000-06-06 Silikinetic Technology, Inc. Wafer cleaning method and system
US6240588B1 (en) 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US20020020434A1 (en) 2000-07-07 2002-02-21 Mcmullen Daniel T. Injection molded disposable core featuring recessed pores for substrate treatment member
WO2005016599A1 (en) 2003-08-08 2005-02-24 Mykrolys Corporation Methods and materials for making a monolithic porous pad cast onto a rotatable base
US6981291B2 (en) 2003-09-26 2006-01-03 The Hartz Mountain Corporation Motorized cleaning apparatus
KR101122792B1 (ko) 2004-01-29 2012-03-21 어플라이드 머티어리얼스, 인코포레이티드 스크러버 브러쉬를 맨드릴 상에 설치하는 장치 및 방법
US20070006405A1 (en) 2005-07-07 2007-01-11 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for wafer cleaning
US7841035B2 (en) * 2005-10-13 2010-11-30 Hitachi High-Technologies Corporation Disc cleaning machinery, disc cleaning device thereof and rotary brush thereof
JP5032497B2 (ja) 2005-12-06 2012-09-26 インテグリス・インコーポレーテッド 多孔性パッド用の回転可能な成形ベース
TWI351991B (en) * 2006-03-07 2011-11-11 Applied Materials Inc Scrubber brush with sleeve and brush mandrel for u
USD622920S1 (en) 2007-05-02 2010-08-31 Entegris Corporation Cleaning sponge roller
JP4934644B2 (ja) 2007-06-25 2012-05-16 株式会社日立ハイテクノロジーズ ディスク洗浄機構およびディスク洗浄装置
KR101119951B1 (ko) 2009-09-29 2012-03-16 방선정 반도체 웨이퍼용 브러쉬 롤
CN202096154U (zh) 2011-05-23 2012-01-04 钟因翔 用于吸尘器的滚刷

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007105624A (ja) * 2005-10-13 2007-04-26 Hitachi High-Technologies Corp ディスク洗浄装置
TW200950893A (en) * 2008-06-06 2009-12-16 Aion Co Ltd Core for a cleaning sponge roller
US20100288305A1 (en) * 2009-05-15 2010-11-18 Illinois Tool Works Inc. Brush core and brush driving method

Also Published As

Publication number Publication date
TWD161994S (zh) 2014-08-01
US8898845B2 (en) 2014-12-02
TW201302328A (zh) 2013-01-16
JP2014516784A (ja) 2014-07-17
US20140373874A1 (en) 2014-12-25
CN103648666A (zh) 2014-03-19
WO2012170767A1 (en) 2012-12-13
CN103648666B (zh) 2015-09-23
TWD154970S (zh) 2013-07-21
EP2718031A1 (en) 2014-04-16
EP2718031B1 (en) 2015-08-12
US9455163B2 (en) 2016-09-27
JP6027101B2 (ja) 2016-11-16
US20120312322A1 (en) 2012-12-13

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