TW593766B - Method for recovering cerium from chromium etching solution - Google Patents

Method for recovering cerium from chromium etching solution Download PDF

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TW593766B
TW593766B TW91119761A TW91119761A TW593766B TW 593766 B TW593766 B TW 593766B TW 91119761 A TW91119761 A TW 91119761A TW 91119761 A TW91119761 A TW 91119761A TW 593766 B TW593766 B TW 593766B
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Taiwan
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chromium
hydroxide
etching solution
oxalate
ammonium
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TW91119761A
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Chinese (zh)
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Ryuichi Saito
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Hayashi Pure Chemical Ind Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

This invention is to provide a method capable of efficiently recovering cerium from chromium etching solution containing cerium compound and chromium compound. The chromium etching solution is vaporized and concentrated and the cerium compound is crystallized, separated and recovered and also, the cerium in the separated solution after separating the cerium compound, is separated and recovered as oxalate. In the solution containing trivalent chromium after separating the oxalate of trivalent cerium, an alkaline hydroxide is added and the trivalent chromium is precipitated as chromium hydroxide and separated to constitute a closed system.

Description

593766 五、發明說明(1) 【發明所屬技術領域】 本發明與由使用於鉻蝕刻等之蝕刻液回收鈽之方法有 關 洋3之’以含硝酸鈽銨(ceric ammonium nitrate)等 飾化合物與酸之蝕刻液進行鉻蝕刻後,由含鈽與鉻之鉻蝕 刻液回收鈽之方法有關。 【習用技術】 *在半導體或液晶顯示器之製造過程通常含有蝕刻電極 膜等金屬薄膜之製程’於此姓刻製程中進行鉻姓刻時,一 般使用g ;G肖酸鈽銨等鈽化合物之鉻餘刻液。又鉻餘刻液可 舉例如下列各種組成之鉻蝕刻液: (1) 配合硝酸鈽鈹與硝酸、 (2) 配合硝酸鈽與硝酸與硝酸銨、 (3 )配合硝酸鈽銨與高氣酸、 (4)配合硝酸鈽銨與硝酸與高氣酸等。 液中t m用任一組成之鉻蝕刻液,在使用過之鉻蝕刻 〒3,大ϊ之4價鈽與β價鉻。 故必需t貝^與6價絡均為強氧化性之有害(環境)物質, 公開專利去除此等物質。而其處理方法如日本 鈉於含鉻T6886。號提示,廣況使用加亞硫酸氫 該廢液中錦銨廢液中還原鉻後加氫氧化每,使 又亦有Ϊ與t币之氣氧化物共同沈殿以去除之方法。 之方法。钕不逛原4價鈽與6價鉻後吸著於吸附劑以去除 但依上逮習用方法未能有效利用高價之錦而大量廢棄593766 V. Description of the invention (1) [Technical field of the invention] The present invention relates to a method for recovering tritium from an etching solution used for chromium etching and the like. The third method is to use ceric ammonium nitrate and other decorative compounds and acids. After the etching solution is etched with chromium, the method of recovering rhenium from a chromium etching solution containing rhenium and chromium is related. [Conventional Technology] * In the manufacturing process of semiconductor or liquid crystal display, it usually includes the process of etching metal thin films such as electrode films. When chromium is engraved in this process, g is generally used; Chromium, G, ammonium bismuth acid, etc. I carved liquid. The chromium etching solution can be, for example, a chromium etching solution of the following compositions: (1) with beryllium nitrate and nitric acid, (2) with rhenium nitrate and nitric acid and ammonium nitrate, (3) with ammonium rhenium nitrate and high gas acid, (4) With ammonium nitrate, nitric acid and high gas acid. In the liquid t m, a chromium etching solution of any composition is used, and the used chromium is etched with 〒3, ϊ4valent 钸, and β-valent chromium. Therefore, it is necessary that both the valence and the valence of 6 are strong oxidative and harmful (environmental) substances, and these patents are removed. The treatment method is, for example, sodium sodium in chromium T6886. No. reminder, the general situation is to add hydrogen sulfite to reduce the chromium in the ammonium ammonium waste liquid and then add hydroxide each, so that there is also a method to remove the thallium and t coin gas oxides. Method. The neodymium is not removed from the original 4-valent europium and 6-valent chromium after being adsorbed on the adsorbent to be removed.

第4頁 州766Page 4 State 766

發明說明(2) 實為不經濟 又日本公開專利公報第昭62_丨9 1 422號提示,將3僭 用氣化#丨丨g 巧鄉 而八t 乳化成4價飾後利用其他物質與4價鈽性質之不r ' 叩刀離、斗·#· ^L}] 萌衣鈽之方法,但依此方法如鉻蝕刻廢液含鉻 ,、 不、純物睹 ❻辱. W ’鈽與鉻共同沈澱而無法單獨分離、回收鈽。 、 【發明欲解決之課題】 八姑發月為解決上述各種問題’提供能夠以良好效率由 ' 3 與絡之鉻蝕刻液回收鈽之方法為目的。 【解決課題之方法】 為達成上述目的,本發明(申請專利範圍第1項)之由 、蝕刻液回收鈽之方法為 _ 以鈽化合物為主要成分之蝕刻液進行鉻蝕刻後,由含 Y b 5物與鉻化合物之蝕刻液回收鈽之方法,其特徵為且 備下列步驟: 〜 (a) 蒸發濃縮含筛化合物與鉻化合物之酸性鉻餘刻液 使鈽化合物析出之蒸發結晶化步驟; (b) 分離析出之鈽化合物之步驟; (c) 利用分離之鈽化合物調製使用於鉻蝕刻之组成之 餘刻液之步驟。 蒸發》辰縮含鈽(化合物)與鉻(化合物)之酸性鉻餘刻液 使鈽化合物析出並分離,同時利用該分離之鈽化合物調製 使用於鉻蝕刻之蝕刻液,即可以較簡單之蒸發結晶化方法 以良好效率由使用過之鉻蝕刻液回收鈽。 申請專利範圍第2項之由鉻蝕刻液回收鈽之方法,其Description of the invention (2) It is really uneconomical and it is suggested by Japanese Laid-Open Patent Publication No. 62_ 丨 9 1 422 that 3 僭 用 气化 # 丨 丨 g 巧 乡 和 八 t is emulsified into a valence of 4 and other materials are used. The nature of the 4-valent 钸 is not r '叩 刀 离, 斗 · # · ^ L}] The method of sprouting clothes, but according to this method, such as chromium etching waste liquid contains chromium, no, pure things see shame. W' 钸It is co-precipitated with chromium and cannot be separated and recovered. [Problems to be Solved by the Invention] In order to solve the above-mentioned various problems, Bagufayue provided a method capable of recovering plutonium from the chrome etching solution of '3 and Nero with good efficiency. [Method to solve the problem] In order to achieve the above-mentioned object, the method of recovering the etchant from the etchant according to the present invention (the scope of application for patent) is _ After the chromium etchant containing the samarium compound as the main component is etched by chromium, A method for recovering rhenium from an etching solution containing 5 compounds and chromium compounds, which is characterized by the following steps: ~ (a) an evaporation crystallization step of evaporating and concentrating an acid chromium residual solution containing a sieve compound and a chromium compound to precipitate rhenium compounds; ( b) a step of isolating the lutetium compound that has been precipitated; (c) a step of preparing an etching solution for the composition of chromium etching by using the separated ytterbium compound. Evaporation: An acidic chromium solution containing rhenium (compound) and chromium (compound) is used to precipitate and separate rhenium compounds. At the same time, the separated rhenium compound is used to prepare an etching solution for chromium etching, which can relatively simply evaporate and crystallize. The method recovers the plutonium from the used chromium etchant with good efficiency. Method for recovering plutonium from chromium etching solution in the scope of patent application No. 2

$ 5頁$ 5 pages

— 593766— 593766

五、發明說明(3) 特徵為於申請專利範圍第i項(a)之蒸 之鋪化合物為錢雜。 析出 於鉻蝕刻液通常使用硝酸鈽銨為鈽化合物,採用蒎發 结晶化方法可使硝酸鈽銨以良好效率析出而分離、回收。 申請專利範圍第3項之由鉻蝕刻液回收鈽之方法為 以鈽化合物為主要成分之蝕刻液進行鉻蝕刻後,由含 鈽化合物與鉻化合物之蝕刻液回收鈽之方法,其特徵 備下列步驟:V. Description of the invention (3) The steamed compound in item i (a) of the scope of the patent application is characterized by money. Precipitation Generally, ammonium osmium nitrate is used as the erbium compound in the chromium etching solution, and the ammonium osmium nitrate can be separated and recovered with good efficiency by the crystallization method. The method for recovering rhenium from chromium etching solution according to item 3 of the patent application is a method for recovering rhenium from an etching solution containing rhenium compound and chromium compound after chromium etching using an etching solution containing rhenium compound as a main component. The characteristics are as follows: :

(a )蒸發漢縮含鈽化合物與鉻化合物之酸性鉻蝕刻液 使鈽化合物析出之蒸發結晶化步驟; (b )分離析出之鈽化合物之步驟; (c)用草酸鹽分離、回收上述步驟(b)分離鈽化合物後 之分離液中(殘存)之鈽之步驟。 蒸發濃縮鉻蝕刻液使鈽化合物析出並分離、回收,同 時以草酸鹽分離、回收分離鈽化合物後之分離液中(殘存) 之鈽’即可大約全量回收鉻蝕刻液中之鈽,使鈽之回收率 大幅度提升,使本發明更有實際效果。(a) Evaporation and crystallization step of precipitating rhenium compounds by evaporation of acid chromium etching solution containing rhenium compounds and chromium compounds; (b) step of separating precipitating rhenium compounds; (c) separating and recovering the above steps with oxalate (B) A step of (remaining) plutonium in the separation solution after the plutonium compound is separated. The chromium etching solution is concentrated by evaporation to separate, recover and recover the rhenium compound. At the same time, the oxalate in the separation solution (remaining) after the erbium compound is separated and recovered can recover approximately the entire amount of the chromium etching solution, so that The recovery rate is greatly improved, making the present invention more practical.

申请專利範圍弟4項之由鉻錄刻液回收飾之方法,其 特徵為具備添加氫氧化驗(金屬)於申請專利範圍第3項步 驟(c )分離、回收草酸鹽後之含3價鉻溶液中,使3價鉻以 氫氧化鉻析出、分離之步驟。 、 於申清專利範圍第3項步驟(c )分離以3價飾之草酸鹽 為主要成分之析出物後,加氫氧化驗(金屬)於此含3價鉻 之各液中,使3價鉻以氫氧化鉻析出、分離,即可構成密Method for recovering decoration from chrome recording and engraving liquid according to item 4 of the scope of patent application, which is characterized by adding trivalent hydroxide (metal) after separation and recovery of oxalate after step 3 (c) of the scope of patent application. In a chromium solution, trivalent chromium is precipitated and separated as chromium hydroxide. 2. After step 3 (c) in the scope of Shenqing Patent, the precipitate containing oxalate trivalent as the main component is separated, and then add hydroxide test (metal) to each solution containing trivalent chromium to make 3 Valence chromium is precipitated and separated by chromium hydroxide to form dense

第6頁 593766 五、發明說明(4) 閉匕閉路)系統’有害物質鉻不會排出於系統外,而有價 物質鈽則以良好效率回收,故極為有意義。 而有h H矛:範圍第5項之由鉻蝕刻液回收鈽之方法為 Ml鹽分離'回收於中請 = 離鈽化合物後之分離液中夕絲夕丰_ =示貝乂 刀 步驟·· 夜中之鈽之步驟,其特徵為具備下列 (a)添加草酸於上述分離液中,使分離 為3價鈽而以草酸鹽析出之步驟; φ還原 (b )添加驗於析出c{槽你 哲 質上不析出3價鉻:ΪΛ鈽物之之^ 析出之步驟; 乳化物之耘度’再使3價鈽以草酸鹽 (C)分離步驟(a)、(b)析出之以3 成分之析出物之步驟。 早夂π马主要 之八:HUr項步驟(C)分離析出之筛化合物後 之刀離液中’添加具還原4價料3㈣之還原作用 3價飾與不溶性鹽之草酸,使鉻㈣液中之⑷賈) ^ 3價鈽並以草酸鹽析出,同時再添加鹼使中和至實/上不<,、、 析出3價絡之氫氧化物之程度,再使3價錦以草酸鹽不 後,分離以析出之3價鈽之草酸鹽為主 由:結晶化步驟析出筛化合物後之含^ =物之鉻㈣液,以良好效率分離、时幾乎不含絡之 申請專利範圍第6項之由鉻蝕刻液回收铈之方 特徵為於申請專利範圍第5項步驟(b)添加驗使中和時應加Page 6 593766 V. Description of the invention (4) Closed circuit) The system's harmful substance chromium will not be discharged out of the system, while the valuable substance 钸 is recovered with good efficiency, so it is extremely meaningful. There are h H spears: the method of recovering rhenium from chromium etching solution in item 5 of the scope is Ml salt separation. The step in the night is characterized by the following steps: (a) the step of adding oxalic acid to the above-mentioned separation solution to separate the trivalent europium and precipitating as oxalate; φ reduction (b) adding the test to the precipitation c {槽 你Trivalent chromium does not precipitate on the philosophical substance: the step of precipitation of ΪΛ 钸; the hardness of the emulsified product, and then the trivalent hydrazone is separated by oxalate (C) in steps (a) and (b). Precipitation of ingredients. Early 八 πMa main eight: After the HUr step (C) separation of the sieve compound separated from the knife's liquid 'addition of reducing valence of 3 valence 3 料 3 valence and insoluble salt of oxalic acid, so that chromium ㈣ solution Zhi ^) ^ 3 valence and oxalate precipitation, at the same time add alkali to neutralize to the extent that the valence of trivalent complex hydroxide is precipitated, and then make the trivalent bromide After the acid salt is not separated, the main reason for the separation of the trivalent oxalate is as follows: the chromate solution containing ^ = after the sieve compound is precipitated in the crystallization step, and is separated with good efficiency, which is almost free of patent applications. The method of recovering cerium from the chromium etching solution in the scope of item 6 is characterized in that in step 5 (b) of the scope of the patent application, the inspection should be added when neutralization is added.

第7頁 五、發明說明(5) 驗至pH為約4為止。 因為於申請專利範圍第 使PH成為約4為止,故能夠、步驟(b )進行中和時添加鹼 同時使3價鈽以草酸鹽確每I制、防止鉻以氫氧化物析出 又申請專利範圍第7 ^ =而可提升鈽之时效率。 其特徵為具備下列步驟:、由鉻蝕刻液回收鈽之方法, 對於申請專利範圍第5 3價鈽之草酸鹽為主要成八、V驟(C)分離、回收以析出之 用使生成氫氧化亞鈽之步刀驟析出物用氫氧化鹼(金屬)作 對於生成之該氫氧化托&Page 7 5. Description of the invention (5) Test until pH is about 4. Because the pH is about 4 in the scope of the patent application, it is possible to apply for a patent by adding a base while neutralizing the trivalent amidine with oxalate at the time of neutralization in step (b) and preventing the precipitation of chromium with hydroxide. The seventh range of ^ = can improve the efficiency of 钸. It is characterized by having the following steps: a method for recovering tritium from a chromium etching solution; the oxalate salt of trivalent tritium is the main component of the patent application scope; V step (C) is separated and recovered for precipitation to generate hydrogen; The precipitant of the arsenic oxide is prepared by using alkali hydroxide (metal) as the hydroxide base.

鈽之步驟,及 鈽以氧化劑作用使生成氫氧化 加熱濃 以析出 金屬) 氧化劑 酸銨作 配合石肖 循環使 之氧化 縮生】硝i:ί::化鈽以硝酸及硝酸銨作用並 之㈣G)分離、回收 作用使生成氫氧化鈽後,對 =K化亞鈽以 用並加熱濃縮使生成硝酸鈽二軋:二以硝酸及硝 ^…調製成新的路 劑可Γ吏;::氣::為氧化氫氧化亞飾為氫氧化鈽 回收鈽之方法 其特;:=利範圍第8項之由鉻#刻液The step of 钸, and 氧化剂 oxidize the generated hydroxide to concentrate the metal to precipitate the metal.) The oxidant ammonium acid is used in conjunction with the Shi Xiao cycle to make it oxidatively shrink] nitrate i: ί :: chemical reaction with nitric acid and ammonium nitrate. ) After separation and recovery to generate ytterbium hydroxide, the ytterbium nitrate can be heated and concentrated to generate ytterbium nitrate. The nitrate and nitrate can be used to prepare a new route agent. :: It is a method for recovering dysprosium from oxidized oxyhydroxide and dysprosium hydroxide.: == The chromium range #etching solution

使用申請專利範圍第2 硝酸鈽銨與申請專利範 丨〇發結晶化步驟所析出之 製使用於鉻蝕刻之既f7項所生成之硝酸鈽銨,以調 使用蒸發結晶:ΐ:;:餘刻液之步驟。 第2項)與申請專利範圍第 之硝酸鈽銨(中請專利範圍 用…刻之既定組成之確酸飾録,以調製使 攻之钱刻液’可循環使用回收之全量 鈽為蝕刻液,使本發明更有實際效果。 王里 【實施發明之形態] 以下用本,明之實施形態再詳細說明本發明之特徵。The ammonium osmium nitrate produced by the crystallization step in the patent application scope No. 2 ammonium osmium nitrate and the patent application range is used for the chromium fetching of the ammonium osmium nitrate produced by the f7 item to adjust the use of evaporation crystallization: ΐ:;: 余 刻液 的 步骤。 Liquid steps. Item 2) and the ammonium osmium nitrate of the scope of patent application (please request the scope of the patent to be used with the exact composition of the engraved predetermined composition, so as to make the entire amount of the engraving solution 'recyclable and recoverable' as an etching solution, Make the present invention more practical. Wang Li [Forms of Implementing the Invention] The following describes the features of the present invention in detail by using the present and the following embodiments.

本實施形態以含硝酸鈽銨與硝酸之鉻蝕刻液進行鉻蝕 刻後,由含4價鈽、6價鉻、硝酸等使用過之鉻蝕刻液回收 鈽為例說明。 本實施形態使用以下列比例含鈽化合物與鉻化合物之 鉻触刻液當做使用過之鉻I虫刻液。 鈽含量(以 CeO^f) :48.6g(48.6g / kg) 鉻含量(以 Cr 計) :682ppm(682mg / l) 〔1〕蒸發結晶化: 首先,蒸發濃縮以上述比例含鈽與鉻之使用過之鉻I虫 刻液(1 0 0 0 g ),一方面分離、回收結晶析出之鈽化合物(硝 酸鈽銨),另一方面將分離硝酸鈽銨後之分離液、即晶化 母液(硝酸鈽銨之飽和溶液)濃縮液連續以既定比例取出系 外。 , 具體而言,實施如下說明之操作以進行硝酸鈽銨結晶 , 之晶化、固液體分離、硝酸水之回收等。In this embodiment, the chromium etching solution containing ammonium osmium nitrate and nitric acid is used to etch chromium, and then the rhenium is recovered from the used chromium etching solution containing tetravalent europium, hexavalent chromium, nitric acid, and the like. In this embodiment, a chromium contact etching solution containing a europium compound and a chromium compound in the following ratio is used as the used chromium I insect solution. Rhenium content (in CeO ^ f): 48.6g (48.6g / kg) Chromium content (in Cr): 682ppm (682mg / l) [1] Evaporation and crystallization: First, evaporate and concentrate Used chromium I insect solution (1000 g), on the one hand, the crystallized praseodymium compound (ammonium phosphonium ammonium nitrate) is separated and recovered, and on the other hand, the separated liquid, namely the crystallized mother liquor ( Saturated solution of ammonium ammonium nitrate) The concentrated solution is continuously taken out of the system at a predetermined ratio. Specifically, the operations described below are performed to crystallize ammonium ammonium nitrate, crystallization, solid-liquid separation, recovery of nitric acid, and the like.

第9頁 593766Page 9 593766

五、發明說明(Ό (1 -1)將以上述比例含鈽與鉻之使用過之鉻蝕刻液連 續供給蒸發晶化裝置之蒸發部以蒸發濃縮鉻姓刻液(第1 圖、步驟1 ( S1 ))。 (1 - 2 )於蒸發晶化裝置之晶化部析出、生長鈽化合物 :· (硝酸鈽銨)之結晶(第1圖、步驟2 ( S 2 )),並以遠心分離機 : 等固液體分離機分離、回收生長之結晶(第1圖、步驟 3(S3)) 。 * (1 - 3 )其次洗清分離之硝酸鈽銨結晶,並去除付著於 結晶之付著液(含鉻濃縮液)之主要部分(第1圖、步驟V. Description of the invention (Ό (1 -1) The used chromium etching solution containing rhenium and chromium in the above ratio is continuously supplied to the evaporation part of the evaporation crystallization device to evaporate and condense the chromium etching solution (Fig. 1, step 1 ( S1)). (1-2) Precipitation and growth of tritium compounds in the crystallization part of the evaporation crystallization device: · (ammonium phosphonium nitrate) crystals (Fig. 1, step 2 (S 2)), and a telecentric separator : Isosolid liquid separator separates and recovers the growing crystals (Figure 1, Step 3 (S3)). * (1-3) Secondly, the separated ammonium osmium nitrate crystals are washed, and the supporting liquids attached to the crystals are removed. (Chromium-containing concentrate) The main part (Figure 1, steps

4(S4))。 (1 - 4 )另一方面冷凝於上述蒸發濃縮步驟發生之蒸汽 以回收硝酸水(第1圖、步驟5(S5))。 (1-5)其次由步驟3(S3)之分離液及步驟4(S4)之洗清 液回收鈽(第1圖、步驟6(S6))。此步驟6(S6)之鈽之回收 係經圖2之流程圖所示步驟11 (S11)〜步驟21 (S21)進行。 上述實施形態係就以連續式進行蒸發濃縮、結晶化之 情形說明,但亦可採用以分批式進行蒸發濃縮,冷卻該濃 縮液使硝酸鈽銨結晶析出並分離後,由分離液回收鈽之方 式。 〔2〕由分離液、洗清液回收鈽: 以下說明由上述步驟3 (S3)之分離液及步驟4(S4)之洗 清液回收鈽之方法。 (2-1)加草酸水溶液於步驟3(S3)之分離液及步驟 4 ( S 4 )之洗清液之合併液,使4價筛還原為3價錦,3價鈽則4 (S4)). (1-4) On the other hand, the steam generated in the above-mentioned evaporation and concentration step is condensed to recover nitric acid water (Fig. 1, step 5 (S5)). (1-5) Secondly, the separation liquid from step 3 (S3) and the washing liquid from step 4 (S4) are recovered (Fig. 1, step 6 (S6)). The recovery of 钸 in this step 6 (S6) is performed through steps 11 (S11) to 21 (S21) shown in the flowchart of FIG. 2. The above embodiment is described in the case of continuous evaporation, concentration, and crystallization. However, evaporation concentration in a batch mode can also be used. The concentrated solution is cooled to crystallize and separate ammonium hafnium nitrate, and then recover the radon from the separation liquid. the way. [2] Recovery of 钸 from the separation liquid and washing liquid: The method for recovering 钸 from the separation liquid of step 3 (S3) and the washing liquid of step 4 (S4) will be described below. (2-1) Add the combined solution of the oxalic acid aqueous solution in step 3 (S3) and the washing liquid in step 4 (S 4) to reduce the 4-valent sieve to 3-valent bromine, and the 3-valent rule

第10頁 593766 五、發明說明(8) 以草酸鹽析出(第2圖、步驟ll(Sll))。又於此步驟,存在 於鉻蝕刻液中之6價鉻還原為3價鉻。 (2-2)其次加氫氧化鈉水溶液中和至"為4· 〇為止, 使於上述(2 - 1)步驟未析出之鈽以草酸鹽析出(第2圖、 步驟 12(S12))。 (2 -3 )用過濾方法分離析出之草酸鈽(第2圖、步驟 13(S13))。 (2-4)加氫氧化鉀濃度為7〇g / 70 0ml之氫氧化鉀水 溶液於上述步驟(2 - 3 )分離、回收之草酸鈽濾餅(第2圖、 步驟1 4 ( S1 4 )),以分解草酸鈽生成氫氧化亞鈽。 (2 - 5 )其次加氧化劑次氣酸鈉以氧化氫氧化亞鈽生成 氫氧化鈽(第2圖、步驟1 5 ( S1 5 ))。 (2-6)用過濾方法分離氫氧化鈽(第2圖、步驟 16(S16))。由此回收得含Ce02 ( 48.5g)之氫氧化鈽濕濾餅 (83· 7g)。 於此步驟可分離回收使用過之鉻蝕刻液中之99. 9%鈽 (以Ce02 計48· 6g)。 (2 - 7)加硝酸•硝酸銨於上得回收之氫氧化鈽後加熱 濃縮生成硝酸鈽銨(第2圖、步驟Π (S1 7))。 (2 -8 )以晶化裝置進行含該硝酸鈽銨溶液之蒸發濃 縮、結晶化,將析出之硝酸鈽銨結晶分離、脫水(第2圖、 步驟 1 8 (S1 8 ))。 (2 - 9 )對該硝酸鈽銨以既定比例配合硝酸等並混合、 溶解,調製成新的鉻蝕刻液(第2圖、步驟1 9 (S1 9 ))。Page 10 593766 5. Description of the invention (8) Precipitation with oxalate (Fig. 2, step 11 (Sll)). In this step, the hexavalent chromium existing in the chromium etching solution is reduced to trivalent chromium. (2-2) Next, add sodium hydroxide aqueous solution to neutralize until "" is 4 · 〇, so that the osmium which is not precipitated in the above step (2-1) is precipitated as oxalate (Fig. 2, step 12 (S12) ). (2 -3) The precipitated gadolinium oxalate is separated by filtration (Fig. 2, step 13 (S13)). (2-4) adding a potassium hydroxide aqueous solution having a potassium hydroxide concentration of 70 g / 70 ml, and separating and recovering the oxalate oxalate filter cake in the above step (2-3) (FIG. 2, step 1 4 (S1 4)) ) To decompose osmium oxalate to form osmium hydroxide. (2-5) Next, the oxidant sodium hypooxygenate is added to oxidize osmium hydroxide to generate rhenium hydroxide (Fig. 2, step 15 (S1 5)). (2-6) Separation of thorium hydroxide by filtration (Fig. 2, step 16 (S16)). Thus, a rhenium hydroxide wet cake (83 · 7 g) containing Ce02 (48.5 g) was recovered. In this step, 99.9% 钸 in the used chromium etching solution can be separated and recovered (calculated by Ce02 as 48 · 6g). (2-7) Add nitric acid and ammonium nitrate to the recovered thorium hydroxide and heat it to concentrate to produce ammonium rhenium nitrate (Figure 2, step Π (S1 7)). (2-8) Evaporating, condensing and crystallizing the ammonium ammonium nitrate solution using a crystallization device, and separating and dehydrating the precipitated ammonium ammonium nitrate crystals (Fig. 2, step 18 (S18)). (2-9) A new chromium etching solution is prepared by mixing and dissolving nitric acid and the like with ammonium osmium nitrate at a predetermined ratio (FIG. 2, step 1 9 (S1 9)).

第11頁 593766 五、發明說明(9) (2 - 1 〇 )另一方面,加氫氧化鈉水溶液於上述步驟(2 -3)分離草酸鈽後含3價鉻之濾液,調整其pH為8,將3價鉻 以氫氧化鉻析出(第2圖、步驟2〇 (S20))。 (2 -1 1 )以過濾方法分離、去除氫氧化鉻(第2圖、步 ' · 驟21(S21))。 過滤II氧化鉻後之濾液中鉻濃度為1 〇ppb,姉濃度則 為lOOppb以下。 於此步驟過滤中和處理後之溶液,可分離、去除使用 過之鉻蝕刻液中之99· 9%以上鉻。 此實施形態中’於步驟(2 —2)加鹼中和至pH為約4, 可使用氫氧化鈉為鹼類,但亦可使用氫氧化鉀等其他鹼 類。 又於步驟(2-4)加氫氧化鉀水溶液於分離、回收之草 酸錦渡餅’但亦可使用氫氧化鈉等其他鹼類水溶液。 又=^驟(2 - 5 ),加氧化劑次氯酸鈉以氧化氫氧化亞 鈽生成^ =化鈽,但亦可使用過氧化氫等其他氧化劑。 、又方、步驟(2 - 1 〇 ),加氫氧化鈉水溶液於分離草酸鈽後 之濾液使3彳貝鉻以氫氧化物沈澱,但亦可使用其他鹼Page 11 593766 V. Description of the invention (9) (2-1 〇) On the other hand, add the aqueous solution of sodium hydroxide in the above step (2-3) to separate the filtrate containing trivalent chromium after the oxalate oxalate, and adjust its pH to 8 The trivalent chromium was precipitated as chromium hydroxide (Fig. 2, step 20 (S20)). (2 -1 1) The chromium hydroxide is separated and removed by a filtration method (Fig. 2, step '· step 21 (S21)). The chromium concentration in the filtrate after filtering the II chromium oxide was 10 ppb, and the concentration was 100 ppb or less. In this step, the solution after filtering and neutralization can be used to separate and remove more than 99.9% of the chromium in the used chromium etching solution. In this embodiment, 'in step (2-2), the base is neutralized to a pH of about 4. Sodium hydroxide may be used as a base, but other bases such as potassium hydroxide may be used. In step (2-4), a potassium hydroxide aqueous solution is added to the separated and recovered oxalate broth cake ', but other alkaline aqueous solutions such as sodium hydroxide may also be used. Another step (2-5), the oxidant sodium hypochlorite is added to oxidize sulfonium hydroxide to form sulfonium, but other oxidants such as hydrogen peroxide can also be used. Step 2 and step (2-10), add sodium hydroxide aqueous solution to the filtrate after separating the oxalate oxalate to precipitate 3 彳 chrome with hydroxide, but other bases can also be used

一 ★又^ ^實施形態’將含硝酸鈽銨之溶液以晶化裝置進 仃f 縮·結晶化(步驟(2 —8)),但可視情況,不特別 進行、、、"0曰化,將溶液狀態之硝酸鈽銨直接使用於調製新的 本發明在其他各方面不受上述實施形態之限制,在本A ★ and ^ ^ Implementation mode 'condensate and crystallize the solution containing ammonium ammonium nitrate using a crystallization device (step (2-8)), but depending on the circumstances, it is not particularly carried out. The use of ammonium osmium nitrate in solution state for the preparation of new inventions is not limited by the above embodiments in other aspects.

第12頁 593766Page 12 593766

五、發明說明(ίο) 發明之範圍内可做各種應用與改變。 【發明效果】 如上述,本發明之由鉻蝕刻液回收鈽之方法為蒸發浪 縮含鈽與鉻之酸性鉻蝕刻液使鈽化合物析出並分離=而利 用該分離之飾化合物調製使用於鉻触刻之虫刻液,故 &lt; 以 較簡單之蒸發結晶化方法以良好效率由使用過之絡餘到液 回收鈽。 〆V. Description of the Invention (ίο) Various applications and changes can be made within the scope of the invention. [Effects of the Invention] As described above, the method for recovering radon from the chromium etching solution of the present invention is to evaporate and condense the acid chromium etching solution containing radon and chromium to precipitate and separate the radon compound =, and use the separated decorative compound to prepare and use the chromium contact. The engraved insect engraved the liquid, so <> the simpler evaporation crystallization method with good efficiency from the used glutamate to the liquid recovery pupae. 〆

又於鉻蝕刻液,通常使用硝酸鈽銨為鈽化合物,此時 採用蒸發結晶化方法使硝酸鈽銨以良好效率析出而分離、 回收(申請專利範圍第2項)。 77 又如本發明之(申請專利範圍第3項)之由鉻蝕刻液回 收鈽之方法,蒸發濃縮鉻蝕刻液使鈽化合物析出並分離, 回收,,同時以草酸鹽分離、回收分離鈽化合物後之分離夺 中(殘存)之鈽,即可大約全量回收鉻蝕刻液中之鈽,使多 之回收率大幅度提升,使本發明更有實際效果。 又如申請專利範圍第4項之由鉻蝕刻液回收鈽之方 於申明專利範圍第3項步驟(c )分離以3價鈽之草酸鹽 :^ Ϊ刀之析出物後,加氫氧化鹼(金屬)於此含3價鉻In the chromium etching solution, ammonium osmium nitrate is usually used as the erbium compound. At this time, the ammonium osmium nitrate is precipitated with good efficiency by evaporation crystallization to separate and recover (the second in the scope of patent application). 77 Another method of recovering thallium from chromium etching solution of the present invention (item No. 3 of the scope of application for patent) is to evaporate and condense the chromium etching solution to separate and recover thallium compounds, and at the same time to separate and recover thallium compounds with oxalate. After the separation of the remaining (remaining) plutonium, about a full amount of the plutonium in the chromium etching solution can be recovered, which greatly improves the recovery rate and makes the present invention more practical. Another example is the method of recovering rhenium from the chromium etching solution in the scope of the patent application. In step 3 (c) of the scope of the declared patent, the trivalent oxalate is separated: ^ The trowel's precipitate is added with alkali hydroxide. (Metal) here contains trivalent chromium

物質鈽則以良好質鉻不會排出於系統外’而有’ ^ = I率收,故極為有意義。 法,於申往】利範圍第5項之由鉻蝕刻液回收鈽之方 之分離液中,夭圍弟3項步驟(c)分離析出之鈽化合物名 中^具還原4價料3價飾之還原作用且生4Substances are very meaningful because they will not be discharged out of the system with good quality chromium but have a ratio of ^ = I. Method, in the application] in the scope of item 5 of the recovery solution of the chromium etching solution from the chromium solution, the third step (c) of the siege compound is separated and precipitated in the name of the compound 具 with a reduction of 4 valence materials 3 valance Reduction and Health 4

593766 、發明說明(11) —3 - 價鉻之氫氧化物之程度::二使:和至實質上'析出3 離以3價飾之草酸鹽為主要再=草酸鹽析出後’分 液,以良好效率分離、回;==鉻化合物之鉻㈣ 又如申請專利範圍第6/λ 之鋪。 法,於申請專利範圍第5項+ 絡餘刻液回收鋪之方 成為約4為止,能夠抑制”;:(b)進行中和時添加驗使ΡΗ 可使3秤你丨、7笞缺疏— 防止鉻以氣氧化物析出,同時 又如申二 法,於申請專利範圍第5項i;;鉻餘刻液回收鋪之方 使生成气4彳卜:#成刀之析出物用氫氧化鹼(金屬)作用 使生成氫氧化錢,氧化亞_氧化劑作用 加熱濃縮使生成她“;;乳:”硝酸及硝酸銨作用並 -^ e _ ^ . ^ ^ P鉍時,所得硝酸鈽銨可配合硝酸等 =;Γϊ飯刻液,可以良好效率循環使用飾。 牛由:—°月斥“巳圍第8項之由鉻蝕刻液回收鈽之方 圍第2項步驟所析出之硝酸鈽銨(申請專利範 制圍第7項所生成之硝酸鈽銨,以調 ± * A U ^ ^ 、、,成之蝕刻液,可循環使用回收之 王置錦為㈣&amp;,使本發明更有實際效果。593766, Description of the invention (11) — 3-The degree of hydroxide of valence chromium :: two make: and to substantially 'precipitate 3' The oxalate with 3 valence as the main re == after the oxalate is precipitated ' The liquid is separated and returned with good efficiency; == chromium compounds of chromium compounds. Method, which can be suppressed until item 5 of the scope of patent application + the solution of recovery of the etch solution is about 4, which can be restrained "; (b) adding neutralizers during neutralization can make 3 scales and 7 scales thinner — To prevent the precipitation of chromium as gas oxides, and at the same time as the second method, in the scope of the patent application, item 5i; Chromium residual etching liquid recovery method to generate the gas 4 彳 b: # 成 刀 的 结 物 用 OH The action of alkali (metal) causes the formation of money hydroxide, and the oxidation and oxidation of the oxidant oxidant heats and concentrates the formation of her ";; milk:" when nitric acid and ammonium nitrate interact and-^ e _ ^. ^ ^ P bismuth, the resulting ammonium osmium nitrate can be Combined with nitric acid, etc .; Γ ϊ rice carving liquid, can be used for recycling with good efficiency. Niu You: — ° Month replies to the 8th step of the 巳 etching solution from the chrome etching solution to recover the 钸 ammonium sulphate ammonium nitrate precipitated in the 2nd step. (The ammonium osmium nitrate generated in the seventh paragraph of the patent application system is used to adjust the etching solution of ± * AU ^ ^,,, and can be recycled and reused. The king sets Jin as ㈣ &amp; to make the invention more practical. .

593766 圖式簡單說明 第1圖與本發明之實施形態相關之由鉻蝕刻液回收鈽 之方法中蒸發濃縮、結晶化步驟之流程圖。 第2圖與本發明之實施形態相關之由鉻蝕刻液回收鈽 之方法中以草酸鹽回收鈽步驟之流程圖。593766 Brief Description of Drawings Fig. 1 is a flow chart showing the steps of evaporation, concentration, and crystallization in a method for recovering plutonium from a chromium etching solution in accordance with an embodiment of the present invention. FIG. 2 is a flowchart of a step of recovering rhenium with oxalate in a method for recovering rhenium from a chromium etching solution according to an embodiment of the present invention.

第15頁Page 15

Claims (1)

593766 六、申請專利範圍 析出之步驟 (c2)分 主成分之析 3 ·如申 法,其中於 收草酸鹽後 分離之步驟 4.如申 法,其中於 5·如申 之方法,其 對於步 分之析出物 驟, 對該生 之步驟;及 對該氫 硝酸鈽銨之 鈽 、及 離於(a2)、(b2)步驟析出之以3價鈽之草酸鹽 出物之步驟。 清專利範圍第2項之由鉻蝕刻液回收鈽之方 v驟(cl)具備添加氫氧化驗(金屬)於分離、回 之3 3 {貝絡溶液中,使3價鉻以氫氧化鉻析出、 〇 明專利範圍第2項之由鉻|虫刻液回收飾之方 步驟(b2)加鹼中和時加鹼至pH為約4為止。 °月專利知圍第2項或第4項之由鉻蝕刻液回收鈽 中具備下列步驟: 驟(&quot;c 2 )刀離、回收之以3價鈽之草酸鹽為主要成 以氫氧化鹼(金屬)作用使生成氫氧化亞鈽之步 成之氫氧化亞#以氧化劑作用使生成氯氧化 氧化鈽以硝酸及硝酸銨作用並加熱濃縮使生成 步驟。593766 VI. The precipitation of the scope of the patent application (c2) The analysis of the main components 3 · Rushen method, in which the step of separation after receiving oxalate 4. Rushen method, in which the method in 5. Rushen method The step of the step of precipitation, the step of this life; and the step of the ammonium hydroxide nitrate, and the step of (a2), (b2) from the step of the valence of oxalate with trivalent amidine. The method of recovering the chromium from the chromium etching solution in item 2 of the Qing patent includes the step (cl) of adding a hydroxide test (metal) to separate and return 3 3 {Below solution to precipitate trivalent chromium as chromium hydroxide. Step 2 (b2) of the method of recovering decoration from chrome | insect engraved liquid by adding alkali during neutralization, and adding alkali until the pH is about 4 during neutralization. The following steps are included in the recovery of the chromium etching solution from the second or fourth item of the patent patent: (&quot; c 2) The knife is separated and recovered, and the trivalent oxalate is mainly used as the hydroxide. The action of alkali (metal) causes the step of generating rhenium hydroxide to form oxyhydroxide, which acts as an oxidant to generate oxychloride, oxidizes rhenium oxide with nitric acid and ammonium nitrate, and heats and concentrates to produce the step.
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